JP2005305725A - Metal mask and manufacturing method thereof - Google Patents

Metal mask and manufacturing method thereof Download PDF

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JP2005305725A
JP2005305725A JP2004123454A JP2004123454A JP2005305725A JP 2005305725 A JP2005305725 A JP 2005305725A JP 2004123454 A JP2004123454 A JP 2004123454A JP 2004123454 A JP2004123454 A JP 2004123454A JP 2005305725 A JP2005305725 A JP 2005305725A
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metal mask
solder
metal
cream solder
plate
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JP2005305725A5 (en
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Atsushi Suzuki
篤 鈴木
Hideki Chiba
千葉秀貴
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Process Lab Micron Co Ltd
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Process Lab Micron Co Ltd
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  • Printing Plates And Materials Therefor (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To prevent a defect such as a crack, an omission or a chip of a solder terminal due to a fault of bleeding or snap-off of cream solder or a fault of slip-off properties of the cream solder from an opening part, and to make the solder terminal free from the defect due to repeated printing, even when a high-precision pattern is printed with a high density and at a high speed on the occasion when the solder terminal for mounting electronic components in a high density is formed of the cream solder by screen printing. <P>SOLUTION: Intermittent electropolishing is applied to an original sheet of a metal mask wherein the opening part for transfer of an electroconductive paste is formed, so as to form the metal mask. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、電子部品や半導体チップを高密度に実装するための接続用のはんだ端子を形成する際に使用するクリームはんだ等の導電性ペースト印刷用のマスクに関する。   The present invention relates to a mask for printing a conductive paste such as cream solder used when forming solder terminals for connection for mounting electronic components and semiconductor chips at high density.

携帯電話を筆頭に、電子回路の小型軽量化の要請から、プリント配線基板に電子部品を高密度に、特にプリント配線基板の両面に電子部品を高密度に実装することが広く行われている。この高密度実装においては、プリント配線基板面に電子部品を実装するために、プリント配線基板にクリームはんだ等の導電性ペーストを印刷し、はんだ端子の高精細な配線パターンを形成し、該はんだ端子に電子部品や半導体チップを搭載し、はんだリフロー炉を通して電子部品や半導体チップの実装を行う。
この際、はんだ端子の配線パターンを欠陥なく、且つ高精細に印刷するための印刷版が種々提案され、実用に供されている。
With the demand for miniaturization and weight reduction of electronic circuits, such as mobile phones, electronic components are mounted on a printed wiring board with high density, and particularly electronic components are mounted on both sides of the printed wiring board with high density. In this high-density mounting, in order to mount an electronic component on the surface of the printed wiring board, a conductive paste such as cream solder is printed on the printed wiring board to form a high-definition wiring pattern of the solder terminal, and the solder terminal The electronic parts and semiconductor chips are mounted on the electronic parts and the electronic parts and semiconductor chips are mounted through a solder reflow furnace.
At this time, various printing plates for printing the wiring patterns of the solder terminals without defects and with high definition have been proposed and put into practical use.

例えば、配線パターン状の開口部が形成されたメタル製マスク、樹脂製マスク、メタルと樹脂の積層マスク等は、高精細印刷性、印刷精度の耐久性、印刷版の作り易さ等のために広く用いられている。印刷用マスクに配線パターン状の開口部を形成する方法(マスクの製造法)としては、金属や樹脂フィルム又は板にフォトリソグラフ法を用いて金属や樹脂をエッチングして作られるエッチング法、パターン状に直接金属や樹脂フィルム又は板にレーザー光を照射して孔を開けるレーザー法、更に金属マスクの別の製造法としては導電性金属表面にレジスト膜で配線パターンを形成し、電鋳により製作するアディティブ法等がある。特に、レーザー法やアディティブ法で作られたメタルマスクは高精細パターンに対応でき、高密度実装用等に使用が拡大している。   For example, metal masks with resin pattern openings, resin masks, metal-resin laminated masks, etc., for high-definition printability, durability of printing accuracy, ease of making printing plates, etc. Widely used. As a method of forming a wiring pattern-shaped opening in a mask for printing (mask manufacturing method), an etching method or pattern formed by etching a metal or resin on a metal or resin film or plate using a photolithographic method A laser method that directly irradiates a metal or resin film or plate with a laser beam to open a hole, and another method for manufacturing a metal mask is to form a wiring pattern with a resist film on the surface of a conductive metal and manufacture it by electroforming. There are additive methods. In particular, a metal mask made by a laser method or an additive method can cope with a high-definition pattern, and its use is expanding for high-density mounting.

