JP2005349309A - Photocatalyst carrier and its manufacturing method - Google Patents
Photocatalyst carrier and its manufacturing method Download PDFInfo
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- JP2005349309A JP2005349309A JP2004172872A JP2004172872A JP2005349309A JP 2005349309 A JP2005349309 A JP 2005349309A JP 2004172872 A JP2004172872 A JP 2004172872A JP 2004172872 A JP2004172872 A JP 2004172872A JP 2005349309 A JP2005349309 A JP 2005349309A
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- 239000011941 photocatalyst Substances 0.000 title claims abstract description 125
- 238000004519 manufacturing process Methods 0.000 title claims description 25
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 151
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 147
- 230000001699 photocatalysis Effects 0.000 claims abstract description 57
- 239000010419 fine particle Substances 0.000 claims abstract description 34
- 239000000919 ceramic Substances 0.000 claims abstract description 21
- 238000010304 firing Methods 0.000 claims description 43
- 239000000758 substrate Substances 0.000 claims description 16
- 239000007788 liquid Substances 0.000 claims description 10
- 239000006185 dispersion Substances 0.000 claims description 8
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 4
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052980 cadmium sulfide Inorganic materials 0.000 claims description 3
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 claims description 3
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 3
- 239000011787 zinc oxide Substances 0.000 claims description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 2
- 238000003618 dip coating Methods 0.000 abstract 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 42
- 230000000052 comparative effect Effects 0.000 description 33
- 239000011248 coating agent Substances 0.000 description 25
- 238000000576 coating method Methods 0.000 description 23
- 229910021529 ammonia Inorganic materials 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 21
- 239000000243 solution Substances 0.000 description 20
- 101100258086 Postia placenta (strain ATCC 44394 / Madison 698-R) STS-01 gene Proteins 0.000 description 18
- 230000000694 effects Effects 0.000 description 15
- 238000000354 decomposition reaction Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 238000005406 washing Methods 0.000 description 11
- 239000011230 binding agent Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 239000000969 carrier Substances 0.000 description 9
- 230000035484 reaction time Effects 0.000 description 9
- 238000005245 sintering Methods 0.000 description 7
- 239000011550 stock solution Substances 0.000 description 7
- 230000000844 anti-bacterial effect Effects 0.000 description 5
- 230000003373 anti-fouling effect Effects 0.000 description 5
- 238000004332 deodorization Methods 0.000 description 5
- 230000001877 deodorizing effect Effects 0.000 description 5
- 238000010790 dilution Methods 0.000 description 5
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- 238000002474 experimental method Methods 0.000 description 5
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- 238000000746 purification Methods 0.000 description 4
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 3
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 description 3
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 3
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 3
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000007865 diluting Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- OHVLMTFVQDZYHP-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CN1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O OHVLMTFVQDZYHP-UHFFFAOYSA-N 0.000 description 2
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 2
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 2
- IHCCLXNEEPMSIO-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 IHCCLXNEEPMSIO-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000003100 immobilizing effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 230000001603 reducing effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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Abstract
Description
本発明は、例えば、光触媒作用により、防汚、防臭、抗菌等の機能を奏する環境浄化装置に用いられる光触媒担持体、及びその製造方法に関する。 The present invention relates to a photocatalyst carrier used in an environmental purification device that exhibits functions such as antifouling, deodorization, and antibacterial activity by photocatalytic action, and a method for producing the same.
従来より、酸化チタン等の酸化物光触媒は、光触媒作用により、防汚、防臭、抗菌作用等の機能を奏することが知られている。
その光触媒作用の発現機構は、以下のものである。すなわち、酸化物光触媒に、バンドギャップに相当するエネルギーを持つ光を照射すると、光励起により伝導帯に電子を生じるとともに、価電子帯に正孔を生じる。このようにして生じた電子は強い還元作用を示し、また、正孔は強い酸化作用を示す。これらの酸化還元作用が、光触媒上に付着した有機物や窒素化合物等を水や炭酸ガスなどに分解する。
Conventionally, it has been known that oxide photocatalysts such as titanium oxide exhibit functions such as antifouling, deodorization, and antibacterial action by photocatalytic action.
The expression mechanism of the photocatalytic action is as follows. That is, when an oxide photocatalyst is irradiated with light having energy corresponding to a band gap, electrons are generated in the conduction band by photoexcitation and holes are generated in the valence band. Electrons generated in this way show a strong reducing action, and holes show a strong oxidizing action. These oxidation-reduction actions decompose organic substances and nitrogen compounds adhering to the photocatalyst into water, carbon dioxide gas, and the like.
近年、上記の酸化物光触媒の防汚、防臭、抗菌等の機能を利用した環境浄化方法、環境浄化装置が注目されている。
ところで、酸化物光触媒は通常粉末状であるので、環境浄化装置に組み込むためには、何らかの方法で酸化物光触媒を基材上に固定化する必要がある。固定方法としては、以下の(i)〜(iii)の方法が知られている。
In recent years, an environmental purification method and an environmental purification apparatus using functions such as antifouling, deodorization, and antibacterial properties of the above-described oxide photocatalyst have attracted attention.
By the way, since the oxide photocatalyst is usually in a powder form, it is necessary to immobilize the oxide photocatalyst on the base material by some method in order to incorporate it into the environmental purification apparatus. As a fixing method, the following methods (i) to (iii) are known.
(i)粉末状の酸化物光触媒を有機バインダーと混合して基材上に塗布し、その後、常温下又は加熱して固定させる（特許文献１参照）。
(ii)粉末状の酸化物光触媒を無機バインダーと混合して基材上に塗布し、その後、常温下又は加熱して固定させる（特許文献２参照）。
(i) A powdered oxide photocatalyst is mixed with an organic binder and coated on a substrate, and then fixed at room temperature or by heating (see Patent Document 1).
(ii) A powdered oxide photocatalyst is mixed with an inorganic binder and coated on a substrate, and then fixed at room temperature or by heating (see Patent Document 2).
(iii)酸化物光触媒と溶媒とを混合して成るコーティング剤を基材上に塗布した後、高温で加熱し、基材上に酸化物光触媒を固定化する（特許文献３参照）。
しかしながら、上記(i)、(ii)の方法では、バインダーが酸化物光触媒表面の大部分を覆ってしまうため、酸化物光触媒の表面のうち、露出している部分の面積が減少し、その結果として、光触媒作用が不活性化してしまうという問題があった。更に、上記(i)の方法では、光触媒作用により有機バインダーが分解されてしまうため、被膜強度が低下し、酸化物光触媒の粉末が次第に脱落してしまうという耐久性上の問題もあった。 However, in the methods (i) and (ii) above, since the binder covers most of the oxide photocatalyst surface, the exposed area of the surface of the oxide photocatalyst is reduced. As a result, the photocatalytic action is inactivated. Furthermore, in the method (i), since the organic binder is decomposed by the photocatalytic action, there is a problem in durability that the coating strength is lowered and the oxide photocatalyst powder gradually falls off.
また、上記(iii)の方法では、高温で加熱するため、酸化物光触媒の焼結が起こってしまい、酸化物光触媒の表面積が減少し、光触媒作用が低下してしまうという問題があった。更に、上記(iii)の方法では、高温で焼成することで、酸化物光触媒の結晶型が低活性の結晶型に相転移し、光触媒作用が不活性化してしまうという問題があった。 In the method (iii), since the oxide photocatalyst is sintered because it is heated at a high temperature, the surface area of the oxide photocatalyst is reduced and the photocatalytic action is lowered. Furthermore, the above method (iii) has a problem that, when baked at a high temperature, the crystal form of the oxide photocatalyst undergoes a phase transition to a low activity crystal form and the photocatalytic action is inactivated.
本発明は以上の点に鑑みなされたものであり、光触媒性微粒子の剥離が生じ難く、光触媒作用が高い光触媒担持体及びその製造方法を提供することを目的とする。 The present invention has been made in view of the above points, and an object of the present invention is to provide a photocatalyst carrier having a high photocatalytic action and a method for producing the photocatalyst fine particles which are difficult to peel off.
