JP2005353641A - Method for mounting semiconductor part - Google Patents

Method for mounting semiconductor part Download PDF

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JP2005353641A
JP2005353641A JP2004169593A JP2004169593A JP2005353641A JP 2005353641 A JP2005353641 A JP 2005353641A JP 2004169593 A JP2004169593 A JP 2004169593A JP 2004169593 A JP2004169593 A JP 2004169593A JP 2005353641 A JP2005353641 A JP 2005353641A
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semiconductor component
base material
semiconductor
synthetic resin
liquefied
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JP4381894B2 (en
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Hitoshi Kagaya
仁 加賀谷
Hiroki Ono
博樹 大野
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Toppan Edge Inc
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Toppan Forms Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor part for relocating each semiconductor chip at a prescribed position to a desired base without taking out of a substrate, or the like, and to provide a method for manufacturing the semiconductor part. <P>SOLUTION: The semiconductor part 20 in which at least one portion of a semiconductor chip 12 is in contact with a base 11 made of a first synthetic resin is injected toward a body 40 to be deposited in the state of a solid. The semiconductor part 20 flying in space to the body 40 to be deposited after injection is heated, the base 11 is liquefied partially or entirely, and the semiconductor part 20 in which the base 11 is liquefied partially or entirely is passed through the atmosphere of adhesive vapor. A method for mounting the semiconductor part 20 for depositing the semiconductor part 20 to the body 40 to be deposited is provided by using one portion or entirety of the liquefied base 11 in which adhesive vapor is deposited. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、半導体部品の取付方法に関するものである。   The present invention relates to a method for mounting a semiconductor component.

一般的に、半導体チップなどの微小な部品は、その大きさが数10μmから数100μmと非常に小さいために、取り扱いが非常に困難であった。近年、半導体チップなどはさらに小型化する傾向にあり、半導体チップを個別に直接保持して、基板上に整列、配置することは困難であった。そこで、これまでに、例えば、特許文献1において、微小な半導体チップを個別に直接保持することなく、基板上に所定の向きに配置する方法などが提案されている。   In general, a minute part such as a semiconductor chip is very difficult to handle because its size is as small as several tens of μm to several hundreds of μm. In recent years, semiconductor chips and the like tend to be further downsized, and it has been difficult to directly hold the semiconductor chips individually and align and arrange them on the substrate. So far, for example, Patent Document 1 has proposed a method of arranging minute semiconductor chips in a predetermined direction on a substrate without directly holding them individually.

また、特許文献2では、半導体チップなどの微小な部品を、所定の向きに整列させて、基板などの所定の位置に供給する供給装置が提案されている。   Further, Patent Document 2 proposes a supply device that supplies minute parts such as semiconductor chips to a predetermined position such as a substrate by aligning them in a predetermined direction.

しかしながら、特許文献1および特許文献2には、個々の半導体チップを所望の基材に対して所定の位置となるように再配置する方法は開示されていない。   However, Patent Literature 1 and Patent Literature 2 do not disclose a method of rearranging individual semiconductor chips so as to be in a predetermined position with respect to a desired base material.

個々の半導体チップを所望の基材に再配置するためには、基板などから半導体チップを取り出して、再度、基材上に整列、配置する作業は人手もしくはロボットアームに頼らざるを得ない。人手による半導体チップの再配置では、半導体チップを脱落して、破損するおそれがあるので、半導体チップの取り扱いには細心の注意が要求される。また、ロボットアームを使用すると、配置速度が遅くなってしまう。このように、従来の半導体チップは、人手またはロボッドアームにより再配置すると、生産性が低くなってしまう。
特開2004−22846号公報 特開平11−186790号公報
In order to rearrange the individual semiconductor chips on a desired base material, the operation of taking out the semiconductor chip from the substrate or the like and aligning and placing it on the base material again has to rely on human hands or robot arms. When the semiconductor chip is manually rearranged, the semiconductor chip may fall off and be damaged, so that the semiconductor chip must be handled with great care. In addition, when the robot arm is used, the arrangement speed becomes slow. As described above, when the conventional semiconductor chip is rearranged manually or by a robot arm, the productivity is lowered.
JP 2004-22846 A JP-A-11-186790

本発明は、前記事情に鑑みてなされたもので、基板などから取り出すことなく、個々の半導体チップを所望の基材に対して所定の位置となるように再配置することを可能とする半導体部品の取付方法を提供することを目的とする。   The present invention has been made in view of the above circumstances, and enables semiconductor components to be rearranged so that individual semiconductor chips are located at predetermined positions with respect to a desired base material without being taken out from a substrate or the like. It aims at providing the attachment method of.

