JP2006045653A - Plated member and production method therefor - Google Patents

Plated member and production method therefor Download PDF

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JP2006045653A
JP2006045653A JP2004232245A JP2004232245A JP2006045653A JP 2006045653 A JP2006045653 A JP 2006045653A JP 2004232245 A JP2004232245 A JP 2004232245A JP 2004232245 A JP2004232245 A JP 2004232245A JP 2006045653 A JP2006045653 A JP 2006045653A
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alloy
plating
plating film
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JP3962841B2 (en
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Yosuke Matsumoto
洋介 松本
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DM LAB KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a plated member plated with a Ge-containing alloy, and to provide a production method therefor. <P>SOLUTION: In the plated member, a plating film of an alloy comprising Ge as an essential component is formed on the surface. The plating film is formed by an electroplating method. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明はめっき部材とその製造方法に関し、更に詳しくは、白金族元素またはAuとGeとの合金から成るめっき皮膜で表面が被覆され、とりわけ白金族元素がRhである場合は、青みがかった黒色の金属光沢を有し、高貴な感触を与えるGe−Rh合金のめっき皮膜で表面が被覆されている新規なめっき部材とその製造方法に関する。   The present invention relates to a plated member and a method for producing the same, and more specifically, the surface is coated with a plating film made of a platinum group element or an alloy of Au and Ge, and particularly when the platinum group element is Rh, the bluish black color The present invention relates to a novel plated member whose surface is coated with a plating film of Ge—Rh alloy having a metallic luster and giving a noble feel, and a method for producing the same.

装飾品業界では、眼鏡、ネックレス、指輪、イヤリング、ブレスレット、ネクタイピンなど人体に装用する各種の装身具に関しては、人体に無害であるだけではなく、更に進んで健康増進に貢献し、同時に外観が美麗で高級感のある使用価値を有するものの開発が進められている。
例えば、次のような装身具用の素材が提案されている(特許文献1を参照)。
In the decoration industry, various accessories such as glasses, necklaces, rings, earrings, bracelets, and tie pins are not only harmless to the human body, but also contribute to health promotion and have a beautiful appearance at the same time. Development of products with high-class use value is underway.
For example, the following materials for jewelry have been proposed (see Patent Document 1).

この素材は、Geの遠赤外効果や血流促進作用などに着目して開発された含Ge合金である。この合金は、Ge:1〜9質量%、In:Geに対して2〜20質量%、残部がAgから成るGe−In−Ag合金であり、Geの上記効能を発現すると同時に、Pt様の金属光沢を有している。
そして、この合金は各成分を所定量比で溶融・混合して合金化することにより調製され、その後所定形状に加工して使用される。
This material is a Ge-containing alloy developed by paying attention to the far-infrared effect and blood flow promoting action of Ge. This alloy is a Ge-In-Ag alloy composed of Ge: 1 to 9% by mass, In: Ge of 2 to 20% by mass, and the balance being made of Ag. Has a metallic luster.
This alloy is prepared by melting and mixing each component at a predetermined amount ratio to form an alloy, and then processing the alloy into a predetermined shape for use.

しかしながら、この合金はGe含有量が増加するにつれて難加工性を示し、例えば薄片への加工や精密な装飾加工などが困難になる。
なお、このような問題は、精密加工された被めっき材の表面を電気めっき法で含Ge合金のめっき皮膜で被覆すれば解消することができる。そのようなことから、装飾品業界では、含Ge合金から成るめっき皮膜の成膜に関して鋭意研究が重ねられている。しかしながら、現在までのところ、含Ge合金から成るめっき成膜を電気めっき法で成膜することに成功した事例はない。その最大の理由は、適切なめっき浴が未だ開発されていないからである。
However, this alloy exhibits difficult processability as the Ge content increases, and for example, it becomes difficult to process into thin pieces or to perform precise decoration processing.
Such a problem can be solved by coating the surface of the material to be plated, which has been precisely processed, with a plating film of a Ge-containing alloy by electroplating. For this reason, in the decorative article industry, earnest research has been repeated on the formation of a plating film made of a Ge-containing alloy. However, to date, there has been no case where a plating film made of a Ge-containing alloy has been successfully formed by an electroplating method. The biggest reason is that an appropriate plating bath has not yet been developed.