（１）請求項１の発明は、
基材に光触媒性微粒子を付着させ、５００〜１１００°Ｃの温度で焼成してＡ層を形成する第１工程と、前記Ａ層の上に、光触媒性微粒子を付着させ、１００〜４００°Ｃの温度で焼成してＢ層を形成する第２工程と、を有することを特徴とする光触媒担持体の製造方法を要旨とする。
(1) The invention of claim 1
First step of attaching photocatalytic fine particles to a substrate and baking at a temperature of 500 to 1100 ° C. to form A layer; and photocatalytic fine particles are attached on the A layer, and the temperature of 100 to 400 ° C. And a second step of forming a B layer by firing at a temperature of 5 ° C., and a gist of the method for producing a photocatalyst carrier.
本発明では、Ａ層を５００〜１１００°Ｃ（好ましくは６００〜１１００°Ｃ、特に好ましくは６００〜１０００°Ｃ）の温度で焼成するので、Ａ層が基材に対し強固に固定される。また、Ａ層とＢ層とはともに光触媒性微粒子から成るので、Ａ層とＢ層との結合も強固である。そのため、本発明で製造された光触媒担持体は、Ａ層やＢ層が剥離しにくく、耐久性が高い。 In the present invention, the A layer is baked at a temperature of 500 to 1100 ° C. (preferably 600 to 1100 ° C., particularly preferably 600 to 1000 ° C.), so that the A layer is firmly fixed to the substrate. Further, since both the A layer and the B layer are made of photocatalytic fine particles, the bond between the A layer and the B layer is strong. Therefore, the photocatalyst carrier manufactured by the present invention has high durability because the A layer and the B layer are hardly peeled off.
また、本発明では、Ａ層及びＢ層を形成する際に、バインダーを用いずに光触媒性微粒子を固定化することができるので、光触媒性微粒子の表面がバインダーで覆われることがなく、光触媒性微粒子の有効表面積が大きい。そのことにより、本発明で製造される光触媒担持体は、光触媒性微粒子による光触媒作用が高く、防汚、防臭、抗菌等の機能において優れている。 Further, in the present invention, when forming the A layer and the B layer, the photocatalytic fine particles can be immobilized without using a binder, so that the surface of the photocatalytic fine particles is not covered with the binder, and the photocatalytic property The effective surface area of the fine particles is large. As a result, the photocatalyst carrier produced in the present invention has a high photocatalytic action by the photocatalytic fine particles, and is excellent in functions such as antifouling, deodorization, and antibacterial properties.
また、本発明では、Ｂ層を光触媒担持体の最表面に形成することができる。このＢ層の焼成温度は１００〜４００°Ｃと低いので、焼結が生じず、Ｂ層に含まれる光触媒性微粒子の有効表面積が大きい。従って、本発明で製造される光触媒担持体は、有効表面積の大きい光触媒性微粒子を最表面に備えることにより、光触媒性微粒子による光触媒作用が高く、防汚、防臭、抗菌等の機能において優れている。 In the present invention, the B layer can be formed on the outermost surface of the photocatalyst carrier. Since the firing temperature of the B layer is as low as 100 to 400 ° C., sintering does not occur, and the effective surface area of the photocatalytic fine particles contained in the B layer is large. Therefore, the photocatalyst carrier produced in the present invention is provided with photocatalytic fine particles having a large effective surface area on the outermost surface, so that the photocatalytic action by the photocatalytic fine particles is high, and is excellent in functions such as antifouling, deodorization, and antibacterial. .
また、本発明は、光触媒性微粒子を固定化するためにバインダーを用いる必要がないので、製造工程を簡略化できる。
・前記基材の材質としては、例えば、セラミックス、金属、ガラス等が挙げられる。
Moreover, since it is not necessary to use a binder for immobilizing the photocatalytic fine particles, the present invention can simplify the production process.
-As a material of the said base material, ceramics, a metal, glass etc. are mentioned, for example.
・前記Ａ層の膜厚としては、例えば、１〜５μｍの範囲が好適である。また、前記Ｂ層の膜厚としては、例えば、１〜２０μｍの範囲が好適である。
・前記光触媒性微粒子の粒径は、５〜１００ｎｍの範囲が好適である。
（２）請求項２の発明は、
前記光触媒性微粒子は、酸化チタン、酸化亜鉛、酸化ジルコニウム、チタン酸ストロンチウム、硫化カドミウム、酸化タングステン、酸化鉄、シリコンの群から選ばれる１種以上から成ることを特徴とする請求項１に記載の光触媒担持体の製造方法を要旨とする。
-As a film thickness of the said A layer, the range of 1-5 micrometers is suitable, for example. Moreover, as a film thickness of the said B layer, the range of 1-20 micrometers is suitable, for example.
The particle size of the photocatalytic fine particles is preferably in the range of 5 to 100 nm.
(2) The invention of claim 2
2. The photocatalytic fine particle comprises at least one selected from the group consisting of titanium oxide, zinc oxide, zirconium oxide, strontium titanate, cadmium sulfide, tungsten oxide, iron oxide, and silicon. The gist of the method for producing a photocatalyst carrier is as follows.
本発明は、光触媒性微粒子が上記の物質から成ることにより、光触媒作用が一層高い。
・前記酸化チタンの結晶形としては、ルチル、アナターゼ、ブルッカイトが挙げられる。特に、光触媒作用が高いアナターゼが好ましい。
（３）請求項３の発明は、
前記Ａ層を構成する光触媒性微粒子と、前記Ｂ層を構成する光触媒性微粒子とが、同一の物質から成ることを特徴とする請求項１又は２に記載の光触媒担持体の製造方法。
In the present invention, the photocatalytic fine particles are composed of the above-mentioned substances, so that the photocatalytic action is higher.
-As a crystal form of the said titanium oxide, a rutile, anatase, and brookite are mentioned. In particular, anatase having a high photocatalytic action is preferable.
(3) The invention of claim 3
The method for producing a photocatalyst carrier according to claim 1 or 2, wherein the photocatalytic fine particles constituting the A layer and the photocatalytic fine particles constituting the B layer are made of the same substance.
本発明では、Ａ層を構成する光触媒性微粒子と、Ｂ層を構成する光触媒性微粒子とが、同一の物質から成るので、Ａ層とＢ層との密着性が一層高くなる。そのため、本発明で製造される光触媒担持体は、耐久性が一層優れている。
（４）請求項４の発明は、
前記第１工程及び／又は前記第２工程において、前記光触媒性微粒子を分散させた分散液を塗布した後、前記分散液の溶媒を蒸発させることにより、前記光触媒性微粒子を付着させることを特徴とする請求項１〜３のいずれかに記載の光触媒担持体の製造方法を要旨とする。
In the present invention, since the photocatalytic fine particles constituting the A layer and the photocatalytic fine particles constituting the B layer are made of the same substance, the adhesion between the A layer and the B layer is further enhanced. Therefore, the durability of the photocatalyst carrier produced by the present invention is further improved.
(4) The invention of claim 4
In the first step and / or the second step, after applying the dispersion liquid in which the photocatalytic fine particles are dispersed, the photocatalytic fine particles are adhered by evaporating the solvent of the dispersion liquid. The manufacturing method of the photocatalyst carrier according to any one of claims 1 to 3 is summarized.
本発明は、上記の方法により、Ａ層、Ｂ層、またはそれらの両方を、均一な厚みに形成することができる。また、本発明によれば、Ａ層、Ｂ層、またはそれらの両方の形成が容易である。
（５）請求項５の発明は、
前記分散液における前記光触媒性微粒子の含有率が、５〜３０重量％であることを特徴とする請求項４に記載の光触媒担持体の製造方法を要旨とする。
In the present invention, the A layer, the B layer, or both of them can be formed to have a uniform thickness by the above method. Further, according to the present invention, formation of the A layer, the B layer, or both of them is easy.
(5) The invention of claim 5
The gist of the method for producing a photocatalyst carrier according to claim 4, wherein the content of the photocatalytic fine particles in the dispersion is 5 to 30% by weight.
本発明は、分散液における光触媒性微粒子の含有率が、５〜３０重量％であることにより、光触媒作用が一層高い。
（６）請求項６の発明は、
前記基材が多孔質セラミックス基材であることを特徴とする請求項１〜５のいずれかに記載の光触媒担持体の製造方法を要旨とする。
In the present invention, when the content of the photocatalytic fine particles in the dispersion is 5 to 30% by weight, the photocatalytic action is higher.
(6) The invention of claim 6
The gist of the method for producing a photocatalyst carrier according to any one of claims 1 to 5, wherein the substrate is a porous ceramic substrate.
