JP2006038657A - Microchemical chip and its manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a microchemical chip that can be manufactured at low costs, reduces the mixture of impurities, can achieve a variety of packaging forms, and has stable performance. <P>SOLUTION: The microchemical chip comprises: an insulating substrate 1 having a wiring conductor 3; a frame-like conductive layer 2 formed at the outer periphery section on one main surface of the insulating substrate 1; a connection pad 4 that is electrically connected to the wiring conductor 3 and is formed outside the conductive layer 2 on one main surface; a channel 5 that is formed inside the insulating substrate 1, has one opening end at a part inside the conductive layer 2 on one main surface, and has the other opening end on a surface exposed to the outside of the insulating substrate 1; a semiconductor substrate 8 in which a part that is inner than an electrode 7 at the outer-periphery section on one main surface is joined by a joining material 11 over the entire periphery of the conductive layer 2 while a minute electromechanical mechanism 6 is formed at the center of one main surface and the electrode 7 connected to the minute electrochemical mechanism 6 is formed at the outer-periphery section; and a conductive connection material 9 that electrically connects the connection pad 4 and the electrode 7 and has the same melting temperature as the joining material 11. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a microchemical chip including a microelectromechanical mechanism formed on a semiconductor substrate and a flow path for flowing a fluid to be processed, and a method for manufacturing the microchemical chip.

  In recent years, with the background of higher precision and higher efficiency in chemical analysis, the measurement of potential, flow rate, injection, discharge, and evaluation required for chromatographs and electrophoresis, which have been performed in conventional laboratories, are very small. So-called microchemical chips have been proposed that can be implemented in various sizes.

  Conventionally, as a microchemical chip, there are generally used a substrate made of a semiconductor, glass or the like in which a flow path is formed, a power source such as a micropump for flowing a processed fluid through the flow path, and a processed fluid. And a functional part for performing various measurements and analyses.

  Among micro chemical chips, what is called MEMS (Micro Electro Mechanical System) is a device that can perform functions such as measurement of potential and mechanical movement such as sample transfer on a single semiconductor substrate. Has been proposed.

  For example, MEMS for microchemical chips are sensors such as accelerometers, pressure sensors, actuators, etc. for detecting changes in pressure of gases and liquids generated in response to chemical changes on the main surface of one semiconductor substrate. A micromirror device, which is a movable micro mirror that is used to change the optical axis for high-precision detection when optically detecting changes that occur in response to chemical changes, light It has a structure in which a micropump or the like is incorporated in a functional part of a device or the like, and has a very wide variety of structures.

  By connecting the flow path substrate in which the flow path is formed to the semiconductor substrate in which the MEMS is formed, and the structure in which the flow path and the part in which the MEMS or the functional part is formed are communicated, the MEMS A microchemical chip that can cause a fluid to be treated to flow through the flow path by the power of a micropump provided, and that can analyze and measure the fluid to be treated that has been supplied through the flow path at a functional part provided in the MEMS. Will be formed.

  The MEMS includes, for example, fine protrusions for electrodes and DNA adsorption, fine structures such as a micro reaction tank, a micro mirror, and a micro pump, a movable body, and the like.

  The flow path substrate is formed with a groove-shaped flow path on one main surface of a substrate made of a semiconductor such as silicon, PDMS (polydimethylsiloxane), glass, or the like, or a flow path penetrating from one main surface to another main surface. It is a formed structure.

  Note that the MEMS and the flow path are covered with a lid made of a glass plate or the like in order to prevent foreign substances from entering from outside air and perform chemical processing such as analysis and measurement with high accuracy. After being covered with the lid, the opening portion of the flow channel exposed to the outside serves as a supply port and a discharge port for the fluid to be processed, and the fluid to be processed is supplied from the supply port.

  Supply of a fluid to be processed (sample) to a supply port opened in a substrate made of silicon, PDMS or the like is carried out under pressure using a liquid delivery device such as a liquid nozzle or a liquid ejection device from the outside, and MEMS is performed via a flow path. A fluid to be treated is caused to flow to cause chemical reaction, detection, and the like.

  In addition, a microchemical chip is generally formed by connecting a connection pad for external connection to the MEMS on the main surface of a semiconductor substrate, and the connection pad is connected to an external electric circuit substrate such as a printed circuit board. By electrically connecting to the electrical circuit, an electrical signal transmitted from the MEMS according to the result of chemical processing such as analysis and measurement is transmitted from the connection pad to an external electrical circuit.

  This microchemical chip using MEMS is a device that uses a channel substrate formed on a silicon substrate or PDMS substrate by miniaturizing a chemical reaction and analysis system, and includes a microchannel, a micropump, a microreactor, and the like. The reaction time of the substrate can be greatly reduced by making the chemical reaction part of the substrate micro and increasing the surface area per unit volume. In addition, since the flow rate can be precisely controlled, highly accurate detection can be performed.

  Of these conventional microchemical chips, MEMS, for example, is formed on a main surface of a semiconductor substrate such as silicon using a so-called semiconductor micromachining technique such as baking or etching for fine projections for electrodes or DNA adsorption. It is manufactured by forming a fine structure such as a micro reaction tank, a micro mirror, a micro pump, or a movable body.

In addition, the flow path part has a groove-like or hole-like structure by applying so-called mold processing or stamping processing that applies photolithography to the main surface of the flow path substrate made of silicon, PDMS, glass or the like. Produced by forming.
Japanese Patent Laid-Open No. 2001-214241 (page 4-5, FIG. 1) JP 2001-108619 A (page 4-5, FIG. 1)

  However, in the above conventional microchemical chip, a fluid to be processed used for detection or the like is supplied to the microchemical system by an external liquid nozzle or a liquid discharge device, and the fluid to be processed is once outside air. It was common to be exposed to

  For this reason, when the fluid to be treated is supplied to the flow path from the outside of the microchemical chip, there is a problem of contamination of foreign matters such as germs and dust (so-called contamination) into the fluid to be treated from the outside.

  In addition, since a large liquid supply device is used, there is a limit to minimizing the flow rate of the fluid to be processed, and there are restrictions on efficient processing by reducing the flow rate of the fluid to be processed, improvement in processing speed, etc. There was a problem.

