JP2006022360A - Partial plating device for electronic component - Google Patents

Partial plating device for electronic component Download PDF

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JP2006022360A
JP2006022360A JP2004200258A JP2004200258A JP2006022360A JP 2006022360 A JP2006022360 A JP 2006022360A JP 2004200258 A JP2004200258 A JP 2004200258A JP 2004200258 A JP2004200258 A JP 2004200258A JP 2006022360 A JP2006022360 A JP 2006022360A
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plating
plating solution
electronic component
cylindrical
container
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Masatoshi Takayama
昌敏 高山
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ETO DENKI KK
ETOU DENKI KK
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ETO DENKI KK
ETOU DENKI KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a partial plating device capable of efficiently applying partial plating with a thick film to an electronic component. <P>SOLUTION: This partial plating device is composed of: a plurality of cylindrical plating liquid retaining vessels opening at both of a tip face and a bottom face; a one-side electrode provided at the inside of each cylindrical plating liquid retaining vessel: a power source electrically connected to the electrode; a plating liquid feeding vessel connected to the bottom face of the opening in each cylindrical plating liquid retaining vessel; a plating liquid recovering vessel provided around the cylindrical plating liquid retaining vessel; and an electronic component temporary retaining tool electrically connected to the other pole in the above power source. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、気密端子などの電子部品に部分めっきを施す装置および該装置を用いる部分めっき方法に関する。   The present invention relates to an apparatus for performing partial plating on an electronic component such as an airtight terminal and a partial plating method using the apparatus.

電子部品のめっき方法として最も一般的に利用されているのは、多数の電子部品を、電源の一方の極に電気的に接続している網篭に収容し、この電子部品を収容した網篭をめっき浴中に浸漬し、めっき浴中に別に用意した電極(前記電源の他方の極に電気的に接続している)と網篭との間に電位差を印加しながら、網篭を回転させる方法である「バレルめっき法」である。   The most commonly used method for plating electronic components is to accommodate a large number of electronic components in a mesh that is electrically connected to one pole of a power supply, and the mesh containing the electronic components. Is immersed in a plating bath, and the mesh cage is rotated while a potential difference is applied between the electrode prepared separately in the plating bath (electrically connected to the other electrode of the power source) and the mesh mesh. This is the “barrel plating method”.

バレルめっき法は、最も単純で、かつ安定しためっき層を電子部品に形成させることのできる方法であるが、一方では、いくつかの問題がある。まず、導電性部位が複数領域ある電子部品の特定の領域のみのめっき処理ができないことがあり、また多量のめっき液を必要とする点である。後者の点は、特に金めっきなどの貴金属めっきを行なう必要がある時に、特に問題となる。   The barrel plating method is the simplest method capable of forming an electronic component with a stable plating layer, but has several problems. First, there is a case where only a specific region of an electronic component having a plurality of conductive parts cannot be plated, and a large amount of plating solution is required. The latter point is particularly problematic when it is necessary to perform precious metal plating such as gold plating.

特許文献1には、気密端子の一方の側のリード部のみをバレル法によりめっき(部分めっき)するために、特別に用意した治具を用いて、非めっき部を保護しながらめっきする装置と方法が記載されている。   Patent Document 1 discloses an apparatus for plating while protecting a non-plated portion using a specially prepared jig in order to plate (partial plating) only a lead portion on one side of an airtight terminal by a barrel method. A method is described.

一方、バレル法ではなく、気密端子の一方の側のリード部のみをめっき処理する方法として、めっき浴に、めっき予定のリード部のみを接触させる方法があるが、この方法では、めっきの進行に伴い、リード部周囲のめっき浴組成が急激に変動するため、厚膜のめっき層の形成が必要な場合には、均一なめっき層の形成が難しいという問題がある。   On the other hand, instead of the barrel method, there is a method in which only the lead portion on one side of the hermetic terminal is plated, and only the lead portion to be plated is brought into contact with the plating bath. Along with this, the plating bath composition around the lead portion changes abruptly, so that it is difficult to form a uniform plating layer when it is necessary to form a thick plating layer.

