JP2006095601A - Laser guide for working machine and its production method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a laser guide for a working machine provided with antireflection films in which peeling is suppressed and characteristics are stable even in a severe using environment. <P>SOLUTION: In the laser guide 10 for transmitting laser light from a laser generation source, guide constituting members 11a 14 are provided at the optical path of laser light, and the light incident surface and light emitting surface of the guide constituting members 11a, 14 are coated with antireflection films 15, 16 each composed of a mutual stacked body of a high refractive index layer and a low refractive index layer. Both the high refractive index layer and low refractive index layer in each mutual stacked body composing the antireflection films 15, 16 are formed by an ion beam assisted deposition process. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a laser guide for a processing machine for transmitting laser light from a laser transmission source such as a YAG laser, and a manufacturing method thereof.

  In order to increase the light transmittance of the optical component, an antireflection film is provided so as to cover the light incident surface or the light emitting surface.

In Patent Document 1, the surface of a transparent glass substrate is made of a metal oxide film such as a base film made of a vacuum-deposited film and tantalum pentoxide (Ta ₂ O ₅ ) imparted with birefringence by an oblique deposition method. A birefringent plate in which an obliquely deposited film and an antireflection film are formed in this order, and the antireflection film is a first antireflection film such as tantalum pentoxide (Ta ₂ O ₅ ) formed by vacuum deposition. A second antireflective film such as titanium dioxide (TiO ₂ ) formed by vacuum deposition, and silicon dioxide (SiO ₂ ) or magnesium fluoride (MgF ₂ ) formed by ion-assisted deposition. 3 is provided with an antireflection film. And according to this, it is described that peeling of the outermost layer of the antireflection film can be surely prevented.

Patent Document 2 discloses a method of manufacturing a substrate with an antireflection film in which an antireflection film is formed on a transparent substrate, and the antireflection film is made of a material containing silicon, tin, and oxygen from the transparent substrate side. A laminated film having a refractive index layer, a high refractive index layer made of a material containing one element selected from titanium, niobium, tantalum, and hafnium and oxygen, and a low refractive index layer made of a material containing silicon and oxygen It is disclosed that the antireflection film is continuously formed by an in-line type sputtering apparatus. And according to this, it is described that the board | substrate with an antireflection film with favorable film | membrane adhesive force without film | membrane peeling can be obtained even in a severe environment.
JP 2001-228330 A JP 2004-126530 A

  By the way, the YAG laser is a solid-state laser having a fundamental wavelength of 1064 nm having neodymium (Nd) mixed in yttrium (Y), aluminum (Al), and garnet (G) crystals as a light emitter, and is welded, cut, marked, etc. It has a very wide application processing range. For this reason, YAG lasers are now an important technical means for industrial use, and are used for production and processing in all industries such as automobile production and processing factories.

  In such a YAG laser, a laser guide for a YAG laser having a laser guide optical fiber core is used for transmitting laser light from the YAG laser. In order to increase the transmission efficiency of the laser light, the laser guide optical fiber core Both fiber end faces are respectively covered with an antireflection film (AR film).

  However, as described above, YAG lasers are used in all industries, and in recent years, the usage environment has diversified both indoors and outdoors, and may be used under extremely severe environmental conditions. In such a case, the antireflection film may be peeled off due to a difference in thermal expansion between the laser guide optical fiber core wire and the antireflection film.

  The present invention has been made in view of the above points, and an object of the present invention is to provide a laser guide for a processing machine provided with an antireflective film that is prevented from being peeled even in a severe use environment and has stable characteristics. And a manufacturing method thereof.

  In the present invention, an antireflection film is formed by ion-assisted vapor deposition.

Specifically, the present invention is a laser guide for a processing machine for transmitting laser light from a laser source,
A guide component is provided in the optical path of the laser beam, and the light incident surface and / or the light output surface of the guide component is covered with an antireflection film composed of an alternating laminate of a high refractive index layer and a low refractive index layer. Has been
Both of the high refractive index layer and the low refractive index layer of the alternating laminate constituting the antireflection film are formed by an ion-assisted deposition method.
It is characterized by that.