  In addition, since it is necessary to prepare a large liquid supply apparatus separately, there is a problem that even if the microchemical system apparatus is manufactured at a low cost, the liquid supply apparatus is expensive.

  In addition, silicon and PDMS are generally difficult to handle, and there are problems such as few simple methods for electrical connection and fluid connection when mounting inside an external printed board or other substrate or device, for example. there were. In this case, for example, a structure in which the opening portion of the flow path is located on the main surface of the flow path substrate and the connection pad for external connection is located on the side surface of the semiconductor substrate, that is, for external connection of the flow path There are many structures where parts and electrical connection parts are located on different planes. For example, when electronic parts such as chip capacitors are mounted on a microchemical chip, connection in the form of general surface mounting is possible. very difficult.

  In addition, when performing flow path sealing, the substrate on which a MEMS such as a semiconductor is formed and the flow path substrate must be connected one by one while aligning the flow path and the functional part of the MEMS. There were problems such as poor productivity and high cost.

  The present invention has been completed in view of the above-described conventional problems, and its purpose is to produce a microchemical chip with stable performance that can be manufactured at low cost, has few impurities, and can realize various mounting forms. The manufacturing method is provided.

  The microchemical chip of the present invention includes an insulating substrate in which a wiring conductor is formed from one main surface to the other main surface, a frame-shaped conductor layer formed on the outer peripheral portion of the one main surface of the insulating substrate, A connection pad electrically connected to the wiring conductor and formed outside the conductor layer on the one main surface; and a portion inside the conductor layer on the one main surface formed inside the insulating substrate. A flow path for circulating a fluid to be processed having one open end and another open end on the surface exposed to the outside of the insulating substrate, and a microelectromechanical mechanism and the one at the center of one main surface. Electrodes electrically connected to the microelectromechanical mechanism are respectively formed on the outer peripheral portion of the main surface, and the inner portion of the one main surface is joined to the conductor layer over the entire periphery. Semiconductors joined via materials A plate, characterized in that the connection pads and the melting temperature and the bonding material while electrically connecting the electrodes are provided with a conductive connecting member is the same.

  The microchemical chip of the present invention is preferably characterized in that the channel has a width in a cross section perpendicular to the flow direction of 0.05 to 0.5 mm.

  The microchemical chip of the present invention is preferably characterized in that the flow path is positioned inside the frame-shaped conductor layer in a plan view.

  In the microchemical chip of the present invention, preferably, the microelectromechanical mechanism is configured so that the fluid to be processed that has flowed out from the one opening end of the flow path to an internal space sandwiched between the insulating substrate and the semiconductor substrate. It is intended for chemical analysis.

  In the microchemical chip of the present invention, preferably, the insulating substrate has the other open end of the flow path located on the other main surface or side surface, and communicates with the flow path at the other open end. A pipe for external connection is attached.

The method for producing the microchemical chip of the present invention comprises:
Prepared a multi-electron micromechanical mechanism board in which microelectromechanical mechanisms and microelectromechanical mechanism areas formed by electrodes connected to the microelectromechanical mechanism are formed on one main surface of the semiconductor mother board. And a process of
A wiring conductor formed from one main surface to the other main surface of the insulating mother board, a frame-shaped conductor layer formed on the outer peripheral portion of the one main surface and having a bonding material deposited on the surface, the one main surface A connection pad formed on the outer surface of the conductor layer and having a conductive connection material attached to the surface, and one open end at a portion of the one main surface inside the conductor layer. Preparing a multi-chip microchemical chip substrate in which a plurality of micro-chemical chip substrate regions having a set of flow paths for circulating the processed fluid are arranged vertically and horizontally; and
The electrodes of the micro electro mechanical mechanism region of the multi-chip micro electro mechanical mechanism substrate are connected to the connection pads of the micro chemical chip substrate region of the multi-chip micro chemical chip substrate via the conductive connection material. And connecting the one main surface of the semiconductor mother board and the conductor layer of the insulating mother board via the bonding material,
Dividing the multi-cavity microelectromechanical mechanism substrate and the multi-cavity microchemical chip substrate bonded together to each microelectromechanical mechanism region and the microchemical chip substrate region to obtain individual microchemical chips; It is characterized by comprising.

  According to the microchemical chip of the present invention, an insulating substrate in which a wiring conductor is formed from one main surface to the other main surface, a frame-like conductor layer formed on the outer peripheral portion of the one main surface of the insulating substrate, and wiring A connection pad that is electrically connected to the conductor and formed on the outer side of the conductor layer on the one main surface, and one open end formed on the inner side of the conductor layer on the one main surface formed inside the insulating substrate. A flow path for circulating a fluid to be treated having another open end on the surface exposed to the outside of the insulating substrate, a microelectromechanical mechanism at the center of one main surface, and a microelectron at the outer periphery of one main surface Each of the electrodes electrically connected to the mechanical mechanism is formed, and connected to the semiconductor substrate in which the portion inside the electrode on the outer peripheral portion of one main surface is bonded to the conductor layer over the entire circumference through the bonding material When the pad and electrode are electrically connected Since the bonding material and the conductive connecting material having the same melting temperature are provided, the supply port of the external fluid to be treated is connected to the opening end portion of the flow path on the one main surface of the insulating substrate. By closely bonding with the means, the fluid to be processed can be easily exchanged between the insulating substrate and the outside. As a result, since the sealed state can be maintained consistently from the supply of the fluid to be treated to the chemical reaction, it is possible to prevent foreign matters from entering from outside and effectively prevent the occurrence of so-called contamination. it can.

  In addition, the liquid feeding function to the MEMS included in the microchemical chip allows the fluid to be treated to flow through the flow path without using a separate large-sized liquid supply device, so that a small amount of liquid can be accommodated in the fine flow path. What is necessary is just to prepare a process fluid and can also suppress the cost required for a desired chemical process low.

  In the microchemical chip of the present invention, both the opening end of the flow path for flowing the fluid to be processed and the connection pad for electrical connection have good characteristics such as mechanical strength and are easy to handle. Since it is formed on the substrate, it is easy to handle.

