JP2006190817A - Substrate transfer device and substrate transfer method - Google Patents

Substrate transfer device and substrate transfer method Download PDF

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JP2006190817A
JP2006190817A JP2005001485A JP2005001485A JP2006190817A JP 2006190817 A JP2006190817 A JP 2006190817A JP 2005001485 A JP2005001485 A JP 2005001485A JP 2005001485 A JP2005001485 A JP 2005001485A JP 2006190817 A JP2006190817 A JP 2006190817A
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semiconductor substrate
carrier
transfer hand
hand body
substrate
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JP2006190817A5 (en
JP5041504B2 (en
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Akira Amano
昭 天野
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Rohm Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem that productivity is reduced due to the fact that the alignment of a transfer hand 14 over its insertion position is required so as to cope with the deformation degree of the semiconductor substrate 10, in a takeout operation when the semiconductor substrates 10 are taken out of a carrier 1 one by one by the flat transfer hand 14 and transferred to a processing stage 5 in a suceeding process. <P>SOLUTION: Paired forks 22 and 22 of the transfer hand 14 are inserted under the semiconductor substrate 10 in the carrier 1 so as to form a space A between the peripheral edge of the semiconductor substrate 10 and the inner diameter side of a root 28 of the forks 22 and 22. Then, the transfer hand 14 is moved up or the carrier 1 is moved down to support parts of the semiconductor substrate 10 as a takeout target near its lateral peripheral edges by the forks 22 and 22. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、キャリア内に多段状に収容されたシリコンウエハ等の半導体基板を1枚ずつ取り出して、次工程の加工ステージに移送するための基板移送装置及び基板移送方法に関するものである。   The present invention relates to a substrate transfer apparatus and a substrate transfer method for taking out semiconductor substrates such as silicon wafers stored in multiple stages in a carrier one by one and transferring them to a next processing stage.

一般に、シリコンウエハ等の半導体基板から半導体チップを製造するに際しては、半導体基板の複数枚を、キャリア内に多段状に収容した状態で任意の箇所に移送したのち、このキャリア内から半導体基板を1枚ずつ取り出して、次工程の加工ステージに供給することが行われている。   In general, when a semiconductor chip is manufactured from a semiconductor substrate such as a silicon wafer, a plurality of semiconductor substrates are transferred to an arbitrary position in a state of being accommodated in multiple stages in a carrier, and then the semiconductor substrate 1 Each sheet is taken out and supplied to the next processing stage.

この種の作業で使用される従来の基板移送装置においては、各半導体基板の略中央部の下方に、扁平状に形成された真空吸着方式の移送ハンド体を挿入したのち、半導体基板の下面略中央部を移送ハンド体で吸着してから、当該移送ハンド体をキャリア内から引き出すことにより、キャリア内から半導体基板を1枚ずつ取り出すように構成されている(例えば特許文献1等参照)。
特開2001−168170号公報(段落0002〜0004及び図7等参照)
In a conventional substrate transfer apparatus used in this type of work, a vacuum suction type transfer hand body formed in a flat shape is inserted below the substantially central portion of each semiconductor substrate, and then the lower surface of the semiconductor substrate is substantially omitted. After the central portion is adsorbed by the transfer hand body, the semiconductor substrate is taken out one by one from the carrier by pulling out the transfer hand body from the carrier (see, for example, Patent Document 1).
Japanese Patent Laid-Open No. 2001-168170 (see paragraphs 0002 to 0004 and FIG. 7)

ところで、キャリア内における各段の半導体基板の保持は、キャリアの左右両内側壁に上下多段状に形成された嵌合溝に対して1枚の半導体基板の左右外周縁を嵌め込み収容することにより、両端自由支持の状態となっているから、キャリア内の半導体基板は自重で下向きに撓み易い。半導体基板の撓みの有無及び大小は、当該半導体基板の厚みに応じて異なる(薄いほど下向きに撓む)。   By the way, the holding of the semiconductor substrate at each stage in the carrier is performed by fitting the left and right outer peripheral edges of one semiconductor substrate into the fitting grooves formed in upper and lower multi-stage shapes on the left and right inner side walls of the carrier. Since both ends are freely supported, the semiconductor substrate in the carrier is easily bent downward by its own weight. Whether the semiconductor substrate is bent or not is different depending on the thickness of the semiconductor substrate (the thinner the substrate, the more downward it is bent).

しかし、前記従来の基板移送装置では、キャリア内から半導体基板を取り出す際に、撓み量の大きい下面略中央部を吸着ハンド体で吸着保持していたから、取り出そうとする半導体基板と移送ハンド体との接触を回避して移送ハンド体の挿入スペースを確保するために、半導体基板の撓み状態に合わせて移送ハンド体の挿入位置を逐一調節するか、又はキャリアにおける半導体基板間の収容ピッチ間隔(嵌合溝の上下ピッチ間隔)を広く設定しなければならなかった。前者の方策では、半導体基板の取り出し作業のたびに移送ハンド体の挿入位置の位置合せをするのが面倒であり、生産性低下の一因になるという問題があった。また、後者の方策では、キャリアにおける半導体基板間の収容ピッチ間隔が大きくなる結果、1つのキャリアに収容可能な半導体基板の枚数が少なくなるという問題があった。   However, in the conventional substrate transfer apparatus, when the semiconductor substrate is taken out from the carrier, the substantially central portion of the lower surface having a large amount of deflection is sucked and held by the suction hand body, so that the contact between the semiconductor substrate to be taken out and the transfer hand body is made. In order to avoid the problem and secure the insertion space of the transfer hand body, the insertion position of the transfer hand body is adjusted one by one according to the bending state of the semiconductor substrate, or the accommodation pitch interval (fitting groove between the semiconductor substrates in the carrier) The vertical pitch interval) had to be set wide. In the former measure, it is troublesome to align the insertion position of the transfer hand body every time the semiconductor substrate is taken out, and this causes a problem of reducing productivity. Further, the latter measure has a problem that the number of semiconductor substrates that can be accommodated in one carrier is reduced as a result of an increase in the accommodation pitch interval between the semiconductor substrates in the carrier.

