JP2006052449A - Cold spray coating film formation method - Google Patents

Cold spray coating film formation method Download PDF

Info

Publication number
JP2006052449A
JP2006052449A JP2004235735A JP2004235735A JP2006052449A JP 2006052449 A JP2006052449 A JP 2006052449A JP 2004235735 A JP2004235735 A JP 2004235735A JP 2004235735 A JP2004235735 A JP 2004235735A JP 2006052449 A JP2006052449 A JP 2006052449A
Authority
JP
Japan
Prior art keywords
powder
film
forming
peening
cold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004235735A
Other languages
Japanese (ja)
Inventor
Yasushi Kurisu
泰 栗栖
Kazuhiko Sakaki
和彦 榊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinshu University NUC
Nippon Steel Corp
Original Assignee
Shinshu University NUC
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinshu University NUC, Nippon Steel Corp filed Critical Shinshu University NUC
Priority to JP2004235735A priority Critical patent/JP2006052449A/en
Publication of JP2006052449A publication Critical patent/JP2006052449A/en
Withdrawn legal-status Critical Current

Links

Images

Landscapes

  • Coating By Spraying Or Casting (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a cold spray coating film formation method which can produce a coating film having a high hardness, a high density, and uniform properties throughout the entire coating film. <P>SOLUTION: This cold spray coating film formation method comprises generating a supersonic stream of a gas having a temperature lower than the melting or softening temperature of a spray material, throwing the spray material into the supersonic stream, and colliding the spray material in a solid phase against a substrate at a high speed to form the coating film, wherein a raw material powder for forming the coating film is prepared by mixing a coating film forming powder having a particle diameter of 5 to 50 μm with a peening powder having a particle diameter of 100 to 1,000 μm. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、溶射材料の融点または軟化温度よりも低い温度のガスを超音速流にして、前記超音速流に前記溶射材料を投入し、固相状態のまま基材に高速で衝突させて皮膜を形成するコールドスプレー皮膜の形成方法に関する。   In the present invention, a gas having a temperature lower than the melting point or softening temperature of the thermal spray material is converted into a supersonic flow, the thermal spray material is introduced into the supersonic flow, and the coating is applied to the substrate at a high speed in a solid state. The present invention relates to a method for forming a cold spray film.

一般に、製鉄プロセスの鋳型やロールは、長寿命化を図るために、その表面に耐食性および耐摩耗性に優れた皮膜を形成する技術が知られており、この皮膜形成方法としては、Ni系の金属をめっきしたり、溶射する手段が用いられている。しかし、めっきによる皮膜は、耐摩耗性に優れたサーメット材料を大面積に施工できない、硬度をHV300以上に高くするとクラックが発生し易くなる、という不都合がある。一方、溶射による皮膜は、溶射中に酸化するため、緻密質の金属、合金、サーメットの皮膜の形成が困難であり、導電性、熱伝導率が低いという問題点がある。   Generally, a technique for forming a film having excellent corrosion resistance and wear resistance on the surface of a casting mold or roll in an iron making process is known in order to extend the life. Means for plating or spraying metal are used. However, the film formed by plating has a disadvantage that a cermet material excellent in wear resistance cannot be applied over a large area, and cracks are likely to occur when the hardness is increased to HV300 or higher. On the other hand, since a coating by thermal spraying is oxidized during thermal spraying, it is difficult to form a dense metal, alloy, or cermet coating, and there is a problem that conductivity and thermal conductivity are low.

