JP2006066547A - Workpiece turnable area decision device, workpiece movement route decision device and workpiece movement route decision method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a device which can effectively shorten tact time despite of being applicable to general-purpose use of a mounting device. <P>SOLUTION: The workpiece turnable area decision device is provided with an interference coordinate acquisition part 201 to acquire a coordinate blocking the turning of a workpiece, a maximum turning radius acquisition part 202 to acquire a maximum turning radius larger than a radius of a maximum circle drawn by the workpiece, and a turning impossible area preparation part 205. A tangent inner area surrounded by tangents that are respectively extended along the x and y directions of a circle with an interference point as a center and the maximum turning radius as a radius is a turning impossible area. It is also provided with a start coordinate decision part 702, an arrival coordinate decision part 703, and a turning movable route decision part 704 that is provided with an evasion route decision means 705 to evade the turning impossible area linearly. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a workpiece rotatable area determination device and the like applied to a mounting device for mounting components on a workpiece.

When an IC is mounted on the liquid crystal panel, the IC is mounted on the peripheral edge of the panel. However, when the mounting position of the IC extends over a plurality of sides of the liquid crystal panel, it is necessary to rotate the liquid crystal panel in a mounting machine.
Conventionally, in a liquid crystal panel mounting apparatus, as a method of rotating the liquid crystal panel according to the mounting position of the component, a mounting position for loading the liquid crystal panel after mounting the component on one side of the liquid crystal panel at the position where the component is mounted, etc. Then, the orientation of the liquid crystal panel is arbitrarily changed by a rotating means capable of rotating the liquid crystal panel, and the liquid crystal panel is moved again to the mounting position (for example, Patent Document 1).
Japanese Patent Laid-Open No. 10-62804

  However, when a liquid crystal panel is subjected to a plurality of different processes inline, the liquid crystal panel is moved to a specific position on the mounting device incorporated in this line, and then the liquid crystal panel is moved to the mounting position after rotating the liquid crystal panel. As a result, the time from loading one liquid crystal panel to mounting and unloading the IC, that is, the tact time, becomes long, resulting in a decrease in productivity.

  Therefore, it is conceivable to move the liquid crystal panel while rotating it, but the size and shape of the work such as the liquid crystal panel are various, and the transfer path that can be transferred while rotating the work also affects the size of the work and the interference with this work. Therefore, a dedicated device is constructed for each mounting device, and the transfer path is calculated in a complicated manner depending on the shape of the mounting device and the size of the workpiece.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide an apparatus and the like that can effectively improve the tact time although it can be applied universally to various mounting apparatuses.

  In order to achieve the above object, a work rotation area determination apparatus according to the present invention includes a holding stage that holds a work so as to be movable in the xy direction and the rotation direction, and mounts components on the work moved to a predetermined location. The radius of the maximum circle that the workpiece draws when the interference point acquisition means that acquires the position of the interference point that obstructs the rotation of the workpiece and the holding stage that holds the workpiece are rotated. A maximum turning radius acquisition means for acquiring the maximum turning radius described above, and a non-rotatable area creating means for setting the inner area of a circle centered on the interference point and having the maximum turning radius as a radius as a non-rotatable area Yes.

As a result, it is possible to easily determine the rotatable region, and it is possible to deal with a wide variety of mounting apparatus models.
The workpiece movement route determination device according to the present invention is applied to a mounting device that includes a holding stage that holds a workpiece so as to be movable in the xy direction and the rotation direction, and that mounts a component on the workpiece moved to a predetermined location. A rotation movable area setting means for setting a rotationally movable area in which the workpiece can move while rotating without interference based on input or preset data, and a movement at which the workpiece starts moving Rotation / movement start point determination means that uses the start point or a point within the nearest rotationally movable area as a rotational movement start point, and a rotational point to move the target point that is the movement target of the workpiece or a point within the immediate rotationally movable area From the rotational movement start point determined from the rotational movement start point determined by the rotational movement limit point determination means as the limit point, from the rotational movement limit determination means Characterized in that it comprises a rotary movable route setting means for setting a route of the rotating movable region extending up order was rotated movement limit point as a rotational movable routes.

