JP2006100703A - Rigid-flexible substrate and manufacturing method therefor - Google Patents

Rigid-flexible substrate and manufacturing method therefor Download PDF

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JP2006100703A
JP2006100703A JP2004287146A JP2004287146A JP2006100703A JP 2006100703 A JP2006100703 A JP 2006100703A JP 2004287146 A JP2004287146 A JP 2004287146A JP 2004287146 A JP2004287146 A JP 2004287146A JP 2006100703 A JP2006100703 A JP 2006100703A
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rigid
substrate
flexible substrate
flexible
connection terminal
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JP4574310B2 (en
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Atsushi Kobayashi
厚志 小林
Kazuo Umeda
和夫 梅田
Takahiro Sawara
隆広 佐原
Susumu Nakazawa
進 中澤
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Dai Nippon Printing Co Ltd
DT Circuit Technology Co Ltd
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Dai Nippon Printing Co Ltd
DT Circuit Technology Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a rigid-flexible substrate in which a joint between the rigid and flexible substrates is strongly adhered, which comprises a simple process, and which provides a high material yield and a high product yield. <P>SOLUTION: A rigid substrate having a vertical wiring formed in a joint region and a flexible substrate having a connection terminal formed at an end are separately manufactured. The joint regions of the rigid substrate are spot faced deeper than the thickness of the flexible substrate to form steps. The connection terminals of the flexible substrate are connected to the vertical wirings of the steps. Another rigid substrate is laminated to cover the flexible substrate on the steps and the upper surface of the rigid substrate having the steps as the same plane. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明はリジッド−フレキシブル基板の製造方法に係り、特に複数枚のリジッド基板がフレキシブル基板を介して、前記フレキシブル基板の主面が、リジッド基板の主面と等高又はリジッド基板の主面よりも低くなるように接続されたリジッド−フレキシブル基板の製造方法に関する。   The present invention relates to a method for manufacturing a rigid-flexible substrate, and more particularly, a plurality of rigid substrates are interposed via a flexible substrate, and the principal surface of the flexible substrate is equal to the principal surface of the rigid substrate or more than the principal surface of the rigid substrate. The present invention relates to a method for manufacturing a rigid-flexible substrate connected to be lowered.

一般に、筺体内の屈曲部に跨ってリジッド基板を配設する場合には、リジッド基板を複数枚に分割し、分割されたリジッド基板間を、コネクタやフレキシブル基板で接続することが行われている。   In general, when a rigid board is disposed across a bent portion in a housing, the rigid board is divided into a plurality of pieces, and the divided rigid boards are connected with a connector or a flexible board. .

しかし、コネクタやフレキシブル基板でリジッド基板間を接続すると、コネクタやフレキシブル基板の厚さ分だけ高さが高くなって機器の薄型化の障害となるし、リジッド基板間を接続した後では複数個の基板に同時に処理や加工を施すことができなくなるため生産性が低くなる。   However, connecting rigid boards with a connector or flexible board increases the height of the connector or flexible board, resulting in an obstacle to thinning the device. After connecting rigid boards, multiple rigid boards are connected. Productivity is reduced because the substrate cannot be processed or processed simultaneously.

このため、等厚の複数枚のリジッド基板をフレキシブル基板で両基板面が等高又はフレキシブル基板の主面がリジッド基板の主面よりも低くなるように接続したリジッド−フレキシブル基板が用いられる。   For this reason, a rigid-flexible substrate is used in which a plurality of rigid substrates having the same thickness are connected to each other so that both substrate surfaces are equal in height or the principal surface of the flexible substrate is lower than the principal surface of the rigid substrate.

このようなリジッド−フレキシブル基板を、例えば特開平7−86749号に開示された方法、すなわち、電解銅箔のような導電性金属板に突設された硬化された導電組成物からなる円錐状の導体バンプを、熱融性の合成樹脂系シートを介して他の導電性金属板と対向させ、加熱加圧により一体化して両面基板とする方法で作成すると、次のような多くの工程が必要になる。なお、以下の各図においては、それぞれ共通する部分に共通の符号を付して重複する説明を省略する。   Such a rigid-flexible substrate is formed by a method disclosed in, for example, Japanese Patent Laid-Open No. 7-86749, that is, a conical shape made of a cured conductive composition protruding from a conductive metal plate such as an electrolytic copper foil. If a conductor bump is made to face another conductive metal plate through a heat-melting synthetic resin sheet and integrated by heating and pressing to make a double-sided board, many processes are required: become. In the following drawings, common portions are denoted by common reference numerals, and redundant description is omitted.

この方法では、まず、図19に模式的に示すように、端縁部分だけカバーフィルム1が被覆されていない両面フレキシブル基板2を作成する。このフレキシブル基板2のカバーフィルム1が被覆されていない部分は、リジット基板内に積層される部分である。なお、同図において、符号3は液晶ポリマーフィルム、4は水平配線部(導体パターン)、5は垂直配線部(導体バンプ)である。   In this method, first, as schematically shown in FIG. 19, a double-sided flexible substrate 2 in which only the edge portion is not covered with the cover film 1 is prepared. The portion of the flexible substrate 2 that is not covered with the cover film 1 is a portion that is laminated within the rigid substrate. In the figure, reference numeral 3 denotes a liquid crystal polymer film, 4 denotes a horizontal wiring portion (conductor pattern), and 5 denotes a vertical wiring portion (conductor bump).

垂直配線部5は、導体バンプを用いて、次の方法で形成される。
すなわち、後工程でパターニングにより水平配線部4となる電解銅箔上に、円錐状の導体バンプを形成し、この導体バンプを液晶ポリマーフィルム(合成樹脂系シート)3を介して他の電解銅箔と対向させ、加熱加圧によりこれらを一体化させる。このとき、導体バンプの先端は対設された電解銅箔に圧接されて、その先端が円錐台状に塑性変形し、両面の水平配線部4間を接続する垂直配線部5となる。水平配線部4は、各電解銅箔面にレジストを塗布し、マスクパターンを介して露光し、未露光部を現像により除去し電解銅箔の露出した部分にエッチング加工を施すことにより形成される。
The vertical wiring part 5 is formed by the following method using a conductor bump.
That is, a conical conductor bump is formed on the electrolytic copper foil that becomes the horizontal wiring portion 4 by patterning in a later step, and this conductive bump is connected to another electrolytic copper foil via a liquid crystal polymer film (synthetic resin sheet) 3. And these are integrated by heating and pressing. At this time, the tips of the conductor bumps are pressed against the pair of electrolytic copper foils, and the tips are plastically deformed into a truncated cone shape to form the vertical wiring portion 5 connecting the horizontal wiring portions 4 on both sides. The horizontal wiring part 4 is formed by applying a resist to each electrolytic copper foil surface, exposing through a mask pattern, removing the unexposed part by development, and etching the exposed part of the electrolytic copper foil. .

カバーフィルム1は、エッチング加工を終えた基板面にレジストを塗布し、リジット基板と一体化する部分だけをホトリソグラフィにより除去して形成されている。   The cover film 1 is formed by applying a resist to the substrate surface after the etching process and removing only the portion integrated with the rigid substrate by photolithography.

次に、このフレキシブル基板2は、図20に模式的に示す、別に作成された導体バンプ5aを有する積層体6(符号7は離型フィルム)と加熱加圧により一体化されて積層体9となる。   Next, this flexible substrate 2 is integrated with a laminate 6 (symbol 7 is a release film) having conductor bumps 5a separately produced, schematically shown in FIG. Become.

積層体6は、次の方法で形成される。
すなわち、後工程でエッチング加工により水平配線部4となる電解銅箔上に円錐状の導体バンプを形成し、この導体バンプをガラス−エポキシ系のプリプレグ(合成樹脂系シート)3aを介して他の電解銅箔4aと対向配置して加熱加圧により一体化させる。このとき、導体バンプの先端は電解銅箔4aに圧接されて、その先端が円錐台状に塑性変形して、両面の電解銅箔4aを接続する垂直配線部5となる。次いで、片方の面の電解銅箔をパターニングして水平配線部4を形成する。さらに、この水平配線部4の垂直配線部5と対応する位置に導体バンプ5aを形成し、導体バンプ5a側を内側にしてガラス−エポキシ系のプリプレグ(合成樹脂系シート)3aと積層し、加熱加圧により一体化するとともに導体バンプ5aの先端を合成樹脂系シート3aから突き出させる。
The laminate 6 is formed by the following method.
That is, a conical conductor bump is formed on the electrolytic copper foil to be the horizontal wiring portion 4 by etching in a later process, and this conductor bump is passed through another glass-epoxy prepreg (synthetic resin sheet) 3a. It arrange | positions facing the electrolytic copper foil 4a, and is integrated by heating and pressurization. At this time, the front end of the conductor bump is pressed against the electrolytic copper foil 4a, and the front end is plastically deformed into a truncated cone, thereby forming the vertical wiring portion 5 that connects the electrolytic copper foils 4a on both sides. Next, the horizontal wiring portion 4 is formed by patterning the electrolytic copper foil on one side. Further, a conductor bump 5a is formed at a position corresponding to the vertical wiring portion 5 of the horizontal wiring portion 4, laminated with a glass-epoxy prepreg (synthetic resin sheet) 3a with the conductor bump 5a side inside, and heated. While being integrated by pressurization, the tip of the conductor bump 5a is protruded from the synthetic resin sheet 3a.

