JP2006002039A - Epoxy resin molding material for encapsulation and electronic component device - Google Patents

Epoxy resin molding material for encapsulation and electronic component device Download PDF

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JP2006002039A
JP2006002039A JP2004180026A JP2004180026A JP2006002039A JP 2006002039 A JP2006002039 A JP 2006002039A JP 2004180026 A JP2004180026 A JP 2004180026A JP 2004180026 A JP2004180026 A JP 2004180026A JP 2006002039 A JP2006002039 A JP 2006002039A
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epoxy resin
molding material
sealing
resin molding
inorganic filler
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Hisanori Watanabe
尚紀 渡辺
Seiichi Akagi
清一 赤城
Toshihiro Hayashi
智弘 林
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Showa Denko Materials Co Ltd
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Hitachi Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an epoxy resin composition molding material for encapsulation excellent in moldability such as fluidity, flame resistance, heat resistance and thermal cycle resistance and an electronic component device equipped with an element encapsulated with the epoxy resin composition molding material. <P>SOLUTION: The epoxy resin composition molding material for encapsulation contains (A) an epoxy resin containing an epoxy resin obtained by glycidyl etherification of a dimer of at least either of hydroxynaphthalene and dihydroxynaphthalene, (B) a hardener expressed by general formula (I) (wherein, n is 0 or a positive integer; and a hydrogen atom on the benzene ring and the naphthalene ring in A and B may be substituted with a hydrocarbon group) and (C) an inorganic filler. Component (C) has at least an average particle size of ≥15 μm or a specific surface area of ≤4.5 m<SP>2</SP>/g. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、封止用エポキシ樹脂成形材料、及びこの封止用エポキシ樹脂成形材料で封止した素子を備えた電子部品装置に関する。   The present invention relates to an epoxy resin molding material for sealing, and an electronic component device including an element sealed with the epoxy resin molding material for sealing.

従来から、トランジスタ、IC、LSI等の電子部品装置の素子封止の分野では生産性、コスト等の面から樹脂封止が主流となり、エポキシ樹脂成形材料が広く用いられている。この理由としては、エポキシ樹脂が電気特性、耐湿性、耐熱性、機械特性、インサート品との接着性などの諸特性にバランスがとれているためである。   Conventionally, in the field of element sealing of electronic component devices such as transistors, ICs, and LSIs, resin sealing has been the mainstream in terms of productivity, cost, etc., and epoxy resin molding materials have been widely used. This is because epoxy resins are balanced in various properties such as electrical properties, moisture resistance, heat resistance, mechanical properties, and adhesiveness with inserts.

近年は、自動車分野においても電子機器化が進んでいる。自動車用途の電子機器には、耐熱性、耐冷熱サイクル性等において、パーソナルコンピュータ、家電等のいわゆる民生用途より、一段と厳しい信頼性が求められることが多い。   In recent years, electronic devices are also being developed in the automobile field. Electronic devices for automobiles are often required to be more reliable in terms of heat resistance and cold cycle resistance than so-called consumer applications such as personal computers and home appliances.

電子機器の耐熱性を高める一般的な手法としては、パッケージのガラス転移点を高める手法が挙げられ、耐冷熱サイクル性を高める手法としては、半導体内部部材と封止用エポキシ樹脂成形材料の熱膨張係数を近づける等の手法が挙げられる。
封止用エポキシ樹脂成形材料には、従来よりデカブロムをはじめとするハロゲン化樹脂やアンチモン化合物が難燃剤として用いられていたが、近年、環境保護の観点からこれらの化合物に量規制の動きがあり、ノンハロゲン化(ノンブロム化)及びノンアンチモン化の要求が出てきている。また、プラスチック封止ICの高温放置特性にブロム化合物が悪影響を及ぼすことが知られており、この観点からもブロム化樹脂量の低減が望まれている。
General techniques for increasing the heat resistance of electronic equipment include a technique for increasing the glass transition point of the package, and techniques for improving the thermal cycle resistance include thermal expansion of the semiconductor internal member and the epoxy resin molding material for sealing. A technique such as bringing the coefficients closer is mentioned.
In epoxy resin molding materials for sealing, halogenated resins such as decabromo and antimony compounds have been used as flame retardants in the past, but in recent years there has been a movement to regulate the amount of these compounds from the viewpoint of environmental protection. There is a demand for non-halogenation (non-bromo) and non-antimony. In addition, it is known that a bromo compound has an adverse effect on the high temperature storage characteristics of a plastic encapsulated IC. From this viewpoint, reduction of the amount of bromo resin is desired.

ブロム化樹脂や酸化アンチモンを用いずに難燃化を達成する手法の一つとしては、有機リン系化合物を添加する方法(例えば特許文献1参照。)、金属水酸化物を方法(例えば特許文献2参照。)等の提案がなされているが、それぞれガラス転移点の低下を招く、成形性に悪影響を及ぼす等の問題を解決できていない。   As one of the methods for achieving flame retardancy without using brominated resin or antimony oxide, a method of adding an organic phosphorus compound (for example, see Patent Document 1), a method of using a metal hydroxide (for example, Patent Document) However, it has not been able to solve problems such as a decrease in glass transition point and an adverse effect on formability.

ブロム化樹脂や酸化アンチモンを用いない封止用エポキシ樹脂成形材料において、耐冷熱サイクル性を高める為に封止用エポキシ樹脂成形材料の線膨張係数と半導体内部部材とのそれを近づけようとすると、特に銅リードフレームを使用したパッケージでの難燃性確保が困難となる。一方、難燃性確保の為に有機リン系化合物、金属水酸化物等の難燃剤を用いると、ガラス転移点の低下を招く、成形性に悪影響を及ぼす等の問題を抱える。金属水酸化物を用いた封止用エポキシ樹脂成形材料の成形性改善に対しては、特許文献3等の報告があるが、その効果は必ずしも充分ではない。
特開平9−235449号公報 特開平9−241483号公報 特開2003−253093公報
In an epoxy resin molding material for sealing that does not use brominated resin or antimony oxide, when trying to bring the coefficient of linear expansion of the epoxy resin molding material for sealing close to that of the semiconductor internal member in order to increase the thermal cycle resistance, In particular, it is difficult to ensure flame retardancy in a package using a copper lead frame. On the other hand, when flame retardants such as organophosphorus compounds and metal hydroxides are used to ensure flame retardancy, there are problems such as lowering the glass transition point and adversely affecting moldability. Although there are reports of Patent Document 3 and the like for improving the moldability of an epoxy resin molding material for sealing using a metal hydroxide, the effect is not always sufficient.
JP 9-235449 A Japanese Patent Laid-Open No. 9-241383 JP 2003-253093 A

本発明はかかる状況に鑑みなされたもので、ハロゲン化樹脂やアンチモン化合物を用いることなく良好な難燃性を実現し、流動性等の成形性や、耐熱性、耐冷熱サイクル性等の信頼性にも優れる封止用エポキシ樹脂成形材料、及びこれにより封止した素子を備えた電子部品装置を提供しようとするものである。   The present invention has been made in view of such a situation, and realizes good flame retardancy without using a halogenated resin or an antimony compound, and has reliability such as moldability such as fluidity, heat resistance, and heat cycle resistance. It is another object of the present invention to provide an epoxy resin molding material for sealing, and an electronic component device including an element sealed thereby.

本発明者らは上記の課題を解決するために鋭意検討を重ねた結果、封止用エポキシ樹脂成形材料に、特定の構造を有するエポキシ樹脂、特定の構造を有する硬化剤、及び特定の性状を有する無機質充填剤を用いるすることにより上記の目的を達成しうることを見い出し、本発明を完成するに至った。   As a result of intensive studies in order to solve the above problems, the present inventors have determined that an epoxy resin molding material for sealing has an epoxy resin having a specific structure, a curing agent having a specific structure, and a specific property. It has been found that the above object can be achieved by using an inorganic filler having the present invention, and the present invention has been completed.