  Thereby, based on the determined rotatable region, it is possible to easily determine a route that can be moved while rotating the workpiece. In addition, if the route is adopted, it is possible to realize a tact time necessary and sufficient for mounting components.

  The present invention can be realized not only as such a workpiece rotation area determination device and workpiece movement route determination device, but also as a workpiece movement route determination method.

  Provides versatile equipment that can flexibly adapt to the shape of the workpiece and the internal structure of the mounting device, even though it is a device that can easily determine the movement area and route of movement while rotating the workpiece. can do.

  In addition, a necessary and sufficient tact time can be realized by the movement route.

Hereinafter, a component mounter according to the present invention will be described with reference to the drawings.
(Embodiment 1)
FIG. 1 is a perspective view showing an entire mounting apparatus line 100 in which mounting apparatuses for mounting electronic components on a liquid crystal panel including a workpiece rotation area determination apparatus and a workpiece movement route determination apparatus according to the present invention are combined in an in-line manner. It is.

  The mounting apparatus line 100 shown in FIG. 1 includes an ACF sticking apparatus 101 for sticking an anisotropic conductive tape (ACF tape) to a liquid crystal panel, a temporary crimping apparatus 102 for temporarily crimping parts to a liquid crystal panel, and a liquid crystal And a main crimping device 103 for final crimping of parts to the panel.

Each of the above devices is provided with a workpiece rotation area determination device and a workpiece movement route determination device.
Each apparatus includes a holding stage 104 that holds the liquid crystal panel in a vacuum suction state and is movable in the xy direction and the rotation direction.

FIG. 2 is a block diagram showing the configuration of the work rotation possible area determination device of the present embodiment.
The work rotation possible area determination device 200 is an apparatus for obtaining a non-rotatable area in which the work cannot be moved while rotating the work from an area on the xy plane where the holding stage 104 is movable, and obtains interference coordinates as an interference point acquisition means. A unit 201, a maximum turning radius acquisition unit 202, an origin specifying unit 203, a mounting position coordinate setting unit 204, and a non-rotatable region creation unit 205.

  The interference coordinate acquisition unit 201 is a processing unit that acquires the coordinates of interference points and interference lines that become obstacles when rotating the liquid crystal panel, and holds the interference point information. The interference point information held in the interference coordinate acquisition unit 201 holds, for example, an X coordinate value and a Y coordinate value as shown in FIG. Further, in the case of an interference line parallel to the X axis, 0 is held as the X coordinate value, and only the Y coordinate value where the interference line exists is held, thereby indicating an interference line.

  Although the interference point may move even within the same component mounter, the interference coordinate acquisition unit 201 acquires and holds the coordinates at the start and end of the movement of the moving interference point as interference coordinates. Or some of the coordinates of the interference point during movement can be acquired and held as interference coordinates.

  The maximum turning radius acquisition unit 202 is a processing unit that acquires a maximum turning radius based on the radius of the maximum circle drawn by the liquid crystal panel when the holding stage holding the liquid crystal panel is rotated.

In the present embodiment, the maximum rotation radius is the maximum distance at which the held liquid crystal panel 401 exists from the rotation center C of the holding stage 104 as shown in FIG.
Note that when the electronic component 402 is mounted on the liquid crystal panel 401, the electronic component 402 may protrude from the end of the liquid crystal panel 401. The maximum turning radius may be taken into account the protruding portion of the electronic component 402. A certain margin, for example, a margin within 10 mm may be added to the radius of the maximum circle.

