JP2006156920A - Crystallization reproducing apparatus of cleaning liquid - Google Patents

Crystallization reproducing apparatus of cleaning liquid Download PDF

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JP2006156920A
JP2006156920A JP2004381612A JP2004381612A JP2006156920A JP 2006156920 A JP2006156920 A JP 2006156920A JP 2004381612 A JP2004381612 A JP 2004381612A JP 2004381612 A JP2004381612 A JP 2004381612A JP 2006156920 A JP2006156920 A JP 2006156920A
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ethylene carbonate
solution
cleaning liquid
cleaning
heating
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Tadashi Nozaki
正 野崎
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Purex Co Ltd
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Purex Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide means which uses cleaning liquid after using is made to recrystallize by making into a cleaning liquid carbonic acid alkylene solution which is a mixed solution of an organic film, such as a resist film of substrate top for semiconductors, or substrate superiors for a liquid crystal, a propylene carbonate solution, and are reproduced. <P>SOLUTION: In the means for recrystallizing the ethylene carbonate crystal of high grade from the cleaning liquid of used ethylene carbonate solution or a carbonic acid alkylene solution, one side is set as a cooling unit, and the other is set as a heating part, thereby reproducing the ethylene carbonate crystal of high grade by making another side into a heating part. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

発明が属する技術分野Technical field to which the invention belongs

本発明は、電子デバイス用基体及び液晶用ガラス基板に表面清浄化のため、基体上に付着するレジスト膜等での有機物被膜の除去のために用いられる炭酸エチレン含有洗浄溶液の使用済溶液を再生するための再結晶化再生装置に関するものである。本発明は、炭酸エチレンに限定するものでなく、再結晶化法で再生可能な溶液に関するものである。  The present invention regenerates a spent solution of an ethylene carbonate-containing cleaning solution used for removing organic coatings on a resist film or the like adhering to a substrate for cleaning the surface of an electronic device substrate and a liquid crystal glass substrate. It is related with the recrystallization reproduction | regeneration apparatus for performing this. The present invention is not limited to ethylene carbonate, but relates to a solution that can be regenerated by a recrystallization method.

半導体用ウェハ基体の洗浄に用いたり又液晶用ガラス基板の洗浄に用いるものとして、同様に、基体及び基板上のレジスト塗膜の剥離・除去を行うことができる、4−メトキシ−1−ブタノール、3−メトキシ−1−ブタノール又は4−メトキシ−1−ブタノールと3−メトキシ−1−ブタノールとの混合物からなる溶剤と、炭酸プロピレンとから構成されるフォトレジスト用剥離液組成物、40〜50容量%の炭酸エチレン等の非プロトン性・環状炭酸エステル、並びにエチレンジアセテート、エチレンジブチレート等のプロトン性極性化合物、さらにN−メチル−2−ピロリドン及びトリエタノールアミンを含む溶剤の超音波撹拌槽中でフォトレジストを除去する方法、オゾンガスを溶解した処理液を用いて有機被膜を除去する方法として、炭酸アルキレンと気体中のオゾンとの分配係数が室温で0.6以上であり、かつ、オゾンにより分解され難い1種又は複数種混合の有機溶剤とを含む溶剤を用いる方法が知られている。
一般に、有機溶剤を使用した場合、その使用量が多いため環境負荷の観点から問題があったが、これに対して、環境負荷が比較的小さい炭酸エチレン又は炭酸プロピレンは、その単独の使用でも十分にレジスト膜剥離・除去を行うことができることが判ってきた。さらに、これを有効活用しようと炭酸アルキレンにより有機被膜を除去した後、溶解した有機被膜をオゾンによって低分子量物質に分解して、炭酸アルキレンを洗浄用の処理液として再生し、循環使用することが検討され始めている(例:特許文献1参照)。
特開2003−330206号公報
4-methoxy-1-butanol, which can be used to clean a semiconductor wafer substrate or a glass substrate for liquid crystal, can similarly remove and remove the resist film on the substrate and the substrate, Stripping composition for photoresist, composed of 3-methoxy-1-butanol or a solvent composed of 4-methoxy-1-butanol and a mixture of 3-methoxy-1-butanol and propylene carbonate, 40 to 50 volumes % In an ultrasonic stirring tank of a solvent containing an aprotic / cyclic carbonate such as ethylene carbonate and a protic polar compound such as ethylene diacetate or ethylene dibutyrate, and N-methyl-2-pyrrolidone and triethanolamine The method of removing the photoresist by the method, the method of removing the organic film using a treatment solution in which ozone gas is dissolved In addition, a method is known that uses a solvent containing one or more organic solvents in which the partition coefficient between alkylene carbonate and ozone in the gas is 0.6 or more at room temperature and is not easily decomposed by ozone. .
In general, when an organic solvent is used, there is a problem from the viewpoint of environmental load because the amount of use is large. On the other hand, ethylene carbonate or propylene carbonate, which has a relatively small environmental load, can be used alone. It has been found that the resist film can be removed and removed. Furthermore, in order to effectively utilize this, after removing the organic film with alkylene carbonate, the dissolved organic film is decomposed into low molecular weight substances with ozone, and the alkylene carbonate is regenerated as a cleaning treatment liquid and can be recycled. It has begun to be studied (for example, see Patent Document 1).
JP 2003-330206 A