  According to said structure, it comprised with the alternately laminated body of the high refractive index layer and the low refractive index layer so that the light-incidence surface and / or light-projection surface of a guide structural member provided in the optical path of a laser beam might be coat | covered. When forming the antireflection film, both the high-refractive index layer and the low-refractive index layer of the alternating laminate constituting the antireflection film are formed by ion-assisted deposition, so that the coating material has high kinetic energy. Because it has collided with the guide component and deposited in a high-density filling state, the adhesion between the antireflection film and the guide component is very high, and a difference in thermal expansion occurs between them. Even if it is, peeling of the antireflection film is suppressed. In addition, since both the high refractive index layer and the low refractive index layer are formed by the ion-assisted deposition method, the adhesion between the high refractive index layer and the low refractive index layer is very high. Delamination of the film is suppressed. Furthermore, since the antireflection film is deposited on the guide component in a high-density filling state, the entry of foreign matters such as water into the film is restricted, so that the deterioration of the antireflection film is suppressed. Thus, the peeling of the antireflection film from the guide component and the delamination of the antireflection film are suppressed, and further the deterioration of the antireflection film is suppressed. It can be used stably in the environment.

  According to the present invention, since both the high refractive index layer and the low refractive index layer of the alternating laminate constituting the antireflection film are formed by the ion-assisted vapor deposition method, peeling of the antireflection film is suppressed. Further, delamination of the antireflection film is suppressed, and further, the deterioration of the antireflection film is suppressed. Therefore, the antireflection film can be used stably in various environments both indoors and outdoors.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

  FIG. 1 shows an incident end side portion of a laser guide 10 for a YAG laser as a laser guide for a processing machine according to an embodiment of the present invention. The laser guide 10 for YAG laser is used in a processing machine such as laser welding in order to transmit laser light from a YAG laser that is a laser transmission source.

  The laser guide 10 for YAG laser is formed by inserting a laser guide optical fiber core wire 11a through a tube 11b to form a guide main body 11 and is incident on an incident end side portion which is one end of the guide main body 11. The output side connector is attached to the output end side portion which is the other end of the side connector 12. The laser guide 10 for YAG laser has a length of 0.1 to 300 m, for example.

Laser guide optical fiber 11a, for example, a diameter of the core and the diameter of 0.01~3mm is 0.06~4mm cladding or support from consisting of SiO ₂ made of an optical fiber made of plastic and / or metal An optical fiber core wire having a fiber diameter of 0.1 to 5 mm coated with a single layer or multiple layers with a coating layer.

  The tube 11b is, for example, a resin or metal corrugated tube having an outer diameter of 1 to 20 mm and an inner diameter of 0.5 to 20 mm.

  At the incident end portion of the guide body 11, the laser guide optical fiber core wire 11a protrudes from the tube 11b by about 0 to 200 mm, and the coating layer is peeled off by about 0 to 200 mm at the tip portion.

  The incident side connector 12 is formed in a cylindrical shape having a length of 10 to 300 mm and an outer diameter of 2 to 40 mm, for example, and a cap member 12b provided so as to cover the connector main body 12a and its connecting end side portion. It consists of

  The connector body 12a is, for example, 10 to 300 mm long and formed in a metal (aluminum, copper, SUS, or an alloy or a plated product thereof), and has holes in three stages in order from the base end side. Is formed with a small inner diameter, and a hole is formed with a maximum inner diameter at the connecting end side portion following the minimum inner diameter portion. A cylindrical sapphire chip 13 is fitted in the minimum inner diameter portion. Then, the incident end portion of the guide main body portion 11 is inserted from the proximal end side of the connector main body 12a toward the connection end side, and the end portion of the tube 11b is accommodated in the most proximal end portion of the connector main body 12a. A laser guide optical fiber core wire 11a protruding from the tube 11b is accommodated in a portion having a large inner diameter, and a portion on the connection end side thereof is embedded and fixed with resin, and the laser guide optical fiber core is placed on the sapphire chip 13 having the smallest inner diameter portion. The part where the coating layer of the wire 11a is peeled off is held in, and the tip part protrudes to the connecting end side part.

