JP2006175569A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2006175569A5 JP2006175569A5 JP2004372737A JP2004372737A JP2006175569A5 JP 2006175569 A5 JP2006175569 A5 JP 2006175569A5 JP 2004372737 A JP2004372737 A JP 2004372737A JP 2004372737 A JP2004372737 A JP 2004372737A JP 2006175569 A5 JP2006175569 A5 JP 2006175569A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- hard
- hard film
- coated
- atomic ratio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 210000002381 Plasma Anatomy 0.000 claims description 37
- 238000005520 cutting process Methods 0.000 claims description 31
- 238000001704 evaporation Methods 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 24
- 238000000576 coating method Methods 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 21
- 239000011248 coating agent Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 14
- 239000002994 raw material Substances 0.000 claims description 13
- 229910001315 Tool steel Inorganic materials 0.000 claims description 9
- 239000011195 cermet Substances 0.000 claims description 9
- 150000002739 metals Chemical class 0.000 claims description 8
- 238000007733 ion plating Methods 0.000 claims description 7
- 239000000155 melt Substances 0.000 claims description 7
- 229910052752 metalloid Inorganic materials 0.000 claims description 6
- 238000005868 electrolysis reaction Methods 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims description 4
- 239000007888 film coating Substances 0.000 claims description 3
- 238000009501 film coating Methods 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910010037 TiAlN Inorganic materials 0.000 description 8
- 238000002844 melting Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- NRTOMJZYCJJWKI-UHFFFAOYSA-N titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005755 formation reaction Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical class [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 2
- -1 argon-nitrogen Chemical compound 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 230000001050 lubricating Effects 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N tin hydride Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- 101710040910 CRAT Proteins 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910015800 MoS Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N Molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910003301 NiO Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atoms Chemical class [H]* 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- TXKRDMUDKYVBLB-UHFFFAOYSA-N methane;titanium Chemical compound C.[Ti] TXKRDMUDKYVBLB-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N nickel(II) oxide Inorganic materials [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- TWXTWZIUMCFMSG-UHFFFAOYSA-N nitride(3-) Chemical compound [N-3] TWXTWZIUMCFMSG-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M sodium chloride Chemical group [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 229910052950 sphalerite Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
Description
本発明は、本発明は、超硬合金、サーメットまたは高速度工具鋼を基材とするチップ、ドリル、タップ、エンドミル、ホブ、ブローチ等の切削工具の耐摩耗性を向上させた硬質皮膜被覆工具に関する。 The present invention is a hard coating coated tool with improved wear resistance of cutting tools such as chips, drills, taps, end mills, hobbs, broaches and the like based on cemented carbide, cermet or high speed tool steel. About.
従来、超硬合金、サーメットまたは高速度工具鋼を基材とする切削工具の耐摩耗性を向上させることを目的に、TiN やTiCN、TiAlN 等の硬質皮膜をコーティングすることが行われている。特に、TiとAlの複合窒化皮膜（以下、TiAlN と記す）が、優れた耐摩耗性を示すことから、前記チタンの窒化物や炭化物、炭窒化物等からなる皮膜に代わって高速切削や焼き入れ鋼等の高硬度材切削用の切削工具に適用されてきた。前記TiAlN 皮膜は、Alを添加することによって膜の硬度が上昇し、耐摩耗性が向上することが知られている。
特許文献２には、CrAlN 皮膜にSiを添加することにより、室温硬度が上昇し、高硬度材の乾式高速切削の寿命が向上することが開示されている。
特許文献３には二硫化モリブデンなどの固体潤滑材を硬質皮膜の表面に被覆し、硬質皮膜に潤滑膜を形成する方法が開示されている。
Patent Document 2 discloses that the addition of Si to the CrAlN coating increases the room temperature hardness and improves the dry high-speed cutting life of a high-hardness material.
Patent Document 3 discloses a method in which a solid lubricant such as molybdenum disulfide is coated on the surface of a hard film, and a lubricating film is formed on the hard film.
さらに、出願人が出願中で未公開の特願2003−325406号には、少なくとも２種類以上の金属もしくは金属間化合物を含む合金を蒸発原料とし、電解又は磁界により収束されたプラズマを用いて原料を単一のルツボ又はハースから溶解・蒸発させる多元系皮膜の製造方法において、前記蒸発原料を蒸発させる際に原料を溶解するために用いる電力供給を、前記蒸発原料を蒸発させるに必要な最初の電力と、所定時間を置いて前記最初の電力より順次増大した電力を加えた電力の供給を、必要な最大の電力供給にいたるまで繰り返して増大させて供給して、未溶融部位を順次溶融させる、又は、代わりに、前記蒸発原料を蒸発させる際に、プラズマを収束させるために用いる電解又は磁界を制御するプラズマ制御を、前記蒸発原料を蒸発させるに必要な最初のプラズマ領域にプラズマを収束させるために用いるプラズマ制御と、前記最初のプラズマ領域よりプラズマを順次移動又は拡大せしめて最大のプラズマ領域にいたるまで連続的に順次移動又は拡大させるプラズマ制御を行い、未溶融部位を順次溶解させて多元系皮膜を製造する方法が開示されている。 Further, in Japanese Patent Application No. 2003-325406, which has been filed by the applicant, an alloy containing at least two kinds of metals or an intermetallic compound is used as an evaporation material, and a material using plasma converged by electrolysis or a magnetic field is used. In a method for producing a multi-component film in which a raw material is dissolved and evaporated from a single crucible or hearth, the power supply used for dissolving the raw material when evaporating the evaporating raw material is the first necessary for evaporating the evaporating raw material. The supply of electric power and electric power that is sequentially increased from the initial electric power after a predetermined time is repeatedly increased until the required maximum electric power supply is supplied, and the unmelted portion is sequentially melted. Alternatively, when evaporating the evaporation material, it is necessary to use electrolysis or plasma control for controlling the magnetic field to converge the plasma to evaporate the evaporation material. Plasma control used to focus the plasma in the first plasma region and plasma control in which the plasma is moved or expanded sequentially from the first plasma region to continuously move or expand to the maximum plasma region. A method of manufacturing a multi-component film by sequentially dissolving unmelted portions is disclosed.