本発明は
(1)(A)ヒドロキシナフタレン及びジヒドロキシナフタレンの少なくともいずれかの2量体をグリシジルエーテル化して得られるエポキシ樹脂を含むエポキシ樹脂、(B)下記一般式(I)で表される化合物を含む硬化剤、(C)無機質充填剤を含有し、前記(C)成分は、平均粒径が15μm以上及び比表面積が4.5m2/g以下の少なくともいずれかである封止用エポキシ樹脂成形材料、

Figure 2006002039
(一般式(I)で、nは0、又は正の整数を表し、A及びB中のベンゼン環及びナフタレン環上の水素原子は炭化水素基で置換されていてもよい。)
(2)ハロゲン系難燃剤及びアンチモン系難燃剤の含有量がいずれも成形材料全体の0.1重量%以下である前記(1)に記載の封止用エポキシ樹脂成形材料。
(3)ハロゲン系難燃剤及びアンチモン系難燃剤を含まない前記(2)に記載の封止用エポキシ樹脂成形材料、
(4)(C)無機質充填剤量が成型材料全体の70重量%以上88重量%以下である前記(1)〜(3)のいずれかに記載の封止用エポキシ樹脂成形材料、
(5)前記(1)〜(4)のいずれかに記載の封止用エポキシ樹脂成形材料により封止された素子を備えた電子部品装置、
に関する。 The present invention relates to (1) (A) an epoxy resin containing an epoxy resin obtained by glycidyl etherification of at least one dimer of hydroxynaphthalene and dihydroxynaphthalene, (B) a compound represented by the following general formula (I) And (C) an inorganic filler, and the component (C) is an epoxy resin for sealing having an average particle size of at least 15 μm and a specific surface area of at least 4.5 m 2 / g. Molding material,
Figure 2006002039
(In general formula (I), n represents 0 or a positive integer, and the hydrogen atom on the benzene ring and naphthalene ring in A and B may be substituted with a hydrocarbon group.)
(2) The epoxy resin molding material for sealing according to the above (1), wherein the content of the halogen flame retardant and the antimony flame retardant is 0.1% by weight or less of the whole molding material.
(3) The epoxy resin molding material for sealing according to the above (2), which does not contain a halogen flame retardant and an antimony flame retardant,
(4) (C) The epoxy resin molding material for sealing according to any one of (1) to (3), wherein the amount of the inorganic filler is 70% by weight or more and 88% by weight or less of the entire molding material,
(5) An electronic component device including an element sealed with the sealing epoxy resin molding material according to any one of (1) to (4),
About.

本発明になる封止用エポキシ樹脂成形材料は、流動性等の成形性、難燃性、耐熱性、耐冷熱サイクル性等の信頼性等に優れ、この封止用エポキシ樹脂成形材料を用いてIC、LSI等の電子部品を封止すれば、成形性や信頼性に優れた電子部品装置を得ることができ、その工業的価値は大である。   The epoxy resin molding material for sealing according to the present invention is excellent in moldability such as fluidity, reliability such as flame retardancy, heat resistance, cold cycle resistance, etc., and using this epoxy resin molding material for sealing If an electronic component such as an IC or LSI is sealed, an electronic component device having excellent moldability and reliability can be obtained, and its industrial value is great.

本発明では、高いガラス転移点と高い難燃性の両立を実現する為に、(A)エポキシ樹脂として、ヒドロキシナフタレン及びジヒドロキシナフタレンの少なくともいずれかの2量体をグリシジルエーテル化して得られるエポキシ樹脂を単独又は二種以上併用して含むことが必要である。高いガラス転移点を実現する為には、ヒドロキシナフタレン及びジヒドロキシナフタレンの2量体をグリシジルエーテル化して得られる3官能のエポキシ樹脂を用いることが好ましく、ジヒドロキシナフタレンの2量体をグリシジルエーテル化して得られる4官能のエポキシ樹脂を用いることがより好ましく、これらの混合物を用いても良い。ジヒドロキシナフタレンの2量体をグリシジルエーテル化して得られるエポキシ樹脂を主成分とするエポキシ樹脂としては、市販品としてHP−4701(大日本インキ化学工業株式会社製商品名)等が入手可能である。   In the present invention, an epoxy resin obtained by glycidyl etherification of at least one dimer of hydroxynaphthalene and dihydroxynaphthalene as (A) an epoxy resin in order to realize both a high glass transition point and high flame retardancy. It is necessary to contain singly or in combination of two or more. In order to realize a high glass transition point, it is preferable to use a trifunctional epoxy resin obtained by glycidyl etherification of a dimer of hydroxynaphthalene and dihydroxynaphthalene, and obtained by glycidyl etherification of a dihydroxynaphthalene dimer. It is more preferable to use a tetrafunctional epoxy resin, and a mixture thereof may be used. As an epoxy resin mainly composed of an epoxy resin obtained by glycidyl etherification of a dihydroxynaphthalene dimer, HP-4701 (trade name, manufactured by Dainippon Ink & Chemicals, Inc.) is available.

本発明の効果を充分得る為には、前記2量体をグリシジルエーテル化して得られるエポキシ樹脂を(A)成分全体の40重量%以上とすることが好ましく、50重量%以上とすることがより好ましく、60重量%以上とすることが特に好ましい。40重量%未満だと、高いガラス転移点と高い難燃性の両立が困難となる傾向がある。   In order to sufficiently obtain the effects of the present invention, the epoxy resin obtained by glycidyl etherification of the dimer is preferably 40% by weight or more of the total component (A), more preferably 50% by weight or more. It is preferably 60% by weight or more. If it is less than 40% by weight, it tends to be difficult to achieve both a high glass transition point and high flame retardancy.

本発明では、(A)成分として、前記2量体をグリシジルエーテル化して得られるエポキシ樹脂の他に封止用エポキシ樹脂成形材料に一般に使用されているエポキシ樹脂を特に制限なく併用することが可能である。併用可能な樹脂として、例えばフェノールノボラック型エポキシ樹脂、オルソクレゾールノボラック型エポキシ樹脂をはじめとするフェノール、クレゾール、キシレノール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF等のフェノール類及び/又はα−ナフトール、β−ナフトール、ジヒドロキシナフタレン等のナフトール類とホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド基を有する化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック樹脂をエポキシ化したもの、ビスフェノールA、ビスフェノールF、ビスフェノールS、ビスフェノールA/D等のジグリシジルエーテル、アルキル置換又は非置換のビフェノールのジグリシジルエーテルであるビフェニル型エポキシ樹脂、フェノール類とジメトキシパラキシレン又はビス(メトキシメチル)ビフェニルから合成されるフェノール・アラルキル型樹脂やビフェニル・アラルキル型樹脂等のエポキシ化物、スチルベン型エポキシ樹脂、ハイドロキノン型エポキシ樹脂、フタル酸、ダイマー酸等の多塩基酸とエピクロルヒドリンの反応により得られるグリシジルエステル型エポキシ樹脂、ジアミノジフェニルメタン、イソシアヌル酸等のポリアミンとエピクロルヒドリンの反応により得られるグリシジルアミン型エポキシ樹脂、シクロペンタジエンとフェノール類の共縮合樹脂のエポキシ化物であるジシクロペンタジエン型エポキシ樹脂、ナフトール・アラルキル型樹脂のエポキシ化物、トリフェノールメタン型エポキシ樹脂、トリメチロールプロパン型エポキシ樹脂、テルペン変性エポキシ樹脂、オレフィン結合を過酢酸等の過酸で酸化して得られる線状脂肪族エポキシ樹脂、脂環族エポキシ樹脂、及びこれらのエポキシ樹脂をシリコーン、アクリロニトリル、ブタジエン、イソプレン系ゴム、ポリアミド系樹脂等により変性したエポキシ樹脂などが挙げられる。   In the present invention, as the component (A), in addition to an epoxy resin obtained by glycidyl etherification of the dimer, an epoxy resin generally used for an epoxy resin molding material for sealing can be used in combination without any particular limitation. It is. Examples of resins that can be used in combination include phenol novolac type epoxy resins, orthocresol novolac type epoxy resins, and other phenols such as phenol, cresol, xylenol, resorcin, catechol, bisphenol A, bisphenol F, and / or α-naphthol, β An epoxidized novolak resin obtained by condensation or cocondensation of naphthols such as naphthol and dihydroxynaphthalene and a compound having an aldehyde group such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, and salicylaldehyde under an acidic catalyst; Diglycidyl ethers such as bisphenol A, bisphenol F, bisphenol S, bisphenol A / D, and diglycidyl ethers of alkyl-substituted or unsubstituted biphenols Biphenyl type epoxy resin that is ether, epoxidized products such as phenol aralkyl type resin and biphenyl aralkyl type resin synthesized from phenol and dimethoxyparaxylene or bis (methoxymethyl) biphenyl, stilbene type epoxy resin, hydroquinone type epoxy resin Glycidyl ester type epoxy resins obtained by reaction of polybasic acids such as phthalic acid and dimer acid with epichlorohydrin, glycidyl amine type epoxy resins obtained by reaction of polyamines such as diaminodiphenylmethane and isocyanuric acid and epichlorohydrin, cyclopentadiene and phenols Dicyclopentadiene-type epoxy resin, naphthol-aralkyl-type resin epoxide, triphenolmethane-type epoxy resin Trimethylolpropane type epoxy resin, terpene-modified epoxy resin, linear aliphatic epoxy resin obtained by oxidizing olefin bond with peracid such as peracetic acid, alicyclic epoxy resin, and these epoxy resins as silicone, acrylonitrile, Examples thereof include epoxy resins modified with butadiene, isoprene-based rubber, polyamide-based resin, and the like.

