JP2006070054A - Resin composition and adhesive film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To obtain a resin composition that prevents dew condensation occurring between a semiconductor part or a liquid crystal display part and a substrate, and an adhesive film. <P>SOLUTION: The resin composition comprises a curable resin and a porous filler. The adhesive film comprises the resin composition. The adsorptivity of the porous filler at a room temperature is ≥7 (g/100g) and that at 60°C is ≥3 (g/100g). The content of the porous filler is preferably 5-70 wt.% based on the whole resin composition. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a resin composition and an adhesive film.

  When bonding semiconductor components such as semiconductor elements or liquid crystal display components to rigid substrates such as interposers, or substrates such as insulating substrates made of organic or inorganic substances, a liquid resin or the like serving as an adhesive is dispenser or potted. It is used by selectively applying to one of a semiconductor element and a substrate by a method, or partially applying a liquid resin with a squeegee or the like (see, for example, Patent Document 1).

  Depending on the type of the semiconductor component or the liquid crystal display component, when bonding the component and the substrate, the adhesive is selectively applied only to the outer peripheral portion without applying and bonding the adhesive to the entire surface. Some have a structure (a so-called hollow package) in which a substrate is bonded to provide a space inside. In particular, when a general-purpose adhesive is used for the structure having a transparent member such as glass as the substrate, the transparent member in the internal space may cause condensation. In particular, when the semiconductor component is a solid-state image sensor, the solid-state image sensor does not cause accurate photoelectric conversion due to condensation, which may cause problems in image recognition and display.

Japanese Patent Laid-Open No. 10-313070

  An object of the present invention is to provide a resin composition and an adhesive film excellent in reliability capable of preventing dew condensation occurring between a semiconductor component or a liquid crystal display component and a substrate.

Such an object can be achieved by the present invention described in the following (1) to (10).
(1) A resin composition comprising a curable resin and a porous filler.
(2) The resin composition according to (1), wherein the curable resin includes a thermosetting resin.
(3) The resin composition according to (1) or (2), wherein the curable resin contains a photocurable resin.
(4) The resin composition according to any one of (1) to (3), wherein the curable resin includes a curable resin curable by both light and heat.
(5) The resin composition according to any one of (1) to (4), wherein the porous filler has an adsorption force at room temperature of 7 (g / 100 g) or more.
(6) The resin composition according to any one of (1) to (5), wherein the porous filler has an adsorption force at 60 ° C. of 3 (g / 100 g) or more.
(7) The resin composition according to any one of (1) to (6), wherein the content of the porous filler is 5 to 70% by weight of the entire resin composition.
(8) The resin composition according to any one of (1) to (7), wherein the porous filler includes zeolite.
(9) The resin composition according to any one of (1) to (8), which is used as an adhesive.
(10) An adhesive film comprising the resin composition according to any one of (1) to (9).

  ADVANTAGE OF THE INVENTION According to this invention, the resin composition and adhesive film excellent in the reliability which can prevent the dew condensation which arises between the components for semiconductors or the components for liquid crystal displays, and a board | substrate can be obtained. Moreover, there is almost no corrosion of the electrodes of the semiconductor component, and the reliability can be maintained for a long time.

Hereinafter, the resin composition and adhesive film of the present invention will be described in detail.
The resin composition of the present invention comprises a curable resin and a porous filler, and the adhesive film of the present invention comprises the resin composition.

  The resin composition and adhesive film of the present invention are used for joining a semiconductor component or a liquid crystal display component and a substrate. In joining the semiconductor component or the liquid crystal display component and the substrate, it is necessary that the adhesive component is accurately formed in a predetermined portion of the semiconductor component or the like (or the substrate). The adhesive film of the present invention is suitable for such a demand.

  Conventionally, various studies have been made to solve the problem of substrate condensation. For example, the resin is filled with spherical or irregular fillers such as silica and alumina, scale pen-like fillers such as talc and mica, and needle-like fillers such as aluminum borate and titanium oxide. It is an attempt to improve the dew condensation by reducing the moisture permeability.

