JP2006058420A - Method for manufacturing photosensitive lithographic printing plate and method for using photosensitive lithographic printing plate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a photosensitive lithographic printing plate with which high working efficiency is ensured, and a printing plate excellent in dot reproducibility and recovery property from staining due to preservation and a print excellent in dot quality can be obtained, and to provide a method for using the photosensitive lithographic printing plate. <P>SOLUTION: The method for manufacturing the photosensitive lithographic printing plate is implemented (a) under a light source lamp with a light emitting diode whose emission wavelength maximum is at 450-490 nm, a light emitting diode whose emission wavelength maximum is at 520-560 nm and a light emitting diode whose emission wavelength maximum is at 630-720 nm, (b) under a light source lamp with a light emitting diode whose emission wavelength maximum is at 450-490 nm and a light emitting diode whose emission wavelength maximum is at 560-630 nm, or (c) under a light source lamp with a light emitting diode whose emission wavelength maximum is at 490-520 nm and a light emitting diode whose emission wavelength maximum is at 630-720 nm. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a method and a method for producing a photosensitive lithographic printing plate suitable for a computer-to-plate system (hereinafter referred to as CTP) using a laser, and more particularly to a method and a method for producing a photosensitive lithographic printing plate exposed by an infrared laser. Regarding the method.

  2. Description of the Related Art In recent years, in printing plate preparation techniques for offset printing, a number of CTP systems that directly expose a lithographic printing plate precursor with a laser light source based on digital image data and record the image have been developed and put into practical use. In particular, with the increase in output of solid-state lasers and semiconductor lasers having emission wavelengths in the near-infrared region, CTP systems that record with near-infrared light, so-called thermal CTP systems, have become widespread.

  US Pat. No. 5,340,699 describes an example of a lithographic printing plate precursor (plate material for CTP) used for thermal CTP having an infrared absorber, an acid generator, a resole resin, and a novolac resin as constituent components of an image recording layer. In the CTP plate material, an acid is generated for an image by the interaction between the infrared absorber and the acid generator in the laser exposure portion, and the acid crosslinking reaction of the resol resin proceeds by the heat treatment following the exposure. The unexposed area is highly soluble in an alkaline aqueous solution and is dissolved and removed by an alkali development process, whereas the exposed area that has undergone crosslinking has lost its solubility in an alkaline aqueous solution and is image-recorded. The layer remains and forms an image.

  Further, in a negative type image forming material provided with an image recording layer containing an infrared absorber, a radical generator, a radical polymerizable compound and a binder polymer, the material is exposed to an infrared laser, and then the material is heated to a temperature of 60 to 120 ° C. An example in which heating is performed for 1 to 20 seconds in a range and heat treatment after exposure is known, and as the radical generator, for example, a triazine compound having a trihalomethyl group is known (see Patent Document 1). ).

  On the other hand, high sensitivity is demanded from the viewpoint of improving the efficiency of plate making work for preparing a printing plate. In JP-T-2002-537419, a polycarboxylic acid having a specific structure is included in an image recording layer. Thus, a technique for achieving high sensitivity without shortening the storage period of the material is shown.

  Furthermore, a technique is known in which a specific cyanine dye is used as an infrared absorber to increase the efficiency of polymerization and increase the printing durability without performing heat treatment (see Patent Documents 2 and 3).

However, when these printing plate materials are manufactured and the plate making work is performed, it is necessary to work under a safe light, so that workability is poor, and when this is performed under a conventional white fluorescent lamp (see Patent Document 4). ) There is a problem that the quality of the printed matter may be insufficient or the non-image area may be stained when the printing plate material is stored for a long time.
JP 2001-175006 A JP 2002-278057 A JP 2003-5363 A JP 2001-194800 A

  An object of the present invention is to provide a method for producing and using a photosensitive lithographic printing plate that provides a printing plate having high workability and excellent stain resistance and halftone dot reproducibility due to storage.

  The above object of the present invention is achieved by the following means.

(Claim 1)
On the support, (A) a color material having absorption in the wavelength range of 700 nm to 1200 nm and (B) an image forming layer containing a radical generator, and a laser beam having an emission wavelength in the wavelength range of 700 nm to 1200 nm A method for producing a photosensitive lithographic printing plate to be exposed, comprising at least a coating step, a drying step, a cutting step, and an inspection / sorting step, and the coating step, the drying step, the cutting step, and the inspection / sorting step. (A) a light source diode having a light emitting diode having an emission wavelength maximum of 450 nm to 490 nm, a light emitting diode having an emission wavelength maximum of 520 nm to 560 nm, and a light emitting diode having an emission wavelength maximum of 630 nm to 720 nm (B) a light emitting diode having an emission wavelength maximum of 450 nm to 490 nm and an emission wavelength maximum of 560 nm to 630 nm It is performed under a light source lamp having a certain light emitting diode, or (c) a light source diode having a light emitting diode having an emission wavelength maximum of 490 nm to 520 nm and a light emission diode having an emission wavelength maximum of 630 nm to 720 nm. A method for producing a sex lithographic printing plate.

(Claim 2)
The method for producing a photosensitive lithographic printing plate according to claim 1, wherein the radical generator (B) is a polyhalogen compound.

(Claim 3)
On the support, (A) a color material having absorption in the wavelength range of 700 nm to 1200 nm and (B) an image forming layer containing a radical generator, and a laser beam having an emission wavelength in the wavelength range of 700 nm to 1200 nm A method for using a photosensitive lithographic printing plate to be exposed, comprising at least an exposure step, a development step, and a printing step, wherein any one of the exposure step, the development step, and the printing step comprises (a) light emission A light source having a light emitting diode having a wavelength maximum of 450 nm to 490 nm, a light emitting diode having an emission wavelength maximum of 520 nm to 560 nm, and a light emitting diode having an emission wavelength maximum of 630 nm to 720 nm, (b) an emission wavelength maximum of 450 nm to 490 nm And a light source lamp having a light emitting diode having an emission wavelength maximum of 560 nm to 630 nm Or (c) an emission wavelength maximum is in 490nm~520nm emitting diodes and methods of use of the photosensitive lithographic printing plate emission wavelength maximum is characterized by being performed in the light source lamp having a light-emitting diode in 630Nm～720nm.

(Claim 4)
4. The method of using a photosensitive lithographic printing plate according to claim 3, wherein the radical generator (B) is a polyhalogen compound.

(Claim 5)
A photosensitive lithographic printing plate produced by the method for producing a photosensitive lithographic printing plate according to claim 1 or 2 is used according to the method for using the photosensitive lithographic printing plate according to claim 3 or 4. How to use photosensitive lithographic printing plates.

  According to the configuration of the present invention, it is possible to provide a method for producing and using a photosensitive lithographic printing plate that provides a printing plate having high workability and excellent stain resistance and halftone dot reproducibility due to storage.

  The present invention has an image forming layer containing (A) a colorant having absorption in a wavelength range of 700 nm to 1200 nm and (B) a radical generator on a support, and an emission wavelength in a wavelength range of 700 nm to 1200 nm. A method for producing a photosensitive lithographic printing plate exposed by a laser beam having at least a coating step, a drying step, a cutting step, and an inspection / sorting step, the coating step, the drying step, the cutting step, Any of the inspection / sorting steps includes: (a) a light emitting diode having an emission wavelength maximum of 450 nm to 490 nm, a light emitting diode having an emission wavelength maximum of 520 nm to 560 nm, and a light emitting diode having an emission wavelength maximum of 630 nm to 720 nm. (B) a light emitting diode having an emission wavelength maximum of 450 nm to 490 nm and an emission wavelength maximum of 560 nm to It is performed under a light source lamp having a light emitting diode at 30 nm, or (c) a light source diode having a light emitting diode having a light emission wavelength maximum at 490 nm to 520 nm and a light emission diode having a light emission wavelength maximum at 630 nm to 720 nm. To do.

  The present invention also has an image forming layer containing (A) a colorant having an absorption in the wavelength range of 700 nm to 1200 nm and (B) a radical generator on the support, and an emission wavelength in the wavelength range of 700 nm to 1200 nm. A method for using a photosensitive lithographic printing plate exposed by a laser beam having at least an exposure step, a development step, and a printing step, wherein any one of the exposure step, the development step, and the printing step includes (A) a light emitting diode having an emission wavelength maximum of 450 nm to 490 nm, a light emitting diode having an emission wavelength maximum of 520 nm to 560 nm, and a light emitting diode having an emission wavelength maximum of 630 nm to 720 nm, and (b) an emission wavelength. A light emitting diode having a maximum at 450 nm to 490 nm and a light emitting diode having an emission wavelength maximum at 560 nm to 630 nm Light emitting diodes and emission wavelength maxima source lamp or (c) an emission wavelength maximum, is in 490nm~520nm to is characterized by being performed in the light source lamp having a light-emitting diode in 630Nm～720nm.

  The manufacturing process of the photosensitive lithographic printing plate starts from the preparation process of the support for the printing plate, but the subject of the present invention is accompanied by the improvement of the working environment for handling the photosensitive material. This is related to the step of applying an object.

  Among the manufacturing processes of the photosensitive lithographic printing plate, the processes after the coating process include a coating process, a drying process, a cutting process, and an inspection / sorting process.

  Depending on the printing plate, a matting process, an aging process, a packaging process, and the like may be added thereto.

  In addition, examples of the printing plate use process include an exposure process, a development process, and a printing process.

  In the present invention, the coating process, the drying process, the cutting process, the inspection / sorting process, the packaging process, the exposure process, the developing process, and the printing process are not limited to each process itself, but enter the process as a pre-stage of the process. What is normally recognized as a series of operations in the process, such as the state of being prepared or waiting as much as possible and the state of being temporarily held in the process after the process is completed and before moving to the next process It means that the process and the surrounding work space.

  Taking the drying process as an example, the drying process itself is usually performed in a dryer. The belt-like support on which the photosensitive composition for the image forming layer is applied is conveyed between the applicator and the drier by rollers or the like before entering the drier.

  Since the inside of the dryer is usually a dark room without light, in this case, the problem that the applied image forming layer is exposed to light by a safety light does not occur.

  On the other hand, the dryer itself may be automatically operated. However, if the operator checks or operates the instrument related to the dryer to check or prepare the operation status, work around the drying process If the space is under the light source lamp used in the present invention, a printing plate having a higher workability than red or the like and having excellent printability as will be described later can be obtained particularly in terms of color identification.