本発明の(B)硬化剤には、特に難燃性の点から、下記一般式(I)で表される化合物を単独又は二種以上併用して含むことが必要である。

Figure 2006002039
(一般式(I)で、nは0、又は正の整数を表し、A及びB中のベンゼン環及びナフタレン環上の水素原子は炭化水素基で置換されていてもよい。) The (B) curing agent of the present invention needs to contain a compound represented by the following general formula (I) singly or in combination of two or more, particularly from the viewpoint of flame retardancy.
Figure 2006002039
(In general formula (I), n represents 0 or a positive integer, and the hydrogen atom on the benzene ring and naphthalene ring in A and B may be substituted with a hydrocarbon group.)

上記一般式(I)で表される化合物としては、一般式(II)で表されるフェノール・アラルキル樹脂、一般式(III)で表されるビフェニル・アラルキル樹脂、一般式(IV)、一般式(V)で表されるナフトール・アラルキル樹脂等を挙げることができ、難燃性の点からは一般式(III)で表されるビフェニル・アラルキル樹脂を単独又は併用して用いることが好ましく、(B)成分全体の40重量%以上とすることがより好ましく、50重量%以上とすることが特に好ましい。

Figure 2006002039
(一般式(II)で、nは0又は1〜10の整数を示す。)
Figure 2006002039
(一般式(III)で、nは0又は1〜10の整数を示す。)
Figure 2006002039
(一般式(IV)で、nは0又は1〜10の整数を示す。)
Figure 2006002039
(一般式(V)で、nは0又は1〜10の整数を示す。)
上記一般式(II)で示されるフェノール・アラルキル樹脂としては、市販品として三井化学株式会社製商品名XLCが挙げられ、上記一般式(III)で示されるビフェニル・アラルキル樹脂としては、市販品として明和化成株式会社製商品名MEH−7851が挙げられる。又、上記一般式(IV)で示されるナフトール・アラルキル樹脂としては、市販品として新日鐵化学株式会社製商品名SN−170が挙げられ、上記一般式(V)で示されるナフトール・アラルキル樹脂としては、市販品として新日鐵化学株式会社製商品名SN−475が挙げられる。また、上記一般式(II)〜(V)で示される化合物中の、ベンゼン環及びナフタレン環上の水素原子のいずれかを炭化水素基で置換した化合物も一般式(I)で表される化合物に含まれる。 Examples of the compound represented by the general formula (I) include a phenol / aralkyl resin represented by the general formula (II), a biphenyl / aralkyl resin represented by the general formula (III), a general formula (IV), and a general formula The naphthol aralkyl resin represented by (V) can be mentioned, and from the viewpoint of flame retardancy, it is preferable to use the biphenyl aralkyl resin represented by the general formula (III) alone or in combination. It is more preferable to set it as 40 weight% or more of the whole B) component, and it is especially preferable to set it as 50 weight% or more.
Figure 2006002039
(In general formula (II), n represents 0 or an integer of 1 to 10.)
Figure 2006002039
(In general formula (III), n represents 0 or an integer of 1 to 10.)
Figure 2006002039
(In general formula (IV), n represents 0 or an integer of 1 to 10.)
Figure 2006002039
(In general formula (V), n represents 0 or an integer of 1 to 10.)
As a phenol aralkyl resin represented by the above general formula (II), a trade name XLC manufactured by Mitsui Chemicals, Inc. may be mentioned as a commercially available product. As a biphenyl aralkyl resin represented by the above general formula (III), Meiwa Kasei Co., Ltd. product name MEH-7851 is mentioned. Moreover, as a naphthol aralkyl resin shown by the said general formula (IV), Nippon Steel Chemical Co., Ltd. brand name SN-170 is mentioned as a commercial item, The naphthol aralkyl resin shown by the said general formula (V) is mentioned. As a commercial item, Nippon Steel Chemical Co., Ltd. product name SN-475 is mentioned. In addition, in the compounds represented by the general formulas (II) to (V), a compound in which any one of the hydrogen atoms on the benzene ring and the naphthalene ring is substituted with a hydrocarbon group is also represented by the general formula (I). include.

本発明では、(B)成分として、一般式(I)で表される硬化剤の他に、封止用エポキシ樹脂成形材料に一般に使用されている硬化剤を特に制限なく併用することができる。併用可能な硬化剤として、例えばフェノール、クレゾール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF、フェニルフェノール、アミノフェノール等のフェノール類及び/又はα−ナフトール、β−ナフトール、ジヒドロキシナフタレン等のナフトール類とホルムアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド基を有する化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック型フェノール樹脂、ジシクロペンタジエン型フェノール樹脂、テルペン変性フェノール樹脂、トリフェノールメタン型フェノール樹脂等が挙げられる。   In the present invention, as the component (B), in addition to the curing agent represented by the general formula (I), a curing agent generally used for an epoxy resin molding material for sealing can be used in combination without any particular limitation. Examples of curing agents that can be used in combination include phenols such as phenol, cresol, resorcin, catechol, bisphenol A, bisphenol F, phenylphenol, aminophenol, and / or naphthols such as α-naphthol, β-naphthol, dihydroxynaphthalene, and formaldehyde. , Novolak-type phenolic resin, dicyclopentadiene-type phenolic resin, terpene-modified phenolic resin, triphenolmethane-type phenolic resin, etc. obtained by condensation or cocondensation with compounds having an aldehyde group such as benzaldehyde, salicylaldehyde, etc. under an acidic catalyst Is mentioned.

(A)成分のエポキシ樹脂と(B)成分の硬化剤との当量比、すなわち、エポキシ樹脂中のエポキシ基数/硬化剤中の水酸基数の比は、特に制限はないが、それぞれの未反応分を少なく抑えるために0.5〜2の範囲に設定されることが好ましく、0.6〜1.5がより好ましい。成形性や信頼性に優れる封止用エポキシ樹脂成形材料を得るためには0.8〜1.2の範囲に設定されることがさらに好ましい。   The equivalent ratio of the (A) component epoxy resin and the (B) component curing agent, that is, the ratio of the number of epoxy groups in the epoxy resin / the number of hydroxyl groups in the curing agent is not particularly limited. Is preferably set in the range of 0.5 to 2, more preferably 0.6 to 1.5. In order to obtain an epoxy resin molding material for sealing which is excellent in moldability and reliability, it is more preferable to set in the range of 0.8 to 1.2.

