JP2006156938A5 - - Google Patents
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- Publication number
- JP2006156938A5 JP2006156938A5 JP2005151025A JP2005151025A JP2006156938A5 JP 2006156938 A5 JP2006156938 A5 JP 2006156938A5 JP 2005151025 A JP2005151025 A JP 2005151025A JP 2005151025 A JP2005151025 A JP 2005151025A JP 2006156938 A5 JP2006156938 A5 JP 2006156938A5
- Authority
- JP
- Japan
- Prior art keywords
- heat transfer
- transfer gas
- introducing
- further provided
- mounting table
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 1
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005151025A JP4642550B2 (ja) | 2004-10-29 | 2005-05-24 | 基板載置台、基板処理装置、および基板の温度制御方法 |
US11/259,037 US20060090855A1 (en) | 2004-10-29 | 2005-10-27 | Substrate mounting table, substrate processing apparatus and substrate temperature control method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004316604 | 2004-10-29 | ||
JP2005151025A JP4642550B2 (ja) | 2004-10-29 | 2005-05-24 | 基板載置台、基板処理装置、および基板の温度制御方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2006156938A JP2006156938A (ja) | 2006-06-15 |
JP2006156938A5 true JP2006156938A5 (ru) | 2008-06-26 |
JP4642550B2 JP4642550B2 (ja) | 2011-03-02 |
Family
ID=36634790
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005151025A Expired - Fee Related JP4642550B2 (ja) | 2004-10-29 | 2005-05-24 | 基板載置台、基板処理装置、および基板の温度制御方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4642550B2 (ru) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5003102B2 (ja) * | 2006-10-27 | 2012-08-15 | 東京エレクトロン株式会社 | 静電チャックの診断方法、真空処理装置及び記憶媒体 |
JP2008198800A (ja) * | 2007-02-13 | 2008-08-28 | Bridgestone Corp | 熱処理用治具 |
JP5269335B2 (ja) * | 2007-03-30 | 2013-08-21 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP2009060011A (ja) * | 2007-09-03 | 2009-03-19 | Tokyo Electron Ltd | 基板載置台、基板処理装置、及び温度制御方法 |
JP5644256B2 (ja) * | 2010-08-20 | 2014-12-24 | 豊田合成株式会社 | 化合物半導体の製造装置及び化合物半導体の製造方法 |
US8520360B2 (en) * | 2011-07-19 | 2013-08-27 | Lam Research Corporation | Electrostatic chuck with wafer backside plasma assisted dechuck |
JP6010433B2 (ja) * | 2012-11-15 | 2016-10-19 | 東京エレクトロン株式会社 | 基板載置台および基板処理装置 |
JP6612985B2 (ja) * | 2016-07-25 | 2019-11-27 | 京セラ株式会社 | 試料保持具 |
TW202211367A (zh) * | 2020-07-06 | 2022-03-16 | 美商應用材料股份有限公司 | 具有改進的溫度控制的靜電卡盤 |
CN114975178B (zh) * | 2022-05-18 | 2024-04-05 | 江苏微导纳米科技股份有限公司 | 温度控制组件、半导体处理腔室及半导体处理设备 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07335630A (ja) * | 1994-06-13 | 1995-12-22 | Hitachi Ltd | 真空処理装置 |
JPH10107134A (ja) * | 1996-10-01 | 1998-04-24 | Ricoh Co Ltd | 静電吸着装置 |
JP2000317761A (ja) * | 1999-03-01 | 2000-11-21 | Toto Ltd | 静電チャックおよび吸着方法 |
-
2005
- 2005-05-24 JP JP2005151025A patent/JP4642550B2/ja not_active Expired - Fee Related
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