本発明は、上記課題を解決するために、半導体チップの少なくとも一部が第一の合成樹脂からなる基材に接してなる半導体部品を固体の状態で被着体に向けて射出し、射出されてから前記被着体に至る空間を飛翔中にある前記半導体部品に熱を加えて、前記基材の一部または全部を液状化させた後、前記基材の一部または全部を液状化させた半導体部品を接着性蒸気の雰囲気中を通過させ、この液状化させるとともに接着性蒸気を付着させた基材の一部または全部を用いて、前記半導体部品を前記被着体に被着させる半導体部品の取付方法を提供する。   In order to solve the above problems, the present invention injects a semiconductor component in which at least a part of a semiconductor chip is in contact with a base material made of a first synthetic resin toward the adherend in a solid state. Heat is applied to the semiconductor component that is in flight through the space to the adherend to liquefy part or all of the base material, and then part or all of the base material is liquefied. A semiconductor in which the semiconductor component is attached to the adherend using a part or the whole of the base material to which the semiconductor component is passed through the atmosphere of adhesive vapor to be liquefied and to which adhesive vapor is attached. Provide a method for mounting components.

この半導体部品の取付方法では、半導体チップの少なくとも一部が第一の合成樹脂からなる基材に接してなる半導体部品を固体の状態で被着体に向けて射出し、射出されてから前記被着体に至る空間を飛翔中にある前記半導体部品に熱を加えて、前記基材の一部または全部を液状化させた後、前記基材の一部または全部を液状化させた半導体部品を接着性蒸気の雰囲気中を通過させ、この液状化させるとともに接着性蒸気を付着させた基材の一部または全部を用いて、前記半導体部品を前記被着体に被着させるから、微小な半導体チップを個別に所望の基材に対して所定の位置となるように再配置する作業を容易に行うことができる。   In this semiconductor component mounting method, a semiconductor component in which at least a part of a semiconductor chip is in contact with a base material made of a first synthetic resin is injected toward an adherend in a solid state, and after the injection, A semiconductor component in which a part or all of the base material is liquefied by applying heat to the semiconductor component in flight through the space leading to the body, and then liquefying part or all of the base material. Since the semiconductor component is attached to the adherend by using part or all of the base material that is passed through the atmosphere of adhesive vapor and liquefied and adhered to the adhesive vapor, a small semiconductor The operation | work which rearranges a chip | tip individually so that it may become a predetermined position with respect to a desired base material can be performed easily.

上記半導体部品の取付方法において、前記半導体チップの露呈している部分の少なくとも一部が、前記基材をなす第一の合成樹脂よりも融点の低い第二の合成樹脂からなる被覆材で被覆されていることが好ましい。   In the semiconductor component mounting method, at least a part of the exposed portion of the semiconductor chip is coated with a coating material made of a second synthetic resin having a melting point lower than that of the first synthetic resin forming the base material. It is preferable.

この半導体部品の取付方法では、前記半導体チップの露呈している部分の少なくとも一部が、基材をなす第一の合成樹脂よりも融点の低い第二の合成樹脂からなる被覆材で被覆されているから、半導体部品の取り扱いにおいて、半導体チップが基材から脱落して、破損するのを防止することができる。   In this semiconductor component mounting method, at least a part of the exposed portion of the semiconductor chip is covered with a covering material made of a second synthetic resin having a melting point lower than that of the first synthetic resin forming the base material. Therefore, it is possible to prevent the semiconductor chip from falling off from the base material and being damaged in handling the semiconductor component.

上記半導体部品の取付方法において、前記第一の合成樹脂および/または前記第二の合成樹脂は、保管温度雰囲気において液状化しないことが好ましい。   In the semiconductor component mounting method, the first synthetic resin and / or the second synthetic resin is preferably not liquefied in a storage temperature atmosphere.

