JP2006103223A - Manufacturing method of metal mask - Google Patents

Manufacturing method of metal mask Download PDF

Info

Publication number
JP2006103223A
JP2006103223A JP2004294713A JP2004294713A JP2006103223A JP 2006103223 A JP2006103223 A JP 2006103223A JP 2004294713 A JP2004294713 A JP 2004294713A JP 2004294713 A JP2004294713 A JP 2004294713A JP 2006103223 A JP2006103223 A JP 2006103223A
Authority
JP
Japan
Prior art keywords
wall
opening
abrasive
metal mask
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004294713A
Other languages
Japanese (ja)
Inventor
Hajime Suzuki
鈴木  元
Hideki Hayashi
秀樹 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASAHITEC CO Ltd
Original Assignee
ASAHITEC CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASAHITEC CO Ltd filed Critical ASAHITEC CO Ltd
Priority to JP2004294713A priority Critical patent/JP2006103223A/en
Publication of JP2006103223A publication Critical patent/JP2006103223A/en
Pending legal-status Critical Current

Links

Images

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a metal mask which keeps the smoothness of the inner wall of an opening part enhanced and thereby stabilizes the quantity of application of a solder paste. <P>SOLUTION: The opening part of a pattern for printing is formed in a metal plate 10 by exposure to a laser light. An abrasive solution containing minute abrasive grains is encapsulated in the opening part and the inner wall of the opening part is polished by applying vibration to the metal plate 10. Then, an abrasive material consisting of the abrasive solution 30 and extremely thin fibers 50 is brought into contact with the inner wall 12 of the opening part to polish the inner wall 12. The abrasive solution 30 is a mixture of a nitrate containing minute abrasive grains 31 of alumina and water. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

この発明は、印刷パターン用の開口部を有するメタルマスクの製造方法に関する。   The present invention relates to a method for manufacturing a metal mask having an opening for a printing pattern.

一般に配線基板に印刷パターンを形成するためにメタルマスクが用いられている。この印刷パターンは、メタルマスクを配線基板の上部に設置し、ハンダペーストをスキージによってメタルマスクのパターン開口部に塗り込み、該メタルマスクを引き上げることによってハンダペーストが配線基板に塗布されて形成される。   In general, a metal mask is used to form a printed pattern on a wiring board. This printed pattern is formed by placing a metal mask on the top of the wiring substrate, applying solder paste to the pattern opening of the metal mask with a squeegee, and lifting the metal mask to apply the solder paste to the wiring substrate. .

ハンダペーストの塗布量を安定させるため、メタルマスクの開口部内壁の表面粗さを小さくする必要がある。この開口部内壁の表面粗さを小さくする方法として、粒状研磨材を吹き付けてサンドブラストするものが知られている(特許文献1参照。)。   In order to stabilize the amount of solder paste applied, it is necessary to reduce the surface roughness of the inner wall of the opening of the metal mask. As a method for reducing the surface roughness of the inner wall of the opening, there is known a method in which a granular abrasive is sprayed and sandblasted (see Patent Document 1).

しかしながら、電子部品の小型化によってメタルマスクの開口部が狭小化したことや流動性に優れた鉛を含まないハンダペーストを用いるようになったことから、前記開口部内壁の平滑度を高めてハンダペーストの塗布量を安定させることが求められている。
特開平9−57937号公報
However, since the opening of the metal mask has been narrowed due to the miniaturization of electronic components and the use of solder paste that does not contain lead and has excellent fluidity, the smoothness of the inner wall of the opening has been increased and solder has been used. There is a demand for stabilizing the amount of paste applied.
JP-A-9-57937

この発明は、このような状況に鑑み提案されたものであって、開口部内壁の平滑度を高めてハンダペーストの塗布量を安定させるメタルマスクの製造方法を提供することを目的とする。   The present invention has been proposed in view of such a situation, and an object of the present invention is to provide a method for manufacturing a metal mask that increases the smoothness of the inner wall of the opening and stabilizes the amount of solder paste applied.