本発明の(C)無機質充填剤は、吸湿性、線膨張係数低減、熱伝導性向上及び強度向上等の他、高い難燃性を確保する為に必要な成分である。無機質充填剤としては、例えば、溶融シリカ、結晶シリカ、アルミナ、ジルコン、珪酸カルシウム、炭酸カルシウム、チタン酸カリウム、炭化珪素、窒化珪素、窒化アルミ、窒化ホウ素、ベリリア、ジルコニア、ジルコン、フォステライト、ステアタイト、スピネル、ムライト、チタニア等の粉体、又はこれらを球形化したビーズ、ガラス繊維などが挙げられ、これらは単独で用いても2種以上を併用して用いてもよい。さらに、本発明の効果を失わない範囲で、難燃効果のある水酸化アルミニウム、水酸化マグネシウム等の金属水酸化物系無機質充填剤を添加してもよい。流動性、線膨張係数低減の観点からは、結晶シリカ、溶融シリカを用いることが好ましく、溶融シリカを用いることがより好ましく、球状溶融シリカを用いることが特に好ましい。
無機質充填剤の配合量は、特に銅リードフレームパッケージでの耐冷熱サイクル性の点から、成形材料全体の70重量%以上、88重量%以下とすることが好ましく、75重量%以上、85重量%以下とすることが特に好ましい。70重量%未満でも88重量%を超えても、ともに封止用エポキシ樹脂成形材料とリードフレームとの線膨張係数のミスマッチが顕著となる傾向があり、耐冷熱サイクル性に不利となる。
The (C) inorganic filler of the present invention is a component necessary for ensuring high flame retardance in addition to hygroscopicity, reduction of linear expansion coefficient, improvement of thermal conductivity and improvement of strength. Examples of the inorganic filler include fused silica, crystalline silica, alumina, zircon, calcium silicate, calcium carbonate, potassium titanate, silicon carbide, silicon nitride, aluminum nitride, boron nitride, beryllia, zirconia, zircon, fosterite, steer. Examples thereof include powders such as tight, spinel, mullite, and titania, or beads formed by spheroidizing these, and glass fibers. These may be used alone or in combination of two or more. Furthermore, you may add metal hydroxide type inorganic fillers, such as aluminum hydroxide and magnesium hydroxide with a flame-retardant effect, in the range which does not lose the effect of this invention. From the viewpoint of reducing fluidity and linear expansion coefficient, it is preferable to use crystalline silica or fused silica, more preferably fused silica, and particularly preferably spherical fused silica.
The blending amount of the inorganic filler is preferably 70% by weight or more and 88% by weight or less of the entire molding material, particularly from the viewpoint of cold heat cycle resistance in the copper lead frame package, and is 75% by weight or more and 85% by weight or less. The following is particularly preferable. When the amount is less than 70% by weight or more than 88% by weight, the mismatch of the linear expansion coefficient between the epoxy resin molding material for sealing and the lead frame tends to be remarkable, which is disadvantageous for the thermal cycle resistance.

また、本発明の効果の一つである高い難燃性を得る為には、平均粒径が15μm以上及び比表面積が4.5m/g以下の少なくとも一方である無機質充填剤を用いることが必要であり、平均粒径が18μm以上及び/又は比表面積が4.0m/g以下である無機質充填剤を用いることがより好ましく、平均粒径が20μm以上及び/又は比表面積が3.5m/g以下である無機質充填剤を用いることが特に好ましい。なお、ここで平均粒径及び比表面積とは、以下の方法により測定した値を指す。
(1)平均粒径
測定装置:(株)堀場製作所製レーザ回折/散乱式粒度分布測定装置LA-920
分散媒:ヘキサメタリン酸ナトリウム0.2wt/vol%水溶液
相対屈折率:1.10
透過率:70〜90%
循環速度:7
超音波時間:3分
超音波強度:7
(2)比表面積
測定装置:ユアサアイオニクス株式会社製流動法BET一点法比表面積測定装置モノソーブ
キャリアガス:窒素/ヘリウム混合ガス1.5kg/cm、窒素ガス0.7kg/ cm
試料脱気条件:200℃/30分
2種以上の性状の異なる無機質充填剤を併用する場合には、それぞれを充分混合後の性状が上記範囲内となるような選択を行うことが好ましい。上記範囲の平均粒径及び/又は比表面積を有する無機質充填剤は、封止用エポキシ樹脂成形材料の燃焼時に、相対的に断熱効果の大きな厚い表面膨張層を与え、それによって高い難燃性を与えると考えられる。
In order to obtain high flame retardancy, which is one of the effects of the present invention, an inorganic filler having an average particle size of 15 μm or more and a specific surface area of at least one of 4.5 m 2 / g or less is used. It is more preferable to use an inorganic filler having an average particle size of 18 μm or more and / or a specific surface area of 4.0 m 2 / g or less, and an average particle size of 20 μm or more and / or a specific surface area of 3.5 m. It is particularly preferable to use an inorganic filler that is 2 / g or less. In addition, an average particle diameter and a specific surface area point out the value measured with the following method here.
(1) Average particle size measuring device: Laser diffraction / scattering particle size distribution measuring device LA-920 manufactured by Horiba, Ltd.
Dispersion medium: sodium hexametaphosphate 0.2 wt / vol% aqueous solution relative refractive index: 1.10
Transmittance: 70-90%
Circulation speed: 7
Ultrasonic time: 3 minutes Ultrasonic intensity: 7
(2) Specific surface area measuring device: Flow method BET single point method specific surface area measuring device manufactured by Yuasa Ionics Co., Ltd. Monosorb Carrier gas: Nitrogen / helium mixed gas 1.5 kg / cm 2 , Nitrogen gas 0.7 kg / cm 2
Sample degassing condition: 200 ° C./30 minutes When two or more kinds of inorganic fillers having different properties are used in combination, it is preferable to perform selection so that the properties after sufficiently mixing each are within the above range. An inorganic filler having an average particle size and / or a specific surface area in the above range gives a thick surface expansion layer having a relatively large heat insulating effect when burning an epoxy resin molding material for sealing, thereby providing high flame retardancy. It is thought to give.

本発明では(A)〜(C)成分の他に、封止用エポキシ樹脂成形材料に通常用いられる硬化促進剤を、特に制限なく用いることができる。使用可能な硬化促進剤を例示すれば、トリブチルホスフィン、メチルジフェニルホスフィン、トリフェニルホスフィン、トリス(4−メチルフェニル)ホスフィン、ジフェニルホスフィン、フェニルホスフィン等の有機ホスフィン、及びこれらの有機ホスフィンに無水マレイン酸、1,4−ベンゾキノン、2,5−トルキノン、1,4−ナフトキノン、2,3−ジメチルベンゾキノン、2,6−ジメチルベンゾキノン、2,3−ジメトキシ−5−メチル−1,4−ベンゾキノン、2,3−ジメトキシ−1,4−ベンゾキノン、フェニル−1,4−ベンゾキノン等のキノン化合物、ジアゾフェニルメタン、フェノール樹脂等のπ結合をもつ化合物を付加してなる分子内分極を有する化合物等の有機リン化合物、テトラフェニルホスホニウムテトラフェニルボレート、トリフェニルホスフィンテトラフェニルボレート、2−エチル−4−メチルイミダゾールテトラフェニルボレート、N−メチルモルホリンテトラフェニルボレート等のテトラフェニルボロン塩及びこれらの誘導体などの有機リン系硬化促進剤、1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7、1,5−ジアザ−ビシクロ(4,3,0)ノネン、5,6−ジブチルアミノ−1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7等のシクロアミジン化合物等のアミン系硬化促進剤、2−メチルイミダゾール、2−フェニルイミダゾール、2−フェニル−4−メチルイミダゾール等のイミダゾール系硬化促進剤等を挙げることが可能で、これらは単独で使用しても2種以上を併用して使用しても構わない。成形性や信頼性、難燃性の点からは、有機ホスフィンとキノン化合物との付加物が好ましい。   In the present invention, in addition to the components (A) to (C), a curing accelerator usually used for an epoxy resin molding material for sealing can be used without any particular limitation. Examples of usable curing accelerators include organic phosphines such as tributylphosphine, methyldiphenylphosphine, triphenylphosphine, tris (4-methylphenyl) phosphine, diphenylphosphine and phenylphosphine, and maleic anhydride to these organic phosphines. 1,4-benzoquinone, 2,5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, 2,3-dimethoxy-5-methyl-1,4-benzoquinone, 2 Organic compounds such as compounds having intramolecular polarization formed by adding a quinone compound such as 1,3-dimethoxy-1,4-benzoquinone and phenyl-1,4-benzoquinone, a compound having a π bond such as diazophenylmethane and phenol resin Phosphorus compounds, tetraphenylphosphonium teto Organophosphorus curing accelerators such as tetraphenylboron salts such as phenylborate, triphenylphosphinetetraphenylborate, 2-ethyl-4-methylimidazoletetraphenylborate, N-methylmorpholinetetraphenylborate and derivatives thereof, 8-diaza-bicyclo (5,4,0) undecene-7, 1,5-diaza-bicyclo (4,3,0) nonene, 5,6-dibutylamino-1,8-diaza-bicyclo (5,4 , 0) Amine curing accelerators such as cycloamidine compounds such as undecene-7, imidazole curing accelerators such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, etc. These may be used alone or in combination of two or more. From the viewpoint of moldability, reliability, and flame retardancy, an adduct of an organic phosphine and a quinone compound is preferable.