上記の部分浸漬法を利用して、気密端子の一方の側のリード部のみを均一にめっきする方法としては、長尺のめっき浴を用意し、このめっき浴中でめっき液を長尺方向に沿って移動させ、かつめっき液に接触しているリード部を長尺方向に沿って、めっき液の移動方向と逆の方向に移動させる方法もある。しかしながら、この方法で、厚膜のめっき層を形成しようとすると、めっき層の長さが長大となり、めっき工場におけるめっき装置の配置が難しいという問題が発生する。
特開平10−130881号公報
As a method of uniformly plating only the lead part on one side of the hermetic terminal using the partial immersion method, a long plating bath is prepared, and the plating solution is placed in the long direction in this plating bath. There is also a method of moving the lead portion in contact with the plating solution along the longitudinal direction in the direction opposite to the moving direction of the plating solution. However, when an attempt is made to form a thick plating layer by this method, the length of the plating layer becomes long, which causes a problem that it is difficult to arrange the plating apparatus in the plating factory.
JP-A-10-130881

本発明は、電子部品に対して、特に厚膜の部分めっきを効率よく施すことを可能にする部分めっき装置を提供することを目的とする。   An object of the present invention is to provide a partial plating apparatus that can efficiently perform partial plating of a thick film on an electronic component.

本発明は、頂面と底面の双方にて開口した複数の筒状めっき液保持容器、各筒状めっき液保持容器の内部に備えられた一方の電極、該電極に電気的に接続された電源、各筒状めっき液保持装置の開口底面に接続するめっき液供給容器、筒状めっき保持装置の周囲に備えられためっき液回収容器、そして上記電源の他方の極に電気的に接続された電子部品仮保持具からなる電子部品の部分めっき装置にある。   The present invention includes a plurality of cylindrical plating solution holding containers opened on both the top surface and the bottom surface, one electrode provided in each cylindrical plating solution holding container, and a power source electrically connected to the electrodes A plating solution supply container connected to the bottom of each cylindrical plating solution holding device, a plating solution recovery container provided around the cylindrical plating holding device, and an electron electrically connected to the other electrode of the power source. It is in the partial plating apparatus of the electronic component which consists of a component temporary holder.

本発明の部分めっき装置の好ましい構成を次に記載する。
(1)複数の筒状めっき液保持容器が、めっき液回収容器を介して直列に並べられている。
(2)複数の筒状めっき液保持容器が、めっき液回収容器を介して直列に、かつ円弧状に並べられている。
(3)電源が、パルス電流を発生させることのできる電源である。
(4)筒状めっき液保持容器の各々に開口底面に接続するめっき液供給容器が互いに接続している。
(5)各筒状めっき保持装置の周囲に備えられた各々のめっき液回収容器が互いに接続している。
A preferred configuration of the partial plating apparatus of the present invention will be described below.
(1) A plurality of cylindrical plating solution holding containers are arranged in series via the plating solution recovery container.
(2) A plurality of cylindrical plating solution holding containers are arranged in series and arcuately via the plating solution recovery container.
(3) The power source is a power source capable of generating a pulse current.
(4) A plating solution supply container connected to the bottom of the opening is connected to each of the cylindrical plating solution holding containers.
(5) The respective plating solution recovery containers provided around each cylindrical plating holding device are connected to each other.