近年、上述した皮膜形成方法の問題点を解消するための新しい溶射プロセスとして「コールドスプレー」が注目されている。このコールドスプレーとは、非特許文献1および非特許文献2に説明されているように、材料粉末の融点又は軟化温度よりも低い温度のガスを超音速流にして、前記超音速流のガス中に前記材料の粒子を投入し、固相状態のまま基材に衝突させて皮膜を形成する技術である。ここで、材料粉末は、金属、合金、金属間化合物、セラミックスなどであり、作動ガスの温度の上限を融点以下または軟化温度以下とするものである。なお、材料粉末の軟化温度とは、材料粉末の強度又は硬さが室温での強度又は硬さの半分となる温度と定義する。
コールドスプレーは、非特許文献1、2に記載されているように、図2に示した構成により、材料粉末を超音速で基材の表面に固体状態で衝突させて皮膜を成膜する技術である。即ち、ガス源(空気、窒素、ヘリウムなど)から供給される高圧の作動ガスは2つの経路に分岐され、一方の作動ガスはガス加熱器を経て室温以上、材料粉末の融点又は軟化温度よりも低い温度に加熱された後、コールドスプレー装置の作動ガス供給孔に供給される。また、他方の作動ガスは粉末供給装置へ送給され、キャリアガスとして材料粉末と共に、コールドスプレー装置の粉末供給孔に供給される。この作動ガス供給孔、粉末供給孔からコールドスプレー用ノズルの入口部に供給された作動ガスおよび材料粉末は、先細部、のど部を経て超音速流となり、末広部の先端のノズル出口から噴出される。
このコールドスプレーでは、従来のプラズマ溶射法、フレーム溶射法、高速フレーム溶射法などに比べ、材料粒子を加熱・加速する作動ガスの温度が著しく低く、原料粉末をあまり加熱せずに固相状態のまま基材へ高速(300〜1000m/sの速度範囲)で衝突させ、そのエネルギーにより基材と粒子に塑性変形を生じさせて成膜させている。これによって得た皮膜は、緻密で密度、熱伝導率・導電性が高く、酸化や熱変質も少なく、密着性も良好であるという優れた性質を有する。
榊、「新しい溶射プロセス コールドスプレー(Cold Spray)」、 溶射技術、第20巻、第2号、産報出版株式会社、 2000年8月30日発行、p32〜41 榊、「コールドスプレーテクノロジー」、溶射技術、第21巻、第3号 産報出版株式会社、2002年2月5日発行、p29〜38
In recent years, “cold spray” has attracted attention as a new thermal spraying process for solving the above-described problems of the film forming method. As described in Non-Patent Document 1 and Non-Patent Document 2, this cold spray is a supersonic flow of a gas having a temperature lower than the melting point or softening temperature of the material powder, Is a technique in which particles of the above material are introduced into the substrate and collided with the base material in the solid state to form a film. Here, the material powder is a metal, an alloy, an intermetallic compound, ceramics, or the like, and the upper limit of the temperature of the working gas is the melting point or lower or the softening temperature or lower. The softening temperature of the material powder is defined as a temperature at which the strength or hardness of the material powder is half of the strength or hardness at room temperature.
As described in Non-Patent Documents 1 and 2, cold spray is a technique for forming a film by colliding a material powder against the surface of a substrate at a supersonic speed in a solid state with the configuration shown in FIG. is there. That is, a high-pressure working gas supplied from a gas source (air, nitrogen, helium, etc.) is branched into two paths, and one working gas passes through a gas heater and is at room temperature or higher than the melting point or softening temperature of the material powder. After being heated to a low temperature, it is supplied to the working gas supply hole of the cold spray device. The other working gas is supplied to the powder supply device, and is supplied to the powder supply hole of the cold spray device together with the material powder as a carrier gas. The working gas and material powder supplied to the inlet of the cold spray nozzle from this working gas supply hole and powder supply hole become supersonic flow through the tip and throat, and are ejected from the nozzle outlet at the tip of the divergent part. The
In this cold spray, the temperature of the working gas that heats and accelerates the material particles is significantly lower than the conventional plasma spraying method, flame spraying method, high-speed flame spraying method, etc. The substrate is allowed to collide with the substrate at a high speed (speed range of 300 to 1000 m / s), and the film is formed by causing plastic deformation of the substrate and particles by the energy. The film thus obtained has excellent properties of being dense and having high density, high thermal conductivity and electrical conductivity, little oxidation and thermal alteration, and good adhesion.
Tsuji, “New Spray Process Cold Spray”, Thermal Spray Technology, Vol. 20, No. 2, Sangyo Publishing Co., Ltd., August 30, 2000, p32-41 Tsuji, "Cold Spray Technology", Thermal Spray Technology, Vol. 21, No. 3, Sangyo Publishing Co., Ltd., February 5, 2002, p29-38

前記コールドスプレーによる皮膜形成方法は、成膜操業面および得られた皮膜性能面で満足すべきものであるが、製品皮膜としてより一層の耐摩耗性、高熱伝導率、導電性が要求されるものがある。例えば、製鉄プロセスの連続鋳造用鋳型やコンダクターロール等である。
本発明は、このような要求に応えるためになされたもので、高硬度かつ高緻密であるため耐摩耗性、熱伝導率、導電性に優れる皮膜を得ることができ、しかも皮膜の全厚にわたって均一な性状のものを得ることができるコールドスプレー皮膜の形成方法を提供することを目的とする。
The film formation method by cold spray is satisfactory in terms of film forming operation and the obtained film performance, but the product film is required to have higher wear resistance, higher thermal conductivity, and conductivity. is there. For example, a continuous casting mold or a conductor roll in an iron making process.
The present invention has been made to meet such demands, and since it has high hardness and high density, it is possible to obtain a film having excellent wear resistance, thermal conductivity, and conductivity, and over the entire thickness of the film. It is an object of the present invention to provide a method for forming a cold spray film capable of obtaining a uniform property.