  The origin specifying unit 203 is a processing unit that specifies the origin of the xy plane, which is a reference for calculating the rotatable region and the movement route, in any part of the mounting apparatus. In the case of this embodiment, as shown in FIG. 5, the origin O is a point that is on the intermediate line of the loading / unloading rail 501 of the mounting apparatus and is equidistant from the end of the loading rail and the end of the unloading rail. I have identified.

  The mounting position coordinate setting unit 204 is a processing unit that sets the positive direction of the xy coordinates, and sets the direction of the mounting position from the identified origin O as the direction of y> 0. The intermediate line of the rail 501 is the X axis, and the line passing through the origin and perpendicular thereto is the Y axis.

  The non-rotatable region creation unit 205 creates a non-rotatable region based on information obtained from the interference coordinate acquisition unit 201, the maximum rotation radius acquisition unit 202, the origin specifying unit 203, and the mounting position coordinate setting unit 204. It is a processing unit. It should be noted that an area other than the non-rotatable area created by the non-rotatable area creation unit 205 is a rotatable area.

FIG. 6 is a block diagram showing in detail the configuration of the non-rotatable area creation unit 205.
The non-rotatable area creating unit 205 includes a tangential internal area creating unit 601, an extended area releasing unit 602, a non-rotatable area expanding unit 603, and a rectangular area creating unit 604.

  The tangential inner region creation unit 601 virtually sets a circle centered on the coordinates of the interference position and having a maximum rotation radius as a radius, a tangent of the circle extending along the x direction, and a y direction Is a processing unit in which an inner area surrounded by a tangent line extending along the line is a non-rotatable area.

  The non-rotatable area expanding unit 603 cannot expand and rotate the inside of the smallest rectangle including all overlapping tangent inner areas when tangent inner areas created based on interference points existing in the same quadrant of y> 0 overlap. It is a processing unit as an area.

  The extended area canceling unit 602 cancels the extended non-rotatable area created based on the interference point having the smallest y-coordinate when the extended non-rotatable areas created in different quadrants where y> 0 overlap, and overlaps the tangent lines. It is a processing unit for returning the non-rotatable area to the internal area.

  Further, the extended area canceling unit 602 has a y value smaller than a tangent extending in the x direction based on the interference point having the largest y value among the interference points existing in the area for y ≦ 0. The area is set as an extended non-rotatable area.

FIG. 7 is a block diagram showing a configuration of the work movement route determination device 700.
In this embodiment, the workpiece movement route determination device 700 acquires data based on the workpiece rotation area obtained by the rotatable region determination device 200, and the route through which the holding stage 104 can move while rotating the held liquid crystal panel. For example, a rotatable area acquisition unit 701 that functions as a rotationally movable area setting unit, a departure coordinate determination unit 702 that functions as a rotational movement start point determining unit, and a rotational movement limit point determining unit An arrival coordinate determining unit 703 and a rotatable route determining unit 704 functioning as a rotationally movable route setting unit.

The rotatable area acquisition unit 701 is a processing unit that acquires the rotatable area created by the non-rotatable area creation unit 205 as data.
The departure coordinate determination unit 702 obtains the coordinates of the movement start point at which the liquid crystal panel starts moving, and if the coordinates of the movement start point are within the rotatable area, the coordinates of the movement start point are set as the departure coordinates, When the coordinates of the movement start point are within the non-rotatable area, the processing unit determines the coordinates within the rotatable area closest to the movement start point as the starting coordinates.

  When the mounting position coordinates for mounting the electronic component on the liquid crystal panel that is the workpiece movement target are within the rotatable region, the arrival coordinate determination unit 703 sets the mounting position coordinates as arrival coordinates that are the limit points where the movement can be performed, When the mounting position coordinates are within the non-rotatable area, the processing unit determines the coordinates within the rotatable area closest to the coordinates as arrival coordinates.

  The rotationally movable route determining unit 704 is a processing unit that calculates a rotatable route that can be moved while rotating the liquid crystal panel held on the holding stage 104, and includes an avoidance route determining unit 705 and a repeating unit 706.