本発明における保管温度雰囲気とは、本発明の半導体部品が使用される温度範囲にある雰囲気のことであり、具体的には0℃〜60℃の温度範囲にある雰囲気のことである。この保管温度雰囲気において、前記第一の合成樹脂および/または前記第二の合成樹脂が液状化しなければ、半導体部品の取り扱いにおいて、半導体チップが基材から脱落することを防止できるとともに、半導体部品を所定の位置に再配置した後に、半導体部品が移動することを防止できる。   The storage temperature atmosphere in the present invention is an atmosphere in a temperature range in which the semiconductor component of the present invention is used, specifically, an atmosphere in a temperature range of 0 ° C to 60 ° C. If the first synthetic resin and / or the second synthetic resin are not liquefied in this storage temperature atmosphere, the semiconductor chip can be prevented from falling off the base material in handling the semiconductor component, and the semiconductor component It is possible to prevent the semiconductor component from moving after being rearranged at a predetermined position.

本発明の半導体部品の取付方法では、半導体チップの少なくとも一部が第一の合成樹脂からなる基材に接してなる半導体部品を固体の状態で被着体に向けて射出し、射出されてから前記被着体に至る空間を飛翔中にある前記半導体部品に熱を加えて、前記基材の一部または全部を液状化させた後、前記基材の一部または全部を液状化させた半導体部品を接着性蒸気の雰囲気中を通過させ、この液状化させるとともに接着性蒸気を付着させた基材の一部または全部を用いて、前記半導体部品を前記被着体に被着させるから、微小な半導体チップを個別に所望の基材に対して所定の位置となるように再配置する作業を容易に行うことができる。
また、半導体チップの露呈している部分の少なくとも一部が、基材をなす第一の合成樹脂よりも融点の低い第二の合成樹脂からなる被覆材で被覆されているから、半導体部品の取り扱いにおいて、半導体チップが基材から脱落して、破損するのを防止することができる。さらに、第一の合成樹脂および/または第二の合成樹脂は、保管温度雰囲気において液状化しないから、半導体部品の取り扱いにおいて、半導体チップが基材から脱落することを防止できるとともに、半導体部品を所定の位置に再配置した後に、半導体部品が移動することを防止できる。
In the method for mounting a semiconductor component of the present invention, a semiconductor component in which at least a part of the semiconductor chip is in contact with the base material made of the first synthetic resin is injected toward the adherend in a solid state, and then injected. A semiconductor in which a part or all of the base material is liquefied after applying heat to the semiconductor component in flight in the space to the adherend to liquefy part or all of the base material The semiconductor component is attached to the adherend by using a part or all of the base material to which the component is passed through the atmosphere of the adhesive vapor and liquefied, and the adhesive vapor is adhered. It is possible to easily perform an operation of rearranging individual semiconductor chips individually so as to be in a predetermined position with respect to a desired substrate.
In addition, since at least a part of the exposed portion of the semiconductor chip is coated with a coating material made of a second synthetic resin having a lower melting point than the first synthetic resin that forms the base material, In this case, it is possible to prevent the semiconductor chip from dropping from the base material and being damaged. Furthermore, since the first synthetic resin and / or the second synthetic resin is not liquefied in the storage temperature atmosphere, it is possible to prevent the semiconductor chip from dropping from the base material during the handling of the semiconductor component, and to fix the semiconductor component to a predetermined level. It is possible to prevent the semiconductor component from moving after being rearranged at the position.

以下、本発明を実施した半導体部品の取付方法について、図面を参照して説明する。   Hereinafter, a semiconductor component mounting method embodying the present invention will be described with reference to the drawings.

図1は、本発明に係る半導体部品の取付方法で用いられる半導体部品の一例を示す概略断面図である。
この半導体部品10は、基材11と、その一方の面12aが基材11の一方の面11aに接するように配された半導体チップ12とから概略構成されている。
FIG. 1 is a schematic cross-sectional view showing an example of a semiconductor component used in the semiconductor component mounting method according to the present invention.
The semiconductor component 10 is generally configured by a base material 11 and a semiconductor chip 12 disposed so that one surface 12 a thereof is in contact with the one surface 11 a of the base material 11.

