JP2006007149A - Cold trap for vacuum film forming apparatus and exhausting system for vacuum film forming apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a cold trap for a vacuum film forming apparatus having an enhanced efficiency of removing moisture in exhaust gas while suppressing a decrease in exhaust gas conductance of the vacuum film forming apparatus, and an exhausting system for the vacuum film forming apparatus. <P>SOLUTION: The cold trap of the vacuum film forming apparatus comprises at least one permanent magnet 1a disposed in the interior of an exhaust path 7c to induce a magnetic field within the exhaust path 7c between a film forming chamber 10 and an exhausting means 2 for exhausting gas inside the chamber 10 and a refrigerant pipe 1b disposed in the vicinity of the permanent magnet 1a in which pipe (1b) a refrigerant flows to condense water molecules in the exhaust gas passing through the path 7c on the pipe 1b and remove condensate. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a vacuum trap for a vacuum film formation apparatus and an exhaust system for a vacuum film formation apparatus provided with a cold trap for a vacuum film formation apparatus.

  A film formation chamber of a vacuum film formation apparatus such as a sputtering apparatus or a vacuum evaporation apparatus is provided with an exhaust system having an exhaust pump that exhausts and depressurizes the film formation chamber. An exhaust duct communicating with the exhaust system is connected to the film formation chamber, and the pressure in the film formation chamber is reduced by the exhaust system via the exhaust duct. The exhaust duct is provided with an open / close valve that isolates and communicates the film forming chamber and the exhaust system.

Here, an oil diffusion pump or a turbo molecular pump is generally used as an exhaust pump of the exhaust system. In order to reduce the influence of moisture on the exhaust pump such that the oil of the oil diffusion pump deteriorates due to contact with moisture, the conventional exhaust system of the vacuum film forming apparatus has a refrigerant pipe disposed in the exhaust passage. A cold trap is provided to remove moisture in the exhaust from the film forming chamber by condensing moisture in the exhaust in the pipe (see Patent Document 1). That is, the cold trap is an apparatus configured such that moisture in the air is condensed in the refrigerant pipe.
Japanese Utility Model Publication No. 63-42156

  However, since the exhaust system for the vacuum film forming apparatus exhausts to a highly reduced pressure state, the structure in the exhaust flow path becomes the exhaust resistance of the exhaust flow path, and causes deterioration in the exhaust conductance of the exhaust system. It has become. Therefore, the cold trap is generally arranged in the vicinity of the wall surface of the exhaust passage. Then, the cold trap only removes water near the refrigerant pipe, and there is room for improvement in the efficiency of removing water passing through the exhaust passage. In particular, in a vacuum film forming apparatus, ion bombarding is performed to clean the surface of the substrate in the film forming chamber and the film forming chamber before vacuum film forming, and adhering impurities and the like are drawn into the exhaust system and removed. . In the ion bombardment process, when an ion bombard process using moisture is performed, a large amount of moisture is ionized and ionized water molecules are drawn into the exhaust system.

  The present invention has been made to solve the above-described problems, and provides a cold trap for a vacuum film forming apparatus and a vacuum forming apparatus that increase the efficiency of removing moisture in the exhaust while suppressing deterioration of the exhaust conductance of the vacuum film forming apparatus. It aims at providing the exhaust system for membrane apparatuses.

In order to solve the above problems, a cold trap for a vacuum film formation apparatus according to the present invention generates a magnetic field in an exhaust flow path between a film formation chamber and an exhaust means for exhausting the inside of the film formation chamber. The one or more permanent magnets arranged inside the exhaust passage and the vicinity of the permanent magnets, circulating the refrigerant and condensing water molecules in the exhaust flowing through the exhaust passage into the refrigerant pipe And a refrigerant pipe to be removed (claim 1). With this configuration, since ionized water molecules in the exhaust are induced, restrained and removed using a magnetic field, the removal efficiency of the moisture in the exhaust is improved while suppressing the deterioration of the exhaust conductance of the vacuum film forming apparatus. Can do.