  The cap member 12b is, for example, formed in a bottomed cylindrical shape having a length of 5 to 100 mm, a bottom made of a protective glass 14 made of quartz or sapphire, and other parts made of metal or ceramic. The laser light is incident on the core of the laser guide optical fiber core 11a through the protective glass 14.

Antireflection films 15 and 16 are provided on both surfaces of the protective glass 14, that is, the light incident surface and the light emitting surface, and the light incident surface (fiber end surface) of the laser guide optical fiber core wire 11a so as to cover each surface. Is provided. As shown in FIG. 2, the antireflection films 15 and 16 are composed of an alternating laminate of a high refractive index layer 18 and a low refractive index layer 19. Both the high-refractive index layer 18 and the low-refractive index layer 19 of the alternating laminate constituting the antireflection films 15 and 16 are formed by ion-assisted deposition. For example, the high refractive index layer 18 has a thickness of 35 to 55 nm, preferably 40 to 50 nm, and is preferably 45 nm if the YAG laser is a laser transmission source. Ta ₂ O ₅ , HfO ₂ , TiO ₂ , Al ₂ O ₃ , Nb ₂ O ₅ , Y ₂ O ₃ or the like. Of these, Ta ₂ O ₅ is preferable because it is excellent in laser resistance and vapor deposition. The low refractive index layer 19 has a thickness of, for example, 220 to 260 nm, preferably 230 to 250 nm, and preferably 240 nm if the YAG laser is a laser source, and the laser guide optical fiber 11a. It is made of a material having a refractive index substantially equal to that of the core (for example, SiO ₂ ). SiO ₂ is preferable because of its good laser resistance and familiarity with the laser guide optical fiber core 11a. Here, the layer closest to the laser guide optical fiber core 11 a is the high refractive index layer 18. In the case where the high refractive index layer 18 is formed of a material (for example, SiO ₂ ) substantially equal to the refractive index of the core of the laser guide optical fiber core 11a, and the low refractive index layer 19 is formed of, for example, MgF ₂ . The layer closest to the laser guide optical fiber core 11a is the low refractive index layer 19. The total number of the antireflection films 15 and 16 is not particularly limited, and may be a two-layer structure or a four-layer structure. For example, a two-layer structure or a four-layer structure of SiO ₂ and Ta ₂ O ₅ can be used as the anti-reflection films 15 and 16 for 1064 nm.

A highly reflective film 17 is provided on the surface of the connection end side of the sapphire chip 13 so as to cover the surface. The highly reflective film 17 has a thickness of 1670 to 2260 nm, for example, and is made of HfO ₂ or SiO ₂ .

  The configuration of the exit end portion is substantially the same.

  In the laser guide 10 for YAG laser, the incident side connector 12 is connected to the YAG laser, and the emission side connector is connected to the processing head. Then, the laser light from the YAG laser is incident on the incident end face of the laser guide optical fiber core 11a through the protective glass 14 on the incident end side, which is transmitted by the laser guide optical fiber core 11a and passes through the output end face. Then, the light is emitted through the protective glass on the emission end side, and is output from the processing head. The protective glass 14 and the laser guide optical fiber core wire 11a are guide members provided in the optical path of the laser beam.

  Here, the YAG laser is a solid-state laser that emits a continuous laser beam having a fundamental wavelength of 1064 nm having neodymium (Nd) mixed in a yttrium (Y), aluminum (Al), or garnet (G) crystal as a light emitter, For example, the output is 6 kW.

  Next, a method of forming the antireflection films 15 and 16 on the protective glass 14 or the laser guide optical fiber core 11a will be described in the method of manufacturing the laser guide 10 for YAG laser.

  FIG. 3 shows an antireflection film deposition apparatus 20.

  The antireflection film deposition apparatus 20 has a chamber 21 connected to a vacuum pump. An electron gun 22 and a vapor deposition source 23 are provided at the lower center of the chamber 21, and electrons from the electron gun 22 collide with the vapor deposition source 23, whereby the vapor deposition material is emitted upward from the vapor deposition source 23. It is like that. An ion gun 24 is provided on the side of the electron gun 22 and the vapor deposition source 23 so that ions are emitted upward so as to collide with the flying vapor deposition material.