そこで、本発明は、以上のような問題を解消した基板移送装置と基板移送方法とを提供することを技術的課題とするものである。   In view of the above, it is a technical object of the present invention to provide a substrate transfer apparatus and a substrate transfer method that solve the above problems.

この技術的課題を解決するため、請求項1の発明は、キャリア内に多段状に収容された各半導体基板の下方に挿入して、当該半導体基板を前記キャリア内から1枚ずつ取り出すための扁平状の移送ハンド体を備えた基板移送装置であって、前記移送ハンド体の先端には、前記半導体基板を載せるための一対のフォーク部が、前記キャリア内に挿入したときに両方とも前記半導体基板のうち挿入方向と交差する両外周縁に近い部位に沿って延びるように、相互間の間隔を空けて設けられ、前記両フォーク部は、前記キャリア内に挿入したときに前記半導体基板の外周縁と前記両フォーク部の付け根部分の内径側との間に隙間が空くような長さに設定されているというものである。   In order to solve this technical problem, the invention of claim 1 is a flat for inserting the semiconductor substrates one by one from the carrier by inserting them below the respective semiconductor substrates accommodated in multiple stages in the carrier. A substrate transfer apparatus comprising a transfer hand body having a pair of forks for placing the semiconductor substrate at the tip of the transfer hand body when both are inserted into the carrier. The fork portions are provided to be spaced apart from each other so as to extend along a portion close to both outer peripheral edges intersecting with the insertion direction, and the both fork portions are outer peripheral edges of the semiconductor substrate when inserted into the carrier. And a length such that a gap is left between the inner diameter side of the base portions of the both fork portions.

請求項2の発明は、請求項1に記載した基板移送装置において、前記両フォーク部の上面には、前記半導体基板を吸着保持するための上向き開口状の吸引穴がそれぞれ形成されているというものである。   According to a second aspect of the present invention, in the substrate transfer apparatus according to the first aspect, an upward opening-shaped suction hole for adsorbing and holding the semiconductor substrate is formed on the upper surfaces of the fork portions. It is.

請求項3の発明は、キャリア内に多段状に収容された半導体基板を扁平状の移送ハンド体で1枚ずつ取り出して、次工程の加工ステージに移送する基板移送方法であって、前記キャリア内における前記半導体基板の下方に、前記移送ハンド体の先端に設けられた一対のフォーク部を、前記半導体基板の外周縁と前記両フォーク部の付け根部分の内径側との間に隙間が空くようにして挿入したのち、前記移送ハンド体を上昇させるか又は前記キャリアを下降させて、前記半導体基板のうち挿入方向と交差する両外周縁に近い部位を前記両フォーク部で支持するというものである。   The invention of claim 3 is a substrate transfer method in which semiconductor substrates accommodated in multiple stages in a carrier are taken out one by one with a flat transfer hand body and transferred to a processing stage in the next process, wherein the inside of the carrier A pair of fork portions provided at the front end of the transfer hand body are provided below the semiconductor substrate in such a manner that a gap is provided between the outer peripheral edge of the semiconductor substrate and the inner diameter side of the base portion of the fork portions. Then, the transfer hand body is raised or the carrier is lowered, and the fork portions support the portions of the semiconductor substrate close to both outer peripheral edges that intersect the insertion direction.

本発明によると、キャリア内の半導体基板を1枚ずつ取り出すに際しては、移送ハンド体の両フォーク部は、両端自由支持の状態で収容された前記半導体基板のうち挿入方向と交差する両外周縁に近い部位の下方に差し込まれる。また、前記半導体基板の外周縁と前記両フォーク部の付け根部分の内径側との間には、隙間が空くことになる。   According to the present invention, when the semiconductor substrates in the carrier are taken out one by one, both fork portions of the transfer hand body are disposed on both outer peripheral edges intersecting the insertion direction among the semiconductor substrates accommodated in a state where both ends are freely supported. It is inserted below the nearest part. In addition, a gap is formed between the outer peripheral edge of the semiconductor substrate and the inner diameter side of the base portion of the fork portions.

この場合、前記両フォーク部間の間隔は広く空いているから、前記半導体基板が自重で下向きに撓んでいたとしても、前記両フォーク部は、前記半導体基板の大きく撓んだ中央部に接触することなく、上下に並ぶ前記半導体基板間の挿入スペースにスムーズに入り込むことができる。これにより、取り出し時の前記半導体基板の損傷を防止することができる。   In this case, since the space between the fork portions is wide, even if the semiconductor substrate is bent downward due to its own weight, the fork portions are in contact with the greatly bent center portion of the semiconductor substrate. Without any problem, it is possible to smoothly enter the insertion space between the semiconductor substrates arranged vertically. Thereby, damage to the semiconductor substrate at the time of taking out can be prevented.

