JP2005519332A5 - - Google Patents
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- Publication number
- JP2005519332A5 JP2005519332A5 JP2003573496A JP2003573496A JP2005519332A5 JP 2005519332 A5 JP2005519332 A5 JP 2005519332A5 JP 2003573496 A JP2003573496 A JP 2003573496A JP 2003573496 A JP2003573496 A JP 2003573496A JP 2005519332 A5 JP2005519332 A5 JP 2005519332A5
- Authority
- JP
- Japan
- Prior art keywords
- projection objective
- lens
- lens group
- refractive projection
- refractive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005499 meniscus Effects 0.000 claims 4
- 210000001624 Hip Anatomy 0.000 claims 3
- 238000003384 imaging method Methods 0.000 claims 2
- 230000003287 optical Effects 0.000 claims 2
- 238000001393 microlithography Methods 0.000 claims 1
Claims (24)
0.8<D1/D2<1.1
であることを特徴とする屈折型投影対物レンズ。 A refractive projection objective lens for microlithography having a numerical aperture larger than 0.7, comprising a first convex portion, a second convex portion, and a waist disposed between both convex portions, first convex portion has a maximum diameter D 1, the second convex portion has a maximum diameter D 2,
0.8 <D 1 / D 2 < 1.1
A refractive projection objective lens, characterized in that
0.9<D1/D2<1.0
であることを特徴とする請求項1に記載の屈折型投影対物レンズ。 The ratio of maximum diameter 0.9 <D 1 / D 2 < 1.0
The refractive projection objective according to claim 1, wherein:
L*Dmax/(NA*2yb)<12850
であることを特徴とする請求項2または3に記載の屈折型投影対物レンズ。 When L is the total length from the reticle to the wafer, NA is the numerical aperture on the image side, D MAX is the maximum diameter of the system, that is, D 1 or D 2, and 2yb is the diameter of the image field,
L * Dmax / (NA * 2yb) <12850
The refractive projection objective according to claim 2 or 3, wherein
である前記屈折型投影対物レンズ。 A refraction-type projection objective lens including a first convex portion, a next waist portion, and a second convex portion next to the first convex portion, in which a system diaphragm is disposed on the second convex portion, and the object plane O range L F up to the last stop side lens surface, the range between the range to the image plane from the first lens surface is followed by the throttle L R, L F and L R and L AP from the objective lens When the sum of the center thicknesses of all the lenses arranged inside is L geo and the distance from the image plane O ′ to the object plane O is L, the length ratio LV
The refractive projection objective lens.
Refractive projection objective according to claim 15 or 16, characterized in that the minimum free diameter in the lens group LG3 is smaller than 1.2 times the object field diameter, in an advantageous embodiment smaller than 1.1 times. .
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US36084502P | 2002-03-01 | 2002-03-01 | |
PCT/EP2003/001147 WO2003075096A2 (en) | 2002-03-01 | 2003-02-06 | Refractive projection lens |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005519332A JP2005519332A (en) | 2005-06-30 |
JP2005519332A5 true JP2005519332A5 (en) | 2006-03-23 |
Family
ID=27789034
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003573496A Pending JP2005519332A (en) | 2002-03-01 | 2003-02-06 | Refractive projection objective |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1483626A2 (en) |
JP (1) | JP2005519332A (en) |
KR (1) | KR20040089688A (en) |
AU (2) | AU2003210214A1 (en) |
WO (2) | WO2003075096A2 (en) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10229249A1 (en) | 2002-03-01 | 2003-09-04 | Zeiss Carl Semiconductor Mfg | Refractive projection lens with a waist |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
KR101129946B1 (en) * | 2003-10-22 | 2012-03-27 | 칼 짜이스 에스엠티 게엠베하 | Refractive projection objective for immersion lithography |
EP2040123B9 (en) | 2003-12-02 | 2012-11-14 | Carl Zeiss SMT GmbH | Projection optical system |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US8107162B2 (en) | 2004-05-17 | 2012-01-31 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
US7301707B2 (en) | 2004-09-03 | 2007-11-27 | Carl Zeiss Smt Ag | Projection optical system and method |
US7508488B2 (en) | 2004-10-13 | 2009-03-24 | Carl Zeiss Smt Ag | Projection exposure system and method of manufacturing a miniaturized device |
DE102005045862A1 (en) | 2004-10-19 | 2006-04-20 | Carl Zeiss Smt Ag | Optical system for ultraviolet light has liquid lens arranged in space between first and second limiting optical elements and containing liquid transparent for wavelength less than or equal to 200 nm |
US7508489B2 (en) | 2004-12-13 | 2009-03-24 | Carl Zeiss Smt Ag | Method of manufacturing a miniaturized device |
