JP2005255945A - Method and apparatus for producing gas hydrate - Google Patents

Method and apparatus for producing gas hydrate Download PDF

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JP2005255945A
JP2005255945A JP2004072900A JP2004072900A JP2005255945A JP 2005255945 A JP2005255945 A JP 2005255945A JP 2004072900 A JP2004072900 A JP 2004072900A JP 2004072900 A JP2004072900 A JP 2004072900A JP 2005255945 A JP2005255945 A JP 2005255945A
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gas
gas hydrate
raw material
hydrate powder
reaction vessel
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JP4638679B2 (en
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Yuichi Kato
裕一 加藤
Takashi Arai
敬 新井
Kazuyoshi Matsuo
和芳 松尾
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Mitsui Engineering and Shipbuilding Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for raising the concentration of a gas hydrate from 50% up to at least 90% in a short time without using an excessively large scale apparatus. <P>SOLUTION: The method for producing an almost dried gas hydrate powder by reacting water contained in a wet gas hydrate powder with a raw material gas comprises fluidizing a gas hydrate powder A up and down by blowing off a raw material gas (g) from the lower part of a reactor 1 against the wet gas hydrate powder A introduced in the reactor 1 and raising contacting efficiency between water contained in the gas hydrate powder A and the raw material gas (g). <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、ガスハイドレートの濃度を短時間で５０％台から９０％台に高めるガスハイドレート製造方法及び装置に関するものである。   The present invention relates to a gas hydrate manufacturing method and apparatus for increasing the gas hydrate concentration from the 50% level to the 90% level in a short time.

従来、濃度が９０％以上、即ち、水分が１０％以下となる高濃度（高純度）のガスハイドレートを製造する場合において、ガスハイドレートの濃度を５０％程度から９０％以上に増加させる方法として、次の２つの方法がある。   Conventionally, when producing a high concentration (high purity) gas hydrate having a concentration of 90% or more, that is, moisture of 10% or less, a method for increasing the concentration of the gas hydrate from about 50% to 90% or more. There are the following two methods.

すなわち、
（１）濃度５０％のガスハイドレートを濃度７０％まで遠心分離、或いは、圧縮濾過等の機械脱水を行い、続いて、濃度７０％から濃度９０％まで原料ガスと残留水分とを気液接触させてガスハイドレートを生成増加させる方法（例えば、図４又は特許文献１参照。）。 That is,
(1) Centrifugation of gas hydrate of 50% concentration to 70% concentration or mechanical dehydration such as compression filtration, and then gas-liquid contact between source gas and residual moisture from 70% concentration to 90% concentration To increase the generation of gas hydrate (see, for example, FIG. 4 or Patent Document 1).

（２）濃度５０％から濃度９０％まで、圧力容器内で機械攪拌によって原料ガスと残留水分とを気液接触させてガスハイドレートを生成増加させる方法（図５参照。）。
特開２００３−１０５３６２号公報（第７−１０頁、図２) (2) A method in which gas hydrate is generated and increased by bringing the source gas and residual moisture into gas-liquid contact by mechanical stirring in a pressure vessel from a concentration of 50% to a concentration of 90% (see FIG. 5).
JP 2003-105362 A (page 7-10, FIG. 2)

しかしながら、前者の方法は、細粒ガスハイドレートが脱水機の篩下に漏洩するため、歩留りが低下する。また、脱水機を高圧（例えば、３０〜５０ｋｇ／ｃｍ2 ）に対応させるため、過大な設備となる。 However, in the former method, since the fine gas hydrate leaks under the sieve of the dehydrator, the yield decreases. Moreover, since it makes a dehydrator respond | correspond to high pressure (for example, 30-50 kg / cm < 2 >), it will be an excessive installation.

他方、後者の方法は、ガスハイドレート濃度が５０％以上になると、ほぼ粉体状であるので、機械攪拌の効率が低くなり、ガスハイドレートの濃度を増加させるために長時間を必要とする。また、ガスハイドレートの生成熱を除去するには、除去するには、外壁ジャケットからの冷却以外に有効な手段がない。所定の除熱量を得ようとすれば、装置が過大なサイズとなる。   On the other hand, in the latter method, when the gas hydrate concentration is 50% or more, it is almost in the form of powder, so the efficiency of mechanical stirring is lowered, and a long time is required to increase the gas hydrate concentration. . Further, in order to remove the heat generated by the gas hydrate, there is no effective means other than cooling from the outer wall jacket. If a predetermined amount of heat removal is to be obtained, the apparatus becomes excessively large.