  The permanent magnet is a permanent magnet of a plurality of plate-like pieces, and is disposed on the inner wall or structure of the exhaust flow path so that the polarities of the magnetic pole surfaces of adjacent permanent magnets are different. (Claim 2). With this configuration, magnetic field lines are formed between the surfaces of adjacent permanent magnets, so magnetic field lines in various directions are formed in the exhaust flow path, and Lorentz force acts on various electron movement directions. And thus more ionized water molecules can be induced and constrained.

  An exhaust system for a vacuum film forming apparatus according to the present invention includes an exhaust unit that exhausts the inside of a film forming chamber, an exhaust duct that connects the exhaust unit and the film forming chamber, and an on-off valve disposed in the exhaust duct. A cold trap installed in the exhaust duct between the on-off valve and the exhaust means, and the cold trap generates a magnetic field in the exhaust duct between the on-off valve and the exhaust means One or more permanent magnets arranged in the exhaust duct and the vicinity of the permanent magnet in such a manner that water molecules in the exhaust gas flowing through the exhaust duct are condensed in the refrigerant pipe by circulating the refrigerant. And a refrigerant pipe to be removed (claim 3). With such a configuration, since ionized water molecules in the exhaust are guided and restrained by using a magnetic field, the efficiency of removing moisture in the exhaust can be improved while suppressing the deterioration of the exhaust conductance of the vacuum film forming apparatus. it can.

  The permanent magnet is a permanent magnet of a plurality of plate-like pieces, and is disposed around the entire wall surface of the inner wall of the exhaust duct so that the polarities of the magnetic pole surfaces of adjacent permanent magnets are different. 4). With this configuration, magnetic field lines are formed between the surfaces of adjacent permanent magnets, so magnetic field lines in various directions are formed in the exhaust flow path, and Lorentz force acts on various electron movement directions. And thus more ionized water molecules can be induced and constrained.

  The refrigerant pipe forms a coil shape along the wall surface of the inner wall of the exhaust duct between the on-off valve and the exhaust means, and is fixed to the wall surface via an attachment member, and both ends of the refrigerant pipe are The substitute chlorofluorocarbon cooled by the refrigerant cooling / circulating device is circulated through the wall surface of the exhaust duct and communicated with an external refrigerant cooling / circulating device (Claim 5). With such a configuration, since the refrigerant pipe can be arranged in the exhaust space in front of the permanent magnet surface, ionized water molecules that are induced and restrained by the magnetic field of the permanent magnet can be efficiently condensed in the refrigerant pipe.

  The exhaust duct includes a first exhaust duct and a second exhaust duct, and the first exhaust duct connects the film formation chamber and the second exhaust duct, and is connected to the second exhaust duct. The joint has an on-off valve, the second exhaust duct connects the first exhaust duct and the exhaust means, and the cold trap is configured inside the second exhaust duct ( Claim 6). With such a configuration, since the cold trap is configured as the second exhaust duct, when the cold trap is malfunctioning, the second exhaust duct can be replaced quickly so that the exhaust system for the vacuum film forming apparatus can be used. The maintainability can be improved.

  The exhaust duct has a bent portion in the middle, and the on-off valve is disposed in the bent portion, and when closed, the entire periphery of the edge of the main surface of the valve body on the exhaust means side is the entire wall surface of the exhaust duct inner wall. Abuts against a sealing surface formed over the circumference, and when opened, the valve body turns the main surface into the exhaust duct and pivots outward in the bending direction of the bent portion; and It is comprised so that it may be located along the said exhaust duct inner wall of the bending direction outer side of a bending part (Claim 7). With such a configuration, the required space for retracting the opening / closing valve when opened can be reduced as compared with the opening / closing valve that moves forward / backward, so that the volume to be exhausted can be reduced while suppressing the deterioration of the exhaust conductance. .