また、前記半導体基板のうち挿入方向と交差する両外周縁に近い部位は、中央部に比べると下向きの撓み量が小さいので、前記両フォーク部の挿入位置は、取り出し対象の前記半導体基板に対して前記半導体基板の厚みの大小に関係なく一定に設定することができる。従って、前記半導体基板の取り出し作業のたびに、前記両フォーク部の挿入位置の位置合せをする手間をなくすことができるだけでなく、設定ミス等による誤動作等も未然に防ぐことができるから、生産効率を格段に向上させることができるという効果を奏する。   Further, the portion of the semiconductor substrate close to both outer peripheral edges intersecting with the insertion direction has a small downward bending amount as compared with the central portion, and therefore the insertion position of both fork portions is relative to the semiconductor substrate to be taken out. Thus, it can be set constant regardless of the thickness of the semiconductor substrate. Therefore, it is possible not only to eliminate the trouble of aligning the insertion positions of the both fork portions every time the semiconductor substrate is taken out, but also to prevent malfunctions due to setting errors, etc. There is an effect that can be remarkably improved.

さらに、前記半導体基板の外周縁と前記両フォーク部の付け根部分の内径側との間には隙間が空いているから、前記半導体基板が自重で下向きに撓んでいたとしても、取り出し時に前記両フォーク部の付け根部分が前記半導体基板に衝突することはない。従って、本発明によると、取り出し時の前記半導体基板の損傷を確実に回避して、前記半導体基板の歩留まりを向上させることができるという効果をも奏する。   Further, since there is a gap between the outer peripheral edge of the semiconductor substrate and the inner diameter side of the base portion of the both fork portions, even if the semiconductor substrate is bent downward by its own weight, The base portion of the portion does not collide with the semiconductor substrate. Therefore, according to the present invention, it is possible to reliably avoid damage to the semiconductor substrate at the time of taking out and improve the yield of the semiconductor substrate.

以下に、本発明を具体化した実施形態を図面(図1〜図6)に基づいて説明する。図1は基板移送装置の概略正面図、図2は基板移送装置の概略平面図、図3はキャリアから半導体基板を取り出した状態を示す平面図、図4のうち(a)は移送ハンド体の拡大平面図、(b)は(a)のIVb−IVb視側断面図、図5はキャリア内に移送ハンド体を挿入した状態を示す平断面図、図6(a)(b)は移送ハンド体での取り出し態様を示す説明図である。   DESCRIPTION OF EMBODIMENTS Embodiments embodying the present invention will be described below with reference to the drawings (FIGS. 1 to 6). 1 is a schematic front view of a substrate transfer device, FIG. 2 is a schematic plan view of the substrate transfer device, FIG. 3 is a plan view showing a state in which a semiconductor substrate is taken out from a carrier, and FIG. (B) is a sectional view taken along the line IVb-IVb of (a), FIG. 5 is a plan sectional view showing a state in which the transfer hand body is inserted into the carrier, and FIGS. 6 (a) and 6 (b) are transfer hands. It is explanatory drawing which shows the taking-out aspect with a body.

まず最初に、図1〜図3等を参照しながら、実施形態のキャリア及び基板移送装置の全体概要について説明する。   First, an overall outline of the carrier and the substrate transfer apparatus according to the embodiment will be described with reference to FIGS.

図1に示すように、キャリア1は、半導体基板10の出し入れ口2を横向きに開口させた略角筒状のものである。キャリア1の左右両内側面には、半導体基板10の左右外周縁が嵌る嵌合溝3(図2、図3及び図5参照)がピッチ間隔Pで上下並列状に複数本形成されている。従って、キャリア1内には、半導体基板10を水平な姿勢で1枚だけ収容する収容部がピッチ間隔Pで上下多段状に設けられている。換言すると、キャリア1内の半導体基板10,10間には収容ピッチ間隔Pのスペースが空いている。このキャリア1はキャリアステージ4の上面に載置されている。   As shown in FIG. 1, the carrier 1 has a substantially rectangular tube shape in which the entrance / exit 2 of the semiconductor substrate 10 is opened sideways. A plurality of fitting grooves 3 (see FIGS. 2, 3, and 5) in which the left and right outer peripheries of the semiconductor substrate 10 are fitted are formed on the left and right inner side surfaces of the carrier 1 in a vertically parallel manner with a pitch interval P. Therefore, in the carrier 1, accommodating portions for accommodating only one semiconductor substrate 10 in a horizontal posture are provided in a multistage shape with a pitch interval P. In other words, a space of the accommodation pitch interval P is vacant between the semiconductor substrates 10 and 10 in the carrier 1. The carrier 1 is placed on the upper surface of the carrier stage 4.

なお、実施形態のキャリア1は、6インチサイズの半導体基板10用のものである。この場合、収容ピッチ間隔PはSEMI(Semiconductor Equipment and Material International)規格に準拠して略4.76mm程度に設定されている。また、キャリア1の左右両内側面間の開口巾寸法WM(図3及び図6参照)は略132mmほどになっている。   The carrier 1 of the embodiment is for a 6-inch semiconductor substrate 10. In this case, the accommodation pitch interval P is set to about 4.76 mm in accordance with SEMI (Semiconductor Equipment and Material International) standards. In addition, the opening width dimension WM (see FIGS. 3 and 6) between the left and right inner surfaces of the carrier 1 is about 132 mm.

キャリアステージ4に相対向して配置された基板移送装置11は、キャリア1内の半導体基板10を1枚ずつ取り出して、次工程の加工ステージ5(図2参照)に移送するためのものである。基板移送装置11は、キャリア1内の各半導体基板10の下方に挿入して、当該半導体基板10をキャリア1内から1枚ずつ取り出すための扁平状の移送ハンド体14と、この移送ハンド体14を先端部に有する屈伸式のアーム体13と、当該アーム体13を支持する鋳鉄製等の機枠12とを備えている。   The substrate transfer device 11 arranged opposite to the carrier stage 4 is for taking out the semiconductor substrates 10 in the carrier 1 one by one and transferring them to the processing stage 5 (see FIG. 2) in the next process. . The substrate transfer device 11 is inserted below each semiconductor substrate 10 in the carrier 1 and has a flat transfer hand body 14 for taking out the semiconductor substrates 10 one by one from the carrier 1, and the transfer hand body 14. And a machine frame 12 made of cast iron or the like for supporting the arm body 13.