  In addition, since both the open end of the flow path and the connection pad are formed on one main surface of the insulating substrate, electrical connection to an external electric circuit board such as a printed wiring board, particularly connection in the form of surface mounting is easy. It is.

  In addition, when supplying the fluid to be processed to the flow path by using a liquid supply device separately when supplying the fluid to be processed from the outside, it is not necessary to clean the external environment, and the amount of the fluid to be processed to be supplied can be increased. A small amount of the fluid for chemical detection that is generally expensive can be efficiently used in a small amount.

  Preferably, in the present invention, the flow path has a width in a cross section perpendicular to the flow direction of 0.05 to 0.5 mm, so that it is large enough to allow a chemical reaction to be performed efficiently and can maintain processability. Since it is small, it is easier to form a flow path on the insulating substrate, which is effective for controlling the flow rate of the fluid to be processed.

  Further, in the present invention, preferably, the flow path is located inside the frame-shaped conductor layer in a plan view, so that the fluid to be processed can be efficiently transferred to the MEMS without touching the connection pad. Therefore, even if a highly corrosive process fluid is supplied to the MEMS, the reliability of the electrical connection is maintained, and the conductive process fluid can be supplied to the MEMS portion. Moreover, since the flow path is located inside the conductor layer, the microchemical chip can be more effectively and reliably reduced in size.

  Further, since the wiring conductor and the flow path can be formed so as not to cross each other inside the insulating base, the manufacturing is easy and the cost can be further reduced.

  Preferably, in the present invention, the microelectromechanical mechanism is for chemically analyzing the fluid to be processed that has flowed out from one opening end of the flow path into the internal space sandwiched between the insulating substrate and the semiconductor substrate. Therefore, since a small amount of fluid to be processed in a narrow space sandwiched between the insulating substrate and the semiconductor substrate can be efficiently analyzed chemically, chemical analysis can be efficiently performed with a small amount of fluid to be processed.

  In the present invention, preferably, the insulating substrate has another open end of the flow path located on the other main surface or side face, and an external connection pipe communicating with the flow path is attached to the other open end. Therefore, since the pipe for external connection can be directly connected to the insulating substrate, the connection work becomes easier and it is consistent from the point where the fluid to be processed is supplied to the place where the chemical reaction is performed. Can be kept sealed. As a result, the connection between the microchemical chip and the external fluid supply apparatus to be processed can be made easier and more reliable, and the supply of the fluid to be processed can be made simple and highly reliable.

  According to the method of manufacturing a microchemical chip of the present invention, since each of the above steps is provided, the connection for external connection of each electrode and the microelectromechanical machine for a large number of microchemical chips arranged in rows and columns. Since the sealing of the mechanism can be performed at the same time, it is possible to easily and reliably manufacture a multi-chip microchemical chip composed of a microelectromechanical mechanism substrate and a multi-chip microchemical chip substrate bonded together. it can.

  In addition, by dividing the multi-chip microchemical chip substrate and the multi-chip microelectromechanical substrate bonded together into the microelectromechanical mechanism region and the microchemical chip substrate region, the insulating substrate and the semiconductor substrate A large number of individual microchemical chips comprising a microelectromechanical mechanism sealed in a microspace between them and a flow path for supplying and discharging a fluid to be processed in the microspace can be manufactured simultaneously. . At the time of this division, each microelectromechanical mechanism in the electromechanical mechanism area is sealed with a multi-chip microchemical chip substrate, so that the cutting powder of the semiconductor substrate such as silicon generated by the division by dicing or the like is generated. There is no adhesion to the microelectromechanical mechanism, and the microelectromechanical mechanism can be reliably operated in the divided microchemical chip.

  In addition, since the microchemical chip obtained by dividing the wiring conductor is led out to the other main surface or side surface of the insulating substrate, simply attaching a terminal such as a metal bump to the derived end part, The microchemical chip can be mounted on an external electronic circuit board by surface mounting or the like, and the mounting process can be made extremely short and easy.

  The microchemical chip and the manufacturing method thereof of the present invention will be described in detail below. FIG. 1 is a cross-sectional view showing an example of an embodiment of a microchemical chip of the present invention. In FIG. 1, 1 is an insulating substrate, 2 is a frame-like conductor layer, 3 is a wiring conductor, 4 is a connection pad, 5 is a flow path, 6 is a micro electromechanical mechanism (MEMS), 7 is an electrode, and 8 is a semiconductor substrate. , 9 is a conductive connecting material, and 10 is a microchemical chip.

  The insulating substrate 1 and the semiconductor substrate 8 are bonded to each other through a bonding material 11 bonded to the frame-like conductor layer 2, and the micro electro mechanical mechanism 6 is formed in the internal space formed between the two. Except for the part, it is cut off from the outside and stored. The fluid to be processed that is supplied into the internal space through the flow path 5 is processed by the microelectromechanical mechanism 6, and an electrical signal generated in accordance with the processing is transmitted from the electrode 7 to the connection pad 4 through the conductive connection material 9. The signal is transmitted from the wiring conductor 3 electrically connected to the connection pad 4 to the outside, and the processing result is known.

  The microelectromechanical mechanism 6 in the present invention has functions of various sensors such as a fluid MEMS device such as a biosensor, a DNA chip, a microreactor, and a print head, a chemical sensor, and a gas sensor. This is a part made by so-called micromachining, and has a size of about 10 μm to several hundreds of μm per element.

  The insulating substrate 1 functions as a lid or a sealing body for sealing the micro electro mechanical mechanism 6 and forms the frame-shaped conductor layer 2, the wiring conductor 3, the connection pad 4, and the flow path 5. It also functions as a substrate.

  This insulating substrate 1 includes ceramic materials such as an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, a silicon carbide sintered body, a silicon nitride sintered body, a glass ceramic sintered body, It is formed of a resin material such as polyimide or glass epoxy resin, or a composite material formed by bonding inorganic material powder such as ceramic or glass with a resin such as epoxy resin.