  An exhaust system for a vacuum film forming apparatus according to the present invention includes an exhaust unit that exhausts the inside of a film forming chamber, an exhaust duct that connects the exhaust unit and the film forming chamber and has a bent portion in the middle, and the exhaust duct. An open / close valve disposed on the bent portion of the valve and a cold trap disposed on the main surface of the open / close valve, and the open / close valve has a full edge portion of the main surface on the exhaust means side of the valve body when closed. The circumference contacts the sealing surface formed over the entire wall surface of the inner wall of the exhaust duct, and when opened, the valve body faces the main surface into the exhaust duct and is outward in the bending direction of the bent portion. It is configured to rotate and retract and to be positioned along the inner wall of the exhaust duct on the outer side in the bending direction of the bent portion, and the cold trap generates a magnetic field in the vicinity of the main surface of the on-off valve. Remove the edge of the main surface of the on-off valve One or more permanent magnets arranged in the center, and a refrigerant pipe arranged in the vicinity of the permanent magnets for circulating the refrigerant and condensing the water molecules in the exhaust gas flowing through the exhaust duct into the refrigerant pipe and removing them. (Claim 8). With such a configuration, since the cold trap is located outside the bent exhaust flow path, the gas particles in the exhaust approach the cold trap side by centrifugal force, and ionized water molecules can be efficiently condensed in the refrigerant pipe. it can.

  A cylindrical body that abuts the end portion protrudes from the central portion excluding the edge portion of the main surface of the on-off valve, and the permanent magnet is a permanent magnet of a plurality of plate-shaped pieces, The magnetic pole faces are arranged over the entire wall surface of the inner wall of the cylindrical body so that the polarities of the magnetic pole faces are different (claim 9).

  The refrigerant pipe is coiled along the wall surface of the inner wall of the cylindrical body, and is fixed to the wall surface via an attachment member, and both ends of the refrigerant pipe are transmitted to the drive mechanism of the on-off valve, By passing through the inside of the penetrating portion from the exhaust duct of the drive mechanism, it communicates with an external refrigerant cooling / circulating device, and the substitute flon cooled by the refrigerant cooling / circulating device is circulated (Claim 10). With such a configuration, the number of external through-holes from the exhaust duct is not increased, so that the complexity of the sealing structure of the vacuum film forming apparatus exhaust system can be avoided.

  As described above, the present invention induces and restrains ionized water molecules in the exhaust by using a magnetic field, and thus removes moisture in the exhaust while suppressing deterioration of the exhaust conductance of the vacuum film forming apparatus. There is an effect of enhancing the.

  The best mode for carrying out the present invention will be described below with reference to the drawings.

(Embodiment 1)
FIG. 1 is a side view showing a partial cross-sectional view of an exhaust system for a vacuum film forming apparatus according to Embodiment 1 of the present invention.

  The vacuum film forming apparatus exhaust system 100 includes a cold trap 1, an exhaust pump 2 (exhaust means), a first exhaust duct 3, a second exhaust duct 7, an on-off valve 4, an on-off valve drive shaft 5, a cylinder device 6, A vacuum pump 20 and open / close valves 21 and 22 are provided.

  The first exhaust duct 3 is a duct connecting the opening 10 a of the film forming chamber 10 and the second exhaust duct 7. An opening / closing valve 4 supported by an opening / closing valve drive shaft 5 is provided in the first exhaust duct 3. The on-off valve 4 is configured to communicate and isolate the first exhaust duct 3 and the second exhaust duct 7 by the forward / backward movement of the on-off valve drive shaft 5 in the first exhaust duct 3. The second exhaust duct 7 is further connected to the exhaust pump 2. The exhaust pump 2 is connected to the vacuum pump 20 via the on-off valve 21. Thereby, the gas in the film forming chamber 10 can be exhausted to the outside via the exhaust pump 2 and the vacuum pump 20. Further, the vacuum pump 20 is also connected to the film forming chamber 10 via an on-off valve 22. Thereby, the inside of the film forming chamber 10 can be roughly evacuated only by the vacuum pump 20.

