JP2006120878A5 - - Google Patents
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- Publication number
- JP2006120878A5 JP2006120878A5 JP2004307528A JP2004307528A JP2006120878A5 JP 2006120878 A5 JP2006120878 A5 JP 2006120878A5 JP 2004307528 A JP2004307528 A JP 2004307528A JP 2004307528 A JP2004307528 A JP 2004307528A JP 2006120878 A5 JP2006120878 A5 JP 2006120878A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- liquid
- immersion exposure
- exposure apparatus
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000007788 liquid Substances 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 12
- 238000007654 immersion Methods 0.000 claims 11
- 230000003287 optical effect Effects 0.000 claims 7
- 239000003638 chemical reducing agent Substances 0.000 claims 6
- 230000033116 oxidation-reduction process Effects 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 claims 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims 1
- 229910002091 carbon monoxide Inorganic materials 0.000 claims 1
- 150000002430 hydrocarbons Chemical class 0.000 claims 1
- -1 hydrogen compound Chemical class 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004307528A JP2006120878A (ja) | 2004-10-22 | 2004-10-22 | 液浸露光装置及びそれを用いたデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004307528A JP2006120878A (ja) | 2004-10-22 | 2004-10-22 | 液浸露光装置及びそれを用いたデバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006120878A JP2006120878A (ja) | 2006-05-11 |
| JP2006120878A5 true JP2006120878A5 (de) | 2007-12-06 |
Family
ID=36538470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004307528A Withdrawn JP2006120878A (ja) | 2004-10-22 | 2004-10-22 | 液浸露光装置及びそれを用いたデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2006120878A (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7291569B2 (en) * | 2005-06-29 | 2007-11-06 | Infineon Technologies Ag | Fluids for immersion lithography systems |
| JPWO2012011512A1 (ja) * | 2010-07-20 | 2013-09-09 | 株式会社ニコン | 露光方法、露光装置および洗浄方法 |
-
2004
- 2004-10-22 JP JP2004307528A patent/JP2006120878A/ja not_active Withdrawn
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