発明が解決しようとする課題Problems to be solved by the invention

この炭酸アルキレンの再生は、処理液中に移行した有機被膜構成物質をオゾンにより低分子量物質にしているため、処理液の有機被膜除去能を効果的に伸ばすことができるものである。
しかしながら、この方法によっても、洗浄操作を行うに従い分解生成物である低分子量物質が処理液中に不純物として蓄積されていくため、処理液の有機被膜除去能が次第に低下していくことは避けられない。
そこで、本発明は、炭酸エチレンを洗浄液として用いた場合に、このような有機被膜除去能が低下した炭酸エチレンから不純物である低分子量物質を除去したり、又はオゾン分解を持ちない場合でも、炭酸エチレンに溶解している有機被膜構成物質を除去したりすることによって、炭酸エチレンの有機被膜を溶解する能力を再生し、炭酸エチレンを洗浄液として効率的に再生利用ができる簡易な炭酸エチレン精製方法及び炭酸エチレン精製装置を提供することを目的とした。
The regeneration of the alkylene carbonate can effectively improve the organic film removing ability of the treatment liquid because the organic film constituent material transferred into the treatment liquid is converted into a low molecular weight substance by ozone.
However, even with this method, the low molecular weight substance, which is a decomposition product, accumulates as impurities in the treatment liquid as the cleaning operation is performed, so that it is unavoidable that the organic film removal ability of the treatment liquid gradually decreases. Absent.
Therefore, when ethylene carbonate is used as a cleaning liquid, the present invention removes low molecular weight substances that are impurities from ethylene carbonate having a reduced ability to remove organic films, or even when it does not have ozonolysis. A simple ethylene carbonate refining method that regenerates the ability to dissolve the organic film of ethylene carbonate by removing organic film constituents dissolved in ethylene, and that can be efficiently recycled as a washing liquid of ethylene carbonate, and An object of the present invention is to provide an apparatus for purifying ethylene carbonate.

課題を解決するための手段Means for solving the problem

炭酸エチレンはEthylene Carbonateまたは[1,3]Dioxdane−2−oneとも呼ばれ、図−1に示すような構造式で表される。融点36.4℃で、融点以上で液化した炭酸エチレン溶液を融点以下に冷却すると炭酸エチレン結晶が析出する。温度が低い程結晶の析出・成長が早く、析出結晶の形状・状態は析出温度、攪拌条件、析出時間等に影響される。しかし、いずれの場合も針状又は板状に結晶成長して、さらに、結晶成長させると樹枝状にあらゆる方向に成長して塊状になる。
本発明者は上記の炭酸エチレンの性状を鋭意検討した結果、一般的には、レジスト洗浄に使用した炭酸エチレン溶液をその融点以下の温度にして炭酸エチレンの結晶を析出させて、さらに析出した炭酸エチレン結晶を加温して炭酸エチレン溶液に精製する方法が考えられる。しかし、単に炭酸エチレン結晶を析出させる方法では、例えば、使用済み炭酸エチレン洗浄液の全てが結晶化すると、レジスト膜の有機被膜構成物質又はオゾンで分解された低分子量物質を含む炭酸エチレン結晶として析出してしまい純化処理したことにならない。そこで、使用済み炭酸エチレン洗浄液を入れた容器内に融点以下の温度領域を持つ冷却部と融点以上の温度領域を持つ加熱部を設けて、温度勾配を付けて、炭酸エチレン結晶を析出させることにより、該結晶を抽出・加熱して炭酸エチレン溶液に精製することにより、炭酸エチレンの洗浄液としての再利用が可能であることを見出して、本発明を完成した。
すなわち、本発明の炭酸エチレン精製方法は、炭酸エチレンを含む少なくとも2種の有機溶剤を含み、使用済み炭酸エチレン洗浄液を入れた容器内に融点以下の温度領域を持つ冷却部と融点以上の温度領域を持つ加熱部を設けて、温度勾配を付けて、炭酸エチレン結晶を析出させる結晶析出工程と、結晶析出工程で析出した炭酸エチレン粗結晶を混合溶剤から分離する固液分離工程と、固液分離工程で分離された炭酸エチレン粗結晶を溶解させる結晶溶解工程とを有することを特徴とするものである。
Ethylene carbonate is also referred to as Ethylene Carbonate or [1,3] Dioxdane-2-one, and is represented by the structural formula shown in FIG. When the ethylene carbonate solution liquefied above the melting point at a melting point of 36.4 ° C. is cooled below the melting point, ethylene carbonate crystals are precipitated. The lower the temperature, the faster the crystals precipitate and grow, and the shape and state of the precipitated crystals are affected by the precipitation temperature, stirring conditions, precipitation time, and the like. However, in any case, the crystal grows in a needle shape or a plate shape, and further grows in a dendritic shape in all directions to form a lump.
As a result of intensive studies on the properties of the above-mentioned ethylene carbonate, the present inventor generally precipitated ethylene carbonate crystals by bringing the ethylene carbonate solution used for resist cleaning to a temperature below its melting point, and further precipitated carbon dioxide. A method in which ethylene crystals are heated and purified to an ethylene carbonate solution is conceivable. However, in the method of merely precipitating ethylene carbonate crystals, for example, when all of the used ethylene carbonate cleaning solution is crystallized, it is precipitated as ethylene carbonate crystals containing organic film constituent materials of the resist film or low molecular weight materials decomposed by ozone. It has not been purified. Therefore, by providing a cooling unit having a temperature region below the melting point and a heating unit having a temperature region above the melting point in a container containing the used ethylene carbonate cleaning liquid, and adding a temperature gradient to precipitate ethylene carbonate crystals. The present invention was completed by finding that the crystals can be reused as a cleaning solution by extracting and heating to purify them into an ethylene carbonate solution.
That is, the ethylene carbonate refining method of the present invention includes at least two kinds of organic solvents containing ethylene carbonate, a cooling section having a temperature range below the melting point in a container containing the used ethylene carbonate cleaning liquid, and a temperature range above the melting point A heating part having a temperature gradient, a crystal precipitation step for precipitating ethylene carbonate crystals, a solid-liquid separation step for separating the ethylene carbonate crude crystals precipitated in the crystal precipitation step from the mixed solvent, and a solid-liquid separation And a crystal dissolving step of dissolving the ethylene carbonate crude crystals separated in the step.