上記課題を解決するための本発明の要旨は次の通りである。
(1) 溶射材料の融点または軟化温度よりも低い温度のガスを超音速流にして、前記超音速流に前記溶射材料を投入し、固相状態のまま基材に高速で衝突させて皮膜を形成するコールドスプレー皮膜の形成方法において、粒径5〜50μmの皮膜原料粉末と粒径100〜1000μmのピーニング粉末を混合した原料粉末を用いて皮膜を形成することを特徴とするコールドスプレー皮膜の形成方法。
(2) 溶射材料の融点または軟化温度よりも低い温度のガスを超音速流にして、前記超音速流に前記溶射材料を投入し、固相状態のまま基材に高速で衝突させて皮膜を形成するコールドスプレー皮膜の形成方法において、ノズルのど部前方のガス・粉末供給部および/またはのど部の後方の末広部または末広部に続く平行部に複数設けた粉末供給孔から粒径5〜50μmの皮膜原料粉末と粒径100〜1000μmのピーニング粉末を別々の粉末供給孔から供給し、皮膜を形成することを特徴とするコールドスプレー皮膜の形成方法。
(3) ノズルのど部前方のチャンバー部またはのど部の後方の末広部または末広部に続く平行部に設けた粉末供給孔から粒径5〜50μmの皮膜原料粉末を供給し、ノズル噴出孔周辺のスリット部に設けた粉末供給孔から粒径100〜1000μmのピーニング粉末を別々に供給し、皮膜を形成することを特徴とする(2)に記載のコールドスプレー皮膜の形成方法。
(4) 溶射材料の融点または軟化温度よりも低い温度のガスを超音速流にして、前記超音速流に前記溶射材料を投入し、固相状態のまま基材に高速で衝突させて皮膜を形成するコールドスプレー皮膜の形成方法において、原料成膜用ノズルとショットピーニング用のノズルを個々に有することを特徴とする(2)または(3)に記載のコールドスプレー皮膜の形成方法。
(5) ピーニング粉末のビッカース硬度が皮膜原料粉末のビッカース硬度よりも、400HV以上大きいことを特徴とする(1)〜(4)のいずれか1項に記載のコールドスプレー皮膜の形成方法。
(6) ピーニング粒が高硬度のFe基合金又はWCであることを特徴とする(1)〜(5)のいずれか1項記載のコールドスプレー皮膜の形成方法。
The gist of the present invention for solving the above problems is as follows.
(1) A gas having a temperature lower than the melting point or softening temperature of the thermal spray material is made into a supersonic flow, the thermal spray material is introduced into the supersonic flow, and the coating is made by colliding with the substrate at a high speed in the solid state. In the method of forming a cold spray film to be formed, a film is formed using a raw material powder obtained by mixing a raw material powder having a particle size of 5 to 50 μm and a peening powder having a particle size of 100 to 1000 μm. Method.
(2) A gas having a temperature lower than the melting point or softening temperature of the thermal spray material is changed to a supersonic flow, the thermal spray material is introduced into the supersonic flow, and the coating is applied to the substrate at a high speed in a solid state. In the forming method of the cold spray film to be formed, a gas / powder supply part in front of the nozzle throat part and / or a divergent part behind the throat part or a plurality of powder supply holes provided in a parallel part following the divergent part, a particle diameter of 5 to 50 μm A method for forming a cold spray film, comprising: forming a film by supplying the film raw material powder and a peening powder having a particle size of 100 to 1000 μm from separate powder supply holes.
(3) A coating raw material powder having a particle size of 5 to 50 μm is supplied from a powder supply hole provided in a chamber part in front of the nozzle throat part or in a divergent part behind the throat part or in a parallel part following the divergent part, and around the nozzle ejection hole. The method for forming a cold spray coating according to (2), wherein a coating is formed by separately supplying peening powder having a particle diameter of 100 to 1000 μm from a powder supply hole provided in the slit portion.
(4) A gas having a temperature lower than the melting point or softening temperature of the thermal spray material is made into a supersonic flow, the thermal spray material is introduced into the supersonic flow, and the coating is made by colliding with the substrate at a high speed in a solid state. The method for forming a cold spray film according to (2) or (3), wherein the method for forming a cold spray film includes a nozzle for forming a raw material and a nozzle for shot peening, respectively.
(5) The method for forming a cold spray coating according to any one of (1) to (4), wherein the Vickers hardness of the peening powder is 400 HV or more higher than the Vickers hardness of the coating material powder.
(6) The method for forming a cold spray film according to any one of (1) to (5), wherein the peening grains are a high hardness Fe-based alloy or WC.

本発明の方法によれば、スプレーとほぼ同時に成膜された皮膜にピーニング効果が付与され、しかも皮膜全厚にわたってこの効果が継続することから、極めて緻密なかつ高硬度の均一な性状の皮膜を効率よく得ることができる。   According to the method of the present invention, since a peening effect is imparted to the film formed almost simultaneously with the spray, and this effect continues throughout the film thickness, an extremely dense and highly uniform film having a uniform property is efficiently produced. Can get well.

以下、本発明の好ましい実施形態について説明する。
まず、本発明においてはコールドスプレーにて皮膜を形成する際に、溶射粉末として、粒径5〜50μmの皮膜原料粉末と粒径100〜1000μmのピーニング粉末(粒径によっては粒子形態となるが、これを含めて粉末と称する)を混合した粉末を用いる。皮膜原料粉末は、溶射後の皮膜を構成する成分の粉末であり、Cu、Al、Cr、Ni、Mo、Fe、Nb、などの金属、およびこれらの合金の何れかを選択すればよい。該皮膜原料粉末は、粒径5〜50μmのものが最適であるが、これは通常のコールドスプレーにおいて使用する原料粉末の粒径範囲と変わることはないし、この粒径のものであれば、通常のスプレー条件のもとで基材上に所望の皮膜を形成し得る。
Hereinafter, preferred embodiments of the present invention will be described.
First, in the present invention, when forming a film by cold spray, as a thermal spray powder, a film raw material powder with a particle size of 5 to 50 μm and a peening powder with a particle size of 100 to 1000 μm (depending on the particle size, it becomes a particle form, A powder mixed with this is referred to as a powder). The film raw material powder is a powder of components constituting the film after thermal spraying, and any one of metals such as Cu, Al, Cr, Ni, Mo, Fe, Nb, and alloys thereof may be selected. The coating raw material powder is optimally one having a particle size of 5 to 50 μm, but this does not change from the particle size range of the raw material powder used in ordinary cold spray. The desired film can be formed on the substrate under the spraying conditions.

また、ピーニング粉末は、前記皮膜原料粉末と混合または別々に噴射されるが、皮膜原料粉末は基材に衝突して少なくともその一部が基材上に残って皮膜を形成するのに対し、該ピーニング粉末の方は、粒径の関係から飛行速度が遅いため皮膜原料粉末より僅かに遅れて基材に衝突し、既に形成されている皮膜に当って付着することなく落下するものである。このためピーニング粉末としては、通常のショットピーニングに用いられるピーニング粉末である、高硬度のFe基合金(例えば、1C−1.5Cr−Feなど)やWC粒子が好ましい。該ピーニング粉末の粒径は、前記皮膜原料粉末の粒径より大きくすることが必要で、その粒径範囲は100〜1000μmである。このような粒径および成分の粒子とすることで、皮膜が緻密化でき、密度・硬度が上昇するピーニング効果を発揮するものである。ピーニング粉末の粒径が100μmよりも小さいと皮膜内にピーニング粉末が残存してしまい、1000μmよりも大きい粉末は粒径が大きすぎて成膜用ノズルから供給することが難しい。
更に、ピーニング粉末と皮膜原料粉末との混合割合は、皮膜原料粉末の量を多めにすることが必要であるが、大体ピーニング粉末の混合割合を5容積%〜20容積%の範囲内とすることが望ましい。
In addition, the peening powder is mixed with the film raw material powder or sprayed separately, but the film raw material powder collides with the base material and at least part of it remains on the base material to form a film. The peening powder has a slow flight speed due to the particle size relationship, so it collides with the base material slightly later than the coating raw material powder and falls without adhering to the coating already formed. Therefore, as the peening powder, a high-hardness Fe-based alloy (for example, 1C-1.5Cr-Fe or the like) or WC particles, which is a peening powder used in normal shot peening, is preferable. The particle size of the peening powder needs to be larger than the particle size of the film raw material powder, and the particle size range is 100 to 1000 μm. By using particles having such particle diameters and components, the coating can be densified, and a peening effect that increases density and hardness is exhibited. If the particle size of the peening powder is smaller than 100 μm, the peening powder remains in the coating, and the powder larger than 1000 μm has a too large particle size and is difficult to supply from the film forming nozzle.
Furthermore, the mixing ratio of the peening powder and the coating raw material powder needs to be a larger amount of the coating raw material powder, but the mixing ratio of the peening powder is generally within the range of 5 vol% to 20 vol%. Is desirable.

