JP2005294310A5 - - Google Patents

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Publication number
JP2005294310A5
JP2005294310A5 JP2004103051A JP2004103051A JP2005294310A5 JP 2005294310 A5 JP2005294310 A5 JP 2005294310A5 JP 2004103051 A JP2004103051 A JP 2004103051A JP 2004103051 A JP2004103051 A JP 2004103051A JP 2005294310 A5 JP2005294310 A5 JP 2005294310A5
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JP
Japan
Prior art keywords
energy beam
chamber
irradiated
beam irradiation
irradiation apparatus
Prior art date
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Application number
JP2004103051A
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English (en)
Japanese (ja)
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JP2005294310A (ja
JP4406311B2 (ja
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Priority to JP2004103051A priority Critical patent/JP4406311B2/ja
Priority claimed from JP2004103051A external-priority patent/JP4406311B2/ja
Publication of JP2005294310A publication Critical patent/JP2005294310A/ja
Publication of JP2005294310A5 publication Critical patent/JP2005294310A5/ja
Application granted granted Critical
Publication of JP4406311B2 publication Critical patent/JP4406311B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2004103051A 2004-03-31 2004-03-31 エネルギー線照射装置およびそれを用いたパタン作成方法 Expired - Lifetime JP4406311B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004103051A JP4406311B2 (ja) 2004-03-31 2004-03-31 エネルギー線照射装置およびそれを用いたパタン作成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004103051A JP4406311B2 (ja) 2004-03-31 2004-03-31 エネルギー線照射装置およびそれを用いたパタン作成方法

Publications (3)

Publication Number Publication Date
JP2005294310A JP2005294310A (ja) 2005-10-20
JP2005294310A5 true JP2005294310A5 (enrdf_load_stackoverflow) 2007-04-19
JP4406311B2 JP4406311B2 (ja) 2010-01-27

Family

ID=35326950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004103051A Expired - Lifetime JP4406311B2 (ja) 2004-03-31 2004-03-31 エネルギー線照射装置およびそれを用いたパタン作成方法

Country Status (1)

Country Link
JP (1) JP4406311B2 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5082050B2 (ja) * 2006-09-28 2012-11-28 株式会社日立製作所 電子線照射装置
TWI517196B (zh) * 2010-11-13 2016-01-11 瑪波微影Ｉｐ公司 具有中間腔室的帶電粒子微影系統
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator
US9653261B2 (en) * 2012-05-14 2017-05-16 Mapper Lithography Ip B.V. Charged particle lithography system and beam generator
US11348756B2 (en) 2012-05-14 2022-05-31 Asml Netherlands B.V. Aberration correction in charged particle system

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