|
US7372541B2
(en)
|
2002-11-12 |
2008-05-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
KR100585476B1
(ko)
|
2002-11-12 |
2006-06-07 |
에이에스엠엘 네델란즈 비.브이. |
리소그래피 장치 및 디바이스 제조방법
|
|
WO2004090634A2
(en)
|
2003-04-10 |
2004-10-21 |
Nikon Corporation |
Environmental system including vaccum scavange for an immersion lithography apparatus
|
|
KR101177330B1
(ko)
|
2003-04-10 |
2012-08-30 |
가부시키가이샤 니콘 |
액침 리소그래피 장치
|
|
KR101159564B1
(ko)
|
2003-04-11 |
2012-06-25 |
가부시키가이샤 니콘 |
액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침액체를 유지하는 장치 및 방법
|
|
TWI347741B
(en)
*
|
2003-05-30 |
2011-08-21 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
TWI515770B
(zh)
|
2003-06-19 |
2016-01-01 |
尼康股份有限公司 |
An exposure apparatus, an exposure method, and an element manufacturing method
|
|
EP3376523A1
(en)
*
|
2004-01-05 |
2018-09-19 |
Nikon Corporation |
Exposure apparatus, exposure method, and device producing method
|
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
|
KR101851511B1
(ko)
|
2004-03-25 |
2018-04-23 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US7486381B2
(en)
*
|
2004-05-21 |
2009-02-03 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7522261B2
(en)
*
|
2004-09-24 |
2009-04-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7119876B2
(en)
*
|
2004-10-18 |
2006-10-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7583357B2
(en)
*
|
2004-11-12 |
2009-09-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US20070132976A1
(en)
*
|
2005-03-31 |
2007-06-14 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
US7411654B2
(en)
|
2005-04-05 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7834974B2
(en)
|
2005-06-28 |
2010-11-16 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7170583B2
(en)
*
|
2005-06-29 |
2007-01-30 |
Asml Netherlands B.V. |
Lithographic apparatus immersion damage control
|
|
US7432513B2
(en)
*
|
2005-10-21 |
2008-10-07 |
Asml Netherlands B.V. |
Gas shower, lithographic apparatus and use of a gas shower
|
|
US8125610B2
(en)
|
2005-12-02 |
2012-02-28 |
ASML Metherlands B.V. |
Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
|
|
US7728952B2
(en)
*
|
2007-01-25 |
2010-06-01 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Method and system for closing plate take-over in immersion lithography
|
|
US8817226B2
(en)
*
|
2007-02-15 |
2014-08-26 |
Asml Holding N.V. |
Systems and methods for insitu lens cleaning using ozone in immersion lithography
|
|
US8654305B2
(en)
*
|
2007-02-15 |
2014-02-18 |
Asml Holding N.V. |
Systems and methods for insitu lens cleaning in immersion lithography
|
|
NL1035908A1
(nl)
|
2007-09-25 |
2009-03-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method.
|
|
JP2009094145A
(ja)
*
|
2007-10-04 |
2009-04-30 |
Canon Inc |
露光装置、露光方法およびデバイス製造方法
|
|
NL2005586A
(en)
*
|
2009-12-02 |
2011-06-06 |
Asml Netherlands Bv |
Lithographic apparatus and sealing device for a lithographic apparatus.
|
|
EP2381310B1
(en)
|
2010-04-22 |
2015-05-06 |
ASML Netherlands BV |
Fluid handling structure and lithographic apparatus
|
|
US9341942B2
(en)
*
|
2010-08-24 |
2016-05-17 |
Nikon Research Corporation Of America |
Vacuum chamber assembly for supporting a workpiece
|
|
NL2008199A
(en)
|
2011-02-28 |
2012-08-29 |
Asml Netherlands Bv |
A fluid handling structure, a lithographic apparatus and a device manufacturing method.
|
|
NL2008695A
(en)
*
|
2011-05-25 |
2012-11-27 |
Asml Netherlands Bv |
Lithographic apparatus comprising substrate table.
|
|
WO2013075878A1
(en)
*
|
2011-11-22 |
2013-05-30 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
NL2010916A
(en)
|
2012-07-06 |
2014-01-07 |
Asml Netherlands Bv |
A lithographic apparatus.
|
|
US9568828B2
(en)
*
|
2012-10-12 |
2017-02-14 |
Nikon Corporation |
Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
|
|
JP6537194B2
(ja)
*
|
2014-07-04 |
2019-07-03 |
エーエスエムエル ネザーランズ ビー．ブイ． |
リソグラフィ装置及びリソグラフィ装置を用いてデバイスを製造する方法
|
|
US11397385B2
(en)
|
2016-06-17 |
2022-07-26 |
Taiwan Semiconductor Manufacturing Company, Ltd |
Apparatus and a method of forming a particle shield
|
|
CN107783283B
(zh)
*
|
2016-08-30 |
2020-01-24 |
上海微电子装备（集团）股份有限公司 |
镜片防污染装置及方法
|
|
CN109283797B
(zh)
*
|
2017-07-21 |
2021-04-30 |
上海微电子装备（集团）股份有限公司 |
物镜保护装置、物镜系统以及光刻设备
|
|
EP3620858B1
(en)
*
|
2018-09-10 |
2023-11-01 |
Canon Kabushiki Kaisha |
Exposure apparatus and method of manufacturing article
|
|
KR102894806B1
(ko)
*
|
2019-04-26 |
2025-12-04 |
에이에스엠엘 홀딩 엔.브이. |
리소그래피 장치 및 조명 균일성 보정 시스템
|
|
EP4018262B1
(en)
|
2019-08-20 |
2023-06-21 |
ASML Netherlands B.V. |
Substrate holder and lithographic apparatus
|
|
EP3918421B1
(en)
*
|
2019-12-26 |
2024-05-15 |
Nanjing ZongAn Semiconductor Equipment Ltd |
Tool architecture for wafer geometry measurement in semiconductor industry
|
|
EP3919978A1
(en)
*
|
2020-06-05 |
2021-12-08 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Apparatus and a method of forming a particle shield
|
|
US11740564B2
(en)
*
|
2020-06-18 |
2023-08-29 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Lithography apparatus and method using the same
|
|
CN113262956B
(zh)
*
|
2021-07-21 |
2021-10-15 |
四川洪芯微科技有限公司 |
一种半导体晶圆表面处理装置
|
|
DE102023204744A1
(de)
*
|
2023-05-22 |
2024-05-16 |
Carl Zeiss Smt Gmbh |
Optisches system und projektionsbelichtungsanlage
|