  When the straight line from the start coordinate to the arrival coordinate crosses the non-rotatable area, the avoidance route determination means 705 uses the point before the non-rotatable area on the straight line as a via coordinate, and follows the non-rotatable area from the via coordinate. The coordinates that face the arrival coordinates without being obstructed by the non-rotatable area when traveling in advance, i.e., in the present embodiment, the coordinates near the corner of the non-rotatable area are set as virtual target coordinates, The processing unit sets a straight line from the via coordinates to the virtual target coordinates as an avoidance route, and newly sets the virtual target coordinates as the starting coordinates.

  The repeating unit 706 is a processing unit that performs a process of repeating the execution of the avoidance route determining unit until the straight line from the changed start coordinate to the arrival coordinate does not cross the non-rotatable region.

  In addition, when the avoidance route is set, the rotationally movable route determination unit 704 determines all the avoidance routes that have been set and the straight line from the last changed starting coordinate to the arrival coordinate as the rotationally movable route. When the avoidance route is not set, that is, when the straight line from the first set departure coordinate to the arrival coordinate does not cross the non-rotatable region, the straight line is determined as the rotationally movable route.

FIG. 12 is a flowchart showing the determination operation of the rotatable region.
First, the coordinates of the interference point, the interference line coordinates, the origin, and the mounting position coordinates, which are model information of the mounting apparatus, are input (S1201). The input of these coordinates and the like is performed using an interference point changing unit.

Next, the maximum turning radius is input (S1202).
Next, a default non-rotatable region is created based on the input interference line coordinates (S1203). Specifically, as shown in FIG. 5, since the mounting apparatus work area is surrounded on all sides by a wall surface A, the wall surface becomes an obstacle when the holding stage is rotated. Therefore, a wall surface portion intersecting with the xy plane is defined as an interference line, and a region farther from the origin than the boundary line L that is separated from the interference line toward the origin by the maximum rotation radius is defined as a default non-rotatable region D.

  Next, a tangential area is created from the interference points in the first quadrant and the second quadrant, and the inside is set as a non-rotatable area (S1204). Specifically, as shown in FIG. 8, circles having a radius of maximum rotation radius around the interference point K are virtually drawn, and tangent lines of these circles, which are tangent lines S along the x and y directions, are drawn. The enclosed area is defined as a tangential inner area M.

  Next, when the tangent inner area M obtained from a plurality of interference points in the same quadrant overlaps (S1205: YES), the smallest rectangle including all the tangent inner areas M, that is, the area N is added. The portion is set as an extended non-rotatable region (S1206).

  Next, if the extended non-rotatable area overlaps (S1207: YES), the extended non-rotatable area is canceled (S1208). As shown in FIG. 9A, when the non-rotatable extended areas determined in the first quadrant and the second quadrant overlap, the non-rotatable non-rotated area based on the interference point coordinate having the smallest y-coordinate value is canceled. Then, as shown in FIG. 9B, the original tangent inner area is set as a non-rotatable area.

  Next, a non-rotatable region is created from the interference points existing in the region of y ≦ 0 (S1209). As shown in FIG. 10, when there are two interference points K in the region of y ≦ 0, x based on the interference point having the largest y value (the right side in the figure) among the coordinates of these two interference points. An area where the value of y is smaller than a tangent extending in the direction is defined as an unrotatable area.

  FIG. 11 is a diagram showing a non-rotatable region created by the above processing. The convex portion at the center of the figure is a rotatable region that can be moved while rotating the liquid crystal panel.

FIG. 13 is a flowchart showing a work movement route determination operation.
First, the rotatable area is acquired as data from the work rotatable area determination device 200 (S1301).