すなわち、請求項1の発明は、金属板にレーザ光を照射して印刷用のパターン開口部を形成し、前記開口部内に微細な砥粒を含む研磨剤溶液を封入し金属板に振動を加えて該開口部の内壁を研磨するとともに、次いで、前記開口部内壁に前記研磨剤溶液と極細繊維よりなる研磨材を接触させて内壁を研磨することを特徴とするメタルマスクの製造方法に係る。   That is, the invention of claim 1 irradiates a metal plate with a laser beam to form a pattern opening for printing, encloses an abrasive solution containing fine abrasive grains in the opening and applies vibration to the metal plate. Then, the inner wall of the opening is polished, and then the inner wall is polished by bringing the abrasive solution and an ultrafine fiber into contact with the inner wall of the opening.

請求項2の発明は、請求項1において、前記研磨剤溶液が、アルミナの微細な砥粒を含む硝酸塩と水との混合液であるメタルマスクの製造方法に係る。   A second aspect of the present invention relates to the method of manufacturing a metal mask according to the first aspect, wherein the abrasive solution is a mixed solution of nitrate and water containing fine abrasive grains of alumina.

請求項3の発明は、請求項1において、前記極細繊維がメラミン樹脂発泡体であるメタルマスクの製造方法に係る。   Invention of Claim 3 concerns on the manufacturing method of the metal mask in which the said ultrafine fiber is a melamine resin foam in Claim 1.

請求項1の発明に係るメタルマスクの製造方法によれば、金属板にレーザ光を照射して印刷用のパターン開口部を形成し、前記開口部内に微細な砥粒を含む研磨剤溶液を封入し金属板に振動を加えて該開口部の内壁を研磨するとともに、次いで、前記開口部内壁に前記研磨剤溶液と極細繊維よりなる研磨材を接触させて内壁を研磨することから、開口部内壁の平滑度を高めてハンダペーストの塗布量を安定させるメタルマスクを製造することができる。   According to the metal mask manufacturing method of the first aspect of the invention, a pattern opening for printing is formed by irradiating a metal plate with laser light, and an abrasive solution containing fine abrasive grains is enclosed in the opening. Since the inner wall of the opening is polished by applying vibration to the metal plate, and then the inner wall is polished by contacting the abrasive solution made of the abrasive solution and ultrafine fibers with the inner wall of the opening. The metal mask which raises the smoothness of this and stabilizes the application quantity of solder paste can be manufactured.

請求項2の発明によれば、請求項1において、前記研磨剤溶液が、アルミナの微細な砥粒を含む硝酸塩と水との混合液であることから、微細な砥粒によって前記開口部内壁を平滑にするとともに、硝酸塩と水との混合液によって該開口部内壁を洗浄することができる。   According to the invention of claim 2, since the abrasive solution is a mixed solution of nitrate and water containing fine abrasive grains of alumina in claim 1, the inner wall of the opening is formed by fine abrasive grains. While smoothing, the inner wall of the opening can be washed with a mixed solution of nitrate and water.

請求項3の発明によれば、請求項1において、前記極細繊維がメラミン樹脂発泡体であることから、安価な極細繊維によって前記開口部内壁の平滑度を高めることができる。   According to the invention of claim 3, since the ultrafine fiber is a melamine resin foam in claim 1, the smoothness of the inner wall of the opening can be increased by an inexpensive ultrafine fiber.

以下添付の図面に従ってこの発明の実施例を説明する。図1はこの発明の一実施例に係るメタルマスクの製造方法のうちレーザ光によってパターン開口部を形成する工程を示す概略側面図、図2はレーザ加工によるパターン開口部の概略断面図、図3はパターン開口部の内壁を砥粒を含む研磨剤溶液によって研磨する工程を示す概略断面図、図4はパタ−ン開口部の内壁を前記研磨剤溶液と極細繊維によって研磨する工程を示す概略断面図、図5はハンダ印刷枚数とハンダペーストの抜け重量との関係を示すグラフである。   Embodiments of the present invention will be described below with reference to the accompanying drawings. 1 is a schematic side view showing a step of forming a pattern opening by laser light in a metal mask manufacturing method according to one embodiment of the present invention, FIG. 2 is a schematic sectional view of a pattern opening by laser processing, and FIG. FIG. 4 is a schematic cross-sectional view showing the step of polishing the inner wall of the pattern opening with an abrasive solution containing abrasive grains, and FIG. 4 is a schematic cross-section showing the step of polishing the inner wall of the pattern opening with the abrasive solution and ultrafine fibers. FIG. 5 and FIG. 5 are graphs showing the relationship between the number of solder printed sheets and the weight of the solder paste removed.