また、本発明の炭酸エチレン結晶化再生装置は、炭酸エチレンを含む少なくとも2種以上の有機溶剤を含み、炭酸エチレンの融点温度以下の温度領域を持つ冷却部と炭酸エチレンの融点以上の温度領域を持つ加熱部で構成される炭酸エチレン粗結晶析出用の結晶析出槽と、結晶析出槽に不純物を含有する使用済み炭酸エチレン含有洗浄液を供給する供給手段と、結晶析出槽での加熱部で不純物を溶解した炭酸エチレン含有溶液を抜き取り分離する固液分離手段と、固液分離手段により得られた炭酸エチレン粗結晶を溶解するために加温する加温手段とを有することを特徴とするものである。  The ethylene carbonate crystallization regenerator of the present invention includes at least two or more organic solvents containing ethylene carbonate, and has a cooling part having a temperature region below the melting point temperature of ethylene carbonate and a temperature region above the melting point of ethylene carbonate. A crystal precipitation tank for crude crystal precipitation of ethylene carbonate composed of a heating unit having a supply means for supplying a used ethylene carbonate-containing cleaning solution containing impurities to the crystal precipitation tank, and a heating unit in the crystal precipitation tank to remove impurities. It comprises solid-liquid separation means for extracting and separating a dissolved ethylene carbonate-containing solution, and heating means for heating in order to dissolve the ethylene carbonate crude crystals obtained by the solid-liquid separation means. .

発明の効果The invention's effect

本発明の炭酸エチレン精製方法によれば、加熱部での不純物を含有した炭酸エチレン溶液を抜き取り排出して、冷却部で結晶化した炭酸エチレンの粗結晶は、高純度の炭酸エチレン結晶で回収することができ、また、本発明の炭酸エチレン精製装置によれば、本発明の炭酸エチレン精製方法で行う一連の工程を簡便に行うことができる。これにより得られた炭酸エチレンは、例えばレジストの洗浄液として再利用することができる。  According to the method for purifying ethylene carbonate of the present invention, the ethylene carbonate solution containing impurities in the heating section is extracted and discharged, and the crude crystals of ethylene carbonate crystallized in the cooling section are recovered as high-purity ethylene carbonate crystals. In addition, according to the ethylene carbonate purification apparatus of the present invention, a series of steps performed by the ethylene carbonate purification method of the present invention can be easily performed. The ethylene carbonate thus obtained can be reused, for example, as a resist cleaning solution.

