JP2005310648A - Quadrupolar field-emission display having mesh structure and its manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a quadrupolar field-emission display having a mesh structure. <P>SOLUTION: A mesh has a gate layer, an insulating layer and a convergence electrode layer. The convergence electrode layer is made of a metal conductive plate joined to one surface of a glass plate. A conductive layer is formed on the other surface of the glass plate. The glass plate functions as the insulating layer and the conductive layer functions as the gate layer. In each of the convergence electrode layer, the insulating layer and the gate layer, one or more openings are formed in order to form at least one passage for an electron beam between a positive electrode and a negative electrode of this quadrupolar field-emission display. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a field emission display, and more particularly, to a mesh-type quadrupole field emission display and a method for manufacturing the same.

  The technology related to the field emission display is a technology developed very recently in the field of flat panel displays. Such types of displays that are self-luminous do not require a backlight as used in liquid crystal displays. The field emission display has the characteristics that the brightness is bright, the vision is wide, the power consumption is small, the response speed is fast (no afterimage), and the operating temperature range is large. Although the image quality of a field emission display is equivalent to a standard cathode ray tube display (CRT), the thickness and weight of the field emission display is much thinner and lighter than that of a cathode ray tube display. Thus, it is expected that field emission displays will replace liquid crystal displays in the market. In addition, rapidly evolving nanotechnology provides potential for nanomaterials used in field emission displays, and field emission display technology is expected to be commercially available.

FIG. 1 shows a typical three-pole field emission display comprising an anode plate 10 and a cathode plate 20. The spacer 14 is installed in a vacuum region between these electrodes in order to insulate and support the anode plate 10 and the cathode plate 20. The anode plate 10 includes an anode substrate 11, an anode conductive layer 12, and a fluorescent layer 13. The cathode plate 20 includes a cathode substrate 21, a cathode conductive layer 22, an electron emission layer 23, a dielectric layer 24, and a gate layer 25. The potential difference is applied to the gate layer 25, whereby an electron beam is emitted from the electron emission layer 23. The high voltage applied by the anode conductive layer 12 acts on the fluorescent layer 13 of the anode plate 10 to accelerate the electron beam with a sufficient momentum, and the fluorescent layer 13 is stimulated to emit light. In order to allow the movement of electrons in the field emission display, the degree of vacuum is kept at least below 10 ⁻⁵ torr, thereby ensuring a suitable mean free path of electrons. In addition, the adverse effects and adverse effects of the electron emission source and the fluorescent layer must be avoided. Furthermore, the electron emitting layer 23 and the fluorescent layer 13 must be spaced from each other by a predetermined distance in order to accelerate electrons with energy required to generate light from the fluorescent layer 13.

  Since the electron beam emitted by a general structure has a typical fan shape, it is difficult to control the divergence range of the electron beam with a three-pole field emission display. The electron beam easily diverges and acts on the fluorescent layer 33 of the adjacent unit to degrade the display performance. Therefore, a proposal as shown in FIG. 2 is made for a quadrupole field emission display. In a quadrupole field emission display, a fourth electrode, a focusing electrode, is formed in addition to the tripolar structure. The mesh 5 is formed between the cathode plate 40 and the anode plate 30. The mesh 5 includes a focusing electrode layer 51, an insulating layer 52, and a gate layer 53. The focusing electrode layer 51 is closest to the anode plate 30, the gate layer 53 is closest to the cathode plate 40, and the insulating layer 52 is sandwiched between the focusing electrode layer 51 and the gate layer 53. The insulating wall 44 extends between the gate layer 53 and the cathode plate 40. The cathode plate 40 includes a cathode substrate 41, a cathode conductive layer 42, and an electron emission source layer 43. The gate layer 53 and the focusing electrode layer 51 have appropriate potentials. A plurality of openings 54 are formed through the mesh 5. Each of the openings 54 is arranged corresponding to the anode and cathode of the unit. The electron beam generated from the electron emission source layer 43 propagates toward the fluorescent layer 33. The structure of the mesh 5 is shown in FIG. As shown in the figure, the metal conductive plate is used as the base of the mesh 5. The focusing electrode layer 51 is processed from a metal conductive plate. The insulating layer 52 is formed on the bottom surface of the metal conductive layer. The metal conductive layer is formed on the bottom surface of the insulating layer 52 functioning as the gate layer 53. The metal conductive layer is processed to form an array of apertures 54 therethrough. The positions of the respective openings 54 are arranged so as to match the respective units of the anode and the cathode formed on the anode plate 30 and the cathode plate 40. The opening 54 serves as a radiation path for the electron beam emitted from each cathode. The outer periphery of the metal conductive plate is an inactive region 55. A plurality of marks 551 can be formed on the inactive region 55 and hold the array of openings 54 and the anode and cathode of the unit.

