JP2005272835A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2005272835A5 JP2005272835A5 JP2005051463A JP2005051463A JP2005272835A5 JP 2005272835 A5 JP2005272835 A5 JP 2005272835A5 JP 2005051463 A JP2005051463 A JP 2005051463A JP 2005051463 A JP2005051463 A JP 2005051463A JP 2005272835 A5 JP2005272835 A5 JP 2005272835A5
- Authority
- JP
- Japan
- Prior art keywords
- component
- weight
- parts
- silicon
- liquid composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 19
- 239000000203 mixture Substances 0.000 claims 19
- 229910052710 silicon Inorganic materials 0.000 claims 19
- 239000010703 silicon Substances 0.000 claims 19
- 239000007788 liquid Substances 0.000 claims 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 10
- 238000000576 coating method Methods 0.000 claims 8
- 239000011248 coating agent Substances 0.000 claims 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 7
- 229910004298 SiO 2 Inorganic materials 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 6
- 239000011347 resin Substances 0.000 claims 5
- 229920005989 resin Polymers 0.000 claims 5
- 239000003054 catalyst Substances 0.000 claims 4
- 238000009833 condensation Methods 0.000 claims 4
- 230000005494 condensation Effects 0.000 claims 4
- 230000007062 hydrolysis Effects 0.000 claims 4
- 238000006460 hydrolysis reaction Methods 0.000 claims 4
- 239000003960 organic solvent Substances 0.000 claims 4
- 239000007787 solid Substances 0.000 claims 4
- 229910052681 coesite Inorganic materials 0.000 claims 3
- 229910052906 cristobalite Inorganic materials 0.000 claims 3
- 239000000377 silicon dioxide Substances 0.000 claims 3
- 235000012239 silicon dioxide Nutrition 0.000 claims 3
- 229910052682 stishovite Inorganic materials 0.000 claims 3
- 238000010998 test method Methods 0.000 claims 3
- 229910052905 tridymite Inorganic materials 0.000 claims 3
- 239000004925 Acrylic resin Substances 0.000 claims 2
- 229920000178 Acrylic resin Polymers 0.000 claims 2
- 239000003638 chemical reducing agent Substances 0.000 claims 2
- 239000000839 emulsion Substances 0.000 claims 2
- 238000002156 mixing Methods 0.000 claims 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 230000001568 sexual effect Effects 0.000 claims 1
- 229920005792 styrene-acrylic resin Polymers 0.000 claims 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims 1
- 238000002834 transmittance Methods 0.000 claims 1
Claims (20)
％以下であり、成分（Ｃ）の濃度が５０重量％以上であることを特徴とする請求項１に記載のケイ素含有液状組成物。
成分（Ａ） オルガノシリケートないしはそのオリゴマー
ＳｉＯ2換算で１００重量部
成分（Ｂ） 加水分解縮合触媒 ０．１〜１０重量部
成分（Ｃ） 水 １００〜５００００重量部
成分（Ｄ） 有機溶剤 １００〜５００００重量部
成分（Ｅ） 水性樹脂成分 固形分として１０〜１０００重量部 The following components (A) to (E) are blended, the concentration of the component (A) is 6% by weight or less in terms of SiO2, and the concentration of the component (C) is 50% by weight or more. The silicon-containing liquid composition according to claim 1 .
Component (A) Organosilicate or oligomer thereof
100 parts by weight in terms of SiO 2 Component (B) Hydrolysis condensation catalyst 0.1 to 10 parts by weight Component (C) Water 100 to 50000 parts by weight Component (D) Organic solvent 100 to 50000 parts by weight Component (E) Aqueous resin component 10 to 1000 parts by weight as solid content
％以下であり、成分（Ｃ）の濃度が５０重量％以上であることを特徴とする請求項１に記載のケイ素含有液状組成物。
成分（Ａ） オルガノシリケートないしはそのオリゴマー
ＳｉＯ2換算で１００重量部
成分（Ｂ） 加水分解縮合触媒 ０．５〜５重量部
成分（Ｃ） 水 ５００〜２５０００重量部
成分（Ｄ） 有機溶剤 ２００〜１００００重量部
成分（Ｅ） 水性樹脂成分 固形分として１０〜１０００重量部 The following components (A) to (E) are blended, the concentration of the component (A) is 6% by weight or less in terms of SiO2, and the concentration of the component (C) is 50% by weight or more. The silicon-containing liquid composition according to claim 1 .
