JP2006072147A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2006072147A5 JP2006072147A5 JP2004257674A JP2004257674A JP2006072147A5 JP 2006072147 A5 JP2006072147 A5 JP 2006072147A5 JP 2004257674 A JP2004257674 A JP 2004257674A JP 2004257674 A JP2004257674 A JP 2004257674A JP 2006072147 A5 JP2006072147 A5 JP 2006072147A5
- Authority
- JP
- Japan
- Prior art keywords
- light
- light source
- sample
- lenses
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Claims (15)
透過照明光源と、
前記透過照明光源からの光を集光して前記試料に出射する透過照明光学系と、
透過像を撮像するため、前記透過照明光学系から前記試料に出射された光のうち前記試料を透過した透過光を検出する透過側検出器と、
落射照明光源と、
前記落射照明光源からの光を集光して前記試料に出射する落射照明光学系と、
反射像を撮像するため、前記落射照明光学系から前記試料に出射された光のうち前記試料で反射した反射光を検出する反射側検出器と、
欠陥のない箇所において、前記透過像と反射像との間の位置ずれ量を算出する位置ずれ量算出部と、
前記透過像又は前記反射像の一方の像において、前記試料に設けられたパターンの輪郭を抽出する輪郭抽出部と、
前記輪郭を抽出した像の前記輪郭における輝度の傾斜方向を算出する傾斜方向算出部と、
前記位置ずれ量と前記輝度の傾斜方向とに基づいて前記輪郭をずらした位置を求め、前記輪郭をずらした位置における前記輪郭を抽出した像の他方の像の輝度に基づいて欠陥判定を行う欠陥判定部とを備える検査装置。 An inspection apparatus for detecting and inspecting a defect of a sample provided with a transmission pattern that transmits light and a light shielding pattern that blocks light,
A transmitted illumination light source;
A transmission illumination optical system that collects light from the transmission illumination light source and emits the light to the sample;
A transmission-side detector that detects transmitted light that has passed through the sample out of light emitted from the transmitted illumination optical system to the sample in order to capture a transmission image;
An epi-illumination light source,
An epi-illumination optical system that collects light from the epi-illumination light source and emits the light to the sample;
In order to capture a reflected image, a reflection-side detector that detects reflected light reflected by the sample out of the light emitted from the epi-illumination optical system to the sample;
A positional deviation amount calculation unit for calculating a positional deviation amount between the transmission image and the reflection image in a place having no defect;
A contour extraction unit that extracts a contour of a pattern provided on the sample in one of the transmission image and the reflection image;
An inclination direction calculating unit for calculating an inclination direction of luminance in the outline of the image obtained by extracting the outline;
A defect that obtains a position where the contour is shifted based on the displacement amount and the inclination direction of the luminance, and performs defect determination based on the luminance of the other image from which the contour is extracted at the position where the contour is shifted. An inspection apparatus comprising a determination unit.
前記輪郭抽出部が前記傾斜量を算出した像の輪郭を抽出し、
前記欠陥判定部が前記輪郭をずらした位置を前記輝度の傾斜量に基づいて求める請求項１記載の検査装置。 In a portion having no defect, further comprising an inclination amount calculation unit for calculating an inclination amount of luminance in the vicinity of a pattern edge in one of the transmission image or the reflection image,
The contour extraction unit extracts the contour of the image for which the inclination amount is calculated,
The inspection apparatus according to claim 1, wherein the defect determination unit obtains a position where the outline is shifted based on an inclination amount of the luminance.
前記第１のレンズを介して、前記落射照明光源からの光が前記反射側検出器に検出され、
前記透過照明光学系が前記透過照明光源からの光を集光して試料に出射する第２のレンズを備え、
前記第１のレンズを介して前記透過照明光源からの光が前記透過側検出器に検出され、
前記落射照明光源からの光が前記第１のレンズの視野の一部である第１の領域に入射して前記反射側検出器で検出され、前記透過照明光源からの光が前記第１のレンズの視野の一部であり前記第１の領域からずれた第２の領域に入射して前記透過側検出器で検出される請求項１、２又は３に記載の検査装置。 The epi-illumination optical system comprises a first lenses to be emitted to the sample light focused from the epi-illumination light source,
Through the first lenses, the light from the epi-illumination light source is detected on the reflection side detector,
A second lenses of the transmitting illumination optical system is emitted to the sample by condensing light from the transmitting light source,
Wherein the light from the transmitting light source is detected on the permeate side detector through the first lenses,
The incident light from the illumination light source is detected by the reflection-side detector enters the first region which is a part of the field of view of the first lenses, the light from the transmitting light source is the first inspection apparatus according to claim 1, 2 or 3 is detected by the transmission-side detector enters a part of the field of view of the lenses in the second region displaced from the first region.