この半導体部品10では、基材11が半導体チップ12よりも大きく形成されて、半導体チップ12の縁取りのような形状をなしている。   In the semiconductor component 10, the base material 11 is formed larger than the semiconductor chip 12 and has a shape like an edge of the semiconductor chip 12.

基材11としては、第一の合成樹脂からなる合成樹脂基板、合成樹脂フィルム、合成樹脂シートなどが挙げられる。また、第一の合成樹脂としては、半導体部品10の保管温度雰囲気(0℃〜60℃)において液状化しない熱可塑性樹脂などが挙げられる。さらに、基材11の厚みや幅は、半導体部品10の用途などに応じて適宜設定される。   Examples of the base material 11 include a synthetic resin substrate made of a first synthetic resin, a synthetic resin film, and a synthetic resin sheet. Examples of the first synthetic resin include a thermoplastic resin that does not liquefy in the storage temperature atmosphere (0 ° C. to 60 ° C.) of the semiconductor component 10. Furthermore, the thickness and width of the base material 11 are appropriately set according to the use of the semiconductor component 10 and the like.

半導体チップ12としては、大きさが数10μm〜数100μm×数10μm〜数100μm程度のものが挙げられる。具体的には、大きさが0.5mm×0.5mmの13.56MHz〜2.45GHzまでの全周波数帯域対応可能な微小RFID(Radio Frequency IDentification)チップなどが挙げられる。  Examples of the semiconductor chip 12 include those having a size of several tens of μm to several hundreds of μm × several tens of μm to several hundreds of μm. Specifically, a micro RFID (Radio Frequency IDentification) chip capable of supporting all frequency bands from 13.56 MHz to 2.45 GHz having a size of 0.5 mm × 0.5 mm can be used.

図2は、本発明に係る半導体部品の取付方法で用いられる半導体部品の他の例を示す概略断面図である。
図2において、図1に示した半導体部品10の構成要素と同じ構成要素には同一符号を付して、その説明を省略する。
この実施形態の半導体部品20は、上記第一の実施形態の半導体部品10とは、半導体チップ12の露呈している部分(図2では、側面12bや他方の面12c)が、被覆材13で被覆されている点が異なっている。
FIG. 2 is a schematic cross-sectional view showing another example of a semiconductor component used in the semiconductor component mounting method according to the present invention.
In FIG. 2, the same components as those of the semiconductor component 10 shown in FIG.
The semiconductor component 20 of this embodiment differs from the semiconductor component 10 of the first embodiment in that the exposed portion of the semiconductor chip 12 (the side surface 12b and the other surface 12c in FIG. It is different in that it is covered.

なお、半導体部品30では、基材11の一方の面11aの全面が被覆材13で覆われているが、本発明の半導体部品はこれに限定されない。本発明の半導体部品にあっては、半導体チップの露呈している部分の少なくとも一部、すなわち、基材と接していない部分が、被覆材で被覆されていればよい。  In addition, in the semiconductor component 30, although the whole surface of the one surface 11a of the base material 11 is covered with the coating | covering material 13, the semiconductor component of this invention is not limited to this. In the semiconductor component of the present invention, it is only necessary that at least a part of the exposed part of the semiconductor chip, that is, a part not in contact with the base material is covered with the coating material.

被覆材13としては、第二の合成樹脂からなる合成樹脂基板、合成樹脂フィルム、合成樹脂シートなどが挙げられる。また、第二の合成樹脂としては、基材11よりも融点の低い熱可塑性樹脂などが挙げられる。さらに、第二の合成樹脂は、半導体部品10の保管温度雰囲気(0℃〜60℃)において液状化しない熱可塑性樹脂であることが好ましい。また、基材13の厚みや幅は、半導体チップ12の大きさなどに応じて適宜設定される。  Examples of the covering material 13 include a synthetic resin substrate made of a second synthetic resin, a synthetic resin film, and a synthetic resin sheet. Examples of the second synthetic resin include a thermoplastic resin having a melting point lower than that of the substrate 11. Furthermore, the second synthetic resin is preferably a thermoplastic resin that does not liquefy in the storage temperature atmosphere (0 ° C. to 60 ° C.) of the semiconductor component 10. In addition, the thickness and width of the base material 13 are appropriately set according to the size of the semiconductor chip 12 and the like.