前記したような方法で作られた高精細な印刷用マスクを用いてプリント配線基板にクリームはんだを印刷し、電子部品の実装用のはんだ端子を形成した場合、パターンが高精細になればなる程、クリームはんだの版からの抜けが悪くなり、印刷版の版離れが悪くなり、クリームはんだの転写性の悪化を招く。その結果転写されたクリームはんだが滲んだり、形成されたはんだ端子に欠け、割れ、抜け等の欠陥が発生し、歩留まり低下の大きな原因となっていた。又印刷スピードを上げると、前記した欠陥がより発生しやすくなり、印刷スピードを早くすることもできなかった。   When cream solder is printed on a printed wiring board using a high-definition printing mask made by the method as described above, and solder terminals for mounting electronic components are formed, the higher the pattern becomes, the higher the pattern becomes. , The release of the cream solder from the plate becomes worse, the separation of the printing plate becomes worse, and the transfer property of the cream solder is deteriorated. As a result, the transferred cream solder oozes out, and defects such as chipping, cracking, and disconnection occur in the formed solder terminal, which is a major cause of yield reduction. Further, when the printing speed is increased, the aforementioned defects are more likely to occur, and the printing speed cannot be increased.

前記した印刷上の問題点を惹起する原因は種々あるが、大きな原因として開口部壁面の平滑性が挙げられる。そこで、開口部の壁面を化学的、物理的に処理する方法が提案されている。その中で
特開平4−9059号公報 特開平6−91839号公報 特開平7−32759号公報には、メタルマスクの開口部壁面を平滑化するために電解研磨処理する方法が提案されている。
Although there are various causes for causing the above-mentioned printing problems, the major cause is the smoothness of the wall surface of the opening. Therefore, a method of chemically and physically treating the wall surface of the opening has been proposed. inside that
JP-A-4-9059 JP-A-6-91839 Japanese Patent Laid-Open No. 7-32759 proposes a method of electrolytic polishing treatment for smoothing the wall surface of the opening of the metal mask.

しかし、前記したような電解研磨処理を施したメタルマスクを用いても、最近の電子部品の高密度化に対しては、印刷性は必ずしも十分とは言えず、その更なる改良が求められている。又、近年環境上の配慮から鉛を含有しない、所謂鉛フリーはんだが使用されるようになってきたが、該鉛フリーのクリームはんだは従来のクリームはんだに比して転写性に劣り、前記した欠陥が発生し易い。   However, even when using a metal mask subjected to the above-described electropolishing treatment, the printability is not necessarily sufficient for the recent increase in the density of electronic components, and further improvements are required. Yes. In recent years, so-called lead-free solder that does not contain lead has been used for environmental reasons. However, the lead-free cream solder is inferior in transferability as compared with the conventional cream solder. Defects are likely to occur.

本発明の目的は、プリント配線基板等に高密度実装用のはんだ端子を形成するに当たり、クリームはんだ等の導電性ペーストを印刷した際に、前記したクリームはんだの滲み、はんだ端子の欠け、抜け、割れ等の欠陥の発生を防止し、且つ印刷スピードを早くできる印刷用メタルマスクを提供することにある。   The purpose of the present invention is to form a solder terminal for high-density mounting on a printed wiring board or the like, and when the conductive paste such as cream solder is printed, bleeding of the cream solder described above, chipping or disconnection of the solder terminal, An object of the present invention is to provide a printing metal mask that can prevent the occurrence of defects such as cracks and can increase the printing speed.

本発明者らは、メタルマスクを用いてクリームはんだを印刷した際の前記した種々の問題を解決するために電解研磨の処理方法の検討を行い、本発明を完成した。   In order to solve the various problems described above when printing cream solder using a metal mask, the present inventors have studied an electrolytic polishing treatment method and completed the present invention.