この積層体6とフレキシブル基板2との一体化は、導体バンプ5aの突出した側をフレキシブル基板2の水平配線部4の露出面側(カバーフィルム1のない側)にして位置合わせし、加熱加圧することにより行われる(図21)。このとき、積層体6とフレキシブル基板2の境界部には、スリット8を形成し、フレキシブル基板2のカバーフィルム1と対接する面には、スペーサを兼ねた離型フィルム7を介在させる。   The laminate 6 and the flexible substrate 2 are integrated by aligning the protruding side of the conductor bump 5a with the exposed surface side of the horizontal wiring portion 4 of the flexible substrate 2 (the side without the cover film 1), and heating. This is done by pressing (FIG. 21). At this time, a slit 8 is formed at the boundary between the laminate 6 and the flexible substrate 2, and a release film 7 that also serves as a spacer is interposed on the surface of the flexible substrate 2 that contacts the cover film 1.

さらに、この積層体9のフレキシブル基板2側を、図22に模式的に示す、別に作成した積層体10と積層して加熱加圧により一体化して積層体11とする(図23)。   Further, the flexible substrate 2 side of the laminate 9 is laminated with a separately produced laminate 10 schematically shown in FIG. 22 and integrated by heating and pressing to form a laminate 11 (FIG. 23).

積層体9と積層体10の一体化は、次のようにして行われる。
すなわち、積層体10の突出する導体バンプ5aを積層体9(フレキシブル基板2)の所定の水平配線部4に当接させ、積層体9(フレキシブル基板2)のカバーフィルム1と対接する面には、スペーサを兼ねる離型フィルム7を介在させて、積層体10と積層体9を重ね合わせ、加熱加圧することにより、図23に模式的に示す、水平配線部4が8層の積層体11が得られる。
Integration of the laminated body 9 and the laminated body 10 is performed as follows.
That is, the protruding conductor bump 5a of the laminated body 10 is brought into contact with a predetermined horizontal wiring portion 4 of the laminated body 9 (flexible substrate 2), and the surface of the laminated body 9 (flexible substrate 2) that is in contact with the cover film 1 is placed on the surface. Then, the laminate 10 and the laminate 9 are overlapped with the release film 7 also serving as a spacer, and heated and pressurized, whereby the laminate 11 having the eight horizontal wiring portions 4 schematically shown in FIG. can get.

この後、図24に模式的に示すように、外層の水平配線部(外層パターン)4をパターニングにより形成し、レジスト等により絶縁保護被覆12を施し、最後に、図25に模式的に示すように、フレキシブル基板2を覆うカバー部分A,Bを除去してリジッド−フレキシブル基板が完成する。
特開平7−86749号公報
Thereafter, as schematically shown in FIG. 24, an outer horizontal wiring portion (outer layer pattern) 4 is formed by patterning, and an insulating protective coating 12 is applied with a resist or the like. Finally, as schematically shown in FIG. Then, the cover portions A and B covering the flexible substrate 2 are removed to complete the rigid-flexible substrate.
JP-A-7-86749

上述したように、従来のリジッド−フレキシブル基板の製造方法では、フレキシブル基板2をリジッド基板の層間に積層するために(フレキシブル基板の主面を、リジッド基板の主面と等高またはこれより低位置にするため)、非常に多くの工程を必要とする難点があった。   As described above, in the conventional rigid-flexible substrate manufacturing method, in order to laminate the flexible substrate 2 between the layers of the rigid substrate (the main surface of the flexible substrate is equal to or lower than the main surface of the rigid substrate). Therefore, there is a difficulty that requires a large number of steps.

また、この方法は、通常、大きい1枚の基板の中に複数の小さい単位基板を作りこみ、大きい基板のまま、積層されて作成されるため、リジッド基板のフレキシブル基板が配置されることになる部分やフレキシブル基板のリジッド基板が配置されることになる部分は、打ち抜かれて屑となってしまい、材料の歩留まりが低いという問題があった。   Further, in this method, a plurality of small unit substrates are usually formed in one large substrate, and the large substrate is laminated and formed, so that a rigid substrate flexible substrate is disposed. The portion where the rigid substrate of the portion or the flexible substrate is to be disposed is punched and becomes waste, and there is a problem that the yield of the material is low.

また、大きい1枚の基板中に複数の単位リジッド−フレキシブル基板が形成されるため、作成過程において合成樹脂系シートや積層体の単位基板の一つに対応する部分に不良が発生すると全体が不良となってしまい、良品率が低いという問題もあった。   In addition, since a plurality of unit rigid-flexible substrates are formed on one large substrate, if a defect occurs in a portion corresponding to one of the unit substrates of the synthetic resin sheet or the laminate in the preparation process, the whole is defective. There was also a problem that the yield rate was low.

本発明のリジッド−フレキシブル基板は、上記の課題を解決すべくなされたもので、リジッド基板とフレキシブル基板とが接続されたリジッド−フレキシブル基板であって、前記リジッド基板は、前記フレキシブル基板との接続部に段部を有するとともに、前記フレキシブル基板は、前記リジッド基板と前記段部において接続され、前記段部上の前記フレキシブル基板は、他のリジッド基板で被覆されていることを特徴とする。   The rigid-flexible substrate of the present invention is a rigid-flexible substrate in which a rigid substrate and a flexible substrate are connected to solve the above-described problem, and the rigid substrate is connected to the flexible substrate. The flexible substrate is connected to the rigid substrate at the step portion, and the flexible substrate on the step portion is covered with another rigid substrate.

より具体的には、本発明のリジッド−フレキシブル基板は、リジッド基板とフレキシブル基板とが接続されたリジッド−フレキシブル基板であって、前記リジッド基板は、フレキシブル基板との接続部に上部に接続端子を有する段部を有し、前記フレキシブル基板は、端部表面に接続端子を有するとともに、この接続端子を前記リジッド基板の段部の接続端子に接続させて前記リジッド基板の段部に一体に接着されており、前記段部上の前記フレキシブル基板は、他のリジッド基板で被覆されていることを特徴とする。   More specifically, the rigid-flexible substrate of the present invention is a rigid-flexible substrate in which a rigid substrate and a flexible substrate are connected, and the rigid substrate has a connection terminal at an upper portion at a connection portion with the flexible substrate. The flexible substrate has a connection terminal on an end surface thereof, and the connection terminal is connected to the connection terminal of the step portion of the rigid substrate so as to be integrally bonded to the step portion of the rigid substrate. The flexible substrate on the step portion is covered with another rigid substrate.

本発明のリジッド−フレキシブル基板においては、前記他のリジッド基板は、前記段部上の前記フレキシブル基板だけでなく、前記段部を有するリジッド基板の上面をも被覆することが好ましい。そうすることで、実装領域を広くすることができる。   In the rigid-flexible substrate of the present invention, it is preferable that the other rigid substrate covers not only the flexible substrate on the stepped portion but also the upper surface of the rigid substrate having the stepped portion. By doing so, the mounting area can be widened.

また、前記他のリジッド基板が前記段部上のみを被覆する場合には、前記他のリジッド基板の上面は、前記段部を有するリジッド基板の上面とほぼ等高か、若しくは、これより低くなっていることが望ましい。段部を被覆した他のリジッド基板の上面が高くなって突出していると、実装機にセットしたとき、その突出した部分が実装の障害となるので好ましくない。   Further, when the other rigid substrate covers only the stepped portion, the upper surface of the other rigid substrate is substantially equal to or lower than the upper surface of the rigid substrate having the stepped portion. It is desirable that If the upper surface of another rigid substrate covering the stepped portion is raised and protrudes, the protruding portion becomes an obstacle to mounting when set on a mounting machine, which is not preferable.

また、本発明のリジッド−フレキシブル基板の製造方法は、複数枚のリジッド基板がフレキシブル基板を介して接続されたリジッド−フレキシブル基板の製造方法において、前記リジッド基板と接続される領域に接続端子を有するフレキシブル基板を作成する工程と、垂直配線部が露出した前記フレキシブル基板の厚さより深い段部を有するリジッド基板を作成する工程と、前記各リジッド基板の段部の前記垂直配線部に前記フレキシブル基板の端子を電気的及び機械的に接続する工程と、前記フレキシブル基板の接続部上並びに前記リジッド基板の上面に、他のリジッド基板を積層し、かつ少なくとも最上面に水平配線部を形成して、各水平配線部を垂直配線部で接続された配線部を有するリジッド基板部を形成する工程とを具備して成ることを特徴とする。   The rigid-flexible board manufacturing method of the present invention is a rigid-flexible board manufacturing method in which a plurality of rigid boards are connected via a flexible board, and has a connection terminal in a region connected to the rigid board. A step of creating a flexible substrate, a step of creating a rigid substrate having a step portion deeper than the thickness of the flexible substrate from which the vertical wiring portion is exposed, and a step of forming the flexible substrate on the vertical wiring portion of the step portion of each rigid substrate. A step of electrically and mechanically connecting the terminals, and laminating another rigid substrate on the connection portion of the flexible substrate and the upper surface of the rigid substrate, and forming a horizontal wiring portion on at least the uppermost surface, Forming a rigid substrate portion having a wiring portion in which a horizontal wiring portion is connected by a vertical wiring portion. And wherein the door.