  Above the electron gun 22 and the vapor deposition source 23, a bowl-shaped dome 25 is rotatably provided so as to open downward. The dome 25 is formed with a large number of processed product holding holes 26, and the protective glass 14 or the like so that the surface on which the antireflection films 15 and 16 are to be formed is exposed inside the dome 25. The laser guide optical fiber core wire 11a can be set. A crystal monitor 27 is provided on the top of the dome 25 so that the vapor deposition amount and vapor deposition rate can be monitored. A monitor glass 28 is provided alongside the crystal monitor 27, and a light source 29 and a photodetector 31 are provided outside the chamber 21, and the light from the light source 29 is reflected to the monitor glass 28 via the mirror 30. This is detected by a photodetector 31 through a mirror 30, and thereby the film thickness of the film formed by vapor deposition can be monitored.

  Examples of the commercially available antireflection film deposition apparatus 20 include SGC-12SAC manufactured by Showa Vacuum Co., Ltd.

  In forming the antireflection films 15 and 16, first, the protective glass 14 or the laser guide optical fiber core wire 11 a on which the antireflection films 15 and 16 are deposited is set on the dome 25. At this time, in the case of the protective glass 14, one surface is set to face the inner side of the dome 25 from the workpiece holding hole 26 in the case of the laser guide optical fiber core wire 11 a. The intermediate portion of the laser guide optical fiber core wire 11 a is wound around the dome 25.

Next, after setting, for example, Ta ₂ O ₅ which is a high refractive index vapor deposition material as the vapor deposition source 23, the chamber is sealed and the inside is evacuated (5 × 10 ⁻³ Pa or less).

Next, the dome 25 is rotated (20 to 60 rpm) and ions are emitted from the ion gun 24. At this time, dust and dust adhering to the surfaces on which the antireflection films 15 and 16 are formed are scattered by ions (cleaning). The cleaning conditions are, for example, cleaning time: 1 to 10 minutes (for example, 5 minutes), rising anode voltage: 90%, about 160 V, rising cathode current: 30%, rising discharge stabilization time: 3 seconds, cleaning anode voltage : 50 to 80%, 80 to 133V (for example, 70% about 110V), cleaning cathode current: 30%, cleaning discharge stabilization time: 0 seconds, neutralizer delay time: 2 seconds, rising MFC-O ₂ flow rate: not specified , Rising MFC-Ar flow rate: not specified, cleaning MFC-O ₂ flow rate: 7.2 × 10 ^{−4 to} 9.0 × 10 ⁻⁴ m ³ / hour (for example, 9.0 × 10 ⁻⁴ m ³ / hour) ), Cleaning MFC-Ar flow rate: 0 to 7.2 × 10 ⁻⁴ m ³ / hour (for example, 0 m ³ / hour), and APC pressure control: not specified.

Next, the emission of electrons from the electron gun 22 and the emission of ions from the ion gun 24 are performed simultaneously. At this time, the electrons from the electron gun 22 collide with the vapor deposition source 23, whereby the vapor deposition material is emitted upward from the vapor deposition source 23. At the same time, ions from the ion gun 24 collide with the flying deposition material, and the kinetic energy of the flying deposition material is increased. The vapor deposition material with increased kinetic energy collides with and adheres to the surface of the protective glass 14 facing the processed product holding hole 26 of the dome 25 or the fiber end surface of the laser guide optical fiber core wire 11a. Is formed. Specifically, for example, in the case of Ta ₂ O ₅ , the rising cathode current is increased to 280 mA for the first 30 seconds, and the evaporation source 23 is dissolved by electron irradiation for about 2 minutes. The melting is an eight-point method so that the whole melts, and irradiation is performed for 2 seconds at each point. Electron irradiation for film formation is performed only on the central portion of the vapor deposition source 23, and the film formation cathode current is set to about 150 mA to adjust the film formation rate to the target. The film formation conditions of the high refractive index layer 18 are, for example, film formation rate: 1 Å / sec or less, rising anode voltage: 90%, about 160 V, rising cathode current: 30%, rising discharge stabilization time: 3 seconds, Membrane anode voltage: 50-80%, 80-133V (for example, 70% about 110V), deposition cathode current: 30%, deposition discharge stabilization time: 0 seconds, neutralizer delay time: 2 seconds, startup MFC-O ₂ flow rate: not specified, rising MFC-Ar flow rate: not specified, deposition MFC-O ₂ flow rate: 7.2 × 10 ^{−4 to} 9.0 × 10 ⁻⁴ m ³ / hour (for example, 9.0 × 10 ^-4 m ³ / hour), film formation MFC-Ar flow rate: 0 to 7.2 × 10 ⁻⁴ m ³ / hour (for example, 0 m ³ / hour), and APC pressure control: 5 × 10 ⁻² Pa is there.