  When the insulating substrate 1 is made of, for example, an aluminum oxide sintered body, a glass ceramic formed by forming a glass ceramic slurry formed by mixing a raw material powder such as aluminum oxide and glass powder, a resin binder, a solvent, and the like into a sheet shape. It is formed by producing a green sheet (hereinafter also referred to as a green sheet) and laminating and firing a plurality of the sheets. The insulating substrate 1 is not limited to the one formed of an aluminum oxide sintered body, and it is preferable to select a substrate that is suitable for the application and the characteristics of the microchemical chip 10 to be hermetically sealed.

  For example, since the insulating substrate 1 is mechanically bonded to the semiconductor substrate 8 via the frame-shaped conductor layer 2, the reliability of the bonding with the semiconductor substrate 8, that is, between the insulating substrate 1 and the semiconductor substrate 8. In order to increase the shielding property against the outside of the formed internal space and the long-term reliability to withstand long-term use as a microchemical chip, the type and amount of mullite sintered body or glass components are adjusted. By using a material having a small difference in thermal expansion coefficient from the semiconductor substrate 8 such as a glass ceramic sintered body such as an aluminum oxide-borosilicate glass system whose thermal expansion coefficient is approximated to that of the semiconductor substrate 8. Is preferred.

  The insulating substrate 1 is made of an organic resin material such as polyimide or glass epoxy resin, or an inorganic resin such as ceramic or glass with an organic resin such as epoxy resin, in order to prevent delay of the electrical signal transmitted by the wiring conductor 3. It is preferable to form a composite material formed by bonding or a material having a low relative dielectric constant such as an aluminum oxide-borosilicate glass-based or lithium oxide-based glass ceramic sintered body.

In addition, the insulating substrate 1 increases the heat retention property of the fluid to be processed and enhances the stability of the processing performed by the microelectromechanical mechanism 6, for example, the processing of a chemical reaction or the like, such as an epoxy resin or a polyimide resin. Preferably, the insulating substrate 1 is formed of a material having a low conductivity. When the processing performed by the microelectromechanical mechanism 6 is visually confirmed or irradiated with light for processing, the insulating substrate 1 is formed at the center of the frame-shaped ceramic material. It is preferable that at least a part has translucency, such as a translucent material such as a glass material attached to the opening of the part.

  As described above, for the microchemical chip of the present invention, various materials can be selected according to the use, etc., and the insulating substrate 1 that has good mechanical strength and other characteristics and is easy to handle is used. Since the opening end of the flow path 5 for flowing the fluid to be processed and the connection pad 4 for electrical connection are formed on the insulating substrate 1, the handling is easy.

  A wiring conductor 3 is led out from one main surface of the insulating substrate 1 (main surface on the side sealing the micro electro mechanical mechanism 6) to the other main surface. A part of the wiring conductor 3 may be led out to the side surface of the insulating substrate 1. A frame-shaped conductor layer 2 is formed on the outer peripheral portion of one main surface of the insulating substrate 1, and the frame-shaped conductor layer 2 functions as a base metal layer for bonding the insulating substrate 1 to the semiconductor substrate 8. . The bonding material 11 is bonded to the frame-like conductor layer 2, and the bonding material 11 is bonded to the semiconductor substrate 8, whereby the insulating substrate 1 and the semiconductor substrate 8 are bonded to each other. An internal space is formed. In this internal space, the micro electromechanical mechanism 6 formed in the central portion of one main surface of the semiconductor substrate 8 is accommodated.

  The semiconductor substrate 8 is formed by processing a semiconductor material such as silicon or polysilicon into a plate shape, and the microelectromechanical mechanism 6 is formed at the center of one main surface. The micro electro mechanical mechanism 6 uses a so-called maskless etching technique such as photolithography technique or laser processing, etching technique such as hydrofluoric acid etching, dry etching, etc. on one main surface of a semiconductor substrate 8 made of silicon, polysilicon or the like. To form a desired structure.

  For example, if the microelectromechanical mechanism 6 is for chemical processing, the surface state is changed using a coating technique such as spin coating or dip coating after being formed into a predetermined structure by etching according to the application. It is used by controlling the wettability and chemical reactivity of chemicals, and performs various analyzes such as chemical analysis, DNA identification, and chromatography.

Further, an electrode 7 electrically connected to the micro electro mechanical mechanism 6 is formed on the outer peripheral portion of one main surface of the semiconductor substrate 8. The electrode 7 has a function of connecting and transmitting an electrical signal transmitted in accordance with the result of processing such as chemical processing performed by the micro-electromechanical mechanism 6 to the outside of the semiconductor substrate 8, and is made of a metal material such as aluminum or gold. Insulating the insulating substrate 1 and the semiconductor substrate 8 formed of a conductive material or the like insulates the outer peripheral portion of one main surface of the semiconductor substrate 8 from the inside of the electrode 7 through the bonding material 11. This is performed by bonding to the frame-like conductor layer 2 of the substrate 1. In addition, a connection pad 4 electrically connected to the wiring conductor 3 is formed in a portion outside the frame-like conductor layer 2 on the one main surface side of the insulating substrate 1.

  The wiring conductor 3 and the connection pad 4 function as a conductive path for transmitting an electrical signal sent from the electrode 7 of the semiconductor substrate 8 to the outside of the microchemical chip 10. These wiring conductor 3, connection pad 4 and conductor layer 2 are made of a metal material such as copper, silver, gold, palladium, tungsten, molybdenum and manganese. As a means for forming these wiring conductor 3, connection pad 4 and conductor layer 2, a means for forming as a metallized layer, a means for forming as a plating layer, a means for depositing metal such as vapor deposition as a thin film layer, etc. are used. Can do. For example, when the wiring conductor 3, the connection pad 4 and the conductor layer 2 are made of a tungsten metallized layer, the tungsten conductor paste is printed on a green sheet to be the insulating substrate 1, and the conductor paste is fired together with the green sheet. Is done.

  When the insulating substrate 1 and the semiconductor substrate 8 are joined, the electrode 7 on one main surface of the semiconductor substrate 8 is electrically connected to the connection pad 4 via the conductive connection material 9, thereby enabling the microelectronic machine. The mechanism 6, the electrode 7, the connection pad 4, and the wiring conductor 3 are electrically connected.