図1及び図2に図示すように、この発明に係るメタルマスクの製造方法によって、レーザ光1を金属板10に照射して印刷用のパターン開口部11を形成する。金属板10はレーザ加工装置のXYテーブル20に設置される。図示するように、レーザヘッド5がXYテーブル20の上部に配置されている。金属板10は、XYテーブル20により移動し、レーザヘッド5からのレーザ光1によって所定のパターン開口部11が形成される。ここでは、金属板10が、厚さ0.04mmのSUS304板によって構成される。符号25はレーザ加工装置の架台である。   As shown in FIG. 1 and FIG. 2, a pattern opening 11 for printing is formed by irradiating a metal plate 10 with a laser beam 1 by a metal mask manufacturing method according to the present invention. The metal plate 10 is installed on the XY table 20 of the laser processing apparatus. As shown in the figure, the laser head 5 is disposed on the top of the XY table 20. The metal plate 10 is moved by the XY table 20, and a predetermined pattern opening 11 is formed by the laser light 1 from the laser head 5. Here, the metal plate 10 is formed of a SUS304 plate having a thickness of 0.04 mm. Reference numeral 25 denotes a frame for the laser processing apparatus.

金属板10の開口部11は、レーザ加工によって生じる溶融物が内壁12に付着している。この内壁12は、図示するように、レーザ加工による凹凸も分布する。このメタルマスクの製造方法の発明は、図3に図示するように、前記開口部11内に砥粒31を含む研磨剤溶液30を封入し金属板10に振動を加えて該開口部11の内壁12を研磨する。これによって、内壁12に付着した溶融物を除去するとともに、内壁12を平滑にすることができる。   In the opening 11 of the metal plate 10, a melt produced by laser processing is attached to the inner wall 12. As shown in the figure, the inner wall 12 also has unevenness due to laser processing. As shown in FIG. 3, the metal mask manufacturing method according to the present invention encloses an abrasive solution 30 containing abrasive grains 31 in the opening 11, and applies vibration to the metal plate 10 to cause an inner wall of the opening 11. 12 is polished. As a result, the melt adhered to the inner wall 12 can be removed and the inner wall 12 can be smoothed.

研磨剤溶液30は、スポイトによって開口部11に注入される。研磨剤溶液30は、金属製の薄板40が開口部11を塞ぐことによって該開口部11内に封入される。この薄板40は、公知の半導体用UVテープ45によって金属板10に固定される。   The abrasive solution 30 is injected into the opening 11 with a dropper. The abrasive solution 30 is enclosed in the opening 11 by the metal thin plate 40 closing the opening 11. The thin plate 40 is fixed to the metal plate 10 by a known semiconductor UV tape 45.

金属板10は、公知のサンダポリシャ(リョービ株式会社製、DSP−125V)によって振動が加えられる。この実施例では、サンダポリシャが、無負荷の状態で1分間に8000〜9000回転して金属板10に振動を加えた。砥粒31は、振動が金属板10の表裏面に加えられることによって移動し、開口部内壁12を研磨する。ここでは、振動を、金属板10の表面に15分間加えた後に裏面に15分間加えた。この研磨を終了した後は、前記薄板40が外されて開口部11が水洗される。   The metal plate 10 is vibrated by a known sander polisher (Ryobi Corporation, DSP-125V). In this example, the sander polisher rotated 8000 to 9000 per minute with no load applied to the metal plate 10. The abrasive grains 31 move when vibration is applied to the front and back surfaces of the metal plate 10 to polish the inner wall 12 of the opening. Here, vibration was applied to the surface of the metal plate 10 for 15 minutes and then applied to the back surface for 15 minutes. After finishing this polishing, the thin plate 40 is removed and the opening 11 is washed with water.

