JP2005526183A5 - - Google Patents
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- Publication number
- JP2005526183A5 JP2005526183A5 JP2004505399A JP2004505399A JP2005526183A5 JP 2005526183 A5 JP2005526183 A5 JP 2005526183A5 JP 2004505399 A JP2004505399 A JP 2004505399A JP 2004505399 A JP2004505399 A JP 2004505399A JP 2005526183 A5 JP2005526183 A5 JP 2005526183A5
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- copper
- nickel
- substrate
- phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/150,382 | 2002-05-17 | ||
| US10/150,382 US6764556B2 (en) | 2002-05-17 | 2002-05-17 | Copper-nickel-silicon two phase quench substrate |
| PCT/US2003/015665 WO2003097886A1 (en) | 2002-05-17 | 2003-05-15 | Copper-nickel-silicon two phase quench substrate |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010214995A Division JP5411826B2 (ja) | 2002-05-17 | 2010-09-27 | 銅‐ニッケル‐ケイ素二相急冷基体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005526183A JP2005526183A (ja) | 2005-09-02 |
| JP2005526183A5 true JP2005526183A5 (enExample) | 2006-05-25 |
| JP5128756B2 JP5128756B2 (ja) | 2013-01-23 |
Family
ID=29548330
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004505399A Expired - Fee Related JP5128756B2 (ja) | 2002-05-17 | 2003-05-15 | 銅‐ニッケル‐ケイ素二相急冷基体 |
| JP2010214995A Expired - Fee Related JP5411826B2 (ja) | 2002-05-17 | 2010-09-27 | 銅‐ニッケル‐ケイ素二相急冷基体 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010214995A Expired - Fee Related JP5411826B2 (ja) | 2002-05-17 | 2010-09-27 | 銅‐ニッケル‐ケイ素二相急冷基体 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6764556B2 (enExample) |
| JP (2) | JP5128756B2 (enExample) |
| KR (1) | KR100627924B1 (enExample) |
| CN (1) | CN1685067B (enExample) |
| AU (1) | AU2003233567A1 (enExample) |
| DE (1) | DE10392662B4 (enExample) |
| RU (1) | RU2317346C2 (enExample) |
| TW (1) | TWI314165B (enExample) |
| WO (1) | WO2003097886A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7291231B2 (en) * | 2002-05-17 | 2007-11-06 | Metglas, Inc. | Copper-nickel-silicon two phase quench substrate |
| RU2374033C1 (ru) * | 2008-06-26 | 2009-11-27 | Открытое акционерное общество "Ашинский металлургический завод" | Способ изготовления аморфных и нанокристаллических металлических лент скоростной закалкой и устройство для его осуществления |
| KR102107286B1 (ko) * | 2013-07-15 | 2020-05-06 | 소니 주식회사 | 비트스트림을 처리하기 위한 장치 및 방법 |
| AT16355U1 (de) * | 2017-06-30 | 2019-07-15 | Plansee Se | Schleuderring |
| CN111386354B (zh) * | 2017-11-17 | 2022-04-19 | 美题隆公司 | 由铍铜合金形成的金属环 |
| CN110923510B (zh) * | 2019-12-16 | 2021-08-31 | 大连大学 | 一种高择优取向NiMnGa磁记忆合金丝的制备方法 |
| JP2021155837A (ja) * | 2020-03-30 | 2021-10-07 | 日本碍子株式会社 | ベリリウム銅合金リング及びその製造方法 |
| CN112410606B (zh) * | 2020-10-28 | 2022-08-05 | 上海大学 | 快速凝固制备长尺寸纳米碳铜基复合材料的方法、其应用及装置 |
| CN114939636A (zh) * | 2022-05-16 | 2022-08-26 | 浙江天能电源材料有限公司 | 铅锭连铸结晶器 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3427154A (en) | 1964-09-11 | 1969-02-11 | Ibm | Amorphous alloys and process therefor |
| US3981722A (en) | 1974-10-31 | 1976-09-21 | Allied Chemical Corporation | Amorphous alloys in the U-Cr-V system |
| US4142571A (en) | 1976-10-22 | 1979-03-06 | Allied Chemical Corporation | Continuous casting method for metallic strips |