  The conductive connecting material 9 and the bonding material 11 are solders such as tin-silver solder, tin-silver-copper solder, low melting point solder such as gold-tin solder, and high melting point solder such as silver-germanium. It is formed by a conductive resin adhesive or the like formed by bonding conductive powders such as silver and copper with a resin. In this case, both the mechanical bonding between the insulating substrate 1 and the semiconductor substrate 8 via the bonding material 11 and the electrical connection between the connection pad 4 and the electrode 8 via the conductive connection material 7. In order to make the bonding easy and strong, it is necessary that the bonding material 11 and the conductive connecting material 7 have the same melting temperature. The melting temperatures of the two do not need to be exactly the same, and there is a temperature difference that allows joint and connection work (actually, heat melting using a well-known tunnel furnace, batch-type furnace, etc.) at the same time. May be.

  Then, the portion of the wiring conductor 3 exposed on the other main surface of the insulating substrate 1 is joined to an external electric circuit via tin-lead solder or the like, so that the electrode 7 of the microchemical chip 10 is electrically connected. It is electrically connected to an external electric circuit through the material 9, the connection pad 4 and the wiring conductor 3. Thereby, the micro electro mechanical mechanism 6 and an external electric circuit are electrically connected.

  In addition, a fluid to be processed having one open end at a portion inside the conductor layer 2 on one main surface and having another open end on the surface exposed to the outside of the insulating substrate 1 is circulated inside the insulating substrate 1. A flow path 5 is formed. A fluid to be processed is supplied to an internal space formed by the insulating substrate 1, the semiconductor substrate 8, and the bonding material 11 through which the micro electromechanical mechanism 6 is accommodated. As a result, a microchemical chip 10 having a processing function such as chemical processing such as potential measurement, DNA detection, identification, chromatography, and photochemical reaction is formed by flowing a fluid to be processed such as a sample for chemical analysis. become.

  According to the microchemical chip 10 of the present invention, since it has the above-described configuration, the semiconductor substrate 8 side mainly having a function such as processing, and the insulating substrate 1 having a function of a fluid to be processed and an electrical signal path and an external connection function. Electrical and mechanical connection and joining to the side can be easily performed, and the productivity of the microchemical chip 10 can be improved. In this case, for example, the semiconductor substrate 8 side and the insulating substrate 1 side are respectively arranged in advance vertically and horizontally, and these are collectively connected and joined together to simultaneously hermetically seal a large number of microchemical chips 10. And the productivity can be made extremely excellent.

  The flow path 5 is produced by producing a depression on the green sheet using a press die, NC punching or laser processing, and then laminating the green sheets. Moreover, when the cross section in the state of a green sheet observes the cross section in the state of a green sheet using SEM or a metal microscope, if the cross section can be produced stably in a rectangular shape, the width in the cross section perpendicular to the distribution direction is It is preferably 0.05 to 0.5 mm. When it is smaller than 0.05 mm, it becomes difficult to process, and there is a risk of causing a decrease in productivity and an increase in cost. Moreover, when larger than 0.5 mm, the cross-sectional area of the flow path 5 will become large and it will interfere with the efficiency improvement of the chemical reaction by the flow path 5 being miniaturized. Therefore, there is a possibility that the function as the microchemical chip 10 that performs high-precision chemical analysis with a small amount of fluid to be processed may be deteriorated.

  Here, for the flow path 5, the insulating substrate 1 is formed of a plate-like aluminum oxide sintered body having a thickness of 0.5 mm, and the flow path 5 having a circular cross section is formed from one main surface to the other main surface. Specific examples of testing the workability and chemical reactivity are shown below.

  The green sheet was prepared by forming a raw material powder mainly composed of aluminum oxide and silicon oxide into a sheet shape together with an organic solvent and a resin binder, and the flow path 5 was formed by NC punching. The criteria for determining workability were determined by an appearance inspection to determine whether a through-hole having a circular cross section could be produced in the green sheet, and a microscope was used. Inspect whether or not the through hole penetrates between the upper and lower surfaces of the green sheet, and the inclination angle (taper angle) of the inner surface of the through hole from the axial direction is the vertical cross section of the through hole. The width (the length of the base of the triangle) and the depth of the triangular part formed between the virtual line when it is completely perpendicular to the lower surface (taper angle = 0 °) and the actual inner surface line The ratio (width: depth) to the height (the length of the virtual line) was 1: 3 or less.

The chemical reactivity is determined when the amount of fluid to be processed actually supplied to the MEMS 6 is doubled or less with respect to the minimum required liquid feeding amount when a chemical reaction is performed in the MEMS 6 manufactured on the Si semiconductor substrate 8. ◯, and the case where the amount of the fluid to be processed actually supplied to the MEMS 6 is more than doubled is indicated by Δ. Table 1 shows the results of the above processability and chemical reactivity.

  From Table 1, if the width in the cross section perpendicular to the flow direction of the flow path 5 is less than 0.05 mm, there is a tendency that defects are likely to occur in workability, and if it exceeds 0.5 mm, defects in chemical reactivity tend to occur. It was observed.

  In the present invention, the flow path 5 is preferably located inside the frame-shaped conductor layer 2 in plan view. As a result, since the fluid to be processed is efficiently supplied to the micro electro mechanical mechanism 6 without touching the connection pad 4, the electrical connection can be made even if a highly corrosive fluid to be processed is supplied to the micro electro mechanical mechanism 6. Therefore, it is possible to supply the fluid to be processed to the micro electro mechanical mechanism 6. Moreover, since the flow path 5 is located inside the conductor layer 2, the microchemical chip 10 can be more effectively and reliably reduced in size. Further, since the wiring conductor 3 and the flow path 5 can be formed so as not to cross each other inside the insulating base 1, the manufacturing is easy and the cost can be further reduced.

