JP2005294488A - Nozzle device - Google Patents

Nozzle device Download PDF

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JP2005294488A
JP2005294488A JP2004106707A JP2004106707A JP2005294488A JP 2005294488 A JP2005294488 A JP 2005294488A JP 2004106707 A JP2004106707 A JP 2004106707A JP 2004106707 A JP2004106707 A JP 2004106707A JP 2005294488 A JP2005294488 A JP 2005294488A
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hole
discharge hole
flow
nozzle body
discharge
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Shigeru Mizukawa
茂 水川
Kazuhiko Harada
和彦 原田
Yasuyuki Harada
康行 原田
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Sumitomo Precision Products Co Ltd
H Ikeuchi and Co Ltd
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Sumitomo Precision Products Co Ltd
H Ikeuchi and Co Ltd
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Priority to JP2004106707A priority Critical patent/JP2005294488A/en
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a nozzle device capable of discharging a supplied treatment fluid as a continuous liquid film having a uniform film thickness even in the case of the supplied treatment fluid at a small flow rate. <P>SOLUTION: The nozzle device has a nozzle body 20 with a flow path formed of a through-hole 23 in which the treatment fluid flows, and a slit-like discharge opening 24 made to communicate with the through-hole 23. The sectional area of the flow path formed of the through-hole 23 and the discharge opening 24 is reduced by the discharge opening 24, and the treatment fluid flowing into the through-hole 23 is discharged towards a treated object from the discharge opening 24. The front end of the nozzle body 20 is formed in a spherical projecting curved surface projected to the outside, and the surface widths of two internal surfaces (21d and 22d) along the mutually opposite longitudinal directions are formed uniformly along the longitudinal direction in the discharge opening 24. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、基板など各種処理対象物に向けて、現像液,エッチング液や洗浄液といった各種処理流体を吐出するためのノズル体を備えたノズル装置に関する。   The present invention relates to a nozzle device including a nozzle body for discharging various processing fluids such as a developing solution, an etching solution, and a cleaning solution toward various processing objects such as a substrate.

基板の製造工程には、適宜ノズル体から基板に向けて各種処理流体を吐出し、当該処理流体によって基板を処理する各種の工程がある。例えば、現像工程では、基板上にレジスト膜(感光性樹脂)を塗布し、露光マスクを用いて所定領域のレジスト膜を感光させた後、当該レジスト膜上に現像液を塗布して、感光部或いは未感光部のレジストを基板上から除去する。   The substrate manufacturing process includes various processes in which various processing fluids are appropriately discharged from the nozzle body toward the substrate and the substrate is processed with the processing fluid. For example, in the development process, a resist film (photosensitive resin) is applied on a substrate, a resist film in a predetermined region is exposed using an exposure mask, and then a developing solution is applied on the resist film to form a photosensitive portion. Alternatively, the resist in the unexposed area is removed from the substrate.

この現像液を吐出させるノズル体として、従来、図7及び図8に示すものが知られている(特開2003−190840号公報参照)。同図7及び図8に示すように、このノズル体50は、裾広がりの三角形状に形成されており、下端部が三角形の底辺部分となっている。   As a nozzle body for discharging the developer, those shown in FIGS. 7 and 8 are conventionally known (see JP-A-2003-190840). As shown in FIGS. 7 and 8, the nozzle body 50 is formed in a triangular shape with a hem extending, and the lower end portion is a triangular base portion.

また、ノズル体50は、その下端部に形成されたスリット状の吐出口52と、上端部に形成された供給口53と、吐出口52と供給口53とを接続する流通穴54とからなる流路51を備えており、吐出口52は、その長手方向が三角形の底辺方向に沿って形成され、流通穴54は、その吐出口52の幅方向に沿った方向の長さが直線的に徐々に小さくなるように形成されるとともに、その吐出口52の長手方向に沿った方向の長さが曲線的に徐々に大きくなるように形成される。尚、前記供給口53には、現像液を供給する現像液供給装置(図示せず)からの供給管(図示せず)が接続される。   The nozzle body 50 includes a slit-like discharge port 52 formed at the lower end portion thereof, a supply port 53 formed at the upper end portion thereof, and a flow hole 54 connecting the discharge port 52 and the supply port 53. The discharge port 52 includes a flow channel 51, and the longitudinal direction of the discharge port 52 is formed along the base of the triangle. The flow hole 54 has a linear length in the direction along the width direction of the discharge port 52. The discharge port 52 is formed so as to gradually decrease, and the length in the direction along the longitudinal direction of the discharge port 52 is gradually increased in a curved manner. The supply port 53 is connected to a supply pipe (not shown) from a developer supply device (not shown) for supplying the developer.