なお、ピーニング粉末の硬度は皮膜原料粉末の硬度より大きくすることが必要であるが、両者の硬度差は、ビッカース硬度でピーニング粉末が皮膜原料粉末よりも、400HV以上大きいことが、良好なピーニング効果を発揮する上で望ましい。400HV未満の硬度差であると、ピーニング粉末の硬度が低すぎて、皮膜に衝突してもピーニング作用が発揮されないおそれがある。また、この硬度差は最大3000HVを超えないことが好ましい。本発明では、皮膜原料粉末が硬度の低い多少軟質の材料であっても、ピーニング粉末の混合で充分な硬度をもつ皮膜とすることができ、従前では実用性が低いとされていた程度の低い硬度の皮膜材料粉末であっても皮膜として形成し得る。   The hardness of the peening powder needs to be greater than the hardness of the film raw material powder, but the difference in hardness between the two is that the peening powder has a Vickers hardness of 400 HV or more larger than the film raw material powder. It is desirable to demonstrate If the hardness difference is less than 400 HV, the hardness of the peening powder is too low and the peening effect may not be exhibited even if it collides with the coating. Moreover, it is preferable that this hardness difference does not exceed 3000 HV at the maximum. In the present invention, even if the coating raw material powder is a soft material having a low hardness, it can be made into a coating having a sufficient hardness by mixing the peening powder, and it is as low as previously impractical. Even a coating material powder having a hardness can be formed as a coating.

上記の混合粉末を実際に基材に対し噴射してその表面に皮膜を形成する場合には、適宜のコールドスプレー装置のガンを使用することになるが、この設備として従前の図2に示すコールドスプレー装置のガンを用いてもよい。図2の装置においては、粉末供給装置の位置で皮膜原料粉末とピーニング粉末が混合され、これがキャリアガスである作動ガスによって粉末供給孔からスプレー装置に送られ、ノズルに供給された所定圧力の作動ガスによって、先細部およびのど部を経て超音速流となり、末広部の先端のノズル出口から基材上に噴射される。   When the above mixed powder is actually sprayed onto the substrate to form a film on the surface, an appropriate cold spray device gun is used. As this equipment, the cold shown in FIG. A spray gun may be used. In the apparatus of FIG. 2, the raw material powder and the peening powder are mixed at the position of the powder supply device, and this is sent to the spray device from the powder supply hole by the working gas which is a carrier gas, and is operated at a predetermined pressure supplied to the nozzle. The gas causes supersonic flow through the taper and throat, and is jetted onto the substrate from the nozzle outlet at the tip of the divergent section.

本発明を既存のコールドスプレー装置を用いて実施する場合に限ることなく、より本発明を実施する上で好適なコールドスプレー装置のガンの一例を図1に示す。
図示するように、コールドスプレー用ノズルの噴射部は、基本的には、先細部1、のど部3、末広部2および平行部19から構成される。末広部2の出口側(噴射方向)の肉厚の平行部には、2個の粉末供給孔4が噴射軸を挟んで対向して設けられている。更に、平行部は、粉末供給孔4よりも出口側に噴射ノズル部分5を取り付けた構造であり、長尺のパイプから形成された噴射ノズル部分5は、交換可能に平行部の肉厚部にナット20を介して、気密性を保ち、取付けられている。
また、コールドスプレー用ノズルの先細部1とガス・粉末供給部7は、ガス流れを整えるハニカム形状の整流子21、ガスケット6を介して、ナット8にて固定される。ガス・粉末供給部7には作動ガス供給孔9、粉末供給孔10、温度測定孔11および圧力測定孔12が設けられており、それぞれ適宜なガス供給源、粉末供給源、測温機構および圧力測定機構に接続している。なお、本発明において、ガス流れを整えるためのハニカム形状の整流子21を設けることが好ましいが、必須ではなく、また、ハニカム形状に限定されるものでもない。
また、整流子21を詰まらせないように、図2のようにパイプを挿入して、皮膜原料および/またはピーニング粉末が作動ガスと混合される位置を先細部1まで持ってきても良い。
FIG. 1 shows an example of a gun of a cold spray device that is more suitable for carrying out the present invention, without being limited to the case where the present invention is implemented using an existing cold spray device.
As shown in the figure, the spray section of the cold spray nozzle basically includes a tapered portion 1, a throat section 3, a divergent section 2, and a parallel section 19. Two powder supply holes 4 are provided opposite to each other across the injection shaft in the thick parallel portion on the outlet side (injection direction) of the divergent portion 2. Further, the parallel part has a structure in which an injection nozzle part 5 is attached to the outlet side of the powder supply hole 4, and the injection nozzle part 5 formed of a long pipe can be replaced with a thick part of the parallel part. The nut 20 is attached so as to maintain airtightness.
Further, the tip 1 of the cold spray nozzle and the gas / powder supply unit 7 are fixed by a nut 8 via a honeycomb-shaped commutator 21 and a gasket 6 for adjusting the gas flow. The gas / powder supply unit 7 is provided with a working gas supply hole 9, a powder supply hole 10, a temperature measurement hole 11 and a pressure measurement hole 12, and an appropriate gas supply source, powder supply source, temperature measurement mechanism and pressure, respectively. Connected to the measurement mechanism. In the present invention, it is preferable to provide a honeycomb-shaped commutator 21 for adjusting the gas flow, but it is not essential and is not limited to the honeycomb shape.
Further, in order not to clog the commutator 21, a pipe may be inserted as shown in FIG. 2 to bring the position where the coating material and / or peening powder is mixed with the working gas to the first detail.