  Condensation that occurs between semiconductor components and liquid crystal components and the substrate (inside) is due to moisture trapped in the internal space when the substrate is attached and moisture that has entered the interior through the adhesive layer after attachment. Is considered to be the cause. Therefore, in the method of reducing the moisture permeability of the resin composition and the adhesive film, the moisture permeability cannot be made completely zero, so moisture gradually enters the interior over time and releases it to the outside instantly. It was difficult to completely resolve the condensation. Further, when trying to reduce the moisture permeability for improving dew condensation, it is necessary to fill the filler in a large amount, which causes problems such as a decrease in adhesive strength and an increase in processing temperature.

  In the present invention, the water permeability is not lowered by filling with the filler as conventionally performed, but a porous filler is added to increase the moisture permeability on the contrary, and the moisture permeability is excellent. By using resin, the occurrence of condensation is prevented. By increasing the moisture permeability of the film, moisture generated inside can be released to the outside instantly, thereby preventing the occurrence of condensation. The mechanism for increasing the water permeability of the resin by adding the porous filler is considered as follows. By filling a porous filler having a high moisture adsorption capacity, a relatively large amount of moisture is adsorbed inside the resin, and moisture (water vapor) easily passes through the film using the moisture in the film as a medium. It is considered a thing. Compared to resin and filler, it is considered that the moisture portion in the resin can transmit water vapor with less resistance. For this reason, it is preferable to add a porous filler having a high water absorption capacity.

  The moisture permeability of the adhesive film can be evaluated at 40 ° C./90% using an adhesive film having a thickness of 100 μm according to a moisture permeability cup method (JIS Z0208).

Examples of the curable resin constituting the resin composition include a photocurable resin (a resin that is cured mainly by irradiation with light such as ultraviolet rays), a thermosetting resin (a resin that is mainly cured by heat), and the like.
Although the said curable resin is not specifically limited, It is preferable that a photocurable resin is included. Thereby, it is excellent in the alignment accuracy of the adhesive component. That is, by including the photocurable resin, it is possible to easily arrange the adhesive component at a predetermined position by exposing, developing, and patterning the adhesive film.

  Examples of the photocurable resin (particularly, an ultraviolet curable resin) include an ultraviolet curable resin mainly composed of an acrylic compound, an ultraviolet curable resin mainly composed of a urethane acrylate oligomer or a polyester urethane acrylate oligomer, and an epoxy resin. Examples thereof include an ultraviolet curable resin mainly comprising at least one selected from the group of resins and vinylphenol resins.

Among these, an ultraviolet curable resin mainly composed of an acrylic compound is preferable. The acrylic compound has a high curing rate when irradiated with light, and thus the resin can be patterned with a relatively small amount of exposure.
Examples of the acrylic compounds include monomers of acrylic acid esters or methacrylic acid esters. Specifically, ethylene glycol diacrylate, ethylene glycol dimethacrylate, 1,6-hexanediol diacrylate, and 1,6 dimethacrylate. -Bifunctional acrylates such as hexanediol, glyceryl diacrylate, glyceryl dimethacrylate, 1,10-decanediol diacrylate, 1,10-decanediol dimethacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate And polyfunctional acrylates such as pentaerythritol triacrylate, pentaerythritol trimethacrylate, dipentaerythritol hexaacrylate, and dipentaerythritol hexamethacrylate . Among these, acrylic acid esters are preferable, and acrylic acid esters or methacrylic acid alkyl esters having 1 to 15 carbon atoms in the ester moiety are particularly preferable.

  Although content of the said photocurable resin (ultraviolet curable resin) is not specifically limited, 5 to 60 weight% of the whole said resin composition is preferable, and 8 to 30 weight% is especially preferable. If the content is less than the lower limit value, the resin may not be patterned by ultraviolet irradiation. If the content exceeds the upper limit value, the resin may be too soft and the film properties before ultraviolet irradiation may be deteriorated.