  In the method for producing a photosensitive lithographic printing plate of the present invention, at least one of a coating step, a drying step, a cutting step, and an inspection / sorting step is performed as follows: (a) a light emitting diode having an emission wavelength maximum of 450 nm to 490 nm, Under a light source lamp having a light emitting diode having an emission wavelength maximum of 520 nm to 560 nm and a light emitting diode having an emission wavelength maximum of 630 nm to 720 nm, (b) a light emitting diode having an emission wavelength maximum of 450 nm to 490 nm and an emission wavelength maximum of 560 nm to 560 nm It is performed under a light source lamp having a light emitting diode at 630 nm, or (c) a light source diode having a light emitting diode having a light emission wavelength maximum at 490 nm to 520 nm and a light emission diode having a light emission wavelength maximum at 630 nm to 720 nm. However, for all these steps, It is most preferably carried out in the light.

  Moreover, it is most preferable to carry out all the steps included in the method of use of the present invention under the light source lamp.

  The emission wavelength of the light source used in the above-described production method and use method of the present invention is in the entire visible range.

  When producing a photosensitive lithographic printing plate or using a photosensitive lithographic printing plate under the light source according to the present invention, it is preferable to illuminate in the range of usually 10 lx to 5000 lx, more preferably 30 lx to 1000 lx.

  In the production method and method of use of the present invention, the light source is preferably installed at a position approximately 0.5 m to 10 m away from the photosensitive lithographic printing plate.

  In particular, when the plate inspection work is performed visually, it is particularly easy to perform the work under the light source as compared with a white light with a fluorescent lamp.

  As a light source having a light emitting diode having an emission wavelength maximum at 450 nm to 490 nm according to the present invention, NSPB-500S, NSPB-510S, NSPBF-50S (manufactured by Nichia Corporation), E1L53-3B, E1L33- 3B (manufactured by Toyoda Gosei Co., Ltd.) has NSPGF-50S (manufactured by Nichia Corporation), E1L53-3G, E1L33-3G as a light source having a light emitting diode whose emission wavelength maximum is 520 nm to 560 nm. (Toyota Gosei Co., Ltd.) has a light emitting diode having an emission wavelength maximum at 630 nm to 720 nm. As the light source, TLRH180P, TLRH160 (manufactured by Toshiba Corporation), SLI-560UT, SLI-560DT, SLI- 570UT, SLI-580UT, SLA-580-JT As a light source having a light emitting diode having an emission wavelength maximum at 560 nm to 630 nm, TLYH20, TPTLYH160, TLYH16TP, TLOH20TP, TLOH160 (manufactured by Toshiba Corporation), SLI-560DT, SLI-560YT, SLI -570DT, SLI-570YT, SLI-580DT, SLI-580YT (manufactured by Rohm Co., Ltd.) and E1L53-KC, E1L31-AC (Toyoda Gosei) Co., Ltd.).

  The light source lamp according to the present invention is obtained by combining the above light emitting diodes to form a single chip.

  Next, the photosensitive lithographic printing plate used in the production method and use method of the present invention will be described.

  The image forming layer according to the present invention contains (A) a coloring material having absorption in the wavelength range of 700 nm to 1200 nm and (B) a radical generator, and can be either a negative type or a positive type image forming layer.

((A) Colorant having absorption in the wavelength range of 700 nm to 1300 nm)
The color material having an absorption in the wavelength range of 700 nm to 1300 nm according to the present invention (hereinafter sometimes abbreviated as (A)) has light absorption in the wavelength range of 700 nm to 1300 nm. Is a compound that generates

  The coloring material having an absorption in the wavelength range of 700 nm to 1300 nm according to the present invention is not particularly limited, but is US Pat. JP, JP-A-2003-76010, JP-A-2002-278057, JP-A-2003-5363, JP-A-2001-125260, JP-A-2002-23360, JP-A-2002-40638, Infrared absorbers, photothermal conversion agents, near-infrared dyes, and pigments described in JP-A Nos. 2002-62642 and 2002-27887057 can be used.

  Preferably, cyanine dyes, squarylium dyes, oxonol dyes, pyrylium dyes, thiopyrylium dyes, polymethine dyes, oil-soluble phthalocyanine dyes, triarylamine dyes, thiazolium dyes, oxazolium dyes, polyaniline dyes, polypyrrole dyes, polythiophene dyes can be used. .

  In addition, pigments such as carbon black, titanium black, iron oxide powder and colloidal silver can also be preferably used. From the viewpoints of absorption coefficient, photothermal conversion efficiency, price, etc., cyanine dyes are particularly preferable as the dyes, and carbon black is particularly preferable as the pigments.

  Preferable specific examples of the cyanine dye include, for example, paragraph numbers [0017] to [0019] of JP 2001-133969 A, paragraph numbers [0012] to [0038] of JP 2002-23360 A, JP Examples thereof include those described in paragraph numbers [0012] to [0023] of JP-A-2002-40638.

  The addition amount of the color material having absorption in the wavelength range of 700 nm to 1300 nm in the image forming layer varies depending on the extinction coefficient of the color material, but the reflection density of the lithographic printing plate material at the exposure wavelength is 0.3-3. It is preferable to add an amount in the range of 0.

More preferably, the addition amount is such that the concentration is in the range of 0.5 to 2.0. For example, in the case of the cyanine dyes mentioned in the above preferred specific examples, an amount of about 10 to 100 mg / m ² is added to the image forming layer in order to obtain the concentration.

((B) radical generator)
(B) The radical generator (hereinafter sometimes abbreviated as (B)) is capable of generating radicals by heat generated by (A) absorbing exposure light.

  The radical generator (B) functions mainly as an acid in the case of a positive type due to the heat generated by absorption of exposure light in (A), and the solubility of the exposed portion of the image forming layer in the developing solution. Acts so that the exposed part of the imaged layer can be removed from the support, and in the case of a negative type, for example, functions to initiate or accelerate polymerization and cures the exposed part of the imaged layer By doing so, the image forming layer in the exposed portion acts so as not to be removed from the support.

  Examples of the radical generator (B) include polyhalogen compounds, iodonium salts, sulfonium salts and the like, and the effect of the present invention is particularly great when polyhalogen compounds are included.

  The heat-sensitive image forming layer according to the present invention includes a positive heat-sensitive image forming layer containing (A) and a polyhalogen compound, or a polymerization-type negative heat-sensitive image forming containing (A), a polyhalogen compound and a polymerization initiator. The layer is particularly preferable because the effect of the present invention is large.

  As the positive type image forming layer, for example, an image forming layer containing a substance decomposable by acid is preferably used, and as the negative type image forming layer, an image forming layer containing a polymerization component is preferably used.

  As a positive type image forming layer containing a substance decomposable by acid, for example, a photo acid generator that generates acid by laser exposure described in JP-A-9-171254 and a photo acid generator that generates acid by the laser exposure described above, And an image-forming layer comprising an acid-decomposable compound and an infrared absorber that increase solubility in water. In this case, the photoacid generator corresponds to the (B) radical generator according to the present invention.

  Examples of the photoacid generator include various known compounds and mixtures.

For example, diazonium, phosphonium, sulfonium, and iodonium salts such as BF ₄ ⁻ , PF ₆ ⁻ , SbF ₆ ⁻ , SiF ₆ ²⁻ , ClO ₄ ⁻ , organic halogen compounds, orthoquinone-diazidosulfonyl chloride, and organometallic / An organic halogen compound is also an actinic ray-sensitive component that forms or separates an acid upon irradiation with actinic rays, and can be used as a photoacid generator.

  Organic halogen compounds known as free radical-forming photoinitiators are compounds that form hydrohalic acid and can be used as photoacid generators.

  Examples of the above-mentioned compounds forming hydrohalic acid include U.S. Pat. Nos. 3,515,552, 3,536,489 and 3,779,778, and West German Patent 2,243,621. In addition, compounds that generate an acid by photolysis described in West German Patent 2,610,842 can also be used. Further, o-naphthoquinonediazide-4-sulfonic acid halogenide described in JP-A-50-36209 can be used.

  As the photoacid generator ((B) radical generator), a polyhalogen compound is particularly preferable since the effect of the present invention is large.

  The polyhalogen compound here is a compound having a trihalogenmethyl group, a dihalogenmethyl group or a dihalomethylene group, and in particular, the halogen compound represented by the following general formula (1) and the above group is substituted with an oxadiazole ring. A compound is preferably used. Among these, a halogen compound represented by the following general formula (2) is particularly preferably used.

Formula (1) R ¹ —CY ₂ — (C═O) —R ²
In the formula, R ¹ represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an acyl group, an alkylsulfonyl group, an arylsulfonyl group, an iminosulfonyl group, or a cyano group. R ² represents a monovalent substituent. R ¹ and R ² may be bonded to form a ring. Y represents a halogen atom.

Formula (2) CY ₃ — (C═O) —X—R ³
In the formula, R ³ represents a monovalent substituent. X represents —O— or —NR ⁴ —. R ⁴ represents a hydrogen atom or an alkyl group. R ³ and R ⁴ may be bonded to form a ring. Y represents a halogen atom. Among these, those having a polyhalogenacetylamide group are particularly preferably used.

  Specific examples of the structure represented by the general formula (1) include the following compounds BR1 to BR70. In addition, a compound in which a polyhalogenmethyl group is substituted with an oxadiazole ring is also preferably used, and examples thereof are listed in H-1 to H-14. Furthermore, oxadiazole compounds described in JP-A-5-34904, Do-45875, and 8-240909 are also preferably used.

  In addition, the compound which substituted the halogen atom from bromine to chlorine can also be used suitably for these compounds in this invention. Specific examples of polyhalogen compounds preferably used in the present invention are listed below.

  The content of the photoacid generator can vary widely depending on its chemical properties and the composition or physical properties of the image forming layer, but it is about 0.1 to about 20 with respect to the total mass of the solid content of the image forming layer. The range of mass% is appropriate, and preferably in the range of 0.2 to 10 mass%.

  Specific examples of the acid-decomposing compound are described in JP-A Nos. 48-89003, 51-120714, 53-133429, 55-12995, 55-126236, and 56-17345. Compounds having a C—O—C bond, compounds having a Si—O—C bond described in JP-A-60-37549, JP-A-60-121446, JP-A-60-3625, Other acid-decomposing compounds described in No. 60-10247. Further, compounds having Si-N bonds described in Japanese Patent Application No. 61-16687, carbonates described in Japanese Patent Application No. 61-94603, ortho described in Japanese Patent Application No. 60-251744. Carbonate ester, orthotitanate ester described in Japanese Patent Application No. 61-125473, orthosilicate ester described in Japanese Patent Application No. 61-125474, acetal described in Japanese Patent Application No. 61-155481, and Ketal, compounds having a C—S bond described in Japanese Patent Application No. 61-87769, and the like. Of these, JP-A-53-133429, JP-A-56-17345, and JP-A-60-112446. No. 60-37549 and Japanese Patent Application Nos. 60-251744 and 61-155481. Compounds having a case, a compound having Si-O-C bonds, orthocarbonates, acetals, ketals and silyl ethers are preferable.

