JP2006026665A - Laser boring method - Google Patents

Laser boring method Download PDF

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JP2006026665A
JP2006026665A JP2004206273A JP2004206273A JP2006026665A JP 2006026665 A JP2006026665 A JP 2006026665A JP 2004206273 A JP2004206273 A JP 2004206273A JP 2004206273 A JP2004206273 A JP 2004206273A JP 2006026665 A JP2006026665 A JP 2006026665A
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hole
laser
laser beam
diameter
predetermined number
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Keiji Iso
圭二 礒
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Sumitomo Heavy Industries Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To perform narrow pitch penetration work with high quality, as regards a laser boring method. <P>SOLUTION: In laser boring work in which a hole 16 larger than a laser beam diameter is bored by rotating the laser beam 20 along the outer periphery of the hole, the boring is suspended for a predetermined period after the rotation of the laser beam 20 for a predetermined number of times and resumed for the predetermined number of times. This process is performed at least once. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、穴の外周に沿ってレーザビームを旋回させることにより、レーザビーム径より大きな穴をあけるレーザ穴あけ加工方法に係る。   The present invention relates to a laser drilling method in which a hole larger than a laser beam diameter is formed by turning a laser beam along the outer periphery of the hole.

図1に示す如く、ガラス繊維13入りの絶縁樹脂12の表裏両面に、導電体である銅箔14が被覆された、厚み0.1〜0.4mm程度のプリント配線基板(PCB)10に、直径200〜300μm程度の貫通穴をあける際、従来は、数値制御により機械的なドリル(メカドリルと称する)を制御する機械式工法が一般的に用いられている。   As shown in FIG. 1, a printed wiring board (PCB) 10 having a thickness of about 0.1 to 0.4 mm, on which both sides of the insulating resin 12 containing glass fibers 13 are coated with a copper foil 14 as a conductor, Conventionally, when a through hole having a diameter of about 200 to 300 μm is formed, a mechanical method for controlling a mechanical drill (called a mechanical drill) by numerical control is generally used.

一方、近年、プリント配線基板の高密度化及び小型化に伴い、直径100μm以下の小径の貫通穴の要求が高まっている。しかしながら、このような小径の貫通穴をメカドリルで開けると、ドリルビットが2000穴程度で破損し、短寿命でランニングコストが高くなるため、直径100μm程度が量産用途の限界であり、より小径加工の工法が望まれている。又、小径化に伴い位置精度が要求されるが、ドリルビットの場合、±50μm程度で、±10μm以下という要求精度を満足できない。   On the other hand, in recent years, with the increase in density and miniaturization of printed wiring boards, there is an increasing demand for through holes having a small diameter of 100 μm or less. However, if such a small-diameter through hole is opened with a mechanical drill, the drill bit will be damaged in about 2000 holes, and the running cost will be high with a short life. Therefore, a diameter of about 100 μm is the limit for mass production, and smaller diameter machining is required. A construction method is desired. In addition, positional accuracy is required as the diameter is reduced, but in the case of a drill bit, the required accuracy of about ± 50 μm and ± 10 μm or less cannot be satisfied.

これは、特に、図2(A)に示すように、リードを持たないフリップチップ(FC)6が、図2(B)に示すように、半田ボール8を介してPCB10に直付けされるFC用PCBの場合に問題となる。即ち、FC用PCBにおいては、図3に拡大して示す如く、貫通穴16の直径D=75μm程度、貫通穴16の間隔P=150μm程度が要求される。   In particular, as shown in FIG. 2 (A), the flip chip (FC) 6 having no lead is directly attached to the PCB 10 via the solder balls 8 as shown in FIG. 2 (B). This is a problem in the case of PCBs for use. That is, in the PCB for FC, as shown in an enlarged view in FIG. 3, the diameter D of the through holes 16 is about 75 μm, and the interval P of the through holes 16 is about 150 μm.

