JP2005311080A - 測定装置、当該測定装置を有する露光装置 - Google Patents

測定装置、当該測定装置を有する露光装置 Download PDF

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Publication number
JP2005311080A
JP2005311080A JP2004126049A JP2004126049A JP2005311080A JP 2005311080 A JP2005311080 A JP 2005311080A JP 2004126049 A JP2004126049 A JP 2004126049A JP 2004126049 A JP2004126049 A JP 2004126049A JP 2005311080 A JP2005311080 A JP 2005311080A
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JP
Japan
Prior art keywords
film
opening
light
wavefront
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004126049A
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English (en)
Japanese (ja)
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JP2005311080A5 (enExample
Inventor
Shiyouritsu Okubo
彰律 大久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004126049A priority Critical patent/JP2005311080A/ja
Priority to US11/112,826 priority patent/US7295327B2/en
Publication of JP2005311080A publication Critical patent/JP2005311080A/ja
Publication of JP2005311080A5 publication Critical patent/JP2005311080A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004126049A 2004-04-21 2004-04-21 測定装置、当該測定装置を有する露光装置 Withdrawn JP2005311080A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004126049A JP2005311080A (ja) 2004-04-21 2004-04-21 測定装置、当該測定装置を有する露光装置
US11/112,826 US7295327B2 (en) 2004-04-21 2005-04-21 Measuring apparatus and exposure apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004126049A JP2005311080A (ja) 2004-04-21 2004-04-21 測定装置、当該測定装置を有する露光装置

Publications (2)

Publication Number Publication Date
JP2005311080A true JP2005311080A (ja) 2005-11-04
JP2005311080A5 JP2005311080A5 (enExample) 2007-06-07

Family

ID=35136067

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004126049A Withdrawn JP2005311080A (ja) 2004-04-21 2004-04-21 測定装置、当該測定装置を有する露光装置

Country Status (2)

Country Link
US (1) US7295327B2 (enExample)
JP (1) JP2005311080A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100955120B1 (ko) 2007-05-22 2010-04-28 캐논 가부시끼가이샤 상의 계측방법 및 장치, 노광장치, 상의 계측용 기판, 및디바이스의 제조방법

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1704445A2 (de) * 2004-01-16 2006-09-27 Carl Zeiss SMT AG Vorrichtung und verfahren zur optischen vermessung eines optischen systems, messstrukturträger und mikrolithographie-projekti onsbelichtungsanlage
JP4666982B2 (ja) * 2004-09-02 2011-04-06 キヤノン株式会社 光学特性測定装置、露光装置及びデバイス製造方法
JP2006324311A (ja) * 2005-05-17 2006-11-30 Canon Inc 波面収差測定装置及びそれを有する露光装置
JP2007180152A (ja) * 2005-12-27 2007-07-12 Canon Inc 測定方法及び装置、露光装置、並びに、デバイス製造方法
JP2008192855A (ja) * 2007-02-05 2008-08-21 Canon Inc 測定装置、露光装置及びデバイス製造方法
JP2009216454A (ja) * 2008-03-07 2009-09-24 Canon Inc 波面収差測定装置、波面収差測定方法、露光装置およびデバイス製造方法
JP2014220263A (ja) * 2013-04-30 2014-11-20 キヤノン株式会社 リソグラフィ装置、及び物品の製造方法
US10209202B1 (en) * 2017-06-14 2019-02-19 Facebook Technologies, Llc Optical characterization system for wide field of view diffractive optical elements

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5835217A (en) * 1997-02-28 1998-11-10 The Regents Of The University Of California Phase-shifting point diffraction interferometer
US7106456B1 (en) * 2002-01-09 2006-09-12 Interphase Technologies, Inc. Common-path point-diffraction phase-shifting interferometer
JP2004055264A (ja) 2002-07-18 2004-02-19 Nippon Steel Corp 金属板の定電圧通電加熱方法
JP2007035709A (ja) * 2005-07-22 2007-02-08 Canon Inc 露光装置及びそれを用いたデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100955120B1 (ko) 2007-05-22 2010-04-28 캐논 가부시끼가이샤 상의 계측방법 및 장치, 노광장치, 상의 계측용 기판, 및디바이스의 제조방법

Also Published As

Publication number Publication date
US20050237540A1 (en) 2005-10-27
US7295327B2 (en) 2007-11-13

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