  The content of the acid-decomposing compound is preferably from 5 to 70% by mass, particularly preferably from 10 to 50% by mass, based on the total solid content of the composition forming the image forming layer. The acid decomposition compound may be used alone or in combination of two or more.

  The positive image forming layer may appropriately contain a binder as necessary.

  (B) used for the negative type image forming layer functions to start or accelerate polymerization, for example, as described above, and the image of the exposed part is cured by curing the image forming layer of the exposed part. It acts so that the forming layer is not removed from the support.

  In this case, the negative type image forming layer contains a polymerizable unsaturated group-containing compound, and (B) acts to initiate or accelerate the polymerization of the polymerizable unsaturated group-containing compound. A polymerization initiator that generates radicals only by light and initiates polymerization may be included.

  Examples of these polymerization initiators containing (B) that generate radicals by heat include the following, but it is preferable to use a polyhalogen compound as in the positive type.

(Polymerization initiator)
For example, J. et al. Carbonyl compounds, organic sulfur compounds, persulfides, redox compounds, azo, diazo compounds, halogen compounds, and photoreductive dyes as described in Chapter 5 of “Light Sensitive Systems” by J. Kosar Etc. More specific compounds are disclosed in British Patent 1,459,563.

  That is, the following can be used as the polymerization initiator.

  Benzoin derivatives such as benzoin methyl ether, benzoin-i-propyl ether, α, α-dimethoxy-α-phenylacetophenone; benzophenone, 2,4-dichlorobenzophenone, methyl o-benzoylbenzoate, 4,4′-bis (dimethyl) Benzophenone derivatives such as amino) benzophenone; thioxanthone derivatives such as 2-chlorothioxanthone and 2-i-propylthioxanthone; anthraquinone derivatives such as 2-chloroanthraquinone and 2-methylanthraquinone; N-methylacridone, N-butylacridone and the like In addition to α, α-diethoxyacetophenone, benzyl, fluorenone, xanthone and uranyl compounds, JP-B-59-1281, JP-A-61-9621 and JP-A-60-60104 Triazine derivatives described in Japanese Patent Publication No. JP-A-59-1504 and JP-A-61-243807; JP-B Nos. 43-23684, 44-6413, 44-6413 No. 47-1604 and U.S. Pat. No. 3,567,453; diazonium compounds; U.S. Pat. Nos. 2,848,328, 2,852,379 and 2,940,853 O-quinonediazides described in JP-B-36-22062, JP-A-37-13109, JP-A-38-18015 and JP-A-45-9610; JP-B-55-39162, JP-A-59-14023 No. and “Macromolecules”, Vol. 10, p. 1307 (1977) Various onium compounds; azo compounds described in JP-A-59-142205; JP-A-1-54440, European Patents 109,851, 126,712 and “Journal of Imaging Science (J. Imag) Sci.)], 30, 174 (1986); (oxo) sulfonium organoboron complexes described in Japanese Patent Application Nos. 4-56831 and 4-89535; Nos. 152396 and 61-151197; “Coordination Chemistry Review” 84, 85-277 (1988), and ruthenium described in JP-A-2-182701. Contains transition metals Transition metal complexes; triarylimidazole dimer of JP-A 3-209477 JP; carbon tetrabromide, organic halogen compounds in JP 59-107344 JP like.

  Further, examples of the polymerization initiator include compounds capable of generating radicals described in JP-A-2002-537419, JP-A-2001-175006, JP-A-2002-278057, JP-A-2003-5363. In addition, an onium salt having two or more cation moieties in one molecule, an N-nitrosamine compound described in JP-A-2001-133966, described in JP-A-2003-76010, Japanese Patent Application Laid-Open No. 2001-343742 A compound that generates a radical by heat, Japanese Patent Application Laid-Open No. 2002-6482 a compound that generates an acid or a radical by heat, Japanese Patent Application Laid-Open No. 2002-116539, Japanese Patent Application Laid-Open No. 2002-148790 A compound that generates an acid or a radical by the heat of heat, JP-A-2002-207293 Japanese Patent Application Laid-Open No. 2002-328465, photo- or thermal polymerization initiator having a polymerizable unsaturated group, Japanese Patent Application Laid-Open No. 2002-268217, an onium salt having a divalent or higher valent anion as a counter ion, and Japanese Patent Application Laid-Open No. 2002-328465 A compound such as a compound or a compound that generates a radical by heat described in JP-A-2002-341519 can also be used.

  The amount of the polymerization initiator added to the image forming layer is not particularly limited, but is preferably in the range of 0.1 to 20% by mass in the components of the image forming layer. Furthermore, Preferably it is 0.8-15 mass%.

(Polymerizable unsaturated group-containing compound)
A polymerizable unsaturated group-containing compound is a compound having a polymerizable unsaturated group in the molecule, and is an addition polymerization in a molecule generally used for general radical polymerizable monomers and UV curable resins. Polyfunctional monomers having a plurality of possible ethylenic double bonds and polyfunctional oligomers can be used.

  These polymerizable ethylenic double bond-containing compounds are not particularly limited, but preferred examples include 2-ethylhexyl acrylate, 2-hydroxypropyl acrylate, glycerol acrylate, tetrahydrofurfuryl acrylate, phenoxyethyl acrylate, nonylphenoxy. Monofunctional acrylic acid esters such as ethyl acrylate, tetrahydrofurfuryloxyethyl acrylate, tetrahydrofurfuryloxyhexanolide acrylate, ε-caprolactone adduct of 1,3-dioxane alcohol, 1,3-dioxolane acrylate, or Methacrylic acid, itaconic acid, crotonic acid, maleic acid, etc. in which these acrylates are replaced with methacrylate, itaconate, crotonate, and maleate. Tel, for example, ethylene glycol diacrylate, triethylene glycol diacrylate, pentaerythritol diacrylate, hydroquinone diacrylate, resorcin diacrylate, hexanediol diacrylate, neopentyl glycol diacrylate, tripropylene glycol diacrylate, hydroxypivalate neo Diacrylate of pentyl glycol, diacrylate of neopentyl glycol adipate, diacrylate of ε-caprolactone adduct of neopentyl glycol hydroxypivalate, 2- (2-hydroxy-1,1-dimethylethyl) -5-hydroxymethyl- 5-ethyl-1,3-dioxane diacrylate, tricyclodecane dimethylol acrylate, tricyclodecane dimethylo Difunctional acrylic acid esters such as ε-caprolactone adduct of diacrylate, diglycidyl ether diacrylate of 1,6-hexanediol, or methacrylic acid, itacon in which these acrylates are replaced with methacrylate, itaconate, crotonate, maleate Acids, crotonic acid, maleic esters such as trimethylolpropane triacrylate, ditrimethylolpropane tetraacrylate, trimethylolethane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, Dipentaerythritol hexaacrylate, ε-cap of dipentaerythritol hexaacrylate Lactone adducts, pyrogallol triacrylate, propionic acid / dipentaerythritol triacrylate, propionic acid / dipentaerythritol tetraacrylate, hydroxypivalylaldehyde-modified dimethylolpropane triacrylate and other polyfunctional acrylic acid esters, or these acrylates Examples thereof include methacrylic acid, itaconic acid, crotonic acid, and maleic acid ester instead of methacrylate, itaconate, crotonate, and maleate.

  Prepolymers can also be used as described above. A prepolymer may use together 1 type, or 2 or more types, and may mix and use the above-mentioned monomer and / or oligomer.

  Examples of prepolymers include adipic acid, trimellitic acid, maleic acid, phthalic acid, terephthalic acid, hymic acid, malonic acid, succinic acid, glutaric acid, itaconic acid, pyromellitic acid, fumaric acid, glutaric acid, pimelic acid, Polybasic acids such as sebacic acid, dodecanoic acid, tetrahydrophthalic acid, and ethylene glycol, propylene glycol, diethylene glycol, propylene oxide, 1,4-butanediol, triethylene glycol, tetraethylene glycol, polyethylene glycol, glycerin, trimethylol Polyester obtained by introducing (meth) acrylic acid into a polyester obtained by combining polyhydric alcohols such as propane, pentaerythritol, sorbitol, 1,6-hexanediol, 1,2,6-hexanetriol Chlorates such as bisphenol A, epichlorohydrin, (meth) acrylic acid, and epoxy acrylates in which (meth) acrylic acid is introduced into an epoxy resin such as phenol novolac, epichlorohydrin, (meth) acrylic acid, such as ethylene glycol, adipine Acid / tolylene diisocyanate / 2-hydroxyethyl acrylate, polyethylene glycol / tolylene diisocyanate / 2-hydroxyethyl acrylate, hydroxyethylphthalyl methacrylate / xylene diisocyanate, 1,2-polybutadiene glycol / tolylene diisocyanate / 2-hydroxyethyl acrylate , Trimethylolpropane, propylene glycol, tolylene diisocyanate, 2-hydroxyethyl acrylate In addition, urethane acrylates in which (meth) acrylic acid is introduced into urethane resin, for example, silicone resin acrylates such as polysiloxane acrylate, polysiloxane diisocyanate, 2-hydroxyethyl acrylate, etc., and (meth) acryloyl in oil-modified alkyd resins Examples thereof include prepolymers such as alkyd-modified acrylates having introduced groups and spirane resin acrylates.

  This image forming layer includes phosphazene monomer, triethylene glycol, isocyanuric acid EO (ethylene oxide) modified diacrylate, isocyanuric acid EO modified triacrylate, dimethylol tricyclodecane diacrylate, trimethylolpropane acrylate benzoate, It can contain addition-polymerizable oligomers and prepolymers having monomers such as alkylene glycol type acrylic acid-modified, urethane-modified acrylate and the like and structural units formed from the monomers.

  Furthermore, examples of the compound that can be used in combination include a phosphoric ester compound containing at least one (meth) acryloyl group. The compound is a compound in which at least a part of the hydroxyl group of phosphoric acid is esterified.

  In addition, JP-A-58-212994, 61-6649, 62-46688, 62-48589, 62-173295, 62-187092, 63- No. 67189, JP-A-1-244891, and the like. Further, "11290 Chemical Products", Chemical Industry Daily, compounds described on pages 286 to 294, "UV / EB curing" The compounds described in "Handbook (raw material)", Kobunshi Shuppankai, pages 11 to 65, and the like can also be suitably used in the present invention. Of these, compounds having two or more acrylic groups or methacryl groups in the molecule are preferred in the present invention, and those having a molecular weight of 10,000 or less, more preferably 5,000 or less are preferred.