次いで、図4に図示するように、開口部内壁12に前記研磨剤溶液30と極細繊維50からなる研磨材を接触させて内壁12を研磨する。研磨剤溶液30は、スポイトによって開口部11に注入される。研磨剤溶液30は、表面張力によって略球形状となって開口部11に付着する。研磨材を形成する極細繊維50は、図示するように、開口部11に入り込んで砥粒31とともに内壁12を研磨する。ここでは、内壁12が、極細繊維50を縦方向と横方向にそれぞれ30回往復させて研磨される。この極細繊維50は、手動あるいは自動制御によって往復運動する。   Next, as shown in FIG. 4, the inner wall 12 is polished by bringing the abrasive solution 30 and the fine fiber 50 into contact with the opening inner wall 12. The abrasive solution 30 is injected into the opening 11 with a dropper. The abrasive solution 30 becomes substantially spherical due to surface tension and adheres to the opening 11. As shown in the drawing, the ultrafine fiber 50 forming the abrasive enters the opening 11 and polishes the inner wall 12 together with the abrasive grains 31. Here, the inner wall 12 is polished by reciprocating the ultrafine fiber 50 30 times in the vertical direction and the horizontal direction. The ultrafine fibers 50 reciprocate manually or automatically.

極細繊維50は、太さが髪の毛の10000分の1であることから開口部11に入り込み、消しゴムが汚れをこすり落すようにして内壁12の平滑度を高めることができる。研磨した内壁12は、鏡面のような平滑な面に仕上がる。これによって、ハンダペーストが平滑度の高い内壁12を通じて配線基板に塗布されて、ハンダペーストの塗布量を安定させることができる。メタルマスク10の製造は、開口部11が水洗されて終了する。   Since the extra fine fiber 50 is 1 / 10,000th the thickness of the hair, it can enter the opening 11 and the eraser can rub off the dirt to increase the smoothness of the inner wall 12. The polished inner wall 12 is finished to a smooth surface such as a mirror surface. As a result, the solder paste is applied to the wiring board through the inner wall 12 having high smoothness, and the amount of solder paste applied can be stabilized. The manufacture of the metal mask 10 ends when the opening 11 is washed with water.

この実施例では、請求項2の発明として規定したように、前記研磨剤溶液30を、アルミナの微細な砥粒を含む硝酸塩と水との混合液とした。実施例の研磨剤溶液30は、公知の鏡面研磨用ポリシングコンパウンド(商品名:MECANOX DN−3、上村工業株式会社製)である。アルミナの砥粒は、平均粒子径が0.37〜0.43μmである。このアルミナの砥粒(研磨剤)は、粒子径が小さいことから狭い開口部11に入り込むことができ、内壁12を研磨して平滑にすることができる。研磨剤溶液30は、硝酸塩(研磨助剤)と水が混合されており、前記内壁12を洗浄する。   In this example, as defined in the invention of claim 2, the abrasive solution 30 was a mixed solution of nitrate and water containing fine abrasive grains of alumina. The abrasive | polishing agent solution 30 of an Example is a well-known polishing compound for mirror polishing (Brand name: MECANOX DN-3, Uemura Kogyo Co., Ltd. product). The alumina abrasive grains have an average particle size of 0.37 to 0.43 μm. Since the alumina abrasive grains (abrasive) have a small particle diameter, they can enter the narrow opening 11, and the inner wall 12 can be polished and smoothed. The abrasive solution 30 is a mixture of nitrate (polishing aid) and water, and cleans the inner wall 12.

実施例の極細繊維50は、請求項3の発明として規定したように、メラミン樹脂発泡体とした。これによって、前記開口部内壁12の平滑度を安価な極細繊維により高めることができる。   The ultrafine fiber 50 of the example was a melamine resin foam as defined in the invention of claim 3. As a result, the smoothness of the opening inner wall 12 can be enhanced by inexpensive ultrafine fibers.