また、前記最終工程のかわりに、段部のフレキシブル基板の接続部上に、前記フレキシブル基板を覆うように、他のリジッド基板を加熱圧着させる工程を行ってもよい。   Moreover, you may perform the process of carrying out the thermocompression bonding of another rigid board | substrate so that the said flexible substrate may be covered on the connection part of the flexible substrate of a step part instead of the said last process.

なお、接続端子となる垂直配線部が露出した前記フレキシブル基板の厚さより深い段部を有するリジッド基板を作成する工程は、具体的には、前記フレキシブル基板が接続される領域に、前記フレキシブル基板が接続される位置又はこれより低い位置で水平配線部と接続された垂直配線部を有する複数のリジッド基板を作成する工程と、前記各リジッド基板のフレキシブル基板の接続される領域に座繰り加工を施して、前記垂直配線部が露出した前記フレキシブル基板の厚さより深い段部を形成する工程とで行える。   Note that the step of creating a rigid substrate having a step portion deeper than the thickness of the flexible substrate from which the vertical wiring portion serving as a connection terminal is exposed is specifically the region where the flexible substrate is connected. A step of creating a plurality of rigid boards having a vertical wiring part connected to a horizontal wiring part at a position to be connected or a position lower than the position, and a countersink process is performed on a region to which the flexible board of each rigid board is connected. And a step of forming a step deeper than the thickness of the flexible substrate where the vertical wiring portion is exposed.

また、垂直配線部が露出した前記フレキシブル基板の厚さより深い段部を有するリジッド基板を作成する別の工程としては、前記フレキシブル基板が接続される領域に、前記フレキシブル基板が接続される位置又はこれより内層の位置で水平配線部と接続された垂直配線部を有する複数の内層リジッド基板を作成する工程と、前記内層リジッド基板の主面上に前記フレキシブル基板が接続される領域を露出させて外装基板を貼着させて前記フレキシブル基板の厚さより深い段部を形成する工程とを具備してもよい。   Further, as another step of creating a rigid substrate having a step portion deeper than the thickness of the flexible substrate from which the vertical wiring portion is exposed, a position where the flexible substrate is connected to a region where the flexible substrate is connected or this A step of forming a plurality of inner layer rigid substrates having vertical wiring portions connected to horizontal wiring portions at a position of the inner layer, and an exterior to expose a region to which the flexible substrate is connected on the main surface of the inner layer rigid substrate And a step of attaching a substrate to form a step portion deeper than the thickness of the flexible substrate.

リジッド基板は、その下面に検査端子を有し、リジッド基板の段部の接続端子は金属めっき層及び/又は導電性ペーストの固化物により接続されていることが望ましい。   It is desirable that the rigid substrate has an inspection terminal on its lower surface, and the connection terminal of the step portion of the rigid substrate is connected by a metal plating layer and / or a solidified conductive paste.

また、フレキシブル基板の段部の接続端子は、金属配線、金属めっき層又は導電性ペーストの固化物から形成することができる。   Moreover, the connection terminal of the step part of a flexible substrate can be formed from the solidified material of a metal wiring, a metal plating layer, or an electrically conductive paste.

リジッド基板のフレキシブル基板の接続端子が接続される垂直配線部は、導体バンプを基板の厚さ方向に連接させて形成することができるが、ビアホールやスルーホールによっても形成することができる。また、フレキシブル基板のリジッド基板の垂直配線部と接続される接続端子も導体バンプで形成することができるが、他の端子、例えば高温半田や電解銅箔で構成することも可能である。   The vertical wiring portion to which the connection terminal of the flexible substrate of the rigid substrate is connected can be formed by connecting conductor bumps in the thickness direction of the substrate, but can also be formed by via holes or through holes. Further, the connection terminals connected to the vertical wiring portion of the rigid substrate of the flexible substrate can also be formed with conductor bumps, but can also be configured with other terminals such as high-temperature solder or electrolytic copper foil.

本発明でリジッド基板やフレキシブル基板の垂直配線部やフレキシブル基板の接続端子に用いられる導体バンプは、通常、導電性金属層上に形成される。このような導電性金属層としては、たとえば電解銅箔などの導電性シート(箔)が挙げられ、この導電性金属層は1枚のシートであってもよいし、パターン化されたものでもよく、その形状はとくに限定されないし、さらに導体バンプは、一方の主面だけでなく、両主面にそれぞれ形設した形のものを用いてもよい。   In the present invention, the conductor bumps used for the rigid wiring board, the vertical wiring portion of the flexible board, and the connection terminal of the flexible board are usually formed on the conductive metal layer. Examples of such a conductive metal layer include a conductive sheet (foil) such as an electrolytic copper foil. The conductive metal layer may be a single sheet or a patterned sheet. The shape is not particularly limited, and the conductor bumps may be formed not only on one main surface but also on both main surfaces.

導体バンプは、たとえば銀,金,銅,半田粉などの導電性粉末、これらの合金粉末もしくは複合(混合)金属粉末と、たとえばポリカーボネート樹脂,ポリスルホン樹脂,ポリエステル樹脂,フェノキシ樹脂,フェノール樹脂,ポリイミド樹脂などのバインダー成分とを混合して調製された導電性組成物、あるいは導電性金属などで構成される。導体バンプを導電性組成物で形成する場合、たとえば比較的厚いメタルマスクを用いた印刷法により、アスペクト比の高いバンプを形成することができ、その導体バンプの高さは一般的に、100 〜 400μm 程度が望ましく、さらに導体バンプの高さは一層の合成樹脂系シートを貫通し得る高さおよび複数層の合成樹脂系シートを貫通し得る高さとが適宜混在していてもよい。導電性金属で導体バンプを形成する手段としては、(a)ある程度形状もしくは寸法が一定の微小金属魂を、粘着剤層を予め設けておいた導電性金属層面に散布し、選択的に固着させる(このときマスクを配置して行ってもよい)、(b)電解銅箔面にめっきレジストを印刷・パターニングして、銅,錫,金,銀,半田などめっきして選択的に微小な金属柱(バンプ)を形成する、(c)導電性金属層面に半田レジストの塗布・パターニングして、半田浴に浸漬して選択的に微小な金属柱(バンプ)を形成する、(d)金属板の一部をレジストにて被膜し、エッチングして微小な金属バンプを形成する、などが挙げられる。ここで、導体バンプに相当する微小金属魂ないし微小な金属柱は、異種金属を組み合わせて成る多層構造、多層シェル構造でもよい。たとえば銅を芯にし表面を金や銀の層で被覆して耐酸化性を付与したり、銅を芯にし表面を半田層被覆して半田接合性をもたせたりしてもよい。なお、本発明において、導体バンプを導電性組成物で形成する場合には、めっき法などの手段で行う場合に較べて、さらに工程など簡略化し得るので、低コスト化の点で有効である。   Conductive bumps are, for example, conductive powders such as silver, gold, copper, solder powder, alloy powders or composite (mixed) metal powders, and polycarbonate resins, polysulfone resins, polyester resins, phenoxy resins, phenol resins, polyimide resins, etc. It is comprised with the electroconductive composition prepared by mixing binder components, such as these, or an electroconductive metal. When the conductive bump is formed of a conductive composition, a bump having a high aspect ratio can be formed by, for example, a printing method using a relatively thick metal mask. About 400 μm is desirable, and the height of the conductor bump may be appropriately mixed with the height that can penetrate one layer of the synthetic resin sheet and the height that can penetrate a plurality of layers of the synthetic resin sheet. As means for forming a conductive bump with a conductive metal, (a) a fine metal soul having a certain shape or size is spread on a conductive metal layer surface on which an adhesive layer has been provided in advance, and is selectively fixed. (This may be done by placing a mask), (b) A plating resist is printed and patterned on the surface of the electrolytic copper foil, and copper, tin, gold, silver, solder, etc. are plated to selectively make a minute metal Forming columns (bumps); (c) applying and patterning a solder resist on the surface of the conductive metal layer; and dipping in a solder bath to selectively form minute metal columns (bumps); (d) metal plate A part of the film is coated with a resist and etched to form a fine metal bump. Here, the fine metal soul or the fine metal pillar corresponding to the conductor bump may have a multilayer structure or a multilayer shell structure in which different metals are combined. For example, copper may be cored and the surface may be coated with a gold or silver layer to provide oxidation resistance, or copper may be cored and the surface may be coated with a solder layer to provide solder jointability. In the present invention, when the conductive bump is formed of a conductive composition, the process can be further simplified as compared with the case where the conductive bump is formed by means such as plating, which is effective in terms of cost reduction.