The quadrupole structure provides a focusing electrode layer 51 for focusing the electron beam, and the electron beam can only act on the corresponding fluorescent layer 33. Therefore, the electron beam does not act on the fluorescent layer 33 of the adjacent unit. The display performance of the field emission display is dramatically improved. However, although the insulating layer 52 and the gate layer 53 of the mesh 5 are still processed by the photolithography process, the process is complicated and the cost is high.
JP 2004-087452 A

  An object of the present invention is to provide a quadrupole field emission display having a mesh structure and a manufacturing method thereof.

  The present invention relates to a quadrupole field emission display having a mesh structure and a manufacturing method thereof. In the present invention, the mesh structure is processed by a simpler process than the photolithography process, and its cost is reduced.

  A mesh structure electrolytic radiation display according to the present invention is a mesh structure electrolytic radiation display having a mesh structure arranged between a plurality of anode units and a cathode unit, the proximity surface facing the anode unit and the proximity A first conductive layer that functions as a focusing electrode layer and includes a plurality of first openings that extend through and through the opposite end surfaces of the first conductive layer; and a proximity surface of the first conductive layer. A glass plate that functions as an insulating layer and includes a plurality of second openings formed and extending therethrough, and an adjacent surface that is formed on the glass plate and faces the cathode unit, and an end surface opposite to the adjacent surface And a second conductive layer that functions as a gate electrode layer and includes a plurality of third openings that extend through the surfaces and are disposed in the first and second openings. Features and That.

  The mesh structure provided by the present invention is a metal conductive layer in which a glass layer is formed on one surface of a metal conductive layer that functions as an insulating layer, and a conductive layer is formed on one exposed surface of the glass layer that functions as a gate layer. Processed through a process.

  A mesh structure of a quadrupole field emission display according to the present invention has a focusing electrode layer having an array of first openings extending therethrough and one surface close to the focusing electrode layer, and is arranged corresponding to the first opening. And a plurality of copper wires formed on the insulating layer on the other surface opposite to the side close to the focusing electrode layer, each copper wire being a first opening. And a gate layer arranged in a part of the focusing electrode layer between a set of adjacent rows.

  A method for manufacturing a field emission display having a mesh structure according to the present invention is a method for manufacturing a mesh structure that is incorporated between an anode plate and a cathode plate of a quadrupole field emission display, and includes providing a first conductive plate; Forming a plurality of first openings extending through one conductive plate, providing a glass plate, forming a plurality of second openings extending through the glass plate, and one of the glass plates Temporarily attaching to a first conductive plate having a second opening arranged corresponding to the first opening; providing a second conductive plate; and a plurality of second extending through the second conductive plate. Forming three openings, temporarily attaching the second conductive plate to a glass plate having third openings arranged corresponding to the first and second openings, the first conductive plate, the glass plate, and Stack so that the second conductive plate cannot be removed Characterized in that it comprises the steps of forming a mesh structure.

  According to the present invention, since the mesh structure of the quadrupole field emission display can be processed by a simpler process than the photolithography process, the cost can be reduced.

  In addition, the mesh structure of a quadrupole field emission display has a metal conductive structure in which a glass layer is formed on one surface of a metal conductive layer that functions as an insulating layer, and a conductive layer is formed on one exposed surface of the glass layer that functions as a gate layer. Since processing is performed through a layer process, the cost can be reduced with a simple process.

  Hereinafter, the present invention will be described in detail with reference to the drawings. Other functions of the present invention will be clarified by referring to these figures.