また、装身具の分野では、表面色調が黒色で金属光沢を有するものに対する要求が強まっている。そして、それを電気めっき法で製造するための開発研究が進められている。
ところで、黒色めっきとしては、従来から黒色Crめっき、黒色Niめっきなどが知られている。しかしながら、これらのめっき皮膜は、いずれも金属光沢に乏しく、そして装飾効果にも劣る。しかも、これらのめっき皮膜の場合、Crは環境や人体に有害な成分として忌避され、またNiは例えば肌アレルギーを引き起こす成分として忌避されているという問題がある。このようなことから、次のような黒色めっき皮膜が提案されている(特許文献2を参照)。
Further, in the field of jewelry, there is an increasing demand for those with a black surface color and a metallic luster. And development research for producing it by electroplating is underway.
By the way, as black plating, black Cr plating, black Ni plating, etc. are known conventionally. However, these plating films are all poor in metallic luster and inferior in decorative effect. Moreover, in the case of these plating films, there is a problem that Cr is repelled as a component harmful to the environment and the human body, and Ni is repelled as a component causing skin allergy, for example. For these reasons, the following black plating film has been proposed (see Patent Document 2).

このめっき皮膜は黒色の鏡面光沢を有するRhめっき皮膜である。しかも、このめっき皮膜は被めっき材との密着性が優れ、耐食性も優れ、そして高硬度である。
このめっき膜は、硫酸ロジウムのようなロジウム塩、硫酸のような遊離酸および次亜リン酸ナトリウムのような次亜リン酸塩を含むめっき浴を用いた電気めっき法で成膜される。
This plating film is a black Rh plating film having a specular gloss. Moreover, this plating film has excellent adhesion to the material to be plated, excellent corrosion resistance, and high hardness.
This plating film is formed by electroplating using a plating bath containing a rhodium salt such as rhodium sulfate, a free acid such as sulfuric acid, and a hypophosphite salt such as sodium hypophosphite.

しかしながら、この特許文献2の技術の場合、用いるめっき浴は必ずしも安定であるとはいえず、またRhの析出効率も高いとはいえない。そのため、鮮明な黒色光沢を実現するために厚付けめっきを行ったときに、めっきに要する時間が非常に長くなり、生産性が低くなるといる問題がある。
特開2000−144283号公報 特公平1−43033号公報
However, in the case of the technique disclosed in Patent Document 2, it cannot be said that the plating bath to be used is necessarily stable and the deposition efficiency of Rh is not high. Therefore, there is a problem that when thick plating is performed in order to realize a clear black gloss, the time required for plating becomes very long and productivity is lowered.
JP 2000-144283 A Japanese Patent Publication No. 1-43033

本発明は、含Ge合金の電気めっき皮膜で被覆された新規なめっき部材とその製造方法の提供を目的とする。   An object of this invention is to provide the novel plating member coat | covered with the electroplating film of Ge containing alloy, and its manufacturing method.

上記した目的を達成するために、本発明においては、
表面に、Geを必須成分として含有する合金のめっき皮膜が成膜されているめっき部材、とりわけ、前記合金におけるGeの含有量が1〜90質量%であり、また前記合金が、Ge−Rh合金、Ge−Ru合金、Ge−Pd合金、Ge−Pt合金またはGe−Au合金であるめっき部材が提供される。
In order to achieve the above object, in the present invention,
A plated member having a plating film formed of an alloy containing Ge as an essential component on the surface, in particular, the Ge content in the alloy is 1 to 90% by mass, and the alloy is a Ge-Rh alloy. , A Ge—Ru alloy, a Ge—Pd alloy, a Ge—Pt alloy, or a Ge—Au alloy.

また、本発明においては、
Ge源、Geと合金を形成する元素源、有機酸、アルカリ成分、および遊離酸を必須成分として含む酸性めっき浴を用いて被めっき材に含Ge合金を電着してめっき皮膜を成膜することを特徴とするめっき部材の製造方法が提供される。
In the present invention,
A plating film is formed by electrodepositing a Ge-containing alloy on a material to be plated using an acid plating bath containing Ge source, an element source that forms an alloy with Ge, an organic acid, an alkali component, and a free acid as essential components. A method of manufacturing a plated member is provided.