特許文献１には、TiAlN を（Al x, Ti1-x ）N と表現した場合のAlの組成比ｘが大きいほど耐酸化性は向上するが、ｘが 0.7を超えるとZnS 型の軟質AlN が析出して皮膜硬度が低下することが示されている。
また、特許文献２には、CrAlN 皮膜にSiを添加することにより、室温硬度が上昇し、高硬度材の乾式高速切削の寿命が向上することが開示されているが、これらの皮膜はもっぱらアーク放電方式イオンプレーティング物理蒸着法（以下アーク法という）によって作製されており、アーク法では不可避な未反応金属ドロップレットにより表面平滑度が低下することが一般に知られている。さらに、ドロップレットから酸化が促進するため耐酸化性も不十分であると考えられる。また、特許文献２ではAl組成比は0.65にとどまっている。しかしながら、近年では、切削工具の使用条件としてより高速化・高能率化が要求されており、この様な切削工具を実現するため、更に優れた耐熱性と耐摩耗性を発揮する切削工具用硬質皮膜が求められている。
In Patent Document 1, the oxidation resistance improves as the Al composition ratio x increases when TiAlN is expressed as (Al x, Ti 1-x ) N, but when x exceeds 0.7, ZnS type soft AlN It is shown that the film hardness is lowered by precipitation.
Patent Document 2 discloses that the addition of Si to the CrAlN coating increases the room temperature hardness and improves the life of dry high-speed cutting of high-hardness materials. It is produced by a discharge ion plating physical vapor deposition method (hereinafter referred to as an arc method), and it is generally known that the surface smoothness decreases due to unreacted metal droplets that are unavoidable in the arc method. Furthermore, since oxidation is promoted from the droplets, the oxidation resistance is considered to be insufficient. Further, in Patent Document 2, the Al composition ratio remains at 0.65. However, in recent years, there has been a demand for higher speed and higher efficiency as the usage conditions of cutting tools, and in order to realize such cutting tools, the cutting tool hard that exhibits further excellent heat resistance and wear resistance. There is a need for a film.
本発明の課題は、従来のTiAlN よりも高速・高能率切削が可能な、耐熱性および耐摩耗性に優れた切削工具用硬質皮膜を被覆した硬質皮膜被覆工具を提供することにある。 An object of the present invention is to provide a hard film-coated tool that is coated with a hard film for a cutting tool that is capable of cutting at higher speed and higher efficiency than conventional TiAlN and has excellent heat resistance and wear resistance.
このため本発明の第１発明は、超硬合金、サーメットまたは高速度工具鋼を基材とする切削工具の基材上に、
(Al a ,Cr b ,Mc )(C 1-d N d ) からなる硬質皮膜であって、
0.75≦a ≦0.95、0.05≦b ≦0.25、a+b+c=1 、0.5 ≦d ≦1(M は1 種または2 種以上の金属および半金属元素であり、a 、b 、c はそれぞれAl、Cr、M の原子比を示し、d はN の原子比を示す。以下同じ) の組成の硬質皮膜を、少なくとも１層以上被覆したことを特徴とする硬質皮膜被覆工具を提供することにより上記課題を解決した。
Therefore, the first invention of the present invention, on the base material of the cutting tool based on cemented carbide, cermet or high-speed tool steel,
A hard coating made of (Al a , Cr b , M c ) (C 1-d N d ),
0.75 ≤ a ≤ 0.95, 0.05 ≤ b ≤ 0.25, a + b + c = 1, 0.5 ≤ d ≤ 1 (M is one or more metals and metalloid elements, and a, b, c are respectively By providing a hard film-coated tool characterized by at least one hard film having a composition of Al, Cr, M and d, which represents the atomic ratio of N. The same applies hereinafter) Solved the above problem.
本発明の第１発明では、Alの組成比を0.75≦a ≦0.95まで高め、従来のTiAlN よりも高速・高能率切削が可能な、耐熱性および耐摩耗性に優れた切削工具用硬質皮膜を被覆した硬質皮膜被覆工具を提供するものとなった。 In the first invention of the present invention, a hard coating for a cutting tool, which has an Al composition ratio increased to 0.75 ≦ a ≦ 0.95 and is capable of cutting at a higher speed and higher efficiency than conventional TiAlN and has excellent heat resistance and wear resistance. A coated hard-coated tool was provided.