なお、本発明にあっては、基材をなす第一の合成樹脂または被覆材をなす第二の合成樹脂のいずれか一方、あるいは、基材をなす第一の合成樹脂または被覆材をなす第二の合成樹脂の両方が保管温度雰囲気において液状化しなければよい。  In the present invention, either the first synthetic resin constituting the base material or the second synthetic resin constituting the covering material, or the first synthetic resin or covering material constituting the base material. It is sufficient that both the two synthetic resins are not liquefied in the storage temperature atmosphere.

次に、図3を参照して、本発明に係る半導体部品の取付方法を説明する。
図3は、本発明に係る半導体部品の取付方法の一実施形態を示す模式図である。
なお、この実施形態では、図2に示した半導体部品20の取付方法を説明する。
Next, with reference to FIG. 3, a method for mounting a semiconductor component according to the present invention will be described.
FIG. 3 is a schematic view showing an embodiment of a semiconductor component mounting method according to the present invention.
In this embodiment, a method for attaching the semiconductor component 20 shown in FIG. 2 will be described.

この実施形態の半導体部品の取付方法では、まず、図3(a)に示すように、半導体部品の取付装置(図示略)に設けられた半導体部品の射出用ノズル30内に、半導体部品20を装填する。半導体部品20を射出用ノズル30内に装填する方法としては、特に限定されないが、例えば、個別にダイシングされた半導体部品20を、個別に射出用ノズル30内に装填する方法、半導体部品20が長手方向に多数連結された長尺のテープ状物を射出用ノズル30内で個別にダイシングする方法などが挙げられる。なお、長尺のテープ状物を射出用ノズル30内で個別にダイシングする方法では、半導体部品20を個別にダイシングする毎に、半導体部品20を射出用ノズル30から射出する。   In the semiconductor component mounting method of this embodiment, first, as shown in FIG. 3A, the semiconductor component 20 is placed in a semiconductor component injection nozzle 30 provided in a semiconductor component mounting apparatus (not shown). Load it. The method of loading the semiconductor component 20 into the injection nozzle 30 is not particularly limited. For example, the method of loading the individually diced semiconductor component 20 into the injection nozzle 30 and the semiconductor component 20 are long in length. For example, a method of individually dicing a long tape-like material connected in a number of directions in the injection nozzle 30 may be used. In the method of individually dicing a long tape-shaped object in the injection nozzle 30, the semiconductor component 20 is injected from the injection nozzle 30 each time the semiconductor component 20 is individually diced.

ここでは、半導体部品20を射出する前に、射出用ノズル30の射出口30aを、被着体40の表面(被着面)40aと間隔をおいて配する。   Here, before injecting the semiconductor component 20, the injection port 30 a of the injection nozzle 30 is arranged at a distance from the surface (attachment surface) 40 a of the adherend 40.

続いて、図3(b)に示すように、半導体部品20後方、かつ、その射出方向と反対側(射出用ノズル30の射出口30aと反対側)から、射出用ノズル30内に、空気、不活性ガスなどの圧縮ガスを送り込み、半導体部品20を固体の状態で被着体40の被着面40aに向けて射出する。   Subsequently, as shown in FIG. 3B, air is introduced into the injection nozzle 30 from the rear side of the semiconductor component 20 and from the side opposite to the injection direction (the side opposite to the injection port 30 a of the injection nozzle 30). Compressed gas such as inert gas is fed to inject the semiconductor component 20 toward the adherend surface 40a of the adherend 40 in a solid state.

そして、射出口30aから射出され、被着体40の被着面40aに至る空間を飛翔中に、半導体部品20に間接的に熱を加えて、半導体部品20の基材11の一部または全部を液状化させる。ここで、半導体部品20の基材11の一部または全部を液状化させるとは、基材11をなす第一の合成樹脂の融点以上で、半導体チップ12が破壊されない程度の熱を加えて、軟化あるいは溶融することを指している。なお、被覆材13は、基材11をなす材料よりも融点の低い材料からなるから、基材11が液状化している場合には、被覆材13も液状化している。   Then, while flying through the space that is injected from the injection port 30 a and reaches the adherend surface 40 a of the adherend 40, heat is indirectly applied to the semiconductor component 20, and a part or all of the base material 11 of the semiconductor component 20. Liquefy. Here, liquefying a part or the whole of the base material 11 of the semiconductor component 20 applies heat at a temperature equal to or higher than the melting point of the first synthetic resin forming the base material 11 so that the semiconductor chip 12 is not destroyed. Refers to softening or melting. Since the covering material 13 is made of a material having a lower melting point than the material forming the base material 11, the covering material 13 is also liquefied when the base material 11 is liquefied.

