JP2005300250A5 - - Google Patents

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JP2005300250A5
JP2005300250A5 JP2004113974A JP2004113974A JP2005300250A5 JP 2005300250 A5 JP2005300250 A5 JP 2005300250A5 JP 2004113974 A JP2004113974 A JP 2004113974A JP 2004113974 A JP2004113974 A JP 2004113974A JP 2005300250 A5 JP2005300250 A5 JP 2005300250A5
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Japan
Prior art keywords
light
path length
optical
optical path
measurement
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JP2004113974A
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Japanese (ja)
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JP2005300250A (en
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Priority to JP2004113974A priority Critical patent/JP2005300250A/en
Priority claimed from JP2004113974A external-priority patent/JP2005300250A/en
Publication of JP2005300250A publication Critical patent/JP2005300250A/en
Publication of JP2005300250A5 publication Critical patent/JP2005300250A5/ja
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光源から光を計測光と参照光とに分割し、レンズを有する被検光学系を透過した前記計測光と前記参照光とを干渉させることにより前記被検光学系の透過波面を測定する光干渉測定装置であって、
記透過波面測定位置を移動させる移動機構と、
記測定位置に応じて前記計測光の光路長又は前記参照光の光路長の少なくと一方を変更する光路長変更機構とを有することを特徴とする光干渉測定装置
The light from the light source is divided into reference light and measurement light, by interfering the measurement light transmitted through the optical system to have a lenses and with said reference light, the transmitted wavefront of the target optical system An optical interference measuring device for measuring,
A moving mechanism for moving the measurement position before SL transmitted wavefront,
Optical interference measuring apparatus characterized by having an optical path length changing mechanism for changing one optical path length of the least well of the optical path length of the measuring light or the reference light in accordance with the prior Kihaka place
前記被検光学系は、反射屈折系であることを特徴とする請求項1記載の光干渉測定装置。2. The optical interference measuring apparatus according to claim 1, wherein the optical system to be tested is a catadioptric system. 前記光源の可干渉距離が、前記計測光の光路長と前記参照光の光路長との光路長差よりも短いことを特徴とする請求項1に記載の光干渉測定装置。   The optical interference measurement apparatus according to claim 1, wherein a coherence distance of the light source is shorter than an optical path length difference between an optical path length of the measurement light and an optical path length of the reference light. 前記レンズの硝材は蛍石であることを特徴とする請求項1に記載の光干渉測定装置。The optical interference measuring apparatus according to claim 1, wherein the glass material of the lens is fluorite. 前記光路長変更機構が、前記蛍石の分散に基づいて前記計測光の光路長又は前記参照光の光路長の少なくと一方を変更することを特徴とする請求項に記載の光干渉測定装置。 The optical path length changing mechanism, an optical interference measurement according to claim 4, wherein the reduced optical path length of the measuring light optical path length or the reference light and also change one based on the variance of the fluorite apparatus. 前記光路長変更機構が、前記参照光と前記被検光学系を経由した前記計測光との結合による干渉縞のビジビリティが実質的に最大となるように、前記計測光の光路長又は前記参照光の光路長の少なくと一方を変更することを特徴とする請求項1に記載の光干渉測定装置。 The optical path length of the measurement light or the reference light so that the optical path length changing mechanism maximizes the visibility of interference fringes due to the combination of the reference light and the measurement light via the test optical system. optical interference measuring apparatus according to claim 1, characterized in that also change one and less of the optical path length of. 光源から光を計測光と参照光とに分割し、レンズを有する被検光学系を透過した前記計測光と前記参照光とを干渉させることにより前記被検光学系の透過波面を測定する光干渉測定装置であって、
前記被検光学系内での前記透過波面測定位置を移動させるステップと、
前記透過波面測定位置に応じて前記計測光の光路長又は前記参照光の光路長の少なくと一方を変更するステップとを有することを特徴とする光干渉測定方法。
The light from the light source is divided into reference light and measurement light, by interfering the measurement light transmitted through the optical system to have a lenses and with said reference light, the transmitted wavefront of the target optical system An optical interference measuring device for measuring,
Moving the transmitted wavefront measurement position in the test optical system;
Optical interference measuring method characterized by a step of changing one said measuring light optical path length or the reference light and small optical path length also in response to the transmitted wavefront measuring position.
JP2004113974A 2004-04-08 2004-04-08 Optical interference measuring apparatus, optical interference measuring method, optical element, and exposure apparatus Pending JP2005300250A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004113974A JP2005300250A (en) 2004-04-08 2004-04-08 Optical interference measuring apparatus, optical interference measuring method, optical element, and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004113974A JP2005300250A (en) 2004-04-08 2004-04-08 Optical interference measuring apparatus, optical interference measuring method, optical element, and exposure apparatus

Publications (2)

Publication Number Publication Date
JP2005300250A JP2005300250A (en) 2005-10-27
JP2005300250A5 true JP2005300250A5 (en) 2007-06-07

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Family Applications (1)

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JP2004113974A Pending JP2005300250A (en) 2004-04-08 2004-04-08 Optical interference measuring apparatus, optical interference measuring method, optical element, and exposure apparatus

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009216454A (en) 2008-03-07 2009-09-24 Canon Inc Wavefront aberration measuring apparatus, wavefront aberration measuring method, exposure apparatus, and device manufacturing method
JP5489658B2 (en) * 2009-11-05 2014-05-14 キヤノン株式会社 Measuring device
JP6378149B2 (en) 2015-09-16 2018-08-22 東芝メモリ株式会社 Defect detection apparatus, defect detection method and program
JP6441252B2 (en) 2016-03-16 2018-12-19 東芝メモリ株式会社 Thermal laser stimulation apparatus, thermal laser stimulation method, and recording medium
CN114414073B (en) * 2022-03-15 2023-06-02 中国工程物理研究院激光聚变研究中心 Method for measuring spectrum phase in ultra-short pulse laser system

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