JP2005515389A5 - - Google Patents
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- Publication number
- JP2005515389A5 JP2005515389A5 JP2003560457A JP2003560457A JP2005515389A5 JP 2005515389 A5 JP2005515389 A5 JP 2005515389A5 JP 2003560457 A JP2003560457 A JP 2003560457A JP 2003560457 A JP2003560457 A JP 2003560457A JP 2005515389 A5 JP2005515389 A5 JP 2005515389A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/032,444 US6512206B1 (en) | 2002-01-02 | 2002-01-02 | Continuous process furnace |
PCT/US2002/041317 WO2003060409A1 (en) | 2002-01-02 | 2002-12-26 | Continuous process furnace |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005515389A JP2005515389A (ja) | 2005-05-26 |
JP2005515389A5 true JP2005515389A5 (ja) | 2005-12-22 |
Family
ID=21864997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003560457A Pending JP2005515389A (ja) | 2002-01-02 | 2002-12-26 | 連続プロセス用加熱炉 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6512206B1 (ja) |
EP (1) | EP1472498A4 (ja) |
JP (1) | JP2005515389A (ja) |
KR (1) | KR100981141B1 (ja) |
CN (1) | CN100416206C (ja) |
AU (1) | AU2002360758A1 (ja) |
WO (1) | WO2003060409A1 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6276072B1 (en) * | 1997-07-10 | 2001-08-21 | Applied Materials, Inc. | Method and apparatus for heating and cooling substrates |
US7118780B2 (en) | 2001-03-16 | 2006-10-10 | Semiconductor Energy Laboratory Co., Ltd. | Heat treatment method |
KR100876927B1 (ko) * | 2001-06-01 | 2009-01-07 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 열처리장치 및 열처리방법 |
US6807220B1 (en) | 2003-05-23 | 2004-10-19 | Mrl Industries | Retention mechanism for heating coil of high temperature diffusion furnace |
JPWO2006013932A1 (ja) * | 2004-08-06 | 2008-05-01 | イビデン株式会社 | 焼成炉及びその焼成炉を用いた多孔質セラミック焼成体の製造方法 |
US7335864B2 (en) * | 2005-06-01 | 2008-02-26 | Mrl Industries, Inc. | Magnetic field reduction resistive heating elements |
WO2007024691A2 (en) * | 2005-08-19 | 2007-03-01 | Mrl Industries, Inc. | Intermingled heating elements having a fault tolerant circuit |
US7514650B2 (en) * | 2005-12-08 | 2009-04-07 | Despatch Industries Limited Partnership | Continuous infrared furnace |
DE102006009388B4 (de) * | 2006-03-01 | 2009-02-26 | Audi Ag | Vorrichtung zur Silicierung von kohlenstoffhaltigen Werkstoffen und darin durchführbares Verfahren |
JP5477180B2 (ja) | 2010-06-10 | 2014-04-23 | 信越化学工業株式会社 | 太陽電池素子の電極焼成用焼成炉、太陽電池素子の製造方法及び太陽電池素子 |
CN102135377A (zh) * | 2011-03-02 | 2011-07-27 | 西南交通大学 | 无氟化学溶液沉积法动态连续制备高温超导带材热处理炉 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3785853A (en) * | 1972-05-24 | 1974-01-15 | Unicorp Inc | Continuous deposition reactor |
US4416623A (en) | 1982-02-01 | 1983-11-22 | Kanto Yakin Kogyo Kabushiki Kaisha | Muffle furnace |
FR2536160A1 (fr) * | 1982-11-17 | 1984-05-18 | Piezo Ceram Electronique | Four continu de brasure de composants electroniques |
US4544025A (en) * | 1984-01-17 | 1985-10-01 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | High gradient directional solidification furnace |
US4596922A (en) | 1984-01-24 | 1986-06-24 | Thermtec | Heating element |
FR2561365B1 (fr) | 1984-03-14 | 1987-10-09 | Savoie Electrodes Refract | Four moufle pour traitements thermiques en continu, par defilement |
CN86108728B (zh) * | 1986-12-30 | 1988-02-24 | 冶金工业部钢铁研究总院 | 日光灯管连续电烤机 |
US4911638A (en) | 1989-05-18 | 1990-03-27 | Direction Incorporated | Controlled diffusion environment capsule and system |
US5038019A (en) | 1990-02-06 | 1991-08-06 | Thermtec, Inc. | High temperature diffusion furnace |
US6114662A (en) * | 1997-06-05 | 2000-09-05 | International Business Machines Corporation | Continual flow rapid thermal processing apparatus and method |
CN100441994C (zh) * | 1998-06-23 | 2008-12-10 | 侯伯文 | 使用u型工车的热加工连续炉流水线装置 |
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2002
- 2002-01-02 US US10/032,444 patent/US6512206B1/en not_active Expired - Lifetime
- 2002-12-26 WO PCT/US2002/041317 patent/WO2003060409A1/en active Application Filing
- 2002-12-26 AU AU2002360758A patent/AU2002360758A1/en not_active Abandoned
- 2002-12-26 JP JP2003560457A patent/JP2005515389A/ja active Pending
- 2002-12-26 KR KR1020047010502A patent/KR100981141B1/ko not_active IP Right Cessation
- 2002-12-26 EP EP02796040A patent/EP1472498A4/en not_active Withdrawn
- 2002-12-26 CN CNB028284453A patent/CN100416206C/zh not_active Expired - Fee Related