図1の装置を使用して本発明の皮膜形成方法を実施する場合には、まず、作動ガス供給孔9から作動ガスが、粉末供給孔4または10からはピーニング粉末および所望の皮膜原料粉末が供給される。作動ガスの温度および圧力は、温度測定孔11および圧力測定孔12を通して測定されており、それらが設定範囲、具体的には0〜700℃、1〜6MPaの範囲に収まるように制御されている。   When the film forming method of the present invention is carried out using the apparatus of FIG. 1, first, the working gas is supplied from the working gas supply hole 9, and the peening powder and the desired film raw material powder are supplied from the powder supply hole 4 or 10. Supplied. The temperature and pressure of the working gas are measured through the temperature measurement hole 11 and the pressure measurement hole 12, and are controlled so that they are within a set range, specifically, a range of 0 to 700 ° C. and 1 to 6 MPa. .

作動ガスは、先細部1の出口側で速度を増し、のど部3で音速に達し、更に末広部2で膨張して圧力が大気圧程度まで下がり、加速して超音速となるが、作動ガスが末広部2で膨張し、圧力が低下するため、粉末供給口4の位置で負圧となる。したがって、この粉末供給口4からは0.2MPa程度の低い圧力で供給ガスとともにピーニング粉末および皮膜原料粉末を供給できる。ピーニング粉末は、皮膜原料粉末と混合された後、噴射ノズル部分5で作動ガスにより加速・加熱されて超音速流となって出口から噴出し、基材上に衝突して皮膜を緻密化する。成膜中においては、先に基材に衝突した皮膜原料粉末が皮膜を作り、僅かに遅れて到達するピーニング粉末がこの皮膜上に衝突して該皮膜をピーニングし、その硬度を高め皮膜を緻密にする。所定の厚みまで複数回の混合粉末の噴射により上記のピーニングが繰り返される結果、皮膜はその厚み全長にわたって均一な硬度の緻密な性状となる。   The working gas increases in speed at the outlet side of the taper 1, reaches the speed of sound at the throat 3 and further expands at the divergent part 2 to decrease the pressure to about atmospheric pressure, and accelerates to supersonic speed. Expands at the divergent portion 2 and the pressure decreases, so that a negative pressure occurs at the position of the powder supply port 4. Therefore, the peening powder and the coating material powder can be supplied from the powder supply port 4 together with the supply gas at a pressure as low as about 0.2 MPa. The peening powder is mixed with the film raw material powder, and then accelerated and heated by the working gas in the spray nozzle portion 5 to become a supersonic flow and ejected from the outlet, and collides with the base material to densify the film. During film formation, the film raw material powder that collided with the base material first forms a film, and the peening powder that arrives with a slight delay collides with this film to peen the film, increasing its hardness and densifying the film. To. As a result of repeating the above peening by spraying the mixed powder a plurality of times to a predetermined thickness, the coating has a dense property with uniform hardness over the entire thickness.

図1のコールドスプレー設備においては、コールドスプレー用ノズルの末広部よりも出口側の平行部に2個の粉末供給口4を設けているが、該粉末供給口4は1個でも良く、場合によっては3個以上でも良い。また、複数の供給口4を設ける場合には、その全てからピーニング粉末を供給せずに、少なくとも1個の供給口からピーニング粉末を供給し、他の少なくとも1個の供給口から皮膜原料粉末を供給するという使い方も可能である。
また、ピーニング粉末は図4に示すように、(a)ノズル噴出孔周辺のスリット部22に設けた粉末供給孔4もしくは9、または、(b)別に設けた近接したノズルから供給しても良い。この場合、ピーニング粉末速度は低くても良いため0.2MPa程度の低い圧力の供給ガスでよい。
前記のように1つのノズルから皮膜原料粉末とピーニング粉末を供給する場合には装置の設置が簡単であり、成膜条件の設定も容易であるメリットがある。一方で、成膜用とピーニング用に別々のノズルを設ける場合には、皮膜内部へピーニング粉末が混入する可能性が低くなるメリットが得られる。
上記のコールドスプレー用ノズルを用いて、形成した皮膜の空隙率は2%以下、金属酸化物は0.001〜1%とすることができる。皮膜の空隙率、酸化物量をこのような低い範囲に特定することによって、緻密で酸化が少なく、導電率が原料粉末の90%以上であるという、優れた特性を有する皮膜を得ることができる。
In the cold spray equipment shown in FIG. 1, two powder supply ports 4 are provided in the parallel portion on the outlet side of the divergent portion of the cold spray nozzle. However, the number of the powder supply ports 4 may be one, depending on circumstances. May be 3 or more. When providing a plurality of supply ports 4, peening powder is supplied from at least one supply port without supplying peening powder from all of the supply ports 4, and film raw material powder is supplied from at least one other supply port. It is possible to use it by supplying.
Further, as shown in FIG. 4, the peening powder may be supplied from (a) the powder supply hole 4 or 9 provided in the slit portion 22 around the nozzle ejection hole, or (b) from the adjacent nozzle provided separately. . In this case, since the peening powder speed may be low, a supply gas having a low pressure of about 0.2 MPa may be used.
As described above, when the film raw material powder and the peening powder are supplied from one nozzle, there is an advantage that the installation of the apparatus is simple and the film forming conditions can be easily set. On the other hand, when separate nozzles are provided for film formation and peening, there is a merit that the possibility of peening powder mixing into the film is reduced.
Using the above cold spray nozzle, the formed film can have a porosity of 2% or less and a metal oxide of 0.001 to 1%. By specifying the porosity and oxide amount of the film within such a low range, it is possible to obtain a film having excellent characteristics such as being dense and less oxidized and having a conductivity of 90% or more of the raw material powder.