本発明はまた、上記の本発明の部分めっき装置を用意する工程;部分めっきの対象の電子部品のめっき予定部位と電気的に接続している導電性部位に電子部品仮保持具を接続して、電子部品を仮支持する工程;めっき液供給容器より、複数の筒状めっき液保持容器に、その底部から、めっき液を、該保持容器開口頂部にてめっき液を表面張力により盛り上がるように維持しながら供給し、次いで該めっき液をめっき液回収容器に流入させる工程;電子部品のめっき予定部位のみを、第一の筒状めっき液保持容器内のめっき液に接触させ、上記電子部品仮保持具と筒状めっき液保持用具の内部に備えられた電極との間に電位差を印加して、該電子部品のめっき液接触部位に第一次のめっき処理を施す工程;該電子部品を該めっき液保持容器より取り出す工程;次いで上記工程で第一次のめっき処理が施された電子部品を第二の筒状めっき液保持容器内のめっき液に接触させ、該電子部品の第一次のめっき処理が施された部位に同様にして第二次のめっき処理を施す工程;さらにこのめっき処理工程を所望回数繰り返す工程;複数回の部分めっき処理を施した電子部品のめっき処理部位を洗浄し、乾燥する工程からなる電子部品の部分めっき方法にもある。   The present invention is also a step of preparing the partial plating apparatus of the present invention described above; an electronic component temporary holder is connected to a conductive portion electrically connected to a planned plating portion of an electronic component to be partially plated. , A step of temporarily supporting electronic components; from a plating solution supply container to a plurality of cylindrical plating solution holding containers, and maintaining the plating solution from the bottom so that the plating solution rises due to surface tension at the top of the holding container opening Supplying the plating solution to the plating solution recovery container; bringing only the planned plating part of the electronic component into contact with the plating solution in the first cylindrical plating solution holding container, and temporarily holding the electronic component Applying a potential difference between the tool and an electrode provided inside the cylindrical plating solution holding tool to subject the plating component contact portion of the electronic component to a primary plating treatment; From liquid holding container Next, the electronic component subjected to the first plating process in the above step is brought into contact with the plating solution in the second cylindrical plating solution holding container, and the first plating process of the electronic component is performed. A step of performing a second plating process in the same manner on the formed portion; a step of repeating this plating step a desired number of times; a step of washing and drying a plating portion of an electronic component that has been subjected to a plurality of partial plating treatments There is also a method for partial plating of electronic parts comprising:

本発明の部分めっき装置を用いることにより、比較的コンパクトなめっき装置にて、各種の電子部品に対して、厚膜の部分めっきを効率よく施すことが可能になる。   By using the partial plating apparatus of the present invention, it is possible to efficiently perform partial plating of thick films on various electronic components with a relatively compact plating apparatus.

本発明の部分めっき装置について、添付図面を参照しながら詳しく説明する。   The partial plating apparatus of this invention is demonstrated in detail, referring an accompanying drawing.

図1は、本発明の部分めっき装置を利用してめっき処理する対象の代表的な電子部品である気密端子のステム(ステム部分)の構成を示す斜視図である。図1において、ステム1は、気密容器部(図示せず)とはめ合わされて気密容器を形成する台座部11と上側リード部12a、12b、そして上側リード部12a、12bに各々電気的に接続している下側リード部13a、13b、そして絶縁材料部14a、14bから構成されている。なお、本発明の部分めっきの対象となる電子部品は、図1に示すようなステム(部分)に限られるものではなく、ひとつの部品内にめっき対象導電性部位と非めっき対象導電性部位とが存在し、それらの部位が電気的に接続している電子部品であれば、特に制限はない。   FIG. 1 is a perspective view showing a configuration of a stem (stem portion) of an airtight terminal which is a representative electronic component to be plated using the partial plating apparatus of the present invention. In FIG. 1, a stem 1 is electrically connected to a pedestal portion 11, upper lead portions 12a and 12b, and upper lead portions 12a and 12b, which are fitted with an airtight container portion (not shown) to form an airtight container. Lower lead portions 13a and 13b and insulating material portions 14a and 14b. In addition, the electronic component which becomes the object of the partial plating of this invention is not restricted to a stem (part) as shown in FIG. 1, The electroconductive part for plating and the electroconductive part for non-plating are contained in one component. There is no particular limitation as long as the electronic components are present and their parts are electrically connected.

図2は、図1の気密端子を用いた自動車搭載エアバックの膨張を発生させるための起爆装置の構成の例を示す断面図である。図2において、図1で説明したステムの上側リード部12aと12bの間にはニクロム線のような通電発熱体15が架けられる。そして、台座部11の上部に火薬16が充填された状態で、台座部11に、気密容器17がはめ合わされる。すなわち、下側リード部13aと13bとの間に電流が流れると、通電発熱体15が発熱して、火薬16が発火して、気密容器17を爆破し、気密容器の周囲に装着されているエアバック(図示せず)を急速に膨張させることができる。   FIG. 2 is a cross-sectional view showing an example of the configuration of a detonator for generating expansion of an automobile-mounted airbag using the airtight terminal of FIG. In FIG. 2, an energization heating element 15 such as a nichrome wire is placed between the upper lead portions 12a and 12b of the stem described in FIG. And the airtight container 17 is fitted to the base part 11 in the state where the upper part of the base part 11 was filled with the explosive 16. That is, when a current flows between the lower lead portions 13a and 13b, the energization heating element 15 generates heat, the explosive 16 ignites, blows up the hermetic container 17, and is mounted around the hermetic container. An airbag (not shown) can be inflated rapidly.