アーム体13は、機枠12に対して鉛直な軸線15回りに水平回動可能で且つ昇降動可能に支持されたヘッド部材16と、ヘッド部材16の先端側に鉛直な軸線17回りに水平回動可能な状態で枢着された第1スイング部材18と、第1スイング部材18の先端側に鉛直な軸線19回りに水平回動可能な状態で枢着された第2スイング部材20とにより構成されている。移送ハンド体14は、第2スイング部材20の先端側に、鉛直な軸線21回りに水平回動可能な状態で枢着されている。   The arm body 13 has a head member 16 that is horizontally rotatable about a vertical axis 15 with respect to the machine frame 12 and is supported so as to be movable up and down, and a horizontal rotation about a vertical axis 17 on the distal end side of the head member 16. A first swing member 18 pivotally attached in a movable state, and a second swing member 20 pivotally attached in a state of being horizontally rotatable around a vertical axis 19 around the distal end side of the first swing member 18. Has been. The transfer hand body 14 is pivotally attached to the distal end side of the second swing member 20 so as to be horizontally rotatable about a vertical axis 21.

実施形態では、アーム体13全体が伸縮するように、移送ハンド体14、両スイング部材18,20及びヘッド部材16を駆動モータ(図示せず)で各々水平回動させることにより、移送ハンド体14が、キャリア1内に挿入された状態(図1及び図2の実線状態参照)から一旦ヘッド部材16の上方にまで、平面視でキャリア1の中心とヘッド部材16の中心とを結ぶ直線SLに沿って移動したのち(図3参照)、次工程の加工ステージ5にまで移動(図2の二点鎖線状態参照)するように構成されている。   In the embodiment, the transfer hand body 14, the swing members 18, 20, and the head member 16 are horizontally rotated by a drive motor (not shown) so that the entire arm body 13 expands and contracts, thereby transferring the transfer hand body 14. However, from the state inserted into the carrier 1 (see the solid line state in FIGS. 1 and 2) to once above the head member 16, a straight line SL connecting the center of the carrier 1 and the center of the head member 16 in plan view. After moving along (see FIG. 3), it is configured to move to the next processing stage 5 (see the two-dot chain line state in FIG. 2).

次に、図4及び図5等を参照しながら、移送ハンド体の詳細構成について説明する。   Next, a detailed configuration of the transfer hand body will be described with reference to FIGS. 4 and 5 and the like.

移送ハンド体14は、キャリア1内における半導体基板10,10間の挿入スペースSPにスムーズに挿入し得るような側面視扁平状で、且つその先端側が二股状に分かれたような平面視略Y字状(フォーク型)に形成されている。なお、実施形態の移送ハンド体14の厚みは最大でも略2mm程度である。   The transfer hand body 14 is flat in a side view so that it can be smoothly inserted into the insertion space SP between the semiconductor substrates 10, 10 in the carrier 1, and has a substantially Y shape in a plan view such that the tip side is divided into two forks. (Fork type). In addition, the thickness of the transfer hand body 14 of the embodiment is about 2 mm at the maximum.

移送ハンド体14の先端側に設けられた一対のフォーク部22,22は、キャリア1内から取り出そうとする半導体基板10が載る部分である。各フォーク部22には、その上面の先端側に、半導体基板10の下面のうち左右外周縁寄りの部位に密着する当接パッド部23が上向き凸状に一体形成されている。各当接パッド部23の上面略中央部には、半導体基板10を吸着保持するための吸引穴24が上向き開口状に形成されている。なお、半導体基板10に塵等の微粒子(パーティクル)が付着したり傷がついたりするのをできるだけ防ぐために、一対の当接パッド部23,23の平面視面積は必要最小限に設定されている。   A pair of fork portions 22, 22 provided on the front end side of the transfer hand body 14 is a portion on which the semiconductor substrate 10 to be taken out from the carrier 1 is placed. In each fork portion 22, an abutting pad portion 23 that is in close contact with a portion of the lower surface of the semiconductor substrate 10 near the left and right outer peripheral edges is integrally formed on the front end side of the upper surface so as to protrude upward. A suction hole 24 for adsorbing and holding the semiconductor substrate 10 is formed in an upward opening shape at a substantially central portion of the upper surface of each contact pad portion 23. In order to prevent the fine particles (particles) such as dust from adhering to or scratching the semiconductor substrate 10 as much as possible, the planar view areas of the pair of contact pad portions 23 and 23 are set to the minimum necessary. .

各吸引穴24は、移送ハンド体14の内部に形成された空気流通路25を介して、移送ハンド体14の基端部に形成された流通穴26に連通している。流通穴26には、フレキシブルホース等の連通管27を介して、外気を強制吸引するポンプ等の吸引源(図示せず)が連通接続されている。実施形態では、この吸引源を駆動させて両フォーク部22,22の吸引穴24,24から外気を吸引することにより、両吸引穴24,24に半導体基板10を吸着させるように構成されている。   Each suction hole 24 communicates with a flow hole 26 formed in the proximal end portion of the transfer hand body 14 via an air flow passage 25 formed in the transfer hand body 14. A suction source (not shown) such as a pump that forcibly sucks outside air is connected to the circulation hole 26 via a communication pipe 27 such as a flexible hose. In the embodiment, the semiconductor substrate 10 is adsorbed to both the suction holes 24, 24 by driving the suction source and sucking outside air from the suction holes 24, 24 of both the fork portions 22, 22. .