  An addition-polymerizable ethylenic double bond-containing monomer containing a tertiary amino group in the molecule can also be preferably used. Although there is no particular limitation on the structure, a tertiary amine compound having a hydroxyl group modified with glycidyl methacrylate, methacrylic acid chloride, acrylic acid chloride or the like is preferably used. Specifically, polymerizable compounds described in JP-A-1-165613 and JP-A-1-203413 are preferably used.

  Further, in the present invention, a reaction product of a polyhydric alcohol containing a tertiary amino group in the molecule, a diisocyanate compound, and a compound containing an ethylenic double bond capable of addition polymerization with a hydroxyl group in the molecule is also preferably used. . In particular, a compound having a tertiary amino group and an amide bond is preferably used.

  Examples of the polyhydric alcohol having a tertiary amino group in the molecule include triethanolamine, N-methyldiethanolamine, N-ethyldiethanolamine, Nn-butyldiethanolamine, N-tert. -Butyldiethanolamine, N, N-di (hydroxyethyl) aniline, N, N, N ', N'-tetra-2-hydroxypropylethylenediamine, p-tolyldiethanolamine, N, N, N', N'-tetra- 2-hydroxyethylethylenediamine, N, N-bis (2-hydroxypropyl) aniline, allyldiethanolamine, 3- (dimethylamino) -1,2-propanediol, 3-diethylamino-1,2-propanediol, N, N -Di (n-propyl) amino-2,3-propanediol, N, N-di (iso-propyl) amino-2,3-propanediol, 3- (N-methyl-N-benzylamino) -1, Although 2-propanediol etc. are mentioned, it is not limited to this.

  Examples of the diisocyanate compound include butane-1,4-diisocyanate, hexane-1,6-diisocyanate, 2-methylpentane-1,5-diisocyanate, octane-1,8-diisocyanate, 1,3-diisocyanate methyl-cyclohexanone. 2,2,4-trimethylhexane-1,6-diisocyanate, isophorone diisocyanate, 1,2-phenylene diisocyanate, 1,3-phenylene diisocyanate, 1,4-phenylene diisocyanate, tolylene-2,4-diisocyanate, tolylene- 2,5-diisocyanate, tolylene-2,6-diisocyanate, 1,3-di (isocyanatomethyl) benzene, 1,3-bis (1-isocyanato-1-methylethyl) benzene, and the like. In Not a constant.

  Examples of the compound containing an ethylenic double bond capable of addition polymerization with a hydroxyl group in the molecule include 2-hydroxyethyl methacrylate, 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate, 2-hydroxypropylene-1,3- Examples include dimethacrylate and 2-hydroxypropylene-1-methacrylate-3-acrylate.

  These reactions can be carried out in the same manner as a method for synthesizing urethane acrylate by a reaction of a normal diol compound, diisocyanate compound, and hydroxyl group-containing acrylate compound.

Specific examples of these reaction products of polyhydric alcohols containing tertiary amino groups in the molecule, diisocyanate compounds, and compounds containing ethylenic double bonds capable of addition polymerization with hydroxyl groups in the molecule are shown below. .
M-1: reaction product of triethanolamine (1 mol), hexane-1,6-diisocyanate (3 mol), 2-hydroxyethyl methacrylate (3 mol) M-2: triethanolamine (1 mol), isophorone Reaction product of diisocyanate (3 mol) and 2-hydroxyethyl acrylate (3 mol) M-3: Nn-butyldiethanolamine (1 mol), 1,3-bis (1-isocyanate-1-methylethyl) Reaction product of benzene (2 mol), 2-hydroxypropylene-1-methacrylate-3-acrylate (2 mol) M-4: Nn-butyldiethanolamine (1 mol), 1,3-di (isocyanatomethyl) ) Reaction of benzene (2 mol), 2-hydroxypropylene-1-methacrylate-3-acrylate (2 mol) Product M-5: Reaction product M-6 of N-methyldiethanolamine (1 mol), tolylene-2,4-diisocyanate (2 mol), 2-hydroxypropylene-1,3-dimethacrylate (2 mol): Reaction product M-7 of triethanolamine (1 mol), 1,3-bis (1-isocyanato-1-methylethyl) benzene (3 mol), 2-hydroxyethyl methacrylate (3 mol): ethylenediaminetetraethanol (1 mol), reaction product of 1,3-bis (1-isocyanato-1-methylethyl) benzene (4 mol), 2-hydroxyethyl methacrylate (4 mol). An acrylate or an alkyl acrylate described in JP-A-2-127404 can be used.

  The addition amount of the polymerizable unsaturated group-containing compound is preferably 5 to 80% by mass and more preferably 15 to 60% by mass with respect to the image forming layer.

  The image forming layer containing the above polymerization component preferably contains an alkali-soluble polymer compound.

  The alkali-soluble polymer compound is a polymer compound having an acid value, and specifically, copolymers having various structures as described below can be preferably used.

  As the above-mentioned copolymer, acrylic polymer, polyvinyl butyral resin, polyurethane resin, polyamide resin, polyester resin, epoxy resin, phenol resin, polycarbonate resin, polyvinyl butyral resin, polyvinyl formal resin, shellac, other natural resins, etc. are used. I can do it. Two or more of these may be used in combination.

  Among these, a polymer having a carboxy group and a hydroxyl group is preferably used, and a polymer having a carboxy group is particularly preferably used.

  Of these, vinyl copolymer obtained by copolymerization of acrylic monomers is preferably used. Furthermore, the copolymer composition is preferably a copolymer of (a) a carboxyl group-containing monomer, (b) a methacrylic acid alkyl ester, or an acrylic acid alkyl ester.

  Specific examples of the carboxyl group-containing monomer include α, β-unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride and the like. In addition, carboxylic acids such as phthalic acid and 2-hydroxymethacrylate half ester are also preferable.

  Specific examples of alkyl methacrylates and alkyl esters include methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, heptyl methacrylate, octyl methacrylate, nonyl methacrylate. , Decyl methacrylate, undecyl methacrylate, dodecyl methacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, heptyl acrylate, octyl acrylate, nonyl acrylate, acrylic In addition to unsubstituted alkyl esters such as decyl acid, undecyl acrylate and dodecyl acrylate, cyclic alkyl esters such as cyclohexyl methacrylate and cyclohexyl acrylate Substituted alkyl esters such as benzyl methacrylate, 2-chloroethyl methacrylate, N, N-dimethylaminoethyl methacrylate, glycidyl methacrylate, benzyl acrylate, 2-chloroethyl acrylate, N, N-dimethylaminoethyl acrylate, and glycidyl acrylate Also mentioned.

  Furthermore, what used the monomer as described in following (1)-(14) as another copolymerization monomer can also be used.

  1) Monomers having an aromatic hydroxyl group, such as o- (or p-, m-) hydroxystyrene, o- (or p-, m-) hydroxyphenyl acrylate and the like.

  2) Monomers having an aliphatic hydroxyl group, such as 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, N-methylol acrylamide, N-methylol methacrylamide, 4-hydroxybutyl methacrylate, 5-hydroxypentyl acrylate, 5-hydroxypentyl methacrylate , 6-hydroxyhexyl acrylate, 6-hydroxyhexyl methacrylate, N- (2-hydroxyethyl) acrylamide, N- (2-hydroxyethyl) methacrylamide, hydroxyethyl vinyl ether and the like.

  3) A monomer having an aminosulfonyl group, such as m- (or p-) aminosulfonylphenyl methacrylate, m- (or p-) aminosulfonylphenyl acrylate, N- (p-aminosulfonylphenyl) methacrylamide, N- (p -Aminosulfonylphenyl) acrylamide and the like.

  4) Monomers having a sulfonamide group, such as N- (p-toluenesulfonyl) acrylamide, N- (p-toluenesulfonyl) methacrylamide and the like.

  5) Acrylamide or methacrylamides such as acrylamide, methacrylamide, N-ethylacrylamide, N-hexylacrylamide, N-cyclohexylacrylamide, N-phenylacrylamide, N- (4-nitrophenyl) acrylamide, N-ethyl-N- Phenylacrylamide, N- (4-hydroxyphenyl) acrylamide, N- (4-hydroxyphenyl) methacrylamide and the like.

  6) Monomers containing fluorinated alkyl groups such as trifluoroethyl acrylate, trifluoroethyl methacrylate, tetrafluoropropyl methacrylate, hexafluoropropyl methacrylate, octafluoropentyl acrylate, octafluoropentyl methacrylate, heptadecafluorodecyl methacrylate, N- Butyl-N- (2-acryloxyethyl) heptadecafluorooctylsulfonamide and the like.

  7) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether and the like.

  8) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, vinyl benzoate and the like.

  9) Styrenes such as styrene, methyl styrene, chloromethyl styrene and the like.

  10) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone.

  11) Olefins such as ethylene, propylene, i-butylene, butadiene, isoprene and the like.

  12) N-vinylpyrrolidone, N-vinylcarbazole, 4-vinylpyridine and the like.

  13) Monomers having a cyano group, such as acrylonitrile, methacrylonitrile, 2-pentenenitrile, 2-methyl-3-butenenitrile, 2-cyanoethyl acrylate, o- (or m-, p-) cyanostyrene.

  14) A monomer having an amino group, such as N, N-diethylaminoethyl methacrylate, N, N-dimethylaminoethyl acrylate, N, N-dimethylaminoethyl methacrylate, polybutadiene urethane acrylate, N, N-dimethylaminopropyl acrylamide, N, N-dimethylacrylamide, acryloylmorpholine, Ni-propylacrylamide, N, N-diethylacrylamide and the like.

  Furthermore, other monomers that can be copolymerized with these monomers may be copolymerized.

  Also, an unsaturated bond-containing vinyl copolymer obtained by addition reaction of a compound having a (meth) acryloyl group and an epoxy group in the molecule to a carboxyl group present in the molecule of the vinyl copolymer. Are also preferably used.

  Specific examples of the compound containing both an unsaturated bond and an epoxy group in the molecule include glycidyl acrylate, glycidyl methacrylate, and an epoxy group-containing unsaturated compound described in JP-A No. 11-271969.

  Among these alkali-soluble polymer compounds, compounds having an acid value of 30 to 200 are preferable, and those having a mass average molecular weight of 15,000 to 500,000 are more preferable.

  Among these, those having a polymerizable unsaturated group are preferred, and those having a polymerizable unsaturated group-containing unit of 5 to 50% with respect to the repeating units of the whole polymer compound are particularly preferred.