図3は、本発明の部分めっき装置と、このめっき装置を利用する部分めっき作業を説明する模式図である。
本発明のめっき装置は、頂面と底面の双方にて開口した複数の筒状めっき液保持容器31a、31b、31c、各筒状めっき液保持容器の内部に備えられた一方の電極32a、32b、32c、該電極に同一の極にて電気的に接続された電源33a、33b、33c、各筒状めっき液保持装置の開口底面に接続するめっき液供給容器34、筒状めっき保持装置の周囲に備えられためっき液回収容器35、そして上記電源33a、33b、33cの他方の極に電気的に接続された電子部品仮保持具36a、36b、36cから構成されている。電源は、各めっき液保持容器毎に独立に用意する必要はなく、共通の電源を切り換え式で使用してもよい。また、めっき液供給容器、そしてめっき液回収容器は、各めっき液保持容器に対して、ひとつずつ用意してもよい。めっき液供給容器34は通常、めっき液供給源(図示せず)に接続しており、まためっき液回収容器35も通常は、別に用意するめっき液溜め(図示せず)に接続している。
FIG. 3 is a schematic diagram for explaining a partial plating apparatus of the present invention and a partial plating operation using the plating apparatus.
The plating apparatus of the present invention includes a plurality of cylindrical plating solution holding containers 31a, 31b, 31c opened at both the top surface and the bottom surface, and one electrode 32a, 32b provided inside each cylindrical plating solution holding container. 32c, power supplies 33a, 33b, 33c electrically connected to the electrodes at the same pole, plating solution supply container 34 connected to the bottom of the opening of each cylindrical plating solution holding device, and surroundings of the cylindrical plating holding device And the electronic component temporary holders 36a, 36b, and 36c electrically connected to the other poles of the power supplies 33a, 33b, and 33c. It is not necessary to prepare a power source independently for each plating solution holding container, and a common power source may be used in a switching manner. One plating solution supply container and one plating solution recovery container may be prepared for each plating solution holding container. The plating solution supply container 34 is normally connected to a plating solution supply source (not shown), and the plating solution recovery container 35 is also usually connected to a separately prepared plating solution reservoir (not shown).

次に、図3に示した部分めっき装置を用いて、図1に示したステムの下側リード13a、13bにめっきを施す操作について説明する。   Next, an operation for plating the lower leads 13a and 13b of the stem shown in FIG. 1 using the partial plating apparatus shown in FIG. 3 will be described.

まず、図3の部分めっき装置を用意し、部分めっきの対象のステム1のめっき予定部位(下側リード部)と電気的に接続している導電性部位(上側リード部)に電子部品仮保持具36aを接続して、電子部品を仮保持する。この仮保持と同時、あるいは前後して、めっき液供給容器34より、筒状めっき液保持容器31aに、その底部から、めっき液を、該保持容器開口頂部にてめっき液を表面張力により盛り上がるように維持しながら供給し、次いで該めっき液をめっき液回収容器35に流入させる。なお、めっき液供給容器は通常、各円筒状めっき液保持容器の底部に連結しているため、各円筒状めっき液保持容器31a、31b、31cには同時にめっき液が供給される。そして、めっき液は、円筒状めっき液保持容器内を上昇し、該円筒状容器の頂面にて表面張力により中央で盛り上がった状態を維持しながらあふれ出て、円筒状容器の周囲に設けられているめっき液回収容器35に流れ込む。   First, the partial plating apparatus shown in FIG. 3 is prepared, and electronic parts are temporarily held in a conductive portion (upper lead portion) electrically connected to a plating scheduled portion (lower lead portion) of the stem 1 to be partially plated. The tool 36a is connected to temporarily hold the electronic component. Simultaneously with or before or after the temporary holding, the plating solution is supplied from the plating solution supply container 34 to the cylindrical plating solution holding container 31a from the bottom thereof, and the plating solution is raised by the surface tension at the top of the holding container opening. Then, the plating solution is supplied to the plating solution recovery container 35. Since the plating solution supply container is normally connected to the bottom of each cylindrical plating solution holding container, the plating solution is supplied to each cylindrical plating solution holding container 31a, 31b, 31c at the same time. Then, the plating solution rises in the cylindrical plating solution holding container, overflows while maintaining a state where the top surface of the cylindrical container is raised by the surface tension, and is provided around the cylindrical container. Into the plating solution recovery container 35.