  Next, a rotational movement start point and a rotational movement limit point are determined (S1302). As shown in FIG. 14, when the movement start point 1401 where the liquid crystal panel starts moving is in the non-rotatable area, the coordinates in the rotatable area closest to the coordinates are set as the starting coordinates 1402. Similarly, since the target point 1403 which is a movement target is also in the rotatable area, the coordinates 1404 in the rotatable area closest to the target point 1403 are determined as arrival coordinates.

  Next, a straight line from the departure coordinates 1402 to the arrival coordinates 1404 is created as a temporary line segment 1405 (S1303).

  If the avoidance route determination means 705 determines that the temporary line segment 1405 crosses the non-rotatable area (S1304: YES), the avoidance route determination means creates an avoidance route that avoids the non-rotatable area (S1305). Specifically, a point in front of the non-rotatable area on the temporary line segment is set as a transit point, and when the vehicle travels from the via point along the non-rotatable region, the rotational movement limit point is faced without being obstructed by the non-rotatable region. A point, that is, in this embodiment, a corner near the arrival coordinates of the non-rotatable region is set as a virtual target point, a straight line connecting the coordinates of the waypoint from the departure coordinates, and a coordinate of the virtual target point from the coordinates of the waypoint A straight line connecting the two is set as an avoidance route. Further, in order to determine whether or not to cross different non-rotatable areas after the avoidance route is determined, the coordinates of the virtual target point are newly changed to departure coordinates.

  Then, the provisional line segment creation (S1303) to the avoidance route determination (S1305) are repeated until the temporary line segment does not cross the non-rotatable area.

  If the temporary line segment 1405 does not cross the non-rotatable area (S1304: NO), the temporary line segment 1405 is set as a rotationally movable route and the avoidance route is also set as a rotationally movable route (S1306).

  As described above, the rotatable route can be determined very easily. In addition, since the non-rotatable region is determined linearly, a CPU with a relatively low capacity is sufficient to determine the rotatable route, and if the obtained rotatable route is used, the tact is sufficient for practical use. You can get time.

  Furthermore, the parameters depending on the mounting apparatus are only the coordinates of the interference point and the interference line coordinates, and the apparatus can be applied to a plurality of types of mounting apparatuses for general purposes. In addition, since a rotatable route can be obtained by inputting only one parameter relating to a workpiece, even when different workpieces are processed by the same apparatus, the rotatable route can be easily changed.

  In the description of the present embodiment, the liquid crystal panel refers to a liquid crystal display substrate (LCD substrate). The electronic components are IC chips, various semiconductor devices, and the like. The work applicable to the present invention is not limited to the above liquid crystal panel, but also a liquid crystal panel such as a glass substrate such as a plasma display panel substrate (PDP substrate) or a substrate including a flexible printed circuit board (FPC substrate). Neither is it limited to a plate-like workpiece.

  In the description of the present embodiment, the rotatable route in the direction toward the mounting location is determined. However, it is needless to say that the workpiece movement route determination device can be applied to the direction from the mounting location toward the unloading location.

The present invention can be applied to a mounting apparatus that mounts a component on a work, and in particular, can be applied to a mounting apparatus that rotates and moves a work from a work inlet or the like to a mounting position.

It is a perspective view which shows the whole mounting apparatus connected in-line. It is a block diagram which shows the structure of the workpiece | work rotation possible area | region determination apparatus concerning embodiment. It is a figure which shows the data structure of the acquired interference point and interference line coordinate virtually. It is a top view which shows the state by which the electronic component was mounted in the liquid crystal panel. It is the figure which showed typically the top view of the working area | region of this crimping | bonding apparatus concerning embodiment. It is a block diagram which shows the structure of the non-rotatable area | region preparation part concerning embodiment in detail. It is a block diagram which shows the structure of the workpiece movement route determination apparatus concerning embodiment. It is the figure which expanded and showed the upper right part (1st quadrant) of the working area | region of this crimping | compression-bonding apparatus. It is the figure which showed the 1st quadrant and the 2nd quadrant of the working area | region of this crimping | compression-bonding apparatus. It is the figure which showed the part of y <= 0 of the working area | region of this crimping | compression-bonding apparatus. It is a figure which shows the produced rotation possible area | region (non-rotatable area | region). It is a flowchart which shows the creation operation of a non-rotatable area. It is a flowchart which shows work movement route creation operation. It is a figure which shows typically the creation state of a workpiece movement route.