  As the alkali-soluble polymer compound having a polymerizable unsaturated group, a known method can be used without limitation.

  Examples thereof include a method of reacting a glycidyl group with a carboxyl group, a method of reacting an isocyanate group with a hydroxyl group, and the like.

(Polymer binder)
The polymerization-type image forming layer may further contain a polymer binder.

  Examples of the polymer binder include acrylic polymer, polyvinyl butyral resin, polyurethane resin, polyamide resin, polyester resin, epoxy resin, phenol resin, polycarbonate resin, polyvinyl butyral resin, polyvinyl formal resin, shellac, and other natural resins. Can be used. Two or more of these may be used in combination.

(Polymerization inhibitor)
The polymerization-type image forming layer may contain a polymerization inhibitor as necessary.

  Examples of the polymerization inhibitor include hindered amine compounds having a piperidine skeleton having a base constant (pKb) of 7 to 14.

  The addition amount of the polymerization inhibitor is preferably about 0.001 to 10% by mass, particularly preferably 0.01 to 10% by mass, and more preferably 0.1 to 5% by mass with respect to the polymerizable unsaturated group-containing compound. Is preferred.

  In addition to the polymerization inhibitor described above, other polymerization inhibitors may be added to the image forming layer. Other polymerization inhibitors include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol) 2,2'-methylenebis (4-methyl-6-t-butylphenol), N-nitrosophenylhydroxylamine cerium salt, 2-t-butyl-6- (3-t-butyl-2-hydroxy-5) -Methylbenzyl) -4-methylphenyl acrylate and the like.

  In addition, a colorant can also be used in the image forming layer, and conventionally known ones including commercially available ones can be suitably used as the colorant. Examples include those described in the revised new edition “Pigment Handbook”, edited by Japan Pigment Technology Association (Seikodo Shinkosha), Color Index Handbook, and the like.

  Examples of the pigment include black pigment, yellow pigment, red pigment, brown pigment, purple pigment, blue pigment, green pigment, fluorescent pigment, and metal powder pigment. Specifically, inorganic pigments (titanium dioxide, carbon black, graphite, zinc oxide, Prussian blue, cadmium sulfide, iron oxide, and lead, zinc, barium and calcium chromates) and organic pigments (azo-based, thioindigo) , Anthraquinone, anthanthrone, and triphendioxazine pigments, vat dye pigments, phthalocyanine pigments and derivatives thereof, quinacridone pigments, and the like.

  Among these, it is preferable to select and use a pigment having substantially no absorption in the absorption wavelength region of the spectral sensitizing dye corresponding to the exposure laser to be used. In this case, an integrating sphere at the laser wavelength to be used is used. It is preferable that the reflection absorption of the used pigment is 0.05 or less. Moreover, as an addition amount of a pigment, 0.1-10 mass% is preferable with respect to solid content of the said composition, More preferably, it is 0.2-5 mass%.

  It is preferable to provide a protective layer on the upper side of the image forming layer. The protective layer (oxygen barrier layer) is preferably highly soluble in a developer solution (generally an alkaline aqueous solution) described later, and specifically includes a layer mainly composed of polyvinyl alcohol and polyvinyl pyrrolidone. it can. Polyvinyl alcohol has an effect of suppressing permeation of oxygen, and polyvinyl pyrrolidone has an effect of ensuring adhesiveness with an adjacent image forming layer.

  In addition to the above two polymers, polysaccharides, polyethylene glycol, gelatin, glue, casein, hydroxyethyl cellulose, carboxymethyl cellulose, methyl cellulose, hydroxyethyl starch, gum arabic, sucrose octaacetate, ammonium alginate, sodium alginate as required Water-soluble polymers such as polyvinylamine, polyethylene oxide, polystyrene sulfonic acid, polyacrylic acid, and water-soluble polyamide can also be used in combination.

(Support)
The support according to the present invention is a plate or film capable of carrying an image forming layer, and preferably has a hydrophilic surface on the side where the image forming layer is provided.

  Examples of the support of the present invention include metal plates such as aluminum, stainless steel, chromium and nickel, and plastic films such as polyester film, polyethylene film and polypropylene film laminated or vapor-deposited with the above metal thin film.

  Moreover, although what hydrophilized the surface, such as a polyester film, a vinyl chloride film, a nylon film, etc. can be used, an aluminum support body is used preferably. In the case of an aluminum support, pure aluminum or an aluminum alloy is used.

  Various aluminum alloys can be used as the support, and for example, alloys of metals such as silicon, copper, manganese, magnesium, chromium, zinc, lead, bismuth, nickel, titanium, sodium, iron, and aluminum are used. . Further, the aluminum support having a roughened surface is used for water retention.

  Prior to roughening (graining treatment), it is preferable to perform a degreasing treatment in order to remove the rolling oil on the surface. As the degreasing treatment, a degreasing treatment using a solvent such as trichlene or thinner, an emulsion degreasing treatment using an emulsion such as kesilon or triethanol, or the like is used. In addition, an alkaline aqueous solution such as caustic soda can be used for the degreasing treatment. When an alkaline aqueous solution such as caustic soda is used for the degreasing treatment, dirt and oxide film that cannot be removed only by the degreasing treatment can be removed. When an alkaline aqueous solution such as caustic soda is used for the degreasing treatment, smut is generated on the surface of the support. It is preferable to perform the treatment. Examples of the roughening method include a mechanical method and a method of etching by electrolysis.

  The mechanical roughening method used is not particularly limited, but a brush polishing method and a honing polishing method are preferable.

  The electrochemical surface roughening method is not particularly limited, but a method of electrochemical surface roughening in an acidic electrolyte is preferable.

After the surface is roughened by the electrochemical surface roughening method, it is preferably immersed in an acid or alkali aqueous solution in order to remove aluminum scraps on the surface. Examples of the acid include sulfuric acid, persulfuric acid, hydrofluoric acid, phosphoric acid, nitric acid, hydrochloric acid, and the like. Examples of the base include sodium hydroxide and potassium hydroxide. Among these, it is preferable to use an alkaline aqueous solution. The dissolution amount of aluminum in the support surface, 0.5 to 5 g / m ² is preferred. In addition, it is preferable that after the immersion treatment with an alkaline aqueous solution, neutralization treatment is performed by immersion in an acid such as phosphoric acid, nitric acid, sulfuric acid, chromic acid or a mixed acid thereof.

  The mechanical surface roughening method and the electrochemical surface roughening method may each be used alone for roughing, or the mechanical surface roughening method followed by the electrochemical surface roughening method. You may roughen.

  Following the roughening treatment, an anodic oxidation treatment can be performed. There is no restriction | limiting in particular in the method of the anodizing process which can be used in this invention, A well-known method can be used. By performing the anodizing treatment, an oxide film is formed on the support.

  The anodized support may be sealed as necessary. These sealing treatments can be performed using known methods such as hot water treatment, boiling water treatment, water vapor treatment, sodium silicate treatment, dichromate aqueous solution treatment, nitrite treatment, and ammonium acetate treatment.

  Furthermore, after performing these treatments, water-soluble resins such as polyvinylphosphonic acid, polymers and copolymers having sulfonic acid groups in the side chain, polyacrylic acid, water-soluble metal salts (for example, zinc borate) or Also suitable are those coated with a yellow dye, amine salt or the like. Further, a sol-gel treated substrate in which a functional group capable of causing an addition reaction by a radical as disclosed in JP-A No. 5-304358 is covalently used.

(Protective layer)
A protective layer may be provided on the upper side of the image forming layer according to the present invention.

  The protective layer (oxygen barrier layer) preferably has high solubility in a developing solution (generally an alkaline aqueous solution) described later.

  The material constituting the protective layer is preferably polyvinyl alcohol, polysaccharide, polyvinyl pyrrolidone, polyethylene glycol, gelatin, glue, casein, hydroxyethyl cellulose, carboxymethyl cellulose, methyl cellulose, hydroxyethyl starch, gum arabic, sucrose octaacetate, ammonium alginate , Sodium alginate, polyvinylamine, polyethylene oxide, polystyrene sulfonic acid, polyacrylic acid, water-soluble polyamide, polyvinylpyrrolidone copolymer, and the like. These compounds can be used alone or in combination of two or more as a protective layer coating composition. A particularly preferred compound is polyvinyl alcohol.

  To prepare a coating composition for the protective layer, the above-mentioned material can be dissolved in a suitable solvent to form a coating solution, which is coated on the image forming layer according to the present invention and dried to protect it. A layer can be formed. The thickness of the protective layer is preferably from 0.1 to 5.0 μm, particularly preferably from 0.5 to 3.0 μm. The protective layer can further contain a surfactant, a matting agent and the like as required.

  As a method for coating the protective layer, known coating methods mentioned for coating the image forming layer can be suitably used. The drying temperature of the protective layer is preferably lower than the drying temperature of the image forming layer, preferably the difference from the drying temperature of the image forming layer is 10 ° C. or more, more preferably 20 ° C. or more, and the upper limit is about 50 ° C. at most. It is.

  Moreover, it is preferable that the drying temperature of a protective layer is lower than the glass transition temperature (Tg) of the binder which an image forming layer contains. The difference between the drying temperature of the protective layer and the glass transition temperature (Tg) of the binder contained in the image forming layer is preferably 20 ° C. or more, more preferably 40 ° C. or more, and the upper limit is about 60 ° C. at most. .

  In the coating process of the photosensitive lithographic printing plate used in the present invention, the above-described components of the image forming layer and various additives are dissolved in a suitable solvent and coated on a support.

  The type of the solvent is not particularly limited as long as it has sufficient solubility for each of the above-described components and gives good coating properties.

  Examples of such solvents include cellosolv solvents such as methyl cellosolve, ethyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, Propylene glycol solvents such as propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether, butyl acetate, amyl acetate, ethyl butyrate, butyl butyrate, diethyl oxalate, ethyl pyruvate, ethyl-2-hydroxybutyrate Rate, ethyl acetoacetate, methyl lactate, ethyl lactate, 3-methoxy Ester solvents such as methyl lopionate, alcohol solvents such as heptanol, hexanol, diacetone alcohol, furfuryl alcohol, ketone solvents such as cyclohexanone, methyl amyl ketone, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, etc. In addition to the polar solvent, acetic acid, a mixed solvent thereof, a mixed solvent obtained by adding an aromatic hydrocarbon thereto, and the like can be given.

  The use ratio of the solvent is usually in the range of 1 to 20 (mass ratio) times the total amount of the photosensitive composition.

  In the coating step, a conventionally known method such as spin coating, wire bar coating, dip coating, air knife coating, roll coating, blade coating, curtain coating or the like is performed.