すなわち、本発明は、
導電性ペーストの転写用の開口部が設けられたメタルマスク原板に間歇電解研磨処理を施してなるメタルマスク、及び
金属基板にレーザー光の照射により開口部が設けられたメタルマスク原板である前記記載のメタルマスク、及び
アディティブ法で作られたメタルマスク原板である前記記載のメタルマスク、及び
金属基板にレーザー光を照射して導電性ペーストの転写用の開口部を形成する工程、間歇電解研磨処理工程からなるメタルマスクの製造方法、及び
前記記載のメタルマスクを紗を介して金属枠に貼り付けてなる、テンションが0.8〜1.2mmスクリーン印刷版、である。
That is, the present invention
The above description is a metal mask obtained by subjecting a metal mask original plate provided with an opening for transferring conductive paste to an intermittent electrolytic polishing treatment, and a metal mask original plate provided with an opening by laser light irradiation on a metal substrate. A metal mask of the above, and a metal mask original plate made by an additive method, and a step of irradiating the metal substrate with a laser beam to form an opening for transferring the conductive paste, an intermittent electrolytic polishing process A metal mask manufacturing method comprising steps, and a screen printing plate having a tension of 0.8 to 1.2 mm, which is formed by attaching the metal mask described above to a metal frame via a scissors.

本発明のクリームはんだ印刷用メタルマスクは開口部の壁面が平滑化され、且つエッジがシャープになっているため、クリームはんだを印刷した際のクリームはんだの滲み、版からの抜け性が改良され、印刷スピードを早くしてもクリームはんだの転写性不良に由来するはんだ端子の割れ、抜け、欠け等の欠陥を防止することができ、はんだ端子形成工程の生産性及び歩留まりが大きく向上する。   The metal mask for cream solder printing of the present invention has a smoothed wall surface of the opening and a sharp edge, so that the bleeding of the cream solder when the cream solder is printed, the ability to pull out from the plate is improved, Even if the printing speed is increased, defects such as cracking, disconnection, and chipping of the solder terminal due to the poor transferability of the cream solder can be prevented, and the productivity and yield of the solder terminal forming process are greatly improved.

本発明においけるクリームはんだ印刷用メタルマスクに用いられる材料としては、ニッケル、銅、クロム、亜鉛、鉄等を主成分とする金属又は合金が好ましい。メタルマスクの厚は30〜150μmで、前記の金属や合金の単層体でも、積層体でもよい。   The material used for the metal mask for cream solder printing in the present invention is preferably a metal or alloy mainly composed of nickel, copper, chromium, zinc, iron or the like. The metal mask has a thickness of 30 to 150 μm, and may be a single layer or a laminate of the metal or alloy.

本発明のメタルマスクはクリームはんだの転写用の開口部を有するが、その形状は特に制限はなく、例えば、円形、楕円形、正方形、長方形、菱形、台形等の四角形、六角形及び八角形等の多角形、その他瓢箪形、ダンベル形等の不定形等が挙げられる。そしてその大きさは、高密度実装のためには、前記した種々の形状の最大の開口部が40〜200μm、繰返しピッチは70〜400μmである。又、前記開口部はテーパーを有していてもよい。   The metal mask of the present invention has a cream solder transfer opening, but the shape thereof is not particularly limited. And other irregular shapes such as a bowl shape and a dumbbell shape. And the size is 40-200 micrometers for the largest opening part of various shapes mentioned above for high-density mounting, and a repetition pitch is 70-400 micrometers. The opening may have a taper.

本発明のメタルマスク原版の製造方法としては、前記した金属又は合金の板に開口部を薬液により溶解するエッチング法、レーザー光により孔を開けるレーザー法、電鋳により製作するアディティブ法等が実用化されているが、本発明においてはレーザー法又はアディティブ法が好ましい。   As a method for producing a metal mask original plate of the present invention, an etching method in which an opening is dissolved in a metal or alloy plate as described above with a chemical solution, a laser method in which a hole is formed with a laser beam, an additive method manufactured by electroforming, etc. are put into practical use. However, in the present invention, the laser method or the additive method is preferable.