硬化促進剤の配合量は、硬化促進効果が達成される量であれば特に制限されるものではないが、エポキシ樹脂(A)に対して0.1〜10重量%が好ましく、より好ましくは1〜5重量%である。0.1重量%未満では短時間での硬化性に劣る傾向があり、10重量%を超えると硬化速度が速すぎて未充填等により良好な成形品を得ることが困難になる傾向がある。   The blending amount of the curing accelerator is not particularly limited as long as the curing acceleration effect is achieved, but is preferably 0.1 to 10% by weight, more preferably 1 with respect to the epoxy resin (A). ~ 5% by weight. If it is less than 0.1% by weight, the curability in a short time tends to be inferior. If it exceeds 10% by weight, the curing rate tends to be too fast, and it tends to be difficult to obtain a good molded product due to unfilling or the like.

本発明では又、成形時の金型からの円滑な離型性を確保する為に、ステアリン酸、モンタン酸等の高級脂肪酸系ワックス、ステアリン酸エステル、モンタン酸エステル等の高級脂肪酸エステル系ワックス、ポリエチレンをはじめとするポリオレフィン等、封止用エポキシ樹脂成形材料に用いられる従来公知の離型剤を単独、又は併用して用いることができる。   In the present invention, in order to ensure smooth releasability from the mold during molding, higher fatty acid waxes such as stearic acid and montanic acid, higher fatty acid ester waxes such as stearic acid ester and montanic acid ester, Conventionally known release agents used for epoxy resin molding materials for sealing, such as polyolefin including polyethylene, can be used alone or in combination.

本発明の封止用エポキシ樹脂成形材料には、IC等の半導体素子の耐湿性、高温放置特性を向上させる観点から陰イオン交換体を添加することもできる。陰イオン交換体としては特に制限はなく、従来公知のものを用いることができるが、例えば、ハイドロタルサイトや、ビスマス、ジルコニウム、チタン、スズ、マグネシウム、アルミニウムから選ばれる元素の含水酸化物等が挙げられ、これらを単独で又は2種以上を組み合わせて用いることができる。中でも、下記一般式(VI)で示されるハイドロタルサイト及びビスマスの含水酸化物が好ましい。
(化7)
Mg1−XAl(OH)(COX/2・mHO ……(VI)
(0<X≦0.5、mは正の整数)
陰イオン交換体の配合量は、ハロゲンイオン等のイオン性不純物を捕捉できる十分な量であれば特に制限はないが、(A)成分のエポキシ樹脂に対して0.1〜30重量%が好ましく、1〜10重量%がより好ましく、2〜5重量%がさらに好ましい。配合量が0.1重量%未満ではイオン性不純物の捕捉が不十分になる傾向があり、30重量%を超えた場合それ以下に比べて効果に大差がないため経済的に不利である。
An anion exchanger can be added to the sealing epoxy resin molding material of the present invention from the viewpoint of improving the moisture resistance and high temperature storage characteristics of a semiconductor element such as an IC. The anion exchanger is not particularly limited, and conventionally known anion exchangers can be used. Examples thereof include hydrotalcite and hydrated oxides of elements selected from bismuth, zirconium, titanium, tin, magnesium, and aluminum. These may be used alone or in combination of two or more. Among these, hydrotalcite and bismuth hydrous oxide represented by the following general formula (VI) are preferable.
(Chemical formula 7)
Mg 1-X Al X (OH) 2 (CO 3 ) X / 2 · mH 2 O (VI)
(0 <X ≦ 0.5, m is a positive integer)
The amount of the anion exchanger is not particularly limited as long as it is sufficient to capture ionic impurities such as halogen ions, but is preferably 0.1 to 30% by weight with respect to the epoxy resin of component (A). 1-10 weight% is more preferable, and 2-5 weight% is further more preferable. If the blending amount is less than 0.1% by weight, trapping of ionic impurities tends to be insufficient, and if it exceeds 30% by weight, there is no significant difference in the effect compared to the amount less than that, which is economically disadvantageous.

本発明の封止用エポキシ樹脂成形材料には、樹脂成分と無機質充填剤との接着性を高めるために、必要に応じて、エポキシシラン、メルカプトシラン、アミノシラン、アルキルシラン、ウレイドシラン、ビニルシラン等の各種シラン系化合物、チタン系化合物、アルミニウムキレート類、アルミニウム/ジルコニウム系化合物等の公知のカップリング剤を添加することができる。これらは単独で用いても、2種以上を併用して用いても構わない。
上記カップリング剤の配合量は、無機質充填剤に対して0.05〜5重量%であることが好ましく、0.1〜2.5重量%がより好ましい。0.05重量%未満では耐湿性が低下する傾向があり、5重量%を超えるとパッケージの成形性が低下する傾向がある。
In the epoxy resin molding material for sealing of the present invention, an epoxy silane, a mercapto silane, an amino silane, an alkyl silane, a ureido silane, a vinyl silane, etc. are used as necessary in order to improve the adhesion between the resin component and the inorganic filler. Various known coupling agents such as various silane compounds, titanium compounds, aluminum chelates, and aluminum / zirconium compounds can be added. These may be used alone or in combination of two or more.
The blending amount of the coupling agent is preferably 0.05 to 5% by weight, more preferably 0.1 to 2.5% by weight, based on the inorganic filler. If it is less than 0.05% by weight, the moisture resistance tends to decrease, and if it exceeds 5% by weight, the moldability of the package tends to decrease.

本発明の成形材料においては、特に耐熱性の観点から、臭素化エポキシ樹脂等のハロゲン系難燃剤の含有量と、三酸化アンチモン、四酸化アンチモン、五酸化アンチモン等のアンチモン系難燃剤の含有量とは、いずれも成形材料全体の0.1重量%以下であることが好ましい。ハロゲン系難燃剤及びアンチモン系難燃剤のいずれも含まないことがより好ましい。
さらに、本発明の封止用エポキシ樹脂成形材料には、本発明の効果を損なわない範囲で、カーボンブラック、有機染料、有機顔料、酸化チタン、鉛丹、ベンガラ等の着色剤、イミダゾール、トリアゾール、テトラゾール、トリアジン等及びこれらの誘導体、アントラニル酸、没食子酸、マロン酸、リンゴ酸、マレイン酸、アミノフェノール、キノリン等及びこれらの誘導体、脂肪族酸アミド化合物、ジチオカルバミン酸塩、チアジアゾール誘導体等の接着促進剤などを必要に応じて配合することができる。
In the molding material of the present invention, particularly from the viewpoint of heat resistance, the content of halogenated flame retardants such as brominated epoxy resins and the content of antimony flame retardants such as antimony trioxide, antimony tetroxide, and antimony pentoxide. Is preferably 0.1% by weight or less of the entire molding material. More preferably, neither halogen-based flame retardant nor antimony-based flame retardant is included.
Furthermore, in the epoxy resin molding material for sealing of the present invention, the colorant such as carbon black, organic dye, organic pigment, titanium oxide, red lead, bengara, imidazole, triazole, as long as the effects of the present invention are not impaired. Adhesion promotion of tetrazole, triazine, etc. and their derivatives, anthranilic acid, gallic acid, malonic acid, malic acid, maleic acid, aminophenol, quinoline, etc. and their derivatives, aliphatic acid amide compounds, dithiocarbamates, thiadiazole derivatives, etc. An agent etc. can be mix | blended as needed.

