JP2006110403A - Cleaning apparatus - Google Patents

Cleaning apparatus Download PDF

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JP2006110403A
JP2006110403A JP2004297416A JP2004297416A JP2006110403A JP 2006110403 A JP2006110403 A JP 2006110403A JP 2004297416 A JP2004297416 A JP 2004297416A JP 2004297416 A JP2004297416 A JP 2004297416A JP 2006110403 A JP2006110403 A JP 2006110403A
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water
discharge
high voltage
electrode
counter electrode
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Makoto Shimizu
真 清水
Masakatsu Iwashimizu
正勝 岩清水
Yuji Inoue
雄二 井上
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Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a cleaning apparatus for removing an indoor bad smell, a virus, a mold or the like safely and efficiently without getting any user's help. <P>SOLUTION: The cleaning apparatus is provided with a discharge electrode 2, a counter electrode 3, a pulsative high voltage applying means 4 for applying a pulsative high voltage between these electrodes, a water generating means 5 for generating water on the discharge electrode 2 and/or the counter electrode 3 without supplying water and a heat sink 6 arranged adjacently to the water generating means. A radical, an ion and a minute particle of water containing a large quantity of radicals and ions are produced in a discharge zone by utilizing the water and electric discharge generated between the electrodes without getting any user's help and without supplying water. The produced radical, ion and minute particle of water are discharged to the downstream side of the discharge zone. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、気体、液体、固体などの浄化装置に関するものである。   The present invention relates to a purification device for gas, liquid, solid and the like.

従来、イオンやオゾン等の活性粒子を利用して、食品・調理用品などの食に関連する物体や公衆衛生上で微生物が問題となる物体の表面、これらの物体を収納する空間に存在する微生物の繁殖を防止する方法が知られている。   Conventionally, using active particles such as ions and ozone, food-related items such as food and cooking utensils, the surface of objects where microorganisms are problematic in public health, and the microorganisms that exist in the space where these objects are stored There are known methods for preventing the propagation of potatoes.

例えば、空気などの気体を電離室に導いてイオン化およびオゾン化させる際の放電電流を制御することにより、所定の低濃度のオゾンと高濃度のイオンを含む気体を発生させ、前記電離室あるいはそれに連通する空間内で、あるいは電離室で発生した気体を物体に吹き付けることによって、オゾンとイオンとの相乗効果で微生物の繁殖を防止するようにした微生物繁殖防止方法および装置がある(例えば、特許文献1参照)。   For example, by controlling a discharge current when ionizing and ozonizing a gas such as air to the ionization chamber, a gas containing a predetermined low concentration of ozone and high concentration of ions is generated, and the ionization chamber or the ionization chamber is generated. There is a method and apparatus for preventing microbial growth in which microorganisms are prevented from propagating by synergistic effects of ozone and ions by blowing a gas generated in an ionization chamber in a communicating space or on an object (for example, patent document) 1).

また、水タンクに水道水を供給させ、供給された水に吸水性の電極を浸すことにより、この水と電極と対向電極間の放電とを利用し、放電領域でより長寿命な酸化力の高いラジカルやイオン等、およびそれらを含んだ微細な水粒子を生成し、放電領域下流に放出させ、放出された領域を殺菌、脱臭、有害物質除去する放電霧化技術応用浄化装置がある。
特開平9−108313号公報
In addition, by supplying tap water to the water tank and immersing the water-absorbing electrode in the supplied water, this water and the discharge between the electrode and the counter electrode can be used to provide a longer-life oxidizing power in the discharge region. There is a discharge atomization technology applied purification device that generates high radicals, ions, and the like and fine water particles containing them, and discharges them downstream of the discharge region, and sterilizes, deodorizes, and removes harmful substances from the discharged region.
JP-A-9-108313

しかしながら、上記従来の微生物繁殖防止方法および装置は、物体の表面や収納空間に存在する微生物を処理対象とするものであるが、生成されたイオン等は非常に不安定なため、イオンとしての寿命が非常に短く、物体に吹き付けるまえに安定な物質に変化してしまい、十分に微生物の繁殖を防止することができないという問題があった。   However, the above-described conventional method and apparatus for preventing microbial growth are intended to treat microorganisms existing on the surface of the object or the storage space, but the generated ions and the like are very unstable, so that the lifetime as ions is reduced. However, it was very short and changed to a stable substance before spraying on the object, and there was a problem that it was not possible to sufficiently prevent the growth of microorganisms.

