JP2006019437A5 - - Google Patents

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Publication number
JP2006019437A5
JP2006019437A5 JP2004194773A JP2004194773A JP2006019437A5 JP 2006019437 A5 JP2006019437 A5 JP 2006019437A5 JP 2004194773 A JP2004194773 A JP 2004194773A JP 2004194773 A JP2004194773 A JP 2004194773A JP 2006019437 A5 JP2006019437 A5 JP 2006019437A5
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JP
Japan
Prior art keywords
charged particle
particle beam
exposure time
pattern
substrate
Prior art date
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Granted
Application number
JP2004194773A
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English (en)
Japanese (ja)
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JP4402529B2 (ja
JP2006019437A (ja
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Priority to JP2004194773A priority Critical patent/JP4402529B2/ja
Priority claimed from JP2004194773A external-priority patent/JP4402529B2/ja
Publication of JP2006019437A publication Critical patent/JP2006019437A/ja
Publication of JP2006019437A5 publication Critical patent/JP2006019437A5/ja
Application granted granted Critical
Publication of JP4402529B2 publication Critical patent/JP4402529B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004194773A 2004-06-30 2004-06-30 荷電粒子線露光方法、荷電粒子線露光装置及びデバイス製造方法 Expired - Fee Related JP4402529B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004194773A JP4402529B2 (ja) 2004-06-30 2004-06-30 荷電粒子線露光方法、荷電粒子線露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004194773A JP4402529B2 (ja) 2004-06-30 2004-06-30 荷電粒子線露光方法、荷電粒子線露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006019437A JP2006019437A (ja) 2006-01-19
JP2006019437A5 true JP2006019437A5 (cg-RX-API-DMAC10.html) 2007-08-16
JP4402529B2 JP4402529B2 (ja) 2010-01-20

Family

ID=35793430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004194773A Expired - Fee Related JP4402529B2 (ja) 2004-06-30 2004-06-30 荷電粒子線露光方法、荷電粒子線露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP4402529B2 (cg-RX-API-DMAC10.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008004596A (ja) * 2006-06-20 2008-01-10 Canon Inc 荷電粒子線描画方法、露光装置、及びデバイス製造方法
JP5116996B2 (ja) * 2006-06-20 2013-01-09 キヤノン株式会社 荷電粒子線描画方法、露光装置、及びデバイス製造方法

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