Component (A) Organosilicate or oligomer thereof
100 parts by weight in terms of SiO 2 Component (B) Hydrolysis condensation catalyst 0.5-5 parts by weight Component (C) Water 500-25000 parts by weight Component (D) Organic solvent 200-10000 parts by weight Component (E) Aqueous resin component 10 to 1000 parts by weight as solid content
ＳｉＯｘ（ＯＲ）ｙ
（但し、０≦ｘ≦１．２、１．６≦ｙ≦４、２ｘ＋ｙ＝４） The silicon-containing liquid composition according to any one of claims 1 to 7 , wherein the component (A) is represented by the following formula.
SiOx (OR) y
(However, 0 ≦ x ≦ 1.2, 1.6 ≦ y ≦ 4, 2x + y = 4)
％以下であり、成分（Ｃ）の濃度が５０重量％以上であることを特徴とするケイ素含有液状組成物。
成分（Ａ） オルガノシリケートないしはそのオリゴマー
ＳｉＯ2換算で１００重量部
成分（Ｂ） 加水分解縮合触媒 ０．１〜１０重量部
成分（Ｃ） 水 １００〜５００００重量部
成分（Ｄ） 有機溶剤 １００〜５００００重量部
成分（Ｅ） 水性樹脂成分 固形分として１０〜１０００重量部 It is formed by blending the following components (A) to (E), the concentration of the component (A) is 6% by weight or less in terms of SiO 2 , and the concentration of the component (C) is 50% by weight or more. A silicon-containing liquid composition.
Component (A) Organosilicate or oligomer thereof
100 parts by weight in terms of SiO 2 Component (B) Hydrolysis condensation catalyst 0.1 to 10 parts by weight Component (C) Water 100 to 50000 parts by weight Component (D) Organic solvent 100 to 50000 parts by weight Component (E) Aqueous resin component 10 to 1000 parts by weight as solid content
％以下であり、成分（Ｃ）の濃度が５０重量％以上であることを特徴とするケイ素含有液状組成物。
成分（Ａ） オルガノシリケートないしはそのオリゴマー
ＳｉＯ2換算で１００重量部
成分（Ｂ） 加水分解縮合触媒 ０．５〜５重量部
成分（Ｃ） 水 ５００〜２５０００重量部
成分（Ｄ） 有機溶剤 ２００〜１００００重量部
成分（Ｅ） 水性樹脂成分 固形分として１０〜１０００重量部 It is formed by blending the following components (A) to (E), the concentration of the component (A) is 6% by weight or less in terms of SiO 2 , and the concentration of the component (C) is 50% by weight or more. A silicon-containing liquid composition.
Component (A) Organosilicate or oligomer thereof
100 parts by weight in terms of SiO 2 Component (B) Hydrolysis condensation catalyst 0.5-5 parts by weight Component (C) Water 500-25000 parts by weight Component (D) Organic solvent 200-10000 parts by weight Component (E) Aqueous resin component 10 to 1000 parts by weight as solid content
ＳｉＯｘ（ＯＲ）ｙ
（但し、０≦ｘ≦１．２、１．６≦ｙ≦４、２ｘ＋ｙ＝４） The silicon-containing liquid composition according to any one of claims 10 to 12, wherein the component (A) is represented by the following sexual formula.
SiOx (OR) y
(However, 0 ≦ x ≦ 1.2, 1.6 ≦ y ≦ 4, 2x + y = 4)
（暴露試験法）ＪＩＳ Ｚ２３８１直接暴露試験法に従い、３ヶ月間、屋外暴露試験を実施する。但し、暴露角度は、水平面から６０度とする。 The coating film according to any one of claims 16 to 18, wherein a change in whiteness (ΔL) of the coating film subjected to the exposure test by the following exposure test method is 5 or less.