また、被着体40の被着面40aに至る空間を飛翔中に、半導体部品20に間接的に熱を加える方法としては、半導体部品20に熱風を吹き付ける方法、半導体部品20を所定の温度に設定された雰囲気内を通過させる方法、半導体部品20に赤外線を照射する方法などが挙げられる。   In addition, as a method of indirectly applying heat to the semiconductor component 20 while flying through the space to the adherend surface 40a of the adherend 40, a method of blowing hot air to the semiconductor component 20, or bringing the semiconductor component 20 to a predetermined temperature. Examples thereof include a method of passing through a set atmosphere and a method of irradiating the semiconductor component 20 with infrared rays.

続いて、基材11の一部または全部を液状化させた半導体部品20を、接着性蒸気の雰囲気35内を通過させて、半導体部品20の基材の一部または全部に、接着性蒸気を付着させる。   Subsequently, the semiconductor component 20 in which a part or all of the substrate 11 is liquefied is passed through the atmosphere 35 of the adhesive vapor, and the adhesive vapor is applied to a part or all of the substrate of the semiconductor component 20. Adhere.

ここで、接着性蒸気としては、接着剤を気化したものや、半導体部品20の基材11をなす合成樹脂または被覆材13をなす合成樹脂のいずれか一方と相溶性のある溶剤、あるいは、半導体部品20の基材11をなす合成樹脂および被覆材13をなす合成樹脂の両方と相溶性のある溶剤を気化したものなどが用いられる。   Here, as the adhesive vapor, a solvent that is compatible with any one of vaporized adhesive, a synthetic resin that forms the base material 11 of the semiconductor component 20, or a synthetic resin that forms the covering material 13, or a semiconductor. What vaporized the solvent compatible with both the synthetic resin which comprises the base material 11 of the components 20, and the synthetic resin which comprises the coating | covering material 13 is used.

続いて、図3(c)に示すように、半導体部品20が被着体40の被着面40aに到達すると、液状化させるとともに接着性蒸気を付着させた基材11の一部または全部により、半導体部品20を被着体40の被着面40aに被着する。
このままの状態で、接着剤が硬化するか、あるいは、溶剤によって表面が溶解して粘着性を示した基材11が固化すると、半導体部品20が被着体40の被着面40aに固定される。
Subsequently, as shown in FIG. 3C, when the semiconductor component 20 reaches the adherend surface 40a of the adherend 40, it is liquefied and partly or entirely of the base material 11 to which adhesive vapor is attached. The semiconductor component 20 is attached to the adherend surface 40a of the adherend 40.
In this state, when the adhesive is cured or the surface 11 is dissolved by the solvent to solidify the substrate 11 exhibiting tackiness, the semiconductor component 20 is fixed to the adherend surface 40a of the adherend 40. .

この実施形態では、半導体チップ12を合成樹脂からなる基材11および被覆材13で包囲した半導体部品20を、固体の状態で被着体40に向けて射出し、射出されてから被着体40に至る空間を飛翔中にある半導体部品20に熱を加えて、基材11の一部または全部を液状化させた後、基材11の一部または全部を液状化させた半導体部品20を接着性蒸気の雰囲気35中を通過させ、この液状化させるとともに接着性蒸気を付着させた基材11の一部または全部を用いて、半導体部品20を被着体40に被着させるから、微小な半導体チップを個別に所望の基材に対して所定の位置となるように再配置する作業を容易に行うことができる。   In this embodiment, the semiconductor component 20 in which the semiconductor chip 12 is surrounded by the base material 11 and the covering material 13 made of synthetic resin is injected toward the adherend 40 in a solid state, and after being injected, the adherend 40 is injected. After heat is applied to the semiconductor component 20 in flight in the space up to liquefy part or all of the substrate 11, the semiconductor component 20 liquefied part or all of the substrate 11 is bonded. Since the semiconductor component 20 is attached to the adherend 40 using a part or the whole of the base material 11 which is passed through the atmosphere 35 of the characteristic vapor and liquefied and adhered with the adhesive vapor, the minute amount is small. The operation | work which rearranges a semiconductor chip separately so that it may become a predetermined position with respect to a desired base material can be performed easily.