このように構成されたノズル体50では、現像液供給装置(図示せず)から供給口53に供給された現像液は、流通穴54内を流通した後、図9及び図10に示すように、吐出口52からその長手方向と平行な平面内で扇状且つ膜状に吐出される。尚、このとき、基板Kは、ノズル体50の下方に配置されて、回転台により適宜水平回転せしめられたり、搬送ローラにより吐出口52の幅方向に平行な水平方向に適宜往復移動せしめられる。   In the nozzle body 50 configured as described above, the developer supplied from the developer supply device (not shown) to the supply port 53 circulates in the flow hole 54 and then as shown in FIGS. 9 and 10. From the discharge port 52, it is discharged in the form of a fan and a film in a plane parallel to the longitudinal direction. At this time, the substrate K is disposed below the nozzle body 50 and is appropriately horizontally rotated by a turntable, or is appropriately reciprocated in a horizontal direction parallel to the width direction of the discharge port 52 by a transport roller.

そして、基板上に現像液が供給されると、当該現像液とレジスト膜との化学反応によって、感光した或いは未感光のレジスト膜が基板から除去される。   When a developing solution is supplied onto the substrate, the exposed or unexposed resist film is removed from the substrate by a chemical reaction between the developing solution and the resist film.

特開2003−190840号公報JP 2003-190840 A

ところで、現像処理を基板の全域に渡ってムラ無く、しかも効率的に行なうには、ノズル体50から扇状且つ膜状に吐出される現像液が、そのすべての吐出方向において途切れることなく連続的にしかも一定の膜厚となるように、均一に基板上に供給されなければならない。   By the way, in order to perform the developing process uniformly and efficiently over the entire area of the substrate, the developer discharged from the nozzle body 50 in the form of a fan and a film is continuously continuous without interruption in all the discharge directions. Moreover, it must be uniformly supplied onto the substrate so as to have a constant film thickness.

ところが、従来のノズル体50では、その流路51内を流通する現像液が当該流路51の壁面と接触する領域が大きいため、この壁面との間に生じる摩擦や、壁面の形状精度(表面粗さ(凹凸))によってその流れが不安定となり、ノズル体50から吐出される現像液の膜厚が一定にならず、しかも、液膜が部分的に途切れた状態(図9に符号55で示す部分)となるため、基板上に供給される現像液が不均一なものとならざるを得なかった。   However, in the conventional nozzle body 50, since the developer flowing through the flow channel 51 has a large area in contact with the wall surface of the flow channel 51, the friction between the wall surface and the shape accuracy of the wall surface (surface The flow becomes unstable due to roughness (unevenness), the film thickness of the developer discharged from the nozzle body 50 is not constant, and the liquid film is partially interrupted (reference numeral 55 in FIG. 9). Therefore, the developer supplied on the substrate has to be non-uniform.

また、現像液は、空気中の二酸化炭素と反応し易いため、これがノズル体50から断続的に吐出されると、空気との混合を生じて当該空気中の二酸化炭素と化学反応を起こし易く、このために、基板上のレジスト膜と化学反応する現像液の割合が減少するという問題もある。   In addition, since the developer is likely to react with carbon dioxide in the air, when this is intermittently discharged from the nozzle body 50, the developer is easily mixed with air and easily causes a chemical reaction with the carbon dioxide in the air. For this reason, there is also a problem that the ratio of the developer that chemically reacts with the resist film on the substrate is reduced.

かかる問題を解決するには、多量の現像液を基板上に供給すれば良いが、このように多量の現像液を供給したのでは、多くの現像液が無駄になって処理コストが高くなり、また、現像液を貯留するタンクが大型化して装置の大型化を招くという別の問題を生じる。また、この他、レジスト膜が損傷するといった問題も生じる。   In order to solve such a problem, it is sufficient to supply a large amount of developer onto the substrate. However, when a large amount of developer is supplied in this way, a lot of developer is wasted, and the processing cost is increased. In addition, another problem arises that the tank for storing the developer becomes larger and the apparatus becomes larger. In addition, there is a problem that the resist film is damaged.

本発明は以上の実情に鑑みなされたものであって、供給される処理流体が少流量であっても、これを均一な膜厚の連続した液膜として吐出することができるノズル装置の提供をその目的とする。   The present invention has been made in view of the above circumstances, and provides a nozzle device capable of discharging a supplied processing fluid as a continuous liquid film having a uniform film thickness even when the flow rate of the processing fluid supplied is small. For that purpose.

上記目的を達成するための本発明は、
外部から供給された処理流体が流通する流通孔と、該流通孔に連通したスリット状の吐出孔とを有し、該吐出孔が先端部に開口されるとともに、前記流通孔及び吐出孔によって形成される流路の横断面積が前記吐出孔によって縮小されてなり、前記流通孔内に流入した前記処理流体を前記吐出孔から処理対象物に向けて吐出するノズル体を備えたノズル装置であって、
前記先端部は、外側に突出した球状の凸曲面に形成され、
前記吐出孔は、相対峙する長手方向に沿った2つの内面の面幅が該長手方向に沿って均一に形成されてなることを特徴とするノズル装置に係る。
To achieve the above object, the present invention provides:
It has a flow hole through which a processing fluid supplied from the outside flows, and a slit-like discharge hole communicating with the flow hole, and the discharge hole is formed at the distal end and formed by the flow hole and the discharge hole. And a nozzle device comprising a nozzle body that discharges the processing fluid that has flowed into the flow hole from the discharge hole toward the object to be processed. ,
The tip is formed in a spherical convex curved surface protruding outward,
The discharge holes are related to a nozzle device in which the surface widths of two inner surfaces along the longitudinal direction facing each other are uniformly formed along the longitudinal direction.