Then, the vapor deposition source 23 is changed to, for example, SiO ₂ which is a low refractive index vapor deposition material, and the same operation is repeated. Thereby, a film of the low refractive index layer 19 is formed on the high refractive index layer 18. Specifically, for example, in the case of SiO ₂ , the rising cathode current is increased to 30 mA for the first 30 seconds, and the evaporation source 23 is dissolved by electron irradiation for about 30 seconds. The melting is an eight-point method so that the whole melts, and irradiation is performed for 2 seconds at each point. Electron irradiation for film formation is performed only on the central portion of the vapor deposition source 23, and the film formation cathode current is set to about 50 mA to adjust the target film formation speed. The film formation conditions of the low refractive index layer 19 are, for example, film formation speed: 1 km / second or less, rising anode voltage: 90%, about 160 V, rising cathode current: 30%, rising discharge stabilization time: 3 seconds, Membrane anode voltage: 50-80%, 80-133V (for example, 70% about 110V), deposition cathode current: 30%, deposition discharge stabilization time: 0 seconds, neutralizer delay time: 2 seconds, startup MFC-O ₂ flow rate: not specified, rising MFC-Ar flow rate: not specified, deposition MFC-O ₂ flow rate: 7.2 × 10 ^{−4 to} 9.0 × 10 ⁻⁴ m ³ / hour (for example, 9.0 × 10 ^-4 m ³ / hour), film formation MFC-Ar flow rate: 0 to 7.2 × 10 ⁻⁴ m ³ / hour (for example, 0 m ³ / hour), and APC pressure control: 5 × 10 ⁻² Pa is there.

  As described above, the antireflection films 15 and 16 having a two-layer structure are formed. By alternately changing the deposition source 23 to form a film, the high refractive index layer 18 and the low refractive index layer 19 are alternately laminated. By forming the body, the antireflection films 15 and 16 having a multilayer structure can be obtained. Further, in order to form the antireflection film 15 on the other surface of the protective glass 14, the protective glass 14 is set so that the other surface faces the inside of the dome 25 from the workpiece holding hole 26. The same operation may be repeated.

  According to the laser guide 10 for YAG laser of the present invention as described above, the light incident surface and the light emission surface of the protective glass 14 and the laser guide optical fiber core wire 11a provided in the optical path of the laser light are covered. Thus, when forming the antireflection films 15 and 16 composed of the alternating laminate of the high refractive index layer 18 and the low refractive index layer 19, the high refractive index of the alternating laminate constituting the antireflection films 15 and 16. Both the layer 18 and the low refractive index layer 19 are formed by ion-assisted deposition. Therefore, since the vapor deposition material has high kinetic energy and collides with the protective glass 14 or the laser guide optical fiber core wire 11a and is deposited in a high density filling state, the antireflection films 15 and 16 and the guide component members However, even if a thermal expansion difference occurs between them, peeling of the antireflection films 15 and 16 is suppressed.

