JP2005294310A5 - - Google Patents
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- Publication number
- JP2005294310A5 JP2005294310A5 JP2004103051A JP2004103051A JP2005294310A5 JP 2005294310 A5 JP2005294310 A5 JP 2005294310A5 JP 2004103051 A JP2004103051 A JP 2004103051A JP 2004103051 A JP2004103051 A JP 2004103051A JP 2005294310 A5 JP2005294310 A5 JP 2005294310A5
- Authority
- JP
- Japan
- Prior art keywords
- energy beam
- chamber
- irradiated
- beam irradiation
- irradiation apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011261 inert gas Substances 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004103051A JP4406311B2 (ja) | 2004-03-31 | 2004-03-31 | エネルギー線照射装置およびそれを用いたパタン作成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004103051A JP4406311B2 (ja) | 2004-03-31 | 2004-03-31 | エネルギー線照射装置およびそれを用いたパタン作成方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005294310A JP2005294310A (ja) | 2005-10-20 |
JP2005294310A5 true JP2005294310A5 (enrdf_load_stackoverflow) | 2007-04-19 |
JP4406311B2 JP4406311B2 (ja) | 2010-01-27 |
Family
ID=35326950
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004103051A Expired - Lifetime JP4406311B2 (ja) | 2004-03-31 | 2004-03-31 | エネルギー線照射装置およびそれを用いたパタン作成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4406311B2 (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5082050B2 (ja) * | 2006-09-28 | 2012-11-28 | 株式会社日立製作所 | 電子線照射装置 |
TWI517196B (zh) * | 2010-11-13 | 2016-01-11 | 瑪波微影Ip公司 | 具有中間腔室的帶電粒子微影系統 |
US10586625B2 (en) | 2012-05-14 | 2020-03-10 | Asml Netherlands B.V. | Vacuum chamber arrangement for charged particle beam generator |
US9653261B2 (en) * | 2012-05-14 | 2017-05-16 | Mapper Lithography Ip B.V. | Charged particle lithography system and beam generator |
US11348756B2 (en) | 2012-05-14 | 2022-05-31 | Asml Netherlands B.V. | Aberration correction in charged particle system |
-
2004
- 2004-03-31 JP JP2004103051A patent/JP4406311B2/ja not_active Expired - Lifetime
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