  The first exhaust duct 3 is a hollow rectangular parallelepiped-shaped duct, and the extending surface of the duct port 3 a that joins the opening 10 a of the film forming apparatus 10 and the extension of the duct port 3 b that joins the second exhaust duct 7. It is formed so that the existing surface is substantially orthogonal. That is, as indicated by an arrow in the figure, the first exhaust duct 3 has a bent portion that bends the exhaust passage.

  The on-off valve 4 has a main surface capable of closing the duct port 3b, is disposed with the main surface facing the duct port 3b, and is supported by the on-off valve drive shaft 5 from behind the main surface. A squeeze packing 4a is disposed at a contact portion with the duct port 3b. The on-off valve drive shaft 5 extends in a direction perpendicular to the main surface of the on-off valve 4 and penetrates the wall surface 3c located so as to face the duct port 3b through the shaft seal portion 3f. The on-off valve drive shaft 5 is connected to the cylinder device 6 on the outer surface of the wall surface 3c. The cylinder device 6 is mounted on the outer surface of the wall surface 3c so that the on-off valve drive shaft 5 can advance and retreat. As a result, the on-off valve 4 can be moved back and forth by the cylinder device 6 via the on-off valve drive shaft 5, and the duct port 3b can be opened and closed. Further, when the on-off valve 4 is opened, the on-off valve 4 is configured to retreat to the vicinity of the wall surface 3c. Thereby, the on-off valve 4 can suppress the deterioration of the exhaust conductance without being a resistance to the discharge of gas molecules from the film forming chamber 10.

  The vacuum pump 20 is a pump suitable for rough exhaust, such as a rotary pump. By opening and closing the on-off valves 21 and 22, rough evacuation of the film forming chamber 10 or decompression of the exhaust pump 2 can be performed.

As the exhaust pump 2, an oil diffusion pump or a turbo molecular pump is used. The exhaust pump 2 is started after the vacuum pump 20 has been depressurized (for example, 30 Pa) to such an extent that the exhaust pump 2 can be started (that is, the oil diffusion pump or the turbo molecular pump can be started). The pressure inside 10 can be reduced to a pressure (for example, about 6 × 10 ⁻³ Pa) at which a film forming operation can be performed.

  The second exhaust duct 7 is a duct that communicates between the duct port 3 b and the exhaust pump 2. A cold trap 1 is formed on the inner wall of the second exhaust duct 7. The cold trap 1 has a refrigerant pipe 1b and a permanent magnet 1a. Here, it has a cylindrical shape having openings at both ends.

  FIG. 2 is a cross-sectional perspective view of the second exhaust duct of the exhaust system for a vacuum film forming apparatus according to Embodiment 1 of the present invention.

  A permanent magnet 1 a and a refrigerant pipe 1 b are arranged over the entire inner wall of the second exhaust duct 7.

  The permanent magnet 1a is disposed so as to generate a magnetic field in the second exhaust duct 7. A specific polarity arrangement is not required. Here, the permanent magnet 1a of a plate-shaped piece is arrange | positioned so that the polarities of the magnetic pole surfaces of the adjacent permanent magnet 1a may differ. Moreover, the permanent magnet 1a is arrange | positioned so that it may continue in a ring shape in the week direction of the 2nd exhaust duct 7, and it is arrange | positioned so that this annular form may be formed in multiple rows. As a result, magnetic flux is connected between the adjacent permanent magnets 1a. In the exhaust space 7c formed in the second exhaust duct 7, magnetic field lines in various directions are formed and the second exhaust gas is formed. A magnetic field having a higher magnetic flux density is formed near the inner wall of the duct 7.