このめっき部材は、そのめっき皮膜にGeが1〜90質量%含有されており、まためっき皮膜がGe−Rh合金の場合は高貴な黒色光沢を示すので、Geの人体への効能を有効に発揮する新たな高級装身具としてその価値は大である。   This plating member contains 1 to 90% by mass of Ge in the plating film, and when the plating film is a Ge-Rh alloy, it exhibits a noble black luster, so that the effect of Ge on the human body is effectively exhibited. Its value is great as a new luxury accessory.

本発明のめっき部材は、表面を被覆するめっき皮膜が含Ge合金で構成されている。具体的には、Ge−Rh合金、Ge−Ru合金、Ge−Pd合金、Ge−Pt合金またはGe−Au合金で構成されている。そして、これら合金におけるGe含有量は1〜90質量%になっている。
このめっき皮膜は、合金におけるGeの相手材の種類やGe含有量によって独特の色調を有するが、いずれの合金の場合であっても、鏡面光沢を備えている。
In the plated member of the present invention, the plating film covering the surface is made of a Ge-containing alloy. Specifically, it is made of a Ge—Rh alloy, a Ge—Ru alloy, a Ge—Pd alloy, a Ge—Pt alloy, or a Ge—Au alloy. And Ge content in these alloys is 1-90 mass%.
This plated film has a unique color tone depending on the kind of Ge counterpart material and Ge content in the alloy, but it has a specular gloss in any alloy.

例えば、後述する実施例の48.8%Ge−51.2%Rh合金から成るめっき皮膜の場合、青みがかった黒色光沢であり、高貴な印象を与える色調である。また50%Ge−50%Auから成るめっき皮膜の場合は、青みがかった黄金色である。
このめっき部材は、電気めっき法で製造される。
まず、めっき浴としては、Ge源、Geと合金を形成する元素源、有機酸、アルカリ成分、遊離酸を必須成分として含む酸性のめっき浴が調製される。
For example, in the case of a plating film made of a 48.8% Ge-51.2% Rh alloy in Examples described later, it has a bluish black gloss and a color tone that gives a noble impression. Moreover, in the case of the plating film which consists of 50% Ge-50% Au, it is a bluish golden color.
This plating member is manufactured by an electroplating method.
First, as a plating bath, an acidic plating bath containing a Ge source, an element source that forms an alloy with Ge, an organic acid, an alkali component, and a free acid as essential components is prepared.

Ge源としては、例えば硫酸ゲルマニウム、塩化ゲルマニウム、硝酸ゲルマニウム、ゲルマニウム酸カリウム、二酸化ゲルマニウムなどを用いることができる。
合金元素源としては、次のような各種の化合物が用いられる。
Ge−Rhめっき皮膜の成膜を目標とする場合のRh源としては、例えば硫酸ロジウム、塩化ロジウム、リン酸ロジウムなどを用いる。
As the Ge source, for example, germanium sulfate, germanium chloride, germanium nitrate, potassium germanate, germanium dioxide and the like can be used.
As the alloy element source, the following various compounds are used.
For example, rhodium sulfate, rhodium chloride, rhodium phosphate, or the like is used as the Rh source when a Ge-Rh plating film is to be formed.

Ge−Ruめっき皮膜の場合のRu源としては、例えば硫酸ルテニウム、塩化ルテニウム、スルファミン酸ルテニウムなどを用いる。
Ge−Pdめっき皮膜の場合のPd源としては、例えば硫酸パラジウム、塩化パラジウム、パラジウムのアンモニア酢酸塩などを用いる。
Ge−Ptめっき皮膜の場合のPt源としては、例えば硫酸白金、亜硝酸白金などを用いる。
As the Ru source in the case of the Ge—Ru plating film, for example, ruthenium sulfate, ruthenium chloride, ruthenium sulfamate, or the like is used.
As the Pd source in the case of the Ge—Pd plating film, for example, palladium sulfate, palladium chloride, palladium ammonia acetate and the like are used.
As the Pt source in the case of the Ge—Pt plating film, for example, platinum sulfate, platinum nitrite or the like is used.