本発明の封止用エポキシ樹脂成形材料は、各種原材料を均一に分散混合できるのであれば、いかなる手法を用いても調製できるが、一般的な手法として、所定の配合量の原材料をミキサー等によって十分混合した後、ミキシングロール、ニーダ、押出機等によって溶融混練した後、冷却、粉砕する方法を挙げることができる。成形条件に合うような寸法及び重量でタブレット化すると使いやすい。   The epoxy resin molding material for sealing of the present invention can be prepared by any method as long as various raw materials can be uniformly dispersed and mixed. However, as a general method, a raw material having a predetermined blending amount is mixed with a mixer or the like. A method of sufficiently cooling and pulverizing after mixing and melting and kneading with a mixing roll, a kneader, an extruder or the like can be mentioned. It is easy to use if it is tableted with dimensions and weight that match the molding conditions.

また、本発明の封止用エポキシ樹脂成形材料は、各種有機溶剤に溶かして液状封止用エポキシ樹脂成形材料として使用することもでき、この液状封止用エポキシ樹脂成形材料を板又はフィルム上に薄く塗布し、樹脂の硬化反応が余り進まないような条件で有機溶剤を飛散させることによって得られるシートあるいはフィルム状の封止用エポキシ樹脂成形材料として使用することもできる。   Moreover, the epoxy resin molding material for sealing of the present invention can be dissolved in various organic solvents and used as a liquid epoxy resin molding material for liquid sealing. This liquid epoxy resin molding material for liquid sealing can be used on a plate or a film. It can also be used as an epoxy resin molding material for sealing in the form of a sheet or film obtained by coating thinly and scattering the organic solvent under conditions that do not allow the resin curing reaction to proceed so much.

本発明で得られる封止用エポキシ樹脂成形材料により素子を封止して得られる電子部品装置としては、リードフレーム、配線済みのテープキャリア、配線板、ガラス、シリコンウエハ等の支持部材に、半導体チップ、トランジスタ、ダイオード、サイリスタ等の能動素子、コンデンサ、抵抗体、コイル等の受動素子等の素子を搭載し、必要な部分を本発明の封止用エポキシ樹脂成形材料で封止した、電子部品装置などが挙げられる。このような電子部品装置としては、例えば、リードフレーム上に半導体素子を固定し、ボンディングパッド等の素子の端子部とリード部をワイヤボンディングやバンプで接続した後、本発明の封止用エポキシ樹脂成形材料を用いてトランスファ成形などにより封止してなる、DIP(Dual Inline Package)、PLCC(Plastic Leaded Chip Carrier)、QFP(Quad Flat Package)、SOP(Small Outline Package)、SOJ(Small Outline J-lead package)、TSOP(Thin Small Outline Package)、TQFP(Thin Quad Flat Package)等の一般的な樹脂封止型IC、テープキャリアにバンプで接続した半導体チップを、本発明の封止用エポキシ樹脂成形材料で封止したTCP(Tape Carrier Package)、配線板やガラス上に形成した配線に、ワイヤボンディング、フリップチップボンディング、はんだ等で接続した半導体チップ、トランジスタ、ダイオード、サイリスタ等の能動素子及び/又はコンデンサ、抵抗体、コイル等の受動素子を、本発明の封止用エポキシ樹脂成形材料で封止したCOB(Chip On Board)モジュール、ハイブリッドIC、マルチチップモジュール、配線板接続用の端子を形成した有機基板に素子を搭載し、バンプまたはワイヤボンディングにより素子と有機基板に形成された配線を接続した後、本発明の封止用エポキシ樹脂成形材料で素子を封止したBGA(Ball Grid Array)、CSP(Chip Size Package)などが挙げられる。また、プリント回路板にも本発明の封止用エポキシ樹脂成形材料は有効に使用できる。   As an electronic component device obtained by sealing an element with the sealing epoxy resin molding material obtained in the present invention, a lead frame, a wired tape carrier, a wiring board, glass, a silicon wafer, a support member such as a semiconductor Electronic components equipped with active elements such as chips, transistors, diodes, and thyristors, and passive elements such as capacitors, resistors, and coils, and encapsulated with the epoxy resin molding material for sealing of the present invention. Examples thereof include devices. As such an electronic component device, for example, a semiconductor element is fixed on a lead frame, and a terminal portion and a lead portion of an element such as a bonding pad are connected by wire bonding or bump, and then the epoxy resin for sealing of the present invention is used. DIP (Dual Inline Package), PLCC (Plastic Leaded Chip Carrier), QFP (Quad Flat Package), SOP (Small Outline Package), SOJ (Small Outline J-) General resin-encapsulated ICs such as lead package (TSP), TSOP (Thin Small Outline Package), and TQFP (Thin Quad Flat Package), and semiconductor chips connected to the tape carrier by bumps are molded with epoxy resin for sealing. TCP (Tape Carrier Package) sealed with materials, wire bonding, flip chip bonding to wiring formed on wiring boards and glass COB (Chip On) in which active elements such as semiconductor chips, transistors, diodes, thyristors and / or passive elements such as capacitors, resistors, coils, etc., which are connected by solder or the like, are sealed with the sealing epoxy resin molding material of the present invention. Board) module, hybrid IC, multi-chip module, an element mounted on an organic substrate on which a wiring board connection terminal is formed, and after connecting the element and the wiring formed on the organic substrate by bump or wire bonding, Examples thereof include BGA (Ball Grid Array) and CSP (Chip Size Package) in which the element is sealed with a sealing epoxy resin molding material. Moreover, the epoxy resin molding material for sealing of the present invention can also be used effectively for printed circuit boards.

本発明の封止用エポキシ樹脂成形材料を用いて素子を封止する方法としては、低圧トランスファ成形法が最も一般的であるが、インジェクション成形法、圧縮成形法等を用いてもよい。封止用エポキシ樹脂成形材料が常温で液状又はペースト状の場合は、ディスペンス方式、注型方式、印刷方式等が挙げられる。   As a method for sealing an element using the epoxy resin molding material for sealing of the present invention, a low-pressure transfer molding method is the most common, but an injection molding method, a compression molding method, or the like may be used. When the sealing epoxy resin molding material is liquid or pasty at normal temperature, a dispensing method, a casting method, a printing method, and the like can be given.

また、素子を直接樹脂封止する一般的な封止方法ばかりではなく、素子に直接電子部品封止用エポキシ樹脂成形材料が接触しない形態である中空パッケージの方式もあり、中空パッケージ用の封止用エポキシ樹脂成形材料としても好適に使用できる。   Also, not only a general sealing method for directly sealing an element with a resin, but also a hollow package system in which an epoxy resin molding material for sealing an electronic component is not in direct contact with the element, sealing for a hollow package Also suitable for use as an epoxy resin molding material.