本発明は、上記のような問題を解消するためになされたものであり、その目的とするところは、過大な装置を要することなく、短時間でガスハイドレートの濃度を５０％から９０％以上に高めることができるガスハイドレートの製造方法及び装置を提供することにある。   The present invention has been made to solve the above-described problems, and its object is to reduce the gas hydrate concentration from 50% to 90% or more in a short time without requiring an excessive apparatus. It is an object of the present invention to provide a gas hydrate manufacturing method and apparatus that can be improved.

本発明は、係る目的を達成するため、本発明は、次のように形成されている。   In order to achieve the object, the present invention is formed as follows.

請求項１に記載の発明は、湿潤状態のガスハイドレート粉体に含まれている水分と原料ガスとを反応させてほぼ乾燥したガスハイドレート粉体を製造する際に、反応容器内に導入した湿潤状態のガスハイドレート粉体に対し、反応容器の下部から原料ガスを噴出して前記ガスハイドレート粉体を上下に流動化させ、前記ガスハイドレート粉体に含まれている水分と原料ガスとの接触効率を高めることを特徴とするガスハイドレート製造方法である。   The invention described in claim 1 is introduced into a reaction vessel when a substantially dry gas hydrate powder is produced by reacting moisture contained in a wet gas hydrate powder with a raw material gas. Moisture and raw material contained in the gas hydrate powder are obtained by jetting a raw material gas from the lower part of the reaction vessel to fluidize the gas hydrate powder up and down with respect to the wet gas hydrate powder. A method for producing a gas hydrate characterized by increasing the contact efficiency with a gas.

請求項２に記載の発明は、湿潤状態のガスハイドレート粉体に含まれている水分と原料ガスとを反応させてほぼ乾燥したガスハイドレート粉体を製造するガスハイドレート製造装置において、反応容器内に無数のガス噴出孔を有する仕切板を設け、該仕切板の下方をガス充填室とすると共にその上方を流動層室とし、該流動層室内に導入した湿潤状態のガスハイドレート粉体に対し、前記仕切板に設けた無数のガス噴出孔から原料ガスを噴出して前記ガスハイドレート粉体を上下に流動化させ、前記ガスハイドレート粉体に含まれている水分と原料ガスとの接触効率を高めることを特徴とするガスハイドレート製造装置である。   According to a second aspect of the present invention, there is provided a gas hydrate production apparatus for producing a substantially dry gas hydrate powder by reacting moisture contained in a wet gas hydrate powder with a raw material gas. A wet gas hydrate powder introduced into the fluidized bed chamber provided with a partition plate having innumerable gas ejection holes in the container, the gas filling chamber below the partition plate and the fluidized bed chamber above the gas filled chamber On the other hand, the gas hydrate powder is fluidized up and down by injecting the raw material gas from the numerous gas injection holes provided in the partition plate, and the moisture and raw material gas contained in the gas hydrate powder, It is a gas hydrate manufacturing apparatus characterized by improving the contact efficiency.

請求項３に記載の発明は、反応容器内に上下両端の空いた腰板を設けると共に、該腰板によって前記反応容器内に塊成化区画と濃度増加区画とを形成し、かつ、前記塊成化区画に供給する流動化ガス供給量を調整してガスハイドレート粉体を造粒化させることを特徴とする請求項２記載のガスハイドレート製造装置である。   The invention according to claim 3 is provided with a waist plate which is open at both upper and lower ends in the reaction container, and the agglomeration section and the concentration increasing section are formed in the reaction container by the waist plate, and the agglomeration is performed. 3. The gas hydrate production apparatus according to claim 2, wherein the gas hydrate powder is granulated by adjusting a fluidized gas supply amount supplied to the compartment.