The photocurable resin (particularly, ultraviolet curable resin) is not particularly limited, but is preferably liquid at normal temperature. Thereby, the curing reactivity by ultraviolet rays can be improved. Furthermore, the mixing operation with the thermosetting resin can be facilitated. Examples of the ultraviolet curable resin that is liquid at normal temperature include the ultraviolet curable resin mainly composed of the acrylic compound described above.
Moreover, it is preferable to use a photopolymerization initiator in combination with the resin composition. Thereby, resin can be efficiently patterned by photopolymerization.

  Although it does not specifically limit as said photoinitiator, The thing which generate | occur | produces a radical by ultraviolet irradiation is preferable. Examples include benzophenone, acetophenone, benzoin, benzoin isobutyl ether, methyl benzoin benzoate, benzoin benzoic acid, benzoin methyl ether, benzylfinyl sulfide, benzyl, dibenzyl, diacetyl and the like.

  Although content of the said photoinitiator is not specifically limited, 0.5 to 5 weight% of the whole said resin composition is preferable, and 0.8 to 2.5 weight% is especially preferable. When the content is less than the lower limit, the effect of initiating photopolymerization may be reduced, and when the content exceeds the upper limit, the reactivity may be too high and storage stability and resolution may be reduced.

  The curable resin preferably further contains a thermosetting resin. Thereby, it can have adhesiveness even after exposing, developing and patterning the adhesive film. That is, by bonding the adhesive film and exposing, developing, and patterning, the semiconductor component and the substrate can be bonded to each other by thermocompression bonding after disposing the adhesive component at a predetermined position.

  Examples of the thermosetting resins include phenol novolac resins, cresol novolac resins, novolac type phenol resins such as bisphenol A novolac resins, phenol resins such as resol phenol resins, bisphenol type epoxies such as bisphenol A epoxy resins and bisphenol F epoxy resins. Resin, novolak epoxy resin, cresol novolac epoxy resin, etc., novolak epoxy resin, biphenyl epoxy resin, stilbene epoxy resin, triphenolmethane epoxy resin, alkyl-modified triphenolmethane epoxy resin, epoxy resin containing triazine nucleus Epoxy resins such as cyclopentadiene-modified phenolic epoxy resins, resins with triazine rings such as urea (urea) resins and melamine resins, unsaturated Riesuteru resins, bismaleimide resins, polyurethane resins, diallyl phthalate resins, silicone resins, resins having a benzoxazine ring, cyanate ester resins, and the like. These may be used singly or in admixture. Among these, an epoxy resin is particularly preferable. Thereby, heat resistance and adhesiveness can be improved more.

  Furthermore, it is preferable to use an epoxy resin that is solid at room temperature (particularly a bisphenol type epoxy resin) and an epoxy resin that is liquid at room temperature (particularly a silicone-modified epoxy resin that is liquid at room temperature) as the epoxy resin. Thereby, it is excellent in both flexibility and resolution, maintaining heat resistance.

  Although content of the said thermosetting resin is not specifically limited, 10 to 40 weight% of the whole said resin composition is preferable, and 15 to 35 weight% is especially preferable. If the content is less than the lower limit, the effect of improving heat resistance may be reduced, and if the content exceeds the upper limit, the effect of improving the toughness of the adhesive film may be reduced.

  When the thermosetting resin that is liquid at room temperature is used in combination, the total amount of the liquid photocurable resin and the liquid thermosetting resin is preferably 60% by weight or less of the entire resin composition. In particular, it is preferably 5 to 50% by weight or less. Within the above range, the balance of heat resistance, flexibility and resolution is particularly excellent.

  It is preferable that the curable resin further includes a curable resin that can be cured by both light and heat. Thereby, the compatibility between the photocurable resin and the thermosetting resin can be improved, whereby the strength of the adhesive film after curing (photocuring and thermosetting) can be increased, and finally Product reliability can be improved.