以下、本発明について、実施の形態を例に図面を参照しながら説明する。
(実施形態)
図2は、本発明の実施形態における炭酸エチレン精製装置の概念図である。
図2において、炭酸エチレン収容槽▲1▼は、使用済み炭酸エチレン含有溶液を収容して炭酸エチレン粗結晶を析出させる結晶析出槽を兼ね備えており、不純物を含有する炭酸エチレンを収容する箱型洗浄液収容槽である。箱型炭酸エチレン収容槽▲1▼の一方が冷却部▲2▼と対極の他方が加熱部▲3▼で構成され、冷却部▲2▼は炭酸エチレン収容溶液との接触面が融点以下の一定温度に保持するため冷水を冷水・温水供給口▲5▼より供給して、冷水・温水戻し循環口▲6▼より冷却器に戻して循環冷却する。対極にある加熱部▲3▼は炭酸エチレン収容溶液との接触面が融点以上の一定温度に保持するため温水供給口▲7▼より供給して、温水戻し循環口▲8▼より加熱器に戻して循環加熱する。炭酸エチレン結晶は槽▲1▼内の温度勾配に支配されて冷却部▲2▼の炭酸エチレン溶液接触面より炭酸エチレン結晶の核生成が起こり、炭酸エチレン結晶が成長する。炭酸エチレン溶液に含まれているレジスト又はオゾンで分解処理された低分子量物質は溶液側に移行して、純度の高い結晶が精製される。
冷却部▲2▼及び加熱部▲3▼の温度設定であるが、冷却部▲2▼での炭酸エチレン溶液との接触面の温度を低く設定すると結晶化時間は早くなるが精製効率が悪くなる。さらに冷却部▲2▼の表面に炭酸エチレンの結晶が析出し始めると炭酸エチレン結晶の熱伝導が悪いため均質に結晶成長させるには冷却部▲2▼の温度を徐々に下げる必要がある。従って、初期冷却温度はほぼ40℃に設定し、時間経過と共に徐々に冷却温度を下げてほぼ20℃に下げた。又、加熱部▲3▼の温度が高いと精製効率は良くなるが結晶化量は少なくなる。加熱部▲3▼の加熱温度は結晶化量がほぼ80重量%になるよう設定した。従って、加熱部▲3▼の表面温度が35〜50℃の任意に設定した温度で制御した。このことは、実施例2(図3表示)及び実施例3(図4表示)で示した円筒型炭酸エチレン収容槽▲1▼で示した冷却部▲2▼、加熱部▲11▼及び▲12▼での温度条件も同様に制御する必要があった。
本発明で言う再結晶化再生で再生炭酸エチレンの純度を上げるには、再結晶化を繰り返し行うことで高純度な炭酸エチレンが得られた。即ち、結晶化量がほぼ80重量%が得られた時点で加熱部▲3▼周辺の残溶液を処理済炭酸エチレン溶液排出口▲4▼より全量抜き取り、冷却部▲1▼に温水を流して50〜60℃に加温して溶液に戻して、前記同様に冷却部▲1▼に冷水を流して結晶化をさせる。この方法を繰返すことで高純度な炭酸エチレンを得ることができる。
Hereinafter, the present invention will be described with reference to the drawings by way of examples.
(Embodiment)
FIG. 2 is a conceptual diagram of an ethylene carbonate refining device in an embodiment of the present invention.
In FIG. 2, an ethylene carbonate storage tank {circle around (1)} also has a crystal precipitation tank for storing a used ethylene carbonate-containing solution and depositing crude ethylene carbonate crystals, and is a box-type cleaning solution for storing ethylene carbonate containing impurities. It is a storage tank. One of the box-type ethylene carbonate containing tank (1) is composed of a cooling part (2) and the other counter electrode is a heating part (3). The cooling part (2) has a constant contact surface with the ethylene carbonate containing solution below the melting point. In order to maintain the temperature, cold water is supplied from the cold water / hot water supply port (5) and returned to the cooler from the cold water / hot water return circulation port (6) to circulate and cool. The heating unit (3) at the counter electrode is supplied from the hot water supply port (7) and returned to the heater from the hot water return circulation port (8) in order to keep the contact surface with the ethylene carbonate-containing solution at a constant temperature above the melting point. Circulate and heat. The ethylene carbonate crystal is controlled by the temperature gradient in the tank (1), and nucleation of the ethylene carbonate crystal occurs from the contact surface of the ethylene carbonate solution in the cooling section (2) to grow the ethylene carbonate crystal. The low molecular weight substance decomposed with the resist or ozone contained in the ethylene carbonate solution moves to the solution side, and a crystal with high purity is purified.
The temperature of the cooling unit (2) and the heating unit (3) is set. However, if the temperature of the contact surface with the ethylene carbonate solution in the cooling unit (2) is set low, the crystallization time is shortened but the purification efficiency is deteriorated. . Further, when ethylene carbonate crystals begin to precipitate on the surface of the cooling section (2), the heat conduction of the ethylene carbonate crystals is poor, and the temperature of the cooling section (2) needs to be gradually lowered in order to grow crystals uniformly. Therefore, the initial cooling temperature was set to about 40 ° C., and the cooling temperature was gradually lowered to about 20 ° C. over time. Further, when the temperature of the heating section (3) is high, the purification efficiency is improved but the amount of crystallization is reduced. The heating temperature of the heating unit (3) was set so that the amount of crystallization was approximately 80% by weight. Therefore, the surface temperature of the heating part (3) was controlled at an arbitrarily set temperature of 35 to 50 ° C. This is because the cooling section {circle around (2)}, the heating section {11} and {circle around (12)} shown in the cylindrical ethylene carbonate storage tank {circle around (1)} shown in Example 2 (shown in FIG. 3) and Example 3 (shown in FIG. 4). It was necessary to similarly control the temperature condition at ▼.
In order to increase the purity of the regenerated ethylene carbonate by recrystallization and regeneration as referred to in the present invention, high purity ethylene carbonate was obtained by repeatedly performing recrystallization. That is, when the amount of crystallization is approximately 80% by weight, the remaining solution around the heating section (3) is withdrawn from the treated ethylene carbonate solution outlet (4), and warm water is poured into the cooling section (1). The mixture is heated to 50 to 60 ° C. and returned to the solution, and crystallization is performed by flowing cold water through the cooling section (1) as described above. By repeating this method, highly pure ethylene carbonate can be obtained.