レーザー法とは、ステンレス、ニッケル等の金属板にレーザー光を直接照射して開口部を形成する。
アディティブ法とは、導電性基板にフォトリソグラフ法により感光性樹脂で開
口部に対応する凸部を形成し、凸部を形成した面に電気メッキを行い金属層を形成した後、感光性樹脂及び導電性基板を除去する。
In the laser method, a metal plate such as stainless steel or nickel is directly irradiated with laser light to form an opening.
In the additive method, a convex portion corresponding to the opening is formed with a photosensitive resin by a photolithographic method on a conductive substrate, and a metal layer is formed by electroplating on the surface where the convex portion is formed. The conductive substrate is removed.

本発明のメタルマスクにおいては、前記した方法で開口部を形成したメタルマスク原版に間歇電解研磨処理を施す。
間歇電解研磨とは電解研磨を間歇的に行う方法であり、研磨液にメタルマスク原板を浸漬し、一定時間通電し、その後一定時間通電しない。この通電と非通電のサイクルを繰り返えす。この際、通電工程と非通電工程の間に短時間逆通電を行うと更に好ましい。具体的には、通電工程は電流密度が5〜35A/dm2、好ましくは10〜30A/dm2、通電時間が5〜30秒、逆通電工程は電流密度が−3〜−0.3A/dm2、通電時間が0.5〜5秒、非通電工程は時間が10〜60秒程度である。
又、当然のことながら、研磨液は研磨する材料に適した電解液を用いることは言うまでもない。
In the metal mask of the present invention, an intermittent electrolytic polishing treatment is performed on the metal mask original plate in which the opening is formed by the above-described method.
Intermittent electropolishing is a method in which electropolishing is intermittently performed. A metal mask original plate is immersed in a polishing solution and energized for a certain period of time, and then not energized for a certain period of time. This energization and non-energization cycle is repeated. At this time, it is more preferable to perform reverse energization for a short time between the energization process and the non-energization process. Specifically, the energization process has a current density of 5 to 35 A / dm 2, preferably 10 to 30 A / dm 2, an energization time of 5 to 30 seconds, and the reverse energization process has a current density of −3 to −0.3 A / dm 2, The energization time is 0.5 to 5 seconds, and the non-energization process takes about 10 to 60 seconds.
Needless to say, an electrolytic solution suitable for the material to be polished is used as the polishing liquid.

従来の電解研磨と間歇研磨処理を施したメタルマスクの相違は、開口部を観測した結果から、開口部の壁面の平滑性には大きな相違が見られる。又、開口部のエッジ形状が異なる。即ち、従来の電解研磨の場合は開口部のエッジも研磨され、丸くなる。一方、間歇電解研磨の場合にはエッジはシャープである。その結果クリームはんだを印刷した際に滲みが改良されたと思われる。 As for the difference between the conventional electropolishing and the metal mask subjected to the intermittent polishing process, the smoothness of the wall surface of the opening is greatly different from the result of observing the opening. Also, the edge shape of the opening is different. That is, in the case of conventional electrolytic polishing, the edge of the opening is also polished and rounded. On the other hand, the edge is sharp in the case of intermittent electropolishing. As a result, it seems that bleeding was improved when cream solder was printed.

本発明のメタルマスクは、アルミ、ステンレス、銅等からなる金属枠に紗を介して貼り付けてスクリーン印刷版になる。具体的には、前記した金属枠に紗を貼り付け、該紗に金属枠の大きさよりも小さい前記メタルマスクの外周部を接着剤を用いて紗に貼り付けた後、接着部以外の内側の紗を切り取る。この様にして金属枠にメタルマスクの外周部を紗を介して貼り付けたスクリーン印刷版が出来上がる。メタルマスクは紗のテンションによって引っ張られている。このテンションも前記したようなクリームはんだの印刷特性に大きく関係し、高密度実装用や鉛フリーのクリームはんだの印刷には、該テンションは0.8〜1.2mmが好ましく、0.9〜1.1mmが更に好ましい。この場合のテンションの測定方法は、スクリーン印刷版の中央部に一定の過重を付加した際の印刷版のたわみ量で測定し、テンションゲージSTG−75B(株式会社プロテック)で測定した値とする。   The metal mask of the present invention is attached to a metal frame made of aluminum, stainless steel, copper or the like via a ridge to form a screen printing plate. Specifically, after attaching a ridge to the above-described metal frame, and attaching the outer peripheral portion of the metal mask smaller than the size of the metal frame to the heel using an adhesive, Cut the firewood. In this way, a screen printing plate in which the outer peripheral portion of the metal mask is attached to the metal frame via the ridge is completed. The metal mask is pulled by the heel tension. This tension is also largely related to the printing characteristics of the cream solder as described above. For high-density mounting and printing of lead-free cream solder, the tension is preferably 0.8 to 1.2 mm, 0.9 to 1 More preferably, it is 1 mm. In this case, the tension is measured by the amount of deflection of the printing plate when a certain amount of weight is applied to the center of the screen printing plate, and the value measured with a tension gauge STG-75B (Protech Co., Ltd.). .