この発明によれば、ノズル体の流通孔内に外部から処理流体が供給され、供給された処理流体は、流通孔内を流通した後、処理対象物に向けて、吐出孔からその長手方向と平行な平面内で扇状且つ膜状に吐出される。   According to the present invention, the processing fluid is supplied from the outside into the flow hole of the nozzle body, and the supplied processing fluid flows through the flow hole and then toward the object to be processed from the discharge hole to the longitudinal direction thereof. It is ejected in the form of a fan and a film within a parallel plane.

その際、上記のように、ノズル体の先端部は球状の凸曲面に形成され、吐出孔は、相対峙する長手方向に沿った2つの内面の面幅が当該長手方向に沿って均一に形成されているので、処理流体が吐出孔を通過する際に、当該吐出孔の前記各内面から受ける抵抗を均一にすることができ、これにより、吐出流を安定したものとすることができ、当該処理流体を均一な膜厚の連続した液膜として吐出することができる。尚、前記各内面の面幅は、所定寸法に対し、±50%の誤差内にあるのが好ましい。   At that time, as described above, the tip of the nozzle body is formed in a spherical convex curved surface, and the discharge holes are formed so that the surface widths of the two inner surfaces along the longitudinal direction facing each other are uniform along the longitudinal direction. Therefore, when the processing fluid passes through the discharge hole, the resistance received from each of the inner surfaces of the discharge hole can be made uniform, thereby making it possible to stabilize the discharge flow. The processing fluid can be discharged as a continuous liquid film having a uniform film thickness. The surface width of each inner surface is preferably within an error of ± 50% with respect to a predetermined dimension.

ところで、流体力学の分野では、内径が大きい第1流通管側からこれよりも内径が小さい第2流通管側へと流体が流通するときに、第2流通管の第1流通管との付け根部近傍において、流体の仮想外径が第2流通管の内径よりも一旦小さくなった(収縮した)後に、当該第2流通管の内径と等しくなる現象を生じることが知られている。即ち、流体の流通方向に垂直な断面積が、第1流通管の横断面積に等しい状態から第2流通管の横断面積に等しい状態へと変化するときに、一度、第2流通管の横断面積よりも小さくなるのである。そして、このとき、流体は、その流速が上昇し、また、第2流通管の内面と接触していない状態となる。   By the way, in the field of fluid dynamics, when fluid flows from the first flow pipe side having a larger inner diameter to the second flow pipe side having a smaller inner diameter, the root portion of the second flow pipe with the first flow pipe is formed. It is known that in the vicinity, after the virtual outer diameter of the fluid once becomes smaller (shrinks) than the inner diameter of the second flow pipe, a phenomenon occurs that becomes equal to the inner diameter of the second flow pipe. That is, when the cross-sectional area perpendicular to the fluid flow direction changes from the state equal to the cross-sectional area of the first flow pipe to the state equal to the cross-sectional area of the second flow pipe, the cross-sectional area of the second flow pipe is once. It becomes smaller than. At this time, the fluid has an increased flow velocity and is not in contact with the inner surface of the second flow pipe.

そこで、前記吐出孔内面の面幅を、0.2mm以上0.5mm以下とすれば、処理流体を収縮状態のまま吐出孔から吐出させることができ、処理流体が当該吐出孔の前記各内面から受ける抵抗を最小限に抑えて流れをより安定させることができるとともに、処理流体の吐出速度が上昇して、当該処理流体をより広角な扇状にして吐出させることができる。   Therefore, if the surface width of the inner surface of the discharge hole is 0.2 mm or more and 0.5 mm or less, the processing fluid can be discharged from the discharge hole in a contracted state, and the processing fluid can be discharged from each inner surface of the discharge hole. It is possible to stabilize the flow by minimizing the resistance received, and to increase the discharge speed of the processing fluid so that the processing fluid can be discharged in the form of a wider-angle fan.

ここで、前記面幅を、0.2mm以上0.5mm以下としているのは、0.2mmより小さいと、ノズル体先端部の厚みが薄くなり過ぎて強度が不足し、吐出孔の開口形状が変形する虞があるからであり、一方、0.5mmより大きいと、処理流体が吐出孔内で収縮状態から拡径状態に移行し、処理流体が吐出孔内面と接触して吐出流が乱れ、その流れが不連続となる虞があるからである。   Here, the surface width is set to 0.2 mm or more and 0.5 mm or less. If the surface width is smaller than 0.2 mm, the thickness of the tip of the nozzle body becomes too thin and the strength is insufficient, and the opening shape of the discharge hole is reduced. On the other hand, if it is larger than 0.5 mm, the processing fluid moves from the contracted state to the expanded diameter state in the discharge hole, the processing fluid contacts the inner surface of the discharge hole, and the discharge flow is disturbed. This is because the flow may be discontinuous.