以下、実施例に基づいて本発明を詳細に説明する。
[使用済炭酸エチレン溶液]
実施例に用いた使用済炭酸エチレン溶液は、カップ洗浄に用いられた使用済洗浄液であって、炭酸エチレン約100kgに対して、全レジスト量として約8kgがオゾンガス吹込みにより低分子量化処理をしたものである。このオゾン処理条件はオゾン量:6L/min,60g/Nm,480hr処理したもので、総オゾン量としては10、368gと計算される。
Hereinafter, the present invention will be described in detail based on examples.
[Used ethylene carbonate solution]
The used ethylene carbonate solution used in the examples is a used cleaning solution used for cup cleaning, and about 8 kg of total resist was subjected to low molecular weight treatment by blowing ozone gas with respect to about 100 kg of ethylene carbonate. Is. This ozone treatment condition is the amount of ozone: 6 L / min, 60 g / Nm 3 , 480 hr treated, and the total ozone amount is calculated as 10,368 g.

(実施例1)
この実施例においては、図2に示した構成であり、本結晶化再生装置の炭酸エチレン収容槽▲1▼は箱型の250□×400Hmm(内容積:25L)で加熱部▲3▼側下部に処理済炭酸エチレン溶液排出口▲4▼付排出溶液溜部50□×50Hmmより出来ている。この側面に加熱部▲3▼の寸法が250□×30W×400Hmmと、その対面に冷却部▲2▼の寸法が250□×30W×400Hmmが付帯して材質SUS−316材の厚み1mmSUS板を用いて製作されている。
50℃に加温溶解した前記使用済炭酸エチレン溶液20L(約26kg)を炭酸エチレン収容槽▲1▼に注入した。液面高は約320Hmmで、冷却部▲2▼へ冷水・温水供給口▲5▼より30℃の冷水を注入し、冷水・温水戻し循環口▲6▼より冷却器に戻し循環使用した。又、加熱部▲3▼の温水供給口▲7▼より35℃の温水を注入し、温水戻し循環口▲8▼より加熱器に戻して循環利用した。
冷却部▲2▼と加熱部▲3▼間での炭酸エチレン収容槽▲1▼内の温度勾配は初期設定では5℃である。冷却部▲2▼は初期温度30℃を10時間かけて20℃まで直線的に下げる制御回路で制御して最終的温度勾配を15℃にした。結晶化炭酸エチレンと炭酸エチレン溶液比が約80重量%/20重量%になるまで結晶化処理を行った。
次に、加熱部▲3▼側の残溶液を処理済炭酸エチレン排出口▲4▼よりポンプにより排出した後、結晶を取りだして観察した所、わずかに黄色味を帯びているが綺麗な白色結晶が樹枝状に絡み合った感じで析出していた。冷却部▲2▼に冷水・温水供給口▲5▼より50℃の温水を供給して炭酸エチレン溶液にして処理済炭酸エチレン溶液排出口▲4▼より回収した。回収量は15.8L(20.6kg)で、この回収炭酸エチレン溶液をカップ洗浄液として使用した所、全く問題なく洗浄液としてレジスト膜剥離・洗浄が行えた。
炭酸エチレン溶液/炭酸プロピレン溶液の比が3/1の洗浄液を本実施例で処理をした所、溶液比が3/1での3の炭酸エチレンの約80重量%を回収して、そのものを用いて前記、カップ洗浄したところ前記同様、全く問題なく洗浄液としてレジスト膜剥離・洗浄が行えた。
Example 1
In this embodiment, the ethylene carbonate storage tank (1) of the present crystallization regenerator is a box-shaped 250 □ × 400Hmm (internal volume: 25L) and has a configuration shown in FIG. And a treated ethylene carbonate solution outlet (4) and a drained solution reservoir 50 □ × 50Hmm. On this side, the size of the heating part (3) is 250 □ × 30W × 400Hmm and the size of the cooling part (2) is 250 □ × 30W × 400Hmm on the opposite side. It is manufactured using.
20 L (about 26 kg) of the used ethylene carbonate solution dissolved by heating at 50 ° C. was poured into the ethylene carbonate storage tank (1). The liquid level was about 320 Hmm, and cold water of 30 ° C. was poured into the cooling section (2) through the cold water / hot water supply port (5), and returned to the cooler through the cold water / hot water return circulation port (6) for circulation. Moreover, hot water of 35 ° C. was injected from the hot water supply port (7) of the heating unit (3), and returned to the heater from the hot water return circulation port (8) for circulation.
The temperature gradient in the ethylene carbonate storage tank (1) between the cooling section (2) and the heating section (3) is 5 ° C. by default. The cooling section (2) was controlled by a control circuit that linearly lowered the initial temperature of 30 ° C. to 20 ° C. over 10 hours, so that the final temperature gradient was 15 ° C. Crystallization was performed until the ratio of crystallized ethylene carbonate to ethylene carbonate solution was about 80% by weight / 20% by weight.
Next, after the residual solution on the heating section (3) side was discharged from the treated ethylene carbonate discharge port (4) by a pump, the crystals were taken out and observed, and they were slightly yellowish but beautiful white crystals. Was deposited with the feeling of being intertwined in a dendritic shape. Hot water of 50 ° C. was supplied from the cold / hot water supply port (5) to the cooling unit (2) to obtain an ethylene carbonate solution, which was recovered from the treated ethylene carbonate solution discharge port (4). The recovered amount was 15.8 L (20.6 kg). When this recovered ethylene carbonate solution was used as a cup cleaning solution, the resist film could be removed and cleaned as a cleaning solution without any problem.
When a cleaning solution having a ratio of ethylene carbonate solution / propylene carbonate solution of 3/1 was treated in this example, about 80% by weight of ethylene carbonate of 3 having a solution ratio of 3/1 was recovered and used as such. When the cup was washed, the resist film was peeled off and washed as a washing solution without any problem as described above.