本発明において、導体バンプが貫挿されるリジッド基板やフレキシブル基板の絶縁層を構成する合成樹脂系シートとしては、たとえば熱可塑性樹脂フィルム(シート)や硬化前状態に保持される熱硬化性樹脂シートが挙げられ、またその厚さは50〜300μm程度が好ましい。ここで、熱可塑性樹脂シートとしては、たとえばポリカーボネート樹脂,ポリスルホン樹脂,熱可塑性ポリイミド樹脂,4フッ化ポリエチレン樹脂,6フッ化ポリプロピレン樹脂,ポリエーテルエーテルケトン樹脂などのシート類が挙げられる。また、硬化前状態に保持される熱硬化性樹脂シートとしては、エポキシ樹脂,ビスマレイミドトリアジン樹脂,ポリイミド樹脂,フェノール樹脂,ポリエステル樹脂,メラミン樹脂,あるいはブタジエンゴム,ブチルゴム,天然ゴム,ネオプレンゴム,シリコーンゴムなどの生ゴムのシート類が挙げられる。これら合成樹脂は、単独でもよいが絶縁性無機物や有機物系の充填物を含有してもよく、さらにガラスクロスやマット、有機合成繊維布やマット、あるいは紙などの補強材と組み合わせて成るシートであってもよい。   In the present invention, as the synthetic resin-based sheet constituting the insulating layer of the rigid substrate or flexible substrate into which the conductor bumps are inserted, for example, a thermoplastic resin film (sheet) or a thermosetting resin sheet held in a state before curing is used. The thickness is preferably about 50 to 300 μm. Here, examples of the thermoplastic resin sheet include sheets such as polycarbonate resin, polysulfone resin, thermoplastic polyimide resin, tetrafluoropolyethylene resin, hexafluoropolypropylene resin, and polyetheretherketone resin. In addition, the thermosetting resin sheet held in the pre-curing state includes epoxy resin, bismaleimide triazine resin, polyimide resin, phenol resin, polyester resin, melamine resin, or butadiene rubber, butyl rubber, natural rubber, neoprene rubber, silicone. Examples thereof include raw rubber sheets such as rubber. These synthetic resins may be used alone or may contain insulating inorganic or organic fillers, and sheets made of glass cloth or mat, organic synthetic fiber cloth or mat, or a sheet combined with a reinforcing material such as paper. There may be.

さらに、本発明において、リジッド基板やフレキシブル基板を形成するために導体バンプを形設した導電性金属層の主面に、合成樹脂系シート主面を対接させた構成の複数層を、積層配置して成る積層体を加熱・加圧するとき、合成樹脂系シートを載置する基台(当て板)として、寸法や変形の少ない金属板もしくは耐熱性樹脂板、たとえばステンレス板,真鍮板、ポリイミド樹脂板(シート),ポリテトラフロロエチレン樹脂板(シート)などが使用される。   Furthermore, in the present invention, a plurality of layers having a structure in which the main surface of the synthetic resin sheet is in contact with the main surface of the conductive metal layer in which the conductor bumps are formed in order to form a rigid substrate or a flexible substrate are laminated. When heating and pressurizing the laminated body, the base (pad) on which the synthetic resin sheet is placed is used as a metal plate or heat-resistant resin plate, such as stainless steel plate, brass plate, polyimide resin, with little size and deformation. A plate (sheet), a polytetrafluoroethylene resin plate (sheet), or the like is used.

本発明に係る印刷配線板の製造方法によれば、フレキシブル基板とリジッド基板とを別々に製造して両者を接続するだけの簡易な方法でリジッド−フレキシブル基板を作成し得るので、生産工程を大幅に簡略化することができる。また、リジッド基板とフレキシブル基板とは、それぞれ最終形態まで作成した状態で接続することができるので、リジッド基板内にはフレキシブル基板はなく、またフレキシブル基板のみの部分もリジッド基板を取り除くなどの工程がないため、材料の利用効率を向上させることができる。また、リジッド基板とフレキシブル基板のそれぞれを、接続前に、ほぼ完成された単位基板の状態で良否の判定ができるので、仮に作成過程で不良が生じてもロスを最小限にすることができる。   According to the method for manufacturing a printed wiring board according to the present invention, a rigid-flexible substrate can be created by a simple method in which a flexible substrate and a rigid substrate are separately manufactured and connected to each other, greatly increasing the production process. Can be simplified. In addition, since the rigid substrate and the flexible substrate can be connected in a state where the final form has been created, there is no flexible substrate in the rigid substrate, and there is a process such as removing the rigid substrate from only the flexible substrate. Therefore, the utilization efficiency of the material can be improved. In addition, since each of the rigid substrate and the flexible substrate can be judged as good or bad in the almost completed unit substrate state before connection, loss can be minimized even if a defect occurs in the production process.

また、その接続部のフレキシブル基板上面を覆うように、他のリジッド基板で被覆するので、接続部の機械的強度を高めるとともに該部の接着力を高めることができる。   Moreover, since it coat | covers with another rigid board | substrate so that the flexible substrate upper surface of the connection part may be covered, the adhesive strength of this part can be raised while improving the mechanical strength of a connection part.

また、接続部が突出しないように被覆するので、外観を損ねることなく、後の実装工程で重要となる基板の部品実装面の平坦性を確保することができる。   Further, since the connection portion is covered so as not to protrude, the flatness of the component mounting surface of the board, which is important in the subsequent mounting process, can be ensured without impairing the appearance.

さらに、前記他のリジッド基板はフレキシブル基板とリジッド基板との接続部を含めた基板上を同一平面として覆うため、実装領域を広くすることができる。   Furthermore, since the other rigid substrate covers the substrate including the connection portion between the flexible substrate and the rigid substrate as the same plane, the mounting area can be widened.

次に、本発明の実施例を図1乃至18を参照しながら説明する。なお、図1乃至18において、図19乃至23と共通する部分には同一符号を付して、重複する説明は省略する。   Next, an embodiment of the present invention will be described with reference to FIGS. 1 to 18, the same reference numerals are given to the portions common to FIGS. 19 to 23, and a duplicate description is omitted.

(フレキシブル基板の作成)
まず、厚さ25μmのポリイミドフィルム3(PI)の両面に厚さ18μmの電解銅箔(4a)を貼着させ基板の所定位置にスルーホールTHを形成して両面銅張りフレキシブル基板を得た。
(Create flexible substrate)
First, an electrolytic copper foil (4a) having a thickness of 18 μm was adhered to both sides of a polyimide film 3 (PI) having a thickness of 25 μm to form a through hole TH at a predetermined position of the substrate to obtain a double-sided copper-clad flexible substrate.

この両面銅張り積層板両面の電解銅箔4aに、通常のエッチングレジストインク(商品名,PSR-4000 H,太陽インキKK)をスクリーン印刷し、導体パターン部をマスクしてから、塩化第2銅をエッチング液としてエッチング処理後、レジストマスク剥離し図1に示す、両面型のフレキシブル基板20を得た。符号4は、電解銅箔4aをエッチングによりパターニングされた水平配線部である。さらに、この両面型フレキシブル基板20のスルーホールTHの上の近傍を除いて水平配線部4上に、ホトリソグラフィによりカバーフィルム1を形成した。   A normal etching resist ink (trade name, PSR-4000 H, Taiyo Ink KK) is screen-printed on the electrolytic copper foil 4a on both sides of this double-sided copper-clad laminate, masking the conductor pattern, and then cupric chloride. After performing an etching treatment using as a etchant, the resist mask was peeled off to obtain a double-sided flexible substrate 20 shown in FIG. Reference numeral 4 denotes a horizontal wiring portion obtained by patterning the electrolytic copper foil 4a by etching. Further, the cover film 1 was formed by photolithography on the horizontal wiring portion 4 except for the vicinity of the through hole TH of the double-sided flexible substrate 20.

次に、図2に示すごとく、水平配線部4のスルーホールTHと接続する部分に、導体バンプ5aを形成し、この上に厚さ60μm のガラス−エポキシ系プリプレグ(合成樹脂系シート)3aを当接させ、アルミ箔及びゴムシートを介して、例えば100℃に保持した熱板の間に配置し、1MPaで1分ほど加熱加圧して、導体バンプ5aの先端がガラス−エポキシ系のプリプレグ(合成樹脂系シート)3aから突き出したフレキシブル基板21を作成した。   Next, as shown in FIG. 2, a conductor bump 5a is formed on the portion of the horizontal wiring portion 4 connected to the through hole TH, and a glass-epoxy prepreg (synthetic resin sheet) 3a having a thickness of 60 μm is formed thereon. Abutting and placing between an aluminum foil and a rubber sheet between, for example, a hot plate kept at 100 ° C., heating and pressurizing at 1 MPa for about 1 minute, the tip of the conductor bump 5a is a glass-epoxy prepreg (synthetic resin A flexible substrate 21 protruding from the system sheet 3a was prepared.