また、前記流通孔は、前記吐出孔との境界部に該吐出孔に沿って形成された円弧状の凹みを備え、この凹みによって前記吐出孔内面の面幅が均一に形成されたものであっても良い。   Further, the flow hole has an arc-shaped recess formed along the discharge hole at the boundary with the discharge hole, and the surface width of the inner surface of the discharge hole is uniformly formed by the recess. May be.

また、前記ノズル体は、前記吐出孔部で、その内面と平行な平面に沿って分割された2つの部材から構成されるとともに、分割された2つの部材が保持手段により前記ノズル体として一体的に保持される構成であっても良い。   The nozzle body is composed of two members divided along the plane parallel to the inner surface of the discharge hole portion, and the two divided members are integrated as the nozzle body by a holding means. It may be a configuration held in

このようにすれば、分割された各部材に吐出孔となる加工をそれぞれ施し、加工後これらを組み合わせることによって一つのノズル体とすることができるので、当該加工を容易に行うことができ、また、吐出孔の縁部にカエリが生じない加工を行なうことができる。吐出孔の縁部にカエリがあると、吐出流に乱れを生じるが、カエリの生じない加工を行なうことで、吐出流に乱れが生じるのを防止することができる。   In this way, each of the divided members can be processed as discharge holes and combined into a single nozzle body after processing, so that the processing can be easily performed. Further, it is possible to perform processing that does not cause burrs at the edge of the discharge hole. If burrs are present at the edge of the discharge hole, the discharge flow is disturbed. However, by performing processing that does not cause burrs, it is possible to prevent the discharge flow from being disturbed.

尚、本発明にける処理対象物としては、例えば、基板などを挙げることができ、処理流体としては、例えば、現像液やエッチング液、洗浄液などを挙げることができるが、これらに限定されるものではない。   In addition, examples of the processing object in the present invention include a substrate, and examples of the processing fluid include a developer, an etching solution, and a cleaning solution, but are not limited thereto. is not.

以上述べたように、本発明に係るノズル装置によれば、ノズル体の先端部を球状の凸曲面に形成し、吐出孔の相対峙する長手方向に沿った2つの内面の面幅をその長手方向に沿って均一に形成しているので、例えば、ノズル体に供給される処理流体の流量が約0.3〜2l/min程度、圧力が約10〜100kPa程度のものであっても、これを均一な膜厚の連続した液膜として扇状に吐出することができる。これにより、処理対象物をその全域に渡ってムラ無く効率的に処理することができる。   As described above, according to the nozzle device of the present invention, the tip of the nozzle body is formed into a spherical convex curved surface, and the surface width of the two inner surfaces along the longitudinal direction in which the discharge holes are opposed to each other is the longitudinal length. For example, even if the flow rate of the processing fluid supplied to the nozzle body is about 0.3 to 2 l / min and the pressure is about 10 to 100 kPa. Can be discharged in a fan shape as a continuous liquid film having a uniform film thickness. Thereby, a process target object can be processed efficiently uniformly, over the whole region.

以下、本発明の具体的な実施形態について、添付図面に基づき説明する。尚、図1は、本発明の一実施形態に係るノズル装置の概略構成を一部断面で示した正面図であり、図2は、図1における矢示A方向の側面図である。   Hereinafter, specific embodiments of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a front view partially showing a schematic configuration of a nozzle device according to an embodiment of the present invention, and FIG. 2 is a side view in the direction of arrow A in FIG.

図1及び図2に示すように、本例のノズル装置1は、適宜図示しない配管に装着するためのアダプタ10と、アダプタ10の先端部に設けられるノズル体20と、アダプタ10の先端部に係合し、スリーブ11を介してノズル体20をアダプタ10に取り付けるためのキャップ12とからなる。   As shown in FIGS. 1 and 2, the nozzle device 1 of this example includes an adapter 10 that is appropriately attached to a pipe (not shown), a nozzle body 20 provided at the distal end portion of the adapter 10, and a distal end portion of the adapter 10. The cap 12 is engaged to attach the nozzle body 20 to the adapter 10 via the sleeve 11.

尚、本例において、前記ノズル装置1は、現像液を基板に向けて吐出するものとして説明するが、吐出対象の処理液はこれに限定されるものではない。また、処理対象物も基板に限定されるものではない。   In this example, the nozzle device 1 is described as ejecting the developer toward the substrate, but the treatment liquid to be ejected is not limited to this. Further, the processing object is not limited to the substrate.