(実施例2)
この実施例においては、図3に示した構成であり、本結晶化再生装置の炭酸エチレン収容槽▲1▼は丸型の210φ×800Hmm(内容積:25L)で、その外周部に冷却部▲2▼が円筒型で低部が密閉された寸法が240φ×840Hmmで、図3に示すように付帯して、材質SUS−316材の厚み3mmSUS管を用いて製作されている。
50℃に加温溶解した前記使用済炭酸エチレン溶液20L(約26kg)を炭酸エチレン収容槽▲1▼に注入した。液面高は約578Hmmで、冷却部▲2▼へ冷水・温水供給口▲5▼より30℃の冷水を注入し、冷水・温水戻し循環口▲6▼より冷却器に戻し循環使用した。又、中心部に加熱部がヒーター付パイプ▲11▼が付帯しており、ヒーターで加熱して中心部を35℃に制御した。
冷却部▲2▼と加熱部▲3▼間での炭酸エチレン収容槽▲1▼内の温度勾配は初期設定では5℃である。冷却部▲2▼は初期温度30℃を10時間かけて20℃まで直線的に下げる制御回路で制御して最終的温度勾配を15℃にした。結晶化炭酸エチレンと炭酸エチレン溶液比が約80重量%/20重量%になるまで結晶化処理を行った。
次に、ヒーター付パイプ▲11▼の内部パイプは洗浄液供給口▲10▼と処理済炭酸エチレン溶液排出口▲4▼を兼ね備えており、処理済炭酸エチレン溶液排出及び再生炭酸エチレン溶液排出は圧縮空気供給口▲9▼より圧縮空気を挿入して排出させた。ヒーター付パイプ▲11▼側の残溶液を処理済炭酸エチレン排出口▲4▼より圧縮空気により排出した後、結晶を取りだして観察した所、わずかに黄色味を帯びているが綺麗な白色結晶が外周より中心部に向かって樹枝状に絡み合った感じで析出していた。冷却部▲2▼に冷水・温水供給口▲5▼より50℃の温水を供給して炭酸エチレン溶液にして処理済炭酸エチレン溶液排出口▲4▼より回収した。回収量は15.7L(20.5kg)で、この回収炭酸エチレン溶液をカップ洗浄液として使用した所、全く問題なく洗浄液としてレジスト膜剥離・洗浄が行えた。
(Example 2)
In this embodiment, the configuration shown in FIG. 3, the ethylene carbonate storage tank (1) of the crystallization regenerator is a round type 210 φ × 800 Hmm (internal volume: 25 L), and a cooling unit is provided on the outer periphery thereof. The dimension (2) is cylindrical and the lower part is hermetically sealed and has a diameter of 240 φ × 840 Hmm, and is attached as shown in FIG. 3, and is manufactured using a SUS-316 material with a thickness of 3 mm.
20 L (about 26 kg) of the used ethylene carbonate solution dissolved by heating at 50 ° C. was poured into the ethylene carbonate storage tank (1). The liquid level was about 578 Hmm, and cold water of 30 ° C. was poured into the cooling section (2) from the cold water / hot water supply port (5), and returned to the cooler from the cold water / hot water return circulation port (6) for circulation. Moreover, the heating part was attached to the center with a heater pipe (11), and the center part was controlled at 35 ° C. by heating with a heater.
The temperature gradient in the ethylene carbonate storage tank (1) between the cooling section (2) and the heating section (3) is 5 ° C. by default. The cooling section (2) was controlled by a control circuit that linearly lowered the initial temperature of 30 ° C. to 20 ° C. over 10 hours, so that the final temperature gradient was 15 ° C. Crystallization was performed until the ratio of crystallized ethylene carbonate to ethylene carbonate solution was about 80% by weight / 20% by weight.
Next, the internal pipe of the heater-equipped pipe (11) has a cleaning liquid supply port (10) and a treated ethylene carbonate solution discharge port (4). The treated ethylene carbonate solution discharge and the regenerated ethylene carbonate solution discharge are compressed air. Compressed air was inserted and discharged from the supply port (9). After discharging the residual solution on the heated pipe (11) side from the treated ethylene carbonate discharge port (4) with compressed air, the crystals were taken out and observed. A slightly yellowish but beautiful white crystal was observed. It was deposited with a feeling of entanglement from the outer periphery toward the center. Hot water of 50 ° C. was supplied from the cold / hot water supply port (5) to the cooling unit (2) to obtain an ethylene carbonate solution, which was recovered from the treated ethylene carbonate solution discharge port (4). The recovered amount was 15.7 L (20.5 kg). When this recovered ethylene carbonate solution was used as a cup cleaning solution, the resist film could be peeled off and cleaned as a cleaning solution without any problem.