  FIG. 4 is an exploded perspective view of the mesh 6. As shown in the figure, the mesh has a three-layer structure including a first conductive layer 61, a glass plate 62, and a second conductive layer 63. The first conductive layer 61 and the second conductive layer 63 are preferably formed of the same metal or conductor. The first conductive layer 61 and the second conductive layer 63 function as a focusing electrode layer or a gate electrode, respectively. The plurality of openings 611 are formed so as to penetrate the first conductive plate 61. In the present embodiment, the openings 611 are arranged in a lattice pattern. Each opening 611 is arranged to correspond to an anode and cathode unit. The outer periphery of the first conductive layer 61, that is, the region outside the dotted line shown in FIG. 4 is a non-active region 612, which is cut off after the package of the field emission display is completed. The glass plate 62 acts as an insulating layer that prevents conduction between the first conductive layer 61 and the second conductive layer 63. Similar to the first conductive layer 61, a plurality of holes 621 are formed so as to penetrate the glass plate 62. The holes 621 are arranged corresponding to the openings 611. It is desirable to form one hole 621 corresponding to each opening 611. Alternatively, the holes 621 may be formed with larger dimensions, such as a single hole 621 spanning one or more openings 611. For example, as shown in FIG. 4, a plurality of long holes 621 may be formed in the glass plate 62, and each long hole 621 may cover the range of the opening 611 aligned in the vertical or horizontal direction. Similar to the first conductive layer 61, the outer periphery of the glass plate 62 is an inactive region 622, which is removed after the package is completed. A plurality of marks 623 are formed in the inactive area 622 to be arranged in a line. The second conductive layer 63 functions as a gate layer. The plurality of openings 631 are formed so as to penetrate the second conductive layer 63. It is desirable to form one opening 631 so as to correspond to each opening 611. Alternatively, as shown in FIG. 6, a plurality of elongated slits 631 'and separation slits 632 may be alternately formed so as to penetrate through the second conductive layer 63'. The elongated slits 631 'are arranged corresponding to the openings 611 arranged in the vertical or horizontal direction, respectively. The separation slit 632 extends to the inactive region 633 across the conductive plate 63 ′. Thus, after the inactive region 633 is removed, two conductive strips are formed on both sides of each elongated slit 631 '. Each pair of conductive strips constitutes an independent conductive path. If any pair of conductive strips biases the potential, the gate operates to eject electrons from the cathode unit between the pair of conductive strips. The second conductive layer 63 also includes an inactive area 633 on the outer periphery, and a plurality of alignment marks 634 for alignment are formed. These three layers are packaged to form an independent mesh 6. FIG. 5 is a perspective sectional view of the mesh. As shown in the figure, the first openings 611, 621, 631 are aligned with each other to form an electron beam path between the anode and the cathode.

  FIG. 7 is a diagram showing another embodiment of the second conductive layer 63. As shown, a plurality of parallel conductors 635 are formed extending into a hollow frame 636. The plurality of conductive wires 635 are positioned between two adjacent openings 611 under the first conductive layer 61. After the non-active area outside the dotted line is removed, the frame 636 is separated from the conductor 635 to form a structure including a plurality of pairs of conductors 635, and each pair of conductors 635 is arranged side by side in a first opening 611. Between. That is, the first opening 611 corresponds to the cathode units arranged side by side as shown in FIG. Each conductor 635 pair acts as a gate.

  The method for manufacturing the mesh structure includes a step of selecting the conductive layers 61 and 63 and the glass plate 62 having a temperature coefficient equivalent to that of the anode plate and the cathode plate that are not damaged in the sintering process under high pressure for the package. UV glue and glass glue are applied to the inactive areas 612, 622, 632. The three layers (the first conductive layer 61, the second conductive layer 63, and the glass plate 62) are overlapped with each other by arranging the alignment marks 613, 623, and 633 linearly. In order to make a temporary attachment, the UV adhesive is irradiated with ultraviolet rays. The tacked mesh 6 is held by a high temperature clip and placed in a high temperature furnace to perform sintering. UV adhesives are vaporized and exhausted by high temperatures. Glass adhesive is supplied for the main attachment of the mesh. Accordingly, screen printing or photolithographic methods are not necessary for assembling the mesh, the manufacturing process is simplified, and costs are reduced.

  Although preferred embodiments of the present invention have been described in detail above, the inventive concept can be embodied and applied in various other ways. It is intended that the appended claims be construed to include various variations which are outside the scope of the prior art.

  The present invention helps to increase the efficiency of manufacturing field emission displays.

1 is a partial cross-sectional view of a typical three-pole field emission display. FIG. 4 is a partial cross-sectional view of a quadrupole field emission display. It is a schematic block diagram of the mesh of a quadrupole field emission display. It is a disassembled perspective view of the mesh structure of Embodiment 1 of this invention. FIG. 5 is a perspective view of the mesh structure shown in FIG. 4. It is a perspective view of the mesh structure of Embodiment 2 of the present invention. It is a perspective view of the mesh structure of Embodiment 3 of this invention. FIG. 8 is a partial cross-sectional view of the mesh structure of FIG. 7 after a gate layer is formed.