前記アダプタ10は、長手方向の中央部に鍔部10aを有する円筒状の部材から構成されており、その先端部に開口し、ノズル体20が装着される装着穴10bと、装着穴10bに連通するとともに後端部に開口し、現像液が流通する流通孔10cと、先端部外周面に形成された第1ねじ溝10dと、後端部外周面に形成された第2ねじ溝10eとを備えている。そして、第2ねじ溝10eが、現像液を供給する現像液供給装置(図示せず)に接続された前記配管(図示せず)に螺合されて、アダプタ10(ノズル装置1)が当該配管(図示せず)に装着される。尚、装着穴10bは、流通孔10cよりも大径に形成されている。   The adapter 10 is composed of a cylindrical member having a flange portion 10a at the center in the longitudinal direction. The adapter 10 is opened at the tip of the adapter 10 and communicates with the mounting hole 10b. In addition, a flow hole 10c that opens to the rear end portion and through which the developer flows, a first screw groove 10d formed on the outer peripheral surface of the front end portion, and a second screw groove 10e formed on the outer peripheral surface of the rear end portion. I have. Then, the second screw groove 10e is screwed into the pipe (not shown) connected to a developer supply device (not shown) for supplying the developer, and the adapter 10 (nozzle device 1) is connected to the pipe. (Not shown). The mounting hole 10b is formed to have a larger diameter than the flow hole 10c.

前記スリーブ11は、環状の部材から構成されており、その中央部の貫通穴11a内にノズル体20が嵌挿される。また、スリーブ11の先端面及び外周面は、キャップ12の内面に当接し、後端面は、アダプタ10の先端面及びノズル体20の鍔部20a先端面に当接するようになっている。   The sleeve 11 is composed of an annular member, and the nozzle body 20 is inserted into the through hole 11a at the center. Further, the front end surface and the outer peripheral surface of the sleeve 11 are in contact with the inner surface of the cap 12, and the rear end surface is in contact with the front end surface of the adapter 10 and the front end surface of the flange 20 a of the nozzle body 20.

前記キャップ12は、後端面に開口し、ねじ溝12bが内周面に形成された凹部12aと、先端面及び凹部12a底面に開口する貫通穴12cとを備えており、スリーブ11が凹部12a内に収容された状態で、ねじ溝12bがアダプタ10の第1ねじ溝10dと螺合している。   The cap 12 is provided with a recess 12a having an opening at the rear end surface and a thread groove 12b formed on the inner peripheral surface, and a through hole 12c opening at the front end surface and the bottom surface of the recess 12a, and the sleeve 11 is in the recess 12a. The thread groove 12b is screwed into the first thread groove 10d of the adapter 10 in the state of being accommodated in the housing.

前記ノズル体20は、図1乃至図5に示すように、先端部が凸球面状に形成されるとともに、後端部外周面に鍔部20aが形成された円筒状に形成されており、その軸線を含む平面に沿って分割された第1部材21と第2部材22との2部材から構成されている。尚、図3は、本実施形態に係るノズル体20の概略構成を示した正断面図であり、図4は、図3における矢示B−B方向の断面図であり、図5は、図3における矢示C方向の側面図である。   As shown in FIGS. 1 to 5, the nozzle body 20 is formed in a cylindrical shape in which a tip end portion is formed in a convex spherical shape and a collar portion 20a is formed in an outer peripheral surface of a rear end portion. The first member 21 and the second member 22 are divided into two members along a plane including the axis. 3 is a front sectional view showing a schematic configuration of the nozzle body 20 according to the present embodiment, FIG. 4 is a sectional view in the direction of arrow BB in FIG. 3, and FIG. 3 is a side view in the direction of arrow C in FIG.

前記第1部材21と第2部材22とは、それぞれ同一形状に形成されており、外面から一定肉厚を確保し、分割面21a,22a及び後端面に開口するように形成された第1凹部21b,22bと、先端部における肉厚を薄くするように、分割面21a,22aに円弧状に開口した第2凹部21c,22cと、凸球面の外面側から第2凹部21c,22c側にかけて分割面21a,22aよりも一段低くなるように先端部に形成された段差部21d,22dとを備えている。   The first member 21 and the second member 22 are each formed in the same shape, and have a certain thickness from the outer surface, and a first recess formed so as to open to the divided surfaces 21a and 22a and the rear end surface. 21b, 22b, and the second concave portions 21c, 22c opened in an arc shape on the split surfaces 21a, 22a and the outer surface side of the convex spherical surface to the second concave portions 21c, 22c side so as to reduce the thickness at the tip portion. Step portions 21d and 22d are provided at the tip so as to be one step lower than the surfaces 21a and 22a.

前記第2凹部21c,22cは、凹曲面状に形成されるとともに、当該第2凹部21c,22cと段差部21d,22dとの境界線である円弧Lが、分割面21a,22aと直交し且つ凸球面の球中心を通る中心軸線を有するように形成され、前記段差部21d,22dの面幅Wが、所定の寸法で凸球面に沿って均一に形成されている。   The second recesses 21c and 22c are formed in a concave curved surface, and an arc L that is a boundary line between the second recesses 21c and 22c and the stepped portions 21d and 22d is orthogonal to the dividing surfaces 21a and 22a. It is formed so as to have a central axis passing through the spherical center of the convex spherical surface, and the surface width W of the step portions 21d, 22d is uniformly formed along the convex spherical surface with a predetermined dimension.