前記落射照明光源からの光を集光して試料に出射する第１のレンズと、
前記第１のレンズから前記試料に出射した光のうち、前記試料で反射した反射光を前記第１のレンズを介して検出する反射側検出器と、
透過照明光源と、
前記透過照明光源からの光を集光して前記試料に出射する第２のレンズと、
前記第２のレンズから前記試料に出射した光のうち、前記試料を透過した透過光を前記第１のレンズを介して検出する透過側検出器とを備え、
前記落射照明光源からの光が前記第１のレンズの視野の一部である第１の領域に入射して前記反射側検出器で検出され、前記透過照明光源からの光が前記第１のレンズの視野の一部であり前記第１の領域からずれた第２の領域に入射し、前記反射光と異なる方向に前記反射光から分岐された前記透過光を前記透過側検出器で検出される検査装置。 An epi-illumination light source,
A first lenses to be emitted to the sample by condensing light from the epi-illumination light source,
Of the light emitted to the sample from the first lenses, and a reflection side detector for detecting reflected light reflected by the sample through the first lenses,
A transmitted illumination light source;
A second lenses emitted to the sample by condensing light from the transmitting light source,
Of the light emitted to the sample from the second lenses, the light transmitted through the sample and a permeate side detector for detecting via the first lenses,
The incident light from the illumination light source is detected by the reflection-side detector enters the first region which is a part of the field of view of the first lenses, the light from the transmitting light source is the first incident on the second region displaced from the portion a and the first region of the field of view of the lenses, detecting the transmitted light which is branched from the reflected light in a different direction as the reflected light at the transmission side detector Inspection equipment.
反射光又は／及び透過光を前記第１のレンズを介して反射部材に入射させて、前記透過光と前記反射光とを分岐させる請求項５に記載の検査装置。 The inspection apparatus according to claim 5, wherein reflected light or / and transmitted light is incident on a reflecting member via the first lens to branch the transmitted light and the reflected light.
前記透過照明光源と前記第２のレンズとの間に配置され、前記透過照明光源からの光が前記第２の領域に入射するよう前記透過照明光源からの光を遮る第２の絞りとをさらに備える請求項４乃至７のいずれかに記載の検査装置。 Wherein disposed between the epi-illumination light source and the first lenses, the first diaphragm which light from the epi-illumination light source blocks the light from the epi-illumination light source to be incident on the first region,
Wherein disposed between the transmitting light source and said second lenses, and a second diaphragm to block light from the transmissive illumination light source so that light from the transmitting light source is incident on the second region inspection device according to any one of claims 4 to 7 further comprising.
前記試料を透過した透過光を検出して透過像を撮像する透過像撮像ステップと、
前記試料で反射した反射光を検出して反射像を撮像する反射像撮像ステップと、
欠陥のない箇所において、前記透過像と前記反射像との間の位置ずれ量を算出する位置ずれ量算出ステップと、
前記透過像又は前記反射像の一方の像において、前記試料に設けられたパターンの輪郭を抽出する輪郭抽出ステップと、
前記輪郭を抽出した像の前記輪郭における輝度の傾斜方向を算出する傾斜方向算出ステップと、
前記位置ずれ量と前記輝度の傾斜方向とに基づいて前記輪郭をずらした位置を算出するステップと、
前記輪郭をずらした位置における前記輪郭を抽出した像の他方の像の輝度に基づいて欠陥判定を行う欠陥判定ステップとを有する検査方法。 A defect inspection method for detecting and inspecting a defect of a sample provided with a transmission pattern that transmits light and a light shielding pattern that blocks light,
A transmission image capturing step of detecting a transmitted light transmitted through the sample and capturing a transmission image;
A reflected image capturing step of detecting reflected light reflected by the sample and capturing a reflected image;
A misregistration amount calculating step for calculating a misregistration amount between the transmission image and the reflection image at a location having no defect;
A contour extraction step of extracting a contour of a pattern provided on the sample in one of the transmission image and the reflection image;
An inclination direction calculating step of calculating an inclination direction of luminance in the outline of the image obtained by extracting the outline;
Calculating a position where the contour is shifted based on the positional deviation amount and the luminance inclination direction;
A defect determination step of performing a defect determination based on the luminance of the other image from which the contour is extracted at the position where the contour is shifted.