なお、図2に示したフレキシブル基板21は、図4に示す、2枚のリジット基板間を接続するためのもので、このフレキシブル基板21は、大きい1枚の基板の中に多数枚を作り込んだものを作成し、図2の状態にまで完成したところで、個々のフレキシブル基板に分割されてリジット基板と接続される。   The flexible substrate 21 shown in FIG. 2 is for connecting the two rigid substrates shown in FIG. 4, and this flexible substrate 21 is made up of a large number of substrates in one large substrate. 2 is completed and is divided into individual flexible boards and connected to the rigid board.

(リジット基板の作成)
前述したポリイミドフィルム3(PI)に代えて厚さ60μm の硬化前のガラス−エポキシ系プリプレグ(合成樹脂系シート)3aを用いた点を除いて、B2it(ビー・スクエア・イット:登録商標)として知られる、たとえば特開平8―204332号公報に記載された方法で、図1と図2に示されたフレキシブル基板の場合と同様の構成の両面型のリジッド基板を用いて、図3の8層の水平配線部4を持つリジッド基板22を作成した。
(Rigid board creation)
As a B2it (B Square It: registered trademark) except that the glass-epoxy prepreg (synthetic resin sheet) 3a before curing having a thickness of 60 μm is used instead of the polyimide film 3 (PI) described above. 3 using the double-sided rigid substrate having the same structure as that of the flexible substrate shown in FIGS. 1 and 2 by a known method described in, for example, Japanese Patent Laid-Open No. 8-204332. A rigid substrate 22 having the horizontal wiring portion 4 was prepared.

このリジッド基板22は、各層の絶縁層が、全てガラス−エポキシ系プリプレグ(合成樹脂系シート)3aからなる点を除いて、図23に示された積層体11のリジッド基板部分と同一構造である。   This rigid substrate 22 has the same structure as the rigid substrate portion of the laminate 11 shown in FIG. 23 except that the insulating layers of each layer are all made of glass-epoxy prepreg (synthetic resin sheet) 3a. .

図3に示したリジッド基板22も、大きい1枚の基板の中に多数枚を作り込んだものを作成し、図3の状態にまで形成したところで、又は後述する座繰り加工が済んだ後、個々のリジッド基板に分割される。   The rigid substrate 22 shown in FIG. 3 is also prepared by making a large number of substrates in a large substrate and forming it up to the state shown in FIG. Divided into individual rigid substrates.

(リジッド−フレキシブル基板の作成)
個々のリジッド基板に分割する前の大きい基板の状態で、又は、個々のリジッド基板に分割した後に、各リジッド基板22のフレキシブル基板と接続される垂直配線部5の近傍に座繰り加工を施し、接続すべきフレキシブル基板20の厚さよりも深く座繰って垂直配線部5が露出した段部Sを有するリジッド基板23を作成した(図4)。
(Rigid-Flexible board creation)
In the state of a large substrate before being divided into individual rigid substrates, or after being divided into individual rigid substrates, a countersink process is performed in the vicinity of the vertical wiring portion 5 connected to the flexible substrate of each rigid substrate 22, The rigid board | substrate 23 which has the step part S where the vertical wiring part 5 was exposed by sweeping deeper than the thickness of the flexible substrate 20 which should be connected was created (FIG. 4).

次に、個々に分割された単位リジッド基板23と単位フレキシブル基板21とを、枠体の中に最終形態となるように配置する。通常、この枠体は、複数のリジッド−フレキシブル基板が組み立て可能な大きさのものとされる。   Next, the unit rigid board | substrate 23 and the unit flexible board | substrate 21 which were divided | segmented separately are arrange | positioned so that it may become a final form in a frame. Usually, the frame is of such a size that a plurality of rigid-flexible substrates can be assembled.

ここで座繰る部分の導体バンプは銅配線で挟む構造でもいいが、深さ方向の座繰り精度を考慮し、導体バンプ部分を表面に露出させるために座繰り部は銅配線を無くしてもよい。また、段差形状を得るために、リジッド基板の形成工程の中で、段差とする部分をルーター加工などにより予め除去した上で積層することで形成することも可能である。   The conductor bumps of the counter-sinking part may be sandwiched between copper wirings, but the counter-sink part may be free of copper wiring in order to expose the conductor bump part on the surface in consideration of the precision of the counter-sinking in the depth direction. . Further, in order to obtain a stepped shape, it is also possible to form the step by laminating a portion to be a step in a rigid substrate forming process by removing in advance by router processing or the like.

図5〜7は、このような段部を有するリジッド基板の他の製法を示すもので、予め、段部より上の部分の積層板50aと段部より下の部分を構成する積層板50bとを別々に作成し(図5)、積層板50aの端部の積層板50bと積層したとき、積層板50bの段部Sとなる部分を切断し(図6)、これらを位置決めして加熱加圧することにより段部Sを有するリジッド基板50を形成することができる(図7)。   FIGS. 5 to 7 show another method for manufacturing a rigid substrate having such a stepped portion, in which a laminated plate 50a above the stepped portion and a laminated plate 50b constituting a portion below the stepped portion are shown in advance. Are separately prepared (FIG. 5), and when laminated with the laminated plate 50b at the end of the laminated plate 50a, the portion that becomes the step S of the laminated plate 50b is cut (FIG. 6), and these are positioned and heated. By pressing, a rigid substrate 50 having a stepped portion S can be formed (FIG. 7).

図8は、枠体24内に、段部Sを形成したリジッド基板23を、段部Sが互いに対向するように配置し、各リジッド基板23の対向する段部Sに跨って、フレキシブル基板21を配設して仮固定した例である。この実施例では、各リジッド基板23の外周に全体の幅が枠体24の保持部の幅とほぼ同一とされた小突起25が形成されており、枠体24内に配設されたリジッド基板23は、この小突起25で枠体24の枠内に保持固定される。なお、必要に応じて、この小突起25を枠体24内面に接着剤で仮固定するようにしてもよい。   In FIG. 8, the rigid substrate 23 in which the stepped portion S is formed in the frame body 24 is disposed so that the stepped portion S faces each other, and the flexible substrate 21 straddles the stepped portion S of each rigid substrate 23. This is an example in which the is fixed temporarily. In this embodiment, small projections 25 whose overall width is substantially the same as the width of the holding portion of the frame body 24 are formed on the outer periphery of each rigid substrate 23, and the rigid substrate disposed in the frame body 24. 23 is held and fixed in the frame 24 by the small protrusion 25. In addition, you may make it temporarily fix this small protrusion 25 to the inner surface of the frame 24 with an adhesive agent as needed.

さらに、図9に示すように、リジッド基板23の縁部にT示型の突起部26を設け、枠体24の内面の対応位置に、この突起部が嵌合する凹部27を設けて、嵌め合い構造により、リジッド基板23を枠体に保持させてもよい。   Further, as shown in FIG. 9, a T-shaped projection 26 is provided at the edge of the rigid board 23, and a recess 27 is provided at the corresponding position on the inner surface of the frame 24 to fit the projection. The rigid substrate 23 may be held on the frame body by a mating structure.

このようにして、複数のリジッド基板23やフレキシブル基板21を、最終形態となる位置関係に保持した枠体24を、複数枚重ねて加熱加圧により一体化させて枠体24に固定されたリジッド−フレキシブル基板が得られる。   In this way, a rigid body in which a plurality of frame bodies 24 holding a plurality of rigid substrates 23 and flexible substrates 21 in a positional relationship in a final form are stacked and integrated by heating and pressing and fixed to the frame body 24. -A flexible substrate is obtained.

この後、各リジッド−フレキシブル基板が打ち抜かれて図10に示す状態となる。   Thereafter, each rigid-flexible substrate is punched out, and the state shown in FIG. 10 is obtained.

なお、この実施例では、リジッド基板の2枚がフレキシブル基板の1枚で接続されるリジッド−フレキシブル基板を製造する方法について説明したが、本発明は、リジッド基板とフレキシブル基板の枚数には制限されない。   In this embodiment, a method of manufacturing a rigid-flexible substrate in which two rigid substrates are connected by one flexible substrate has been described. However, the present invention is not limited to the number of rigid substrates and flexible substrates. .

また、図11に示すように、1個のリジッド基板23の辺部に、異なる水平配線部4に接続する複数組の垂直配線部を形成し、それぞれの配線ごとに深さの異なる段部を形成して各段部において、別々のフレキシブル基板と接続するようにしてもよい。また、リジッド基板の異なる辺にそれぞれ段部を形成し、フレキシブル基板と接続するようにしてもよい。   Further, as shown in FIG. 11, a plurality of sets of vertical wiring portions connected to different horizontal wiring portions 4 are formed on the side portion of one rigid substrate 23, and step portions having different depths for each wiring are formed. You may make it connect with a separate flexible substrate in each step part. Further, stepped portions may be formed on different sides of the rigid substrate and connected to the flexible substrate.