一方、両フォーク部22,22は、キャリア1内に挿入したときに両方とも半導体基板10の左右両外周縁(挿入方向と交差する両外周縁)に近い部位に沿って延びるように相互間の間隔Wを空けた状態で、移送ハンド体14の先端に設けられている。   On the other hand, both fork portions 22, 22 are arranged so as to extend along the portions near both the left and right outer peripheral edges (both outer peripheral edges intersecting the insertion direction) of the semiconductor substrate 10 when inserted into the carrier 1. It is provided at the front end of the transfer hand body 14 with a space W left therebetween.

実施形態では、両フォーク部22,22間の間隔W(一方のフォーク部22の内側縁から他方のフォーク部22の内側縁までの内法寸法)は略108mm程度になっている。各フォーク部22の横巾寸法WFは略10mmほどに設定されている。両フォーク部22,22間の間隔Wは、半導体基板10に対する両フォーク部22,22の支持位置を半導体基板10の中心からできるだけ離すために、半導体基板10の直径の50%以上であればよい。なお、両フォーク部22,22の並び巾寸法(一方のフォーク部22の外側縁から他方のフォーク部22の外側縁までの外法寸法)がキャリア1の開口巾寸法WMよりも小さいことはいうまでもない。   In the embodiment, the distance W between the fork parts 22 and 22 (internal dimension from the inner edge of one fork part 22 to the inner edge of the other fork part 22) is about 108 mm. The width dimension WF of each fork part 22 is set to about 10 mm. The distance W between the fork portions 22 and 22 may be 50% or more of the diameter of the semiconductor substrate 10 so that the support position of the fork portions 22 and 22 with respect to the semiconductor substrate 10 is as far as possible from the center of the semiconductor substrate 10. . It should be noted that the arrangement width dimension of both fork parts 22, 22 (external dimension from the outer edge of one fork part 22 to the outer edge of the other fork part 22) is smaller than the opening width dimension WM of the carrier 1. Not too long.

また、両フォーク部22,22は、キャリア1内に挿入したときに半導体基板10の外周縁と両フォーク部22,22の付け根部分28の内径側との間に隙間A(図2及び図5参照)が空くような長い長さLF(先端から付け根部分28の内径側までの距離)に設定されている。実施形態では、平面視で両フォーク部22,22の吸引穴24,24を結ぶ直線上に半導体基板10の重心O(中心)が位置した状態で、半導体基板10の外周縁と両フォーク部22,22の付け根部分28の内径側との間に隙間Aが空くように構成されている。   Further, when the fork portions 22 and 22 are inserted into the carrier 1, a gap A (see FIGS. 2 and 5) is formed between the outer peripheral edge of the semiconductor substrate 10 and the inner diameter side of the base portion 28 of the fork portions 22 and 22. It is set to a long length LF (distance from the tip to the inner diameter side of the root portion 28) such that the reference is open. In the embodiment, the outer peripheral edge of the semiconductor substrate 10 and the both fork portions 22 in a state where the center of gravity O (center) of the semiconductor substrate 10 is positioned on a straight line connecting the suction holes 24 and 24 of the fork portions 22 and 22 in plan view. , 22 is configured such that a gap A is provided between the inner diameter side of the base portion 28 of the base portion 28.

このように設定すると、平面視で重心Oを挟んで点対称な位置において半導体基板10が両フォーク部22,22の吸引穴24,24に吸着されるから、半導体基板10を両フォーク部22,22でバランスよく安定的に保持することができる。なお、吸引穴24が全部で3つ以上ある場合は、取り出そうとする半導体基板10の重心Oが平面視で吸引穴24を結ぶ直線のなす多角形の内径側に位置するようにすればよい。実施形態の各フォーク部22の長さLFは略115mm程度になっている。   With this setting, the semiconductor substrate 10 is attracted to the suction holes 24, 24 of the both fork portions 22, 22 at a point-symmetrical position across the center of gravity O in plan view. 22 can be stably held with good balance. If there are three or more suction holes 24 in total, the center of gravity O of the semiconductor substrate 10 to be taken out may be positioned on the inner diameter side of a polygon formed by a straight line connecting the suction holes 24 in plan view. The length LF of each fork portion 22 of the embodiment is about 115 mm.

以上の構成において、図6(a)(b)等を参照しながら、キャリア内から半導体基板を1枚ずつ取り出す態様について説明する。   In the above configuration, a mode in which semiconductor substrates are taken out one by one from the carrier will be described with reference to FIGS. 6 (a) and 6 (b).

まず、アーム体13全体が伸びるように移送ハンド体14及び両スイング部材18,20を各々水平回動させることにより、取り出し対象の半導体基板10の下方に、移送ハンド体14の両フォーク部22,22を挿入する(図6(a)(b)の実線状態参照)。このとき、両フォーク部22,22は、両端自由支持の状態で収容された半導体基板10の左右両外周縁に近い部位の下方に配置される。また、平面視で両吸引穴24,24を結ぶ直線上に半導体基板10の重心Oが位置するようにして、半導体基板10の外周縁と両フォーク部22,22の付け根部分28の内径側との間に隙間Aを空ける(図5参照)。   First, by horizontally rotating the transfer hand body 14 and the swing members 18 and 20 so that the entire arm body 13 extends, both fork portions 22 and 22 of the transfer hand body 14 are disposed below the semiconductor substrate 10 to be taken out. 22 is inserted (refer to the solid line state in FIGS. 6A and 6B). At this time, the both fork portions 22 and 22 are disposed below a portion near the left and right outer peripheral edges of the semiconductor substrate 10 accommodated in a state where both ends are freely supported. Further, the center of gravity O of the semiconductor substrate 10 is positioned on a straight line connecting the suction holes 24 and 24 in a plan view, and the outer peripheral edge of the semiconductor substrate 10 and the inner diameter side of the base portions 28 of the fork portions 22 and 22. A gap A is made between (see FIG. 5).