尚、段差部21d,22dの高さhは、後述する吐出孔24の開口幅Hに応じて設定され、当該開口幅Hは、例えば、約0.15mm〜0.5mm程度に設定される。また、段差部21d,22dの面幅Wは、例えば、約0.3mm程度に設定されるが、面幅W及び開口幅Hは、W/H≦2.5の関係を満たしていることが好ましい。また、面幅Wの均一さとしては、所定寸法に対し、約±50%の誤差内(本例では、約±0.15mm内)に収めることが好ましい。   The height h of the stepped portions 21d and 22d is set according to the opening width H of the discharge hole 24 described later, and the opening width H is set to about 0.15 mm to 0.5 mm, for example. Further, the surface width W of the step portions 21d and 22d is set to about 0.3 mm, for example, but the surface width W and the opening width H satisfy the relationship of W / H ≦ 2.5. preferable. The uniformity of the surface width W is preferably within an error of about ± 50% with respect to a predetermined dimension (in this example, within about ± 0.15 mm).

そして、この第1部材21及び第2部材22の各分割面21a,22a同士を突き合わせて前記スリーブ11に嵌挿し、ノズル体20として一体的に組み合わせると、前記第1凹部21b,22b、第2凹部21c,22c及び段差部21d,22dによって現像液が流通する流路が形成され、第1凹部21b,22b及び第2凹部21c,22cが、現像液を流通させるための流通孔23として、段差部21d,22dが現像液を吐出させるためのスリット状の吐出孔24として機能する。また、当該流路は、その横断面積が吐出孔24によって縮小されている。   Then, when the divided surfaces 21a and 22a of the first member 21 and the second member 22 are brought into contact with each other and inserted into the sleeve 11 and integrally combined as the nozzle body 20, the first recesses 21b and 22b, the second A flow path through which the developer flows is formed by the recesses 21c and 22c and the stepped portions 21d and 22d, and the first recesses 21b and 22b and the second recesses 21c and 22c serve as flow holes 23 for flowing the developer. The portions 21d and 22d function as slit-like discharge holes 24 for discharging the developer. Further, the cross-sectional area of the flow path is reduced by the discharge holes 24.

また、ノズル体20は、その鍔部20aがアダプタ10の装着穴10b内に挿入されて流通孔23と流通孔10cとが相互に連通し、且つその先端部(凸球面部)がキャップ12の先端面から突出した状態で、キャップ12によりスリーブ11を介しアダプタ10に取り付けられる。   The nozzle body 20 has a flange 20a inserted into the mounting hole 10b of the adapter 10, the flow hole 23 and the flow hole 10c communicate with each other, and the tip (convex spherical surface) of the cap 12 In a state of protruding from the front end surface, the cap 12 is attached to the adapter 10 via the sleeve 11.

以上のように構成された本例のノズル装置1によれば、現像液供給装置(図示せず)から配管(図示せず)を介してアダプタ10の流通孔10c内に現像液が供給され、供給された現像液は、流通孔10c及びノズル体20の流通孔23内を当該各流通孔10c,23に沿って流通した後、基板に向けて吐出孔24からその長手方向と平行な平面内で扇状に且つ薄膜状に吐出される。   According to the nozzle device 1 of the present example configured as described above, the developer is supplied into the flow hole 10c of the adapter 10 from a developer supply device (not shown) via a pipe (not shown). The supplied developer flows through the flow holes 10c and the flow holes 23 of the nozzle body 20 along the flow holes 10c and 23, and then is directed toward the substrate from the discharge holes 24 in a plane parallel to the longitudinal direction thereof. Is discharged in a fan shape and in a thin film shape.

ところで、流体力学の分野では、図6に示すように、内径dが大きい第1流通管30側からこれよりも内径dが小さい第2流通管31側へと流体が流通するとき、第2流通管31の第1流通管30との付け根部近傍において、流体の仮想外径dが第2流通管31の内径dよりも一旦小さくなった(収縮した)後、当該第2流通管31の内径dと等しくなる現象を生じることが知られている。即ち、流体の流通方向に垂直な断面積が、第1流通管30の横断面積に等しい状態から第2流通管31の横断面積に等しい状態へと変化するときに、一度、第2流通管31の横断面積よりも小さくなるのである。そして、このとき、流体は、その流速が上昇し、また、第2流通管31の内面と接触していない状態となる。 Meanwhile, in the field of fluid dynamics, as shown in FIG. 6, when the fluid from the inner diameter d 1 is larger first flow pipe 30 side to the inner diameter d 2 is smaller second circulation pipe 31 side than this flows, the In the vicinity of the root of the second flow pipe 31 with the first flow pipe 30, the virtual outer diameter d 3 of the fluid once becomes smaller (shrinks) than the inner diameter d 2 of the second flow pipe 31, and then the second flow. it is known to produce phenomenon becomes equal to the inner diameter d 2 of the tube 31. That is, when the cross-sectional area perpendicular to the flow direction of the fluid changes from the state equal to the cross-sectional area of the first flow pipe 30 to the state equal to the cross-sectional area of the second flow pipe 31, the second flow pipe 31 once. It is smaller than the cross-sectional area. At this time, the flow rate of the fluid increases, and the fluid is not in contact with the inner surface of the second flow pipe 31.