円筒状容器内のめっき液が上記の状態にある段階で、電子部品仮保持具36aで接続され、仮保持されているステムの下側リード部をめっき液の頂部から差し入れ、図3に示されているように、その下側リード部の略全体をめっき液に接触させる。そして、この状態で、電子部品仮保持具36aと筒状めっき液保持用具の内部に備えられた電極32aとの間に電位差をパルス的に印加して、該電子部品のめっき液接触部位(下側リード部)に第一次のめっき処理(通常は、1〜5秒間)を施し、その後、該電子部品を該めっき液保持容器より取り出す。次いで、上記工程で第一次のめっき処理が施された電子部品を第二の筒状めっき液保持容器内のめっき液に接触させ、該電子部品の第一次のめっき処理が施された部位に同様にして第二次のめっき処理を施す。さらに、必要に応じて、このめっき処理工程を所望回数繰り返し、このようにして複数回の部分めっき処理を施す。その後、電子部品のめっき処理部位を洗浄し、最後に乾燥を行なって電子部品の部分めっきを完了する。   At the stage where the plating solution in the cylindrical container is in the above state, the lower lead portion of the stem which is connected by the electronic component temporary holder 36a and temporarily held is inserted from the top of the plating solution, and is shown in FIG. As shown, the entire lower lead portion is brought into contact with the plating solution. Then, in this state, a potential difference is applied in a pulsed manner between the electronic component temporary holder 36a and the electrode 32a provided inside the cylindrical plating solution holding tool, so that the plating solution contact portion of the electronic component (lower The first lead treatment (usually 1 to 5 seconds) is performed on the side lead portion, and then the electronic component is taken out from the plating solution holding container. Next, the electronic component that has been subjected to the primary plating process in the above step is brought into contact with the plating solution in the second cylindrical plating solution holding container, and the part of the electronic component that has been subjected to the primary plating process Similarly, the second plating process is performed. Further, if necessary, this plating process is repeated a desired number of times, and thus a plurality of partial plating processes are performed. Thereafter, the plating part of the electronic component is washed and finally dried to complete the partial plating of the electronic component.

本発明の部分めっき装置において、円筒状めっき液保持容器(めっき浴)は、二個以上用いるが、厚いめっき層を形成させるためには、4〜8個程度の円筒状めっき液保持容器を直列で図3のように、めっき液回収容器を介して直列に配列して用いることが望ましい。   In the partial plating apparatus of the present invention, two or more cylindrical plating solution holding containers (plating baths) are used. In order to form a thick plating layer, about 4 to 8 cylindrical plating solution holding containers are connected in series. Thus, as shown in FIG. 3, it is desirable to use them arranged in series via a plating solution recovery container.

図4は、5の円筒状めっき液保持容器31a、31b、31c、31d、31eを直列に、円弧状に配置して構成した部分めっき装置の構成を示す平面図である。なお、電子部品のめっき処理を行なう場合には通常、めっき処理を行なう前に、まず前処理(洗浄、脱脂、酸処理など)を行ない、まためっき処理の終了後には、洗浄(水洗浄、純水洗浄)と乾燥が行なわれる。従って、図4のめっき装置では、前処理部37、38、そして後処理部39が設けられている。矢印は、それぞれ電子部品の供給位置と排出位置を示している。図4の直列かつ円弧状に配置した円筒状めっき液保持容器の個数は、二個以上であれば特に制限はなく、また前処理部と後処理部の個数についても特に制限はない。   FIG. 4 is a plan view showing a configuration of a partial plating apparatus in which five cylindrical plating solution holding containers 31a, 31b, 31c, 31d, and 31e are arranged in series in an arc shape. In general, when performing plating treatment of electronic parts, first, pretreatment (cleaning, degreasing, acid treatment, etc.) is performed before the plating treatment, and after the plating treatment is finished, washing (water washing, pure treatment) is performed. Water washing) and drying. Therefore, in the plating apparatus of FIG. 4, pretreatment units 37 and 38 and a posttreatment unit 39 are provided. The arrows indicate the supply position and discharge position of the electronic components, respectively. The number of cylindrical plating solution holding containers arranged in series and in an arc shape in FIG. 4 is not particularly limited as long as it is two or more, and the number of pretreatment units and posttreatment units is not particularly limited.