以下、本発明を実施例によりさらに詳細に説明する。但し、本発明は、これらの実施例により限定されるものではない。   Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to these examples.

厚さ50μmのステンレス板に電子部品搭載用のはんだパターンとして、直径が70μmの開口部を繰り返しピッチ150μmで縦横それぞれ68(合計4624)個からなる約10mm×10mmの正方形を基本パターンとし、該基本パターンを繰り返しピッチ15mmで3×5(合計15)個を配置したパターンとなるようにYAGレーザーで開口部を形成し、400×480mmのメタルマスク原板を製作した。   As a solder pattern for mounting electronic components on a stainless steel plate having a thickness of 50 μm, a basic pattern is a square of about 10 mm × 10 mm consisting of 68 openings (total 4624 in total) with a pitch of 150 μm and openings of 70 μm in diameter. An opening was formed with a YAG laser so as to form a pattern in which 3 × 5 (total 15) patterns were repeatedly arranged at a pitch of 15 mm, and a 400 × 480 mm metal mask original plate was manufactured.

上記のメタルマスク原板を、燐酸濃度が600ml/l、硫酸濃度が180ml/lからなる電解液を用い、45℃の条件で、メタルマスク原板を陽極にして下記の電解研磨条件を1サイクルとし、20サイクルの電解研磨処理を行い、メタルマスクを製作した。
電流密度 通電時間
通電 : 15A/dm2 15秒
逆通電: −0.5A/dm2 3秒
非通電: 0A/dm2 20秒
Using the above-mentioned metal mask original plate, an electrolytic solution having a phosphoric acid concentration of 600 ml / l and a sulfuric acid concentration of 180 ml / l, and at 45 ° C., with the metal mask original plate as an anode, the following electropolishing conditions are set to one cycle, 20 cycles of electropolishing were performed to produce a metal mask.
Current density Energization time energization: 15 A / dm2 15 seconds Reverse energization: -0.5 A / dm2 3 seconds Non-energization: 0 A / dm2 20 seconds

次に、外形550×650mmのアルミ製枠に180メッシュのポリエステル製の紗が張られたスクリーンの中心部に、上記のメタルマスクの外周部をエポキシ系接着剤を用いて貼り付け、メタルマスクの外周部から10mm以内の部分の紗を切り取り、スクリーン印刷版を作った。テンションゲージSTG−75B(株式会社プロテック)で測定した該版のテンションは0.9mmであった。   Next, the outer periphery of the metal mask is attached to the center of a screen having an outer shape of 550 × 650 mm aluminum frame and a 180-mesh polyester wrinkle stretched using an epoxy adhesive. A screen printing plate was made by cutting off the wrinkles within 10 mm from the outer periphery. The tension of the plate measured with a tension gauge STG-75B (Protech Co., Ltd.) was 0.9 mm.

上記のスクリーン印刷版をスクリーン印刷機(SP28P−DH、パナソニックファクトリーソリューション株式会社)にセットし、鉛フリーのクリームはんだ(LF−71S−3、タムラ化研株式会社)をプリント配線基板に印刷し、形成されたクリームはんだ端子を観察した。繰り返し5000回印刷してもクリームはんだの滲み、はんだ端子の欠け、抜け、割れ等の欠陥は観察されなかった。   Set the above screen printing plate on a screen printing machine (SP28P-DH, Panasonic Factory Solution Co., Ltd.), print lead-free cream solder (LF-71S-3, Tamura Kaken Co., Ltd.) on the printed circuit board, The formed cream solder terminal was observed. Even when printing was repeated 5000 times, defects such as cream solder bleeding, solder terminal chipping, disconnection, and cracking were not observed.