本発明による皮膜緻密化過程を図3を用いて説明する。
皮膜原料粉末とピーニング粉末は同時に噴射される。(a)皮膜原料粉末は軟質であるため基材に衝突した際に塑性変形して少なくともその一部が基材上に残って皮膜を形成する。(b)ピーニング粉末は、粒径の関係から飛行速度が遅いこと、また硬質であるため塑性変形しない。このため基材に衝突した際も、既に形成されている皮膜に当って皮膜を緻密化するが、付着することなく落下する。(c)この過程が成膜中に繰り返されて緻密皮膜を形成することができる。
The film densification process according to the present invention will be described with reference to FIG.
The film raw material powder and the peening powder are jetted simultaneously. (A) Since the coating raw material powder is soft, when it collides with the substrate, it is plastically deformed and at least part of it remains on the substrate to form a coating. (B) The peening powder does not plastically deform because of its slow flight speed due to the particle size and because it is hard. For this reason, even when it collides with the base material, it hits the already formed film and densifies the film, but falls without adhering. (C) This process can be repeated during film formation to form a dense film.

図1に示すコールドスプレー用ノズルのガンを使用して、作動ガス供給孔9から温度400℃、圧力4MPaの窒素ガスを、粉末供給孔10からは表1に示す組成、粒径および硬度の粉末を供給すると共に、粉末供給孔4からは表1に示す組成、粒径および硬度のピーニング粒を室温、圧力0.2MPaの窒素ガスと共に供給し、基材上に成膜させた。比較例として、ピーニング粉末を含まない皮膜原料粉末を供給孔4から供給し上記の条件で噴射し成膜したものを示す。
表1の評価項目に示す如く、比較例の皮膜に比べ、本発明の皮膜が高硬度化されかつ高い緻密性を有していることがわかる。
Using a gun for a cold spray nozzle shown in FIG. 1, nitrogen gas at a temperature of 400 ° C. and a pressure of 4 MPa is supplied from the working gas supply hole 9, and a powder having the composition, particle size and hardness shown in Table 1 from the powder supply hole 10. From the powder supply hole 4, peening grains having the composition, particle diameter and hardness shown in Table 1 were supplied together with nitrogen gas at room temperature and pressure of 0.2 MPa to form a film on the substrate. As a comparative example, a film raw material powder not containing peening powder is supplied from the supply hole 4 and sprayed under the above conditions to form a film.
As shown in the evaluation items of Table 1, it can be seen that the film of the present invention has higher hardness and higher density than the film of the comparative example.

Figure 2006052449
Figure 2006052449

本発明方法を実施するに好適なコールドスプレー装置のガンの一例を示すもので、(a)は平面図、(b)は断面図である。An example of the gun of the cold spray apparatus suitable for implementing this invention method is shown, (a) is a top view, (b) is sectional drawing. 従来のコールドスプレー設備の概要図である。It is a schematic diagram of the conventional cold spray equipment. 本発明方法による皮膜緻密化過程の概要図である。It is a schematic diagram of the film densification process by the method of the present invention. 本発明方法を実施するに好適なコールドスプレー装置の一例を示すもので、(a)はスリットを設けたノズル、(b)はノズル2個を近接させた図である。An example of a cold spray apparatus suitable for carrying out the method of the present invention is shown, in which (a) is a nozzle provided with a slit, and (b) is a diagram in which two nozzles are brought close to each other.

符号の説明Explanation of symbols

1 先細部 2 末広部
3 のど部 4 ピーニング粉末供給孔
5 ノズル部 6 ガスケット
7 ガス・粉末供給部 8 ナット
9 作動ガス供給孔 10 原料粉末供給孔
11 温度測定孔 12 圧力測定孔
13 皮膜原料粉末 14 ピーニング粉末
15 基材 16 原料成膜用ガン
17 ショットピーニング用ガン 18 チャンバー
19 平行部 20 ナット
21 整流子 22 スリット
DESCRIPTION OF SYMBOLS 1 Tip detail 2 Wide end part 3 Throat part 4 Peening powder supply hole 5 Nozzle part 6 Gasket 7 Gas / powder supply part 8 Nut 9 Working gas supply hole 10 Raw material powder supply hole 11 Temperature measurement hole 12 Pressure measurement hole 13 Film raw material powder 14 Peening Powder 15 Base Material 16 Raw Material Film Formation Gun 17 Shot Peening Gun 18 Chamber 19 Parallel Portion 20 Nut 21 Commutator 22 Slit

Claims (6)

