JP2006041219A5 - - Google Patents

Download PDF

Info

Publication number
JP2006041219A5
JP2006041219A5 JP2004219647A JP2004219647A JP2006041219A5 JP 2006041219 A5 JP2006041219 A5 JP 2006041219A5 JP 2004219647 A JP2004219647 A JP 2004219647A JP 2004219647 A JP2004219647 A JP 2004219647A JP 2006041219 A5 JP2006041219 A5 JP 2006041219A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004219647A
Other languages
Japanese (ja)
Other versions
JP4569207B2 (en
JP2006041219A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2004219647A priority Critical patent/JP4569207B2/en
Priority claimed from JP2004219647A external-priority patent/JP4569207B2/en
Publication of JP2006041219A publication Critical patent/JP2006041219A/en
Publication of JP2006041219A5 publication Critical patent/JP2006041219A5/ja
Application granted granted Critical
Publication of JP4569207B2 publication Critical patent/JP4569207B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2004219647A 2004-07-28 2004-07-28 Method for manufacturing field effect transistor Expired - Fee Related JP4569207B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004219647A JP4569207B2 (en) 2004-07-28 2004-07-28 Method for manufacturing field effect transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004219647A JP4569207B2 (en) 2004-07-28 2004-07-28 Method for manufacturing field effect transistor

Publications (3)

Publication Number Publication Date
JP2006041219A JP2006041219A (en) 2006-02-09
JP2006041219A5 true JP2006041219A5 (en) 2007-06-07
JP4569207B2 JP4569207B2 (en) 2010-10-27

Family

ID=35905888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004219647A Expired - Fee Related JP4569207B2 (en) 2004-07-28 2004-07-28 Method for manufacturing field effect transistor

Country Status (1)

Country Link
JP (1) JP4569207B2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007266355A (en) * 2006-03-29 2007-10-11 Brother Ind Ltd Organic transistor and manufacturing method thereof
JP5326100B2 (en) * 2006-08-04 2013-10-30 国立大学法人 千葉大学 Organic thin film transistor and manufacturing method thereof.
KR101274036B1 (en) * 2006-09-08 2013-06-12 고쿠리츠다이가쿠호진 토쿄고교 다이가꾸 Organic thin film transistor and method for fabricating of the same
JP5167465B2 (en) * 2006-09-08 2013-03-21 エルジー ディスプレイ カンパニー リミテッド Method for manufacturing organic semiconductor thin film transistor
KR101451581B1 (en) * 2007-06-29 2014-10-16 엘지디스플레이 주식회사 Organic thin film transistor and method for fabricating of the same
FR2918797B1 (en) * 2007-07-13 2009-11-06 Sofileta Sa ORGANIC FIELD EFFECT TRANSISTOR AND METHOD OF MANUFACTURING THE TRANSISTOR
JP2009105258A (en) * 2007-10-24 2009-05-14 Konica Minolta Holdings Inc Method for manufacturing of thin-film transistor, thin-film transistor and display unit
JP5459570B2 (en) * 2008-02-05 2014-04-02 セイコーエプソン株式会社 Semiconductor device manufacturing method, electro-optical device manufacturing method, and electronic device manufacturing method
KR101079519B1 (en) * 2009-12-21 2011-11-03 성균관대학교산학협력단 Organic thin film transistor and method of manufacturing the same
JP5725614B2 (en) * 2011-08-04 2015-05-27 国立大学法人大阪大学 Organic transistor and manufacturing method thereof
WO2013069366A1 (en) * 2011-11-10 2013-05-16 富士電機株式会社 Organic thin film transistor and method for manufacturing same
JP6239227B2 (en) * 2011-11-30 2017-11-29 株式会社半導体エネルギー研究所 Semiconductor device and manufacturing method of semiconductor device
CN105047677B (en) * 2015-09-09 2017-12-12 京东方科技集团股份有限公司 Display base plate and preparation method thereof and display device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4389481A (en) * 1980-06-02 1983-06-21 Xerox Corporation Method of making planar thin film transistors, transistor arrays
US4461071A (en) * 1982-08-23 1984-07-24 Xerox Corporation Photolithographic process for fabricating thin film transistors
JPH01259563A (en) * 1988-04-08 1989-10-17 Mitsubishi Electric Corp Field effect transistor
JP3522771B2 (en) * 1991-03-22 2004-04-26 三菱電機株式会社 Inverter
JP2005354035A (en) * 2004-05-14 2005-12-22 Toppan Printing Co Ltd Forming method of semiconductor device

Similar Documents

Publication Publication Date Title
JP2005009494A5 (en)
JP2004224337A5 (en)
JP2006025501A5 (en)
JP2005114724A5 (en)
JP2004301123A5 (en)
JP2006025530A5 (en)
JP2005242542A5 (en)
JP2006041219A5 (en)
JP2005269070A5 (en)
JP2005317903A5 (en)
JP2005344887A5 (en)
JP2005271988A5 (en)
JP2005208610A5 (en)
JP2005249736A5 (en)
JP2006063573A5 (en)
JP2005203055A5 (en)
JP2005255126A5 (en)
CN300765733S (zh) 瓶子
CN300741076S (zh) 可收缩容器
CN301030001S (zh) 液体分配阀入口
CN300781624S (zh) 电视机
CN300781317S (zh) 叉车
CN300779224S (zh) 龙头
CN300734497S (zh) 旋转椅子
CN300736035S (zh) 蒸汽发生器基座(1)