また、上記従来の放電霧化技術応用浄化装置は、水を供給させなくてはならず、水がなくなれば供給、給水しなくてはならないとういう、使用者の手をわずらわす必要があった。   In addition, the conventional discharge atomization technology applied purification device described above needs to be supplied with water, and when the water runs out, it is necessary to bother the user to supply and supply water. It was.

本発明は上記問題を解決するもので、使用者の手をわずらわす必要なく、より安全かつ効率的に、室内の臭気、ウイルス、かびなどの、脱臭や除菌を行う浄化装置を提供することを目的とするものである。   The present invention solves the above-described problems, and provides a purification device that deodorizes and disinfects indoor odors, viruses, fungi, and the like more safely and efficiently without the need for bothering the user. It is for the purpose.

上記課題を解決するために、本発明の浄化装置は、放電電極と、対向電極と、これらの電極間に超音波領域のパルス周波数の高電圧を印加する超音波パルス高電圧印加手段と、前記放電電極および/または前記対向電極に無給水で水を発生させる水発生手段と、前記水発生手段に近接させ設けたヒートシンクとを備えたもので、使用者の手をわずらわすことなく、無給水で、電極間に発生させた水と放電を利用し、放電領域でラジカルやイオン等、およびそれらを多量に含んだ微細な水粒子を生成し、前記放電領域下流に放出させさせることができる。また、パルス状の高電圧を印加することにより、人体に有害なオゾンの発生を低減し、火花放電を抑制することが可能となる。また、ヒートシンクを水発生手段5に密着させ設けておくと、例えば水発生手段をペルチェ素子としたとき、一方が冷却面であれば他方は放熱面になり、この放熱面に、ヒートシンクを密着することにより効率よく放電電極が露点以下の温度になり、水の発生を促進できる。   In order to solve the above problems, a purification device of the present invention includes a discharge electrode, a counter electrode, an ultrasonic pulse high voltage applying unit that applies a high voltage of a pulse frequency in an ultrasonic region between these electrodes, It comprises a water generating means for generating water without supplying water to the discharge electrode and / or the counter electrode, and a heat sink provided close to the water generating means, so that there is no need to bother the user. With water supply, water and discharge generated between the electrodes can be used to generate radicals, ions, etc., and fine water particles containing a large amount of them in the discharge region, which can be released downstream of the discharge region. . Further, by applying a pulsed high voltage, generation of ozone harmful to the human body can be reduced, and spark discharge can be suppressed. Also, if the heat sink is provided in close contact with the water generating means 5, for example, when the water generating means is a Peltier element, if one is a cooling surface, the other becomes a heat radiating surface, and the heat sink is in close contact with the heat radiating surface. As a result, the discharge electrode can be efficiently brought to a temperature below the dew point, and the generation of water can be promoted.

以上のように本発明によれば、使用者の手をわずらわす必要なく、より安全かつ効率的に、室内の臭気、ウイルス、かびなどの、脱臭や除菌を行う浄化装置を提供できる。   As described above, according to the present invention, it is possible to provide a purification device that deodorizes and disinfects indoor odors, viruses, fungi, and the like more safely and efficiently without the need for bothering the user.

第1の発明は、放電電極と、対向電極と、これらの電極間に超音波領域のパルス周波数の高電圧を印加する超音波パルス高電圧印加手段と、前記放電電極および/または前記対向電極に無給水で水を発生させる水発生手段と、前記水発生手段に近接させ設けたヒートシンクとを備えたもので、使用者の手をわずらわすことなく、無給水で、電極間に発生させた水と放電を利用し、放電領域でラジカルやイオン等、およびそれらを多量に含んだ微細な水粒子を生成し、前記放電領域下流に放出させさせることができる。また、パルス状の高電圧を印加することにより、人体に有害なオゾンの発生を低減し、火花放電を抑制することが可能となる。また、ヒートシンクを水発生手段5に密着させ設けておくと、例えば水発生手段をペルチェ素子としたとき、一方が冷却面であれば他方は放熱面になり、この放熱面に、ヒートシンクを密着することにより効率よく放電電極が露点以下の温度になり、水の発生を促進できる。   A first aspect of the invention relates to a discharge electrode, a counter electrode, ultrasonic pulse high voltage applying means for applying a high voltage having a pulse frequency in an ultrasonic region between these electrodes, the discharge electrode and / or the counter electrode. It is provided with water generating means for generating water without water supply, and a heat sink provided close to the water generating means, and is generated between the electrodes without water supply without bothering the user's hand. By utilizing water and discharge, radicals, ions, etc., and fine water particles containing a large amount of them can be generated in the discharge region and released downstream of the discharge region. Further, by applying a pulsed high voltage, generation of ozone harmful to the human body can be reduced, and spark discharge can be suppressed. Also, if the heat sink is provided in close contact with the water generating means 5, for example, when the water generating means is a Peltier element, if one is a cooling surface, the other becomes a heat radiating surface, and the heat sink is in close contact with the heat radiating surface. As a result, the discharge electrode can be efficiently brought to a temperature below the dew point, and the generation of water can be promoted.