また、Ge−Auめっき皮膜のAu源としては、例えばシアン金カリウム、塩化金酸などを用いる。
めっき浴の調製時におけるGe源と合金元素源の濃度は成膜するめっき皮膜におけるGe含有量の目標値との関係で適宜に決めればよい。
めっき浴における有機酸としては、例えば、クエン酸、スルファミン酸、グリコール酸、酢酸、コハク酸、リンゴ酸などの1種または2種以上を用いることができる。そして、これら有機酸のめっき浴における濃度は、0.1〜200g/L程度にすることが好ましい。
Further, as the Au source of the Ge—Au plating film, for example, cyanogen gold potassium and chloroauric acid are used.
The concentration of the Ge source and the alloy element source during the preparation of the plating bath may be determined as appropriate in relation to the target value of the Ge content in the plating film to be formed.
As the organic acid in the plating bath, for example, one or more of citric acid, sulfamic acid, glycolic acid, acetic acid, succinic acid, malic acid and the like can be used. And it is preferable that the density | concentration in the plating bath of these organic acids shall be about 0.1-200 g / L.

アルカリ成分としては、例えば水酸化カリウム、水酸化ナトリウムなどを用いることができるが、これらのうち水酸化カリウムが好適である。そして、これらアルカリ成分の濃度は5〜200g/L程度にすることが好ましい。このアルカリ成分は濃度5〜200Nの水溶液にして用いてもよい。
遊離酸としては、酸性めっき浴に常用されている酸であれば何であってもよく、例えば硫酸、塩酸、リン酸、スルファミン酸などを用いることができる。そして、その使用量は、めっき浴のpHを5.5以下の酸性に確保できる量に設定される。
As the alkali component, for example, potassium hydroxide, sodium hydroxide, and the like can be used. Of these, potassium hydroxide is preferable. And it is preferable that the density | concentration of these alkali components shall be about 5-200 g / L. This alkaline component may be used as an aqueous solution having a concentration of 5 to 200N.
As the free acid, any acid commonly used in acidic plating baths may be used. For example, sulfuric acid, hydrochloric acid, phosphoric acid, sulfamic acid and the like can be used. And the usage-amount is set to the quantity which can ensure the pH of a plating bath to the acidity of 5.5 or less.

めっき浴のpHは5.0以下に設定されることが好ましい。pHが5.0より高い場合は、Geやその相手元素の水酸化物が生成するようになって目標組成のめっき皮膜を成膜することが困難になるからである。
めっき浴の温度は常温から60℃の範囲内の適宜な温度に設定すればよい。温度が常温より低いと析出効率が悪くなり、また温度を60℃より高くすると、めっき浴の蒸発が進んで浴組成の変動が激しくなるからである。
The pH of the plating bath is preferably set to 5.0 or less. When the pH is higher than 5.0, it is difficult to form a plating film having a target composition because Ge or a hydroxide of its counterpart element is generated.
What is necessary is just to set the temperature of a plating bath to the appropriate temperature in the range of normal temperature to 60 degreeC. This is because if the temperature is lower than room temperature, the deposition efficiency is deteriorated, and if the temperature is higher than 60 ° C., evaporation of the plating bath proceeds and the variation of the bath composition becomes severe.

また電流密度は0.1〜10A/dm2の範囲内に設定することが好ましい。0.1A/dm2より低密度の場合は、析出速度が遅くなり、また10A/dm2より高密度にするとヤケが発生して光沢のあるめっき皮膜が成膜できなくなるからである。 The current density is preferably set in the range of 0.1 to 10 A / dm 2. This is because when the density is lower than 0.1 A / dm 2 , the deposition rate is slow, and when the density is higher than 10 A / dm 2 , burns occur and a glossy plating film cannot be formed.

実施例1
下記の成分を用いてめっき浴を建浴した。
二酸化ゲルマニウム:13g/L(Ge換算)、硫酸ロジウム:2g/L(Rh換算)、スルファミン酸:50g/L、グリコール酸:50g/L、クエン酸:50g/L、水酸化カリウム:40g/L、硫酸:80g/L。
Example 1
A plating bath was constructed using the following ingredients.
Germanium dioxide: 13 g / L (converted to Ge), rhodium sulfate: 2 g / L (converted to Rh), sulfamic acid: 50 g / L, glycolic acid: 50 g / L, citric acid: 50 g / L, potassium hydroxide: 40 g / L , Sulfuric acid: 80 g / L.

