JP2006190016A - クラスタリング方法 - Google Patents

クラスタリング方法 Download PDF

Info

Publication number
JP2006190016A
JP2006190016A JP2005000410A JP2005000410A JP2006190016A JP 2006190016 A JP2006190016 A JP 2006190016A JP 2005000410 A JP2005000410 A JP 2005000410A JP 2005000410 A JP2005000410 A JP 2005000410A JP 2006190016 A JP2006190016 A JP 2006190016A
Authority
JP
Japan
Prior art keywords
data
clusters
image
wafer
round
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005000410A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006190016A5 (enExample
Inventor
Hiroyuki Abe
啓之 阿部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2005000410A priority Critical patent/JP2006190016A/ja
Publication of JP2006190016A publication Critical patent/JP2006190016A/ja
Publication of JP2006190016A5 publication Critical patent/JP2006190016A5/ja
Pending legal-status Critical Current

Links

Images

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Information Retrieval, Db Structures And Fs Structures Therefor (AREA)
JP2005000410A 2005-01-05 2005-01-05 クラスタリング方法 Pending JP2006190016A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005000410A JP2006190016A (ja) 2005-01-05 2005-01-05 クラスタリング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005000410A JP2006190016A (ja) 2005-01-05 2005-01-05 クラスタリング方法

Publications (2)

Publication Number Publication Date
JP2006190016A true JP2006190016A (ja) 2006-07-20
JP2006190016A5 JP2006190016A5 (enExample) 2007-12-27

Family

ID=36797166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005000410A Pending JP2006190016A (ja) 2005-01-05 2005-01-05 クラスタリング方法

Country Status (1)

Country Link
JP (1) JP2006190016A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018020681A1 (ja) * 2016-07-29 2019-05-16 株式会社ニコン 設定方法、検査方法、欠陥評価装置および構造物の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09265529A (ja) * 1996-03-28 1997-10-07 Nippon Telegr & Teleph Corp <Ntt> クラスタ分類方法及びクラスタ分類装置
JP2001338264A (ja) * 2000-05-25 2001-12-07 Ricoh Co Ltd 文字認識パターン辞書作成装置、文字認識パターン辞書作成方法および記録媒体
JP2003207565A (ja) * 2002-01-10 2003-07-25 Mitsubishi Electric Corp 類識別装置及び類識別方法
JP2004054847A (ja) * 2002-07-24 2004-02-19 Ricoh Co Ltd テキストデータ群生成装置、テキストデータ群生成方法、プログラムおよび記録媒体

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09265529A (ja) * 1996-03-28 1997-10-07 Nippon Telegr & Teleph Corp <Ntt> クラスタ分類方法及びクラスタ分類装置
JP2001338264A (ja) * 2000-05-25 2001-12-07 Ricoh Co Ltd 文字認識パターン辞書作成装置、文字認識パターン辞書作成方法および記録媒体
JP2003207565A (ja) * 2002-01-10 2003-07-25 Mitsubishi Electric Corp 類識別装置及び類識別方法
JP2004054847A (ja) * 2002-07-24 2004-02-19 Ricoh Co Ltd テキストデータ群生成装置、テキストデータ群生成方法、プログラムおよび記録媒体

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018020681A1 (ja) * 2016-07-29 2019-05-16 株式会社ニコン 設定方法、検査方法、欠陥評価装置および構造物の製造方法

Similar Documents

Publication Publication Date Title
US9778206B2 (en) Defect inspection device and defect inspection method
US6879392B2 (en) Method and apparatus for inspecting defects
US9805462B2 (en) Machine learning method and apparatus for inspecting reticles
TWI575625B (zh) 檢測晶圓之系統及方法
TWI679710B (zh) 用於判定樣品上缺陷之系統、非暫時性電腦可讀媒體及方法
JP4009409B2 (ja) パターン欠陥検査方法及びその装置
TWI551855B (zh) 檢測晶圓之系統與方法以及由該系統讀取的程式儲存裝置
JP4357355B2 (ja) パターン検査方法及びその装置
KR20210107149A (ko) 자동으로 생성된 결함 피처를 가진 반도체 구조의 검사를 위한 방법 및 시스템
US20190244336A1 (en) Defect inspection apparatus and defect inspection method
US20130202188A1 (en) Defect inspection method, defect inspection apparatus, program product and output unit
TWI778258B (zh) 缺陷偵測之方法、系統及非暫時性電腦可讀媒體
KR20130109162A (ko) 결함 검사 방법 및 결함 검사 장치
KR102685758B1 (ko) 딥 러닝을 사용한 3d 구조물 검사 또는 계측
JP5450161B2 (ja) 欠陥検査装置および欠陥検査方法
CN114998333B (zh) 一种光源特性的计算机视觉检测方法及系统
CN111819596A (zh) 组合模拟及光学显微术以确定检验模式
CN109752390A (zh) 用于检测光掩模和裸片中的缺陷的检查设备及检查方法
JP2012083351A (ja) 欠陥検査装置およびその方法
TW202206805A (zh) 用於光學目標檢索之光學影像對比度量
KR20220104776A (ko) 노이즈 특성에 기초한 서브케어 영역의 클러스터링
JP2006190016A (ja) クラスタリング方法
JP2000097869A (ja) パターンの欠陥検査方法およびその装置
CN117581093B (zh) 激光退火图案抑制
JP2006294684A (ja) 表面検査装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071106

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20071114

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100608

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100611

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20101015