次に、カップ洗浄液より更に純度を要求されるウェハ基体又はウェハ基体上のフォトレジスト等の有機薄膜剥離・洗浄用の高純度炭酸エチレン洗浄液を得るために、前記、50℃に戻した炭酸エチレン溶液を全く同法で繰り返し再結晶化処理を行った。  Next, in order to obtain a high-purity ethylene carbonate cleaning solution for peeling and cleaning an organic thin film such as a wafer substrate or a photoresist on the wafer substrate, which requires higher purity than the cup cleaning solution, the ethylene carbonate solution returned to 50 ° C. Was completely recrystallized by the same method.

表1Table 1

に示したのは、原液とは前記した[使用済炭酸エチレン溶液]であって、「1回分離後結晶側」とは原液の再結晶化再生処理を一回行い、再加熱して得た炭酸エチレン溶液であり、「4回目分離後結晶側」とは原液の再結晶化再生処理を4回繰り返し行った後、再加熱して得た炭酸エチレン溶液のレジスト成分がオゾン分解で低分子化された有機酸類と有機酸エステル類である。尚、分析方法はイオンクロマトグラフィーを用いて行った。The undiluted solution is the [spent ethylene carbonate solution] described above, and the “crystal side after separation once” is obtained by performing recrystallization regeneration treatment of the undiluted solution once and reheating it. “Carbon side after the fourth separation” is an ethylene carbonate solution. After re-crystallizing and regenerating the stock solution four times, the resist component of the ethylene carbonate solution obtained by reheating reduces the molecular weight by ozone decomposition. Organic acids and organic acid esters. The analysis method was performed using ion chromatography.

Figure 2006156920
Figure 2006156920

1回の再結晶化再生処理の有機酸及び有機酸エステルでは、原液の約3分の1の減少であるが4回の再結晶化再生処理では10分の1の減少が見られ、高純度が要求されるウェハ基体上のフォトレジスト膜などの有機被膜での剥離洗浄剤として充分使用可能である。
又、炭酸エチレン溶液/炭酸プロピレン溶液の比が3/1の洗浄液を本実施例での1回の再結晶化再生処理をした所、溶液比が3/1での3の炭酸エチレンの約80重量%を回収して、そのものを用いて前記、カップ洗浄したところ前記同様、全く問題なく洗浄液としてレジスト膜剥離・洗浄が実施例1同様に行えた。
In the case of organic acid and organic acid ester of one recrystallization regeneration treatment, there is a reduction of about one third of the stock solution, but in the four recrystallization regeneration treatments, a reduction of one tenth is seen, and high purity. Can be sufficiently used as a peeling cleaning agent in an organic coating such as a photoresist film on a wafer substrate.
Further, when the cleaning solution having a ratio of ethylene carbonate solution / propylene carbonate solution of 3/1 was recrystallized and regenerated once in this example, about 80 of ethylene carbonate of 3 having a solution ratio of 3/1 was obtained. As a result of recovering the weight% and washing the cup using the same, the resist film was peeled and washed as a cleaning solution in the same manner as in Example 1 without any problem.

(実施例3)
この実施例においては、図4に示した構成であり、実施例2の図3との相違は炭酸エチレン収容槽▲1▼の最下部に保温ヒーターで表示される保温ヒーター▲13▼を付帯した処理済炭酸エチレン溶液排出口▲4▼が最下部に設けられていることである。
得られた炭酸エチレン結晶は、実施例2で得られた結晶と類似したもので、わずかに帯びている黄色味が少ない白色結晶が得られた。
(Example 3)
In this embodiment, the configuration shown in FIG. 4 is different from that of FIG. 3 in Embodiment 2 in that a heat retaining heater (13) indicated by a heat retaining heater is attached at the bottom of the ethylene carbonate storage tank (1). The treated ethylene carbonate solution outlet (4) is provided at the bottom.
The obtained ethylene carbonate crystals were similar to the crystals obtained in Example 2, and white crystals with a slight yellowishness were obtained.