実施例と比較例の各評価および評価方法を以下に示す。ハンダペーストの抜け性を、実施例と比較例の抜け重量を対比することによって評価した。対比するメタルマスクの製造方法等を表1に示す。抜け重量は、ハンダペーストがメタルマスク10の開口部11を通過する量であり、ハンダ印刷後の配線基板の重量から印刷前の配線基板の重量を減算することによって求めた。ここでは、抜け重量を、図5に図示するように、60枚の配線基板を用いて求めた。抜け重量が多いときは、前記開口部内壁12の平滑度が高く、ハンダペーストの塗布量が安定する。   Each evaluation and evaluation method of Examples and Comparative Examples are shown below. Solder paste was evaluated for removal by comparing the weights of the examples and comparative examples. Table 1 shows a metal mask manufacturing method and the like for comparison. The missing weight is the amount that the solder paste passes through the opening 11 of the metal mask 10, and was obtained by subtracting the weight of the wiring board before printing from the weight of the wiring board after solder printing. Here, the removal weight was obtained using 60 wiring boards as shown in FIG. When the removal weight is large, the smoothness of the inner wall 12 of the opening is high and the amount of solder paste applied is stabilized.

Figure 2006103223
Figure 2006103223

ハンダ印刷の状態を目視によって確認して評価した。ここでは、ハンダペーストの形状を、デジタルHDマイクロスコープ(株式会社キーエンス製、VH−7000)によって確認した。これに加えて、ハンダペーストが、開口部11を通過することができずハンダ印刷後にメタルマスク10の開口部11に付着していないかについても目視により確認して評価した。対比するメタルマスクの製造方法等と目視による評価を表2と表3に示す。   The state of solder printing was visually confirmed and evaluated. Here, the shape of the solder paste was confirmed with a digital HD microscope (manufactured by Keyence Corporation, VH-7000). In addition to this, whether or not the solder paste could not pass through the opening 11 and adhered to the opening 11 of the metal mask 10 after solder printing was also confirmed by visual inspection and evaluated. Tables 2 and 3 show the manufacturing method of the metal mask to be compared and the visual evaluation.

Figure 2006103223
Figure 2006103223

Figure 2006103223
Figure 2006103223

この発明の一実施例に係るメタルマスクの製造方法のうちレーザ光によってパターン開口部を形成する工程を示す概略側面図である。It is a schematic side view which shows the process of forming a pattern opening part with a laser beam among the manufacturing methods of the metal mask which concerns on one Example of this invention. レーザ加工によるパターン開口部の概略断面図である。It is a schematic sectional drawing of the pattern opening part by laser processing. パターン開口部の内壁を砥粒を含む研磨剤溶液によって研磨する工程を示す概略断面図である。It is a schematic sectional drawing which shows the process of grind | polishing the inner wall of a pattern opening part with the abrasive | polishing agent solution containing an abrasive grain. パタ−ン開口部の内壁を前記研磨剤溶液と極細繊維によって研磨する工程を示す概略断面図である。It is a schematic sectional drawing which shows the process of grind | polishing the inner wall of a pattern opening part with the said abrasive | polishing agent solution and an ultrafine fiber. ハンダ印刷枚数とハンダペーストの抜け重量との関係を示すグラフである。It is a graph which shows the relationship between the number of solder printed sheets and the weight of the solder paste.

符号の説明Explanation of symbols

1 レーザ光
10 金属板
11 印刷用のパターン開口部
12 パターン開口部の内壁
30 研磨剤溶液
31 砥粒
50 極細繊維
DESCRIPTION OF SYMBOLS 1 Laser beam 10 Metal plate 11 Pattern opening part for printing 12 Inner wall of pattern opening part 30 Abrasive solution 31 Abrasive grain 50 Extra fine fiber

Claims (3)

金属板にレーザ光を照射して印刷用のパターン開口部を形成し、
前記開口部内に微細な砥粒を含む研磨剤溶液を封入し金属板に振動を加えて該開口部の内壁を研磨するとともに、
次いで、前記開口部内壁に前記研磨剤溶液と極細繊維よりなる研磨材を接触させて内壁を研磨する
ことを特徴とするメタルマスクの製造方法。
Irradiate a metal plate with laser light to form a pattern opening for printing,
While encapsulating a polishing agent solution containing fine abrasive grains in the opening and applying vibration to the metal plate to polish the inner wall of the opening,
Next, the inner wall is polished by bringing the abrasive solution and an ultrafine fiber abrasive into contact with the inner wall of the opening. A method for producing a metal mask.
前記研磨剤溶液が、アルミナの微細な砥粒を含む硝酸塩と水との混合液である請求項1に記載のメタルマスクの製造方法。   The method for producing a metal mask according to claim 1, wherein the abrasive solution is a mixed solution of nitrate and water containing fine abrasive grains of alumina. 前記極細繊維がメラミン樹脂発泡体である請求項1に記載のメタルマスクの製造方法。   The method for producing a metal mask according to claim 1, wherein the ultrafine fiber is a melamine resin foam.
JP2004294713A 2004-10-07 2004-10-07 Manufacturing method of metal mask Pending JP2006103223A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004294713A JP2006103223A (en) 2004-10-07 2004-10-07 Manufacturing method of metal mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004294713A JP2006103223A (en) 2004-10-07 2004-10-07 Manufacturing method of metal mask