請求項４に記載の発明は、反応容器から飛散したガスハイドレート粒子を、捕集装置によって原料ガスから分離した後、前記反応容器に戻すことを特徴とする請求項３記載のガスハイドレート製造装置である。   The invention according to claim 4 is characterized in that the gas hydrate particles scattered from the reaction vessel are separated from the raw material gas by a collector and then returned to the reaction vessel. Device.

請求項５に記載の発明は、反応容器に冷却ジャケット又は冷却管を設けたことを特徴とする請求項３記載のガスハイドレート製造装置である。   The invention according to claim 5 is the gas hydrate production apparatus according to claim 3, wherein the reaction vessel is provided with a cooling jacket or a cooling pipe.

上記のように、請求項１に記載の発明に係るガスハイドレート製造方法は、湿潤状態のガスハイドレート粉体に含まれている水分と原料ガスとを反応させてほぼ乾燥したガスハイドレート粉体を製造する際に、反応容器内に導入した湿潤状態のガスハイドレート粉体に対し、反応容器の下部から原料ガスを噴出して前記ガスハイドレート粉体を上下に流動化させ、前記ガスハイドレート粉体に含まれている水分と原料ガスとの接触効率を高めるので、次のような効果を有する。すなわち、
（１）ガスハイドレートの攪拌を原料ガスで流動化して行なうため、湿潤状態のガスハイドレートに含まれている水分と原料ガスとの接触度が高まり、ガスハイドレートの生成反応時間を短縮できる。 As described above, the gas hydrate production method according to the first aspect of the present invention is a gas hydrate powder that is substantially dried by reacting the moisture contained in the wet gas hydrate powder with the raw material gas. When the body is manufactured, the gas hydrate powder is fluidized up and down by jetting a raw material gas from the lower part of the reaction vessel with respect to the wet gas hydrate powder introduced into the reaction vessel. Since the contact efficiency between the moisture contained in the hydrate powder and the raw material gas is increased, the following effects are obtained. That is,
(1) Since the gas hydrate is stirred by fluidizing with the raw material gas, the contact degree between the moisture contained in the wet gas hydrate and the raw material gas is increased, and the gas hydrate production reaction time can be shortened. .

（２）ガスハイドレート生成熱の除熱を原料ガスの顕熱で行なっているので、直接冷却となり、冷却効果を高くすることができる。そのため、ガスハイドレートの反応時間を短縮できる。   (2) Since the heat removal of the gas hydrate generation heat is performed by sensible heat of the raw material gas, direct cooling is performed, and the cooling effect can be enhanced. Therefore, the reaction time of gas hydrate can be shortened.

（３）原料ガスのバブリングによってガスハイドレート全体が攪拌状態となるため、ガスハイドレートの壁面への付着、堆積を防止できる。   (3) Since the entire gas hydrate is agitated by the bubbling of the raw material gas, it is possible to prevent the gas hydrate from adhering to and depositing on the wall surface.

他方、請求項２に記載の発明に係るガスハイドレート製造装置は、湿潤状態のガスハイドレート粉体に含まれている水分と原料ガスとを反応させてほぼ乾燥したガスハイドレート粉体を製造するガスハイドレート製造装置において、反応容器内に無数のガス噴出孔を有する仕切板を設け、該仕切板の下方をガス充填室とすると共にその上方を流動層室とし、該流動層室内に導入した湿潤状態のガスハイドレート粉体に対し、前記仕切板に設けた無数のガス噴出孔から原料ガスを噴出して前記ガスハイドレート粉体を上下に流動化させ、前記ガスハイドレート粉体に含まれている水分と原料ガスとの接触効率を高めるので、次のような効果を有する。すなわち、
（１）ガスハイドレートの攪拌を原料ガスで流動化して行なうため、湿潤状態のガスハイドレートに含まれている水分と原料ガスとの接触度が高まり、ガスハイドレートの生成反応時間を短縮できる。 On the other hand, the gas hydrate manufacturing apparatus according to the invention described in claim 2 manufactures a gas hydrate powder that is almost dry by reacting the moisture contained in the wet gas hydrate powder with the raw material gas. In the gas hydrate manufacturing apparatus, a partition plate having an infinite number of gas ejection holes is provided in a reaction vessel, a gas filling chamber is provided below the partition plate, and a fluidized bed chamber is provided above the chamber, which is introduced into the fluidized bed chamber. With respect to the wet gas hydrate powder, the gas hydrate powder is fluidized up and down by jetting a raw material gas from countless gas jet holes provided in the partition plate. Since the contact efficiency between the contained moisture and the source gas is increased, the following effects are obtained. That is,
(1) Since the gas hydrate is stirred by fluidizing with the raw material gas, the contact degree between the moisture contained in the wet gas hydrate and the raw material gas is increased, and the production reaction time of the gas hydrate can be shortened. .