CN101107570B (en) | 2004-12-30 | 2011-02-09 | 卡尔蔡司Smt股份公司 | Projection optical system |
JP2007114750A (en) | 2005-09-09 | 2007-05-10 | Asml Netherlands Bv | Projection system design method, lithography apparatus, and device manufacturing method |
TWI439815B (en) | 2006-07-03 | 2014-06-01 | Zeiss Carl Smt Gmbh | Method for revising/repairing a projection objective of a lithography projection expose apparatus and such projection objective |
DE102006045075A1 (en) | 2006-09-21 | 2008-04-03 | Carl Zeiss Smt Ag | Controllable optical element |
JP5154564B2 (en) | 2006-12-01 | 2013-02-27 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Optical system with interchangeable and operable correction arrangement for reducing image aberrations |
DE102008000790A1 (en) | 2007-03-20 | 2008-09-25 | Carl Zeiss Smt Ag | A method for improving imaging properties of an optical system and such an optical system |
WO2009018911A1 (en) | 2007-08-03 | 2009-02-12 | Carl Zeiss Smt Ag | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate |
DE102008041144A1 (en) | 2007-08-21 | 2009-03-05 | Carl Zeiss Smt Ag | Optical arrangement for e.g. projection lens, has structure for optimizing arrangement with respect to angle of incident angle-dependent polarization division in phase and amplitude, and another structure compensating change of wave front |
EP2181357A1 (en) | 2007-08-24 | 2010-05-05 | Carl Zeiss SMT AG | Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography |
EP2048540A1 (en) | 2007-10-09 | 2009-04-15 | Carl Zeiss SMT AG | Microlithographic projection exposure apparatus |
DE102007055567A1 (en) | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optical system |
JP5533656B2 (en) * | 2008-09-18 | 2014-06-25 | 株式会社ニコン | Imaging optical system, exposure apparatus, and electronic device manufacturing method |
DE102008042356A1 (en) | 2008-09-25 | 2010-04-08 | Carl Zeiss Smt Ag | Projection exposure system with optimized adjustment option |
WO2011116792A1 (en) | 2010-03-26 | 2011-09-29 | Carl Zeiss Smt Gmbh | Optical system, exposure apparatus, and waverfront correction method |
JP6282742B2 (en) | 2013-09-09 | 2018-02-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Microlithographic projection exposure apparatus and method for correcting optical wavefront deformation in such an apparatus |
US9091843B1 (en) | 2014-03-16 | 2015-07-28 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low track length to focal length ratio |
US9494772B1 (en) | 2014-03-16 | 2016-11-15 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low field curvature |
US9995910B1 (en) | 2014-03-16 | 2018-06-12 | Navitar Industries, Llc | Optical assembly for a compact wide field of view digital camera with high MTF |
US9726859B1 (en) | 2014-03-16 | 2017-08-08 | Navitar Industries, Llc | Optical assembly for a wide field of view camera with low TV distortion |
US9316820B1 (en) | 2014-03-16 | 2016-04-19 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low astigmatism |
US10139595B1 (en) | 2014-03-16 | 2018-11-27 | Navitar Industries, Llc | Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio |
US9316808B1 (en) | 2014-03-16 | 2016-04-19 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with a low sag aspheric lens element |
US10386604B1 (en) | 2014-03-16 | 2019-08-20 | Navitar Industries, Llc | Compact wide field of view digital camera with stray light impact suppression |
US10545314B1 (en) | 2014-03-16 | 2020-01-28 | Navitar Industries, Llc | Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3624973B2 (en) * | 1995-10-12 | 2005-03-02 | 株式会社ニコン | Projection optical system |
DE19855108A1 (en) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Microlithographic reduction lens, projection exposure system and method |
DE19855157A1 (en) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Projection lens |
EP1242843B1 (en) * | 1999-12-29 | 2006-03-22 | Carl Zeiss SMT AG | Projection lens comprising adjacent aspheric lens surfaces |
-
2003
- 2003-02-06 EP EP03743308A patent/EP1483626A2/en not_active Withdrawn
- 2003-02-06 AU AU2003210214A patent/AU2003210214A1/en not_active Abandoned
- 2003-02-06 JP JP2003573496A patent/JP2005519332A/en active Pending
- 2003-02-06 KR KR10-2004-7013547A patent/KR20040089688A/en not_active Application Discontinuation
- 2003-02-06 WO PCT/EP2003/001147 patent/WO2003075096A2/en active Application Filing
- 2003-03-03 WO PCT/US2003/006592 patent/WO2003075049A2/en not_active Application Discontinuation
- 2003-03-03 AU AU2003230593A patent/AU2003230593A1/en not_active Abandoned
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