そうすると、両フォーク部22,22間の間隔Wは広く空いているから、半導体基板10が自重で下向きに撓んでいたとしても、両フォーク部22,22は、半導体基板10の大きく撓んだ部分(中央部)に接触することなく、半導体基板10,10間の挿入スペースSPにスムーズに入り込むことができる。これにより、取り出し時の半導体基板10の損傷を防止することができる。   Then, since the interval W between the fork portions 22 and 22 is wide, even if the semiconductor substrate 10 is bent downward due to its own weight, the fork portions 22 and 22 are largely bent portions of the semiconductor substrate 10. It is possible to smoothly enter the insertion space SP between the semiconductor substrates 10 and 10 without contacting the (central portion). Thereby, damage of the semiconductor substrate 10 at the time of taking out can be prevented.

また、半導体基板10の左右両外周縁に近い部位は、中央部に比べて下向きの撓み量が小さいので、取り出し対象の半導体基板10に対する両フォーク部22,22の挿入位置を、半導体基板10の厚みの大小に関係なく一定に設定することができる。従って、半導体基板10の取り出し作業のたびに、両フォーク部22,22の挿入位置の位置合せをする手間をなくすことができるだけでなく、設定ミス等による誤動作等も未然に防ぐことができるから、生産効率が格段に向上するのである。   Further, the portion near the left and right outer peripheral edges of the semiconductor substrate 10 has a downward deflection amount smaller than that of the central portion, and therefore the insertion positions of both fork portions 22 and 22 with respect to the semiconductor substrate 10 to be taken out are determined. It can be set constant regardless of the thickness. Therefore, it is possible not only to eliminate the trouble of aligning the insertion positions of the fork portions 22 and 22 every time the semiconductor substrate 10 is taken out, but also to prevent malfunctions due to setting errors and the like. Production efficiency is greatly improved.

さらに、半導体基板10の外周縁と両フォーク部22,22の付け根部分28の内径側との間には隙間Aが空いているから、半導体基板10が自重で下向きに撓んでいたとしても、取り出し時に両フォーク部22,22の付け根部分28が半導体基板10に衝突することはない。この点でも、取り出し時の半導体基板10の損傷が防止される。従って、本発明によると、取り出し時の半導体基板10の損傷を確実に回避して、半導体基板10の歩留まりを向上させることができるのである。   Further, since there is a gap A between the outer peripheral edge of the semiconductor substrate 10 and the inner diameter side of the base portion 28 of both the fork portions 22 and 22, even if the semiconductor substrate 10 is bent downward due to its own weight, it is removed. Sometimes the base portions 28 of the fork portions 22 and 22 do not collide with the semiconductor substrate 10. Also in this respect, damage to the semiconductor substrate 10 at the time of taking out is prevented. Therefore, according to the present invention, it is possible to reliably avoid damage to the semiconductor substrate 10 at the time of removal and improve the yield of the semiconductor substrate 10.

しかも、従来のように、両フォーク部22,22の挿入スペースSP確保のために、キャリア1における半導体基板10,10間の収容ピッチ間隔Pを大きくする必要がないから、上下に並ぶ半導体基板10,10同士が撓み等により接触しない程度にキャリア1の収容ピッチ間隔Pを狭くして、1つのキャリア1に収容可能な半導体基板10の枚数を多くすることもできる。   In addition, unlike the prior art, it is not necessary to increase the accommodation pitch interval P between the semiconductor substrates 10 and 10 in the carrier 1 in order to secure the insertion space SP of the both fork portions 22 and 22. , 10 can be narrowed so that the carriers 1 do not come into contact with each other due to bending or the like, and the number of semiconductor substrates 10 that can be accommodated in one carrier 1 can be increased.

取り出し対象の半導体基板10の下方に両フォーク部22,22を挿入した後は、ヘッド部材16を上昇動させることにより、取り出し対象の半導体基板10を両フォーク部22,22の上面に載せるようにして持ち上げる。このとき、ポンプ等の吸引源(図示しない)を駆動させて両フォーク部22,22の吸引穴24,24から外気を吸引することにより、両吸引穴24,24に半導体基板10が吸着保持される。   After both fork portions 22 and 22 are inserted below the semiconductor substrate 10 to be taken out, the head member 16 is moved up so that the semiconductor substrate 10 to be taken out is placed on the upper surfaces of both fork portions 22 and 22. Lift up. At this time, a suction source (not shown) such as a pump is driven to suck outside air from the suction holes 24, 24 of both fork portions 22, 22, so that the semiconductor substrate 10 is sucked and held in both suction holes 24, 24. The

次いで、アーム体13全体が縮むように移送ハンド体14及び両スイング部材18,20を各々水平回動させることにより、半導体基板10を吸着保持した移送ハンド体14をキャリア1内から引き出し、キャリア1の中心とヘッド部材16の中心とを結ぶ直線SLに沿ってヘッド部材16の上部まで、当該移送ハンド体14を直線的に移動させる(図3参照)。   Next, the transfer hand body 14 and the swing members 18 and 20 are horizontally rotated so that the entire arm body 13 is contracted, thereby pulling out the transfer hand body 14 holding the semiconductor substrate 10 by suction from the inside of the carrier 1. The transfer hand body 14 is linearly moved to the upper part of the head member 16 along a straight line SL connecting the center and the center of the head member 16 (see FIG. 3).