実施例1〜7、及び比較例1〜10
(A)成分のエポキシ樹脂として、ジヒドロキシナフタレン2量体のエポキシ化物を主成分とするエポキシ樹脂(エポキシ樹脂1、エポキシ当量168、軟化点70℃、大日本インキ化学工業株式会社製商品名HP−4701)、
(A)成分の比較エポキシ樹脂としてエポキシ当量196、融点106℃のビフェニル型エポキシ樹脂(比較エポキシ樹脂1、ジャパンエポキシレジン株式会社製商品名エピコートYX−4000H)、
エポキシ当量170、軟化点60℃のトリフェノールメタン型エポキシ樹脂(比較エポキシ樹脂2、ジャパンエポキシレジン株式会社製商品名エピコート1032H60)を用意した。
(B)成分の硬化剤として水酸基当量200、軟化点65℃のビフェニル・アラルキル型フェノール樹脂(硬化剤1、明和化成株式会社製商品名MEH-7851)、
水酸基当量185、軟化点67℃のβ−ナフトール・アラルキル樹脂(硬化剤2、新日鉄化学株式会社製商品名SN−170L)、水酸基当量103、軟化点83℃のトリフェニルメタン型フェノール樹脂(比較硬化剤1、明和化成株式会社製商品名MEH−7500)を用意した。
(C)成分として平均粒径25μm、比表面積2.5m2/gの球状シリカ(株式会社マイクロン社製商品名S30-71)、平均粒径6μm、比表面積4.5m2/gの球状シリカ(電気化学工業株式会社製商品名FB-304)、及び平均粒径0.5μm、比表面積6.5m2/gの球状シリカ(株式会社アドマテックス製商品名SO-25R)を7/2/1の重量比率で混合した無機質充填剤(無機充填剤1。平均粒径22μm、比表面積3.3m2/g)、
同じく5/4/1の重量比率で混合した無機質充填剤(無機充填剤2。平均粒径18μm、比表面積3.8m2/g)、
平均粒径22μm、比表面積3.0m2/gの粗球シリカ(株式会社龍森製商品名MSR-2507)、前記FB-304、及び前記SO-25Rを7/2/1の重量比率で混合した無機質充填剤(無機充填剤3。平均粒径20μm、比表面積3.5m2/g)、
平均粒径20μm、比表面積3.5m2/gの粗球シリカ(株式会社マイクロン製商品名S-COX31)、前記FB-304、及び前記SO-25Rを7/2/1の重量比率で混合した無機質充填剤(無機充填剤4。平均粒径18μm、比表面積3.4m2/g)、
平均粒径25μm、比表面積1.5m2/gの粗球シリカ(電気化学工業株式会社製商品名FB-950)、及び前記SO-25Rを9/1の重量比率で混合した無機質充填剤(無機充填剤5。平均粒径24μm、比表面積1.8m2/g)、
平均粒径10μm、比表面積3.0m2/gの粗球シリカ(電気化学工業株式会社製商品名FB-105X)、及び前記SO-25Rを9/1の重量比率で混合した無機質充填剤(無機充填剤6。平均粒径16μm、比表面積3.3m2/g)および、前記S30-71、前記FB-304、及び前記SO-25Rを2/7/1の重量比率で混合した無機質充填剤(比較無機充填剤1。平均粒径13μm、比表面積4.6m2/g)、
平均粒径7μm、比表面積4.5μmの球状シリカ(電気化学工業株式会社製商品名FB-105)、及び前記SO-25Rを9/1の重量比率で混合した無機質充填剤(比較無機充填剤2。平均粒径13μm、比表面積4.6m2/g)を用意した。
硬化促進剤としてトリフェニルホスフィンとp−ベンゾキノンとの付加反応物、離型剤として酸化型ポリエチレン、カップリング剤としてγ−グリシドキシプロピルトリメトキシシラン(エポキシシラン)、着色剤としてカーボンブラック(三菱化学株式会社製商品名MA−100)を用意した。
これらを、それぞれ表1及び表2に示す重量部で配合し、混練温度80℃、混練時間10分の条件でロール混練を行い、実施例及び比較例の封止用エポキシ樹脂成形材料を作製した。
Examples 1-7 and Comparative Examples 1-10
As the epoxy resin of component (A), an epoxy resin (epoxy resin 1, epoxy equivalent 168, softening point 70 ° C., trade name HP-manufactured by Dainippon Ink & Chemicals, Inc.) having an epoxidized product of dihydroxynaphthalene dimer as a main component 4701),
As a comparative epoxy resin of component (A), an epoxy equivalent of 196, a biphenyl type epoxy resin having a melting point of 106 ° C. (Comparative epoxy resin 1, trade name Epicoat YX-4000H manufactured by Japan Epoxy Resin Co., Ltd.),
A triphenolmethane type epoxy resin having an epoxy equivalent of 170 and a softening point of 60 ° C. (Comparative Epoxy Resin 2, trade name Epicoat 1032H60 manufactured by Japan Epoxy Resin Co., Ltd.) was prepared.
(B) Biphenyl aralkyl type phenol resin having a hydroxyl equivalent of 200 and a softening point of 65 ° C. as a curing agent for the component (curing agent 1, trade name MEH-7851 manufactured by Meiwa Kasei Co., Ltd.),
Β-naphthol aralkyl resin having a hydroxyl group equivalent of 185 and a softening point of 67 ° C. (curing agent 2, trade name SN-170L manufactured by Nippon Steel Chemical Co., Ltd.), triphenylmethane type phenol resin having a hydroxyl group equivalent of 103 and a softening point of 83 ° C. (comparative curing) Agent 1, Meiwa Kasei Co., Ltd. trade name MEH-7500) was prepared.
(C) Spherical silica having a mean particle size of 25 μm and a specific surface area of 2.5 m 2 / g (trade name S30-71, manufactured by Micron Co., Ltd.), spherical silica having a mean particle size of 6 μm and a specific surface area of 4.5 m 2 / g (Trade name FB-304, manufactured by Denki Kagaku Kogyo Co., Ltd.) and 7/2 / spherical silica (trade name: SO-25R manufactured by Admatechs Co., Ltd.) having an average particle size of 0.5 μm and a specific surface area of 6.5 m 2 / g. Inorganic filler mixed at a weight ratio of 1 (inorganic filler 1. average particle size 22 μm, specific surface area 3.3 m 2 / g),
Similarly, an inorganic filler mixed at a weight ratio of 5/4/1 (inorganic filler 2. Average particle size 18 μm, specific surface area 3.8 m 2 / g),
Coarse sphere silica (trade name MSR-2507 manufactured by Tatsumori Co., Ltd.) having an average particle size of 22 μm and a specific surface area of 3.0 m 2 / g, FB-304, and SO-25R in a weight ratio of 7/2/1. Mixed inorganic filler (inorganic filler 3. Average particle size 20 μm, specific surface area 3.5 m 2 / g),
Coarse spherical silica (trade name: S-COX31 manufactured by Micron Co., Ltd.) having an average particle size of 20 μm and a specific surface area of 3.5 m 2 / g, FB-304, and SO-25R are mixed at a weight ratio of 7/2/1. Inorganic filler (inorganic filler 4. Average particle size 18 μm, specific surface area 3.4 m 2 / g),
Rough spherical silica (trade name FB-950, manufactured by Denki Kagaku Kogyo Co., Ltd.) having an average particle size of 25 μm and a specific surface area of 1.5 m 2 / g, and an inorganic filler in which the SO-25R is mixed at a weight ratio of 9/1 ( Inorganic filler 5. Average particle size 24 μm, specific surface area 1.8 m 2 / g),
An inorganic filler in which a coarse spherical silica (trade name FB-105X, manufactured by Denki Kagaku Kogyo Co., Ltd.) having an average particle size of 10 μm and a specific surface area of 3.0 m 2 / g, and the SO-25R are mixed at a weight ratio of 9/1 ( Inorganic filler 6. Average particle size 16 μm, specific surface area 3.3 m 2 / g) and inorganic filling in which S30-71, FB-304, and SO-25R are mixed in a weight ratio of 2/7/1 Agent (Comparative inorganic filler 1. Average particle size 13 μm, specific surface area 4.6 m 2 / g),
Spherical silica having an average particle size of 7 μm and a specific surface area of 4.5 μm (trade name FB-105 manufactured by Denki Kagaku Kogyo Co., Ltd.) and an inorganic filler (comparative inorganic filler) in which the SO-25R is mixed at a weight ratio of 9/1. 2. An average particle diameter of 13 μm and a specific surface area of 4.6 m 2 / g were prepared.
Addition reaction product of triphenylphosphine and p-benzoquinone as a curing accelerator, oxidized polyethylene as a release agent, γ-glycidoxypropyltrimethoxysilane (epoxysilane) as a coupling agent, and carbon black as a colorant (Mitsubishi) Chemical brand name MA-100) was prepared.
These were blended in parts by weight shown in Table 1 and Table 2, respectively, and roll kneading was carried out under conditions of a kneading temperature of 80 ° C. and a kneading time of 10 minutes to produce epoxy resin molding materials for sealing of Examples and Comparative Examples. .

Figure 2006002039
Figure 2006002039

Figure 2006002039
Figure 2006002039

作製した実施例及び比較例の封止用エポキシ樹脂成形材料を、次の各試験により評価した。評価結果を表3及び表4に示す。   The produced epoxy resin molding materials for sealing of Examples and Comparative Examples were evaluated by the following tests. The evaluation results are shown in Tables 3 and 4.