  In the present invention, the microelectromechanical mechanism 6 is for chemically analyzing the fluid to be treated that has flowed from one open end of the flow path 5 into the internal space sandwiched between the insulating substrate 1 and the semiconductor substrate 8. It is preferable that Thereby, a small amount of fluid to be processed in a narrow internal space sandwiched between the insulating substrate 1 and the semiconductor substrate 8 can be efficiently chemically analyzed. As the microelectromechanical mechanism 6 for chemical analysis, for example, different standard samples of DNA are fixed in advance on the exposed surfaces of a large number of pin-shaped protrusions, and the DNA in the fluid to be treated is adsorbed by the protrusions. By identifying the DNA in the fluid to be treated, what constitutes a so-called DNA chip, a large number of protruding adsorbents that trap molecules are arranged in the direction of flow of the fluid to be treated, Examples thereof include one having a function of chromatographic analysis in which molecules in a fluid to be treated are sequentially adsorbed on an adsorbent.

  In the present invention, the insulating substrate 1 has the other open end of the flow path on the other main surface or side surface, and the external connection pipe (not shown) communicates with the flow path at the other open end. Is preferably attached. Thereby, since the pipe for external connection can be directly connected to the insulating substrate 1, the work of connecting the microchemical chip 10 to the external electric circuit board or the like becomes easier and the fluid to be processed is supplied. From the place to the place where the chemical reaction is performed, the sealed state can be maintained consistently, and the connection between the microchemical chip 10 and the external fluid supply device to be processed becomes easier and more reliable, and the supply of the fluid to be processed is simplified. And can be highly reliable.

Pipes, Fe-Ni-Co alloy, which increased the Fe-Ni metal material such as an alloy or chemical resistance subjected them with gold, glass whose main component is SiO ₂ or the like, alumina, aluminum nitride, It is formed of a ceramic material or the like. In addition, the pipe is attached to the insulating substrate 1 by using a brazing material, a resin adhesive, a low-melting glass (sealing glass) or another bonding material, and a surface using a plasma device or a blast device. After activation, it can be performed by surface activated bonding or the like in which bonding is performed by pressure bonding or annealing.

  Next, the manufacturing method of the microchemical chip of this invention is demonstrated based on Fig.2 (a)-(d). FIG. 2 is a cross-sectional view showing an example of an embodiment of a method for producing a microchemical chip according to the present invention in the order of steps. In FIG. 2, the same parts as those in FIG.

  First, as shown in FIG. 2A, a large number of micro electro mechanical mechanism regions 29 each having a micro electro mechanical mechanism 6 and electrodes 7 electrically connected thereto are formed on one main surface of a semiconductor mother substrate 28. A plurality of micro-electromechanical mechanism substrates 30 that are arranged vertically and horizontally are prepared.

  The semiconductor mother substrate 28 is made of, for example, a silicon substrate such as single crystal or polycrystal. A silicon oxide layer is formed on the surface of the silicon substrate. By forming the microelectromechanical mechanism 6 such as a minute vibrating body in the microelectromechanical mechanism region 29 and forming a plurality of microelectromechanical mechanism regions 29 in which electrodes 7 made of a conductor such as a circular pattern are formed on the main surface, A multi-chip micro electromechanical mechanism substrate 30 is formed. In this example, the microelectromechanical mechanism 6 and the electrode 7 are electrically connected to each other through fine wiring (not shown) formed on the main surface of the semiconductor mother substrate 28.

  Next, as shown in FIG. 2 (b), a wiring conductor 3 is formed on the insulating mother board 21 from one main surface to the other main surface, and the bonding material 11 is formed on the outer peripheral portion of the one main surface. A frame-like conductor layer 2 to which is attached, a connection pad 4 formed on the outer surface of the conductor layer 2 on one main surface and having a conductive connecting material 9 applied to the surface, and a conductor layer on one main surface A plurality of microchemical chip regions 22 each having a set of flow paths 5 for circulating a fluid to be processed formed so as to have one open end at an inner portion of 2 are arranged in the main surface vertically and horizontally. A multi-chip microchemical chip substrate 23 is prepared.

  For example, when the insulating mother board 21 is made of an aluminum oxide sintered body and the wiring conductor 3 is made of a metallized layer of tungsten, a raw material powder such as aluminum oxide, silicon oxide, calcium oxide, etc., resin binder, organic solvent A slurry is prepared by kneading together, and the slurry is formed into a sheet shape by a doctor blade method, a lip coater method or the like to form a plurality of green sheets, which are formed in advance on the surface of the green sheet and, if necessary, a green sheet. It can be formed by printing, filling and filling the through-holes with tungsten conductor paste, and then laminating and firing these green sheets.

  The frame-like conductor layer 2 is made of, for example, a conductor layer such as a metallized layer similar to the wiring conductor 3, and the bonding strength to the insulation mother substrate 21 when the insulation mother substrate 21 is made of ceramics such as an aluminum oxide sintered body. In view of productivity, cost, etc., a metallized layer having the same composition as the wiring conductor 3 is preferable.

  The connection pad 4 is made of, for example, the same material as the wiring conductor 3 and the conductor layer 2, and a tungsten conductor paste is printed on the outermost surface side of the green sheet to be the insulating mother substrate 21 to be the wiring conductor 3. It is formed by printing by a screen printing method or the like so that it is connected to the conductive paste and a large number are arranged in rows and columns.

  For example, when the insulating base substrate 21 is made of an aluminum oxide sintered body, the flow path 5 is formed by punching, punching, cutting, etc., such as a press die, NC punching, and laser processing, on the green sheet to be the insulating base substrate 21. It is formed by forming an opening, a through hole, a groove or the like in the green sheet by performing mechanical processing such as. For example, when the flow path 5 is formed of a through hole that penetrates from one main surface to the other main surface of the insulating mother substrate 21 as shown in FIG. 2B, the through holes are formed in each green sheet by NC punching. It is formed by laminating green sheets so that the through holes communicate from the uppermost layer to the lowermost layer.

  In addition, the flow path 5 does not need to be a through-hole shape over the entire length, and in a state after dividing the insulating mother substrate 21, each microchemical chip 10 has a central portion in the thickness direction of the insulating mother substrate 21. Other forms such as a form formed in a lateral groove shape on the side surface may be used. In this case, an elongated groove-like opening is formed in a predetermined portion of the green sheet by laser processing or the like, and another green sheet is laminated on the upper and lower sides of the opening so that the groove is formed inside the insulating mother substrate 21. A shaped flow path 5 can be formed.