一方、レーザビームを用いて貫通穴をあける方法も開発されており、例えばUVレーザで貫通加工する場合は、(1)貫通穴16の穴径Dに相当するビーム径(スポット径)のレーザビームを、例えば10kHzの固定周波数で連続照射する、いわゆるバースト工法と、(2)図4に示す如く、貫通穴16の穴径より小さいビーム径(スポット径)のレーザビーム20で旋回軌跡を描きながら所望の穴径Dの加工を行なう、いわゆるトレパニング工法(特許文献1、2参照)がある。図において、22は、例えばfθレンズでなる加工レンズ、24は加工ヘッド、26は、PCB10を固定するチャックプレートである。   On the other hand, a method of making a through hole using a laser beam has also been developed. For example, in the case of performing a through process using a UV laser, (1) a laser beam having a beam diameter (spot diameter) corresponding to the hole diameter D of the through hole 16. For example, a so-called burst method that continuously irradiates at a fixed frequency of 10 kHz, and (2) while drawing a turning trajectory with a laser beam 20 having a beam diameter (spot diameter) smaller than the diameter of the through hole 16 as shown in FIG. There is a so-called trepanning method (see Patent Documents 1 and 2) for processing a desired hole diameter D. In the figure, 22 is a processing lens made of, for example, an fθ lens, 24 is a processing head, and 26 is a chuck plate for fixing the PCB 10.

特開2000−263263号公報JP 2000-263263 A 特開2004−87879号公報Japanese Patent Laid-Open No. 2004-87879

しかしながら、両工法共、小径貫通孔16のピッチPが狭まると、図5に示す如く、熱影響により、穴16間の絶縁樹脂12Aが破損して、崩れや欠けが発生するという問題点を有していた。   However, in both methods, when the pitch P of the small-diameter through-holes 16 is narrowed, there is a problem that the insulating resin 12A between the holes 16 is broken due to the thermal effect, causing collapse or chipping as shown in FIG. Was.

本発明は、前記従来の問題点を解消するべくなされたもので、狭ピッチの貫通加工を品質良く実施することを課題とする。   The present invention has been made to solve the above-mentioned conventional problems, and an object of the present invention is to carry out narrow pitch penetration processing with high quality.

本発明は、穴の外周に沿ってレーザビームを旋回させることにより、レーザビーム径より大きな穴をあけるレーザ穴あけ加工方法において、レーザビームを所定回数旋回したら、当該穴の加工を所定時間休止し、再び所定回数旋回する工程を、少なくとも1回行なうことにより、前記課題を解決したものである。   The present invention provides a laser drilling method in which a laser beam is swung a predetermined number of times in a laser drilling method in which a laser beam is swung along the outer periphery of the hole to thereby drill a hole larger than the laser beam diameter. The above-mentioned problem is solved by performing the step of turning again a predetermined number of times at least once.

本発明は、又、前記レーザビームを所定回数旋回したら、当該穴の加工を所定時間休止する工程を、複数回繰り返すようにしたものである。   According to the present invention, the step of pausing the hole for a predetermined time after the laser beam is rotated a predetermined number of times is repeated a plurality of times.

本発明は、又、前記レーザビームとして、波長が400nm以下のパルスレーザを用いるようにしたものである。   In the present invention, a pulse laser having a wavelength of 400 nm or less is used as the laser beam.

本発明によれば、絶縁樹脂に対する熱影響を緩和させ、狭ピッチの貫通加工を品質良く実施することができる。   According to the present invention, it is possible to alleviate the thermal effect on the insulating resin and to carry out narrow pitch penetration processing with high quality.

以下図面を参照して、本発明の実施形態を詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

貫通穴を形成するためには、銅箔層(導電層)の穴あけが必要となる。銅箔14をレーザビーム20により直接加工するためには、吸収率の高い400nm以下の波長(例えば355nm)を持つ高調波固体レーザ(UVレーザ)が適する。第3高調波固体レーザが望ましいが、第4高調波や第5高調波でも構わない。貫通穴16の品質を守るためには、表面銅箔の盛り上がりや飛散物を少なくし、開口率を高くする必要がある。実験の結果、表層銅箔14の厚みが9μm、絶縁樹脂12の厚みが0.3mm、裏面銅箔14の厚みが9μmのPCB10に対して、穴径D=75μmの貫通穴16を穴ピッチP=150μmで形成する場合、ビーム径(スポット径)は、熱影響を避けるため直径50μm以下、パルスエネルギは、銅箔及びガラス材の加工性を良くするため、加工面におけるエネルギ密度を30J/cm2以上とすることが望ましいことが分かった。エネルギが低いと、図6に例示する如く、絶縁樹脂12内のガラス繊維13の先端が、貫通穴16内に突出してしまう。 In order to form the through hole, it is necessary to drill a copper foil layer (conductive layer). In order to directly process the copper foil 14 with the laser beam 20, a harmonic solid-state laser (UV laser) having a high absorption rate and a wavelength of 400 nm or less (for example, 355 nm) is suitable. A third harmonic solid-state laser is desirable, but a fourth harmonic or a fifth harmonic may be used. In order to protect the quality of the through-holes 16, it is necessary to reduce the bulge and scattering of the surface copper foil and increase the aperture ratio. As a result of the experiment, a through hole 16 having a hole diameter D = 75 μm is formed in the hole pitch P with respect to the PCB 10 having the thickness of the surface copper foil 14 of 9 μm, the thickness of the insulating resin 12 of 0.3 mm, and the thickness of the back surface copper foil 14 of 9 μm. = 150 μm, the beam diameter (spot diameter) is 50 μm or less in order to avoid thermal effects, and the pulse energy is 30 J / cm in energy density on the processed surface in order to improve the workability of the copper foil and glass material. It turned out that it is desirable to set it as 2 or more. When the energy is low, the tip of the glass fiber 13 in the insulating resin 12 protrudes into the through hole 16 as illustrated in FIG.