好ましくは、上記 dの値が１の場合を好ましい形態とする。
さらに好ましくは、前記元素M が Si 、Ti、Niであることが望ましい。
また、好ましくは、前記AlCrMN皮膜の膜厚が 0.5μｍ以上 5.0μｍ以下であることが望ましい。
さらに好ましくは、前記硬質皮膜の基材と逆側に、金属元素としてAlを80％ 以上含む耐熱皮膜を形成することにより、より工具寿命を高めることが可能となった。
Preferably, the case where the value of d is 1 is a preferable mode.
More preferably, the element M is Si, Ti, or Ni.
Also, preferably, arbitrariness is desirable thickness of the AlCrMN film is 0.5μm or more 5.0μm or less.
Preferably the further, the substrate and the opposite side of the hard substance coating, by forming a heat-resistant film containing an Al 80% or more as the metal element was Tsu Do can be enhanced more tool life.
本発明の第２発明は、超硬合金、サーメットまたは高速度工具鋼を基材とする切削工具の基材上に、According to a second aspect of the present invention, on the base material of the cutting tool based on cemented carbide, cermet or high speed tool steel,
(Al (Al
a a
,Cr , Cr
b b
,M, M
c c
)(C ) (C
1-d 1-d
N N
d d
) からなる硬質皮膜であって、)
基材側の成分比が0.75≦a ≦0.95、0.05≦b ≦0.25、a+b+c=1 、0.5 ≦d ≦1(M は１種または２種以上の金属および半金属元素であり、a 、b 、c はそれぞれAl、Cr、M の原子比を示し、d はN の原子比を示す。以下同じ) を満たし、かつ、基材側から表面側にかけて組成比a/b が連続的に減少する硬質皮膜を少なくとも１層以上被覆したことを特徴とする硬質皮膜被覆工具を提供することにより、即ち溶融蒸発型イオンプレーティング装置による硬質皮膜製造方法によりAlCrM(CN) 皮膜を形成する際、蒸発初期にはAl、蒸発後期にはCr蒸発量が比較的多くなるため、蒸発時間が長い場合は基材側から表面側にかけてAl/Cr 組成比が減少する組成傾斜膜となるが、この場合でも上記課題を解決した。The component ratio on the substrate side is 0.75 ≦ a ≦ 0.95, 0.05 ≦ b ≦ 0.25, a + b + c = 1, 0.5 ≦ d ≦ 1 (M is one or more metals and metalloid elements, a, b, and c represent the atomic ratio of Al, Cr, and M, respectively, d represents the atomic ratio of N. The same applies hereinafter), and the composition ratio a / b is continuous from the substrate side to the surface side. When providing an AlCrM (CN) film by a method for producing a hard film using a melt evaporation type ion plating apparatus, by providing a hard film coating tool characterized by coating at least one layer of a hard film that decreases to a minimum Since the amount of evaporated Cr is relatively large in the early stage of evaporation and in the late stage of evaporation, when the evaporation time is long, a composition gradient film in which the Al / Cr composition ratio decreases from the base material side to the surface side is obtained. Even in the case, the above problem was solved.
本発明の第１発明を実施するための最良の形態は、超硬合金、サーメットまたは高速度工具鋼を基材とする切削工具の基材上に、
(Al a ,Cr b ,Mc )(C 1-d N d ) からなる硬質皮膜であって、
0.75≦a ≦0.95、0.05≦b ≦0.25、a+b+c=1 、0.5 ≦d ≦1(M は1 種または2 種以上の金属および半金属元素であり、a 、b 、c はそれぞれAl、Cr、M の原子比を示し、d はN の原子比を示す。以下同じ) の組成の硬質皮膜を、少なくとも１層以上被覆したことを特徴とする硬質皮膜被覆工具である。
The best mode for carrying out the first invention of the present invention is on a base material of a cutting tool based on cemented carbide, cermet or high-speed tool steel.
A hard coating made of (Al a , Cr b , M c ) (C 1-d N d ),
0.75 ≤ a ≤ 0.95, 0.05 ≤ b ≤ 0.25, a + b + c = 1, 0.5 ≤ d ≤ 1 (M is one or more metals and metalloid elements, and a, b, c are respectively This is a hard coating tool characterized in that it represents the atomic ratio of Al, Cr, M, and d represents the atomic ratio of N. The same applies hereinafter, and at least one hard coating is coated.
本発明の第２発明を実施するための最良の形態は、超硬合金、サーメットまたは高速度工具鋼を基材とする切削工具の基材上に、
(Al a ,Cr b ,Mc )(C 1-d N d ) からなる硬質皮膜であって、
基材側の成分比が0.75≦a ≦0.95、0.05≦b ≦0.25、a+b+c=1 、0.5 ≦d ≦1(M は１種または２種以上の金属および半金属元素であり、a 、b 、c はそれぞれAl、Cr、M の原子比を示し、d はN の原子比を示す。以下同じ) を満たし、かつ、基材側から表面側にかけて組成比a/b が連続的に減少する硬質皮膜を少なくとも１層以上被覆したことを特徴とする硬質皮膜被覆工具を提供することにより、即ち溶融蒸発型イオンプレーティング装置による硬質皮膜製造方法によりAlCrM(CN) 皮膜を形成する際、蒸発初期にはAl、蒸発後期にはCr蒸発量が比較的多くなるため、蒸発時間が長い場合は基材側から表面側にかけてAl/Cr 組成比が減少する組成傾斜膜となるが、この場合でも上記課題を解決した。
The best mode for carrying out the second invention of the present invention is on a base material of a cutting tool based on cemented carbide, cermet or high speed tool steel.