  The refrigerant pipe 1b is installed close to the permanent magnet 1a. Here, the refrigerant pipe 1b is installed in a coil shape of, for example, three rounds along the wall surface on the exhaust space 7c side of the permanent magnet 1a, and is fixed to the wall surface via an attachment member 7d. Both ends of the refrigerant pipe 1b pass through the wall surface of the exhaust space 7c and communicate with an external refrigerant cooling / circulation device (not shown). In the refrigerant pipe 7b, the refrigerant cooled by the refrigerant cooling / circulating device is circulated. Here, the refrigerant pipe 7b is composed of a copper pipe, and substitute chlorofluorocarbon circulates as a refrigerant inside, and the chlorofluorocarbon substitute is cooled to about −140 ° C. and circulated by the refrigerant cooling and circulation device.

  Next, the operation of the vacuum film deposition apparatus exhaust system 100 according to Embodiment 1 configured as described above will be described.

  When evacuating the film forming chamber 10, first, the on-off valve 4 is closed, and the film forming chamber 10 is evacuated by the vacuum pump 20 through the on-off valve 22. By evacuation by the vacuum pump 20, the inside of the film forming chamber 10 is reduced to a pressure (for example, 30 Pa) that enables the exhaust pump 2 to be activated.

The on-off valve 22 is closed, the on-off valve 4 is opened, the on-off valve 21 is opened, and the film formation chamber 10 is further evacuated by the exhaust pump 2 and the vacuum pump 20. When the film forming chamber 10 is depressurized to a pressure suitable for film forming work (for example, about 6 × 10 ⁻³ Pa), the film forming chamber is ready for film forming processing.

  When exhausted through the exhaust pump 2, air particles in the film forming chamber 10 pass through the second exhaust duct 7. Here, although the traveling direction of electrons and ions in the exhaust gas is not microscopically constant, the traveling direction is macroscopically at least in the exhausting direction. Therefore, the electrons in the exhaust are subjected to a Lorentz force at least in the direction perpendicular to the exhaust direction by the magnetic field of the permanent magnet 1b. That is, the electrons in the exhaust gas change in the traveling direction at least in the direction perpendicular to the exhaust direction, and are entangled with the magnetic field lines like a cyclotron motion. On the other hand, ions do not move as entangled with magnetic field lines as much as electrons, but move following electrons due to Coulomb force acting between them. Here, since the permanent magnet 1a is disposed on the entire circumference of the wall surface of the exhaust space 7c, the magnetic flux density increases as the distance from the vicinity of the wall surface of the exhaust space 7c approaches. Therefore, as the electrons get closer to the vicinity of the wall surface of the exhaust space 7c, the electrons receive a stronger Lorentz force, and are more easily restrained as they approach the wall surface of the exhaust space 7c. And ion is restrained by the wall surface vicinity of the exhaust space 7c so that it may follow an electron by Coulomb force. In this way, the ionized water molecules in the exhaust are guided to the vicinity of the wall surface of the exhaust space 7c and are easily restrained, so that they are condensed in the refrigerant pipe 1b and easily removed from the exhaust.

(Modification 1)
Modification 1 of the present invention is an exhaust system 110 for a vacuum film forming apparatus in which the opening / closing direction of the opening / closing valve 4 having the configuration shown in FIG. 1 is changed.

  FIG. 3 is a side view showing a partial cross section of an exhaust system for a vacuum film forming apparatus according to a modification of the first embodiment. FIG. 4 is a rear view showing a vacuum film forming apparatus exhaust system according to a modification of the first embodiment, with a partial cross-section and open cut.

  As shown in FIG. 3, the vacuum film forming apparatus exhaust system 110 according to Modification 1 is different from the vacuum film forming apparatus exhaust system 100 of FIG. 1 in the structure of the on-off valve drive shaft 5 and the first exhaust duct 3. The configuration is substantially the same except for the shape and the arrangement of the cylinder device 6.

  Here, the 1st exhaust duct 3 is comprised so that the wall surface 3e facing both the duct port 3a and the duct port 3b may form a slope in a side view. As a result, the duct volume of the first exhaust duct 3 can be reduced, so that the exhaust target volume including the film forming chamber 10 can be reduced, and time and energy during exhaust can be saved.