  Therefore, the laser guide 10 for YAG laser is a high-temperature process in which the difference in thermal expansion is remarkably high, for example, removal processing such as cutting processing and drilling processing, welding processing and soldering among laser processes. It can be suitably used for a processing machine that performs thermal distortion deformation such as joining processing such as surface modification, surface modification such as back hardening, surface alloying and surface overlaying, linear bending processing and curved bending processing. Of course, it can be used in a low-temperature process, for example, a processing machine that performs surface decoration such as local heating for heat-assisted processing, patterning, and marking. Even in the case of a low-temperature process, a difference in thermal expansion may occur when used for a long time. Therefore, the effect of suppressing peeling of the antireflection films 15 and 16 is useful.

  In addition, since both the high refractive index layer 18 and the low refractive index layer 19 are formed by ion-assisted deposition, the adhesion between the high refractive index layer 18 and the low refractive index layer 19 is very high, Therefore, delamination of the antireflection films 15 and 16 is also suppressed.

  Furthermore, since the antireflection films 15 and 16 are vapor-deposited on the guide constituent member in a high-density filling state, entry of foreign matters such as water into the film is restricted, so that deterioration of the antireflection films 15 and 16 is suppressed. The

  In the case of the laser guide 10 for YAG laser as described above, peeling of the antireflection films 15 and 16 from the protective glass 14 or the laser guide optical fiber core 11a and delamination of the antireflection films 15 and 16 are performed. In addition, since the deterioration of the antireflection films 15 and 16 is suppressed, the antireflection films 15 and 16 can be stably used by being attached to a processing machine used in various environments both indoors and outdoors.

In the above embodiment, a YAG laser that emits continuous laser light is used as a laser generation source. However, the present invention is not particularly limited thereto, and a YAG laser that emits pulse laser light having a fundamental wavelength of 1064 nm (for example, an average output of 600 W), YVO ₄ laser that emits pulse laser light with a fundamental wavelength of 1064 nm (for example, average output 40 W), titanium that emits pulse laser light with a fundamental wavelength of 800 nm using titanium (Ti) mixed in alumina (Al ₂ O ₃ ) as a light emitter. A sapphire laser (for example, an output of 1 to 2 W), a ruby laser that emits a pulse laser beam having a fundamental wavelength of 684.3 nm, a glass laser that emits a pulse laser beam having a fundamental wavelength of 1060 nm that uses neodymium (Nd) as a light emitter, and neodymium (Nd) Doped continuous light with a fundamental wavelength of 1060 nm Fiber laser emitting (for example, output 1 kW), fiber laser emitting continuous light of fundamental wavelength 1540 nm doped with erbium (Er) (for example, output several hundred W), continuous wavelength of 1030 to 2200 nm doped with ytterbium (Yb) A fiber laser that emits light (for example, 1 to 10 kW), a semiconductor laser that emits continuous light with a fundamental wavelength of 700 to 900 nm using AlGaAsP as a light emitter, a semiconductor laser that emits continuous light with a fundamental wavelength of 1000 to 1600 nm using InGaAsP as a light emitter, A semiconductor laser or the like that emits continuous light with a fundamental wavelength of 490 nm using ZnSe as a light emitter may be used.

  Further, in the above embodiment, the antireflection films 15 and 16 are formed on both surfaces of the incident-side and emission-side protective glass 14 and on both fiber end surfaces of the laser guide optical fiber core wire 11a. It is not limited and may be provided in any one place.

  In the above embodiment, all the antireflection films 15 and 16 are formed by the ion-assisted deposition method. However, the present invention is not limited to this, and any one of the antireflection films 15 and 16 is an ion. What is necessary is just to be formed by the assist vapor deposition method, and it may be formed by other methods as long as it is the antireflection films 15 and 16 in places that are not placed under harsh environmental conditions.

  The antireflection film formed by the ion-assisted deposition method of the present invention has the effect of suppressing peeling even when provided on optical elements such as PPLN, optical fibers for communication wavelengths, optical fibers for high-power lasers, bundles and lenses. Can get.

  Laser guide optical fiber core (invention example 1) in which an antireflection film is formed on one fiber end surface by ion-assisted deposition, and laser guide optical fiber in which an antireflection film is formed on one fiber surface by electron beam heating deposition Both the core wire (Comparative Example 1), the laser guide optical fiber core wire (Invention Example 2) in which an antireflection film is formed on both fiber end faces by ion-assisted deposition, and the antireflection film by both electron beam heating deposition methods. About the laser guide optical fiber core wire (Comparative Example 2) formed on the fiber end face, spectral characteristics were measured before and after being immersed in pure water boiled at 100 ° C. for 2 hours and 4 hours.