なお、以上の実施例では、フレキシブル基板が接続されるリジッド基板の垂直配線部(接続端子)を導体バンプで形成した例について説明したが、本発明はかかる実施例に限定されるものではなく、図12に示す、ビアホール28a内に導電性ペースト28bを充填して形成することも可能である。また、図13に示すように、高温半田(たとえば融点200℃〜240℃程度の半田)により導体バンプ29を形成し、リジッド基板23の段部に形成した端子27(水平配線部4と実質的に同じもの)に半田接続するようにしてもよい。この場合、電子部品を搭載する際に使用する半田は前述の高温半田よりも融点の低いものを使用することで、フレキシブル基板とリジッド基板の接続半田の再溶融を回避することができる。また、絶縁層にレーザーなどで穴明けし、そこに導電ペーストを埋め込んだ後、積層することで導通をとる方法でも可能である。   In addition, although the above example demonstrated the example which formed the vertical wiring part (connection terminal) of the rigid board | substrate to which a flexible substrate is connected with a conductor bump, this invention is not limited to this Example, It is also possible to fill the via hole 28a shown in FIG. 12 with a conductive paste 28b. Further, as shown in FIG. 13, a conductor bump 29 is formed by high-temperature solder (for example, solder having a melting point of about 200 ° C. to 240 ° C.), and terminals 27 (substantially the same as the horizontal wiring portion 4) formed on the stepped portion of the rigid substrate 23. To the same device). In this case, it is possible to avoid remelting of the connecting solder between the flexible substrate and the rigid substrate by using a solder having a melting point lower than that of the above-described high-temperature solder when mounting the electronic component. Alternatively, the insulating layer can be made conductive by drilling holes with a laser or the like, embedding a conductive paste in the insulating layer, and then laminating.

さらに、フレキシブル基板とリジッド基板の接続として、(a)異方性導電膜を挟み圧着することで接続する方法、(b)フレキシブル基板とリジッド基板それぞれの端子に金めっきを施し、金めっき同士を圧着接続する方法、(c)貫通孔を有する絶縁層に導電性ペーストを充填したものを挟み真空熱プレスすることで接続する方法、などでも接続は可能である。   Furthermore, as a connection between the flexible substrate and the rigid substrate, (a) a method of connecting by sandwiching an anisotropic conductive film, (b) gold plating is applied to each terminal of the flexible substrate and the rigid substrate, Connection is also possible by a method of crimping connection, (c) a method of connecting by insulating hot layers filled with a conductive paste and vacuum hot pressing.

(フレキシブル基板の接続部上面の被覆)
この実施例においては、以上の工程で作成された例えば図10に示した状態のリジッド−フレキシブル基板の接続部の上面が他のリジッド基板30で覆われる。
(Coating of the upper surface of the connection part of the flexible substrate)
In this embodiment, the upper surface of the connecting portion of the rigid-flexible substrate formed in the above process, for example, in the state shown in FIG. 10 is covered with another rigid substrate 30.

図14は、他のリジッド基板30として両面配線リジッド基板を積層して、フレキシブル基板の接続部の上面を含めたリジッド基板の上面全域にわたって配線部を形成可能とした実施例を示したものである。同図において、太線AA以下に示された部分は、図10に示した状態のリジッド−フレキシブル基板を示したものである。この実施例によれば、接続部の機械的強度が増すだけでなく、フレキシブル基板の接続部上にも配線層を形成することができるので、設計の自由度が増大する。   FIG. 14 shows an embodiment in which a double-sided wiring rigid board is stacked as another rigid board 30 and a wiring portion can be formed over the entire upper surface of the rigid substrate including the upper surface of the connecting portion of the flexible substrate. . In the same figure, the part shown below the thick line AA shows the rigid-flexible substrate in the state shown in FIG. According to this embodiment, not only the mechanical strength of the connection portion is increased, but also the wiring layer can be formed on the connection portion of the flexible substrate, so that the degree of freedom in design is increased.

図15は、図10のリジッド−フレキシブル基板の接続部上面を、未硬化のガラス−エポキシ系のプリプレグ(合成樹脂系シート)3aを介して他のリジッド基板30(配線部のない絶縁基板)で、リジッド基板23の基板面より低くなるように被覆し加熱圧着により一体化した実施例を示したものである。なお、同図では、図10に示した基板の部分は白抜きにし、簡略化して示してある。   FIG. 15 shows the rigid-flexible substrate of FIG. 10 with the upper surface of the rigid-flexible substrate connected to another rigid substrate 30 (insulating substrate having no wiring portion) through an uncured glass-epoxy prepreg (synthetic resin sheet) 3a. 3 shows an embodiment in which the substrate is coated so as to be lower than the substrate surface of the rigid substrate 23 and integrated by thermocompression bonding. In the figure, the portion of the substrate shown in FIG. 10 is outlined and simplified.

図16,17は、図15におけるBB断面をフレキシブル基板の長手方向に見た状態を模式的に示したものである。図16は、段部の幅をほぼフレキシブル基板の幅と等しくするとともに、他のリジット基板30の幅もほぼ等しくして、フレキシブル基板とリジット基板30が段部に嵌合するようにした例であり、図17は、段部の幅をフレキシブル基板の幅よりも広くして他のリジット基板30の両端が直接段部に接着させて、リジット基板によりフレキシブル基板を段部に押さえつけるようにした例である。図17に示したように、リジット基板30の幅をフレキシブル基板の幅よりも広くした場合には、フレキシブル基板がより強固に段部に固定される。   16 and 17 schematically show a state in which the BB cross section in FIG. 15 is viewed in the longitudinal direction of the flexible substrate. FIG. 16 shows an example in which the width of the step portion is made substantially equal to the width of the flexible substrate, and the widths of the other rigid substrates 30 are also made substantially equal so that the flexible substrate and the rigid substrate 30 are fitted to the step portion. FIG. 17 shows an example in which the width of the stepped portion is made wider than the width of the flexible substrate, and both ends of the other rigid substrate 30 are directly bonded to the stepped portion, and the flexible substrate is pressed against the stepped portion by the rigid substrate. It is. As shown in FIG. 17, when the width of the rigid substrate 30 is made wider than the width of the flexible substrate, the flexible substrate is more firmly fixed to the stepped portion.

図15乃至17に示した実施例では、リジッド基板30の上面がリジッド基板23の基板面より低くなっているが、図18に示すように、他のリジッド基板30の上面がリジッド基板23の上面とほぼ等高になるようにしてもよい。この場合、実質的にリジッド基板上の部品実装面積が増加する。また、リジッド基板30の上面がリジッド基板23の上面とほぼ等高であるため、部品実装面の平坦性が確保できる。このような部品面の平坦性は、例えば半田クリームを部品実装面にスクリーン印刷する場合に重要で、リジッド基板30の上面が高いと印刷用のスクリーン面がリジッド基板30の上面に接触してリジッド基板23の上面に密着せず、印刷の障害となるが、リジッド基板30の上面がほぼ等高か低い位置であれば、前記のような障害は起こらない。ところで、通常リジッド基板上に50μm程度の半田レジスト膜が有っても実用上スクリーン印刷の障害とはならない事から、リジッド基板30の上面がリジッド基板23と実用上ほぼ等高と言える範囲は、通常100μm以下、好ましくは50μm以下である。   In the embodiment shown in FIGS. 15 to 17, the upper surface of the rigid substrate 30 is lower than the substrate surface of the rigid substrate 23, but the upper surfaces of the other rigid substrates 30 are the upper surfaces of the rigid substrate 23 as shown in FIG. 18. You may make it become almost level. In this case, the component mounting area on the rigid board is substantially increased. In addition, since the upper surface of the rigid substrate 30 is substantially level with the upper surface of the rigid substrate 23, the flatness of the component mounting surface can be ensured. Such flatness of the component surface is important, for example, when screen printing of solder cream on the component mounting surface. If the upper surface of the rigid substrate 30 is high, the screen surface for printing comes into contact with the upper surface of the rigid substrate 30 and is rigid. Although it does not adhere to the upper surface of the substrate 23 and becomes an obstacle to printing, if the upper surface of the rigid substrate 30 is at a substantially equal or lower position, such an obstacle does not occur. By the way, even if a solder resist film of about 50 μm is usually present on a rigid substrate, it does not impede practically screen printing. Therefore, the range in which the upper surface of the rigid substrate 30 can be practically almost equal to the rigid substrate 23 is as follows: Usually, it is 100 micrometers or less, Preferably it is 50 micrometers or less.

リジッド−フレキシブル基板の製造にあたり、リジッド基板とフレキシブル基板とを別工程で製造し両者を単位基板に分割した後、リジッド基板とフレキシブル基板とを製造できるため、生産工程を大幅に簡略化することができ、屑となる部分が少なく、材料を有効利用して歩留まりを向上させることができる。また、単位基板ごとに良否を判定して、良品のみで最終の接続工程を行うことができるので、基板の作成過程で不良が生じても屑を最小限にすることができる。さらに、リジッド基板とフレキシブル基板との接続部を他のリジッド基板で被覆したので接続部の機械的強度と接着力を高めることができ、基板の平坦性も確保できる。また、接続部を含めた基板上に通常の多層両面配線板を積層した場合には、実装領域が増加し、設計の自由度も増大する。   When manufacturing rigid-flexible substrates, the rigid substrate and flexible substrate can be manufactured in separate processes, and after both are divided into unit substrates, the rigid substrate and flexible substrate can be manufactured, which greatly simplifies the production process. And there are few parts which become waste, and a yield can be improved by using a material effectively. In addition, since it is possible to determine pass / fail for each unit substrate and perform the final connection process using only non-defective products, it is possible to minimize waste even if a defect occurs in the substrate manufacturing process. Furthermore, since the connecting portion between the rigid substrate and the flexible substrate is covered with another rigid substrate, the mechanical strength and adhesive force of the connecting portion can be increased, and the flatness of the substrate can be ensured. In addition, when an ordinary multilayer double-sided wiring board is laminated on a substrate including the connecting portion, the mounting area increases and the degree of design freedom increases.