溶射材料の融点または軟化温度よりも低い温度のガスを超音速流にして、前記超音速流に前記溶射材料を投入し、固相状態のまま基材に高速で衝突させて皮膜を形成するコールドスプレー皮膜の形成方法において、粒径5〜50μmの皮膜原料粉末と粒径100〜1000μmのピーニング粉末を混合した原料粉末を用いて皮膜を形成することを特徴とするコールドスプレー皮膜の形成方法。   Cold that forms a film by making a gas at a temperature lower than the melting point or softening temperature of the thermal spray material into a supersonic flow, injecting the thermal spray material into the supersonic flow, and colliding with the substrate at a high speed in a solid state A method of forming a cold spray film, comprising forming a film using a raw material powder obtained by mixing a raw material powder having a particle size of 5 to 50 µm and a peening powder having a particle size of 100 to 1000 µm. 溶射材料の融点または軟化温度よりも低い温度のガスを超音速流にして、前記超音速流に前記溶射材料を投入し、固相状態のまま基材に高速で衝突させて皮膜を形成するコールドスプレー皮膜の形成方法において、ノズルのど部前方のガス・粉末供給部および/またはのど部の後方の末広部または末広部に続く平行部に複数設けた粉末供給孔から粒径5〜50μmの皮膜原料粉末と粒径100〜1000μmのピーニング粉末を別々の粉末供給孔から供給し、皮膜を形成することを特徴とするコールドスプレー皮膜の形成方法。   Cold that forms a film by making a gas at a temperature lower than the melting point or softening temperature of the thermal spray material into a supersonic flow, injecting the thermal spray material into the supersonic flow, and colliding with the substrate at a high speed in a solid state In the spray film forming method, a gas / powder supply part in front of the nozzle throat part and / or a film raw material having a particle diameter of 5 to 50 μm from a plurality of powder supply holes provided in the divergent part behind the throat part or the parallel part following the divergent part A method for forming a cold spray film, comprising forming a film by supplying powder and a peening powder having a particle diameter of 100 to 1000 μm from separate powder supply holes. ノズルのど部前方のチャンバー部またはのど部の後方の末広部または末広部に続く平行部に設けた粉末供給孔から粒径5〜50μmの皮膜原料粉末を供給し、ノズル噴出孔周辺のスリット部に設けた粉末供給孔から粒径100〜1000μmのピーニング粉末を別々に供給し、皮膜を形成することを特徴とする請求項2に記載のコールドスプレー皮膜の形成方法。   The coating material powder having a particle diameter of 5 to 50 μm is supplied from the powder supply hole provided in the chamber part in front of the nozzle throat part or the divergent part behind the throat part or in the parallel part following the divergent part, and into the slit part around the nozzle ejection hole The method for forming a cold spray coating according to claim 2, wherein the coating is formed by separately supplying peening powder having a particle diameter of 100 to 1000 µm from the provided powder supply hole. 溶射材料の融点または軟化温度よりも低い温度のガスを超音速流にして、前記超音速流に前記溶射材料を投入し、固相状態のまま基材に高速で衝突させて皮膜を形成するコールドスプレー皮膜の形成方法において、原料成膜用ノズルとショットピーニング用のノズルを個々に有することを特徴とする請求項2または3に記載のコールドスプレー皮膜の形成方法。   A cold that forms a film by making a gas at a temperature lower than the melting point or softening temperature of the thermal spray material into a supersonic flow, injecting the thermal spray material into the supersonic flow, and colliding with the substrate at a high speed in the solid state. The method for forming a cold spray film according to claim 2 or 3, wherein the spray film forming method includes a nozzle for forming a raw material film and a nozzle for shot peening, respectively. ピーニング粉末のビッカース硬度が皮膜原料粉末のビッカース硬度よりも、400HV以上大きいことを特徴とする請求項1〜4のいずれか1項記載のコールドスプレー皮膜の形成方法。   5. The method for forming a cold spray coating according to claim 1, wherein the peening powder has a Vickers hardness of 400 HV or more higher than the Vickers hardness of the coating material powder. ピーニング粒が高硬度のFe基合金又はWCであることを特徴とする請求項1〜5のいずれか1項記載のコールドスプレー皮膜の形成方法。   The method of forming a cold spray film according to any one of claims 1 to 5, wherein the peening grains are a high hardness Fe-based alloy or WC.
JP2004235735A 2004-08-13 2004-08-13 Cold spray coating film formation method Withdrawn JP2006052449A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004235735A JP2006052449A (en) 2004-08-13 2004-08-13 Cold spray coating film formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004235735A JP2006052449A (en) 2004-08-13 2004-08-13 Cold spray coating film formation method

Publications (1)

Publication Number Publication Date
JP2006052449A true JP2006052449A (en) 2006-02-23

Family

ID=36030109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004235735A Withdrawn JP2006052449A (en) 2004-08-13 2004-08-13 Cold spray coating film formation method

Country Status (1)