第2の発明は、放電電極および/または対向電極に突起を設けたもので、効率よく放電を発生させることができ、電極間に発生させた水と放電を利用し、放電領域でラジカルやイオン等、およびそれらを多量に含んだ微細な水粒子を生成し、前記放電領域下流に放出させることができる。   In the second invention, protrusions are provided on the discharge electrode and / or the counter electrode, the discharge can be generated efficiently, and water and discharge generated between the electrodes are used to generate radicals and ions in the discharge region. Etc., and fine water particles containing a large amount of them can be generated and discharged downstream of the discharge region.

第3の発明は、水発生手段を設けた電極は、親水性処理を施したもので、電極表面に薄膜状の結露水が生成でき、より効率よく放電を発生させることができ、放電領域でより多量のラジカルやイオン等、およびそれらを多量に含んだ微細な水粒子を生成し、前記放電領域下流に放出させることができる。   In a third aspect of the invention, the electrode provided with the water generating means is subjected to a hydrophilic treatment, so that a thin film of condensed water can be generated on the electrode surface, and discharge can be generated more efficiently. A larger amount of radicals, ions, etc., and fine water particles containing a larger amount of them can be generated and released downstream of the discharge region.

第4の発明は、対向電極は、網状や環状の形状とするもので、放電領域で多量のラジカルやイオン等、およびそれらを多量に含んだ微細な水粒子を生成した後、対向電極に阻害されることなく前記放電領域下流により効率よく放出させることができるとともに、サイズを小さくすることができる。   According to a fourth aspect of the present invention, the counter electrode has a net-like or annular shape, and generates a large amount of radicals and ions in the discharge region and fine water particles containing a large amount thereof, and then inhibits the counter electrode. Thus, the discharge can be performed more efficiently downstream and the size can be reduced.

第5の発明は、超音波パルス高電圧印加手段は、所定の極小パルス幅の高電圧を印加するもので、さらに、電圧印加時間を短縮して人体に有害なオゾンの発生を低減すること、また火花放電を抑制することができるとともに、放電音を小さくすることができる。   According to a fifth aspect of the invention, the ultrasonic pulse high voltage application means applies a high voltage having a predetermined minimum pulse width, and further reduces the generation of ozone harmful to the human body by shortening the voltage application time. In addition, spark discharge can be suppressed and the discharge sound can be reduced.

第6の発明は、超音波高電圧印加手段は、負のパルス波形の高電圧を印加するもので、さらに、マイナスイオンを含んだきれいな空気を供給することができる。   According to a sixth aspect of the invention, the ultrasonic high voltage applying means applies a high voltage having a negative pulse waveform, and can supply clean air containing negative ions.

(実施の形態1)
以下、本発明の実施の形態1について図面を参照しながら説明する。
(Embodiment 1)
Embodiment 1 of the present invention will be described below with reference to the drawings.

図1および図2は本発明の一実施形態における浄化装置の概略図および断面図である。なお、以下では空気などの気体について説明するが、水などの液体、固体でも同様である。   1 and 2 are a schematic view and a cross-sectional view of a purification device according to an embodiment of the present invention. In addition, although gas, such as air, is demonstrated below, it is the same also with liquids, such as water, and solid.

浄化ユニット1は、気体の流路内に配置されるものであり、放電電極2が配置され、放電電極2の対向に対向電極3が配置されていて、放電電極2と対向電極3との間に形成される放電領域9が構成されている。7は浄化ユニット上流気流、8は浄化ユニット下流気
流を示す。
The purification unit 1 is arranged in a gas flow path, a discharge electrode 2 is arranged, a counter electrode 3 is arranged opposite to the discharge electrode 2, and between the discharge electrode 2 and the counter electrode 3. A discharge region 9 is formed. Reference numeral 7 denotes the purification unit upstream airflow, and 8 denotes the purification unit downstream airflow.