A hard coating made of (Al a , Cr b , M c ) (C 1-d N d ),
The component ratio on the substrate side is 0.75 ≦ a ≦ 0.95, 0.05 ≦ b ≦ 0.25, a + b + c = 1, 0.5 ≦ d ≦ 1 (M is one or more metals and metalloid elements, a, b, and c represent the atomic ratio of Al, Cr, and M, respectively, d represents the atomic ratio of N. The same applies hereinafter), and the composition ratio a / b is continuous from the substrate side to the surface side. When providing an AlCrM (CN) film by a method for producing a hard film using a melt evaporation type ion plating apparatus, by providing a hard film coating tool characterized by coating at least one layer of a hard film that decreases to a minimum Since the amount of evaporated Cr is relatively large in the early stage of evaporation and in the late stage of evaporation, when the evaporation time is long, a composition gradient film in which the Al / Cr composition ratio decreases from the base material side to the surface side is obtained. Even in the case, the above problem was solved.
本発明の硬質皮膜被覆工具は、ホローカソード放電による電子ビームを用いてターゲットを構成する金属を蒸発およびイオン化して被処理体上に本発明で規定する皮膜を形成する溶融蒸発型イオンプレーティング法（以下溶解法と略記する）において未溶融部位を順次溶解させるようにし、成膜することを好ましい形態とする。尚、この場合に前記被処理体に印加するバイアス電位は、アース電位に対して-50V〜-300V とすることが好ましい。また、成膜時の被処理体温度（以下、基板温度ということがある）は 300℃以上で 800℃以下の範囲内とすることが望ましく、成膜時の反応ガスの分圧または全圧を 0.1Pa以上 2Pa以下とすることが望ましい。尚、本発明における上記反応ガスとは、窒素ガス、メタンガス、エチレン、アセチレン、アンモニア、水素、またはこれら２種以上を混合させた皮膜の成分組成に必要な元素を含むガスをいい、これら以外に用いられるＡｒなどの様な希ガス等をアシストガスといい、これらをあわせて成膜ガスということとする。
本発明者らは、より優れた耐熱性を発揮する切削工具用硬質皮膜の実現を目指して鋭意研究を進めた。そして、その手段として溶解法に着目して研究を進めた結果、電解または磁界により収束されたプラズマを用いて原料を単一の坩堝またはハースから溶融・蒸発させる溶融蒸発型イオンプレーティング装置に使用される蒸発原料としてのターゲットであって、(Al x 、Cry 、M Z ) からなり
0.4 ≦x ≦0.8 、0.2 ≦y ≦0.6 、z ≦0.1 、x+y+z=1
（ x、y 、z はそれぞれAl、Cr、M の原子比を示す。以下同じ）の組成であり、且つ相対密度即ち製品完全固体に対する原料体積比が50％以上70％以下であることを特徴とする硬質皮膜形成用ターゲットを用い、超硬合金、サーメットまたは高速度工具鋼を基材とする切削工具の基材上に、前記硬質皮膜形成用ターゲットを蒸発原料とし、硬質皮膜形成用ターゲットを蒸発させる際に原料を溶解するために用いる電力供給を、前記硬質皮膜形成用ターゲットを蒸発させるに必要な最初の電力供給を行い、その後で所定時間を置いて前記最初の電力より順次増大した電力を加えた電力の供給を、必要な最大の電力供給にいたるまで繰り返して増大させて供給し、未溶融部位を順次溶融させるようにし、及び／又は、前記硬質皮膜形成用ターゲットを蒸発させる際に、プラズマを収束させるために用いる電解又は磁界を制御するプラズマ制御を、前記硬質皮膜形成用ターゲットを蒸発させるに必要な最初のプラズマ領域にプラズマを収束させるようにプラズマ制御を行い、その後で前記最初のプラズマ領域よりプラズマを順次移動又は拡大せしめて最大のプラズマ領域にいたるまで連続的に順次移動・拡大させるプラズマ制御を行うようにし、未溶融部位を順次溶解させることを特徴とするAlCrM(CN) 硬質皮膜の製造方法によって得たAl比率0.75〜0.95の皮膜は硬度および耐酸化性が向上し、結果として耐摩耗性が飛躍的に向上することを突き止めた。
The hard film coated tool of the present invention is a melt evaporation type ion plating method in which a metal constituting a target is evaporated and ionized by using an electron beam by hollow cathode discharge to form a film defined by the present invention on a workpiece. In the following (hereinafter abbreviated as a melting method), it is preferable to sequentially form unmelted portions and form a film. In this case, the bias potential applied to the object to be processed is preferably -50V to -300V with respect to the ground potential. In addition, the temperature of the object to be processed during film formation (hereinafter sometimes referred to as substrate temperature) is preferably within the range of 300 ° C to 800 ° C, and the partial pressure or total pressure of the reaction gas during film formation is It is desirable that the pressure be 0.1 Pa or more and 2 Pa or less. In addition, the said reaction gas in this invention means nitrogen gas, methane gas, ethylene, acetylene, ammonia, hydrogen, or the gas containing the element required for the component composition of the film | membrane which mixed these 2 or more types other than these. A rare gas such as Ar used is called an assist gas, and these are collectively referred to as a film forming gas.