  Further, the on-off valve 4 is configured to be opened and closed by rotational driving with a corner portion formed by the duct port 3b and the wall surface 3e as a rotation axis in a side view. As a result, the opening / closing valve 4 opens the duct port 3b greatly toward the duct port 3a connected to the opening 10a of the film forming chamber 10, and when the opening / closing valve 4 is opened, the opening / closing valve 4 is located near the wall surface 3e. Therefore, the exhaust conductance caused by the exhaust valve 4 can be prevented from deteriorating.

  A general drive mechanism is used for rotationally driving the on-off valve 4. Here, the on-off valve drive shaft 5 includes a valve arm 5a, a support shaft 5b, a lever member 5c, a cylinder shaft connecting shaft 5d, and a cylinder shaft 5e that are swingably connected to the on-off valve 4. It is attached to the cylinder device 6 and is configured to be driven forward and backward.

  The on-off valve 4 is configured to be supported in the first exhaust duct 3 by shaft seal portions 3f, 3f via a valve arm 5a and a support shaft 5b attached to the on-off valve 4. The support shaft 5 is installed to extend in the side surface direction at a corner formed by the duct port 3b and the wall surface 3e. As shown in FIG. 4, both ends of the support shaft 5 penetrate the first exhaust duct 3 in an airtight manner through shaft seal portions 3 f and 3 f. The shaft seal portion 3f is fixed to the first exhaust duct 3, and is configured to support the support shaft 5b so as to be airtightly rotatable. Both ends of the support shaft 5b are fixedly joined to a pair of lever members 5c and 5c outside the first exhaust duct 3. The lever members 5c and 5c are joined to the cylinder shafts 5e and 5e via the cylinder shaft joining shaft 5d. The cylinder shaft joining shaft 5d joins both so that the lever member 5c can tilt with respect to the cylinder shaft 5e. The cylinder shafts 5e and 5e are arranged so as to advance and retract the cylinder joint shaft 5d in the inclination direction of the wall surface 3e, and are mounted so that the cylinder devices 6 and 6 can advance and retract. The cylinder devices 6 and 6 are joined to the outer surface of the first exhaust duct 3. Thus, when the cylinder devices 6 and 6 push out the cylinder shafts 5e and 5e, the lever members 5c and 5c are rotated about the support shaft 5b, and the valve arm 5a and the on-off valve 4 are centered on the support shaft 5b. Rotate in the opening direction. Similarly, when the cylinder devices 6 and 6 pull back the cylinder shafts 5e and 5e, the valve arm 5a and the on-off valve 4 rotate in the closing direction about the support shaft 5b.

  Further, the operation of the vacuum film forming apparatus exhaust system 110 of Modification 1 configured as described above is the same as that of the vacuum film forming apparatus exhaust system 100 of the first embodiment.

(Embodiment 2)
FIG. 5 is a side view showing a partial cross-sectional view of an exhaust system for a vacuum film forming apparatus according to Embodiment 2 of the present invention.

  The second embodiment of the present invention is an exhaust system 120 for a vacuum film forming apparatus in which the cold trap 1 of the modification of the first embodiment is configured on the main surface of the on-off valve 4. Therefore, in the second embodiment, the first exhaust duct 3 is configured to communicate with the exhaust pump 2 at the duct port 3b.

  As shown in FIG. 5, the vacuum film forming apparatus exhaust system 120 according to the second embodiment is different from the vacuum film forming apparatus exhaust system 110 according to the modified example of the first embodiment except for the arrangement position of the cold trap 1. The configuration is substantially the same.