（２）ガスハイドレート生成熱の除熱を原料ガスの顕熱で行なっているので、直接冷却となり、冷却効果を高くすることができる。そのため、ガスハイドレートの反応時間を短縮できる。   (2) Since the heat removal of the gas hydrate generation heat is performed by sensible heat of the raw material gas, direct cooling is performed, and the cooling effect can be enhanced. Therefore, the reaction time of gas hydrate can be shortened.

（３）原料ガスのバブリングによってガスハイドレート全体が攪拌状態となるため、ガスハイドレートの壁面への付着、堆積を防止できる。   (3) Since the entire gas hydrate is agitated by the bubbling of the raw material gas, it is possible to prevent the gas hydrate from adhering to and depositing on the wall surface.

また、請求項３に記載の発明は、反応容器内に上下両端の空いた腰板を設けると共に、該腰板によって前記反応容器内に塊成化区画と濃度増加区画とを形成し、かつ、前記塊成化区画に供給する流動化ガス供給量を調整してガスハイドレート粉体を造粒化させるので、流動層部において、ガスハイドレート濃度を増加させると同時に、流動攪拌効果によってガスハイドレート粒子の塊成化（造粒化）も可能となるので、後工程における付着、閉塞、分解を防止できる。   Further, the invention according to claim 3 is provided with a waist plate which is open at both upper and lower ends in the reaction vessel, and the agglomeration zone and the concentration increasing zone are formed in the reaction vessel by the waist plate, and the mass Since the gas hydrate powder is granulated by adjusting the fluidized gas supply amount supplied to the formation zone, the gas hydrate particles are increased by the fluid stirring effect at the same time as increasing the gas hydrate concentration in the fluidized bed part. Can be agglomerated (granulated), thereby preventing adhesion, blockage, and decomposition in the subsequent process.

以下、本発明の実施の形態を図面を用いて説明する。
（１）実施形態１
図１に示すように、このガスハイドレート製造装置は、圧力容器（反応容器ともいう。）１、サイクロン２、循環ガス冷却器３および循環ガスブロワ４を備えている。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
(1) Embodiment 1
As shown in FIG. 1, the gas hydrate production apparatus includes a pressure vessel (also referred to as a reaction vessel) 1, a cyclone 2, a circulating gas cooler 3, and a circulating gas blower 4.

圧力容器１は、筒形に形成され、その断面は、円形又は矩形断面となっている。この圧力容器１は、大断面部１ａと、小断面部１ｂと、これらを接続する漏斗状部１ｃにより形成され、小断面部１ｂの上端に多孔板や焼結板等から成る仕切板５を設けている。そして、仕切板５より下方をガス充填室６と称すると共に、仕切板５より上方を流動層室７と称している。   The pressure vessel 1 is formed in a cylindrical shape, and has a circular or rectangular cross section. This pressure vessel 1 is formed by a large cross-sectional portion 1a, a small cross-sectional portion 1b, and a funnel-like portion 1c connecting them, and a partition plate 5 made of a porous plate, a sintered plate or the like is provided at the upper end of the small cross-sectional portion 1b. Provided. A portion below the partition plate 5 is referred to as a gas filling chamber 6 and a portion above the partition plate 5 is referred to as a fluidized bed chamber 7.

