JP2006114650A5 - - Google Patents

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Publication number
JP2006114650A5
JP2006114650A5 JP2004299790A JP2004299790A JP2006114650A5 JP 2006114650 A5 JP2006114650 A5 JP 2006114650A5 JP 2004299790 A JP2004299790 A JP 2004299790A JP 2004299790 A JP2004299790 A JP 2004299790A JP 2006114650 A5 JP2006114650 A5 JP 2006114650A5
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JP
Japan
Prior art keywords
original
light
scanning
cleaning
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004299790A
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English (en)
Japanese (ja)
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JP2006114650A (ja
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Publication date
Application filed filed Critical
Priority to JP2004299790A priority Critical patent/JP2006114650A/ja
Priority claimed from JP2004299790A external-priority patent/JP2006114650A/ja
Priority to US11/250,072 priority patent/US7319507B2/en
Publication of JP2006114650A publication Critical patent/JP2006114650A/ja
Publication of JP2006114650A5 publication Critical patent/JP2006114650A5/ja
Withdrawn legal-status Critical Current

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JP2004299790A 2004-10-14 2004-10-14 露光装置、走査露光装置、デバイス製造方法、原版のクリーニング方法、および原版 Withdrawn JP2006114650A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004299790A JP2006114650A (ja) 2004-10-14 2004-10-14 露光装置、走査露光装置、デバイス製造方法、原版のクリーニング方法、および原版
US11/250,072 US7319507B2 (en) 2004-10-14 2005-10-12 Apparatus and method for removing contaminant on original, method of manufacturing device, and original

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004299790A JP2006114650A (ja) 2004-10-14 2004-10-14 露光装置、走査露光装置、デバイス製造方法、原版のクリーニング方法、および原版

Publications (2)

Publication Number Publication Date
JP2006114650A JP2006114650A (ja) 2006-04-27
JP2006114650A5 true JP2006114650A5 (cg-RX-API-DMAC10.html) 2007-11-22

Family

ID=36180368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004299790A Withdrawn JP2006114650A (ja) 2004-10-14 2004-10-14 露光装置、走査露光装置、デバイス製造方法、原版のクリーニング方法、および原版

Country Status (2)

Country Link
US (1) US7319507B2 (cg-RX-API-DMAC10.html)
JP (1) JP2006114650A (cg-RX-API-DMAC10.html)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7522263B2 (en) * 2005-12-27 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and method
US20070146658A1 (en) * 2005-12-27 2007-06-28 Asml Netherlands B.V. Lithographic apparatus and method
US7628865B2 (en) * 2006-04-28 2009-12-08 Asml Netherlands B.V. Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus
JP2008016825A (ja) * 2006-06-09 2008-01-24 Canon Inc 露光装置、除去方法及びデバイス製造方法
US7903234B2 (en) * 2006-11-27 2011-03-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
WO2011016254A1 (ja) * 2009-08-07 2011-02-10 株式会社ニコン 移動体装置、露光装置及び露光方法、並びにデバイス製造方法
US20110032495A1 (en) * 2009-08-07 2011-02-10 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP4761589B1 (ja) * 2010-12-22 2011-08-31 レーザーテック株式会社 汚染防止装置、汚染防止方法、露光装置、及びパターン付きウエハの製造方法
US20130235357A1 (en) * 2012-03-12 2013-09-12 Kla-Tencor Corporation System and Method for Particle Control Near A Reticle
WO2020109152A1 (en) * 2018-11-27 2020-06-04 Asml Netherlands B.V. Membrane cleaning apparatus
CN120802570A (zh) * 2019-08-26 2025-10-17 Asml荷兰有限公司 用于光刻设备的防护膜隔膜
US11687012B2 (en) * 2021-06-25 2023-06-27 Taiwan Semiconductor Manufacturing Company, Ltd. Reduce mask defect impact by contamination decompose

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3721940A1 (de) * 1987-07-02 1989-01-12 Ibm Deutschland Entfernen von partikeln von oberflaechen fester koerper durch laserbeschuss
JPS6412526U (cg-RX-API-DMAC10.html) 1987-07-13 1989-01-23
JPH10223512A (ja) * 1997-02-10 1998-08-21 Nikon Corp 電子ビーム投影露光装置
EP1011128A4 (en) * 1997-07-22 2004-11-10 Nikon Corp PROJECTION EXPOSURE METHOD, PROJECT ALIGNMENT DEVICE AND METHOD FOR PRODUCING AND OPTICALLY CLEANING THE ALIGNMENT DEVICE
US6385290B1 (en) * 1998-09-14 2002-05-07 Nikon Corporation X-ray apparatus
JP2000088999A (ja) 1998-09-14 2000-03-31 Nikon Corp Ｘ線装置
JP3947374B2 (ja) * 2000-08-25 2007-07-18 エーエスエムエル ネザーランズ ビー．ブイ． 平板投影装置および素子製造方法
JP3940378B2 (ja) * 2003-05-26 2007-07-04 沖電気工業株式会社 半導体露光装置の自己洗浄方法と自己洗浄用透過板
JP2005129898A (ja) * 2003-09-29 2005-05-19 Canon Inc 露光装置およびデバイス製造方法

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