Examples of the curable resin curable by both light and heat include, for example, a thermosetting resin having a photoreactive group such as an acryloyl group, a methacryloyl group, and a vinyl group, an epoxy group, a phenolic hydroxyl group, an alcoholic hydroxyl group, Examples thereof include a photocurable resin having a thermally reactive group such as a carboxyl group, an acid anhydride group, an amino group, and a cyanate group. Specific examples include acrylic-modified phenolic resins and acryloyl group-containing acrylic acid polymers. Of these, acrylic-modified phenolic resins are preferred. Thereby, not only an organic solvent but an alkaline aqueous solution with a small environmental load can be applied to the developer, and heat resistance can be maintained.
In addition, as said curable resin, what was mentioned above with a thermosetting resin and a photocurable resin can be used.

  In the case of the thermosetting resin having the photoreactive group, the modification rate (substitution rate) of the photoreactive group is not particularly limited, but the entire reactive group of the curable resin that can be cured by both light and heat (light 20 to 80% of the total of reactive groups and thermally reactive groups) is preferable, and 30 to 70% is particularly preferable. When the modification amount is within the above range, the resolution is particularly excellent.

  In the case of the photocurable resin having the thermally reactive group, the modification rate (substitution rate) of the thermally reactive group is not particularly limited, but the entire reactive group of the curable resin that can be cured by both light and heat (light 20 to 80% is preferable, and 30 to 70% is particularly preferable. When the modification amount is within the above range, the resolution is particularly excellent.

  The content of the curable resin curable by both light and heat is not particularly limited, but is preferably 15 to 50% by weight, particularly preferably 20 to 40% by weight, based on the entire resin composition. If the content is less than the lower limit, the effect of improving the compatibility may be reduced, and if the content exceeds the upper limit, the developability or the resolution may be reduced.

The resin composition includes a porous filler. The porous filler is an important component capable of controlling the moisture permeability of the adhesive film.
Examples of the porous filler include porous fillers such as activated alumina, zeolite, silica gel, imogolite, and allophane. These can be used alone or in combination. It is particularly preferable that the porous filler contains zeolite.

The average particle diameter of the porous filler is not particularly limited, but is preferably 0.01 to 90 μm, particularly preferably 0.1 to 40 μm. If the average particle diameter exceeds the upper limit, there may be abnormal appearance of the film or poor resolution, and if it is less than the lower limit, there may be poor adhesion at the time of heat pasting.
The average particle diameter can be evaluated using, for example, a laser diffraction particle size distribution analyzer SALD-7000 (manufactured by Shimadzu Corporation).

  The content of the filler is preferably 5 to 70% by weight, and particularly preferably 20 to 50% by weight, based on the entire resin composition. If the content exceeds the upper limit value, adhesion failure may occur at the time of heating and pasting, and if it is less than the lower limit value, moisture permeability may be low and condensation of the substrate may not be improved.

  The average pore diameter of the porous filler is preferably from 0.1 to 5 nm, particularly preferably from 0.3 to 1 nm. If the average pore diameter exceeds the upper limit, some resin components may enter the pores and the reaction may be hindered. If the average pore diameter is less than the lower limit, the water absorption capacity decreases, so the moisture permeability of the film In some cases, the substrate condensation cannot be improved.

The adsorbing force [Q1] at room temperature of the porous filler is preferably 7 [g / 100 g adsorbent] or more, particularly preferably 15 [g / 100 g adsorbent] or more. If the adsorption force at room temperature is less than the lower limit, the water absorption capacity of the porous filler is low, the moisture permeability of the film is lowered, and the condensation of the substrate may not be improved.
The adsorptive power [Q1] at room temperature can be determined, for example, by measuring the weight of the filler completely dried by heating in an aluminum cup and leaving it in a 25 ° C./50% environment for 168 hours. .

Further, the adsorbing force [Q2] at 60 ° C. of the filler is preferably 3 [g / 100 g adsorbent] or more, particularly preferably 10 [g / 100 g adsorbent] or more. If the adsorption force is maintained at the above value even at 60 ° C., it is particularly effective in improving the dew condensation on the substrate.
The adsorptive power [Q2] at 60 ° C. can be obtained, for example, by measuring the weight of the filler completely dried by heating after weighing it in an aluminum cup and leaving it in a 60 ° C./90% environment for 168 hours. it can.