  The conductive connecting material 9 and the bonding material 11 are made of tin-silver solder, tin-silver-bismuth solder, tin-copper-bismuth solder, tin-lead solder, or other metals such as silver, copper, gold, platinum, and palladium. A material such as a conductive resin adhesive formed by bonding a conductive filler powder obtained by coating such a metal to the surface of a powder core material such as a resin by means of plating or the like with a resin such as an epoxy resin or an acrylic resin. Can be used. Further, the bonding material 11 may not be conductive. For example, a resin such as an epoxy resin or an acrylic resin, or a resin added with an inorganic powder such as glass or silica may be used. For example, when both the conductive connecting material 9 and the bonding material 11 are made of solder such as tin-silver solder, the solder is positioned and placed on the connection pad 4 and the conductor layer 2 to be heated, melted, and bonded. Is formed.

  Next, as shown in FIG. 2 (c), each of the electrodes 7 in the microelectromechanical mechanism substrate region 29 of the multi-chip microelectromechanical substrate 30 is replaced with the microchemical chip substrate region of the multichip microchemical chip substrate 23. 22 are connected to the connection pads 4 via the conductive connecting material 9, and one main surface of the semiconductor mother board 28 and the conductor layer 2 of the insulating mother board 21 are joined via the bonding material 11. In this step, the multi-chip microelectromechanical mechanism substrate 30 and the multi-chip microchemical chip substrate 23 are mechanically and electrically joined and connected to each microelectromechanical mechanism region 29 and each microchemical chip substrate region 22. A large number of microchemical chips in which the microelectromechanical mechanisms 6 are accommodated in the internal space formed in the above are collectively formed in a state of being arranged vertically and horizontally.

  In this way, the process of connecting the electrode 7 and the connecting pad 4 via the conductive connecting material 9 and joining one main surface of the semiconductor mother board 28 and the conductor layer 2 via the bonding material 11 is performed as one step. It is possible to carry out the process, and it is easy to form a microchemical chip in a multi-piece state, and the electrical connection between the electrode 7 and the connection pad 4, the semiconductor mother substrate 28 and the conductor In order to ensure that the mechanical bonding between the layer 2 and the insulating mother substrate 21 is strong, the conductive connecting material 9 and the bonding material 11 have the same melting temperature.

  Moreover, it is preferable that the conductive connecting material 9 and the bonding material 11 have the same height. Thereby, since the connection surface with respect to the electrode 7 of the conductive connecting material 9 and the bonding surface with respect to one main surface of the semiconductor mother board 28 of the bonding material 11 become the same height, the electrode 7 and the connection pad 4 are made conductive. It becomes even easier to connect the main surface of the semiconductor mother board 28 and the conductor layer 2 via the bonding material 11 in one step while connecting them via the connecting material 9. In addition, the electrical connection between the electrode 7 and the connection pad 4 and the mechanical bonding between the semiconductor mother board 28 and the conductor layer 2 and the insulating mother board 21 are more surely strong.

  As a method of making the height of the bonding material 11 the same as the height of the conductive connecting material 9, for example, when the tin-silver solder used as the conductive connecting material 9 is melted and attached on the connection pad 4. A method of holding the upper surface with a ceramic jig or the like so that the upper surface is the same height as the bonding material 11 can be used.

  Here, for joining the electrode 7 and the connection pad 4, for example, when the connection pad 4 and the bonding material 11 are made of tin-silver solder, the connection pad 4 is aligned and placed on the electrode 7, and about 250 The heat treatment is performed in a reflow furnace at a temperature of about ~ 300 ° C.

  In addition, for example, the bonding material 11 is pressed against one main surface of the semiconductor mother substrate 28 in the outer peripheral portion of each micro electro mechanical mechanism region 29 by pressing the bonding material 11 against one main surface of the semiconductor mother substrate 28. The electrode 7 and the connecting pad 4 can be connected through the conductive connection 9 and simultaneously heat treated in a reflow furnace. In this case, as described above, if the height of the connection pad 4 is the same as the height of the frame-like conductor layer 2, the connection between the electrode 7 and the connection pad 4 via the conductive connection material 9, and the bonding material 11 and one main surface of the semiconductor mother board 28 can be joined simultaneously more easily and reliably.

  As described above, according to the method of manufacturing the microchemical chip 10 of the present invention, the bonding for leading out the electrode 7 of the micro electromechanical mechanism region 29, the semiconductor mother substrate 28 (semiconductor substrate 8), and the insulating mother. Since bonding to the substrate 21 (insulating substrate 1) can be performed simultaneously and in a state where a large number of substrates 21 are arranged, it is possible to perform a bonding process such as soldering that requires several hours in one time. In addition, since the microchemical chip 10 can be manufactured in a state where a large number of microchemical chips 10 are arranged at the same time, the productivity of the microchemical chip 10 can be greatly increased.

  Then, as shown in FIG. 2D, the multi-chip microchemical chip substrate 23 and the microelectromechanical mechanism region substrate 30 bonded to each other are divided into microelectromechanical mechanism regions 29 and microchemical chip regions 22. As a result, individual microchemical chips 10 obtained by bonding the semiconductor substrate 8 to the insulating substrate 1 are obtained. In this case, the joined body of the insulating mother substrate 21 and the semiconductor mother substrate 28 joined to each other can be cut by performing a cutting process such as a dicing process on the joined body.

  In the manufacturing method of the microchemical chip 10 of the present invention, each microelectromechanical mechanism 6 is formed by a frame-shaped conductor layer 2, a semiconductor substrate 8, and an insulating substrate 1 during cutting such as dicing. Since it is housed in the space, it is effectively prevented that cutting powder such as silicon or ceramics generated by cutting the semiconductor substrate 8 or the insulating substrate 1 adheres to the microelectromechanical mechanism 6 and completed. In the microchemical chip 10, the microelectromechanical mechanism 6 can be reliably operated normally.

In this case, cutting powder or the like may enter the internal space in which the micro electro mechanical mechanism 6 is accommodated via the flow path 5, but the opening area of the flow path 5 is reduced to 0.3 mm ² or less. Thereby, possibility that cutting powder etc. penetrate | invade into internal space can be suppressed to such an extent that there is no practical trouble. Further, by taking measures such as increasing the flow rate of cleaning water used at the time of cutting or changing the flow direction to a direction perpendicular to the opening end of the flow path 5, the microelectromechanical mechanism 6 can be more reliably provided. Can be operated normally.