本発明では、基材が多孔質セラミックスであることにより、焼成工程において、基材が損傷することがない。また、本発明で製造される光触媒担持体は、基材が多孔質であることにより、表面積が大きく、光触媒作用が高い。
（７）請求項７の発明は、
請求項１〜６のいずれかに記載された製造方法により製造される光触媒担持体を要旨とする。
In the present invention, since the substrate is a porous ceramic, the substrate is not damaged in the firing step. Moreover, the photocatalyst carrier produced by the present invention has a large surface area and high photocatalytic action due to the porous substrate.
(7) The invention of claim 7
The gist is a photocatalyst carrier produced by the production method according to claim 1.
本発明の光触媒担持体は、請求項１〜６の発明について述べた作用効果を奏する。 The photocatalyst carrier of the present invention has the effects described in the first to sixth aspects of the invention.
以下に本発明の光触媒担持体の形態の例（実施例）を説明する。 Examples of the form of the photocatalyst carrier of the present invention (Examples) will be described below.
ａ）まず、本実施例１の光触媒担持体の構成を図１及び図２を用いて説明する。
光触媒担持体１は、基材としてのセラミックスフィルター（多孔質セラミックス基材）３と、その表面に順次積層された酸化チタン第１層（Ａ層）５及び酸化チタン第２層（Ｂ層）７とから成る。
a) First, the structure of the photocatalyst carrier of Example 1 will be described with reference to FIGS.
The photocatalyst carrier 1 includes a ceramic filter (porous ceramic substrate) 3 as a substrate, and a titanium oxide first layer (A layer) 5 and a titanium oxide second layer (B layer) 7 sequentially laminated on the surface thereof. It consists of.
セラミックスフィルター３は、アルミナセラミックス多孔体（Ａｌ2Ｏ3：７６％・ＳｉＯ2：１９％・空孔率：８５％）から成る板状部材である。このセラミックスフィルター３の表面を電子顕微鏡（株式会社日立ハイテクノロジーズ製走査型電子顕微鏡Ｓ−４８００）により撮影した写真を図２に示す。 The ceramic filter 3 is a plate-like member made of an alumina ceramic porous body (Al 2 O 3 : 76%, SiO 2 : 19%, porosity: 85%). The photograph which image | photographed the surface of this ceramic filter 3 with the electron microscope (Hitachi High-Technologies Corporation scanning electron microscope S-4800) is shown in FIG.
酸化チタン第１層５及び酸化チタン第２層７は、それぞれ、酸化チタン微細粉末（光触媒性微粒子）を固定化した層であり、それらの厚みはいずれも約１〜２μｍである。
ｂ）次に、本実施例１の光触媒担持体の製造方法を説明する。
Each of the titanium oxide first layer 5 and the titanium oxide second layer 7 is a layer in which titanium oxide fine powder (photocatalytic fine particles) is immobilized, and the thickness thereof is about 1 to 2 μm.
b) Next, a method for producing the photocatalyst carrier of Example 1 will be described.
まず、セラミックスフィルター３の表面に、酸化チタン第１層５を形成した。具体的には、ディップコーター（有限会社エス・デイ・アイ製ＫＤ−５０００）を用い、セラミックスフィルター３を酸化チタンコーティング液（光触媒性微粒子を分散させた分散液）に一旦浸漬し、その後引き上げた。こうすることにより、セラミックスフィルター３の表面に酸化チタンコーティング液が付着し、その後、酸化チタンコーティング液の溶媒が蒸発することにより、セラミックスフィルター３の表面に酸化チタンから成るＡ層が形成された。 First, the titanium oxide first layer 5 was formed on the surface of the ceramic filter 3. Specifically, using a dip coater (KD-5000 manufactured by S.D.I., Ltd.), the ceramic filter 3 was once immersed in a titanium oxide coating liquid (a dispersion liquid in which photocatalytic fine particles are dispersed) and then pulled up. . By doing so, the titanium oxide coating liquid adhered to the surface of the ceramic filter 3, and then the solvent of the titanium oxide coating liquid evaporated to form an A layer made of titanium oxide on the surface of the ceramic filter 3.
ここで、酸化チタンコーティング液は、石原産業製ＳＴＳ−０１（酸化チタン含有率３０．１％（重量比）、酸化チタンの平均粒径約７ｎｍ、ｐＨ１．５）を４倍希釈したもの（ＳＴＳ−０１と水とを１：３の比率で混合したもの）である。ＳＴＳ−０１の酸化チタン含有率は上記のように３０．１重量％であるので、使用した酸化チタンコーティング液の酸化チタン含有率は７．５２重量％である。 Here, the titanium oxide coating solution is STS-01 (titanium oxide content 30.1% (weight ratio), average particle diameter of titanium oxide of about 7 nm, pH 1.5) manufactured by Ishihara Sangyo Co., Ltd. diluted 4 times (STS). -01 and water mixed at a ratio of 1: 3). Since the titanium oxide content of STS-01 is 30.1% by weight as described above, the titanium oxide content of the used titanium oxide coating liquid is 7.52% by weight.
次に、セラミックスフィルター３及び酸化チタン第１層５を、電気炉（株式会社デンケン製ＫＤＦ Ｓ−１００）を用いて２時間焼成した（第１回焼成）。
ここで、焼成温度は、６００°Ｃ、８００°Ｃ、１０００°、１１００°Ｃの４種類とし、６００°Ｃで焼成したものを実施例１−１、８００°Ｃで焼成したものを実施例１−２、１０００°Ｃで焼成したものを実施例１−３、１１００°Ｃで焼成したものを実施例１−４とした。
Next, the ceramic filter 3 and the titanium oxide first layer 5 were fired for 2 hours using an electric furnace (KDF S-100 manufactured by Denken Co., Ltd.) (first firing).
Here, there are four firing temperatures of 600 ° C., 800 ° C., 1000 °, and 1100 ° C., and those fired at 600 ° C. are Example 1-1 and those fired at 800 ° C. A sample fired at 1-2, 1000 ° C. was fired at Example 1-3, 1100 ° C., and was designated as Example 1-4.
次に、実施例１−１〜１−４のそれぞれについて、酸化チタン第１層５の上に、酸化チタン第２層７を形成した。その形成方法は、酸化チタン第１層５の形成と同様に、ディップコーターを用いて酸化チタンコーティング液に浸漬する方法により行った。ただし、このときの酸化チタンコーティング液は、石原産業製ＳＴＳ−０１を２倍希釈したもの（ＳＴＳ−０１と水とを１：１の比率で混合したもの）を用いた。ＳＴＳ−０１の酸化チタン含有率は３０．１重量％であるので、使用した酸化チタンコーティング液の酸化チタン含有率は１５．１重量％である。 Next, a titanium oxide second layer 7 was formed on the titanium oxide first layer 5 for each of Examples 1-1 to 1-4. The formation method was carried out by a method of immersing in a titanium oxide coating solution using a dip coater, similarly to the formation of the titanium oxide first layer 5. However, the titanium oxide coating solution at this time was obtained by diluting STS-01 manufactured by Ishihara Sangyo Co., Ltd. (mixed STS-01 and water at a ratio of 1: 1). Since the titanium oxide content of STS-01 is 30.1% by weight, the titanium oxide content of the used titanium oxide coating solution is 15.1% by weight.
次に、セラミックスフィルター３、酸化チタン第１層５、及び酸化チタン第２層７を、電気炉を用い、２００°Ｃの条件で１時間焼成し（第２回焼成）、光触媒担持体１を完成した。尚、実施例１−１〜１−４の光触媒担持体の製造条件の一覧を表１に示す。 Next, the ceramic filter 3, the titanium oxide first layer 5, and the titanium oxide second layer 7 are fired at 200 ° C. for 1 hour using an electric furnace (second firing), and the photocatalyst carrier 1 is formed. completed. Table 1 shows a list of production conditions for the photocatalyst carriers of Examples 1-1 to 1-4.
また、次のようにして、比較例１−１〜１−４の光触媒担持体を製造した。
（比較例１−１）
酸化チタン第１層の形成、及び第１回焼成は実施例１−１と同様に行ったが、酸化チタン第２層の形成、及び第２回焼成を行っていないものである。
（比較例１−２）
酸化チタン第１層の形成、及び第１回焼成は実施例１−２と同様に行ったが、酸化チタン第２層の形成、及び第２回焼成を行っていないものである。
（比較例１−３）
酸化チタン第１層の形成、及び第１回焼成は実施例１−３と同様に行ったが、酸化チタン第２層の形成、及び第２回焼成を行っていないものである。
（比較例１−４）
酸化チタン第１層の形成、及び第１回焼成は実施例１−４と同様に行ったが、酸化チタン第２層の形成、及び第２回焼成を行っていないものである。
Moreover, the photocatalyst carrier of Comparative Examples 1-1 to 1-4 was manufactured as follows.