前記輪郭抽出ステップでは、前記傾斜量を求めた像の輪郭を抽出し、
前記欠陥判定ステップでは、前記輪郭をずらした位置を前記輝度の傾斜量に基づいて求める請求項９に記載の検査方法。 A step of calculating a gradient amount of luminance in the vicinity of a pattern edge in one of the transmission image or the reflection image in a place having no defect;
In the contour extraction step, the contour of the image for which the inclination amount is obtained is extracted,
The inspection method according to claim 9, wherein, in the defect determination step, a position where the outline is shifted is obtained based on an inclination amount of the luminance.
前記第１のレンズに入射した前記落射照明光源からの光を前記第１のレンズの視野の一部である第１の領域に集光して試料に入射させるステップと、
前記落射照明光源から前記試料に入射した光のうち、前記試料で反射した反射光を前記第１のレンズに入射させるステップと、
透過照明光源からの光を第２のレンズに入射させるステップと、
前記第２のレンズに入射した前記透過照明光源からの光を前記第１のレンズの視野の一部であり前記第１の領域からずれた第２の領域に集光して前記試料に入射させるステップと、
前記透過照明光源から前記試料に入射した光のうち、前記試料を透過した透過光を前記第１のレンズに入射させるステップと、
前記第１のレンズから出射された前記透過光と前記反射光とを分岐させるステップと、
前記反射光から分岐された前記透過光を透過側検出器で検出するステップと、
前記透過光から分岐された前記反射光を反射側検出器で検出するステップとを有する検査方法。 A step for entering the light from the epi-illumination light source to the first lenses,
A step of entering the sample by condensing light from the epi-illumination light source incident on the first lenses in a first area which is a part of the field of view of the first lenses,
Of the light incident on the sample from the epi-illumination light source, a step of incident light reflected by the sample to the first lenses,
A step for entering the light from the transmissive illumination light source to the second lenses,
The sample light converged second region displaced from the first a part of the field of view of lenses of the first region from the second of said transmitting light source incident on the lenses An incident step;
Of the light incident on the sample from the transmitting light source, the step of entering the light transmitted through the sample to the first lenses,
Branching the transmitted light and the reflected light emitted from the first lens;
Detecting the transmitted light branched from the reflected light with a transmission-side detector;
Inspection method and a step of detecting the reflected light split from the transmitted light by the reflection side detector.
