JP2006093721A5 - - Google Patents
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- Publication number
- JP2006093721A5 JP2006093721A5 JP2005291809A JP2005291809A JP2006093721A5 JP 2006093721 A5 JP2006093721 A5 JP 2006093721A5 JP 2005291809 A JP2005291809 A JP 2005291809A JP 2005291809 A JP2005291809 A JP 2005291809A JP 2006093721 A5 JP2006093721 A5 JP 2006093721A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- exposure
- exposure apparatus
- liquid
- flat plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005291809A JP4164508B2 (ja) | 2005-10-04 | 2005-10-04 | 露光装置及びデバイス製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005291809A JP4164508B2 (ja) | 2005-10-04 | 2005-10-04 | 露光装置及びデバイス製造方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003185389A Division JP3862678B2 (ja) | 2003-06-27 | 2003-06-27 | 露光装置及びデバイス製造方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007248076A Division JP4533416B2 (ja) | 2007-09-25 | 2007-09-25 | 露光装置およびデバイス製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2006093721A JP2006093721A (ja) | 2006-04-06 |
JP2006093721A5 true JP2006093721A5 (zh) | 2007-08-23 |
JP4164508B2 JP4164508B2 (ja) | 2008-10-15 |
Family
ID=36234328
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005291809A Expired - Fee Related JP4164508B2 (ja) | 2005-10-04 | 2005-10-04 | 露光装置及びデバイス製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4164508B2 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4517354B2 (ja) * | 2004-11-08 | 2010-08-04 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
US7423720B2 (en) | 2004-11-12 | 2008-09-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
TWI653511B (zh) * | 2006-08-31 | 2019-03-11 | 日商尼康股份有限公司 | Exposure apparatus, exposure method, and component manufacturing method |
JP5177736B2 (ja) * | 2006-11-01 | 2013-04-10 | レーザーテック株式会社 | マスク検査装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100446179C (zh) * | 2002-12-10 | 2008-12-24 | 株式会社尼康 | 曝光设备和器件制造法 |
KR101178756B1 (ko) * | 2003-04-11 | 2012-08-31 | 가부시키가이샤 니콘 | 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침액체를 유지하는 장치 및 방법 |
JP2005277363A (ja) * | 2003-05-23 | 2005-10-06 | Nikon Corp | 露光装置及びデバイス製造方法 |
-
2005
- 2005-10-04 JP JP2005291809A patent/JP4164508B2/ja not_active Expired - Fee Related
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