超音波パルス高電圧印加装置4は、放電電極2に接続する電極(プラスまたはマイナス)41と、対向電極3に接続するアース電極42とを有し、放電電極2と対向電極3との間に、放電を発生させ得るパルス状の高電圧を印加するように構成されている。   The ultrasonic pulse high-voltage applying device 4 includes an electrode (plus or minus) 41 connected to the discharge electrode 2 and a ground electrode 42 connected to the counter electrode 3, and between the discharge electrode 2 and the counter electrode 3. The pulsed high voltage capable of generating discharge is applied.

この超音波パルス高電圧印加装置4としては、例えば倍電圧回路にIGBT(Inslated
Gate Bipolar Transistor)などのスイッチング手段を配して、所望のパルス波形かつ高周波数の電圧を生成し、高圧トランスで昇圧するようにした電装回路などが使用される。しかし所望のパルス波形、周波数の高電圧を印加できるものであれば、これに限定されず使用可能である。
As this ultrasonic pulse high voltage application device 4, for example, an IGBT (Inslated) is added to a voltage doubler circuit.
An electrical circuit or the like in which switching means such as a gate bipolar transistor) is arranged to generate a desired pulse waveform and a high-frequency voltage and boosted by a high-voltage transformer is used. However, as long as a high voltage having a desired pulse waveform and frequency can be applied, the present invention is not limited to this and can be used.

水発生手段5は、例えばペルチェ素子など無給水で水を発生させるのもであり、放電電極2に密着させ設けておく。これにより、放電電極2が露点以下の温度になると放電電極2の表面に結露水10が発生する。例えば、温度が22℃で湿度が30%のとき、放電電極2が露点すなわち3.6℃以下の温度になると放電電極2の表面に結露水10が発生する。なお、ペルチェ素子を対向電極3に密着させ設けておいてもかまわない。   The water generating means 5 generates water without supplying water, such as a Peltier element, and is provided in close contact with the discharge electrode 2. Thereby, when the discharge electrode 2 becomes a temperature below the dew point, condensed water 10 is generated on the surface of the discharge electrode 2. For example, when the temperature is 22 ° C. and the humidity is 30%, dew condensation water 10 is generated on the surface of the discharge electrode 2 when the discharge electrode 2 reaches a dew point, that is, a temperature of 3.6 ° C. or lower. Note that the Peltier element may be provided in close contact with the counter electrode 3.

さらに、ヒートシンク6は、水発生手段5に密着させ設けておく。例えば水発生手段5をペルチェ素子とすると、一方が冷却面であれば他方は放熱面になり、この放熱面に、ヒートシンク6を密着することにより効率よく放電電極2が露点以下の温度になる。   Furthermore, the heat sink 6 is provided in close contact with the water generating means 5. For example, if the water generating means 5 is a Peltier element, if one is a cooling surface, the other is a heat radiating surface, and the heat sink 6 is brought into close contact with the heat radiating surface, whereby the discharge electrode 2 is efficiently brought to a temperature below the dew point.

以下、上記構成における作用を説明する。   Hereinafter, the operation of the above configuration will be described.

超音波パルス高電圧印加装置4によって放電電極2と対向電極3との間に高電圧を印加するとともに、水発生手段9により放電電極2に結露水10を発生させる。これにより電極間に発生させた放電と結露水10を利用し、放電領域9でラジカルやイオン等、およびそれらを含んだ微細な水粒子11を生成し、放電領域下流すなわち、浄化ユニット下流8に放出させることができる。   A high voltage is applied between the discharge electrode 2 and the counter electrode 3 by the ultrasonic pulse high voltage application device 4, and condensed water 10 is generated on the discharge electrode 2 by the water generating means 9. As a result, the discharge generated between the electrodes and the dew condensation water 10 are used to generate radicals, ions, and the like and fine water particles 11 containing them in the discharge region 9, and the downstream of the discharge region, that is, the purification unit downstream 8. Can be released.

簡略化すると例えば   For example, if simplified

Figure 2006110403
Figure 2006110403

の反応がおこり、放電領域9の下流に、OHラジカルやイオン、H2O2ラジカルやイオン等、酸化力の高いラジカルやイオン等、およびそれらを含んだ水粒子11を豊富に生成することができる。 As a result of this reaction, downstream of the discharge region 9, OH radicals and ions, H2O2 radicals and ions, etc., radicals and ions with high oxidizing power, and water particles 11 containing them can be produced in abundance.