The relationship between the adsorption force [Q1] at room temperature and the adsorption force [Q2] at 60 ° C. is not particularly limited, but preferably satisfies the following relationship.
0.4 * [Q1] <[Q2]
When [Q1] and [Q2] satisfy the above relational expression, it is particularly effective in improving substrate dew condensation. The reason for this is that since the adsorbing force is maintained even when the filler is at a high temperature, the film filled with it maintains the moisture permeability even at a relatively high temperature, and gas moisture easily passes through the resin. In addition, it is considered that the phenomenon that the moisture inside the liquid crystal device is reduced and clouding does not occur.

  In addition to the curable resin and porous filler described above, the resin composition contains additives such as a plastic resin, a leveling agent, an antifoaming agent, a coupling agent, and a filler as long as the object of the present invention is not impaired. Can be contained. The filler is not particularly limited, but for example, fibrous fillers such as alumina fibers and glass fibers, potassium titanate, wollastonite, aluminum borate, acicular magnesium hydroxide, acicular fillers such as whiskers, talc, Examples thereof include plate-like fillers such as mica, sericite, glass flakes, scaly graphite, and plate-like calcium carbonate, and spherical (granular) fillers such as calcium carbonate, silica, fused silica, fired clay, and unfired clay. These can be used alone or in combination. The average particle size of the filler is not particularly limited, but is preferably 0.01 to 90 μm, and particularly preferably 0.1 to 40 μm. If the average particle diameter exceeds the upper limit, there may be abnormal appearance of the film or poor resolution, and if it is less than the lower limit, there may be poor adhesion at the time of heat pasting.

The semiconductor component to be bonded using such an adhesive film is not particularly limited, and examples thereof include solid-state image sensors such as CCD and CMOS, and semiconductor elements such as MEMS elements.
Further, the liquid crystal display component is not particularly limited, and examples thereof include a liquid crystal panel.

  Examples of the substrate include a flexible substrate such as an interposer or a mother board, a rigid substrate, an insulating substrate made of an organic material or an inorganic material, a transparent substrate such as an acrylic resin, a polyethylene terephthalate resin (PET), or a glass substrate. Can be mentioned. Among these, the performance of the adhesive film is exhibited particularly when a substrate made of an inorganic material is used as the substrate. The reason is considered that when a substrate made of an organic material is used, the substrate has a higher moisture permeability than an inorganic material, so that the influence of the adhesive film is reduced. On the other hand, when using the board | substrate comprised with an inorganic substance, only an adhesive film part will be what can permeate | transmit a water | moisture content, and the influence becomes large.

  EXAMPLES Hereinafter, although this invention is demonstrated in detail based on an Example and a comparative example, this invention is not limited to this. First, examples of the adhesive film will be described.

Example 1
1. Curable resin curable by both light and heat (synthesis of acrylic modified phenolic resin)
Phenol novolak (Dainippon Ink & Chemicals, Phenolite TD-2090-60M) 600 g (OH equivalent: 4 equivalents) of 70% non-volatile content was put into a 2 liter flask, and 1 g of tributylamine was added thereto. And 0.2 g of hydroquinone were added and heated to 110 ° C. Into this, 284 g (2 mol) of glycidyl methacrylate was added dropwise over 30 minutes, and then the mixture was reacted with stirring at 110 ° C. for 5 hours to obtain a phenol novolak (methacryloyl group modification rate of 50%) having a nonvolatile content of 80%. .

2. Preparation of resin varnish 5.1% by weight acrylic resin compound (manufactured by Sanyo Kasei Co., Ltd., Neomer PM201) as a photocurable resin at room temperature, epoxy resin (manufactured by Dainippon Ink & Chemicals, Inc.) as a thermosetting resin , Epicron N-865) 12.9% by weight, silicone epoxy resin (manufactured by Toray Dow Corning Silicone Co., Ltd., BY16-115) 5.4% by weight, as a curable resin curable by both light and heat 28.2% by weight of the above-mentioned synthesized acrylic modified phenolic resin, 1.9% by weight of a photopolymerization initiator (manufactured by Ciba Specialty Chemicals Co., Ltd., Irgacure 651), a porous filler (Union Showa Co., Ltd.) ), Molecular sieve 3A) 31.8% by weight, 14.7% by weight of methyl ethyl ketone as a solvent, and using a disperser, 1 hour and stirred at rpm, to prepare a resin varnish.