The inventors of the present invention have made extensive studies with the aim of realizing a hard film for a cutting tool that exhibits better heat resistance. As a result of this research, we focused on the melting method, and as a result, it was used in a melt evaporation type ion plating apparatus that melts and evaporates the raw material from a single crucible or hearth using plasma focused by electrolysis or a magnetic field. The target as evaporation raw material, which consists of (Al x , Cr y , M Z )
0.4 ≤ x ≤ 0.8, 0.2 ≤ y ≤ 0.6, z ≤ 0.1, x + y + z = 1
(X, y, and z represent the atomic ratios of Al, Cr, and M, respectively, and the same applies hereinafter), and the relative density, that is, the volume ratio of the raw material to the complete solid of the product is 50% or more and 70% or less. The target for forming a hard film is used as a material for evaporating the target for forming a hard film on a base material of a cutting tool made of cemented carbide, cermet or high-speed tool steel. The power supply used for dissolving the raw material when evaporating is the first power supply necessary for evaporating the hard film forming target, and then the power gradually increased from the first power after a predetermined time. Is added repeatedly until the required maximum power supply is reached, so that unmelted portions are sequentially melted, and / or the hard film forming target is steamed. When generating the plasma control to control the electrolysis or magnetic field used to converge the plasma, the plasma control is performed so as to converge the plasma in the first plasma region necessary to evaporate the hard film forming target, Thereafter, plasma control is performed such that the plasma is sequentially moved or expanded from the first plasma region to continuously move and expand until reaching the maximum plasma region, and unmelted portions are sequentially dissolved. It was found that the Al ratio 0.75 to 0.95 film obtained by the AlCrM (CN) hard film manufacturing method improved in hardness and oxidation resistance, and as a result, improved in wear resistance.
かかる構成により、溶融原料を溶解するために使用する電力を所定時間を置いてステップさせて溶解中に増大させることで未溶融部位が新たに溶融しはじめ、未溶融部位に含まれる低融点金属を補充することができ、及び／又は、プラズマを収束させている電界または磁界を制御して未溶融部位を溶解するために使用するプラズマ領域を最初のプラズマ領域よりプラズマを順次移動・拡大せしめて最大のプラズマ領域に至るまで連続的に順次移動・拡大させるプラズマ制御を行い、同様の効果を得ることができた。上記した構成により、被覆処理中に未溶融部位を拡大させることにより、融点の低い金属を補充することが可能となり、出発原料の組成と未溶融部位の溶解速度を制御することで所望の膜組成分布を持った皮膜を得ることが可能となった。これにより、AlCrM(CN) の融点の大きく異なる金属成分を持つ多元系皮膜を、目的の膜組成に厳密に一致させる必要はなく目的の膜組成にほぼ近い、金属成分を持つ原材料合金を使用して、ほぼその全体を有効に使用できるので原料利用効率が高く、異なる金属の各成分が全膜厚にわたり所望の皮膜分布が得られるなど膜質の良い硬質皮膜被覆工具とすることができる。 With this configuration, the electric power used to melt the molten raw material is stepped over a predetermined time and increased during melting, so that the unmelted portion begins to melt newly, and the low melting point metal contained in the unmelted portion is removed. The plasma region that can be replenished and / or used to dissolve the unmelted part by controlling the electric or magnetic field that is converging the plasma, and the plasma is moved and expanded sequentially from the first plasma region to maximize The same effect can be obtained by performing plasma control that moves and expands sequentially up to the plasma region. With the above-described configuration, it is possible to replenish a metal having a low melting point by expanding the unmelted portion during the coating process, and a desired film composition by controlling the composition of the starting material and the dissolution rate of the unmelted portion. It became possible to obtain a film with a distribution. As a result, it is not necessary to match the multi-component film having a metal component with a significantly different melting point of AlCrM (CN) to the target film composition, and a raw material alloy having a metal component that is almost the same as the target film composition is used. Thus, almost all of them can be used effectively, so that the raw material utilization efficiency is high, and a hard film-coated tool with good film quality can be obtained, for example, each component of different metals can obtain a desired film distribution over the entire film thickness.
硬質皮膜の基材と逆側に、NiO 、DLC 、MoS 2 又はBNの潤滑機能皮膜を形成することにより、切削時の摩擦を減少させ、好ましい切削性能を得ることができる。 By forming a lubricating functional film of NiO, DLC, MoS 2 or BN on the opposite side of the base of the hard film, it is possible to reduce friction during cutting and to obtain preferable cutting performance.