本発明の部分めっき装置を利用してめっき処理する対象の代表的な電子部品である気密端子のステム部分の構成を示す斜視図である。It is a perspective view which shows the structure of the stem part of the airtight terminal which is a typical electronic component of the object plated using the partial plating apparatus of this invention. 図1の気密端子を用いた自動車搭載エアバックの膨張を発生させるための起爆装置の構成の例を示す断面図である。It is sectional drawing which shows the example of a structure of the detonator for generating the expansion | swelling of the airbag mounted on a motor vehicle using the airtight terminal of FIG. 本発明の部分めっき装置と、このめっき装置を利用するめっき作業を説明する模式図である。It is a schematic diagram explaining the plating operation using the partial plating apparatus of this invention and this plating apparatus. 本発明の部分めっき装置の別のタイプの構成例を示す模式平面図である。It is a schematic plan view which shows another type of structural example of the partial plating apparatus of this invention.

符号の説明Explanation of symbols

1 ステム
11 台座部
12a,12b 上側リード部
13a,13b 下側リード部
14a,14b 絶縁材料部
15 通電発熱体(ニクロム線)
16 火薬
17 気密容器
31a,31b,31c 円筒状めっき液保持容器
32a,32b,32c 電極
33a,33b,33c 電源
34 めっき液供給容器
35 めっき液回収容器
36a,36b,36c 電子部品仮保持具
37,38 前処理部
39 後処理部
DESCRIPTION OF SYMBOLS 1 Stem 11 Base part 12a, 12b Upper lead part 13a, 13b Lower lead part 14a, 14b Insulation material part 15 Electric heating element (Nichrome wire)
16 Gunpowder 17 Airtight containers 31a, 31b, 31c Cylindrical plating solution holding containers 32a, 32b, 32c Electrodes 33a, 33b, 33c Power supply 34 Plating solution supply container 35 Plating solution recovery containers 36a, 36b, 36c Electronic parts temporary holder 37, 38 Pre-processing unit 39 Post-processing unit

Claims (6)