上記エネルギ密度を実現するため、レーザビーム20のスポット径を例えば直径30μmに絞り、例えば外径75μmの貫通穴16を形成する場合は、外周が75μmとなるよう、旋回軌跡でトレパニング加工する。   In order to realize the above energy density, when the spot diameter of the laser beam 20 is reduced to, for example, 30 μm and the through hole 16 having an outer diameter of 75 μm is formed, for example, trepanning is performed on the turning trajectory so that the outer periphery becomes 75 μm.

具体的には、図7に示す如く、ある穴Aに対してレーザビームを1旋回(2旋回でも可)したら、別の穴Bの加工を行ない、一定時間(例えば0.2〜1秒)を空けた後、再び当該穴Aを1旋回(2旋回でも可)して加工する。図8に示す如く、この方法を所定回数繰り返すことで、絶縁樹脂12に対する熱影響を緩和させ、狭ピッチの貫通加工を品質良く実施できる。0.3mm厚のPCBの場合、1穴貫通するのに、10回程度の繰り返しを行なうと良い。   More specifically, as shown in FIG. 7, when the laser beam is turned once (or even two turns) with respect to a certain hole A, another hole B is processed for a certain time (for example, 0.2 to 1 second). After drilling, the hole A is turned once again (two turns are also possible) and processed. As shown in FIG. 8, by repeating this method a predetermined number of times, the thermal effect on the insulating resin 12 can be alleviated, and narrow pitch penetration processing can be performed with good quality. In the case of a PCB having a thickness of 0.3 mm, it is preferable to repeat about 10 times to penetrate one hole.

ここで、紫外線(UV)領域の波長を有するレーザビームとしては、Nd:YAGレーザの第3高調波の他、Nd:YAGレーザの第4若しくは第5高調波を用いることができる。又、Nd:YAGレーザの代わりにYLFレーザやYVO4レーザを用いても良い。又、KrFエキシマレーザやXeClエキシマレーザの基本波を用いても良い。   Here, as the laser beam having a wavelength in the ultraviolet (UV) region, the fourth or fifth harmonic of the Nd: YAG laser can be used in addition to the third harmonic of the Nd: YAG laser. A YLF laser or a YVO4 laser may be used instead of the Nd: YAG laser. Further, a fundamental wave of a KrF excimer laser or a XeCl excimer laser may be used.

なお、前記実施形態においては、銅箔が加工されていたが、加工対象はこれに限定されず、アルミニウム箔や金箔等、他の金属箔も同様に加工できる。加工対象のPCBもFC用に限定されない。   In the embodiment, the copper foil is processed. However, the processing target is not limited to this, and other metal foils such as an aluminum foil and a gold foil can be processed in the same manner. The PCB to be processed is not limited to FC.