Country Link
JP (1) JP2006052449A (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007146281A (en) * 2005-10-24 2007-06-14 Nippon Steel Corp Cold spray device
KR100776537B1 (en) 2005-03-09 2007-11-15 주식회사 솔믹스 Nozzle for cold spray and cold spray apparatus using the same
KR100776194B1 (en) * 2005-03-09 2007-11-28 주식회사 솔믹스 Nozzle for cold spray and cold spray apparatus using the same
JP2007308737A (en) * 2006-05-16 2007-11-29 Toyota Motor Corp Corrosion protection method for welded part
JP2008018455A (en) * 2006-07-13 2008-01-31 Nippon Steel Corp Mold for continuous casting and method for manufacturing the mold
JP2009197276A (en) * 2008-02-21 2009-09-03 Aisan Ind Co Ltd Hard coating film forming method
JP2010144224A (en) * 2008-12-19 2010-07-01 Honda Motor Co Ltd Modification treatment method for metal film, and aluminum base alloy laminated body
JP2010234499A (en) * 2009-03-31 2010-10-21 Dowa Thermotech Kk Apparatus and method for forming coating film
JP2012502182A (en) * 2008-09-09 2012-01-26 エイチ.シー. スターク インコーポレイテッド Dynamic hydrogenation of refractory metal powders
JP2012102361A (en) * 2010-11-09 2012-05-31 Keio Gijuku Method for manufacturing metal diffused layer, and metal material
CN102873011A (en) * 2012-09-18 2013-01-16 西北工业大学 Spray gun for cold spray of inner hole
GB2496041A (en) * 2011-10-25 2013-05-01 Mtu Aero Engines Gmbh Coating components by kinetic cold gas spraying
US20130106233A1 (en) * 2010-07-08 2013-05-02 Nhk Spring Co., Ltd. Squirrel-cage rotor and manufacturing method of squirrel-cage rotor
JP2016117953A (en) * 2016-03-28 2016-06-30 学校法人慶應義塾 Surface treatment apparatus and method
WO2017090565A1 (en) 2015-11-26 2017-06-01 日本発條株式会社 Laminate and method for producing laminate
WO2019016779A1 (en) * 2017-07-21 2019-01-24 National Research Council Of Canada Method for preparing powders for a cold spray process, and powders therefor

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100776537B1 (en) 2005-03-09 2007-11-15 주식회사 솔믹스 Nozzle for cold spray and cold spray apparatus using the same
KR100776194B1 (en) * 2005-03-09 2007-11-28 주식회사 솔믹스 Nozzle for cold spray and cold spray apparatus using the same
JP2007146281A (en) * 2005-10-24 2007-06-14 Nippon Steel Corp Cold spray device
JP2007308737A (en) * 2006-05-16 2007-11-29 Toyota Motor Corp Corrosion protection method for welded part
JP2008018455A (en) * 2006-07-13 2008-01-31 Nippon Steel Corp Mold for continuous casting and method for manufacturing the mold
JP2009197276A (en) * 2008-02-21 2009-09-03 Aisan Ind Co Ltd Hard coating film forming method
JP2012502182A (en) * 2008-09-09 2012-01-26 エイチ.シー. スターク インコーポレイテッド Dynamic hydrogenation of refractory metal powders
JP2010144224A (en) * 2008-12-19 2010-07-01 Honda Motor Co Ltd Modification treatment method for metal film, and aluminum base alloy laminated body
JP2010234499A (en) * 2009-03-31 2010-10-21 Dowa Thermotech Kk Apparatus and method for forming coating film
US20130106233A1 (en) * 2010-07-08 2013-05-02 Nhk Spring Co., Ltd. Squirrel-cage rotor and manufacturing method of squirrel-cage rotor
JP2012102361A (en) * 2010-11-09 2012-05-31 Keio Gijuku Method for manufacturing metal diffused layer, and metal material
GB2496041A (en) * 2011-10-25 2013-05-01 Mtu Aero Engines Gmbh Coating components by kinetic cold gas spraying
GB2496041B (en) * 2011-10-25 2016-06-08 MTU Aero Engines AG Forming crack-resistant coatings by cold gas spraying methods
CN102873011A (en) * 2012-09-18 2013-01-16 西北工业大学 Spray gun for cold spray of inner hole
WO2017090565A1 (en) 2015-11-26 2017-06-01 日本発條株式会社 Laminate and method for producing laminate
KR20180050357A (en) 2015-11-26 2018-05-14 닛폰 하츠죠 가부시키가이샤 LAMINATE, AND METHOD FOR MANUFACTURING LAMINATE
JP2016117953A (en) * 2016-03-28 2016-06-30 学校法人慶應義塾 Surface treatment apparatus and method
WO2019016779A1 (en) * 2017-07-21 2019-01-24 National Research Council Of Canada Method for preparing powders for a cold spray process, and powders therefor

Similar Documents

Publication Publication Date Title
JP4310251B2 (en) Nozzle for cold spray and method for producing cold spray coating
JP2006052449A (en) Cold spray coating film formation method
EP1579921A2 (en) Improved kinetic spray nozzle system design
US20060038044A1 (en) Replaceable throat insert for a kinetic spray nozzle
EP1705266A2 (en) Applying bond coat to engine components using cold spray
US20070137560A1 (en) Cold spray apparatus having powder preheating device
US8052074B2 (en) Apparatus and process for depositing coatings
EP1775026B1 (en) Improved non-clogging powder injector for a kinetic spray nozzle system
JP2006289364A (en) Method and system for forming functionally gradient material using cold spray
JP2006176880A (en) Cold spray process and apparatus
WO2005072249A2 (en) A modified high efficiency kinetic spray nozzle
US20070278324A1 (en) Device for cold gas spraying
US20200376507A1 (en) Internally Cooled Aerodynamically Centralizing Nozzle (ICCN)
KR100776194B1 (en) Nozzle for cold spray and cold spray apparatus using the same
Fauchais et al. Thermal and cold spray: Recent developments
US20090256010A1 (en) Cold gas-dynamic spray nozzle
JP5573505B2 (en) Ejector nozzle for cold spray device and cold spray device
EP2411554B1 (en) Nozzle for a thermal spray gun and method of thermal spraying
EP1508379B1 (en) Gas collimator for a kinetic powder spray nozzle
WO2007091102A1 (en) Kinetic spraying apparatus and method
JP2020037720A (en) Formation method of sprayed coating, high-speed flame spraying equipment and high-speed flame spraying nozzle
JP5228149B2 (en) Nozzle for film formation, film formation method, and film formation member
CN113957376A (en) Inner hole dual-fuel supersonic flame spray gun and spraying method
JP6404532B1 (en) Nozzle for cold spray and cold spray device
CN112742620A (en) High-speed oxygen-containing air fuel thermal spraying device

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20071106