更に、この圧力容器１は、その外側に循環ガスブロワ４を備え、圧力容器１内の原料ガスｇを循環するようにしている。そして、圧力容器１の大断面部１ａの上部部分に設けたダクト８から流出したガスハイドレート粒子ａをサイクロン（捕集装置ともいう。）２によって捕集して圧力容器１の大断面部１ａの下部部分に戻すようにしている。   Further, the pressure vessel 1 is provided with a circulation gas blower 4 on the outside thereof, and circulates the raw material gas g in the pressure vessel 1. And the gas hydrate particle | grains a which flowed out from the duct 8 provided in the upper part of the large cross-sectional part 1a of the pressure vessel 1 are collected by the cyclone (it is also called a collection apparatus) 2, and the large cross-sectional part 1a of the pressure vessel 1 is collected. It is trying to return to the lower part of.

そして、サイクロン２の頂部２ａと圧力容器１のガス充填室６とを接続する管路９には、循環ガス冷却器３と循環ガスブロワ４とを、この順に配し、圧力容器１の外に取り出した原料ガスｇを循環ガス冷却器３によって所定温度に冷却した後、圧力容器１のガス充填室６に供給するようにしている。   A circulation gas cooler 3 and a circulation gas blower 4 are arranged in this order in a pipe line 9 connecting the top 2a of the cyclone 2 and the gas filling chamber 6 of the pressure vessel 1 and taken out of the pressure vessel 1. The raw material gas g is cooled to a predetermined temperature by the circulating gas cooler 3 and then supplied to the gas filling chamber 6 of the pressure vessel 1.

また、サイクロン２から循環ガス冷却器３に至る管路９の途中に原料ガス補給管１０を設け、ガスハイドレートの水和脱水反応の進行状況にしたがって原料ガスｇを補給するようにしている。   In addition, a raw material gas supply pipe 10 is provided in the middle of a pipe line 9 extending from the cyclone 2 to the circulating gas cooler 3 to supply the raw material gas g according to the progress of the hydrated dehydration reaction of the gas hydrate.

更に、圧力容器１の大断面部１ａに原料供給管１１を設け、圧力容器１の漏斗部１ｃに製品排出管１２を設けている。   Further, a raw material supply pipe 11 is provided in the large cross section 1 a of the pressure vessel 1, and a product discharge pipe 12 is provided in the funnel portion 1 c of the pressure vessel 1.

次に、このガスハイドレート製造装置の作用について説明する。   Next, the operation of this gas hydrate production apparatus will be described.

上記循環ガス冷却器３および循環ガスブロワ４を稼働すると、所定温度に冷却された原料ガス（天然ガス）ｇが圧力容器１のガス充填室６に供給され、仕切板５に設けられている微細な無数の孔１５から圧力容器１の流動層室７内に噴出する。   When the circulating gas cooler 3 and the circulating gas blower 4 are operated, the raw material gas (natural gas) g cooled to a predetermined temperature is supplied to the gas filling chamber 6 of the pressure vessel 1, and the fine gas provided in the partition plate 5. The fluid is ejected into the fluidized bed chamber 7 of the pressure vessel 1 from the numerous holes 15.

その時、原料供給管１１から圧力容器１の流動層室７に湿潤状態（例えば、純度５０％程度）のガスハイドレート粉体Ａを供給すると、湿潤状態のガスハイドレート粉体Ａは、仕切板５に設けられている微細な無数の孔１５から噴出する原料ガスｇによって吹き上げられ、上下に激しく流動する。その間に、湿潤状態のガスハイドレート粉体Ａに含まれている未反応水と原料ガス（天然ガス）ｇが反応し、新規にガスハイドレートが生成される。   At that time, when the gas hydrate powder A in a wet state (for example, a purity of about 50%) is supplied from the raw material supply pipe 11 to the fluidized bed chamber 7 of the pressure vessel 1, the gas hydrate powder A in the wet state is separated from the partition plate. 5 is blown up by the raw material gas g ejected from the innumerable fine holes 15 provided in 5 and vigorously flows up and down. Meanwhile, the unreacted water contained in the wet gas hydrate powder A reacts with the raw material gas (natural gas) g to newly generate gas hydrate.