この生成されたラジカルやイオン等、およびそれらを含んだ水粒子11は酸化力が高く、微生物の外壁やタンパク質を破壊することができ、微生物は殺滅または不活化される。すなわち、生成されたOHラジカルやイオン、H2O2ラジカルやイオン等、酸化力の高いラジカルやイオン等、およびそれらを含んだ水粒子11を放電領域9の下流に放出させることにより、放出された領域を殺菌、脱臭、有害物質除去することができ、浄化される。   The generated radicals and ions and the water particles 11 containing them have high oxidizing power, can destroy the outer wall and protein of the microorganism, and the microorganism is killed or inactivated. That is, by releasing the generated OH radicals and ions, H 2 O 2 radicals and ions, radicals and ions having high oxidizing power, and water particles 11 containing them, the discharged region is discharged downstream. It can be sterilized, deodorized, harmful substances removed and purified.

印加すべき超音波領域のパルス状の高電圧は、例えば図5から図9に示すように、効率
よく放電を発生させ得る高電圧であり、放電電極2と対向電極3との間隙の大きさによっても異なるが、たとえば放電電極2と対向電極3との間隙が約10mmである時には約7kV以上、間隙が約8mmである時には約6kV以上、間隙が約5mmである時には約4kV以上のパルス波形の歪んだ高電圧が必要である。
The pulsed high voltage in the ultrasonic region to be applied is a high voltage that can efficiently generate a discharge as shown in FIGS. 5 to 9, for example, and the size of the gap between the discharge electrode 2 and the counter electrode 3. For example, a pulse waveform of about 7 kV or more when the gap between the discharge electrode 2 and the counter electrode 3 is about 10 mm, about 6 kV or more when the gap is about 8 mm, and about 4 kV or more when the gap is about 5 mm. A distorted high voltage is required.

なお、パルス幅を極小パルス幅とすることによって、電圧を瞬時に立ち上がらせることが可能になり、それにより、放電領域8でより多量の電子を高速飛散させること、また電圧印加時間を短縮して人体に有害なオゾンの発生を低減すること、また火花放電を抑制することが可能となる。できるだけ小さいパルス幅が望ましいが、約5μsec以下、すなわち数μsec以下とすることで、より好ましい浄化効果が得られる。   Note that by setting the pulse width to a minimum pulse width, it is possible to instantaneously raise the voltage, thereby causing a larger amount of electrons to be scattered at high speed in the discharge region 8 and reducing the voltage application time. It is possible to reduce generation of ozone harmful to the human body and to suppress spark discharge. Although a pulse width as small as possible is desirable, a more preferable purification effect can be obtained by setting it to about 5 μsec or less, that is, several μsec or less.

また負の超音波のパルス状の高電圧を印加することによって、放電領域9でマイナスイオンを生成することができ、下流気流7としてマイナスイオンを含んだきれいな空気を供給して、リラックスできる雰囲気を提供することが可能となる。   Further, by applying a high voltage in the form of negative ultrasonic pulses, negative ions can be generated in the discharge region 9, and a clean air containing negative ions is supplied as the downstream airflow 7 to create a relaxing atmosphere. It becomes possible to provide.

図3、図4は、突起を設けた放電電極21、さらに網状や環状の形状の対向電極31のときの概略図である。なお、突起を設けた放電電極21について、放電が効率的に可能であれば、その突起部の本数についてはなんら限定しない。これにより、突起を設けた放電電極21の突起先端で効率よく放電を発生させることができる。また、酸化力の高い水粒子11は対向電極31に阻害されることなく浄化ユニット下流8により効率よく放出させることができるとともに、浄化ユニット1のサイズを小さくすることができる。   3 and 4 are schematic views of the discharge electrode 21 provided with protrusions and the counter electrode 31 having a net shape or an annular shape. In addition, about the discharge electrode 21 which provided the protrusion, if discharge is possible efficiently, the number of the protrusion part will not be limited at all. Thereby, discharge can be efficiently generated at the protrusion tip of the discharge electrode 21 provided with the protrusion. Further, the water particles 11 having a high oxidizing power can be efficiently discharged from the purification unit downstream 8 without being inhibited by the counter electrode 31, and the size of the purification unit 1 can be reduced.

また、放電電極21を親水性処理を行う。これにより、電極表面に薄膜状の結露水101が生成でき、より効率よく放電を発生させることができる。   Further, the discharge electrode 21 is subjected to hydrophilic treatment. Thereby, the thin film-shaped condensed water 101 can be produced | generated on the electrode surface, and discharge can be generated more efficiently.