なお、封止用エポキシ樹脂成形材料の成形は、トランスファ成形機により、金型温度180℃、成形圧力6.9MPa、硬化時間90秒の条件で行った。また、後硬化は175℃で6時間行った。
(1)スパイラルフロー(流動性の指標)
EMMI−1−66に順じてスパイラルフロー測定用金型を用いて、封止用エポキシ樹脂成形材料を上記条件で成形し、流動距離(cm)を求めた。
(3)燃焼性
後硬化後の試験片(試験片厚み1/8inch)を用いて、94UL規格に従い、燃焼性の判定を行った。
(4)耐熱性
SOP-28p(42Alloy リードフレーム)にTEG-ML1020チップ(Line/Space=20μm/20μm領域2ヶ所:1.90×4.20mm、Line/Space=10μm/10μm領域2ヶ所:1.90×4.20mm)を搭載し、リードフレームとチップとをφ20μmの金線により接続した。その後、作製した成形材料による封止を行い、後硬化後、195℃環境中に1000時間放置した。
各成形材料による作製パッケージN=10のうち、放置後の電気導通の有無を測定し、計4配線のうち、1配線でも導通不具合のあるパッケージをNGパッケージとしてカウントした。
(5)耐冷熱サイクル性
QFP1420×2.0mmt(EFTEC-64Tリードフレーム/フラットアイランド)にシリコンチップ(8×10mm/窒化珪素保護膜)を搭載した。ダイボンド材には日立化成工業(株)社製EN-4065Dを用いた。ダイボンド材の硬化条件は210℃/2分とした。成形材料による封止を行い、後硬化後、パッケージを液体窒素(−196℃)とシリコーンオイル(150℃)とに各2分間ずつ交互に浸す形での冷熱サイクル試験を行った。50サイクル後のパッケージを株式会社日立製作所製SATを用いて観察し、チップ剥離、リードフレーム剥離、パッケージクラックの有無を判定した。各成形材料による作製パッケージN=10のうち、剥離やクラック等の不具合の発生したパッケージをNGパッケージとしてカウントした。
The epoxy resin molding material for sealing was molded by a transfer molding machine under conditions of a mold temperature of 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 90 seconds. Further, post-curing was performed at 175 ° C. for 6 hours.
(1) Spiral flow (fluidity index)
The sealing epoxy resin molding material was molded under the above conditions using a spiral flow measurement mold in accordance with EMMI-1-66, and the flow distance (cm) was determined.
(3) Flammability Using the post-cured test piece (test piece thickness 1/8 inch), the flammability was determined according to the 94 UL standard.
(4) Heat resistance TEG-ML1020 chip on SOP-28p (42Alloy lead frame) (Line / Space = 20 μm / 20 μm area 2 locations: 1.90 × 4.20 mm, Line / Space = 10 μm / 10 μm area 2 locations: 1 .90 × 4.20 mm), and the lead frame and the chip were connected by a gold wire of φ20 μm. Then, sealing with the produced molding material was performed, and after post-curing, it was left in an environment of 195 ° C. for 1000 hours.
Of the manufactured packages N = 10 made of each molding material, the presence or absence of electrical continuity after being left was measured, and among the total of 4 wirings, the package having continuity failure even with one wiring was counted as an NG package.
(5) Cold and heat cycle resistance A silicon chip (8 × 10 mm / silicon nitride protective film) was mounted on QFP1420 × 2.0 mmt (EFTEC-64T lead frame / flat island). EN-4065D manufactured by Hitachi Chemical Co., Ltd. was used as the die bond material. The curing condition of the die bond material was 210 ° C./2 minutes. Sealing with a molding material was carried out, and after post-curing, a cooling cycle test was conducted in which the package was alternately immersed in liquid nitrogen (-196 ° C.) and silicone oil (150 ° C.) for 2 minutes each. The package after 50 cycles was observed using SAT manufactured by Hitachi, Ltd., and the presence or absence of chip peeling, lead frame peeling, or package cracking was determined. Of the production packages N = 10 made of each molding material, the packages with defects such as peeling and cracking were counted as NG packages.

Figure 2006002039
Figure 2006002039

Figure 2006002039
Figure 2006002039

本発明の(A)成分、又は(B)成分が規定より外れる比較例1〜6はいずれも難燃性に劣り、比較例5、6は耐冷熱サイクル性にも劣る。また、(C)成分が規定より外れる比較例7〜10もやはり難燃性に劣る。   Comparative Examples 1 to 6 in which the component (A) or the component (B) of the present invention deviates from the specifications are all inferior in flame retardancy, and Comparative Examples 5 and 6 are also inferior in cold-heat cycle resistance. Moreover, the comparative examples 7-10 from which (C) component remove | deviates from prescription | regulation are also inferior to a flame retardance.

これに対し、本発明の(A)〜(C)成分をすべて含有し、(C)成分が適正な範囲である実施例1〜7は、流動性等の成形性、難燃性、耐熱性や耐冷熱サイクル性のいずれにも優れることがわかる。

On the other hand, Examples 1-7 which contain all (A)-(C) component of this invention, and (C) component is an appropriate range are moldability, such as fluidity | liquidity, a flame retardance, and heat resistance. It can be seen that both the heat resistance and the thermal cycle resistance are excellent.

Claims (5)

(A)ヒドロキシナフタレン及びジヒドロキシナフタレンの少なくともいずれかの2量体をグリシジルエーテル化して得られるエポキシ樹脂を含むエポキシ樹脂、(B)下記一般式(I)で表される化合物を含む硬化剤、(C)無機質充填剤を含有し、前記(C)成分は、平均粒径が15μm以上及び比表面積が4.5m2/g以下の少なくともいずれかである封止用エポキシ樹脂成形材料。
Figure 2006002039
(一般式(I)で、nは0、又は正の整数を表し、A及びB中のベンゼン環及びナフタレン環上の水素原子は炭化水素基で置換されていてもよい。)
(A) an epoxy resin containing an epoxy resin obtained by glycidyl etherification of at least one dimer of hydroxynaphthalene and dihydroxynaphthalene, (B) a curing agent containing a compound represented by the following general formula (I), C) An epoxy resin molding material for sealing, containing an inorganic filler, wherein the component (C) is at least one having an average particle size of 15 μm or more and a specific surface area of 4.5 m 2 / g or less.
Figure 2006002039
(In general formula (I), n represents 0 or a positive integer, and the hydrogen atom on the benzene ring and naphthalene ring in A and B may be substituted with a hydrocarbon group.)
ハロゲン系難燃剤及びアンチモン系難燃剤の含有量がいずれも成形材料全体の0.1重量%以下である請求項1に記載の封止用エポキシ樹脂成形材料。   2. The epoxy resin molding material for sealing according to claim 1, wherein the content of both the halogen-based flame retardant and the antimony-based flame retardant is 0.1% by weight or less of the entire molding material. ハロゲン系難燃剤及びアンチモン系難燃剤を含まない請求項2に記載の封止用エポキシ樹脂成形材料。   The epoxy resin molding material for sealing according to claim 2, which does not contain a halogen flame retardant and an antimony flame retardant. (C)無機質充填剤量が成形材料全体の70重量%以上88重量%以下である請求項1〜3のいずれかに記載の封止用エポキシ樹脂成形材料。   The epoxy resin molding material for sealing according to any one of claims 1 to 3, wherein the amount of the inorganic filler (C) is 70 wt% or more and 88 wt% or less of the entire molding material. 請求項1〜4のいずれかに記載の封止用エポキシ樹脂成形材料により封止された素子を備えた電子部品装置。

The electronic component apparatus provided with the element sealed with the epoxy resin molding material for sealing in any one of Claims 1-4.

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008088278A (en) * 2006-09-30 2008-04-17 Sumitomo Bakelite Co Ltd Liquid resin composition and semiconductor device using the same
JP2009286841A (en) * 2008-05-27 2009-12-10 Panasonic Electric Works Co Ltd Epoxy resin composition for encapsulation and semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008088278A (en) * 2006-09-30 2008-04-17 Sumitomo Bakelite Co Ltd Liquid resin composition and semiconductor device using the same
JP2009286841A (en) * 2008-05-27 2009-12-10 Panasonic Electric Works Co Ltd Epoxy resin composition for encapsulation and semiconductor device

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