頂面と底面の双方にて開口した複数の筒状めっき液保持容器、各筒状めっき液保持容器の内部に備えられた一方の電極、該電極に電気的に接続された電源、各筒状めっき液保持装置の開口底面に接続するめっき液供給容器、筒状めっき保持装置の周囲に備えられためっき液回収容器、そして上記電源の他方の極に電気的に接続された電子部品仮保持具からなる電子部品の部分めっき装置。   A plurality of cylindrical plating solution holding containers opened on both the top surface and the bottom surface, one electrode provided in each cylindrical plating solution holding container, a power source electrically connected to the electrodes, and each cylindrical shape A plating solution supply container connected to the bottom of the opening of the plating solution holding device, a plating solution recovery container provided around the cylindrical plating holding device, and an electronic component temporary holder electrically connected to the other electrode of the power source A partial plating apparatus for electronic parts. 複数の筒状めっき液保持容器が、めっき液回収容器を介して直列に並べられてなる請求項1に記載の電子部品の部分めっき装置。   The partial plating apparatus for an electronic component according to claim 1, wherein the plurality of cylindrical plating solution holding containers are arranged in series via the plating solution recovery container. 電源が、パルス電流を発生させることのできる電源である請求項1もしくは2に記載の電子部品の部分めっき装置。   The partial plating apparatus for electronic parts according to claim 1 or 2, wherein the power source is a power source capable of generating a pulse current. 筒状めっき液保持容器の各々に開口底面に接続するめっき液供給容器が互いに接続している請求項1乃至3のうちのいずれかの項に記載の電子部品の部分めっき装置。   The partial plating apparatus for electronic parts according to any one of claims 1 to 3, wherein a plating solution supply container connected to the bottom surface of the opening is connected to each of the cylindrical plating solution holding containers. 各筒状めっき保持装置の周囲に備えられた各々のめっき液回収容器が互いに接続している請求項1乃至4のうちのいずれかの項に記載の電子部品の部分めっき装置。   The partial plating apparatus of the electronic component according to any one of claims 1 to 4, wherein the plating solution recovery containers provided around the cylindrical plating holding devices are connected to each other. 請求項1乃至5のうちのいずれかの項に記載の電子部品の部分めっき装置を用意する工程;部分めっきの対象の電子部品のめっき予定部位と電気的に接続している導電性部位に電子部品仮保持具を接続して、電子部品を仮保持する工程;めっき液供給容器より、複数の筒状めっき液保持容器に、その底部から、めっき液を、該保持容器開口頂部にてめっき液を表面張力により盛り上がるように維持しながら供給し、次いで該めっき液をめっき液回収容器に流入させる工程;電子部品のめっき予定部位のみを、第一の筒状めっき液保持容器内のめっき液に接触させ、上記電子部品仮保持具と筒状めっき液保持用具の内部に備えられた電極との間に電位差を印加して、該電子部品のめっき液接触部位に第一次のめっき処理を施す工程;該電子部品を該めっき液保持容器より取り出す工程;次いで上記工程で第一次のめっき処理が施された電子部品を第二の筒状めっき液保持容器内のめっき液に接触させ、該電子部品の第一次のめっき処理が施された部位に同様にして第二次のめっき処理を施す工程;さらにこのめっき処理工程を所望回数繰り返す工程;複数回の部分めっき処理を施した電子部品のめっき処理部位を洗浄し、乾燥する工程からなる電子部品の部分めっき方法。
A step of preparing a partial plating apparatus for an electronic component according to any one of claims 1 to 5; an electron in a conductive portion electrically connected to a planned plating portion of an electronic component to be partially plated A step of temporarily holding an electronic component by connecting a component temporary holder; from a plating solution supply container to a plurality of cylindrical plating solution holding containers, and from the bottom of the plating solution, a plating solution at the top of the holding container opening The step of supplying the plating solution to the plating solution recovery container while maintaining the surface so as to rise due to the surface tension; the plating solution in the first cylindrical plating solution holding container is used only for the planned plating portion of the electronic component. Applying a potential difference between the electronic component temporary holding tool and the electrode provided inside the cylindrical plating solution holding tool to perform a first plating process on the plating solution contact portion of the electronic component Step; the electronic component Step of removing from the plating solution holding container; Next, the electronic component subjected to the first plating process in the above step is brought into contact with the plating solution in the second cylindrical plating solution holding container to A step of performing the second plating process in the same manner on the portion subjected to the plating treatment; a step of repeating this plating treatment step as many times as desired; and washing a plating treatment portion of an electronic component that has been subjected to a plurality of partial plating treatments And a method for partially plating electronic parts comprising a drying step.
JP2004200258A 2004-07-07 2004-07-07 Partial plating device for electronic component Withdrawn JP2006022360A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120175260A1 (en) * 2009-05-13 2012-07-12 Rolf Keller Device And Method For Simultaneous Coating Or De-Coating Of A Plurality Of Workpieces And Workpiece
KR101342359B1 (en) 2011-10-31 2013-12-16 이병록 Surface treatment method for nut bore
CN111188077A (en) * 2020-01-16 2020-05-22 陈远 Clamp for nickel plating protection

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120175260A1 (en) * 2009-05-13 2012-07-12 Rolf Keller Device And Method For Simultaneous Coating Or De-Coating Of A Plurality Of Workpieces And Workpiece
JP2012526913A (en) * 2009-05-13 2012-11-01 ローベルト ボツシユ ゲゼルシヤフト ミツト ベシユレンクテル ハフツング APPARATUS, METHOD, CARTRIDGE FOR APPARATUS, AND WORK PRODUCT FOR COATING A PLURALITY OF WORK PARENTS OR REMOVING A COATING FROM MULTIPLE WORKS simultaneously
US9200376B2 (en) * 2009-05-13 2015-12-01 Robert Bosch Gmbh Device and method for simultaneous coating or de-coating of a plurality of workpieces and workpiece
KR101342359B1 (en) 2011-10-31 2013-12-16 이병록 Surface treatment method for nut bore
CN111188077A (en) * 2020-01-16 2020-05-22 陈远 Clamp for nickel plating protection

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