3. Manufacture of adhesive film The above-mentioned resin varnish is applied to a supporting base polyester film (manufactured by Mitsubishi Polyester Film Co., Ltd., T100G, thickness 25 μm) with a comma coater, dried at 80 ° C. for 10 minutes, and an adhesive film having a thickness of 50 μm Got.

(Example 2)
The same procedure as in Example 1 was conducted except that the resin varnish was mixed as follows.
Acrylic resin compound that is liquid at room temperature as a photocurable resin (Neomer PM201, manufactured by Sanyo Chemical Co., Ltd.) 4.4% by weight, and an epoxy resin (manufactured by Dainippon Ink & Chemicals, Inc., Epicron N-) as a thermosetting resin 865) 11.1% by weight, silicone epoxy resin (Toray Dow Corning Silicone Co., Ltd., BY16-115) 4.7% by weight, synthesized as a curable resin that can be cured by both light and heat. Acrylic modified phenolic resin 24.3% by weight, photopolymerization initiator (Ciba Specialty Chemicals Co., Ltd., Irgacure 651) 1.6% by weight, porous filler as a filler (Union Showa Co., Ltd., Molecular) Sheave 3A) 41.2 wt%, methyl ethyl ketone 12.7 wt% as solvent.

(Example 3)
The same procedure as in Example 1 was conducted except that the resin varnish was mixed as follows.
Acrylic resin compound that is liquid at room temperature as a photocurable resin (Neomer PM201, manufactured by Sanyo Chemical Co., Ltd.) 5.5% by weight, and an epoxy resin (manufactured by Dainippon Ink & Chemicals, Inc., Epicron N-) as a thermosetting resin 865) 14.1% by weight, silicone epoxy resin (manufactured by Toray Dow Corning Silicone Co., Ltd., BY16-115) 5.9% by weight, synthesized as a curable resin curable by both light and heat Acrylic modified phenolic resin 30.7 wt%, photopolymerization initiator (Ciba Specialty Chemicals Co., Ltd., Irgacure 651) 2.1 wt%, porous filler (Union Showa Co., Ltd., Molecular) as filler Sieve 3A, pore diameter 3 mm) 25.7 wt%, and methyl ethyl ketone 16.0 wt% as a solvent.

Example 4
Example 1 was repeated except that the following materials were used as the filler.
As the filler, a porous filler (Union Showa Co., Ltd., molecular sieve 4A, pore diameter 4 mm) was used.

(Example 5)
Example 1 was repeated except that the following materials were used as the filler.
A porous filler (Union Showa Co., Ltd., molecular sieve 5A, pore diameter 5 mm) was used as the filler.

(Example 6)
Example 1 was repeated except that the following materials were used as the filler.
A porous filler (Union Showa Co., Ltd., molecular sieve 13X, pore diameter 10 mm) was used as the filler.

(Example 7)
The same procedure as in Example 1 was performed except that the following resin was used that was curable with both light and heat.
As a resin curable by both light and heat, a resin having a carboxyl group and an acrylic group (Cyclomer P, manufactured by Daicel Chemical Industries, Ltd.) was used.

(Example 8)
The same procedure as in Example 1 was conducted except that the resin varnish was mixed as follows.
Acrylic resin compound that is liquid at room temperature as photo-curing resin (Sanyo Kasei Co., Ltd., Neomer PM201) 5.1% by weight, and epoxy resin (Dainippon Ink Chemical Co., Ltd., Epicron N-) 865) 12.9 wt%, silicone epoxy resin (Toray Dow Corning Silicone Co., Ltd., BY16-115) 5.4 wt%, synthesized as a curable resin curable with both light and heat Acrylic modified phenolic resin 28.2% by weight, photopolymerization initiator (Ciba Specialty Chemicals Co., Ltd., Irgacure 651) 1.9% by weight, porous filler as a filler (Union Showa Co., Ltd., Molecular) Sieve 3A) 15.9 wt%, silica (manufactured by Admatechs, Admafine SE5101) 15.9 wt%, methyl ethyl ketone as solvent 4.7 and the weight%.