なお、本浄化装置を、例えば風量の大きい、空気清浄機や空気調和機に搭載すると、さらに浄化性能を向上させることができる。   In addition, if this purification apparatus is mounted in, for example, an air cleaner or an air conditioner having a large air volume, the purification performance can be further improved.

本発明の一実施形態における浄化装置の概略図Schematic of the purification device in one embodiment of the present invention 図1の浄化装置の断面図Sectional view of the purification device of FIG. 本発明の一実施形態における浄化装置の概略図Schematic of the purification device in one embodiment of the present invention 図3の浄化装置の断面図Sectional view of the purification device of FIG. 本発明の一実施形態におけるパルス状の高電圧波形の概略図Schematic of pulsed high voltage waveform in one embodiment of the present invention 同他のパルス状の高電圧波形の概略図Schematic of other pulsed high voltage waveforms 同他のパルス状の高電圧波形の概略図Schematic of other pulsed high voltage waveforms 同他のパルス状の高電圧波形の概略図Schematic of other pulsed high voltage waveforms 同他のパルス状の高電圧波形の概略図Schematic of other pulsed high voltage waveforms

符号の説明Explanation of symbols

1 浄化ユニット
2 放電電極
3 対向電極
4 パルス高電圧印加装置
5 水発生手段(ペルチェ素子)
6 ヒートシンク

DESCRIPTION OF SYMBOLS 1 Purification unit 2 Discharge electrode 3 Counter electrode 4 Pulse high voltage application apparatus 5 Water generating means (Peltier device)
6 Heat sink

Claims (6)

放電電極と、対向電極と、これらの電極間に超音波領域のパルス周波数の高電圧を印加する超音波パルス高電圧印加手段と、前記放電電極および/または前記対向電極に無給水で水を発生させる水発生手段と、前記水発生手段に近接させ設けたヒートシンクとを備えた浄化装置。 A discharge electrode, a counter electrode, ultrasonic pulse high voltage applying means for applying a high voltage of a pulse frequency in the ultrasonic region between these electrodes, and generating water without supplying water to the discharge electrode and / or the counter electrode A purifier comprising: water generating means to be moved; and a heat sink provided close to the water generating means. 放電電極および/または対向電極に突起を設けた請求項1記載の浄化装置。 The purification apparatus according to claim 1, wherein a protrusion is provided on the discharge electrode and / or the counter electrode. 水発生手段を設けた電極は、親水性処理を施した請求項1または2記載の浄化装置。 The purification apparatus according to claim 1 or 2, wherein the electrode provided with the water generating means is subjected to a hydrophilic treatment. 対向電極は、網状や環状の形状とする請求項1〜3のいずれか1項に記載の浄化装置。 The purification apparatus according to any one of claims 1 to 3, wherein the counter electrode has a net shape or an annular shape. 超音波パルス高電圧印加手段は、所定の極小パルス幅の高電圧を印加する請求項1〜4のいずれか1項に記載の浄化装置。 The purification apparatus according to any one of claims 1 to 4, wherein the ultrasonic pulse high voltage applying means applies a high voltage having a predetermined minimum pulse width. 超音波パルス高電圧印加手段は、負のパルス波形の高電圧を印加する請求項1〜5のいずれか1項に記載の浄化装置。 The purification apparatus according to any one of claims 1 to 5, wherein the ultrasonic pulse high voltage applying means applies a high voltage having a negative pulse waveform.
JP2004297416A 2004-10-12 2004-10-12 Cleaning apparatus Pending JP2006110403A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006216468A (en) * 2005-02-04 2006-08-17 Toyohashi Univ Of Technology Plasma surface treatment method, plasma generation apparatus, and plasma surface treatment apparatus
EP2301588A1 (en) * 2008-07-16 2011-03-30 SANYO Electric Co., Ltd. Electrical equipment having air cleaning function

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006216468A (en) * 2005-02-04 2006-08-17 Toyohashi Univ Of Technology Plasma surface treatment method, plasma generation apparatus, and plasma surface treatment apparatus
EP2301588A1 (en) * 2008-07-16 2011-03-30 SANYO Electric Co., Ltd. Electrical equipment having air cleaning function
EP2301588A4 (en) * 2008-07-16 2012-02-15 Sanyo Electric Co Electrical equipment having air cleaning function
US8702850B2 (en) 2008-07-16 2014-04-22 Sanyo Electric Co., Ltd. Electric device with air cleaning function

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