(Comparative Example 1-1)
The formation of the first titanium oxide layer and the first firing were performed in the same manner as in Example 1-1, but the formation of the second titanium oxide layer and the second firing were not performed.
(Comparative Example 1-2)
The formation of the first titanium oxide layer and the first firing were performed in the same manner as in Example 1-2, but the formation of the second titanium oxide layer and the second firing were not performed.
(Comparative Example 1-3)
The formation of the first titanium oxide layer and the first firing were performed in the same manner as in Example 1-3, but the formation of the second titanium oxide layer and the second firing were not performed.
(Comparative Example 1-4)
The formation of the titanium oxide first layer and the first firing were performed in the same manner as in Example 1-4, but the formation of the titanium oxide second layer and the second firing were not performed.
尚、比較例１−１〜１−４における光触媒担持体の製造条件の一覧を表２に示す。 Table 2 shows a list of production conditions for the photocatalyst carrier in Comparative Examples 1-1 to 1-4.
ｃ）次に、本実施例１の光触媒担持体１が奏する効果を説明する。
i)本実施例１の光触媒担持体１では、酸化チタン第１層５は６００〜１１００°Ｃの温度で焼成されているので、セラミックスフィルター３に対し強固に固定されている。また、酸化チタン第２層７と酸化チタン第１層５との結合も強固である。そのため、本実施例１の光触媒担持体１は、酸化チタン第１層５や酸化チタン第２層７が剥離しにくく、耐久性が高い。
c) Next, the effect produced by the photocatalyst carrier 1 of Example 1 will be described.
i) In the photocatalyst carrier 1 of Example 1, the titanium oxide first layer 5 is fired at a temperature of 600 to 1100 ° C., and is thus firmly fixed to the ceramic filter 3. The bond between the titanium oxide second layer 7 and the titanium oxide first layer 5 is also strong. Therefore, the photocatalyst carrier 1 of Example 1 has high durability because the titanium oxide first layer 5 and the titanium oxide second layer 7 are difficult to peel off.
(ii)本実施例１の光触媒担持体１では、バインダーを用いずに酸化チタンを固定化しているので、酸化チタンの表面がバインダーで覆われることがなく、酸化チタンの有効表面積が大きい。そのことにより、本実施例１の光触媒担持体１は、酸化チタンによる光触媒作用が高い。 (ii) In the photocatalyst carrier 1 of Example 1, since the titanium oxide is immobilized without using the binder, the surface of the titanium oxide is not covered with the binder, and the effective surface area of the titanium oxide is large. As a result, the photocatalyst carrier 1 of Example 1 has a high photocatalytic effect due to titanium oxide.
(iii)本実施例１の光触媒担持体１では、酸化チタン第２層７が最表面に露出している。この酸化チタン第２層７の焼成温度は２００°Ｃと低いので、焼結が生じず、酸化チタンの有効表面積が大きい。従って、本実施例１の光触媒担持体１は、有効表面積の大きい酸化チタン第２層７を最表面に備えることにより、酸化チタンによる光触媒作用が高い。 (iii) In the photocatalyst carrier 1 of Example 1, the titanium oxide second layer 7 is exposed on the outermost surface. Since the firing temperature of the titanium oxide second layer 7 is as low as 200 ° C., sintering does not occur and the effective surface area of titanium oxide is large. Therefore, the photocatalyst carrier 1 of Example 1 has a high photocatalytic action by titanium oxide by providing the titanium oxide second layer 7 having a large effective surface area on the outermost surface.
(iv)本実施例１の光触媒担持体１は、酸化チタンを固定化するためにバインダーを用いる必要がないので、製造工程を簡略化できる。
ｄ）次に、本実施例１の光触媒担持体１が奏する光触媒作用を確かめるために行った実験について説明する。以下の実験は、実施例１−１〜１−４、及び比較例１−１〜１−４の光触媒担持体のそれぞれについて行った。
(iv) Since the photocatalyst carrier 1 of Example 1 does not require the use of a binder to immobilize titanium oxide, the production process can be simplified.
d) Next, an experiment conducted for confirming the photocatalytic action exhibited by the photocatalyst carrier 1 of Example 1 will be described. The following experiment was conducted for each of the photocatalyst carriers of Examples 1-1 to 1-4 and Comparative Examples 1-1 to 1-4.
(i)実験方法
容積６７Ｌの容器に、光触媒担持体と、光触媒を照らす光源としてのブラックライトと、容器内部の空気を攪拌するためのファンとを収容した。ブラックライトの照度は３０Ｗとし、ファンによる攪拌速度は０．４ｍ3／ｍｉｎとした。
(i) Experimental Method A photocatalyst carrier, a black light as a light source for illuminating the photocatalyst, and a fan for stirring the air inside the container were housed in a 67 L volume container. The illuminance of the black light was 30 W, and the stirring speed by the fan was 0.4 m 3 / min.
次に、上記容器を密閉し、初期濃度が２００ｐｐｍとなるようにアンモニアを導入した。そして、アンモニア導入からの時間（反応時間）が０分、２．５分、５分、７．５分、１０分、１５分、３０分の時に、それぞれ、アンモニア濃度測定器（株式会社ガステック製の検知管３Ｌ（０．５〜７８ｐｐｍ）、３Ｌａ（２．５〜２００ｐｐｍ））を用いてアンモニア濃度を測定した。 Next, the container was sealed, and ammonia was introduced so that the initial concentration was 200 ppm. When the time from ammonia introduction (reaction time) was 0 minutes, 2.5 minutes, 5 minutes, 7.5 minutes, 10 minutes, 15 minutes, and 30 minutes, respectively, an ammonia concentration measuring device (Gastech Corporation) The ammonia concentration was measured using a detector tube 3L (0.5 to 78 ppm) and 3La (2.5 to 200 ppm).
(ii)実験結果
反応時間ごとの、アンモニア濃度と除去率とを上記表１及び表２に示す。ここで、除去率とは、アンモニアの初期濃度Ｃ0、測定濃度Ｃnしたときに、下記式（１）で表されるものである。
(ii) Experimental results Tables 1 and 2 show the ammonia concentration and removal rate for each reaction time. Here, the removal rate is expressed by the following formula (1) when the initial concentration C 0 and the measured concentration C n of ammonia are obtained.
式（１） 除去率（％）＝（（Ｃ0−Ｃn）／Ｃ0）×１００
表１に示すように、実施例１−１〜１−４の光触媒担持体１は、反応時間３０分において、除去率は全て９８％以上であり、非常に高かった。この結果から、本実施例１の光触媒担持体１は、光触媒作用によるアンモニア分解効果（防臭効果）が高いことが確認できた。
Expression (1) Removal rate (%) = ((C 0 −C n ) / C 0 ) × 100
As shown in Table 1, the photocatalyst carriers 1 of Examples 1-1 to 1-4 all had a very high removal rate of 98% or more at a reaction time of 30 minutes. From this result, it was confirmed that the photocatalyst carrier 1 of Example 1 has a high ammonia decomposition effect (deodorizing effect) due to the photocatalytic action.
また、実施例１−１〜１−４の光触媒担持体１のアンモニア分解効果がいずれも高かったことから、酸化チタン第１層５の焼成温度として、６００〜１１００°Ｃの範囲が好適であることが確認できた。 Moreover, since the ammonia decomposition | disassembly effect of the photocatalyst carrier 1 of Examples 1-1 to 1-4 was high, the range of 600 to 1100 ° C. is preferable as the firing temperature of the titanium oxide first layer 5. I was able to confirm.