Explanation of symbols

DESCRIPTION OF SYMBOLS 100 Mounting apparatus line 101 ACF sticking apparatus 102 Temporary pressure bonding apparatus 103 Main pressure bonding apparatus 104 Holding stage 200 Work rotation possible area determination apparatus 201 Interference point acquisition part 202 Maximum rotation radius acquisition part 203 Origin specification part 204 Mounting position coordinate setting part 205 Rotation Unusable region creation unit 401 Liquid crystal panel 402 Electronic component 501 Rail 601 Tangent internal region creation unit 602 Expansion region creation unit 603 Non-rotatable region creation unit 604 Rectangular region creation unit 700 Work movement route and determination device 701 Rotatable region acquisition unit 702 Starting coordinates Determination unit 703 Arrival coordinate determination unit 704 Rotationally movable route determination unit 705 Avoidance route determination unit 706 Repeat unit

Claims (9)

an apparatus that includes a holding stage that holds a workpiece movably in an xy direction and a rotation direction, and that is applied to a mounting device that mounts a component on the workpiece moved to a predetermined location;
Interference point acquisition means that acquires the position of the interference point that obstructs the rotation of the workpiece and maximum rotation radius acquisition that acquires the maximum rotation radius that is greater than the radius of the maximum circle drawn by the workpiece when the holding stage that holds the workpiece is rotated Means,
A non-rotatable area creation means for making a non-rotatable area an inner area of a circle centered on the interference point and having a maximum rotation radius as a radius. an apparatus that includes a holding stage that holds a workpiece movably in an xy direction and a rotation direction, and that is applied to a mounting device that mounts a component on the workpiece moved to a predetermined location;
Interference point acquisition means that acquires the position of the interference point that obstructs the rotation of the workpiece and maximum rotation radius acquisition that acquires the maximum rotation radius that is greater than the radius of the maximum circle drawn by the workpiece when the holding stage that holds the workpiece is rotated Means,
And a non-rotatable area creating means for making a non-rotatable area a tangential inner area surrounded by tangents extending along the x direction and the y direction of a circle centered on the interference point and having a maximum rotation radius as a radius. Work rotation area determination device.   3. The work rotation possible region determination device according to claim 1, wherein the interference point acquisition unit acquires a position of a moving interference point. an apparatus that includes a holding stage that holds a workpiece movably in an xy direction and a rotation direction, and that is applied to a mounting device that mounts a component on the workpiece moved to a predetermined location;
A rotationally movable region setting means for setting a rotationally movable region in which the workpiece can move while rotating without interference based on input or preset data;
A rotational movement start point determination means having a rotational movement start point at a movement start point at which the workpiece starts moving or a point within the immediate rotational movement possible area;
A rotational movement limit point determination means that uses a target point that is a movement target of the workpiece or a point within the nearest rotational movement possible area as a rotational movement limit point;
Rotational movement for setting a route in a rotationally movable region from the rotational movement start point determined by the rotational movement start point determining means to the rotational movement limit point determined by the rotational movement limit determining means as a rotationally movable route. A work movement route determination device comprising: a possible route setting unit. The rotationally movable region setting means sets the workpiece rotatable region determined by the workpiece rotatable region determination device according to any one of claims 1 to 3 as a rotationally movable region,
The rotational movement start point determining means determines the movement start point when the movement start point at which the workpiece starts moving is within the rotationally movable area, or the movement start when the movement start point is outside the rotationally movable area. One of the points in the rotatable area near the point is set as the rotational movement start point,
The rotational movement limit point determining means rotates the target point when the target point, which is the movement target of the workpiece, is within the rotationally movable region, or near the target point when the target point is outside the rotationally movable region. One of the points in the movable area is the rotational movement limit point,
The rotationally movable route setting means includes