Explanation of symbols

5, 6 mesh,
10 Anode plate,
11 Anode substrate,
12 Anode conductive layer,
13 fluorescent layer,
14 Spacer,
20 cathode plate,
21 cathode substrate,
22 cathode conductive layer,
23 electron emission layer,
24 dielectric layer,
25 gate layer,
30 anode plate,
33 fluorescent layer,
40 cathode plate,
41 cathode substrate,
42 cathode conductive layer,
43 electron emission source layer,
44 insulation wall,
51 focusing electrode layer,
52 insulating layer,
53 Gate layer,
54 opening,
55 inactive area,
61 first conductive layer,
62 glass plate,
63 second conductive layer,
551 mark,
611 opening,
612 inactive area,
613 mark,
621 holes,
622 inactive area,
623 mark,
631 opening,
632 separation slit,
633 inactive area,
635 conductor,
636 frames.

Claims (15)

A mesh-structure electrolytic emission display having a mesh structure arranged between a plurality of anode units and cathode units,
A first conductive layer having a proximity surface facing the anode unit and a terminal surface opposite to the proximity surface and including a plurality of first openings extending through the surfaces and functioning as a focusing electrode layer;
A glass plate formed on the end face of the first conductive layer and including a plurality of second openings extending therethrough and functioning as an insulating layer;
A plurality of proximate surfaces formed on the glass plate and facing the cathode unit and end faces opposite to the proximate surfaces, extending through the surfaces and disposed in the first and second openings; A second conductive layer functioning as a gate electrode layer including a third opening;
A quadrupole field emission display having a mesh structure.   The quadrupole field emission display with a mesh structure according to claim 1, wherein each of the second openings is arranged in a row with the corresponding first opening.   The quadrupole field emission display of mesh structure according to claim 1, wherein each of the second openings covers an opening range of the plurality of first openings.   The quadrupole field emission display with a mesh structure according to claim 1, wherein each of the third openings is arranged in a row with the corresponding one of the first openings.   The quadrupole field emission display with a mesh structure according to claim 1, wherein each of the third openings covers an opening range of the plurality of first openings. A focusing electrode layer having an array of first openings extending therethrough;
An insulating layer having one surface close to the focusing electrode layer and having a plurality of second openings arranged corresponding to the first openings;
A plurality of copper wires formed on an insulating layer on the other side opposite the side proximate to the focusing electrode layer, each copper wire of the focusing electrode layer between a set of adjacent rows of first openings; A gate layer arranged in part,
A mesh structure of a quadrupole field emission display characterized by comprising:   The mesh structure of a quadrupole field emission display according to claim 6, wherein the gate layer further includes a hollow frame in which a copper wire extends.   The mesh structure of a quadrupole field emission display according to claim 6, wherein each of the second openings is arranged in a line with the corresponding first opening.   The mesh structure of a quadrupole field emission display according to claim 6, wherein each second opening is arranged in a row with a corresponding plurality of first openings. A method of manufacturing a mesh structure incorporated between an anode plate and a cathode plate of a quadrupole field emission display,
Providing a first conductive plate;
Forming a plurality of first openings extending through the first conductive plate;
Providing a glass plate;
Forming a plurality of second openings extending through the glass plate;
Temporarily attaching one of the glass plates to a first conductive plate having a second opening arranged corresponding to the first opening;
Providing a second conductive plate;
Forming a plurality of third openings extending through the second conductive plate;
Temporarily attaching the second conductive plate to a glass plate having a third opening arranged corresponding to the first and second openings;
Stacking the first conductive plate, the glass plate and the second conductive plate so that they cannot be removed to form a mesh structure;
A method of manufacturing a quadrupole field emission display comprising:   The method of manufacturing a quadrupole field emission display according to claim 10, wherein the step of temporarily attaching the glass plate to the first conductive plate is applied with an ultraviolet adhesive.   11. The method of manufacturing a quadrupole field emission display according to claim 10, wherein an ultraviolet adhesive is applied in the step of temporarily attaching the second conductive plate to the glass plate.   The method of manufacturing a quadrupole field emission display according to claim 10, wherein the step of stacking the first conductive plate, the glass plate and the second conductive plate so as not to be removed includes a high temperature sintering process.   11. The method of manufacturing a quadrupole field emission display according to claim 10, further comprising selecting first and second conductive layers processed from a material having a thermal expansion coefficient similar to that of the anode plate and the cathode plate. .   The method of manufacturing a quadrupole field emission display according to claim 10, further comprising selecting a glass plate having a thermal expansion coefficient similar to that of the anode plate and the cathode plate.

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