比較例1として、実施例1において、電解研磨条件として、電流密度を18A/dm2で、通電時間を連続300秒とする以外は実施例1と同じようにしてメタルマスク、及びスクリーン印刷版を作り、クリームはんだの印刷を行った。100回繰り返し印刷すると、クリームはんだの滲みが発生し始め、且つはんた端子にも欠けが生じた。
比較例2及び3として、実施例1で製作したメタルマスクを、紗のテンションを変えたスクリーンに貼り付けて、テンションがそれぞれ1.3mm(比較例2)、0.7mm(比較例3)のスクリーン印刷版を作り、クリームはんだの印刷を行った。比較例2の版は印刷時の版離れが悪く、はんだ端子に欠け、割れ等の欠陥が生じた。又、比較例3の版では印刷版の版離れが急激に起こり、はんだ端子に欠けが生じた。
As Comparative Example 1, a metal mask and a screen printing plate were prepared in the same manner as in Example 1 except that in Example 1, the electropolishing conditions were a current density of 18 A / dm2 and an energization time of 300 seconds. The cream solder was printed. When printing was repeated 100 times, bleeding of cream solder began to occur, and chipping also occurred on the solder terminals.
As Comparative Examples 2 and 3, the metal mask manufactured in Example 1 was attached to a screen with a different tension of the heel, and the tensions were 1.3 mm (Comparative Example 2) and 0.7 mm (Comparative Example 3), respectively. A screen printing plate was made and cream solder was printed. The plate of Comparative Example 2 had poor plate separation at the time of printing, and had defects such as chipping and cracking in the solder terminals. Further, in the plate of Comparative Example 3, the printing plate was suddenly separated, and the solder terminals were chipped.

板厚1mm、550×650mmのSUS304の基板の表面を整面(バフ研磨)し、ドライフィルムレジスト(FP240、東京応化工業(株)製)を両面にラミネートした。次に、電子部品搭載用のはんだ端子パターンとして、実施例1同じパターンのガラスマスクを使用して、ミラー反射型平行光露光機で両面露光し、15分エージングした後、1.0%の炭酸ナトリウム水溶液で現像、水洗してSUS304の基板の両面にドライフィルムレジスト膜のはんだ端子パターンを形成した。   The surface of a SUS304 substrate having a plate thickness of 1 mm and 550 × 650 mm was leveled (buffed), and a dry film resist (FP240, manufactured by Tokyo Ohka Kogyo Co., Ltd.) was laminated on both sides. Next, as a solder terminal pattern for mounting electronic components, using a glass mask having the same pattern as in Example 1, double-sided exposure with a mirror reflection type parallel light exposure machine, aging for 15 minutes, and then 1.0% carbonic acid Development with a sodium aqueous solution and washing with water were carried out to form a solder terminal pattern of a dry film resist film on both surfaces of the SUS304 substrate.

次に、スルファミン酸ニッケルメッキ浴に入れて、2A/dm2、浴温度45℃で前記基板上に厚さ60μmのニッケル膜を形成した。得られたニッケル膜付き基板を50℃の1.0%水酸化ナトリウム水溶液に浸漬してレジスト膜を除去し、次いで基板からニッケル膜を剥離して、400×480mmのニッケル製のメタルマスク原板を作製した。 Next, it was placed in a nickel sulfamate plating bath, and a nickel film having a thickness of 60 μm was formed on the substrate at 2 A / dm 2 and a bath temperature of 45 ° C. The obtained nickel film-coated substrate is immersed in a 1.0% sodium hydroxide aqueous solution at 50 ° C. to remove the resist film, and then the nickel film is peeled off from the substrate to obtain a 400 × 480 mm nickel metal mask original plate. Produced.