  The coating amount is usually in the range of 0.3 to 7 μm, preferably 0.5 to 5 μm, and more preferably 1 to 3 μm as a dry film thickness.

  Next, in the drying step after coating, drying is usually performed in the range of 30 to 170 ° C., preferably 40 to 150 ° C., and the residual solvent is adjusted to 10% by mass or less in the normal image forming layer.

  After the drying process, an aging process is performed as necessary. The aging process is to hold the printing plate under heating under certain conditions, but the development latitude can be widened through the aging process.

  There is a cutting step of cutting the photosensitive lithographic printing plate into a predetermined size before or after the aging step.

  In the cutting step, the photosensitive lithographic printing plate having a predetermined size is cut according to various uses.

  However, even after this cutting step, after another step, there may be a step of finally removing a part of the photosensitive lithographic printing plate for the purpose of dimension alignment and edge processing.

  Next, in the inspection / sorting step, it is determined whether or not the photosensitive lithographic printing plate as the final product is valuable as a product.

  The photosensitive lithographic printing plate determined to have no commercial value in the inspection / sorting process is recycled or discarded and is not shipped. The inspection / sorting step is performed by visual inspection by an operator, computer processing of information obtained from a camera, or a combination thereof. In the inspection / sorting step, the surface of the image forming layer is inspected for scratches and uneven coating.

  This final inspection / selection process is necessary for final selection as a product. However, in some cases, a process for inspecting and selecting surface defects between the processes before the cutting process is provided.

  The photosensitive lithographic printing plate to be shipped as a product by the inspection / sorting process is arranged in a form for shipping.

  Depending on the type of photosensitive lithographic printing plate, a plurality of photosensitive lithographic printing plates are mounted on a horizontal or vertical mounting table. In this case, it is supplied to the user in a mounted state and set as a photosensitive lithographic printing plate supply mounting table for the exposure apparatus.

  When the user places the photosensitive lithographic printing plate on the photosensitive lithographic printing plate supply platform of the exposure apparatus, the supplier must pack the cardboard box or the like for transportation to the user. Packaging using an outer box (packaging process). The photosensitive lithographic printing plate mounted on the mounting table or packaged is shipped and finally supplied to the user.

  Next, as a process of making a plate using a photosensitive lithographic printing plate and printing, there are an exposure process, a development process, and a printing process.

(Plate making method)
The photosensitive lithographic printing plate according to the present invention is exposed to a laser beam having an emission wavelength in a wavelength range of 700 nm to 1200 nm.

  As a laser light source of a laser beam having an emission wavelength in the wavelength range of 700 nm to 1200 nm, a YAG laser, a semiconductor laser, or the like can be suitably used.

  In the case of laser exposure, it is possible to perform scanning exposure according to image data by reducing light into a beam shape, and it is easy to reduce the exposure area to a very small size, and high-resolution image formation is possible.

  Laser scanning methods include cylindrical outer surface scanning, cylindrical inner surface scanning, and planar scanning. In the cylindrical outer surface scanning, laser exposure is performed while rotating a drum around which the recording material is wound, and the rotation of the drum is the main scanning and the movement of the laser light is the sub scanning. In cylindrical inner surface scanning, a recording material is fixed to the inner surface of the drum, a laser beam is irradiated from the inside, and a main scanning is performed in the circumferential direction by rotating a part or all of the optical system. Sub scanning is performed in the axial direction by linearly moving all of them in parallel with the drum axis. In plane scanning, a laser beam main scan is performed by combining a polygon mirror, a galvanometer mirror, and an fθ lens, and a sub-scan is performed by moving a recording medium. Cylindrical outer surface scanning and cylindrical inner surface scanning are easier to increase the accuracy of the optical system and are suitable for high-density recording.

(Automatic processor)
In the method of use of the present invention, a method of developing a photosensitive lithographic printing plate material using an automatic processor is a preferable embodiment because the effects of the present invention are effective.

  The automatic developing machine is preferably provided with a mechanism for automatically replenishing a required amount of replenisher to the developing bath, and preferably provided with a mechanism for discharging a developer exceeding a certain amount, preferably the developing bath. Is provided with a mechanism for automatically replenishing the required amount of water, preferably a mechanism for detecting the plate passing, preferably a mechanism for estimating the processing area of the plate based on the detection of the plate passing And preferably a mechanism for controlling the replenishment amount and / or replenishment timing of replenisher and / or water to be replenished based on the detection of the plate and / or the estimation of the processing area. Preferably, a mechanism for controlling the temperature of the developer is provided, preferably a mechanism for detecting the pH and / or conductivity of the developer is provided, preferably the pH and / or conductivity of the developer. Mechanism for controlling the replenishment amount and / or replenishment timing of replenishment solution and / or water tries to refill the original has been granted.

  The automatic processor may have a pretreatment unit that immerses the plate in the pretreatment liquid before the development step. The pretreatment unit is preferably provided with a mechanism for spraying the pretreatment liquid onto the plate surface, and preferably provided with a mechanism for controlling the temperature of the pretreatment liquid to an arbitrary temperature of 25 ° C to 55 ° C. Preferably, a mechanism for rubbing the plate surface with a roller-like brush is provided. Moreover, water etc. are used as this pretreatment liquid.

(Post-processing)
The developed plate is subjected to post-treatment with a rinse solution containing rinse water, a surfactant or the like, a finisher mainly composed of gum arabic or starch derivatives, or a protective gum solution, and then subjected to printing.

  These post-processing are generally performed using an automatic developing machine including a developing unit and a post-processing unit.

  As the post-treatment liquid, a method of spraying from a spray nozzle or a method of immersing and conveying in a treatment tank filled with the treatment liquid is used. There is also known a method in which a small amount of washing water after development is supplied to the plate surface and washed, and the waste solution is reused as dilution water for the developer stock solution. In such automatic processing, processing can be performed while each replenisher is replenished with each replenisher according to the processing amount, operating time, and the like. In addition, a so-called disposable processing method in which treatment is performed with a substantially unused post-treatment liquid can also be applied. The lithographic printing plate obtained by such processing is loaded on an offset printing machine and used for printing a large number of sheets.

  In the case of a photosensitive lithographic printing plate material having a protective layer, a plate making method including a step of washing with pre-development washing water is a preferred embodiment.

(printing)
The photosensitive lithographic printing plate material is subjected to plate making, post-processing, and printing.

  Printing can be performed using a general lithographic printing machine.

  Prior to the exposure step, the photosensitive lithographic printing plate is placed on the photosensitive lithographic printing plate supply platform of the exposure apparatus, but the photosensitive lithographic printing plate is packaged. If so, the packaging box is opened and the photosensitive lithographic printing plate is taken out and placed.

  From the exposure device to the development device and the printing device, the printing plate is transported by an automatic transport machine, which may be consistently automated until a printed product is produced. The printing plate may be transferred to the process. Even if the operator handles the printing plate directly, even if the transport is automated, the operator checks the instruments related to the exposure device, developing device, and printing device in order to check or prepare the operating status. Alternatively, when the operation is performed, if the work space around each process is under the light emitting diode lamp of the present invention, the workability is higher than that of red or the like.

  EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated in detail, the aspect of this invention is not limited to this. In the examples, “parts” represents “parts by mass” unless otherwise specified.

Example 1
<< Polymer binder: Synthesis of acrylic copolymer 1 >>
A three-necked flask under a nitrogen stream is charged with 30 parts of methacrylic acid, 50 parts of methyl methacrylate, 20 parts of ethyl methacrylate, 500 parts of isopropyl alcohol and 3 parts of α, α'-azobisisobutyronitrile. The mixture was reacted for 6 hours in an oil bath at 0 ° C.

  Then, after refluxing at the boiling point of isopropyl alcohol for 1 hour, 3 parts of triethylammonium chloride and 25 parts of glycidyl methacrylate were added and reacted for 3 hours to obtain an acrylic copolymer 1.

  The weight average molecular weight measured using GPC was about 35,000, and the glass transition temperature (Tg) measured using DSC (differential thermal analysis) was about 85 ° C.

  [Preparation of Support] Using a JIS A1050 aluminum plate having a thickness of 0.30 mm and a width of 1030 mm, the treatment was continuously performed as follows.

(A) The aluminum plate was etched by spraying at a caustic soda concentration of 2.6 mass%, an aluminum ion concentration of 6.5 mass%, and a temperature of 70 ° C. to dissolve the aluminum plate by 0.3 g / m ² . Thereafter, washing with water was performed by spraying.

  (B) A desmut treatment was performed by spraying with a 1% by mass aqueous solution of nitric acid having a temperature of 30 ° C. (including 0.5% by mass of aluminum ions), and then washed with water by spraying.

  (C) An electrochemical surface roughening treatment was continuously performed using an alternating voltage of 60 Hz.

  The electrolytic solution contains 0.5% by mass of aluminum ions and 0.007% by mass of acetic acid. The temperature was 21 ° C. The AC power source was subjected to electrochemical surface roughening treatment using a sine wave alternating current having a time TP of 2 msec until the current value reached a peak from zero, using a carbon electrode as a counter electrode.

The current density was an effective value of 50 A / dm ² and the energization amount was 900 C / dm ² . Then, water washing by spraying was performed.

  (D) A desmut treatment was performed for 10 seconds with a phosphoric acid concentration 20 mass% aqueous solution (containing 0.5 mass% of aluminum ions) at a temperature of 60 ° C., followed by washing with water by spraying.

  (E) An anodizing apparatus of an existing two-stage feed electrolytic treatment method (first and second electrolysis unit length 6 m, first feed unit length 3 m, second feed unit length 3 m, first and second feed electrode lengths 2.4 m each ) Was used to perform anodization at a sulfuric acid concentration of 170 g / liter (containing 0.5 mass% of aluminum ions) at a temperature of 38 ° C.

  Thereafter, washing with water was performed by spraying. At this time, in the anodizing device, the current from the power source flows to the first power supply electrode provided in the first power supply unit, flows to the plate-like aluminum via the electrolytic solution, An oxide film is formed on the surface, passes through the electrolytic electrode provided in the first power feeding portion, and returns to the power source.

On the other hand, the current from the power source flows to the second power feeding electrode provided in the second power feeding portion, similarly flows to the plate-like aluminum via the electrolytic solution, and an oxide film is formed on the surface of the plate-like aluminum by the second electrolysis portion. Although the amount of electricity fed from the power source to the first feeding unit and the amount of electricity fed from the power source to the second feeding unit are the same, the feeding current density on the oxide film surface in the second feeding unit is about It was 25 A / dm ² . In the 2nd electric power feeding part, it came to feed from the oxide film surface of 1.35 g / m < ² >. The final oxide film amount was 2.7 g / m ² .