従って、この新規なガスハイドレートの生成によってガスハイドレート粉体Ａに含まれている未反応水が減少し、ガスハイドレートの純度が高くなる（例えば、純度９０％程度）。純度の上がったガスハイドレート粉体Ａ’は、製品排出管１２から図示しない次工程に送出される。   Therefore, the generation of the new gas hydrate reduces the unreacted water contained in the gas hydrate powder A, and the purity of the gas hydrate is increased (for example, the purity is about 90%). The gas hydrate powder A ′ having increased purity is sent from the product discharge pipe 12 to the next process (not shown).

この例では、ガスハイドレート生成熱を循環ガス（原料ガス）の顕熱を利用して除去している。
（２）実施形態２
図２は、本発明に係るガスハイドレート製造装置の第２の実施形態を示しており、圧力容器１の流動層室７内に設けた伝熱管１３にブラインｂを通してガスハイドレートの生成熱を除去するようにしている。また、伝熱管１３の代わりに圧力容器１の外側に冷却ジャケット（図示せず）を設けてガスハイドレートの生成熱を除去しても良い。その他の部位は、第１の実施形態と相違がないので、同じ部位に同じ符合を付け、詳細な説明を省略する。
（３）実施形態３
図３は、本発明に係るガスハイドレート製造装置の第３の実施形態を示しており、第１の実施形態と同じ部位に同じ符合を付け、詳細な説明を省略する。 In this example, the gas hydrate generation heat is removed using the sensible heat of the circulating gas (raw material gas).
(2) Embodiment 2
FIG. 2 shows a second embodiment of the gas hydrate production apparatus according to the present invention, in which the heat generated by the gas hydrate is supplied to the heat transfer pipe 13 provided in the fluidized bed chamber 7 of the pressure vessel 1 through the brine b. Try to remove. Further, instead of the heat transfer tube 13, a cooling jacket (not shown) may be provided outside the pressure vessel 1 to remove the heat generated by the gas hydrate. Other parts are the same as those in the first embodiment, and therefore, the same reference numerals are given to the same parts, and detailed description is omitted.
(3) Embodiment 3
FIG. 3 shows a third embodiment of the gas hydrate production apparatus according to the present invention. The same reference numerals are given to the same portions as those in the first embodiment, and detailed description thereof is omitted.

このガスハイドレート製造装置は、矩形断面の圧力容器１を２つ合体させた２連式の圧力容器３０を有し、その接合面を上下の空いた腰板１６によって仕切っている。そして、腰板１６によって仕切られた圧力容器３０の前段部を塊成化区画１７とし、後段部を濃度増加区画１８としている。   This gas hydrate manufacturing apparatus has a duplex pressure vessel 30 in which two pressure vessels 1 having a rectangular cross section are combined, and the joint surface is partitioned by upper and lower waist plates 16. The front part of the pressure vessel 30 partitioned by the waist plate 16 is an agglomeration section 17 and the rear part is a concentration increasing section 18.

各圧力容器１は、大断面部１ａと、小断面部１ｂと、これらを接続する漏斗状部１ｃにより形成され、小断面部１ｃの上端に多孔板や焼結板等から成る仕切板５を設けている。そして、仕切板５より下方をガス充填室６と称すると共に、仕切板５より上方を流動層室７と称している。   Each pressure vessel 1 is formed by a large cross-sectional portion 1a, a small cross-sectional portion 1b, and a funnel-shaped portion 1c that connects them, and a partition plate 5 made of a porous plate, a sintered plate, or the like is provided at the upper end of the small cross-sectional portion 1c. Provided. A portion below the partition plate 5 is referred to as a gas filling chamber 6 and a portion above the partition plate 5 is referred to as a fluidized bed chamber 7.

只、この例では、原料供給管１１を前段の圧力容器１ｘに設け、製品排出管１２を後段の圧力容器１ｙに設けている。また、循環ガスブロワ４を２台設け、圧力容器３０の前段の塊成化区画１７と、後段の濃度増加区画１８とで循環ガスの風量を変更できるようにしている。サイクロン２や循環ガス冷却器３は、後段側の圧力容器１ｙに設けている。   In this example, the raw material supply pipe 11 is provided in the front pressure vessel 1x, and the product discharge pipe 12 is provided in the rear pressure vessel 1y. Two circulating gas blowers 4 are provided so that the air volume of the circulating gas can be changed between the agglomeration section 17 at the front stage of the pressure vessel 30 and the concentration increasing section 18 at the rear stage. The cyclone 2 and the circulating gas cooler 3 are provided in the pressure vessel 1y on the rear stage side.