When the straight line from the rotational movement start point to the rotational movement limit point crosses the non-rotatable area, the point before the non-rotatable area on the straight line is a transit point, and travels from the via point along the non-rotatable area A point that faces the rotational movement limit point without being obstructed by the non-rotatable area is set as a virtual target point, a route from the rotational movement start point to the virtual target point is set as an avoidance route, and the virtual target point is newly set. Avoidance route determination means for changing to the rotational movement start point;
Repetitive means that repeats execution of the avoidance route determination means until the straight line from the rotational movement start point after the change to the rotational movement limit point does not cross the non-rotatable region,
The work movement route determination device according to claim 4, wherein the avoidance route and a route from a rotational movement start point to a rotational movement limit point are set as a rotationally movable route. The work movement route determination device further includes:
A rotation end point detecting means for detecting a rotation end point when the rotation of the workpiece moving on the rotationally movable route is completed;
A work movement route determination device, comprising: a reroute means that cancels a rotatable route when a rotation end point is detected and uses a straight line from the rotation end point to a target point as a movement route. The avoidance route determination means uses a straight line from the rotational movement start point to the transit point and a straight line from the transit point to the virtual target point as an avoidance route,
The work movement route determination according to claim 5 or 6, wherein the rotational movement possible route setting means sets the avoidance route and a straight line from the rotational movement start point to the rotational movement limit point as a rotational movement possible route. apparatus. A method that is applied to a mounting apparatus that includes a holding stage that holds a workpiece movably in an xy direction and a rotation direction, and that mounts a component on the workpiece that has been moved to a predetermined location,
A rotationally movable region setting step for setting a rotationally movable region where the workpiece can move while rotating without interference based on input or preset data;
A rotational movement start point determination step in which a rotational start point is a movement start point at which the workpiece starts moving or a point within the nearest rotational movement possible region;
A rotational movement limit point determination step in which the target point that is the movement target of the workpiece or a point in the nearest rotational movement possible region is the rotational movement limit point;
Rotational movement is possible to move the workpiece while rotating in the rotationally movable area from the rotational movement start point determined by the rotational movement start point determining means toward the rotational movement limit point determined by the rotational movement limit determining means. A work movement route determination method comprising: a route progression step. The rotationally movable region setting step sets the workpiece rotatable region determined by the workpiece rotatable region determination device according to any one of claims 1 to 3 as a rotationally movable region,
The rotational movement start point determination step includes the movement start point when the movement start point where the workpiece starts moving is within the rotationally movable area, or the movement start when the movement start point is outside the rotationally movable area. One of the points in the rotatable area near the point is set as the rotational movement start point,
In the rotational movement limit point determination step, when the target point that is the movement target of the workpiece is within the rotationally movable region, the target point is rotated, or when the target point is outside the rotationally movable region, the target point is rotated. One of the points in the movable area is the rotational movement limit point,
The rotationally movable route progression step includes:
When the straight line from the rotational movement start point to the rotational movement limit point crosses the non-rotatable area, the point before the non-rotatable area on the straight line is set as a via point, and the movement is started with the via point as a target. After arriving at the point, the vehicle proceeds to the rotation movement limit point along the non-rotatable area until reaching the rotation movement limit point without being blocked by the non-rotation area, and newly rotates the virtual target point. The avoidance route progress step to change to the movement start point,
Repeating the avoidance route progression step until the straight line from the rotational movement start point after the change to the rotational movement limit point does not cross the non-rotatable region,
9. The route from the rotational movement start point to the rotational movement limit point proceeds when the straight line from the rotational movement start point to the rotational movement limit point does not cross the non-rotatable region. Work movement route determination method.

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