| US4191601A (en) | 1979-02-12 | 1980-03-04 | Ampco-Pittsburgh Corporation | Copper-nickel-silicon-chromium alloy having improved electrical conductivity |
| US4260435A (en) | 1979-07-02 | 1981-04-07 | Ampco-Pittsburgh Corporation | Copper-nickel-silicon-chromium alloy having improved electrical conductivity |
| DE3069151D1 (en) | 1979-08-13 | 1984-10-18 | Allied Corp | Apparatus and method for chill casting of metal strip employing a chromium chill surface |
| US4290435A (en) * | 1979-09-07 | 1981-09-22 | Thermatime A.G. | Internally cooled electrode for hyperthermal treatment and method of use |
| US4537239A (en) | 1982-07-13 | 1985-08-27 | Allied Corporation | Two piece casting wheel |
| JPS6045696B2 (ja) | 1982-07-26 | 1985-10-11 | 三菱マテリアル株式会社 | 銅系形状記憶合金 |
| JPS5961544A (ja) * | 1982-10-01 | 1984-04-07 | Hitachi Metals Ltd | 高融点金属鋳造用プリハ−ドン型材料 |
| JPS6045696A (ja) | 1983-08-22 | 1985-03-12 | 日本ゼオン株式会社 | 紙塗被組成物 |
| JPH08942B2 (ja) * | 1986-12-19 | 1996-01-10 | トヨタ自動車株式会社 | 分散強化Cu基合金 |
| JPH07116540B2 (ja) | 1990-08-03 | 1995-12-13 | 株式会社日立製作所 | プラスチック成形用金型材料 |
| FR2706488B1 (fr) | 1993-06-14 | 1995-09-01 | Tech Ind Fonderie Centre | Alliage de cuivre, nickel, silicium et chrome et procédé d'élaboration dudit alliage. |
| US5564490A (en) * | 1995-04-24 | 1996-10-15 | Alliedsignal Inc. | Homogeneous quench substrate |
| JPH09143596A (ja) | 1995-11-20 | 1997-06-03 | Miyoshi Gokin Kogyo Kk | 耐熱、耐摩耗性高強度銅合金およびその製造方法。 |
| KR0157257B1 (ko) | 1995-12-08 | 1998-11-16 | 정훈보 | 석출물 성장 억제형 고강도, 고전도성 동합금 및 그 제조방법 |
| US5842511A (en) * | 1996-08-19 | 1998-12-01 | Alliedsignal Inc. | Casting wheel having equiaxed fine grain quench surface |
| JP3797736B2 (ja) * | 1997-02-10 | 2006-07-19 | 株式会社神戸製鋼所 | 剪断加工性に優れる高強度銅合金 |
| US6251199B1 (en) | 1999-05-04 | 2001-06-26 | Olin Corporation | Copper alloy having improved resistance to cracking due to localized stress |
| DE19928777A1 (de) * | 1999-06-23 | 2000-12-28 | Vacuumschmelze Gmbh | Gießrad über Schleudergießverfahren hergestelltes Gießrad |
-
2002
- 2002-05-17 US US10/150,382 patent/US6764556B2/en not_active Expired - Fee Related
-
2003
- 2003-05-15 RU RU2004136993/02A patent/RU2317346C2/ru not_active IP Right Cessation
- 2003-05-15 DE DE10392662.3T patent/DE10392662B4/de not_active Expired - Fee Related
- 2003-05-15 JP JP2004505399A patent/JP5128756B2/ja not_active Expired - Fee Related
- 2003-05-15 WO PCT/US2003/015665 patent/WO2003097886A1/en not_active Ceased
- 2003-05-15 CN CN038168650A patent/CN1685067B/zh not_active Expired - Fee Related
- 2003-05-15 AU AU2003233567A patent/AU2003233567A1/en not_active Abandoned
- 2003-05-15 KR KR1020047018596A patent/KR100627924B1/ko not_active Expired - Fee Related
- 2003-06-10 TW TW092115686A patent/TWI314165B/zh not_active IP Right Cessation
-
2010
- 2010-09-27 JP JP2010214995A patent/JP5411826B2/ja not_active Expired - Fee Related
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| JP3194268B2 (ja) | 等削減微粒焼入れ表面 | |
| US5564490A (en) | Homogeneous quench substrate | |
| JP2005526183A5 (enExample) | ||
| JP4891768B2 (ja) | 銅‐ニッケル‐ケイ素多相急冷基体 | |
| HK1099345B (en) | Copper-nickel-silicon two phase quench substrate | |
| HK1084420B (en) | Copper-nickel-silicon two phase quench substrate | |
| HK1032019B (en) | Equiaxed fine grain quench surface and process therefor |