  Thus, according to the manufacturing method of the microchemical chip 10 of the present invention, the step of forming the internal space in which the micro electro mechanical mechanism 6 is accommodated and the electrode 7 electrically connected to the micro electro mechanical mechanism 6 are Since the step of connecting to a conductive path that leads to the outside in a form that allows surface mounting and the step of opening the flow path 5 that causes the fluid to be treated to flow into the internal space can be performed in one step, microchemistry The productivity of the chip 10 can be made very high.

  Further, since the microchemical chip 10 manufactured as described above is already hermetically sealed and the electrode 7 is led out to the outside through the wiring conductor 3, this is separately put in a package. There is no need to add a process for mounting, and the portion where the wiring conductor 3 is led out is simply connected to an external electric circuit via an external terminal such as a solder ball, and mounted on an external electric circuit board for use. be able to.

  Further, since the microchemical chip 10 manufactured as described above has an opening end of the flow path 5 which is an inflow / outlet of the fluid to be processed on the insulating substrate 1 side, a metal pipe or the like is flowed through the insulating substrate 1. 5 can be easily connected to the outside simply by being attached so as to communicate with the outside. In this case, since at least one open end of the wiring conductor 3 and the flow path 5 is led out to the other main surface or side surface of the insulating base 1, it can be connected to an external electric circuit in the form of surface mounting. It can be mounted at a high density, and the external electric circuit board can be effectively downsized.

  In addition, this invention is not limited to the example of above-mentioned embodiment, A various deformation | transformation is possible if it is in the range of the summary of this invention. For example, in the example of the above-described embodiment, one microelectromechanical mechanism 6 is hermetically sealed in one microchemical chip 10, but a plurality of microelectromechanical mechanisms 6 are sealed in one microchemical chip 10. You may seal tightly. In the example shown in FIG. 1, the wiring conductor 3 is led out to the other main surface side of the insulating substrate 1, but a part thereof may be led out to the side surface or may be led out to a plurality of portions. In addition, the electrical connection of the derived portion to an external electric circuit is not limited to being performed via a solder such as tin-silver solder, but a lead terminal, a pin terminal, a conductive adhesive, a conductive clip, etc. It may be performed via.

It is sectional drawing which shows an example of embodiment about the board | substrate for electronic component sealing of this invention. (A)-(d) is sectional drawing which showed an example of embodiment about the manufacturing method of the microchemical chip of this invention, respectively in order of a process.

Explanation of symbols

1: Insulating substrate 2: Frame-like conductor layer 3: Wiring conductor 4: Connection pad 5: Flow path 6: Microelectromechanical mechanism 7: Electrode 8: Semiconductor substrate 9: Conductive connection material 10: Micro chemical chip 11: Bonding Material 21: Insulating mother substrate 22: Micro chemical chip region 23: Multi-chip micro chemical chip substrate 28: Semiconductor mother substrate 29: Micro electro mechanical mechanism region 30: Multi micro micro mechanical mechanism substrate

Claims (6)

An insulating substrate in which a wiring conductor is formed from one main surface to the other main surface, a frame-like conductor layer formed on the outer peripheral portion of the one main surface of the insulating substrate, and electrically connected to the wiring conductor And a connection pad formed on the outer side of the conductor layer on the one main surface, and an opening end formed on the inner side of the conductor layer on the one main surface formed inside the insulating substrate. A flow path for circulating a fluid to be processed having another open end on the surface exposed to the outside of the insulating substrate, a microelectromechanical mechanism at the center of one main surface, and the micro at the outer periphery of the one main surface A semiconductor in which electrodes electrically connected to the electromechanical mechanism are respectively formed, and a portion inside the electrode at the outer peripheral portion of the one main surface is bonded to the conductor layer through a bonding material over the entire circumference A substrate, the connection pad and the power Microchemical chip characterized in that the melting temperature and the bonding material is provided with a conductive connecting member is the same while electrically connected and. The microchemical chip according to claim 1, wherein the flow path has a width in a cross section perpendicular to the flow direction of 0.05 to 0.5 mm. 3. The microchemical chip according to claim 1, wherein the flow path is located inside the frame-like conductor layer in a plan view. The microelectromechanical mechanism is for chemically analyzing the fluid to be processed that has flowed out from the one open end of the flow path into an internal space sandwiched between the insulating substrate and the semiconductor substrate. The microchemical chip according to any one of claims 1 to 3, wherein the microchemical chip is characterized in that: In the insulating substrate, the other open end of the flow path is located on the other main surface or side surface, and a pipe for external connection communicating with the flow path is attached to the other open end. The microchemical chip according to any one of claims 1 to 4, wherein: Prepared a multi-electron micromechanical mechanism board in which microelectromechanical mechanisms and microelectromechanical mechanism areas formed by electrodes connected to the microelectromechanical mechanism are formed on one main surface of the semiconductor mother board. And a process of
A wiring conductor formed from one main surface to the other main surface of the insulating mother board, a frame-shaped conductor layer formed on the outer peripheral portion of the one main surface and having a bonding material deposited on the surface, the one main surface A connection pad formed on the outer surface of the conductor layer and having a conductive connection material attached to the surface, and one open end at a portion of the one main surface inside the conductor layer. Preparing a multi-chip microchemical chip substrate in which a plurality of micro-chemical chip substrate regions having a set of flow paths for circulating the processed fluid are arranged vertically and horizontally; and
The electrodes of the micro electro mechanical mechanism region of the multi-chip micro electro mechanical mechanism substrate are connected to the connection pads of the micro chemical chip substrate region of the multi-chip micro chemical chip substrate via the conductive connection material. And connecting the one main surface of the semiconductor mother board and the conductor layer of the insulating mother board via the bonding material,
Dividing the multi-cavity microelectromechanical mechanism substrate and the multi-cavity microchemical chip substrate bonded together to each microelectromechanical mechanism region and the microchemical chip substrate region to obtain individual microchemical chips; A method for producing a microchemical chip, comprising:

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