前記検査ステップによって検査されたフォトマスクの欠陥を修正する欠陥修正ステップと、
前記欠陥修正ステップで修正されたフォトマスクを介して基板を露光する露光ステップと、
前記露光された基板を現像する現像ステップを有するパターン基板の製造方法。 The inspection method according to any one of claims 9 to 1 4, an inspection step of inspecting the photomask,
A defect correcting step of correcting defects of the photomask inspected by the inspecting step;
An exposure step of exposing the substrate through the photomask corrected in the defect correction step;
A pattern substrate manufacturing method comprising a developing step of developing the exposed substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004257674A JP4025859B2 (en) | 2004-09-03 | 2004-09-03 | Inspection apparatus, inspection method, and pattern substrate manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004257674A JP4025859B2 (en) | 2004-09-03 | 2004-09-03 | Inspection apparatus, inspection method, and pattern substrate manufacturing method |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007170090A Division JP4285613B2 (en) | 2007-06-28 | 2007-06-28 | Inspection apparatus, inspection method, and pattern substrate manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006072147A JP2006072147A (en) | 2006-03-16 |
| JP2006072147A5 true JP2006072147A5 (en) | 2007-03-29 |
| JP4025859B2 JP4025859B2 (en) | 2007-12-26 |
Family
ID=36152823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004257674A Expired - Fee Related JP4025859B2 (en) | 2004-09-03 | 2004-09-03 | Inspection apparatus, inspection method, and pattern substrate manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4025859B2 (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008026212A (en) * | 2006-07-24 | 2008-02-07 | Ushio Inc | Pattern inspection device |
| JP5221858B2 (en) * | 2006-08-30 | 2013-06-26 | 株式会社日立ハイテクノロジーズ | Defect inspection apparatus and defect inspection method |
| JP4224863B2 (en) | 2007-02-02 | 2009-02-18 | レーザーテック株式会社 | Inspection apparatus, inspection method, and pattern substrate manufacturing method |
| JP4590521B1 (en) * | 2009-10-30 | 2010-12-01 | レーザーテック株式会社 | Inspection apparatus and inspection method |
| US8280172B1 (en) * | 2011-03-22 | 2012-10-02 | Mitutoyo Corporation | Edge location measurement correction for coaxial light images |
| JP5024842B1 (en) * | 2011-07-22 | 2012-09-12 | レーザーテック株式会社 | Inspection apparatus and inspection method |
| US9843719B2 (en) | 2013-02-28 | 2017-12-12 | Panasonic Intellectual Property Management Co., Ltd. | Confocal microscope |
| JP6373074B2 (en) * | 2014-06-06 | 2018-08-15 | 株式会社ニューフレアテクノロジー | Mask inspection apparatus and mask inspection method |
| JP6591348B2 (en) * | 2016-06-03 | 2019-10-16 | 株式会社ニューフレアテクノロジー | Inspection method |
| EP3951844A4 (en) * | 2019-03-28 | 2023-01-04 | Hamamatsu Photonics K.K. | Inspection device and inspection method |
| JP7373105B2 (en) | 2020-03-10 | 2023-11-02 | 株式会社東京精密 | Crack detection device and method |
| CN113686897B (en) * | 2021-08-05 | 2023-11-03 | 江苏维普光电科技有限公司 | Mask surface particle defect detection method |
-
2004
- 2004-09-03 JP JP2004257674A patent/JP4025859B2/en not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4224863B2 (en) | Inspection apparatus, inspection method, and pattern substrate manufacturing method | |
| JP5594254B2 (en) | Silicon substrate inspection apparatus and inspection method | |
| JP4990630B2 (en) | Surface inspection apparatus and surface inspection method | |
| KR101207198B1 (en) | Board inspection apparatus | |
| KR101300132B1 (en) | Apparatus for detecting particle in flat glass and detecting method using same | |
| US20110043794A1 (en) | Dark-Field Examination Device | |
| JP2005127989A (en) | Flaw detector and flaw detecting program | |
| JP2006072147A5 (en) | ||
| JP7183155B2 (en) | Defect inspection method and apparatus on transparent substrate | |
| JP2015227793A (en) | Inspection device of optical components and inspection method thereof | |
| JP2012002676A (en) | Mask defect checking device and mask defect checking method | |
| JP2004022797A (en) | Device and method for detecting position of mark | |
| JP4025859B2 (en) | Inspection apparatus, inspection method, and pattern substrate manufacturing method | |
| US8223328B2 (en) | Surface inspecting apparatus and surface inspecting method | |
| JP6160255B2 (en) | Solar cell inspection device and image position correction method for solar cell inspection device | |
| JP2015078865A (en) | Foreign substance inspection device | |
| JP2005241586A (en) | Inspection device and method for optical film | |
| JP4285613B2 (en) | Inspection apparatus, inspection method, and pattern substrate manufacturing method | |
| KR101745764B1 (en) | Apparatus and Method for Optically Inspecting Surface of Plate Member | |
| JP4715955B2 (en) | Mask inspection method and mask inspection apparatus | |
| JP2004212353A (en) | Optical inspection apparatus | |
| KR20160032576A (en) | System and Method for Analyzing Image Using High-Speed Camera and Infrared Optical System | |
| KR20160084726A (en) | Apparatus for inspecting defect | |
| TWI843194B (en) | Defect detection method and detection system for semi-reflective film using different light sources along the same optical axis | |
| JP2002014058A (en) | Method and apparatus for checking |