本発明品１：Al60Cr40at％の混合粉末40g をφ40の円筒形金型を用いて2GPaにて成型し、相対密度即ち製品完全固体に対する原料体積比を70％とした。この圧粉成型体をるつぼに入れ、加熱およびクリーニングを行った後に約1Pa のアルゴン窒素混合雰囲気中で、硬質皮膜形成用ターゲットを蒸発させるに必要な最初のプラズマ領域である圧粉成型体上面のプラズマビーム径が10mm程度となるよう収束させたHCD ガンを用いてプラズマ制御を行い、その後で最初のプラズマ領域よりプラズマビーム径を、ほぼ直径40mmのAlCr圧粉成型体を全部を覆うまでに至るように、20分にわたり連続的に順次移動・拡大させるプラズマ制御を行い、未溶融部位を順次溶解させて溶融蒸発させ、予め下地としてTiCNコーティングを施してある超硬エンドミルにAl80Cr19C1N at％皮膜を成膜した(TiCN+AlCrN)。この時同時にプラズマ出力は 3000Wから 8000Wまで毎分500Wずつ上昇させた。TiCNコーティングは岩塩構造型を主体とする結晶構造を有し、且つAl80Cr19C1N at％皮膜とは異なる成分組成の皮膜である。
本発明品２：同じくAl60Cr40at％の相対密度を60％とした圧粉成型体を用いてAl80Cr20at％膜を超硬エンドミル基材上に成膜し、さらにTi65Al35at％の混合粉末 30gを直径40mmの円筒形金型を用いて2GPaにて成型し、この圧粉成型体をるつぼに入れ、加熱およびクリーニングを行った後に約1Pa のアルゴン窒素混合雰囲気中で、圧粉成形体上面のプラズマビーム直径が10mm程度となるよう収束させたHCD ガンを用いて溶融蒸発させ、Ti15Al85at％皮膜を成膜した。この時のプラズマ出力は 3000Wから 8000Wまで毎分500Wずつ上昇させ、未溶融部位を順次溶解させTi15Al85at％の膜を成膜した。
Invention product 1: 40 g of Al60Cr40at% mixed powder was molded at 2 GPa using a φ40 cylindrical mold, and the relative density, that is, the volume ratio of raw material to the complete solid of the product was set to 70%. After this compacted body is put in a crucible, heated and cleaned, in the argon-nitrogen mixed atmosphere of about 1 Pa, the upper surface of the compacted body, which is the first plasma region necessary for evaporating the hard film forming target, is used. Plasma control is performed using an HCD gun converged so that the plasma beam diameter is about 10 mm, and then the plasma beam diameter is covered from the first plasma region until it covers the entire AlCr compact with a diameter of 40 mm. In this way, plasma control is performed to continuously move and expand continuously over 20 minutes, and the unmelted parts are sequentially melted and evaporated to form an Al80Cr19C1N at% film on a carbide end mill that has been previously coated with TiCN. Filmed (TiCN + AlCrN). At the same time, the plasma power was increased from 3000W to 8000W by 500W per minute. The TiCN coating has a crystal structure mainly composed of a rock salt structure type, and is a coating having a composition different from that of the Al80Cr19C1N at% coating.
Invention product 2: An Al80Cr20at% film is formed on a cemented carbide end mill substrate using a compacted compact in which the relative density of Al60Cr40at% is 60%, and 30g of Ti65Al35at% mixed powder is a cylinder with a diameter of 40mm. Molded at 2 GPa using a mold, put this compacted body in a crucible, and after heating and cleaning, the plasma beam diameter on the top surface of the compacted compact is 10 mm in an argon-nitrogen mixed atmosphere of about 1 Pa. A Ti15Al85at% coating was formed by melting and evaporating using an HCD gun converged to a degree. At this time, the plasma power was increased from 3000 W to 8000 W by 500 W per minute, and the unmelted portion was sequentially dissolved to form a Ti15Al85 at% film.
本発明品３：同じくAl60Cr40at％の相対密度を60％とした圧粉成型体を用いて超硬エンドミル基材上に成膜し、その上に同様にAl50Cr50at％の相対密度を60％とした圧粉成型体を用いてAl50Cr50at％の膜を成膜した。このときのそれぞれのプラズマ出力は3000W から8000W まで毎分500Wずつ上昇させた後、8000W で30分間成膜を継続した。その結果、基材側から表面側にかけて AL/Crat％組成比が減少する ALCrNの組成傾斜膜となった。
本発明品４：同様な方法により、Al43Cr40Si7 at％の圧粉成型体を用いて、超硬エンドミル基材上に AlCrSiNの組成傾斜膜を成膜した。
Invention product 3: A film formed on a cemented carbide end mill base material using a compacted body in which the relative density of Al60Cr40at% is 60%, and the pressure of Al50Cr50at% is set to 60%. A film of Al50Cr50at% was formed using the powder molding. At this time, the plasma power was increased from 3000 W to 8000 W by 500 W per minute, and then the film formation was continued at 8000 W for 30 minutes. As a result, the composition gradient film of ALCrN in which the AL / Crat% composition ratio decreases from the substrate side to the surface side was obtained.
Invention product 4: An AlCrSiN composition gradient film was formed on a cemented carbide end mill substrate using a compacted Al43Cr40Si7 at% compact by the same method.
本発明品５：同じくAl50Cr40Ti10at％の圧粉成型体を用いて、超硬エンドミル基材上に AlCrTiNの組成傾斜膜を成膜した。
本発明品６：同様な方法により、Al55Cr40Ni5at ％の圧粉成型体を用いて、超硬エンドミル基材上に AlCrNiNの組成傾斜膜を成膜した。
本発明品７：同様な方法により、Al60Cr40at％の圧粉成型体を用いて、超硬エンドミル基材上にAlCrCNの組成傾斜膜を成膜した。反応ガスとして窒素とアセチレンの混合ガスを使用した。
比較例：アーク放電方式イオンプレーティング物理蒸着法（アーク法）により、超硬エンドミル基材上に TiN＋TiAlN の膜を成膜した。
得られたエンドミルよる切削試験結果を表１に示す。
超硬エンドミルは切削長50m 時での逃げ面摩耗幅を測定した。切削諸元を次に示す。
超硬エンドミルではアーク法により成膜した比較例ＴｉＡｌＮ膜と比較して同等以上の耐摩耗性を示した。
( 超硬エンドミル切削条件)
工具：φ10超硬2 枚刃スクェアエンドミル
切削方法：側面切削ダウンカット
被削材：SKD61(硬さ53HRC)
切り込み：軸方向10mm、径方向0.2mm
切削速度：300m/min、送り：0.07mm/ 刃
切削長：50m 、潤滑剤：無し（エアーブロー）
Invention product 6: By the same method, an AlCrNiN composition gradient film was formed on a carbide end mill base material using an Al55Cr40Ni5at% compact.