これに対し、表２に示すように、比較例１−１〜１−４の光触媒担持体は、反応時間３０分における除去率が５５〜７２．５％と非常に低かった。このように比較例１−１〜１−４の光触媒担持体のアンモニア除去率が低い理由は次のように推定される。すなわち、比較例１−１〜１−４の光触媒担持体は、酸化チタン第２層７を備えておらず、酸化チタン第１層５のみを備えている。酸化チタン第１層５は、６００°Ｃ〜１１００°Ｃという高温で焼成されているので焼結が生じ、酸化チタンの表面積が小さくなっていると考えられる。その結果として、比較例１−１〜１−４の光触媒担持体のアンモニア除去率は低くなったと考えられる。 In contrast, as shown in Table 2, the photocatalyst carrier of Comparative Examples 1-1 to 1-4 had a very low removal rate of 55 to 72.5% at a reaction time of 30 minutes. The reason why the ammonia removal rate of the photocatalyst carriers of Comparative Examples 1-1 to 1-4 is thus low is estimated as follows. That is, the photocatalyst carriers of Comparative Examples 1-1 to 1-4 do not include the titanium oxide second layer 7 but include only the titanium oxide first layer 5. Since the titanium oxide first layer 5 is fired at a high temperature of 600 ° C. to 1100 ° C., sintering occurs, and it is considered that the surface area of the titanium oxide is reduced. As a result, the ammonia removal rate of the photocatalyst carrier of Comparative Examples 1-1 to 1-4 is considered to be low.
基本的には前記実施例１−１〜１−４と同様に、実施例２−１〜２−４の光触媒担持体１を製造した。但し、本実施例２では、酸化チタン第１層５の形成に用いる酸化チタンコーティング液は、ＳＴＳ−０１を６倍希釈したもの（ＳＴＳ−０１と水とを１：５の比率で混合したもの）とした。ＳＴＳ−０１の酸化チタン含有率は３０．１重量％であるので、使用した酸化チタンコーティング液の酸化チタン含有率は５．０２重量％である。尚、実施例２−１〜２−４における光触媒担持体１の製造方法の一覧を表３に示す。 Basically, the photocatalyst carrier 1 of Examples 2-1 to 2-4 was produced in the same manner as in Examples 1-1 to 1-4. However, in Example 2, the titanium oxide coating solution used for forming the titanium oxide first layer 5 is a solution obtained by diluting STS-01 six times (a mixture of STS-01 and water in a ratio of 1: 5). ). Since the titanium oxide content of STS-01 is 30.1% by weight, the titanium oxide content of the used titanium oxide coating solution is 5.02% by weight. Table 3 shows a list of methods for producing the photocatalyst carrier 1 in Examples 2-1 to 2-4.
また、次のようにして、比較例２−１〜２−４の光触媒担持体を製造した。
（比較例２−１）
酸化チタン第１層の形成、及び第１回焼成は実施例２−１と同様に行ったが、酸化チタン第２層の形成、及び第２回焼成を行っていないものである。
（比較例２−２）
酸化チタン第１層の形成、及び第１回焼成は実施例２−２と同様に行ったが、酸化チタン第２層の形成、及び第２回焼成を行っていないものである。
（比較例２−３）
酸化チタン第１層の形成、及び第１回焼成は実施例２−３と同様に行ったが、酸化チタン第２層の形成、及び第２回焼成を行っていないものである。
（比較例２−４）
酸化チタン第１層の形成、及び第１回焼成は実施例２−４と同様に行ったが、酸化チタン第２層の形成、及び第２回焼成を行っていないものである。尚、比較例２−１〜２−４における光触媒担持体の製造条件の一覧を表４に示す。
Moreover, the photocatalyst carrier of Comparative Examples 2-1 to 2-4 was manufactured as follows.
(Comparative Example 2-1)
The formation of the first titanium oxide layer and the first firing were performed in the same manner as in Example 2-1, but the formation of the second titanium oxide layer and the second firing were not performed.
(Comparative Example 2-2)
The formation of the titanium oxide first layer and the first firing were performed in the same manner as in Example 2-2, but the formation of the titanium oxide second layer and the second firing were not performed.
(Comparative Example 2-3)
The formation of the titanium oxide first layer and the first firing were performed in the same manner as in Example 2-3, but the formation of the titanium oxide second layer and the second firing were not performed.
(Comparative Example 2-4)
The formation of the titanium oxide first layer and the first firing were performed in the same manner as in Example 2-4, but the formation of the titanium oxide second layer and the second firing were not performed. Table 4 shows a list of production conditions for the photocatalyst carrier in Comparative Examples 2-1 to 2-4.
本実施例２−１〜２−４の光触媒担持体１は、前記実施例１と同様の効果を奏することができる。
本実施例２−１〜２−４、及び比較例２−１〜２−４の光触媒担持体について、前記実施例１と同様に、アンモニアの分解試験を行った。その結果を上記表３及び表４に示す。
The photocatalyst carrier 1 of Examples 2-1 to 2-4 can achieve the same effects as those of Example 1.
For the photocatalyst carriers of Examples 2-1 to 2-4 and Comparative Examples 2-1 to 2-4, an ammonia decomposition test was performed in the same manner as in Example 1. The results are shown in Tables 3 and 4 above.
表３に示すように、実施例２−１〜２−４の光触媒担持体１は、反応時間３０分において、除去率は全て９８％以上であり、非常に高かった。この結果から、本実施例２の光触媒担持体１は、光触媒作用によるアンモニア分解効果（防臭効果）が高いことが確認できた。 As shown in Table 3, the photocatalyst carriers 1 of Examples 2-1 to 2-4 all had a very high removal rate of 98% or more at a reaction time of 30 minutes. From this result, it was confirmed that the photocatalyst carrier 1 of Example 2 has a high ammonia decomposition effect (deodorizing effect) due to the photocatalytic action.
また、実施例２−１〜２−４の光触媒担持体１のアンモニア分解効果がいずれも高かったことから、酸化チタン第１層５の焼成温度として、６００〜１１００°Ｃの範囲が好適であることが確認できた。 Moreover, since the ammonia decomposition | disassembly effect of the photocatalyst carrier 1 of Examples 2-1 to 2-4 was all high, the range of 600-1100 degreeC is suitable as a calcination temperature of the titanium oxide 1st layer 5. I was able to confirm.
これに対し、表４に示すように、酸化チタン第２層を備えていない比較例２−１〜２−４の光触媒担持体は、反応時間３０分における除去率が４７．５〜７０％と非常に低かった。この理由は、比較例２−１〜２−４の光触媒担持体は酸化チタン第２層７を備えておらず、６００〜１１００°Ｃという高温で焼成され、焼結が生じている酸化チタン第１層５のみを備えるためであると推定される。 On the other hand, as shown in Table 4, the photocatalyst carrier of Comparative Examples 2-1 to 2-4 not including the titanium oxide second layer had a removal rate of 47.5 to 70% in a reaction time of 30 minutes. It was very low. This is because the photocatalyst carriers of Comparative Examples 2-1 to 2-4 are not provided with the titanium oxide second layer 7 and are sintered at a high temperature of 600 to 1100 ° C. and sintered. It is estimated that this is because only one layer 5 is provided.
また、実施例２−１〜２−４の光触媒担持体１の表面を電子顕微鏡（株式会社日立ハイテクノロジーズ製走査型電子顕微鏡Ｓ−４８００）により撮影した。この写真を図３に示す。図３（ａ）は実施例２−１についての写真であり、図３（ｂ）は実施例２−２についての写真であり、図３（ｃ）は実施例２−３についての写真であり、図３（ｄ）は実施例２−４についての写真である。 Moreover, the surface of the photocatalyst carrier 1 of Examples 2-1 to 2-4 was photographed with an electron microscope (a scanning electron microscope S-4800 manufactured by Hitachi High-Technologies Corporation). This photograph is shown in FIG. FIG. 3A is a photograph regarding Example 2-1, FIG. 3B is a photograph regarding Example 2-2, and FIG. 3C is a photograph regarding Example 2-3. FIG. 3D is a photograph of Example 2-4.
この図３に示すように、酸化チタン第１層５の焼結温度が６００〜１０００°Ｃである実施例２−１〜２−３では、酸化チタン第１層５の焼結（大きい粒子の発生）は生じていないが、焼成温度が１１００°Ｃである実施例２−４では、一部において酸化チタン第１層５の焼結が生じ始めている。 As shown in FIG. 3, in Examples 2-1 to 2-3 in which the sintering temperature of the titanium oxide first layer 5 is 600 to 1000 ° C., the sintering of the titanium oxide first layer 5 (large particles In Example 2-4 where the firing temperature is 1100 ° C., the titanium oxide first layer 5 starts to be partially sintered.