そこで、本例のノズル装置1では、上述のように、ノズル体20の先端部を凸球面に形成するとともに、吐出孔24を構成する段差部21d,22dの面幅Wを約0.3mmとしてこれを凸球面に沿って均一に形成した構成とした。これにより、現像液が収縮状態のまま吐出孔24から吐出され、例えば、現像液の流量が約0.3〜2l/min程度、圧力が約10〜100kPa程度のものであっても、均一な膜厚の連続した液膜として扇状に吐出され、基板をその全域に渡ってムラ無く効率的に処理することが可能となる。   Therefore, in the nozzle device 1 of the present example, as described above, the tip end portion of the nozzle body 20 is formed into a convex spherical surface, and the surface width W of the stepped portions 21d and 22d constituting the discharge hole 24 is set to about 0.3 mm. This was configured to be uniformly formed along the convex spherical surface. As a result, the developer is discharged from the discharge hole 24 in a contracted state. For example, even if the flow rate of the developer is about 0.3 to 2 l / min and the pressure is about 10 to 100 kPa, the developer is uniform. A liquid film having a continuous film thickness is ejected in a fan shape, and the substrate can be efficiently processed without unevenness over the entire area.

また、現像液が途切れることなく連続的に吐出されるので、吐出された現像液が空気と混ざり合い難く、空気中の二酸化炭素と反応するのを効果的に防止することができ、この意味においても処理効率を高めることができる。   Further, since the developer is continuously discharged without interruption, it is difficult for the discharged developer to mix with air, and it can be effectively prevented from reacting with carbon dioxide in the air. Can also increase the processing efficiency.

また、本例のノズル装置1では、第2凹部21c,22cを形成することで、第1部材21及び第2部材22の各先端部における肉厚を薄くするようにしているので、ノズル体20先端部付近の肉厚のみを薄くすることができ、また、段差部21d,22dの面幅Wを容易に均一にすることができる。   Further, in the nozzle device 1 of the present example, the second recesses 21c and 22c are formed so as to reduce the thickness at the respective distal end portions of the first member 21 and the second member 22, so that the nozzle body 20 Only the thickness near the tip can be reduced, and the surface width W of the stepped portions 21d and 22d can be easily made uniform.

更に、本例のノズル装置1では、ノズル体20を2部材から構成しているので、第1凹部21b,22b,第2凹部21c,22c及び段差部21d,22dの加工や、吐出流の乱れの原因となるカエリが生じない加工を容易に行うことができる。   Further, in the nozzle device 1 of this example, the nozzle body 20 is composed of two members, so that the processing of the first recesses 21b and 22b, the second recesses 21c and 22c, and the stepped portions 21d and 22d, and the disorder of the discharge flow are performed. It is possible to easily perform processing that does not cause burrs that cause the above-described problem.

以上、本発明の一実施形態について説明したが、本発明の採り得る具体的な態様は、何らこれに限定されるものではない。   As mentioned above, although one Embodiment of this invention was described, the specific aspect which this invention can take is not limited to this at all.

上例では、段差部21d,22dの面幅Wを約0.3mmとしたが、これに限られるものではなく、0.2mm以上0.5mm以下の範囲内であれば良い。ここで、この面幅Wを、0.2mm以上0.5mm以下としているのは、0.2mmより小さいと、ノズル体20先端部の厚みが薄くなり過ぎて強度が不足し、吐出孔24の開口形状が変形する虞があるからであり、一方、0.5mmより大きいと、現像液が吐出孔24内で収縮状態から拡径状態に移行し、現像液が吐出孔24の内面(段差部21d,22d)と接触して吐出流が乱れ、その流れが不連続となる虞があるからである。但し、上述したように、面幅W及び開口幅Hは、W/H≦2.5の関係を満たしていることが好ましい。   In the above example, the surface width W of the stepped portions 21d and 22d is set to about 0.3 mm. However, the present invention is not limited to this and may be in the range of 0.2 mm to 0.5 mm. Here, the surface width W is set to 0.2 mm or more and 0.5 mm or less. If the surface width W is smaller than 0.2 mm, the thickness of the tip of the nozzle body 20 becomes too thin and the strength becomes insufficient. This is because the shape of the opening may be deformed. On the other hand, if the opening is larger than 0.5 mm, the developer shifts from the contracted state to the expanded diameter state in the discharge hole 24, and the developer moves to the inner surface (stepped portion) of the discharge hole 24. 21d, 22d) and the discharge flow is disturbed, and the flow may be discontinuous. However, as described above, the surface width W and the opening width H preferably satisfy the relationship of W / H ≦ 2.5.