(Exposure test method) An outdoor exposure test is conducted for 3 months according to the JIS Z2381 direct exposure test method. However, the exposure angle is 60 degrees from the horizontal plane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005051463A JP2005272835A (en) | 2004-02-27 | 2005-02-25 | Silicon-containing liquid composition |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004054383 | 2004-02-27 | ||
| JP2005051463A JP2005272835A (en) | 2004-02-27 | 2005-02-25 | Silicon-containing liquid composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005272835A JP2005272835A (en) | 2005-10-06 |
| JP2005272835A5 true JP2005272835A5 (en) | 2007-10-25 |
Family
ID=35172828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005051463A Withdrawn JP2005272835A (en) | 2004-02-27 | 2005-02-25 | Silicon-containing liquid composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005272835A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007169353A (en) * | 2005-12-20 | 2007-07-05 | Nippon Light Metal Co Ltd | Corrosion-resistant water-based coating composition and corrosion-resistant coated aluminum material |
| JP5201930B2 (en) * | 2007-02-16 | 2013-06-05 | 富士フイルム株式会社 | Hydrophilic member and method for producing the same |
| JP5170396B2 (en) * | 2007-11-28 | 2013-03-27 | 信越化学工業株式会社 | Gas barrier film coating agent and gas barrier film |
| JPWO2011142463A1 (en) * | 2010-05-14 | 2013-07-22 | 旭硝子株式会社 | UV absorbing film forming coating solution and UV absorbing glass article |
| JP5785121B2 (en) * | 2011-04-28 | 2015-09-24 | 信越化学工業株式会社 | Pattern formation method |
| JP5955805B2 (en) * | 2013-04-19 | 2016-07-20 | KeePer技研株式会社 | Surface modification method, surface modifier and surface modification structure of glass-based coating |
| JP6846129B2 (en) * | 2016-07-14 | 2021-03-24 | 日本ペイント株式会社 | Method of forming a heat-shielding multi-layer coating film |
-
2005
- 2005-02-25 JP JP2005051463A patent/JP2005272835A/en not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2005272835A5 (en) | ||
| Wong et al. | Preparation of transparent superhydrophobic glass slides: Demonstration of surface chemistry characteristics | |
| TWI437029B (en) | Siloxane-based resin composition | |
| WO2015064509A1 (en) | Positive photosensitive resin composition, method for producing film using same, and electronic component | |
| JP5617476B2 (en) | Siloxane polymer composition, cured film and method of forming cured film | |
| CN108139506B (en) | It is suitable for the glass substrate of cover glass of mobile display device etc. | |
| JP5818022B2 (en) | Photosensitive resin composition and display device | |
| CN105319852B (en) | Photosensitive resin composition, protective film and element with protective film | |
| KR102244973B1 (en) | Low refractive index film-forming composition | |
| Adamopoulos et al. | TEOS-based superhydrophobic coating for the protection of stone-built cultural heritage | |
| JP2015528522A5 (en) | ||
| TWI738634B (en) | Positive photosensitive resin composition, hardened film and display element | |
| TWI655518B (en) | Polymer-containing coating liquid applied to photoresist pattern | |
| WO2007053407A3 (en) | Thick crack-free silica film by colloidal silica incorporation | |
| JP2007332262A5 (en) | ||
| JPWO2006049008A1 (en) | Inorganic coating composition, hydrophilic coating film and method for forming hydrophilic coating film | |
| JP2023015097A (en) | Coating composition, and film produced therefrom | |
| Pham et al. | Positive-tone photoresist process for supercritical carbon dioxide development | |
| CN114867793A (en) | Antifogging coating composition, antifogging coating film and antifogging article | |
| JP3723891B2 (en) | Surface hard transparent sheet and manufacturing method thereof | |
| KR20140049722A (en) | Positive-type photosensitive resin composition and hardened overcoat layer prepared therefrom | |
| JP2006208991A5 (en) | ||
| JP2015069141A (en) | Radiation-sensitive resin composition, photosensitive dry film, lamination method of radiation-sensitive resin layer, protective film, and touch panel | |
| JP2009160681A5 (en) | ||
| JP2009075283A (en) | Radiation-sensitive resin composition, spacer for liquid crystal display device and method for producing the same |