酸化チタン第１層５の焼結が進むと、セラミックスフィルター３の表面に、酸化チタン第１層５で覆われていない部分が生じ、そこでは、酸化チタン第２層７が、セラミックスフィルター３に直接固定されることになり、酸化チタン第２層７の密着性が低下する。従って、図３から、酸化チタン第１層５の焼成温度は、１０００°Ｃ以下が一層好ましいことが分かる。 When the sintering of the titanium oxide first layer 5 proceeds, a portion of the surface of the ceramic filter 3 that is not covered with the titanium oxide first layer 5 is generated, where the titanium oxide second layer 7 is formed on the ceramic filter 3. It will be fixed directly, and the adhesiveness of the titanium oxide second layer 7 will decrease. Therefore, FIG. 3 shows that the firing temperature of the titanium oxide first layer 5 is more preferably 1000 ° C. or less.
基本的には前記実施例１と同様にして実施例３−１〜３−４の光触媒担持体１を製造した。
ただし、本実施例３では、酸化チタン第１層５の形成に用いる酸化チタンコーティング液は、ＳＴＳ−０１の原液とした。また、酸化チタン第１層５の焼成条件は、全て５００°Ｃ、４時間とした。
Basically, the photocatalyst carrier 1 of Examples 3-1 to 3-4 was produced in the same manner as in Example 1.
However, in Example 3, the titanium oxide coating solution used for forming the titanium oxide first layer 5 was an STS-01 stock solution. The firing conditions for the titanium oxide first layer 5 were all set to 500 ° C. for 4 hours.
また、酸化チタン第２層７の焼成温度は、１００°Ｃ、２００°Ｃ、３０００°、４００°Ｃの４種類とし、１００°Ｃで焼成したものを実施例３−１、２００°Ｃで焼成したものを実施例３−２、３００°Ｃで焼成したものを実施例３−３、４００°Ｃで焼成したものを実施例３−４とした。尚、実施例３−１〜３−４における光触媒担持体１の製造条件の一覧を表５に示す。 Moreover, the firing temperature of the titanium oxide second layer 7 is 100 ° C., 200 ° C., 3000 °, and 400 ° C., and those fired at 100 ° C. are Example 3-1 and 200 ° C. What baked what was baked at 300 degreeC in Example 3-2 was what was baked at Example 3-3 and 400 degreeC as Example 3-4. Table 5 shows a list of production conditions for the photocatalyst carrier 1 in Examples 3-1 to 3-4.
本実施例３−１〜３−４の光触媒担持体１は、前記実施例１と同様の効果を奏することができる。
本実施例３−１〜３−４の光触媒担持体１について、前記実施例１と同様に、アンモニアの分解試験を行った。その結果を上記表５に示す。
The photocatalyst carrier 1 of Examples 3-1 to 3-4 can achieve the same effects as those of Example 1.
About the photocatalyst carrier 1 of Examples 3-1 to 3-4, an ammonia decomposition test was performed in the same manner as in Example 1. The results are shown in Table 5 above.
表５に示すように、実施例３−１〜３−４の光触媒担持体１は、反応時間３０分において、除去率は全て９７％以上であり、非常に高かった。特に、酸化チタン第２層７の焼成温度が１００〜３００°Ｃである実施例３−１〜３−３は、除去率が９９％以上と、一層高かった。更に、酸化チタン第２層７の焼成温度が２００°Ｃである実施例３−２は、除去率が９９．９５％と、最も高かった。 As shown in Table 5, the photocatalyst carriers 1 of Examples 3-1 to 3-4 all had a very high removal rate of 97% or more at a reaction time of 30 minutes. In particular, Examples 3-1 to 3-3 in which the firing temperature of the titanium oxide second layer 7 was 100 to 300 ° C. had a higher removal rate of 99% or more. Furthermore, in Example 3-2 in which the firing temperature of the titanium oxide second layer 7 was 200 ° C., the removal rate was the highest at 99.95%.
この結果から、本実施例３の光触媒担持体１は、光触媒作用によるアンモニア分解効果（防臭効果）が高いことが確認できた。
また、実施例３−１〜３−４の光触媒担持体１のアンモニア分解効果がいずれも高かったことから、酸化チタン第２層７の焼成温度として、１００〜４００°Ｃの範囲が好適であることが確認できた。
From this result, it was confirmed that the photocatalyst carrier 1 of Example 3 had a high ammonia decomposition effect (deodorizing effect) due to the photocatalytic action.
Moreover, since the ammonia decomposition | disassembly effect of the photocatalyst carrier 1 of Examples 3-1 to 3-4 was all high, the range of 100-400 degreeC is suitable as a calcination temperature of the titanium oxide 2nd layer 7. I was able to confirm.
次に、実施例３−１〜３−４の光触媒担持体１の表面を電子顕微鏡（株式会社日立ハイテクノロジーズ製走査型電子顕微鏡Ｓ−４８００）により撮影した。この写真を図４に示す。図４（ａ）は実施例３−１についての写真であり、図４（ｂ）は実施例３−２についての写真であり、図４（ｃ）は実施例３−３についての写真であり、図４（ｄ）は実施例３−４についての写真である。 Next, the surface of the photocatalyst carrier 1 of Examples 3-1 to 3-4 was photographed with an electron microscope (a scanning electron microscope S-4800 manufactured by Hitachi High-Technologies Corporation). This photograph is shown in FIG. FIG. 4A is a photograph regarding Example 3-1, FIG. 4B is a photograph regarding Example 3-2, and FIG. 4C is a photograph regarding Example 3-3. FIG. 4D is a photograph of Example 3-4.
この図４では、酸化チタン第２層７の焼結温度が１００〜３００°Ｃである実施例３−１〜３−３では、酸化チタン第２層７に、数十μｍ周期の波模様が現れている。それに対し、焼成温度が４００°Ｃである実施例３−４では、そのような波模様は現れていない。 In FIG. 4, in Examples 3-1 to 3-3 in which the sintering temperature of the titanium oxide second layer 7 is 100 to 300 ° C., a wave pattern having a period of several tens of μm is formed on the titanium oxide second layer 7. Appears. On the other hand, in Example 3-4 whose baking temperature is 400 degreeC, such a wave pattern does not appear.
実施例３−１〜３−４に現れているような波模様があれば、酸化チタン第２層７の表面積が増し、光触媒作用が向上すると考えられる。従って、図４からも、酸化チタン第２層７の焼成温度は、１００〜３００°Ｃの範囲が一層好適であることが分かった。 If there is a wave pattern as shown in Examples 3-1 to 3-4, it is considered that the surface area of the titanium oxide second layer 7 is increased and the photocatalytic action is improved. Therefore, also from FIG. 4, it was found that the firing temperature of the titanium oxide second layer 7 is more preferably in the range of 100 to 300 ° C.
基本的には前記実施例１と同様にして実施例４−１〜４−４の光触媒担持体１を製造した。
ただし、本実施例４では、酸化チタン第１層５の形成に用いる酸化チタンコーティング液は、ＳＴＳ−０１の原液とした。また、酸化チタン第１層５の焼成条件は、全て、５００°Ｃ、４時間とした。
Basically, the photocatalyst carrier 1 of Examples 4-1 to 4-4 was produced in the same manner as in Example 1.
However, in Example 4, the titanium oxide coating solution used for forming the titanium oxide first layer 5 was an STS-01 stock solution. The firing conditions for the titanium oxide first layer 5 were all set to 500 ° C. for 4 hours.
また、酸化チタン第２層７の形成に用いる酸化チタンコーティング液は、ＳＴＳ−０１の原液、２倍希釈（ＳＴＳ−０１と水とを１：１で混合）、３倍希釈（ＳＴＳ−０１と水とを１：２で混合）、４倍希釈（ＳＴＳ−０１と水とを１：３で混合）の４種類とし、原液を用いるものを実施例４−１、２倍希釈を用いるものを実施例４−２、３倍希釈を用いるものを実施例４−３、４倍希釈を用いるものを実施例４−４とした。ここで、ＳＴＳ−０１原液の酸化チタン含有率は、上述したように３０．１重量％であるので、実施例４−１で酸化チタン第２層７の形成に用いる酸化チタンコーティング液の酸化チタン含有率は３０．１重量％であり、実施例４−２で用いる酸化チタンコーティング液の酸化チタン含有率は１５．１重量％であり、実施例４−３で用いる酸化チタンコーティング液の酸化チタン含有率は１０．０重量％であり、実施例４−４で用いる酸化チタンコーティング液の酸化チタン含有率は７．５２重量％である。尚、実施例４−１〜４−４における光触媒担持体の製造条件の一覧を表６に示す。 The titanium oxide coating solution used for forming the titanium oxide second layer 7 is a stock solution of STS-01, diluted 2 times (mixed STS-01 and water 1: 1), diluted 3 times (STS-01 and 4) (mixed with water 1: 2) and 4 times dilution (mixed STS-01 and water 1: 3), and those using the stock solution were those using Example 4-1, 2 times dilution. Example 4-2 Using 3 times dilution was used as Example 4-3 and 4 times dilution was used as Example 4-4. Here, since the titanium oxide content of the STS-01 stock solution is 30.1% by weight as described above, the titanium oxide of the titanium oxide coating solution used for forming the titanium oxide second layer 7 in Example 4-1. The content is 30.1 wt%, the titanium oxide content of the titanium oxide coating solution used in Example 4-2 is 15.1 wt%, and the titanium oxide of the titanium oxide coating solution used in Example 4-3 The content is 10.0% by weight, and the titanium oxide content of the titanium oxide coating solution used in Example 4-4 is 7.52% by weight. In addition, Table 6 shows a list of production conditions for the photocatalyst carrier in Examples 4-1 to 4-4.
