|
US7372541B2
(en)
|
2002-11-12 |
2008-05-13 |
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Lithographic apparatus and device manufacturing method
|
|
SG135052A1
(en)
|
2002-11-12 |
2007-09-28 |
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Lithographic apparatus and device manufacturing method
|
|
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(ko)
|
2003-04-10 |
2014-08-19 |
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|
|
SG141426A1
(en)
|
2003-04-10 |
2008-04-28 |
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Environmental system including vacuum scavange for an immersion lithography apparatus
|
|
SG139733A1
(en)
|
2003-04-11 |
2008-02-29 |
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|
|
TWI442694B
(zh)
*
|
2003-05-30 |
2014-06-21 |
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|
|
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(ko)
|
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|
|
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(ko)
*
|
2004-01-05 |
2014-09-17 |
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|
|
US7589822B2
(en)
|
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2009-09-15 |
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Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
|
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(ko)
|
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2013-04-05 |
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|
|
US7486381B2
(en)
|
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2009-02-03 |
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Lithographic apparatus and device manufacturing method
|
|
US7522261B2
(en)
*
|
2004-09-24 |
2009-04-21 |
Asml Netherlands B.V. |
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|
|
US7119876B2
(en)
*
|
2004-10-18 |
2006-10-10 |
Asml Netherlands B.V. |
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|
|
US7583357B2
(en)
*
|
2004-11-12 |
2009-09-01 |
Asml Netherlands B.V. |
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|
|
US20070132976A1
(en)
*
|
2005-03-31 |
2007-06-14 |
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|
|
US7411654B2
(en)
|
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2008-08-12 |
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Lithographic apparatus and device manufacturing method
|
|
US7834974B2
(en)
*
|
2005-06-28 |
2010-11-16 |
Asml Netherlands B.V. |
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|
|
US7170583B2
(en)
*
|
2005-06-29 |
2007-01-30 |
Asml Netherlands B.V. |
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|
|
US7432513B2
(en)
*
|
2005-10-21 |
2008-10-07 |
Asml Netherlands B.V. |
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|
|
US8125610B2
(en)
|
2005-12-02 |
2012-02-28 |
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Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
|
|
US7728952B2
(en)
*
|
2007-01-25 |
2010-06-01 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Method and system for closing plate take-over in immersion lithography
|
|
US8654305B2
(en)
*
|
2007-02-15 |
2014-02-18 |
Asml Holding N.V. |
Systems and methods for insitu lens cleaning in immersion lithography
|
|
US8817226B2
(en)
*
|
2007-02-15 |
2014-08-26 |
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|
|
NL1035908A1
(nl)
|
2007-09-25 |
2009-03-26 |
Asml Netherlands Bv |
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|
|
JP2009094145A
(ja)
*
|
2007-10-04 |
2009-04-30 |
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露光装置、露光方法およびデバイス製造方法
|
|
NL2005586A
(en)
*
|
2009-12-02 |
2011-06-06 |
Asml Netherlands Bv |
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|
|
EP2381310B1
(en)
|
2010-04-22 |
2015-05-06 |
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Fluid handling structure and lithographic apparatus
|
|
US9341942B2
(en)
*
|
2010-08-24 |
2016-05-17 |
Nikon Research Corporation Of America |
Vacuum chamber assembly for supporting a workpiece
|
|
NL2008199A
(en)
*
|
2011-02-28 |
2012-08-29 |
Asml Netherlands Bv |
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|
|
NL2008695A
(en)
*
|
2011-05-25 |
2012-11-27 |
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|
|
JP5809364B2
(ja)
*
|
2011-11-22 |
2015-11-10 |
エーエスエムエル ネザーランズ ビー．ブイ． |
露光装置
|
|
NL2010916A
(en)
|
2012-07-06 |
2014-01-07 |
Asml Netherlands Bv |
A lithographic apparatus.
|
|
US9568828B2
(en)
*
|
2012-10-12 |
2017-02-14 |
Nikon Corporation |
Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
|
|
NL2014893A
(en)
*
|
2014-07-04 |
2016-03-31 |
Asml Netherlands Bv |
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|
|
US11397385B2
(en)
|
2016-06-17 |
2022-07-26 |
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|
|
CN107783283B
(zh)
*
|
2016-08-30 |
2020-01-24 |
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|
|
CN109283797B
(zh)
*
|
2017-07-21 |
2021-04-30 |
上海微电子装备（集团）股份有限公司 |
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|
|
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(en)
*
|
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|
|
WO2020216643A1
(en)
*
|
2019-04-26 |
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|
|
WO2021032356A1
(en)
*
|
2019-08-20 |
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|
|
WO2021133436A1
(en)
*
|
2019-12-26 |
2021-07-01 |
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|
|
EP3919978A1
(en)
*
|
2020-06-05 |
2021-12-08 |
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|
|
US11740564B2
(en)
*
|
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|
|
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(zh)
*
|
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|
|
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(de)
*
|
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|