本発明の半導体部品の取付方法は、半導体チップ以外の微小な部品にも適用可能である。すなわち、半導体チップと同等の大きさの微小な部品に本発明を適用することにより、人手による取り扱いを容易にすることができる。また、本発明の半導体部品の取付方法は、インクジェット式の印刷方法にも適用可能である。   The semiconductor component mounting method of the present invention is also applicable to minute components other than semiconductor chips. That is, by applying the present invention to a minute part having a size equivalent to that of a semiconductor chip, handling by a human can be facilitated. Further, the semiconductor component mounting method of the present invention can also be applied to an ink jet printing method.

本発明に係る半導体部品の取付方法で用いられる半導体部品の一例を示す概略断面図である。It is a schematic sectional drawing which shows an example of the semiconductor component used with the attachment method of the semiconductor component which concerns on this invention. 本発明に係る半導体部品の取付方法で用いられる半導体部品の他の例を示す概略断面図である。It is a schematic sectional drawing which shows the other example of the semiconductor component used with the attachment method of the semiconductor component which concerns on this invention. 本発明に係る半導体部品の取付方法の一実施形態を示す模式図である。It is a schematic diagram which shows one Embodiment of the attachment method of the semiconductor component which concerns on this invention.

符号の説明Explanation of symbols

10,20・・・半導体部品、11・・・基材、12・・・半導体チップ、13・・・被覆材、30・・・射出用ノズル、30a・・・射出口、35・・・接着性蒸気の雰囲気、40・・・被着体。
DESCRIPTION OF SYMBOLS 10,20 ... Semiconductor component, 11 ... Base material, 12 ... Semiconductor chip, 13 ... Covering material, 30 ... Injection nozzle, 30a ... Injection port, 35 ... Adhesion Sexual vapor atmosphere, 40 ... adherend.

Claims (3)

半導体チップの少なくとも一部が第一の合成樹脂からなる基材に接してなる半導体部品を固体の状態で被着体に向けて射出し、射出されてから前記被着体に至る空間を飛翔中にある前記半導体部品に熱を加えて、前記基材の一部または全部を液状化させた後、前記基材の一部または全部を液状化させた半導体部品を接着性蒸気の雰囲気中を通過させ、この液状化させるとともに接着性蒸気を付着させた基材の一部または全部を用いて、前記半導体部品を前記被着体に被着させることを特徴とする半導体部品の取付方法。   A semiconductor component in which at least a part of the semiconductor chip is in contact with the base material made of the first synthetic resin is injected toward the adherend in a solid state, and is flying in the space from the injection to the adherend After heat is applied to the semiconductor component in part to liquefy part or all of the base material, the semiconductor part in which part or all of the base material is liquefied is passed through an adhesive vapor atmosphere. And attaching the semiconductor component to the adherend using a part or all of the base material to which the liquefied and adhesive vapor is adhered. 前記半導体チップの露呈している部分の少なくとも一部が、前記基材をなす第一の合成樹脂よりも融点の低い第二の合成樹脂からなる被覆材で被覆されていることを特徴とする請求項1に記載の半導体部品の取付方法。   The at least part of the exposed portion of the semiconductor chip is covered with a covering material made of a second synthetic resin having a melting point lower than that of the first synthetic resin forming the base material. Item 2. A method for mounting a semiconductor component according to Item 1. 前記第一の合成樹脂および/または前記第二の合成樹脂は、保管温度雰囲気において液状化しないことを特徴とする請求項1または2に記載の半導体部品の取付方法。

3. The method of mounting a semiconductor component according to claim 1, wherein the first synthetic resin and / or the second synthetic resin is not liquefied in a storage temperature atmosphere.

JP2004169593A 2004-06-08 2004-06-08 Mounting method of semiconductor parts Expired - Fee Related JP4381894B2 (en)

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