本実施例４−１〜４−４の光触媒担持体１は、前記実施例１と同様の効果を奏することができる。
本実施例４−１〜４−４の光触媒担持体１について、前記実施例１と同様に、アンモニアの分解試験を行った。その結果を上記表６に示す。
The photocatalyst carrier 1 of Examples 4-1 to 4-4 can achieve the same effects as those of Example 1.
For the photocatalyst carrier 1 of Examples 4-1 to 4-4, an ammonia decomposition test was performed in the same manner as in Example 1. The results are shown in Table 6 above.
表６に示すように、実施例４−１〜４−４の光触媒担持体１は、反応時間３０分において、除去率は全て９９．６％以上であり、非常に高かった。特に、酸化チタンコーティング剤としてＳＴＳ−０１の原液（酸化チタン含有率３０．１重量％）、又は２倍希釈（酸化チタン含有率１５．１重量％）を用いる実施例４−１〜４−２では、除去率が９９．８％以上と、一層高かった。 As shown in Table 6, the photocatalyst carrier 1 of Examples 4-1 to 4-4 had a very high removal rate of 99.6% or more at a reaction time of 30 minutes. In particular, Examples 4-1 to 4-2 using an STS-01 stock solution (titanium oxide content 30.1% by weight) or 2-fold dilution (titanium oxide content 15.1% by weight) as a titanium oxide coating agent Then, the removal rate was higher, 99.8% or more.
この結果から、本実施例４の光触媒担持体１は、光触媒作用によるアンモニア分解効果（防臭効果）が高いことが確認できた。
また、実施例４−１〜４−４の光触媒担持体１のアンモニア分解効果がいずれも高かったことから、酸化チタン第２層７の形成に用いる酸化チタンコーティング液の酸化チタン含有率として、７．５２〜３０．１重量％の範囲が好適であることが確認できた。
From this result, it was confirmed that the photocatalyst carrier 1 of Example 4 had a high ammonia decomposition effect (deodorizing effect) due to the photocatalytic action.
Moreover, since the ammonia decomposition effect of the photocatalyst carrier 1 of each of Examples 4-1 to 4-4 was high, the titanium oxide content of the titanium oxide coating solution used for forming the titanium oxide second layer 7 was 7 It was confirmed that the range of 0.52 to 30.1% by weight was suitable.
基本的には前記実施例１と同様にして実施例５の光触媒担持体１を製造した。
ただし、本実施例５では、酸化チタン第１層５の形成に用いる酸化チタンコーティング液は、ＳＴＳ−０１の原液とし、酸化チタン第１層５の焼成条件は、５００°Ｃ、４時間とした。
Basically, the photocatalyst carrier 1 of Example 5 was produced in the same manner as in Example 1.
However, in Example 5, the titanium oxide coating solution used for forming the titanium oxide first layer 5 was a stock solution of STS-01, and the firing conditions of the titanium oxide first layer 5 were 500 ° C. and 4 hours. .
また、次のようにして、比較例５の光触媒担持体を製造した。
（比較例５）
酸化チタン第１層５の形成、及び第１回焼成は行わず、酸化チタン第２層７の形成、及び第２回焼成は実施例５と同様に行った。従って、比較例５の光触媒担持体の構成は、実施例５の光触媒担持体１から、酸化チタン第１層５を除いたものである。
Moreover, the photocatalyst carrier of the comparative example 5 was manufactured as follows.
(Comparative Example 5)
The formation of the titanium oxide first layer 5 and the first firing were not performed, and the formation of the titanium oxide second layer 7 and the second firing were performed in the same manner as in Example 5. Therefore, the configuration of the photocatalyst carrier of Comparative Example 5 is obtained by removing the titanium oxide first layer 5 from the photocatalyst carrier 1 of Example 5.
尚、実施例５及び比較例５における光触媒担持体の製造条件の一覧を表７に示す。 Table 7 shows a list of production conditions for the photocatalyst carrier in Example 5 and Comparative Example 5.
実施例５、及び比較例５の光触媒担持体について、前記実施例１と同様に、アンモニアの分解試験を行った。その結果を上記表７に示す。
表７に示すように、実施例５の光触媒担持体１は、反応時間３０分において、除去率は全て９９．９５％であり、非常に高かった。この結果から、本実施例５の光触媒担持体１は、光触媒作用によるアンモニア分解効果（防臭効果）が高いことが確認できた。
For the photocatalyst carrier of Example 5 and Comparative Example 5, an ammonia decomposition test was performed in the same manner as in Example 1. The results are shown in Table 7 above.
As shown in Table 7, the photocatalyst carrier 1 of Example 5 had a very high removal rate of 99.95% at a reaction time of 30 minutes. From this result, it was confirmed that the photocatalyst carrier 1 of Example 5 has a high ammonia decomposition effect (deodorizing effect) due to the photocatalytic action.
また、実施例５、及び比較例５の光触媒担持体に対し、酸化チタン第２層７の密着性を確かめるための試験を行った。具体的には、実施例５、比較例５の光触媒担持体を洗浄し、その洗浄前後の表面状態を電子顕微鏡（株式会社日立ハイテクノロジーズ製走査型電子顕微鏡Ｓ−４８００）を用いて観察した。ここで、洗浄条件は、上水を用いた５分間の流水処理とした。 Moreover, the test for confirming the adhesiveness of the titanium oxide 2nd layer 7 was done with respect to the photocatalyst carrier of Example 5 and Comparative Example 5. Specifically, the photocatalyst support of Example 5 and Comparative Example 5 were washed, and the surface state before and after the washing was observed using an electron microscope (scanning electron microscope S-4800 manufactured by Hitachi High-Technologies Corporation). Here, the washing condition was a running water treatment for 5 minutes using clean water.
その結果を図５に示す。図５（ａ）は洗浄前における比較例５の光触媒担持体の表面写真であり、図５（ｂ）は洗浄前における実施例５の光触媒担持体１の表面写真であり図５（ｃ）は洗浄後における比較例５の光触媒担持体の表面写真であり図５（ｄ）は洗浄後における実施例５の光触媒担持体１の表面写真である。 The result is shown in FIG. FIG. 5A is a photograph of the surface of the photocatalyst carrier of Comparative Example 5 before washing, FIG. 5B is a photograph of the surface of the photocatalyst carrier 1 of Example 5 before washing, and FIG. FIG. 5D is a surface photograph of the photocatalyst carrier of Example 5 after washing, and FIG. 5D is a photograph of the surface of the photocatalyst carrier 1 of Example 5 after washing.
実施例５の光触媒担持体１では、図５（ｂ）に示すように、洗浄前は、全面にわたって約１０μｍサイズの鱗状模様が見られる。この鱗状模様は、酸化チタン第２層７で覆われていることを示す。従って、比較例５の光触媒担持体１は、洗浄前には、全面にわたって酸化チタン第２層７で覆われていた。 In the photocatalyst carrier 1 of Example 5, as shown in FIG. 5B, a scale-like pattern having a size of about 10 μm is seen over the entire surface before washing. This scale pattern indicates that the titanium oxide second layer 7 is covered. Therefore, the photocatalyst carrier 1 of Comparative Example 5 was covered with the titanium oxide second layer 7 over the entire surface before washing.