その後、図2の時計回りに略90°ほどヘッド部材16を水平回動させてから、アーム体13全体が伸びるように移送ハンド体14及び両スイング部材18,20を各々水平回動させることにより、半導体基板10を吸着保持した移送ハンド体14を加工ステージ5の位置まで移動させる。そして、ヘッド部材16を下降動させるか又は加工ステージ5を上昇動させることにより、半導体基板2を加工ステージ5上に載置したのち、吸引源(図示しない)による吸引穴24,24からの外気の吸引を停止するのである(図2の二点鎖線状態参照)。   Thereafter, the head member 16 is horizontally rotated about 90 ° in the clockwise direction in FIG. 2, and then the transfer hand body 14 and the swing members 18 and 20 are horizontally rotated so that the entire arm body 13 is extended. Then, the transfer hand body 14 holding the semiconductor substrate 10 by suction is moved to the position of the processing stage 5. Then, after the head member 16 is moved down or the processing stage 5 is moved up, the semiconductor substrate 2 is placed on the processing stage 5 and then the outside air from the suction holes 24 and 24 by the suction source (not shown). Is stopped (see the two-dot chain line state in FIG. 2).

本発明は、前述の実施形態に限らず、様々な態様に具体化することができる。例えば移送ハンド体の形状は、前述のような平面視略Y字状に限らず、平面視略U字状や平面視略コ字状等のように、先端側が二股状に分かれている形状であればよい。両フォーク部間の間隔及び長さ、フォーク部の横巾寸法等も、キャリアに収容される半導体基板のサイズに応じて自由に設定することができる。   The present invention is not limited to the above-described embodiment, and can be embodied in various forms. For example, the shape of the transfer hand body is not limited to a substantially Y shape in plan view as described above, but is a shape in which the tip side is divided into two forks, such as a substantially U shape in plan view and a substantially U shape in plan view. I just need it. The distance and length between the fork parts, the width of the fork part, and the like can be freely set according to the size of the semiconductor substrate accommodated in the carrier.

また、キャリアステージ4に、キャリア1が載る上面板を前述の収容ピッチ間隔Pずつ昇降動させる昇降機構を内蔵することにより、キャリアステージ4上のキャリア1を、昇降機構の駆動で収容ピッチ間隔Pずつ昇降動させるように構成してもよい。この場合は、取り出し対象の半導体基板10の下方に両フォーク部22,22を挿入した後、ヘッド部材16に代えてキャリアステージ4を下降動させることにより、取り出し対象の半導体基板10を両フォーク部22,22の上面に載せるようにして持ち上げることができる。   Further, by incorporating an elevating mechanism for moving the upper surface plate on which the carrier 1 is placed up and down by the above-described accommodation pitch interval P in the carrier stage 4, the carrier 1 on the carrier stage 4 is driven by the elevating mechanism to accommodate the accommodation pitch interval P. You may comprise so that it may raise / lower. In this case, after inserting both fork portions 22 and 22 below the semiconductor substrate 10 to be taken out, the carrier stage 4 is moved down instead of the head member 16, so that the semiconductor substrate 10 to be taken out is placed in both fork portions. It can be lifted so as to be placed on the upper surfaces of the 22 and 22.

その他、各部の構成は図示の実施形態に限定されるものではなく、本発明の趣旨を逸脱しない範囲で種々変更が可能である。   In addition, the configuration of each unit is not limited to the illustrated embodiment, and various modifications can be made without departing from the spirit of the present invention.

基板移送装置の概略正面図である。It is a schematic front view of a substrate transfer apparatus. 基板移送装置の概略平面図である。It is a schematic plan view of a substrate transfer apparatus. キャリアから半導体基板を取り出した状態を示す平面図である。It is a top view which shows the state which took out the semiconductor substrate from the carrier. (a)は移送ハンド体の拡大平面図、(b)は(a)のIVb−IVb視側断面図である。(A) is an enlarged plan view of a transfer hand body, (b) is IVb-IVb view side sectional drawing of (a). キャリア内に移送ハンド体を挿入した状態を示す平断面図である。It is a plane sectional view showing the state where the transfer hand body is inserted into the carrier. 移送ハンド体での取り出し態様を示す説明図であり、(a)は上段の半導体基板を取り出す場合の図、(b)は中段の半導体基板を取り出す場合の図である。It is explanatory drawing which shows the taking-out aspect in a transfer hand body, (a) is a figure in the case of taking out an upper stage semiconductor substrate, (b) is a figure in the case of taking out a middle stage semiconductor substrate.