このめっき浴は強酸性であり、そのpHは、温度30℃で0.5になっている。
このめっき浴の温度を45±2℃に制御し、陽極としてTi製の不溶性電極、陰極として銅箔を配置し、電流密度3A/dm2で電気めっきを6分間行った。
銅箔の表面に、青みがかった黒色光沢のめっき皮膜が形成された。厚みは約1μmであった。
This plating bath is strongly acidic, and its pH is 0.5 at a temperature of 30 ° C.
The temperature of this plating bath was controlled to 45 ± 2 ° C., an insoluble electrode made of Ti as an anode, a copper foil as a cathode, and electroplating at a current density of 3 A / dm 2 were performed for 6 minutes.
A bluish black glossy plating film was formed on the surface of the copper foil. The thickness was about 1 μm.

銅箔のめっき皮膜面に対してX線を照射して、蛍光X線エネルギースペクトクルを測定した。測定には、フィッシャースコープX−RAY XDL(フィッシャー社製)を用いた。結果を図1に示した。
図1から次のことが明らかである。
(1)2θ:60°付近にCuのエネルギーピーク、2θ:75°付近にGeのエネルギーピーク、2θ:155°付近にRhのエネルギーピークが認められる。
X-rays were irradiated to the plating film surface of the copper foil, and a fluorescent X-ray energy spectrum was measured. For the measurement, Fischer scope X-RAY XDL (manufactured by Fischer) was used. The results are shown in FIG.
The following is clear from FIG.
(1) Cu energy peak near 2θ: 60 °, Ge energy peak near 2θ: 75 °, and Rh energy peak around 2θ: 155 ° are observed.

このスペクトル図において各成分のエネルギーピークの割合は、Cu:91.4%、Ge:4.2%、Rh:4.4%になっている。
(2)銅箔の表面には、Ge−Rhから成るめっき皮膜が成膜されている。そしてそのめっき皮膜は上記したエネルギーピークの計算から、Ge:48.8質量%、Rh:51.2%の合金組成になっている。
In this spectrum diagram, the ratio of the energy peak of each component is Cu: 91.4%, Ge: 4.2%, Rh: 4.4%.
(2) A plating film made of Ge—Rh is formed on the surface of the copper foil. The plating film has an alloy composition of Ge: 48.8% by mass and Rh: 51.2% from the calculation of the energy peak described above.

なお、このめっき皮膜に対し、次のような人工汗浸漬試験を行った。
塩化ナトリウム:9.9g/L、硫酸ナトリウム:0.8g/L、尿素:1.7g/L、乳酸:1.7mL/L、アンモニウム:0.2mL/Lを含み、温度40℃、pH5.6の試験用水溶液に、めっき部材を48時間浸漬したのち取りだして、めっき皮膜の状態を目視観察した。
In addition, the following artificial sweat immersion test was done with respect to this plating film.
Sodium chloride: 9.9 g / L, sodium sulfate: 0.8 g / L, urea: 1.7 g / L, lactic acid: 1.7 mL / L, ammonium: 0.2 mL / L, temperature: 40 ° C., pH: 5. The plated member was immersed in the test aqueous solution No. 6 for 48 hours and then taken out, and the state of the plated film was visually observed.

めっき皮膜には、変色も腐食も認められず、このめっき皮膜は優れた耐食性を備えていることが確認された。
また、銅箔を硝酸で溶解したところ、めっき皮膜は粉体化することなく、細かいフレーク状になって残存した。そして、このフレークの集合体を充分に水洗いしたのち、温度100℃の乾燥器内に1昼夜放置して乾燥したところ、重量が30%程度増量するという現象がみられた。これは、例えば大気中の酸素を吸蔵したのではないかと考えられる。
実施例2
下記の成分を用いてめっき浴を建浴した。
Neither discoloration nor corrosion was observed in the plating film, and it was confirmed that this plating film had excellent corrosion resistance.
Further, when the copper foil was dissolved with nitric acid, the plating film remained in the form of fine flakes without being powdered. When the flake aggregate was sufficiently washed with water and then left to dry in a dryer at a temperature of 100 ° C. for one day, a phenomenon was observed in which the weight increased by about 30%. This may be because, for example, oxygen in the atmosphere is occluded.
Example 2
A plating bath was constructed using the following ingredients.