また、実施例５の光触媒担持体１を洗浄した後も、図５（ｄ）に示すように、光触媒担持体１の表面は、洗浄前と同様に、全面にわたって鱗状模様で覆われいた。この結果から、実施例５の光触媒担持体１は、洗浄を行っても酸化チタン第２層７が剥離せず、耐久性が高いことが確認できた。 Further, even after the photocatalyst carrier 1 of Example 5 was washed, as shown in FIG. 5D, the surface of the photocatalyst carrier 1 was covered with a scaly pattern over the entire surface in the same manner as before washing. From this result, it was confirmed that the photocatalyst carrier 1 of Example 5 was highly durable because the titanium oxide second layer 7 did not peel off even after washing.
次に、比較例５の光触媒担持体は、洗浄前は、図５（ａ）に示すように、全面にわたって約１０μｍサイズの鱗状模様が見られ、酸化チタン第２層７で均一に覆われていた。
しかし、比較例５の光触媒担持体を洗浄した後は、図５（ｃ）に示すように、鱗状模様は写真中の右上の領域に残るだけで、その他の部分は、セラミックスフィルター３の表面が露出していた（図２参照）。この結果から、比較例５の光触媒担持体は、酸化チタン第１層５が存在しないことにより、酸化チタン第２層７の密着性が低く、耐久性において劣ることが分かった。
（実験例）
実施例１〜５の光触媒担持体１における酸化チタン第１層５、酸化チタン第２層７厚さを確かめるための実験を行った。具体的には、ガラスの薄板に、実施例１〜５と同様の方法で酸化チタンコーティング液を塗布し、焼成した後に、断面を電子顕微鏡で観察した。酸化チタンコーティング液は、ＳＴＳ−０１を２倍に希釈したものを用いた。また、実験は、焼成温度が１００°Ｃ、１５０°Ｃ、２００°Ｃ、２５０°Ｃ、３００°Ｃ、４００°Ｃの場合について、それぞれ行った。
Next, as shown in FIG. 5A, the photocatalyst carrier of Comparative Example 5 has a scale-like pattern of about 10 μm in size over the entire surface and is uniformly covered with the titanium oxide second layer 7 before cleaning. It was.
However, after washing the photocatalyst carrier of Comparative Example 5, as shown in FIG. 5 (c), the scaly pattern only remains in the upper right region in the photograph, and the other part is the surface of the ceramic filter 3. It was exposed (see FIG. 2). From this result, it was found that the photocatalyst carrier of Comparative Example 5 was inferior in durability because the titanium oxide first layer 5 was not present and the titanium oxide second layer 7 had low adhesion.
(Experimental example)
An experiment was conducted to confirm the thicknesses of the titanium oxide first layer 5 and the titanium oxide second layer 7 in the photocatalyst carrier 1 of Examples 1 to 5. Specifically, a titanium oxide coating solution was applied to a thin glass plate in the same manner as in Examples 1 to 5, and baked, and then the cross section was observed with an electron microscope. As the titanium oxide coating solution, a solution obtained by diluting STS-01 twice was used. In addition, the experiment was performed for cases where the firing temperature was 100 ° C, 150 ° C, 200 ° C, 250 ° C, 300 ° C, and 400 ° C, respectively.
結果を図６に示す。図６（ａ）は焼成温度が１００°Ｃの場合であり、図６（ｂ）は焼成温度が１５０°Ｃの場合であり、図６（ｃ）は焼成温度が２００°Ｃの場合であり、図６（ｄ）は焼成温度が２５０°Ｃの場合であり、図６（ｅ）は焼成温度が３００°Ｃの場合であり、図６（ｆ）は焼成温度が４００°Ｃの場合である。図６（ａ）〜（ｆ）の写真において、下側の層はガラス薄板の層であり、上側の層が酸化チタンから成る層である。 The results are shown in FIG. 6A shows a case where the firing temperature is 100 ° C., FIG. 6B shows a case where the firing temperature is 150 ° C., and FIG. 6C shows a case where the firing temperature is 200 ° C. FIG. 6D shows the case where the firing temperature is 250 ° C., FIG. 6E shows the case where the firing temperature is 300 ° C., and FIG. 6F shows the case where the firing temperature is 400 ° C. is there. 6A to 6F, the lower layer is a glass thin plate layer, and the upper layer is a layer made of titanium oxide.
図６に示す写真のうち、酸化チタンから成る層が明瞭に識別できる図６（ｃ）、図６（ｅ）について見ると、酸化チタンから成る層の厚みは、それぞれ、１．３μｍ、１．６μｍであった。従って、実施例１〜５における酸化チタン第１層５、酸化チタン第２層７の厚さも、これに近い値であると推定される。 6 (c) and 6 (e) in which the layer made of titanium oxide can be clearly identified in the photograph shown in FIG. 6, the thickness of the layer made of titanium oxide is 1.3 μm, 1. It was 6 μm. Therefore, the thicknesses of the titanium oxide first layer 5 and the titanium oxide second layer 7 in Examples 1 to 5 are also estimated to be values close to this.
尚、本発明は前記実施例になんら限定されるものではなく、本発明を逸脱しない範囲において種々の態様で実施しうることはいうまでもない。
例えば、前記実施例１〜５において、酸化チタンの代わりに、他の光触媒性の物質、例えば、酸化亜鉛、酸化ジルコニウム、チタン酸ストロンチウム、硫化カドミウム、酸化タングステン、酸化鉄、シリコン等を用いても良い。
Needless to say, the present invention is not limited to the above-described embodiments, and can be implemented in various modes without departing from the scope of the present invention.
For example, in Examples 1 to 5, other photocatalytic substances such as zinc oxide, zirconium oxide, strontium titanate, cadmium sulfide, tungsten oxide, iron oxide, silicon, etc. may be used instead of titanium oxide. good.
また、酸化チタンコーティング液としては、例えば、石原産業製ＳＴＳ−２１（酸化チタン含有率３８．８％（重量比）、酸化チタンの平均粒径約１００ｎｍ、ｐＨ８．３）の原液、または水で希釈した液を用いることができる。 Moreover, as a titanium oxide coating liquid, for example, STS-21 manufactured by Ishihara Sangyo (titanium oxide content 38.8% (weight ratio), average particle diameter of titanium oxide is about 100 nm, pH 8.3), or water is used. A diluted solution can be used.
１・・・光触媒担持体
３・・・セラミックスフィルター
５・・・酸化チタン第１層
７・・・酸化チタン第２層
DESCRIPTION OF SYMBOLS 1 ... Photocatalyst carrier 3 ... Ceramics filter 5 ... Titanium oxide 1st layer 7 ... Titanium oxide 2nd layer
Claims (7)
前記Ａ層の上に、光触媒性微粒子を付着させ、１００〜４００°Ｃの温度で焼成してＢ層を形成する第２工程と、を有することを特徴とする光触媒担持体の製造方法。 A first step in which photocatalytic fine particles are adhered to a substrate and baked at a temperature of 500 to 1100 ° C. to form an A layer;
And a second step of forming a B layer by attaching photocatalytic fine particles on the A layer and firing at a temperature of 100 to 400 ° C.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| KR101910569B1 (en) * | 2014-09-30 | 2018-10-22 | 서울바이오시스 주식회사 | A Photocatalytic Filter for Efficient Removal of Mixed Gas and Manufacturing Method thereof |
| US10213779B2 (en) | 2014-09-04 | 2019-02-26 | Seoul Viosys Co., Ltd. | Photocatalytic filter, method for manufacturing the same, and method for reactivating the same |
| CN112675878A (en) * | 2021-01-11 | 2021-04-20 | 武汉金特明新材料科技有限公司 | Boron modified photocatalytic material and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10213779B2 (en) | 2014-09-04 | 2019-02-26 | Seoul Viosys Co., Ltd. | Photocatalytic filter, method for manufacturing the same, and method for reactivating the same |
| US11565246B2 (en) | 2014-09-04 | 2023-01-31 | Seoul Viosys Co., Ltd. | Photocatalytic filter, method for manufacturing the same, and method for reactivating the same |
| KR101910569B1 (en) * | 2014-09-30 | 2018-10-22 | 서울바이오시스 주식회사 | A Photocatalytic Filter for Efficient Removal of Mixed Gas and Manufacturing Method thereof |
| CN112675878A (en) * | 2021-01-11 | 2021-04-20 | 武汉金特明新材料科技有限公司 | Boron modified photocatalytic material and preparation method thereof |
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