  Further, after washing with water for spraying, it was immersed in a 0.4% by mass polyvinylphosphonic acid solution (used by diluting PVPA30 manufactured by Clariant) for 30 seconds to be hydrophilized. The temperature was 85 ° C. Thereafter, it was washed with spray water and dried with an infrared heater.

  At this time, the center line average roughness (Ra) of the surface was 0.55 μm.

(Preparation of photosensitive lithographic printing plate)
On the support, a photopolymerizable image-forming layer coating solution having the following composition was applied with a wire bar so as to be 1.5 g / m ² when dried, and dried at 95 ° C. for 1.5 minutes to form a photopolymerizable image. A layer coated sample was obtained.

Further, on the photopolymerizable image forming layer coating sample, an oxygen barrier layer coating solution having the following composition was coated with a wire bar so as to be 1.8 g / m ² when dried, and dried at 75 ° C. for 1.5 minutes. A photosensitive lithographic printing plate sample having an oxygen blocking layer on the image forming layer was prepared.

  The safelight was produced under an illuminance of 30 lux using an EncapSulite R-10 filter in a fluorescent lamp manufactured by FLR40S- / M-X National.

  After preparing the sample, the work was performed under the light emission source shown in the table. The illuminance was 300 lux.

  The illuminance was a digital illuminometer T-1M (Konica Minolta Sensing).

(Image forming layer coating solution)
Ethylene double bond-containing monomer (B-1) 27.0 parts Ethylenic double bond-containing monomer (NK ester 4G: manufactured by Shin-Nakamura Chemical Co., Ltd.)
14.0 parts Dye (D-1) 3.0 parts Photopolymerization initiator (Fe-1) 4.0 parts Polyhalogen compound (BR22) 4.0 parts Acrylic copolymer 1 41.0 parts Phthalocyanine pigment ( MHI454: manufactured by Mikuni Dye Co., Ltd.) 6.0 parts 2-t-butyl-6- (3-t-butyl-2-hydroxy-5-methylbenzyl) -4-methylphenyl acrylate (Sumilyzer GS: manufactured by Sumitomo 3M) 0.5 parts Fluorosurfactant (FC-4430; manufactured by Sumitomo 3M) 0.5 parts Methyl ethyl ketone 80 parts Cyclohexanone 820 parts (oxygen barrier coating liquid)
Polyvinyl alcohol (GL-05: manufactured by Nippon Synthetic Chemical Co., Ltd.) 89 parts Polyvinylpyrrolidone (PVP K-30: manufactured by IPS Japan Co., Ltd.) 10 parts Surfactant (Surfinol 465: manufactured by Nissin Chemical Industry Co., Ltd.) 0.5 900 parts of water

<Exposure and development processing>
The obtained photosensitive lithographic printing plate sample was subjected to 2400 dpi (dpi is 1 inch, that is, 2.54 cm per 1 inch) using a Trend setter 3244VFS manufactured by Creo equipped with a water-cooled 40 W infrared semiconductor laser under the condition that the plate surface energy was 150 mJ / cm ^2. (Resolution indicated by the number of dots).

  After the exposure, the photosensitive lithographic printing plate is turned off with the power source of the heat source of the preheating part, and only passed through without preheating. CTP automatic developing machine (PHW23-V) equipped with a washing section for removing developer adhering to the plate surface, and a gum solution for protecting the image area (GW-3: two times diluted by Mitsubishi Chemical) : Developed by Technigraph) to obtain a lithographic printing plate.

(Developer D-1 composition)
A Sodium silicate 8.0 parts New Coal B-13SN (manufactured by Nippon Emulsifier Co., Ltd.) 2.0 parts Pronon # 204 (manufactured by Nippon Oil & Fats Co., Ltd.) 1.0 part Ethylenediaminetetraacetic acid disodium dihydrate 0.1 part Hydroxide Potassium pH = 12.9 addition amount <Printing>
The produced lithographic printing plate was coated with a printing machine (Mitsubishi Heavy Industries, Ltd .: DAIYA1F-1), coated paper, printing ink (Toyo Ink Co., Ltd .: Toyo King High Echo M Red), and fountain solution (Tokyo Ink Co., Ltd .: H). Liquid SG-51, density 1.5%) was used for printing, and the following characteristics were evaluated.

<Reproducibility of halftone dots>
<Evaluation of linearity>
A halftone dot image of 175 lines at 2400 dpi was drawn from 0% to 100% in 5% increments without linearity correction.

  When the exposure amount was changed and exposure was performed at an exposure amount at which the half point was 20%, the portion at which the half point should be 70% was measured, and the measured value was shown as lonality in the table.

  In the measurement, a halftone dot output image was taken with a 500 × optical microscope, the area of the image portion was calculated, and halftone dot% was used as one of the indices of halftone dot reproducibility. The closer to 70%, the better.

<Line width reproduction>
A thin line of 1 dot was drawn at the four corners and the center of a sample of 400 mm × 600 mm with an exposure amount evaluated for linearity.

  The line width at that time was measured with a 100 times loupe, and the difference between the maximum value and the minimum value was used as one of the indexes of halftone dot reproducibility as line width reproduction. The closer to zero, the better.

《Non-image area stains》
The photosensitive lithographic printing plate sample was placed in a thermostat having a temperature of 40 ° C. and a relative humidity of 20% for 48 hours, and image exposure and development were performed as described above, and the non-image area was observed with a 100 × magnifier. The number of defective development (residual layer remaining) of 20 μm or more was counted and used as an index of the anti-staining property of the non-image area after storage. Less is better.

  The results are shown in Table 1.

  From Table 1, it can be seen that a printing plate having good linearity and line width reproduction, excellent halftone dot reproduction, and excellent anti-staining properties on non-image areas after storage can be obtained by the method of use of the present invention.

Example 2
Production of the photosensitive lithographic printing plate and the developer were carried out in the following manner, and the others were carried out in the same manner as in Example 1.

<Production of support>
In the preparation of the support of Example 1, after anodizing, instead of the treatment with polyvinylphosphonic acid, hot water sealing treatment was performed with hot water at 30 ° C. for 20 seconds, and aluminum which was a support for a photosensitive lithographic printing plate A plate was made.

<< Synthesis of acid-decomposable compounds >>
1,1-dimethoxycyclohexane (0.5 mol), phenyl cellosolve (1.0 mol) and 80 mg of p-toluenesulfonic acid were reacted at 100 ° C. for 1 hour with stirring, and then the temperature was gradually raised to 150 ° C., Furthermore, it was made to react at 150 degreeC for 4 hours. Methanol produced by the reaction was distilled off during this time.

  After cooling, 500 ml of tetrahydrofuran and 2.5 g of anhydrous potassium carbonate were added, stirred and filtered. The solvent was distilled off from the filtrate under reduced pressure, and the low-boiling component was further distilled off at 150 ° C. under high vacuum to obtain the following acid-decomposable compound A as a viscous oil.

The image forming layer coating solution having the following composition is coated on the support of the aluminum plate using a rotary coater so that the film thickness after drying is 2 g / m ² , and dried at 100 ° C. for 2 minutes. A printed version was obtained.

Composition of image forming layer coating solution Binder A 60 parts Acid-decomposable compound A 20 parts Polyhalogen compound (2-trichloromethyl-5- [β- (2-benzofuryl) vinyl] -1,3,4-oxadiazole) 5 Part Infrared absorbing dye (IR17) 2 parts Propylene glycol monomethyl ether 1000 parts Developer: SDR-1 (manufactured by Konica Corporation) was diluted with water to a volume ratio of 6 times.

  The results are shown in Table 2.

  From Table 2, it can be seen that a printing plate having good linearity and line width reproduction, excellent halftone dot reproduction, and excellent anti-staining properties in non-image areas after storage can be obtained by the method of use of the present invention.

Example 3
Production of the photosensitive lithographic printing plate and the developer were carried out in the following manner, and the others were carried out in the same manner as in Example 1.

  In the preparation of the support of Example 1, after anodization, instead of the treatment with polyvinylphosphonic acid, an aluminum plate which is a support for a photosensitive lithographic printing plate treated with a 2.5% by weight aqueous solution of sodium silicate at 30 ° C. for 10 seconds Was made.

The following undercoat liquid was applied onto a support of the aluminum plate, and the coating film was dried at 80 ° C. for 15 seconds to obtain a substrate. The coating amount of the coating film after drying was 15 mg / m ² .

(Undercoat liquid)
The following compounds 0.3 parts Methanol 100 parts Water 1 part

<Production of substrate 1>
The following backcoat coating solution-1 is applied to the back surface of the support treated as described above with a bar coater so that the coating amount after drying is 30 mg / m ^2, and dried at 100 ° C. for 1 minute. Thus, a back coat layer was provided to produce a substrate 1.

(Backcoat coating solution-1)
Sol-gel reaction solution:
Tetraethyl silicate 50 parts Water 86.4 parts Methanol 10.8 parts Phosphoric acid (85%) 0.08 parts When the above components were mixed and stirred, heat was generated in about 35 minutes. After reacting with stirring for 40 minutes, the mixture was further mixed with the following diluent to prepare Backcoat Coating Solution-1.

Diluted solution:
Pyrogallol-acetone condensation resin 3.5 parts Dibutyl maleate 5.0 parts Megafac F-177 (Fluorine surfactant manufactured by Dainippon Ink & Chemicals, Inc.)
0.8 parts Methanol 800 parts Propylene glycol monomethyl ether 270 parts [Coating of image forming layer]
After applying the following lower image forming layer coating solution to the substrate 1 to a coating amount of 0.75 g / m ² , WindControl is set to 7 with PERFECT OVENPH200 manufactured by Tabai Co., and at 140 ° C. for 50 seconds. After drying, the upper image forming layer coating solution was applied to a coating amount of 0.3 g / m ² and then dried at 120 ° C. for 1 minute to obtain a photosensitive lithographic printing plate.