リジッド−フレキシブル基板の製造に用いる両面型のフレキシブル基板を模式的に示す断面図。Sectional drawing which shows typically the double-sided type flexible substrate used for manufacture of a rigid-flexible substrate. 図1のフレキシブル基板に導体バンプを設けた状態を模式的に示す断面図。Sectional drawing which shows typically the state which provided the conductor bump in the flexible substrate of FIG. リジッド−フレキシブル基板の製造に用いるリジッド基板を模式的に示す断面図。Sectional drawing which shows typically the rigid board | substrate used for manufacture of a rigid-flexible board | substrate. 図3のリジッド基板のフレキシブル基板接続部に座繰り加工を施した状態を模式的に示す断面図。Sectional drawing which shows typically the state which gave the countersink process to the flexible substrate connection part of the rigid board | substrate of FIG. 段部をもつリジッド基板の製法を説明するための図。The figure for demonstrating the manufacturing method of the rigid board | substrate which has a step part. 段部をもつリジッド基板の製法を説明するための図。The figure for demonstrating the manufacturing method of the rigid board | substrate which has a step part. 段部をもつリジッド基板の製法を説明するための図。The figure for demonstrating the manufacturing method of the rigid board | substrate which has a step part. 枠体に、単位リジッド基板と単位フレキシブル基板を組み込んだ状態を示す平面図。The top view which shows the state which incorporated the unit rigid board | substrate and the unit flexible board | substrate in the frame. 枠体と単位リジッド基板の係合部の一部を示す平面図。The top view which shows a part of engaging part of a frame and a unit rigid board | substrate. フレキシブル基板の接続部の被覆に用いるリジッドーフレキシブル基板を模式的に示す断面図。Sectional drawing which shows typically the rigid-flexible board | substrate used for coating | covering the connection part of a flexible substrate. リジッド基板に設けた段部を示す斜視図。The perspective view which shows the step part provided in the rigid board | substrate. リジッド基板とフレキシブル基板の接続部の状態を模式的に示す断面図。Sectional drawing which shows the state of the connection part of a rigid board | substrate and a flexible substrate typically. リジッド基板とフレキシブル基板の接続部の状態を模式的に示す断面図。Sectional drawing which shows the state of the connection part of a rigid board | substrate and a flexible substrate typically. フレキシブル基板の接続部とリジッド基板の全面を他のリジッド基板で被覆した状態を模式的に示す断面図。Sectional drawing which shows typically the state which coat | covered the connection part of the flexible substrate, and the whole surface of the rigid board | substrate with the other rigid board | substrate. 段部上のフレキシブル基板を他のリジッド基板で被覆した状態を模式的に示す断面図。Sectional drawing which shows typically the state which coat | covered the flexible substrate on a step part with another rigid board | substrate. 図15におけるB−B断面を模式的に示す断面図。Sectional drawing which shows the BB cross section in FIG. 15 typically. 図15におけるB−B断面を模式的に示す断面図。Sectional drawing which shows the BB cross section in FIG. 15 typically. フレキシブル基板の接続部を他のリジッド基板で被覆した状態を模式的に示す断面図。Sectional drawing which shows typically the state which coat | covered the connection part of the flexible substrate with the other rigid board | substrate. 従来のリジッド−フレキシブル基板の製造に用いるフレキシブル基板を模式的に示す断面図。Sectional drawing which shows typically the flexible substrate used for manufacture of the conventional rigid-flexible substrate. 図19のフレキシブル基板と積層される積層体を模式的に示す断面図。Sectional drawing which shows typically the laminated body laminated | stacked with the flexible substrate of FIG. 図19のフレキシブル基板と図20の積層体とを積層させた積層体を模式的に示す断面図。Sectional drawing which shows typically the laminated body which laminated | stacked the flexible substrate of FIG. 19, and the laminated body of FIG. 図21の積層体と積層される積層体を模式的に示す断面図。Sectional drawing which shows typically the laminated body laminated | stacked with the laminated body of FIG. 図21の積層体と図22の積層体とを積層させた積層体を模式的に示す断面図。Sectional drawing which shows typically the laminated body which laminated | stacked the laminated body of FIG. 21 and the laminated body of FIG. 図23の積層体の外層をパターニングした積層体を模式的に示す断面図。FIG. 24 is a cross-sectional view schematically showing a laminate in which the outer layer of the laminate in FIG. 23 is patterned. リジッド−フレキシブル基板を模式的に示す断面図。Sectional drawing which shows a rigid-flexible board | substrate typically.

符号の説明Explanation of symbols

1…カバーフィルム、2…1が被覆されていない両面型のフレキシブル基板、3…ポリイミドフィルム、3a…ガラス−エポキシ系のプリプレグ(合成樹脂系シート)、4…水平配線部(導体パターン)、4a…電解銅箔、5…垂直配線部(導体バンプ)、5a…導体バンプ、6,9,10,11…積層体、8…スリット、12…絶縁保護被覆、20,21…フレキシブル基板、22,23…リジッド基板、24…枠体、25…小突起、26…突起部、27…凹部、28…ビアホール、29…高温半田により導体バンプ、TH…スルーホール、30…他のリジッド基板。   DESCRIPTION OF SYMBOLS 1 ... Cover film, 2 ... Double-sided type flexible substrate which is not coat | covered 3 ... Polyimide film, 3a ... Glass-epoxy type prepreg (synthetic resin type sheet), 4 ... Horizontal wiring part (conductor pattern), 4a ... electrolytic copper foil, 5 ... vertical wiring part (conductor bump), 5a ... conductor bump, 6, 9, 10, 11 ... laminated body, 8 ... slit, 12 ... insulating protective coating, 20, 21 ... flexible substrate, 22, DESCRIPTION OF SYMBOLS 23 ... Rigid board | substrate, 24 ... Frame, 25 ... Small protrusion, 26 ... Projection part, 27 ... Recessed part, 28 ... Via hole, 29 ... Conductor bump by high temperature solder, TH ... Through hole, 30 ... Other rigid board | substrates.

Claims (13)