加工対象であるプリント配線基板の構成を示す断面図Sectional drawing showing the configuration of the printed wiring board to be processed 同じく(A)フリップチップの底面図及び(B)基板に取付けた状態を示す断面図(A) Bottom view of flip chip and (B) Cross-sectional view showing a state attached to the substrate 同じくフリップチップ用基板の要部拡大平面図Similarly, an enlarged plan view of the main part of a flip chip substrate トレパニング工法を示す(A)断面図及び(B)平面図(A) sectional view and (B) plan view showing trepanning method 本発明が解決すべき課題を示すプリント配線基板の断面図Sectional drawing of the printed wiring board which shows the problem which this invention should solve 同じく他の問題を示すプリント配線基板の断面図Cross-sectional view of a printed wiring board showing other problems 本発明の実施形態の加工方法を示すタイムチャートThe time chart which shows the processing method of the embodiment of the present invention 同じく加工状態を示すプリント配線基板の断面図Cross-sectional view of a printed wiring board showing the processing state

符号の説明Explanation of symbols

10…プリント配線基板(PCB)
12…絶縁樹脂
14…銅箔
16…貫通穴
20…レーザビーム
10 ... Printed wiring board (PCB)
DESCRIPTION OF SYMBOLS 12 ... Insulating resin 14 ... Copper foil 16 ... Through-hole 20 ... Laser beam

Claims (3)

穴の外周に沿ってレーザビームを旋回させることにより、レーザビーム径より大きな穴をあけるレーザ穴あけ加工方法において、
レーザビームを所定回数旋回したら、当該穴の加工を所定時間休止し、再び所定回数旋回する工程を、少なくとも1回行なうことを特徴とするレーザ穴あけ加工方法。
In the laser drilling method of making a hole larger than the laser beam diameter by swirling the laser beam along the outer periphery of the hole,
A laser drilling method characterized in that, when the laser beam is swung a predetermined number of times, the processing of the hole is paused for a predetermined time, and the step of swirling the predetermined number of times is performed at least once.
前記レーザビームを所定回数旋回したら、当該穴の加工を所定時間休止する工程を、複数回繰り返すことを特徴とする請求項1に記載のレーザ穴あけ加工方法。   2. The laser drilling method according to claim 1, wherein, when the laser beam is rotated a predetermined number of times, the step of pausing the hole for a predetermined time is repeated a plurality of times. 前記レーザビームとして、波長が400nm以下のパルスレーザを用いることを特徴とする請求項1又は2に記載のレーザ穴あけ加工方法。   The laser drilling method according to claim 1 or 2, wherein a pulse laser having a wavelength of 400 nm or less is used as the laser beam.
JP2004206273A 2004-07-13 2004-07-13 Laser boring method Pending JP2006026665A (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
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US7665208B2 (en) * 2006-07-04 2010-02-23 Nitto Denko Corporation Through hole forming method
JP2015168226A (en) * 2014-03-10 2015-09-28 株式会社今井金箔 Cutting method and device of gold foil
US20170120390A1 (en) * 2015-10-30 2017-05-04 Laser Systems Inc. Manufacturing method of processed resin substrate and laser processing apparatus
US20180097164A1 (en) * 2016-09-30 2018-04-05 Nichia Corporation Printed board, light emitting device, and method for manufacturing same
JP2020141147A (en) * 2020-05-28 2020-09-03 日亜化学工業株式会社 Printed board, light-emitting device, and methods for manufacturing the same

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7665208B2 (en) * 2006-07-04 2010-02-23 Nitto Denko Corporation Through hole forming method
JP2015168226A (en) * 2014-03-10 2015-09-28 株式会社今井金箔 Cutting method and device of gold foil
US20170120390A1 (en) * 2015-10-30 2017-05-04 Laser Systems Inc. Manufacturing method of processed resin substrate and laser processing apparatus
JP2017080796A (en) * 2015-10-30 2017-05-18 株式会社レーザーシステム Manufacturing method of processing resin substrate, and laser processing device
US11338393B2 (en) 2015-10-30 2022-05-24 Laser Systems Inc. Manufacturing method of processed resin substrate and laser processing apparatus
US20180097164A1 (en) * 2016-09-30 2018-04-05 Nichia Corporation Printed board, light emitting device, and method for manufacturing same
JP2018056456A (en) * 2016-09-30 2018-04-05 日亜化学工業株式会社 Printed board, light-emitting device, and methods for manufacturing the same
US10957836B2 (en) 2016-09-30 2021-03-23 Nichia Corporation Printed board and light emitting device
US10964865B2 (en) 2016-09-30 2021-03-30 Nichia Corporation Printed board, light emitting device, and method for manufacturing same
JP2020141147A (en) * 2020-05-28 2020-09-03 日亜化学工業株式会社 Printed board, light-emitting device, and methods for manufacturing the same
JP7054021B2 (en) 2020-05-28 2022-04-13 日亜化学工業株式会社 Printed circuit boards and light emitting devices and their manufacturing methods

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