Publications (1)

Publication Number Publication Date
JP2006103223A true JP2006103223A (en) 2006-04-20

Family

ID=36373458

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004294713A Pending JP2006103223A (en) 2004-10-07 2004-10-07 Manufacturing method of metal mask

Country Status (1)

Country Link
JP (1) JP2006103223A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019124867A1 (en) * 2017-12-19 2019-06-27 주식회사 포스코 Metal mask for deposition for oled and method for producing same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08104021A (en) * 1994-10-05 1996-04-23 Brother Ind Ltd Production of electrode
JPH0957937A (en) * 1995-08-21 1997-03-04 Taiyo Kagaku Kogyo Kk Manufacture of metal mask for screen printing
JPH10270538A (en) * 1997-02-13 1998-10-09 Integrated Process Equip Corp Semiconductor wafer polishing device with soft carrier plate
JPH1165105A (en) * 1997-06-13 1999-03-05 Konica Corp Image forming material and image forming method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08104021A (en) * 1994-10-05 1996-04-23 Brother Ind Ltd Production of electrode
JPH0957937A (en) * 1995-08-21 1997-03-04 Taiyo Kagaku Kogyo Kk Manufacture of metal mask for screen printing
JPH10270538A (en) * 1997-02-13 1998-10-09 Integrated Process Equip Corp Semiconductor wafer polishing device with soft carrier plate
JPH1165105A (en) * 1997-06-13 1999-03-05 Konica Corp Image forming material and image forming method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019124867A1 (en) * 2017-12-19 2019-06-27 주식회사 포스코 Metal mask for deposition for oled and method for producing same

Similar Documents

Publication Publication Date Title
CN1067315C (en) Abrasive article, method of manufacture of same, method of using same for finishing, and a production tool
CN1133575A (en) Abrasive article, a process of making same, and a method of using same to finish a workpiece surface
JP2000091280A (en) Semiconductor polishing apparatus and polishing of semiconductor substrate
KR100645748B1 (en) Diamond tool manufacturing method and diamond tool made of the method
JP2003257910A (en) Method for polishing copper layer of substrate
JP2006103223A (en) Manufacturing method of metal mask
JP2016150451A (en) Mold
TWI272672B (en) Process for the abrasive machining of surfaces, in particular of semiconductor wafers
JP2001077065A (en) Polishing of molten silica using colloid
DE60222100T2 (en) &#34;GRINDSTONE GRAIN, GRINDSTONE AND METHOD FOR THE PRODUCTION THEREOF, AND METHOD FOR THE PRODUCTION OF OPTICAL ELEMENTS USING THE GRINDSTONE AND METHOD FOR THE PRODUCTION OF PROJECTION READERS&#34;
JP3510036B2 (en) Method for manufacturing semiconductor device
JP2003275951A (en) Polishing method and polishing device
KR100798831B1 (en) Method and apparatus for polishing
TWI277460B (en) Die head for painting, painting device, and method of manufacturing die head for painting
JP6831541B2 (en) Manufacturing method of optical element
JP2007222996A (en) Polishing device and polishing method
JP2003311605A (en) Abrasive grain burying device and method, and polishing device using it
KR100509396B1 (en) Photomask reclamation method
KR20130104539A (en) Grinding apparatus and grinding method using the same
JP2019069620A (en) Anti-glare film
JP6858763B2 (en) How to process semiconductor wafers with polycrystalline finish
JP2012011518A (en) Polishing apparatus, polishing pad, and method for polishing
JP2016150450A (en) Mold
JP2006250677A (en) Sample manufacturing method
JP4485849B2 (en) Optical element molding die polishing method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070920

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100713

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20110419