符号の説明Explanation of symbols

LF フォーク部の長さ
P 収容ピッチ間隔
SP 挿入スペース
WF 両フォーク部間の間隔
1 キャリア
2 出し入れ口
3 嵌合溝
10 半導体基板
11 基板移送装置
12 機枠
13 アーム体
14 移送ハンド体
16 ヘッド部材
18 第1スイング部材
20 第2スイング部材
22 フォーク部
24 吸引穴
28 付け根部分
LF Length of fork part P Storing pitch interval SP Insertion space WF Distance between both fork parts 1 Carrier 2 Loading / unloading port 3 Fitting groove 10 Semiconductor substrate 11 Substrate transfer device 12 Machine frame 13 Arm body 14 Transfer hand body 16 Head member 18 First swing member 20 Second swing member 22 Fork portion 24 Suction hole 28 Base portion

Claims (3)

キャリア内に多段状に収容された各半導体基板の下方に挿入して、当該半導体基板を前記キャリア内から1枚ずつ取り出すための扁平状の移送ハンド体を備えた基板移送装置であって、
前記移送ハンド体の先端には、前記半導体基板を載せるための一対のフォーク部が、前記キャリア内に挿入したときに両方とも前記半導体基板のうち挿入方向と交差する両外周縁に近い部位に沿って延びるように、相互間の間隔を空けて設けられ、
前記両フォーク部は、前記キャリア内に挿入したときに前記半導体基板の外周縁と前記両フォーク部の付け根部分の内径側との間に隙間が空くような長さに設定されていることを特徴とする基板移送装置。
A substrate transfer apparatus provided with a flat transfer hand body for inserting the semiconductor substrates one by one from the inside of the carrier, inserted below each semiconductor substrate accommodated in a multistage manner in a carrier,
At the front end of the transfer hand body, a pair of fork portions for placing the semiconductor substrate are both along a portion near both outer peripheral edges that intersects the insertion direction of the semiconductor substrate when both are inserted into the carrier. Are provided with a space between each other,
The both fork portions are set to such a length that a gap is formed between the outer peripheral edge of the semiconductor substrate and the inner diameter side of the base portion of the fork portions when inserted into the carrier. A substrate transfer device.
前記両フォーク部の上面には、前記半導体基板を吸着保持するための上向き開口状の吸引穴がそれぞれ形成されていることを特徴とする請求項1に記載した基板移送装置。   2. The substrate transfer apparatus according to claim 1, wherein suction holes each having an upward opening are formed on the upper surfaces of the fork portions to hold the semiconductor substrate by suction. キャリア内に多段状に収容された半導体基板を扁平状の移送ハンド体で1枚ずつ取り出して、次工程の加工ステージに移送する基板移送方法であって、
前記キャリア内における前記半導体基板の下方に、前記移送ハンド体の先端に設けられた一対のフォーク部を、前記半導体基板の外周縁と前記両フォーク部の付け根部分の内径側との間に隙間が空くようにして挿入したのち、前記移送ハンド体を上昇させるか又は前記キャリアを下降させて、前記半導体基板のうち挿入方向と交差する両外周縁に近い部位を前記両フォーク部で支持することを特徴とする基板移送方法。
A substrate transfer method for taking out semiconductor substrates housed in multiple stages in a carrier one by one with a flat transfer hand body and transferring them to a processing stage of the next process,
Below the semiconductor substrate in the carrier, a pair of fork portions provided at the front end of the transfer hand body are provided with a gap between the outer peripheral edge of the semiconductor substrate and the inner diameter side of the base portions of the fork portions. After being inserted so as to be vacant, the transfer hand body is raised or the carrier is lowered, and the fork portions support the portions of the semiconductor substrate close to both outer peripheral edges that intersect the insertion direction. A substrate transfer method.
JP2005001485A 2005-01-06 2005-01-06 Semiconductor substrate transfer apparatus and semiconductor substrate transfer method Expired - Fee Related JP5041504B2 (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010194668A (en) * 2009-02-25 2010-09-09 Kyocera Corp Suction conveying member and substrate conveying device using the same
JP2011211119A (en) * 2010-03-30 2011-10-20 Fuji Electric Co Ltd Wafer carrying device and wafer carrying method
JP2013187493A (en) * 2012-03-09 2013-09-19 Disco Abrasive Syst Ltd Method for carrying out wafer
CN105374721A (en) * 2014-08-14 2016-03-02 株式会社迪思科 Transfer unit
KR101768721B1 (en) * 2010-03-23 2017-08-16 닛토덴코 가부시키가이샤 Workpiece transport method and workpiece transport apparatus

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JPS63293849A (en) * 1987-05-27 1988-11-30 Hitachi Ltd Wafer carrier
JPH0758188A (en) * 1993-08-19 1995-03-03 Hitachi Ltd Wafer processing unit
JPH1154585A (en) * 1997-08-01 1999-02-26 Hitachi Ltd Article identification system
JPH1171025A (en) * 1997-09-01 1999-03-16 Nec Corp Wafer conveying device
JP2002305233A (en) * 2001-04-05 2002-10-18 Olympus Optical Co Ltd Arm for carrying wafer

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JPS63293849A (en) * 1987-05-27 1988-11-30 Hitachi Ltd Wafer carrier
JPH0758188A (en) * 1993-08-19 1995-03-03 Hitachi Ltd Wafer processing unit
JPH1154585A (en) * 1997-08-01 1999-02-26 Hitachi Ltd Article identification system
JPH1171025A (en) * 1997-09-01 1999-03-16 Nec Corp Wafer conveying device
JP2002305233A (en) * 2001-04-05 2002-10-18 Olympus Optical Co Ltd Arm for carrying wafer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010194668A (en) * 2009-02-25 2010-09-09 Kyocera Corp Suction conveying member and substrate conveying device using the same
KR101768721B1 (en) * 2010-03-23 2017-08-16 닛토덴코 가부시키가이샤 Workpiece transport method and workpiece transport apparatus
JP2011211119A (en) * 2010-03-30 2011-10-20 Fuji Electric Co Ltd Wafer carrying device and wafer carrying method
JP2013187493A (en) * 2012-03-09 2013-09-19 Disco Abrasive Syst Ltd Method for carrying out wafer
CN105374721A (en) * 2014-08-14 2016-03-02 株式会社迪思科 Transfer unit

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