上記のメタルマスク原板を用いて、下記の電解研磨条件以外は実施例1と同じようにして間歇電解研磨処理を行い、メタルマスクを製作した。
電流密度 通電時間
通電 : 25A/dm2 10秒
逆通電: −1.5A/dm2 1秒
非通電: 0A/dm2 40秒
Using the above metal mask original plate, an intermittent electropolishing treatment was performed in the same manner as in Example 1 except for the following electropolishing conditions to produce a metal mask.
Current density Energization time energization: 25 A / dm2 10 seconds Reverse energization: -1.5 A / dm2 1 second Non-energization: 0 A / dm2 40 seconds

上記のメタルマスクを用いて、実施例1と同じ方法でテンションが1.0mmのスクリーン印刷版を作り、クリームはんだの印刷評価を行った。結果は実施例1と同じであった。又、比較例として、連続通電だけの電解研磨処理したメタルマスクを用いたスクリーン印刷版(比較例4)、及び実施例2メタルマスクを用いて、版のテンションを1.3mm(比較例5)、0.7mm(比較例6)にしたスクリーン印刷版を作り、評価した。結果は、比較例4ではクリームはんだの滲みが発生し始め、はんた端子にも欠けが生じた。比較例5では印刷時の版離れが悪く、はんだ端子に欠け、割れ等の欠陥が生じ、比較例6では印刷版の版離れが急激に起こり、はんだ端子に欠けが生じた。   Using the above metal mask, a screen printing plate having a tension of 1.0 mm was prepared in the same manner as in Example 1, and printing evaluation of cream solder was performed. The result was the same as in Example 1. Further, as comparative examples, a screen printing plate using a metal mask subjected to electropolishing only for continuous energization (Comparative Example 4) and Example 2 using a metal mask, the plate tension was 1.3 mm (Comparative Example 5). A screen printing plate having a thickness of 0.7 mm (Comparative Example 6) was prepared and evaluated. As a result, in Comparative Example 4, bleeding of cream solder began to occur, and chipping also occurred in the solder terminals. In Comparative Example 5, the plate separation at the time of printing was poor, and defects such as chipping and cracking occurred in the solder terminal. In Comparative Example 6, the plate separation of the printing plate occurred rapidly and chipping occurred in the solder terminal.

本発明のメタルマスクは鉛フリーのクリームはんだを、高精細なパターンを高密度に、且つ高速で印刷しても優れた転写性で印刷することができ、電子部品の高密度実装向けのはんだ端子の作成に利用できる。

The metal mask of the present invention can print lead-free cream solder with high transferability even when high-definition patterns are printed at high density and high speed, and is a solder terminal for high-density mounting of electronic components. Can be used to create

Claims (5)

導電性ペーストの転写用の開口部が設けられたメタルマスク原板に間歇電解研磨処理を施してなるメタルマスク。 A metal mask obtained by subjecting a metal mask original plate provided with an opening for transferring a conductive paste to an intermittent electrolytic polishing treatment. 金属基板にレーザー光の照射により開口部が設けられたメタルマスク原板である請求項1記載のメタルマスク。 The metal mask according to claim 1, which is a metal mask original plate in which an opening is provided on a metal substrate by laser light irradiation. アディティブ法で作られたメタルマスク原板である請求項1記載のメタルマスク。 2. The metal mask according to claim 1, wherein the metal mask is an original metal mask made by an additive method. 金属基板にレーザー光を照射して導電性ペーストの転写用の開口部を形成する工程、間歇電解研磨処理工程からなるメタルマスクの製造方法。 A method for producing a metal mask comprising a step of irradiating a metal substrate with laser light to form an opening for transferring a conductive paste, and an intermittent electrolytic polishing treatment step. 請求項2、又は3記載のメタルマスクを紗を介して金属枠に貼り付けてなる、版のテンションが0.8〜1.2mmスクリーン印刷版。

A screen printing plate having a plate tension of 0.8 to 1.2 mm, wherein the metal mask according to claim 2 or 3 is attached to a metal frame through a ridge.

JP2004123454A 2004-04-19 2004-04-19 Metal mask and manufacturing method thereof Pending JP2005305725A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009045867A (en) * 2007-08-21 2009-03-05 Fluoro Technology:Kk Plate surface processing agent for screen printing plate
JP2019107858A (en) * 2017-12-20 2019-07-04 株式会社ボンマーク Metal mask for screen printing with plate frame and manufacturing method therefor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009045867A (en) * 2007-08-21 2009-03-05 Fluoro Technology:Kk Plate surface processing agent for screen printing plate
JP2019107858A (en) * 2017-12-20 2019-07-04 株式会社ボンマーク Metal mask for screen printing with plate frame and manufacturing method therefor

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