Example 9
The same procedure as in Example 1 was conducted except that the resin varnish was mixed as follows.
Acrylic resin compound that is liquid at room temperature as photo-curing resin (Sanyo Kasei Co., Ltd., Neomer PM201) 5.1% by weight, and epoxy resin (Dainippon Ink Chemical Co., Ltd., Epicron N-) as thermosetting resin 865) 12.9 wt%, silicone epoxy resin (Toray Dow Corning Silicone Co., Ltd., BY16-115) 5.4 wt%, synthesized as a curable resin curable with both light and heat Acrylic modified phenolic resin 28.2% by weight, photopolymerization initiator (Ciba Specialty Chemicals Co., Ltd., Irgacure 651) 1.9% by weight, porous filler as a filler (Union Showa Co., Ltd., Molecular) Sieve 3A) 15.9 wt%, silica gel (Mizusawa Chemical Co., Ltd.) 15.9 wt%, and methyl ethyl ketone 14.7 wt% as a solvent.

(Comparative Example 1)
The same procedure as in Example 1 was conducted except that the resin varnish was mixed as follows.
Acrylic resin compound that is liquid at room temperature as photo-curing resin (Sanyo Kasei Co., Ltd., Neomer PM201) 5.1% by weight, and epoxy resin (Dainippon Ink Chemical Co., Ltd., Epicron N-) as thermosetting resin 865) 12.9 wt%, silicone epoxy resin (Toray Dow Corning Silicone Co., Ltd., BY16-115) 5.4 wt%, synthesized as a curable resin curable with both light and heat Acrylic modified phenolic resin 28.2% by weight, photopolymerization initiator (Ciba Specialty Chemicals Co., Ltd., Irgacure 651) 1.9% by weight, silica as a filler (manufactured by Admatechs Co., Ltd., Admafine SE5101) 31.8% by weight and 14.7% by weight of methyl ethyl ketone as a solvent were used.

(Comparative Example 2)
The same procedure as in Example 1 was conducted except that the resin varnish was mixed as follows.
Acrylic resin compound that is liquid at room temperature as a photocurable resin (Sanyo Kasei Co., Ltd., Neomer PM201) 8.1 wt%, and epoxy resin as a thermosetting resin (Dainippon Ink Chemical Co., Ltd., Epicron N-) 865) 20.5 wt%, silicone epoxy resin (Toray Dow Corning Silicone Co., Ltd., BY16-115) 8.6 wt%, synthesized as a curable resin curable with both light and heat Acrylic modified phenolic resin 44.8% by weight, photopolymerization initiator (Ciba Specialty Chemicals Co., Ltd., Irgacure 651) 3.0% by weight, methyl ethyl ketone 15.0% by weight as a solvent.

The following evaluation was performed about the adhesive film obtained by each Example and the comparative example. The evaluation items are shown together with the contents. The obtained results are shown in Table 1.
1) Film characteristics (tensile fracture strength)
The obtained adhesive film was exposed so that light with a wavelength of 365 nm was irradiated at 750 mJ / cm ² , and cured at 120 ° C. for 1 hour and at 180 ° C. for 2 hours to obtain a cured film. A dumbbell-shaped test piece was produced from the cured film according to JIS K7127, and a tensile test was performed. And the tensile fracture strength of each adhesive film was calculated | required.

2) Developability The developability of the resulting adhesive film must be immersed in TMAH (tetramethylammonium hydroxide) at 25 ° C and 3%, and the resin must be dissolved within 3 minutes and remain on the support base polyester film. In other words, “developable” was determined, and if the resin remained, “developable” was determined.