  4 to 7 show the relationship between the wavelength and reflectance of Invention Example 1, Comparative Example 1, Invention Example 2 and Comparative Example 2, respectively.

  According to FIG. 4, it can be seen that Invention Example 1 has no change from the initial spectral characteristics when immersed for 2 hours or when immersed for 4 hours. Similarly, according to FIG. 6, it can be seen that Invention Example 2 has no change from the initial spectral characteristics when immersed for 2 hours or when immersed for 4 hours.

  On the other hand, according to FIG. 5, in Comparative Example 1, when immersed for 2 hours, there was a deviation from the initial spectral characteristics, and when immersed for 4 hours, spectral characteristics completely different from the initial ones. You can see that Similarly, according to FIG. 7, Comparative Example 2 shows a deviation from the initial spectral characteristics when immersed for 2 hours, and completely different from the initial spectral characteristics when immersed for 4 hours. You can see that These are considered to be due to peeling of the antireflection film.

  Therefore, it can be said that the antireflection films of Invention Examples 1 and 2 formed by ion-assisted vapor deposition are more difficult to peel than the antireflection films of Comparative Examples 1 and 2 formed by electron beam heating vapor deposition. .

  INDUSTRIAL APPLICATION This invention is useful about the laser guide for processing machines for transmitting the laser beam from a laser transmission source, and its manufacturing method.

It is a figure which shows the structure of the laser guide for YAG lasers concerning embodiment of this invention. It is a typical sectional view of an antireflection film. It is a figure which shows the structure of an antireflection film vapor deposition apparatus. It is a graph which shows the relationship between the wavelength of invention example 1, and a reflectance. It is a graph which shows the relationship between the wavelength of the comparative example 1, and a reflectance. It is a graph which shows the relationship between the wavelength of invention example 2, and a reflectance. It is a graph which shows the relationship between the wavelength of the comparative example 2, and a reflectance.

Explanation of symbols

10 Laser guide for YAG laser (Laser guide for processing machine)
DESCRIPTION OF SYMBOLS 11 Guide main-body part 11a Laser guide optical fiber core wire 11b Tube 12 Incident side connector 12a Connector main body 12b Cap member 13 Sapphire chip 14 Protective glass 15, 16 Antireflection film 17 High reflection film 18 High refractive index layer 19 Low refractive index layer 20 Antireflection film deposition apparatus 21 Chamber 22 Electron gun 23 Deposition source 24 Ion gun 25 Dome 26 Workpiece holding hole 27 Crystal monitor 28 Monitor glass 29 Light source 30 Mirror 31 Photo detector

Claims (5)

A laser guide for a processing machine for transmitting laser light from a laser source,
A guide component is provided in the optical path of the laser beam, and the light incident surface and / or the light output surface of the guide component is covered with an antireflection film composed of an alternating laminate of a high refractive index layer and a low refractive index layer. Has been
Both of the high refractive index layer and the low refractive index layer of the alternating laminate constituting the antireflection film are formed by an ion-assisted deposition method.
This is a laser guide for processing machines. In the laser guide for processing machines described in claim 1,
The guide component is a laser guide optical fiber;
This is a laser guide for processing machines. In the laser guide for processing machines described in claim 1,
The laser source is a YAG laser;
This is a laser guide for processing machines. In the laser guide for processing machines described in claim 1,
For high temperature process applications,
This is a laser guide for processing machines. A method of manufacturing a laser guide for a processing machine for transmitting laser light from a laser source,
Forming an antireflection film composed of an alternating laminate of a high-refractive index layer and a low-refractive index layer so as to cover a light incident surface and / or a light output surface of a guide component provided in the optical path of the laser beam With
Both of the high refractive index layer and the low refractive index layer of the alternating laminate constituting the antireflection film are formed by ion-assisted deposition.
A method for manufacturing a laser guide for a processing machine.

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