Invention product 7: By the same method, an AlCrCN composition gradient film was formed on a cemented carbide end mill substrate using a compacted body of Al60Cr40at%. A mixed gas of nitrogen and acetylene was used as a reaction gas.
Comparative example: A TiN + TiAlN film was formed on a carbide end mill base material by an arc discharge type ion plating physical vapor deposition method (arc method).
Table 1 shows the results of the cutting test using the obtained end mill.
The carbide end mill measured the flank wear width when the cutting length was 50m. The cutting specifications are shown below.
The carbide end mill showed the same or higher wear resistance than the comparative example TiAlN film formed by the arc method.
(Carbide end mill cutting conditions)
Tool: φ10 Carbide 2 Flute Square End Mill Cutting Method: Side Cutting Down Cut Work Material: SKD61 (Hardness 53HRC)
Cutting depth: 10mm in the axial direction, 0.2mm in the radial direction
Cutting speed: 300m / min, Feed: 0.07mm / Blade cutting length: 50m, Lubricant: None (Air blow)
Claims (7)
(Al a ,Cr b ,Mc )(C 1-d N d ) からなる硬質皮膜であって、
0.75≦a ≦0.95、0.05≦b ≦0.25、a+b+c=1 、0.5 ≦d ≦1 （M は1 種または2 種以上の金属および半金属元素であり、a 、b 、c はそれぞれAl、Cr、M の原子比を示し、d はN の原子比を示す。以下同じ）の組成の硬質皮膜を、少なくとも１層以上被覆したことを特徴とする硬質皮膜被覆工具。 On the base of cutting tools based on cemented carbide, cermet or high speed tool steel,
A hard coating made of (Al a , Cr b , M c ) (C 1-d N d ),
0.75 ≦ a ≦ 0.95, 0.05 ≦ b ≦ 0.25, a + b + c = 1, 0.5 ≦ d ≦ 1 (M is one or more metals and metalloid elements, and a, b, and c are respectively A hard coating tool characterized by showing an atomic ratio of Al, Cr, M and d showing an atomic ratio of N. The same applies hereinafter, and a hard coating having a composition of at least one layer is coated.
(Al a ,Cr b ,Mc )(C 1-d N d ) からなる硬質皮膜であって、
基材側の成分比が0.75≦a ≦0.95、0.05≦b ≦0.25、a+b+c=1 、0.5 ≦d ≦1 （M は１種または２種以上の金属および半金属元素であり、a 、b 、c はそれぞれAl、Cr、M の原子比を示し、d は Nの原子比を示す。以下同じ）を満たし、かつ、基材側から表面側にかけて組成比a/b が連続的に減少する硬質皮膜を少なくとも１層以上被覆したことを特徴とする硬質皮膜被覆工具。 On the base of cutting tools based on cemented carbide, cermet or high speed tool steel,
A hard coating made of (Al a , Cr b , M c ) (C 1-d N d ),
The component ratio on the substrate side is 0.75 ≦ a ≦ 0.95, 0.05 ≦ b ≦ 0.25, a + b + c = 1, 0.5 ≦ d ≦ 1 (M is one or more metals and metalloid elements, a, b, and c represent the atomic ratio of Al, Cr, and M, respectively, d represents the atomic ratio of N. The same applies hereinafter, and the composition ratio a / b is continuous from the substrate side to the surface side. A hard film-coated tool characterized in that at least one layer of a hard film that decreases to a minimum is coated.