炭酸エチレンの構造式Structural formula of ethylene carbonate 一方が冷却部、他方が加熱部で構成される箱型炭酸エチレン結晶化槽の断面図。Sectional drawing of the box-type ethylene carbonate crystallization tank where one side is a cooling part and the other is a heating part. 外側が冷却部.中心が加熱部で構成される丸型炭酸エチレン結晶化槽の断面図。The outside is the cooling section. Sectional drawing of the round ethylene carbonate crystallization tank which a center comprises a heating part. 図3の中心部から処理済炭酸エチレン溶液を抜き取る方式の断面図。Sectional drawing of the system which extracts a processed ethylene carbonate solution from the center part of FIG.

符号の説明Explanation of symbols

▲1▼炭酸エチレン収容槽、▲2▼冷却部、▲3▼加熱部、▲4▼処理済炭酸エチレン溶液排出口、▲5▼冷水・温水供給口、▲6▼冷水・温水戻し循環口、▲7▼温水供給口、▲8▼温水戻し循環口、▲9▼圧縮空気供給口、▲10▼洗浄液供給口、▲11▼加熱ヒーター付パイプ、▲12▼加熱ヒーター、▲13▼保温ヒーター(1) ethylene carbonate storage tank, (2) cooling section, (3) heating section, (4) treated ethylene carbonate solution outlet, (5) cold water / hot water supply port, (6) cold water / hot water return circulation port, (7) Warm water supply port, (8) Warm water return circulation port, (9) Compressed air supply port, (10) Cleaning liquid supply port, (11) Pipe with heating heater, (12) Heating heater, (13) Heating heater

Claims (3)

半導体用基体上または液晶用基板上等のレジスト膜等の有機被膜を炭酸エチレン溶液または炭酸エチレン溶液、炭酸プロピレン溶液の混合溶液である炭酸アルキレン溶液を洗浄液として使用後の使用済洗浄液を再結晶化させて再生させる手段において、
再生用容器の一方が冷却工程と、
再生用容器の他方が加熱工程と、
からなる使用済み洗浄液から炭酸エチレン結晶を再結晶化させることで洗浄液を再生させることを特徴とする洗浄液再生装置。
Recrystallize used cleaning solution after using organic film such as resist film on semiconductor substrate or liquid crystal substrate as cleaning solution using ethylene carbonate solution or mixed solution of ethylene carbonate solution and propylene carbonate solution as cleaning solution In the means to let you play,
One of the recycling containers is a cooling process,
The other of the recycling containers is a heating step;
A cleaning liquid regenerator that regenerates the cleaning liquid by recrystallizing ethylene carbonate crystals from the used cleaning liquid.
再生用容器が円筒形であって、円筒形外周部に冷却部を有し、円筒形中心部に加熱部を有することを特徴とする請求項1に記載する洗浄液再生装置。  2. The cleaning liquid regenerating apparatus according to claim 1, wherein the regeneration container has a cylindrical shape, has a cooling portion at the outer peripheral portion of the cylindrical shape, and has a heating portion at the central portion of the cylindrical shape. 再生用容器の中心下部に溶液を排出するための排出口を有することを特徴とする請求項1、2に記載する洗浄液再生装置。  The cleaning liquid regenerator according to claim 1 or 2, further comprising a discharge port for discharging the solution at a lower center portion of the regeneration container.
JP2004381612A 2004-12-01 2004-12-01 Crystallization reproducing apparatus of cleaning liquid Pending JP2006156920A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006241088A (en) * 2005-03-04 2006-09-14 Nomura Micro Sci Co Ltd Method for recycling ethylene carbonate and installation for recycling ethylene carbonate
JP2009131778A (en) * 2007-11-30 2009-06-18 Nomura Micro Sci Co Ltd Method for recovering ethylene carbonate
CN107837558A (en) * 2016-09-21 2018-03-27 山东豪迈化工技术有限公司 Crystallizer and method for crystallising
CN107837559A (en) * 2016-09-21 2018-03-27 山东豪迈化工技术有限公司 Crystallizer

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006241088A (en) * 2005-03-04 2006-09-14 Nomura Micro Sci Co Ltd Method for recycling ethylene carbonate and installation for recycling ethylene carbonate
JP2009131778A (en) * 2007-11-30 2009-06-18 Nomura Micro Sci Co Ltd Method for recovering ethylene carbonate
CN107837558A (en) * 2016-09-21 2018-03-27 山东豪迈化工技术有限公司 Crystallizer and method for crystallising
CN107837559A (en) * 2016-09-21 2018-03-27 山东豪迈化工技术有限公司 Crystallizer

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