  That is, the cold trap 1 is formed on the main surface of the on-off valve 4. Here, a cylindrical body 4e, which is a hollow cylindrical frame body, is installed on the main surface of the on-off valve 4, and the permanent magnet 1a and the refrigerant are installed on the inner surface of the cylindrical body 4e in the same manner as in the first embodiment. A cold trap 1 is configured with a pipe 1b. The attachment configuration of the permanent magnet 1a and the refrigerant pipe 1b to the cylindrical body 4e of the cold trap 1 is the same as that of the first embodiment. Both ends of the refrigerant pipe 1b are configured to pass through the exhaust valve 4 and through the arm 5a, and to pass through the support shaft 5b to be connected to an external refrigerant cooling / circulation device (not shown). Thereby, when the on-off valve 4 is opened, the main surface of the on-off valve 4 is located outside the bent exhaust passage (arrow in FIG. 5) and is exposed to the exhaust passage. Therefore, at the time of exhaust, the gas particles exhausted from the duct port 3a side receive a centrifugal force outward in the bending direction, so that the gas particle concentration is relatively high in the vicinity of the main surface of the on-off valve 4. As a result, the electrons in the exhaust are more easily restrained by the magnetic field of the permanent magnet 1b, and the ionized water molecules in the exhaust are induced to follow the electrons by the Coulomb force and are restrained in the vicinity of the permanent magnet 1a. . As a result, more ionized water molecules are condensed in the refrigerant pipe.

  Further, the operation of the vacuum film forming apparatus exhaust system 120 according to the second embodiment configured as described above is the same as that of the vacuum film forming apparatus exhaust system 100 according to the first embodiment.

  It is useful as a cold trap for a vacuum film formation apparatus and an exhaust system for a vacuum film formation apparatus that increase the removal efficiency of moisture in the exhaust while suppressing deterioration in exhaust conductance.

It is a side view which shows the exhaust system for vacuum film-forming apparatuses concerning Embodiment 1 of this invention in a partial cross section. It is a cross-sectional perspective view of the 2nd exhaust duct of the exhaust system for vacuum film-forming apparatuses concerning Embodiment 1 of this invention. FIG. 6 is a side view showing a partial cross section of an exhaust system for a vacuum film forming apparatus according to a modification of the first embodiment. It is a rear view which shows the exhaust system for vacuum film-forming apparatuses which concerns on the modification of Embodiment 1 with a partial cross section and excavation. It is a side view which shows the exhaust system for vacuum film-forming apparatuses concerning Embodiment 2 of this invention in a partial cross section.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Cold trap 1a Permanent magnet 1b Refrigerant piping 2 Exhaust pump 3 1st exhaust duct 3a, 3b Duct port 3c, 3e Wall surface 3f Shaft seal part 4 On-off valve 4a Squeeze packing 4e Cylindrical body 5 On-off valve drive shaft 5a Valve arm 5b Support Shaft 5c Insulator member 5d Cylinder shaft joint shaft 5e Cylinder shaft 6 Cylinder device 7 Second exhaust duct 7c Exhaust space 7d Mounting member 10 Film forming chamber 10a Opening 20 Vacuum pumps 21, 22 On-off valves 100, 110, 120 Vacuum film forming Exhaust system for equipment

Claims (10)