(Al x 、Cry 、M Z ) からなり、
0.4 ≦x ≦0.8 、0.2 ≦y ≦0.6 、z ≦0.1 、x+y+z=1 （ x、y 、z はそれぞれAl、Cr、M の原子比を示す。以下同じ）の組成であり、且つ相対密度即ち製品完全固体に対する原料体積比が50％以上70％以下であることを特徴とする硬質皮膜形成用ターゲット。 A target as an evaporation material used in a melt evaporation type ion plating apparatus that melts and evaporates a material from a single crucible or hearth using a plasma focused by electrolysis or a magnetic field,
(Al x , Cr y , M Z )
0.4 ≦ x ≦ 0.8, 0.2 ≦ y ≦ 0.6, z ≦ 0.1, x + y + z = 1 (x, y, and z represent the atomic ratio of Al, Cr, and M, respectively, the same applies hereinafter) A target for forming a hard film, wherein the relative density, that is, the volume ratio of the raw material to the product solid is 50% or more and 70% or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004372737A JP4753281B2 (en) | 2004-12-24 | 2004-12-24 | Hard film forming target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004372737A JP4753281B2 (en) | 2004-12-24 | 2004-12-24 | Hard film forming target |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006175569A JP2006175569A (en) | 2006-07-06 |
| JP2006175569A5 true JP2006175569A5 (en) | 2007-12-06 |
| JP4753281B2 JP4753281B2 (en) | 2011-08-24 |
Family
ID=36730151
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004372737A Expired - Fee Related JP4753281B2 (en) | 2004-12-24 | 2004-12-24 | Hard film forming target |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4753281B2 (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100453692C (en) * | 2006-07-20 | 2009-01-21 | 浙江大学 | Aluminium material surface modifying diamond-like film coating process and apparatus |
| JP5070622B2 (en) * | 2007-06-07 | 2012-11-14 | 住友電工ハードメタル株式会社 | Surface coated cutting tool |
| JP5077743B2 (en) * | 2007-07-24 | 2012-11-21 | 三菱マテリアル株式会社 | Surface coated cutting tool with excellent chipping resistance and wear resistance due to hard coating layer |
| JP2009039838A (en) | 2007-08-10 | 2009-02-26 | Mitsubishi Materials Corp | Surface-coated cutting tool |
| DE102007000512B3 (en) * | 2007-10-16 | 2009-01-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Hard-coated body with a multi-layer system for tools and components such as drills, millers and indexable inserts, comprises a bonding layer applied on the body, a single- or multi-phase hard layer, and a phase gradient layer |
| JP5196122B2 (en) * | 2007-11-21 | 2013-05-15 | 三菱マテリアル株式会社 | Surface coated cutting tool |
| JP5310314B2 (en) * | 2009-06-30 | 2013-10-09 | 株式会社不二越 | Hard film coated cutting tool with excellent radiation cooling capability |
| JP5497062B2 (en) * | 2009-11-12 | 2014-05-21 | オーエスジー株式会社 | Hard coating and hard coating tool |
| JP4753143B2 (en) * | 2009-12-21 | 2011-08-24 | 住友電工ハードメタル株式会社 | Surface coated cutting tool |
| JP4753144B2 (en) * | 2009-12-21 | 2011-08-24 | 住友電工ハードメタル株式会社 | Surface coated cutting tool |
| CN103286537B (en) * | 2013-06-26 | 2016-03-30 | 洛阳理工学院 | A kind of preparation method with high-wearing feature coated cutting tool |
| CN112663060A (en) * | 2020-11-30 | 2021-04-16 | 宁波革创新材料科技有限公司 | Composite cutter coating and preparation method thereof |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05195209A (en) * | 1991-11-08 | 1993-08-03 | Mitsubishi Electric Corp | Vacuum vapor deposition target and vacuum vapor deposition method using the same |
| JP4311803B2 (en) * | 1999-03-23 | 2009-08-12 | 住友電気工業株式会社 | Surface coating mold and manufacturing method thereof |
| JP4112834B2 (en) * | 2000-12-28 | 2008-07-02 | 株式会社神戸製鋼所 | Target for forming hard coatings for cutting tools |
-
2004
- 2004-12-24 JP JP2004372737A patent/JP4753281B2/en not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5234926B2 (en) | Hard film and hard film forming target | |
| US20060068225A1 (en) | Hard coating excellent in wear resistance and in oxidation resistance and target for forming the same | |
| JP4018480B2 (en) | Coated hard tool | |
| JP4753281B2 (en) | Hard film forming target | |
| JP2006175569A5 (en) | ||
| JP2011094241A (en) | Hard coating having excellent wear resistance and oxidation resistance and target for forming the same, and hard coating having excellent high-temperature lubricating ability and wear resistance and target for forming the same | |
| WO2013137233A1 (en) | Cermet film, coated metal body having cermet film, method for producing cermet film, and method for producing coated metal body | |
| WO2015076220A1 (en) | Hard coating film and target for forming hard coating film | |
| JP4253169B2 (en) | Hard coating with excellent wear resistance, method for producing the same, cutting tool, and target for forming hard coating | |
| JP2005177952A (en) | Compound hard film coated tool and its manufacturing method | |
| JP2005088130A (en) | Hard film coated tool and target for hard film formation | |
| JP5995091B2 (en) | Surface coated cutting tool with excellent adhesion strength and chipping resistance | |
| JP2008279563A (en) | Surface-coated cutting tool | |
| JP2011104737A (en) | Surface coated cutting tool | |
| JP4998304B2 (en) | Target for hard film formation by melting method using electron beam | |
| JP5267365B2 (en) | Surface coated cutting tool | |
| JP4346020B2 (en) | Hard coating tool | |
| JP5629291B2 (en) | Hard film and hard film forming target | |
| JP4396898B2 (en) | Multi-component coating production apparatus and method | |
| EP1642998B1 (en) | Production device for multiple-system film and coating tool for multiple-system film | |
| JP2006205297A (en) | Surface-coated cutting tool and its manufacturing method | |
| JP2005238402A (en) | Hard coating film-coated tool and its manufacturing method | |
| JP2002212708A (en) | Ti-Si ALLOY BASED TARGET MATERIAL, PRODUCTION METHOD THEREFOR AND FILM COATING METHOD | |
| JP2007237307A (en) | Surface coated cermet-made cutting tool having hard coating layer exhibiting excellent chipping resistance in heavy cutting | |
| JPH08174341A (en) | Rigid-film-covered twist drill and manufacture thereof |