リジッド基板とフレキシブル基板とが接続されたリジッド−フレキシブル基板であって、
前記リジッド基板は、前記フレキシブル基板との接続部に段部を有するとともに、前記フレキシブル基板は、前記リジッド基板と前記段部において接続され、前記段部上の前記フレキシブル基板、及び前記リジッド基板の上面は、他のリジッド基板で被覆されていることを特徴とするリジッド−フレキシブル基板。
A rigid-flexible board in which a rigid board and a flexible board are connected,
The rigid substrate has a step portion at a connection portion with the flexible substrate, the flexible substrate is connected to the rigid substrate at the step portion, the flexible substrate on the step portion, and an upper surface of the rigid substrate Is a rigid-flexible substrate which is covered with another rigid substrate.
リジッド基板とフレキシブル基板とが接続されたリジッド−フレキシブル基板であって、
前記リジッド基板は、フレキシブル基板との接続部に上部に接続端子を有する段部を有し、前記フレキシブル基板は、端部表面に接続端子を有するとともに、この接続端子を前記リジッド基板の段部の接続端子に電気的に接続させて前記リジッド基板の段部に一体に接着されており、前記段部上の前記フレキシブル基板、及び前記リジッド基板の上面は、他のリジッド基板で被覆されていることを特徴とするリジッド−フレキシブル基板。
A rigid-flexible board in which a rigid board and a flexible board are connected,
The rigid substrate has a step portion having a connection terminal at an upper portion in a connection portion with the flexible substrate, and the flexible substrate has a connection terminal on an end surface, and the connection terminal is connected to a step portion of the rigid substrate. It is electrically connected to the connection terminal and is integrally bonded to the step portion of the rigid substrate, and the flexible substrate on the step portion and the upper surface of the rigid substrate are covered with another rigid substrate. A rigid-flexible substrate characterized by the above.
リジッド基板とフレキシブル基板とが接続されたリジッド−フレキシブル基板であって、
前記リジッド基板は、前記フレキシブル基板との接続部に段部を有するとともに、前記フレキシブル基板は、前記リジッド基板と前記段部において接続され、前記段部上の前記フレキシブル基板は、他のリジッド基板で被覆されていることを特徴とするリジッド−フレキシブル基板。
A rigid-flexible board in which a rigid board and a flexible board are connected,
The rigid substrate has a step portion at a connection portion with the flexible substrate, the flexible substrate is connected to the rigid substrate at the step portion, and the flexible substrate on the step portion is another rigid substrate. A rigid-flexible substrate, characterized in that it is coated.
リジッド基板とフレキシブル基板とが接続されたリジッド−フレキシブル基板であって、
前記リジッド基板は、フレキシブル基板との接続部に上部に接続端子を有する段部を有し、前記フレキシブル基板は、端部表面に接続端子を有するとともに、この接続端子を前記リジッド基板の段部の接続端子に電気的に接続させて前記リジッド基板の段部に一体に接着されており、前記段部上の前記フレキシブル基板は、他のリジッド基板で被覆されていることを特徴とするリジッド−フレキシブル基板。
A rigid-flexible board in which a rigid board and a flexible board are connected,
The rigid substrate has a step portion having a connection terminal at an upper portion in a connection portion with the flexible substrate, and the flexible substrate has a connection terminal on an end surface, and the connection terminal is connected to a step portion of the rigid substrate. Rigid-flexible, characterized in that it is electrically connected to a connection terminal and is integrally bonded to a step portion of the rigid substrate, and the flexible substrate on the step portion is covered with another rigid substrate. substrate.
前記他のリジッド基板の上面は、前記段部を有するリジッド基板の上面とほぼ等高とされていることを特徴とする請求項3又は4記載のリジッド−フレキシブル基板。   5. The rigid-flexible substrate according to claim 3, wherein an upper surface of the other rigid substrate is substantially level with an upper surface of the rigid substrate having the stepped portion. 前記リジッド基板の段部の接続端子は、その下面に形成した検査端子と、金属めっき層及び/又は導電性ペーストの固化物により接続されていることを特徴とする請求項1乃至5のいずれか1項記載のリジッド−フレキシブル基板。   The connection terminal of the step portion of the rigid substrate is connected to an inspection terminal formed on the lower surface thereof by a metal plating layer and / or a solidified material of a conductive paste. A rigid-flexible substrate according to item 1. 前記フレキシブル基板の接続端子は、金属配線、金属めっき層又は導電性ペーストの固化物からなることを特徴とする請求項1乃至6のいずれか1項記載のリジッド−フレキシブル基板。   The rigid-flexible substrate according to any one of claims 1 to 6, wherein the connection terminal of the flexible substrate is made of a metal wiring, a metal plating layer, or a solidified conductive paste. 前記リジッド基板の段部の接続端子とフレキシブル基板の接続端子の電気的な接続は、
導電性ペースト、異方性導電膜、高温半田、各端子表面に施した金めっき同士を圧接したもの、または、導電性組成物の固化物若しくは導電性金属からなる導体バンプを圧接したもので接続されていることを特徴とする請求項1乃至7のいずれか1項に記載のリジッド−フレキシブル基板。
The electrical connection between the connection terminal of the step portion of the rigid substrate and the connection terminal of the flexible substrate is as follows:
Connected with conductive paste, anisotropic conductive film, high-temperature solder, gold plating applied to the surface of each terminal, or solid bumps of conductive composition or conductive bumps made of conductive metal The rigid-flexible substrate according to any one of claims 1 to 7, wherein the rigid-flexible substrate is formed.
前記リジッド基板及びフレキシブル基板の各接続端子は、前記各基板の水平配線部と接続されるとともに、前記リジッド基板の反対側の面に設けた検査端子に接続されていることを特徴とする請求項1乃至8のいずれか1項記載のリジッド−フレキシブル基板。   The connection terminals of the rigid board and the flexible board are connected to a horizontal wiring portion of each of the boards, and are connected to an inspection terminal provided on the opposite surface of the rigid board. The rigid-flexible substrate according to any one of 1 to 8. リジッド基板とフレキシブル基板とが接続されたリジッド−フレキシブル基板の製造方法において、
前記リジッド基板と接続される領域に接続端子を有するフレキシブル基板を作成する工程と、
接続端子となる垂直配線部が露出した前記フレキシブル基板の厚さより深い段部を有するリジッド基板を作成する工程と、
前記各リジッド基板の段部の接続端子である前記垂直配線部に前記フレキシブル基板の端子を電気的及び機械的に接続し、前記フレキシブル基板の接続部上部並びに前記リジッド基板の上面に、他のリジッド基板を積層し、かつ少なくとも最上面に水平配線部を形成して、各水平配線部を垂直配線部で接続された配線部を有するリジッド基板部を形成する工程と
を具備して成ることを特徴とするリジッド−フレキシブル基板の製造方法。
In a manufacturing method of a rigid-flexible substrate in which a rigid substrate and a flexible substrate are connected,
Creating a flexible substrate having a connection terminal in a region connected to the rigid substrate;
Creating a rigid substrate having a step portion deeper than the thickness of the flexible substrate in which the vertical wiring portion serving as a connection terminal is exposed;
The terminals of the flexible substrate are electrically and mechanically connected to the vertical wiring portion, which is the connection terminal of the step portion of each rigid substrate, and another rigid portion is connected to the upper portion of the flexible substrate and the upper surface of the rigid substrate. And a step of forming a rigid substrate portion having a wiring portion in which a horizontal wiring portion is formed on at least the uppermost surface and each horizontal wiring portion is connected by a vertical wiring portion. A method for manufacturing a rigid-flexible substrate.
リジッド基板とフレキシブル基板とが接続されたリジッド−フレキシブル基板の製造方法において、
前記リジッド基板と接続される領域に接続端子を有するフレキシブル基板を作成する工程と、
接続端子となる垂直配線部が露出した前記フレキシブル基板の厚さより深い段部を有するリジッド基板を作成する工程と、
前記各リジッド基板の段部の接続端子である前記垂直配線部に前記フレキシブル基板の端子を電気的及び機械的に接続し、前記段部のフレキシブル基板の接続部上に、前記フレキシブル基板を覆うように、他のリジッド基板を加熱圧着させる工程と
を具備して成ることを特徴とするリジッド−フレキシブル基板の製造方法。
In a manufacturing method of a rigid-flexible substrate in which a rigid substrate and a flexible substrate are connected,
Creating a flexible substrate having a connection terminal in a region connected to the rigid substrate;
Creating a rigid substrate having a step portion deeper than the thickness of the flexible substrate in which the vertical wiring portion serving as a connection terminal is exposed;
A terminal of the flexible substrate is electrically and mechanically connected to the vertical wiring portion which is a connection terminal of a step portion of each rigid substrate, and the flexible substrate is covered on the connection portion of the flexible substrate of the step portion. And a step of thermocompression bonding another rigid substrate. A method for producing a rigid-flexible substrate, comprising:
前記接続端子となる垂直配線部が露出した前記フレキシブル基板の厚さより深い段部を有するリジッド基板を作成する工程は、
前記フレキシブル基板が接続される領域に、前記フレキシブル基板が接続される位置又はこれより内層の位置で水平配線部と接続された垂直配線部を有する複数のリジッド基板を作成する工程と、
前記各リジッド基板のフレキシブル基板の接続される領域に、座繰り加工を施して、前記垂直配線部が露出した前記フレキシブル基板の厚さより深い段部を形成する工程と
から成ることを特徴とする請求項10又は11記載のリジッド−フレキシブル基板の製造方法。
The step of creating a rigid substrate having a step portion deeper than the thickness of the flexible substrate in which the vertical wiring portion serving as the connection terminal is exposed,
Creating a plurality of rigid substrates having a vertical wiring portion connected to a horizontal wiring portion at a position where the flexible substrate is connected or at a position of an inner layer from the region where the flexible substrate is connected;
Forming a stepped portion deeper than the thickness of the flexible substrate where the vertical wiring portion is exposed by applying a countersink process to a region of the rigid substrate to which the flexible substrate is connected. Item 12. A method for producing a rigid-flexible substrate according to Item 10 or 11.
前記接続端子となる垂直配線部が露出した前記フレキシブル基板の厚さより深い段部を有するリジッド基板を作成する工程は、
前記フレキシブル基板が接続される領域に、前記フレキシブル基板が接続される位置又
はこれより内層の位置で水平配線部と接続された垂直配線部を有する複数の内層リジッド基板を作成する工程と、
前記内層リジッド基板の主面上に前記フレキシブル基板が接続される領域を露出させて外装基板を貼着させて、前記フレキシブル基板の厚さより深い段部を有するリジッド基板を作成する工程と
から成ることを特徴とする請求項10又は11記載のリジッド−フレキシブル基板の製造方法。
The step of creating a rigid substrate having a step portion deeper than the thickness of the flexible substrate in which the vertical wiring portion serving as the connection terminal is exposed,
Creating a plurality of inner layer rigid substrates having a vertical wiring portion connected to a horizontal wiring portion at a position where the flexible substrate is connected or an inner layer position in the region where the flexible substrate is connected;
Forming a rigid substrate having a step deeper than the thickness of the flexible substrate by exposing a region to which the flexible substrate is connected to the main surface of the inner layer rigid substrate and attaching an exterior substrate. The method for producing a rigid-flexible substrate according to claim 10 or 11, wherein:
JP2004287146A 2004-09-30 2004-09-30 Manufacturing method of rigid-flexible substrate Expired - Fee Related JP4574310B2 (en)

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