本発明の一実施形態に係るノズル装置の概略構成を一部断面で示した正面図である。It is the front view which showed the schematic structure of the nozzle apparatus which concerns on one Embodiment of this invention in a partial cross section. 図1における矢示A方向の側面図である。It is a side view of the arrow A direction in FIG. 本実施形態に係るノズル体の概略構成を示した正断面図である。It is the front sectional view showing the schematic structure of the nozzle body concerning this embodiment. 図3における矢示B−B方向の断面図である。It is sectional drawing of the arrow BB direction in FIG. 図3における矢示C方向の側面図である。It is a side view of the arrow C direction in FIG. 管内を流通する現像液の収縮を説明するための説明図である。It is explanatory drawing for demonstrating contraction of the developing solution which distribute | circulates the inside of a pipe | tube. 従来例に係るノズル体の概略構成を示した正断面図である。It is a front sectional view showing a schematic configuration of a nozzle body according to a conventional example. 図7における矢示D−D方向の断面図である。It is sectional drawing of the arrow DD direction in FIG. 現像液の吐出状態を説明するための説明図である。It is explanatory drawing for demonstrating the discharge state of a developing solution. 図9における矢示E方向の側面図である。It is a side view of the arrow E direction in FIG.

符号の説明Explanation of symbols

1 ノズル装置
10 アダプタ
11 スリーブ
12 キャップ
20 ノズル体
21 第1部材
22 第2部材
23 流通孔
24 吐出孔
21a,22a 分割面
21b,22b 第1凹部
21c,22c 第2凹部
21d,22d 段差部(内面)
DESCRIPTION OF SYMBOLS 1 Nozzle apparatus 10 Adapter 11 Sleeve 12 Cap 20 Nozzle body 21 1st member 22 2nd member 23 Flow hole 24 Discharge hole 21a, 22a Split surface 21b, 22b 1st recessed part 21c, 22c 2nd recessed part 21d, 22d Step part (inner surface) )

Claims (4)

外部から供給された処理流体が流通する流通孔と、該流通孔に連通したスリット状の吐出孔とを有し、該吐出孔が先端部に開口されるとともに、前記流通孔及び吐出孔によって形成される流路の横断面積が前記吐出孔によって縮小されてなり、前記流通孔内に流入した前記処理流体を前記吐出孔から処理対象物に向けて吐出するノズル体を備えたノズル装置であって、
前記先端部は、外側に突出した球状の凸曲面に形成され、
前記吐出孔は、相対峙する長手方向に沿った2つの内面の面幅が該長手方向に沿って均一に形成されてなることを特徴とするノズル装置。
It has a flow hole through which a processing fluid supplied from the outside flows, and a slit-like discharge hole communicating with the flow hole, and the discharge hole is formed at the distal end and formed by the flow hole and the discharge hole. And a nozzle device comprising a nozzle body that discharges the processing fluid that has flowed into the flow hole from the discharge hole toward the object to be processed. ,
The tip is formed in a spherical convex curved surface protruding outward,
2. The nozzle device according to claim 1, wherein the discharge holes are formed such that the surface widths of two inner surfaces along the longitudinal direction facing each other are uniformly formed along the longitudinal direction.
前記吐出孔内面の面幅を0.2mm以上0.5mm以下としたことを特徴とする請求項1記載のノズル装置。   The nozzle device according to claim 1, wherein a surface width of the inner surface of the discharge hole is 0.2 mm or more and 0.5 mm or less. 前記流通孔は、前記吐出孔との境界部に該吐出孔に沿った円弧状の凹みを備え、該凹みによって前記吐出孔内面の面幅が均一に形成されてなることを特徴とする請求項1又は2記載のノズル装置。   The flow hole includes an arc-shaped recess along the discharge hole at a boundary portion with the discharge hole, and a surface width of the inner surface of the discharge hole is uniformly formed by the recess. The nozzle device according to 1 or 2. 前記ノズル体が、前記吐出孔部で、その内面と平行な平面に沿って分割された2つの部材から構成されるとともに、
分割された2つの部材が保持手段により前記ノズル体として一体的に保持されてなることを特徴とする請求項1乃至3記載のいずれかのノズル装置。
The nozzle body is composed of two members divided along the plane parallel to the inner surface of the discharge hole portion,
4. The nozzle device according to claim 1, wherein the two divided members are integrally held as the nozzle body by a holding means.
JP2004106707A 2004-03-31 2004-03-31 Nozzle device Pending JP2005294488A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008272723A (en) * 2007-04-26 2008-11-13 Miike Iron Works Co Ltd Atomized material-containing water production method and device, and method for using produced atomized material-containing water
JP2015219088A (en) * 2014-05-16 2015-12-07 フェムトディプロイメンツ株式会社 Liquid membrane nozzle device, injection needle, syringe, syringe type liquid membrane generation device, liquid sterilization device, liquid screen formation device, and method for manufacturing liquid membrane nozzle device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008272723A (en) * 2007-04-26 2008-11-13 Miike Iron Works Co Ltd Atomized material-containing water production method and device, and method for using produced atomized material-containing water
JP2015219088A (en) * 2014-05-16 2015-12-07 フェムトディプロイメンツ株式会社 Liquid membrane nozzle device, injection needle, syringe, syringe type liquid membrane generation device, liquid sterilization device, liquid screen formation device, and method for manufacturing liquid membrane nozzle device

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