One or more permanent magnets arranged inside the exhaust passage so as to generate a magnetic field in an exhaust passage between the film formation chamber and an exhaust means for exhausting the inside of the film formation chamber;
A cold trap for a vacuum film-forming apparatus, which is provided in the vicinity of the permanent magnet, and includes a refrigerant pipe for allowing water molecules in the exhaust gas flowing through the exhaust passage to condense and remove the water molecules in the refrigerant pipe. .   The permanent magnet is a permanent magnet of a plurality of plate-like pieces, and is disposed on an inner wall or a structure of the exhaust passage so that polarities of magnetic pole surfaces of adjacent permanent magnets are different from each other. Item 2. A cold trap for a vacuum film-forming apparatus according to Item 1. An exhaust means for exhausting the inside of the film forming chamber;
An exhaust duct connecting the exhaust means and the film forming chamber;
An on-off valve disposed in the exhaust duct;
A cold trap installed in the exhaust duct between the on-off valve and the exhaust means;
The cold trap includes at least one permanent magnet disposed inside the exhaust duct so as to generate a magnetic field in the exhaust duct between the on-off valve and the exhaust means, and in the vicinity of the permanent magnet. An exhaust system for a vacuum film forming apparatus, comprising: a refrigerant pipe that is disposed and circulates the refrigerant to condense water molecules in the exhaust gas flowing through the exhaust duct and condense it in the refrigerant pipe.   The permanent magnet is a permanent magnet of a plurality of plate-like pieces, and is disposed on the entire wall surface of the inner wall of the exhaust duct so that the polarities of the magnetic pole surfaces of adjacent permanent magnets are different. 4. An exhaust system for a vacuum film forming apparatus according to 3.   The refrigerant pipe forms a coil shape along the wall surface of the inner wall of the exhaust duct between the on-off valve and the exhaust means, and is fixed to the wall surface via an attachment member, and both ends of the refrigerant pipe are 5. The exhaust system for a vacuum film forming apparatus according to claim 4, wherein an alternative chlorofluorocarbon that has passed through a wall surface of the exhaust duct and communicated with an external refrigerant cooling / circulating device and is cooled by the refrigerant cooling / circulating device is circulated. The exhaust duct comprises a first exhaust duct and a second exhaust duct,
The first exhaust duct connects the film formation chamber and the second exhaust duct, and has an on-off valve at a joint portion with the second exhaust duct,
The second exhaust duct connects the first exhaust duct and the exhaust means,
The exhaust system for a vacuum film forming apparatus according to claim 3, wherein the cold trap is configured inside the second exhaust duct. The exhaust duct has a bent portion in the middle,
The on-off valve is disposed in the bent portion, and when closed, the entire periphery of the edge of the main surface of the valve body on the exhaust means side is in contact with a seal surface formed over the entire wall surface of the inner wall of the exhaust duct. When opened, the valve body turns with the main surface into the exhaust duct and rotates outward in the bending direction of the bent portion, and moves along the inner wall of the exhaust duct outside the bent portion in the bending direction. The exhaust system for a vacuum film forming apparatus according to claim 3, wherein the exhaust system is configured to be positioned as described above. An exhaust means for exhausting the inside of the film forming chamber;
An exhaust duct connecting the exhaust means and the film forming chamber and having a bent portion in the middle;
An on-off valve disposed at the bent portion of the exhaust duct;
A cold trap disposed on the main surface of the on-off valve;
When the on-off valve is closed, the entire periphery of the edge of the main surface of the valve body on the exhaust means side is in contact with a seal surface formed over the entire wall surface of the inner wall of the exhaust duct. The main surface faces the inside of the exhaust duct and is retracted by turning outward in the bending direction of the bent portion, and is positioned along the inner wall of the exhaust duct outside the bent portion of the bent portion. Composed of
The cold trap includes one or more permanent magnets disposed in a central portion excluding an edge of the main surface of the on-off valve so as to generate a magnetic field in the vicinity of the main surface of the on-off valve, and in the vicinity of the permanent magnet. An exhaust system for a vacuum film forming apparatus, comprising: a refrigerant pipe that is disposed and circulates the refrigerant to condense water molecules in the exhaust gas flowing through the exhaust duct and condense it in the refrigerant pipe. In the central part excluding the edge part of the main surface of the on-off valve, a cylindrical body that abuts the end part is projected,
The permanent magnet is a permanent magnet of a plurality of plate-like pieces, and is disposed over the entire wall surface of the inner wall of the cylindrical body so that the polarities of the magnetic pole surfaces of adjacent permanent magnets are different. The exhaust system for a vacuum film-forming apparatus according to claim 8.   The refrigerant pipe is coiled along the wall surface of the inner wall of the cylindrical body, and is fixed to the wall surface via an attachment member, and both ends of the refrigerant pipe are transmitted to the drive mechanism of the on-off valve, 10. The vacuum according to claim 9, wherein an alternative refrigerant cooled by the refrigerant cooling / circulation device is circulated by penetrating through the inside of a through portion from the exhaust duct of the drive mechanism and being circulated by the refrigerant cooling / circulation device. Exhaust system for film deposition equipment.

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