[Coating liquid for lower image forming layer]
N- (4-aminosulfonylphenyl) methacrylamide / acrylonitrile / methyl methacrylate (molar ratio 36/34/30, weight average molecular weight 50000) 2.133 parts 3-methoxy-4-diazophenylamine hexafluorophosphate
0.030 parts Cyanine dye A (following structure) 0.109 parts 4,4′-Bizhydroxyphenylsulfone 0.063 parts Tetrahydrophthalic anhydride 0.190 parts p-Toluenesulfonic acid 0.008 parts Ethyl violet counterion Is changed to 6-hydroxynaphthalenesulfonic acid
0.05 parts Fluorosurfactant (Megafac F176, Dainippon Ink & Chemicals, Inc.)
0.035 parts Methyl ethyl ketone 26.6 parts 1-methoxy-2-propanol 13.6 parts γ-butyrolactone 13.8 parts

[Coating solution for upper image forming layer]
m, p-cresol novolak (m / p ratio = 6/4, weight average molecular weight 4500, containing unreacted cresol 0.8% by mass) 0.237 parts cyanine dye A (the above structure) 0.047 parts dodecyl stearate 0 .060 parts 3-methoxy-4-diazodiphenylamine hexafluorophosphate
0.030 parts Fluorosurfactant (Megafac F176, manufactured by Dainippon Ink & Chemicals, Inc.)
0.110 parts Fluorosurfactant (Megafac MCF312 (30%), manufactured by Dainippon Ink & Chemicals, Inc.) 0.120 parts Methyl ethyl ketone 15.1 parts 1-methoxy-2-propanol 10.0 parts ·printing]
The photosensitive lithographic printing plate 1 according to the present invention produced as described above is 175 lines, 2400 dpi (dpi is the number of dots per 2.54 cm) with exposure energy (140 mJ / cm ² ) using a Trend setter manufactured by Creo. Draw a halftone dot image.

  Next, the lithographic printing plate subjected to imagewise exposure was developed using a developer DT-1 and a developer replenisher DT-1R manufactured by Fuji Photo Film Co., Ltd.

  The results are shown in Table 3.

  From Table 3, it can be seen that a printing plate having good linearity and line width reproduction, excellent halftone dot reproduction, and excellent anti-staining properties on non-image areas after storage can be obtained by the method of use of the present invention.

Example 4
Production of the photosensitive lithographic printing plate and the developer were carried out in the following manner, and the others were carried out in the same manner as in Example 1.

The following photosensitive solution was applied on an aluminum plate produced in the same manner as in Example 1 with a wire bar and dried at 85 ° C. for 2 minutes to obtain a photosensitive lithographic printing plate having a thickness of 20 mg / dm ² .

(Photosensitive solution)
m-cresol / p-cresol / phenol novolak resin (SK-188, manufactured by Sumitomo Durres Co., Ltd.) 0.5 part Cymel 300 (methoxymethylmelamine type, methoxylation rate of 90% or more, manufactured by Mitsui Cyanamid Co., Ltd.) 0.1 part Infrared Absorbing dye CY-10 (manufactured by Nippon Kayaku Co., Ltd.) 0.025 part 2,4,6-tris (trichloromethyl) -s-triazine 0.015 part cyclohexanone 5.7 part 2-mercaptobenzthiazole 0.024 part this A photosensitive lithographic printing plate was mounted on a rotating drum, and scanning exposure was performed with laser light (40 mW) with a semiconductor laser (Applied Techno Co., 830 nm) focused to a 25 μm beam diameter with a lens under a yellow lamp.

  Next, after heating at 100 ° C. for 3 minutes, the developer SDR-1 (manufactured by Konica, for positive type lithographic plate) was diluted 6 times and developed at 25 ° C. for 30 seconds.

  The results are shown in Table 4.

  From Table 4, it can be seen that a printing plate having good linearity and line width reproduction, excellent halftone dot reproduction, and excellent anti-staining properties on non-image areas after storage can be obtained by the method of use of the present invention.

Example 5
Production of the photosensitive lithographic printing plate and the developer were carried out in the following manner, and the others were carried out in the same manner as in Example 1.

  In the preparation of the support of Example 1, after anodization, instead of the treatment with polyvinylphosphonic acid, an aluminum plate which is a support for a photosensitive lithographic printing plate treated with a 2.5% by weight aqueous solution of sodium silicate at 30 ° C. for 10 seconds Was made.

[Formation of intermediate layer]
A liquid composition (sol solution) was prepared by the following procedure.

(Sol solution composition)
Methanol 130 parts Water 20 parts 85% by mass Phosphoric acid 16 parts Tetraethoxysilane 50 parts 3-Methacryloxypropyltrimethoxysilane 60 parts The above compounds were mixed and stirred.

  An exotherm was observed in about 5 minutes. After reacting for 60 minutes, the contents were transferred to another container, and 3000 g of methanol was added to obtain a sol solution.

This sol solution was diluted with methanol / ethylene glycol = 9/1 (mass ratio), and applied onto the support so that the amount of Si on the support was 3 mg / m ^2. And dried for 1 minute to obtain a substrate.

[Formation of image forming layer]
An image forming layer coating solution having the following composition is applied to the surface of the base plate produced as described above, dried at 115 ° C. for 1 minute to form an image forming layer of 1.4 g / m ² , and a photosensitive lithographic printing plate Got.

(Image forming layer coating solution)
Addition-polymerizable compound (pentaerythritol tetraacrylate) 1.5 parts Binder (allyl methacrylate / methacrylic acid copolymer (copolymerization molar ratio: 83/17) acid value 1.55 meq / g, polymerization average molecular weight 125,000 2.0 parts Photothermal conversion agent (DX-1) 0.1 part Polymerization initiator (S-33) 0.15 part Fluorine-based nonionic surfactant (Megafac F-177P manufactured by Dainippon Ink & Chemicals, Inc.) 0.02 part Dye with Victoria Pure Blue BOH counter anion as 1-naphthalene sulfonate anion 0.04 part Methyl ethyl ketone 10 parts Methanol 7 parts 2-Methoxy-1-propanol 10 parts

[Exposure, development]
The obtained photosensitive lithographic printing plate was exposed at a main scanning speed of 5 m / sec using a semiconductor laser having an output of 500 mW, a wavelength of 830 nm, and a beam diameter of 17 μm (l / e2), and then a D-1 developer having the following composition: It developed using the automatic processor (Fuji Photo Film Co., Ltd. product: PS processor 900VR) charged with the rinse liquid FR-3 (1: 7).

(D-1 developer)
Potassium hydroxide 3 parts Sodium hydrogen carbonate 1 part Potassium carbonate 2 parts Sodium sulfite 1 part Polyethylene glycol mononaphthyl ether 150 parts Dibutyl naphthalene sulfonate sodium salt 50 parts Ethylenediaminetetraacetic acid tetrasodium salt 8 parts Water 785 parts The results are shown in Table 5. .

  Regarding the work efficiency after producing the photosensitive lithographic printing plate of Examples 1 to 5, the plate inspection work should be performed in a shorter time than the conventional fluorescent white light. The other work was almost the same as that under the fluorescent white light.

  From Table 5, it can be seen that a printing plate having good linearity and line width reproduction, excellent halftone dot reproduction, and excellent anti-staining properties on non-image areas after storage can be obtained by the method of use of the present invention.

Example 6
The preparation of the photosensitive lithographic printing plate and the subsequent plate making operations were performed in the same manner as in Example 1 under the light emission source shown in Table 6, and the illuminance was 100 lux.
.

  The results are shown in Table 6. As for the preparation work of the photosensitive lithographic printing plate and the subsequent plate-making work efficiency, the plate inspection work can be performed in a shorter time than the conventional fluorescent white light, and other work can be performed. It was almost the same as the case under fluorescent white light.

  From Table 6, it can be seen that a printing plate having excellent linearity and line width reproduction, excellent halftone dot reproduction, and excellent anti-staining properties in non-image areas after storage can be obtained by the method of use of the present invention.

Example 7
The photosensitive lithographic printing plate was produced in the same manner as in Example 2 under the light emission source shown in Table 7, and the illuminance was 100 lux. After the exposure, an EncapSulite R-10 filter was used in a fluorescent lamp manufactured by Safelight FLR40S- / M-X National, and the work was performed under an illuminance of 100 lux.

  The results are shown in Table 7. Regarding the work efficiency in the production of photosensitive lithographic printing plates, the plate inspection work is easier and quicker than in the case of conventional fluorescent white light, and other photosensitive lithographic printing plates are produced. The working efficiency was almost the same as that under fluorescent white light.

  From Table 7, it can be seen that by the production method of the present invention, a printing plate having excellent linearity and line width reproduction, excellent halftone dot reproduction, and excellent anti-staining properties in non-image areas after storage can be obtained.

Claims (5)

On the support, (A) a color material having absorption in the wavelength range of 700 nm to 1200 nm and (B) an image forming layer containing a radical generator, and a laser beam having an emission wavelength in the wavelength range of 700 nm to 1200 nm A method for producing a photosensitive lithographic printing plate to be exposed, comprising at least a coating step, a drying step, a cutting step, and an inspection / sorting step, and the coating step, the drying step, the cutting step, and the inspection / sorting step. (A) a light emitting diode having a light emitting diode having an emission wavelength maximum of 450 nm to 490 nm, a light emitting diode having an emission wavelength maximum of 520 nm to 560 nm, and a light emitting diode having an emission wavelength maximum of 630 nm to 720 nm (B) a light emitting diode having an emission wavelength maximum of 450 nm to 490 nm and an emission wavelength maximum of 560 nm to 630 nm It is performed under a light source lamp having a certain light emitting diode, or (c) a light source diode having a light emitting diode having an emission wavelength maximum of 490 nm to 520 nm and a light emission diode having an emission wavelength maximum of 630 nm to 720 nm. A method for producing a sex lithographic printing plate. The method for producing a photosensitive lithographic printing plate according to claim 1, wherein the radical generator (B) is a polyhalogen compound. On the support, (A) a color material having absorption in the wavelength range of 700 nm to 1200 nm and (B) an image forming layer containing a radical generator, and a laser beam having an emission wavelength in the wavelength range of 700 nm to 1200 nm A method for using a photosensitive lithographic printing plate to be exposed, comprising at least an exposure step, a development step, and a printing step, wherein any one of the exposure step, the development step, and the printing step comprises: A light source having a light emitting diode having a wavelength maximum of 450 nm to 490 nm, a light emitting diode having a light emission wavelength maximum of 520 nm to 560 nm, and a light emitting diode having a light emission wavelength maximum of 630 nm to 720 nm, and (b) a light emission wavelength maximum of 450 nm to 490 nm. And a light source lamp having a light emitting diode having a light emission wavelength maximum at 560 nm to 630 nm Or (c) an emission wavelength maximum is in 490nm~520nm emitting diodes and methods of use of the photosensitive lithographic printing plate emission wavelength maximum is characterized by being performed in the light source lamp having a light-emitting diode in 630Nm～720nm. 4. The method of using a photosensitive lithographic printing plate according to claim 3, wherein the radical generator (B) is a polyhalogen compound. A photosensitive lithographic printing plate produced by the method for producing a photosensitive lithographic printing plate according to claim 1 or 2 is used according to the method for using the photosensitive lithographic printing plate according to claim 3 or 4. How to use photosensitive lithographic printing plates.