3) Resolution (aperture ratio)
The resolution was evaluated by the aperture ratio as follows.
The obtained adhesive film is laminated on a polyimide film at 55 ° C., and pattern exposure is performed so that light with a wavelength of 365 nm is irradiated with 200 mJ / cm ² using a negative type film mask that can open a via having a diameter of 200 μm. did.
Then, using 3% TMAH, development was performed at a spray pressure of 0.1 MPa for 90 seconds, the diameter of the via patterned with a length measuring microscope was measured, and the aperture ratio was calculated using the following formula.
Opening ratio (%) = actually measured opening diameter (μm) / mask diameter 200 (μm) × 100

4) Moisture permeability Using a laminator set at 60 ° C., the obtained adhesive film is bonded to produce a film with a thickness of 100 μm, and using an exposure machine, the exposure amount is 750 mJ / cm ² (wavelength 365 nm). After irradiation, heat curing is performed at 120 ° C./1 hour and 180 ° C./1 hour. The obtained cured film was evaluated in an environment of 25 ° C./50% in accordance with a moisture permeable cup method (JIS Z0208), and a moisture permeability was determined.

  As apparent from Table 1, Examples 1 to 9 had high adhesive film tensile strength, excellent film characteristics, and excellent developability and resolution.

Next, an example of an adhesive body obtained by joining a semiconductor component and a substrate using the above-described adhesive film will be described.
(Examples 1A-9A and Comparative Examples 1A-2A)
Using a solid-state imaging device as a semiconductor component, a laminator set at 60 ° C. is used to attach the adhesive film on the 6-inch wafer. Then, a patterning sample is prepared by exposing and developing using a negative mask and an exposure machine. The patterning shape and arrangement are such that the light-receiving portion on each individual image sensor is surrounded by a frame having a width of 100 μm. The exposure is performed such that light having a wavelength of 365 nm is irradiated at 750 mJ / cm ² , and development is performed using 3% TMAH (tetraammonium hydroxide) under conditions of a spray pressure of 0.1 MPa and a time of 90 seconds. went. The obtained patterning sample was separated into pieces, and a glass substrate (5 mm × 4 mm × 0.5 mm) was bonded by thermocompression bonding (temperature 110 ° C., time 10 seconds, pressure 1 MPa). This sample was cured at 120 ° C. for 1 hour and then at 180 ° C. for 2 hours, placed on an evaluation substrate, and connected to produce an evaluation sample.
A general accelerated reliability test of the semiconductor device was performed with the sample for evaluation. After processing for 500 hours under the conditions of a temperature of 60 ° C. and a humidity of 90%, the sample was put in an environment of a temperature of 25 ° C. and a humidity of 50%, and the inside of the glass substrate of the sample for evaluation was observed with a microscope. The results are shown in Table 2.

As is clear from Table 2, Examples 1A to 9A showed no condensation, no electrode corrosion, excellent electrical conductivity, good images, and good reliability as a semiconductor device. On the other hand, in Comparative Examples 1A to 2A, condensation was observed and the reliability as a semiconductor device was inferior.
From the above results, according to the present invention, it is possible to provide a resin composition and an adhesive film having high performance, particularly excellent reliability as a semiconductor / liquid crystal material.

Claims (10)

A resin composition comprising a curable resin and a porous filler. The resin composition according to claim 1, wherein the curable resin contains a thermosetting resin. The resin composition according to claim 1, wherein the curable resin contains a photocurable resin. The resin composition according to claim 1, wherein the curable resin contains a curable resin that can be cured by both light and heat.   The resin composition according to any one of claims 1 to 4, wherein the porous filler has an adsorption force at room temperature of 7 (g / 100 g) or more.   The resin composition according to claim 1, wherein the porous filler has an adsorption force at 60 ° C. of 3 (g / 100 g) or more.   The resin composition according to any one of claims 1 to 6, wherein a content of the porous filler is 5 to 70% by weight of the entire resin composition.   The resin composition according to any one of claims 1 to 7, wherein the porous filler contains zeolite.   The resin composition according to any one of claims 1 to 8, which is used as an adhesive.   An adhesive film comprising the resin composition according to claim 1.