ゲルマニウム酸カリウム(Ge換算):10g/L、硫酸ロジウム(Rh換算):2g/L、クエン酸カリウム:20g/L、リンゴ酸:30g/L、水酸化カリウム:30g/L。
この浴のpHは約5.0である。このめっき浴の温度を50±2℃に制御し、陽極としてTi製の不溶性電極、陰極として銅箔を配置し、電流密度2.0A/dm2で電気めっきを6分間行った。
Potassium germanate (converted to Ge): 10 g / L, rhodium sulfate (converted to Rh): 2 g / L, potassium citrate: 20 g / L, malic acid: 30 g / L, potassium hydroxide: 30 g / L.
The pH of this bath is about 5.0. The temperature of this plating bath was controlled to 50 ± 2 ° C., an insoluble electrode made of Ti as an anode, and a copper foil as a cathode were arranged, and electroplating was performed at a current density of 2.0 A / dm 2 for 6 minutes.

実施例1のめっき皮膜と同じように黒色光沢を有するめっき皮膜が成膜された。膜厚は約1.0μmであった。   A plating film having a black luster was formed in the same manner as the plating film of Example 1. The film thickness was about 1.0 μm.

本発明のめっき部材は、めっき皮膜が含Ge合金で構成されている。そして、めっき皮膜がGe−Rh合金の場合、その色調は青みがかった黒色光沢になっていて優れた装飾効果を発揮している。
そのため、このめっき部材は、Geの効能も併有する装身具としての有用性が大である。
In the plated member of the present invention, the plating film is made of a Ge-containing alloy. And when a plating film is a Ge-Rh alloy, the color tone is bluish black luster and exhibits the outstanding decoration effect.
Therefore, this plating member is very useful as an accessory that also has the effect of Ge.

また、Geの相手材として触媒作用を有する白金族元素を選択することにより、このめっき部材に対しては、例えば触媒のような未知の用途も期待できる。   Further, by selecting a platinum group element having a catalytic action as the Ge counterpart, an unknown application such as a catalyst can be expected for this plated member.

実施例1のめっき部材の蛍光X線エネルギースペクトクル図である。2 is a fluorescent X-ray energy spectrum diagram of a plated member of Example 1. FIG.

Claims (4)

表面に、Geを必須成分として含有する合金のめっき皮膜が成膜されていることを特徴とするめっき部材。   A plated member, wherein a plating film of an alloy containing Ge as an essential component is formed on a surface. 前記合金におけるGeの含有量が1〜90質量%である請求項1のめっき部材。   The plated member according to claim 1, wherein the Ge content in the alloy is 1 to 90 mass%. 前記合金が、Ge−Rh合金、Ge−Ru合金、Ge−Pd合金、Ge−Pt合金またはGe−Au合金のいずれか1種である請求項1または2のめっき部材。   The plated member according to claim 1, wherein the alloy is any one of a Ge—Rh alloy, a Ge—Ru alloy, a Ge—Pd alloy, a Ge—Pt alloy, or a Ge—Au alloy. Ge源、Geと合金を形成する元素源、有機酸、アルカリ成分、および遊離酸を必須成分として含む酸性めっき浴を用いて被めっき材に含Ge合金を電着してめっき皮膜を成膜することを特徴とするめっき部材の製造方法。   A plating film is formed by electrodepositing a Ge-containing alloy on a material to be plated using an acidic plating bath containing Ge source, element source forming an alloy with Ge, organic acid, alkali component, and free acid as essential components. The manufacturing method of the plating member characterized by the above-mentioned.
JP2004232245A 2004-08-09 2004-08-09 Plating member manufacturing method, plating member for jewelry manufactured by the method Expired - Fee Related JP3962841B2 (en)

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