JP2005286162A5 - - Google Patents

Download PDF

Info

Publication number
JP2005286162A5
JP2005286162A5 JP2004099129A JP2004099129A JP2005286162A5 JP 2005286162 A5 JP2005286162 A5 JP 2005286162A5 JP 2004099129 A JP2004099129 A JP 2004099129A JP 2004099129 A JP2004099129 A JP 2004099129A JP 2005286162 A5 JP2005286162 A5 JP 2005286162A5
Authority
JP
Japan
Prior art keywords
processing
substrate
space
liquid
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004099129A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005286162A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004099129A priority Critical patent/JP2005286162A/ja
Priority claimed from JP2004099129A external-priority patent/JP2005286162A/ja
Priority to US10/909,977 priority patent/US20050028929A1/en
Publication of JP2005286162A publication Critical patent/JP2005286162A/ja
Publication of JP2005286162A5 publication Critical patent/JP2005286162A5/ja
Pending legal-status Critical Current

Links

JP2004099129A 2003-08-07 2004-03-30 基板処理装置およびその処理方法 Pending JP2005286162A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004099129A JP2005286162A (ja) 2004-03-30 2004-03-30 基板処理装置およびその処理方法
US10/909,977 US20050028929A1 (en) 2003-08-07 2004-08-03 Substrate processing apparatus and method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004099129A JP2005286162A (ja) 2004-03-30 2004-03-30 基板処理装置およびその処理方法

Publications (2)

Publication Number Publication Date
JP2005286162A JP2005286162A (ja) 2005-10-13
JP2005286162A5 true JP2005286162A5 (enExample) 2007-05-17

Family

ID=35184185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004099129A Pending JP2005286162A (ja) 2003-08-07 2004-03-30 基板処理装置およびその処理方法

Country Status (1)

Country Link
JP (1) JP2005286162A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009054174A1 (ja) * 2007-10-22 2009-04-30 Sharp Kabushiki Kaisha 液晶パネル用基板の製造方法及び液晶パネル用基板の製造装置
JP5861696B2 (ja) * 2013-03-28 2016-02-16 ウシオ電機株式会社 光照射装置
JP6550235B2 (ja) * 2015-02-03 2019-07-24 株式会社ブルー・スターR&D 薄板状被洗浄物の洗浄装置
KR102433558B1 (ko) * 2019-07-11 2022-08-19 세메스 주식회사 기판 처리 장치 및 기판 처리 방법

Similar Documents

Publication Publication Date Title
CN102791391B (zh) 处理基片的方法和装置
TW200739714A (en) Substrate processing device, substrate processing method and storage medium
JP2002280378A5 (enExample)
CN103066004B (zh) 一种表面处理方法
WO2009019156A3 (de) Verfahren und vorrichtung zur plasmagestützten oberflächenbehandlung
WO2013052509A3 (en) Remote plasma burn-in
WO2003066249A3 (en) Evaporative desorption soil treatment apparatus and process
MX2010000720A (es) Aparato y metodo para eliminacion de iones de un electrodo poroso que es parte de un sistema de desionizacion.
JP2005286162A5 (enExample)
CN105493235A (zh) 光照射装置
JP5317852B2 (ja) 紫外線照射装置
GB0608352D0 (en) Liquid treatment apparatus
JP2019529104A5 (enExample)
JP4014729B2 (ja) Uv洗浄装置
WO2003076715A3 (en) Method for treating powdery particles
DE602006001655D1 (de) Vorrichtung zum stückweise oder chargenweise Behandeln von Gegenständen, mit einem bei hohem Druck überkritischen oder beinah überkritischen Behandlungsmittel
CN105874892B (zh) 除胶渣处理装置
JP4479466B2 (ja) エキシマ光照射装置
US9895645B2 (en) Apparatus for treating substrate
TWI745860B (zh) 基板處理方法以及基板處理裝置
ES2185389T3 (es) Metodo y aparato para el tratamiento de liquidos por medio de vibraciones ultrasonicas.
JP2000011960A (ja) 誘電体バリア放電ランプを用いた表面処理装置及び方法
WO2017092081A1 (zh) 一种鞋底粘接前处理机
JP4382190B2 (ja) 基板の処理装置及び処理方法
JP2015103545A (ja) 光源装置およびデスミア処理装置