ここで、塊成化区画１７では、塊成条件を、例えば、次のように設定している。   Here, in the agglomeration section 17, agglomeration conditions are set as follows, for example.

（ａ）ガス噴流流速 ：０．５ｍ／ｓ〜１０ｍ／ｓ
（ｂ）ハイドレート水分：１０％〜４０％
（ｃ）造 粒 時 間 ：５ｍｉｎ〜２０ｍｉｎ
次に、このガスハイドレート製造装置の作用について説明する。 (A) Gas jet flow velocity: 0.5 m / s to 10 m / s
(B) Hydrate moisture: 10% to 40%
(C) Granulation time: 5 min to 20 min
Next, the operation of this gas hydrate production apparatus will be described.

各仕切板５に設けた微細な無数の孔１５から各圧力容器１の流動層室７内に所定温度に冷却された原料ガス（天然ガス）ｇを噴出させると共に、原料供給管１１から前段の圧力容器１の流動層室７に湿潤状態（例えば、純度５０％程度）のガスハイドレート粉体Ａを供給すると、湿潤状態のガスハイドレート粉体Ａは、仕切板５に設けた微細な無数の孔１５から噴出する原料ガスｇによって吹き上げられ、上下に流動する。   A raw material gas (natural gas) g cooled to a predetermined temperature is ejected into the fluidized bed chamber 7 of each pressure vessel 1 from a myriad of fine holes 15 provided in each partition plate 5, and the upstream of the raw material supply pipe 11. When the gas hydrate powder A in a wet state (for example, a purity of about 50%) is supplied to the fluidized bed chamber 7 of the pressure vessel 1, the gas hydrate powder A in the wet state is infinitely fine provided on the partition plate 5. Are blown up by the source gas g ejected from the holes 15 and flow up and down.

そして、湿潤状態のガスハイドレート粉体Ａに含まれている未反応水と原料ガス（天然ガス）ｇとが反応し、新規にガスハイドレートが生成され、ガスハイドレートの純度が、多少、高くなる（例えば、純度７０％程度）と共に、ガスハイドレート粒子どうしが結合し、小さな塊となる。この塊のサイズ（見掛けの粒径）は、後工程の付着、閉塞、分解を防止する観点から、０．５〜１０ｍｍ程度、好ましくは、２〜６ｍｍである。   Then, the unreacted water contained in the wet gas hydrate powder A reacts with the raw material gas (natural gas) g to newly generate gas hydrate, and the purity of the gas hydrate is somewhat As it becomes higher (for example, about 70% purity), the gas hydrate particles combine to form a small lump. The size of the lump (apparent particle size) is about 0.5 to 10 mm, preferably 2 to 6 mm, from the viewpoint of preventing adhesion, blockage, and decomposition in the subsequent process.

圧力容器３０の前段の塊成化区画１７で純度が中程度（純度７０％程度）に上がるとともに、小さな塊に造粒されたガスハイドレートＡ”は、中間にある腰板１６の下を潜って後段の濃度増加区画１８に流入し、仕切板５から噴出する原料ガスｇに晒され、小さな塊に造粒されたガスハイドレートＡ”に含まれている残りの未反応水と原料ガスｇとが反応し、ガスハイドレートの純度が更に高くなる（例えば、純度９０％程度。）。このガスハイドレートＡ’は、製品排出管１２から図示しない次工程に送出される。   In the agglomeration section 17 at the front stage of the pressure vessel 30, the purity increases to a medium level (about 70% purity), and the gas hydrate A ″ granulated into a small lump dives under the waist plate 16 in the middle. The remaining unreacted water and the raw material gas g contained in the gas hydrate A ″ that flows into the subsequent concentration increasing section 18 and is exposed to the raw material gas g ejected from the partition plate 5 and granulated into a small lump. React to further increase the purity of the gas hydrate (for example, a purity of about 90%). The gas hydrate A 'is sent from the product discharge pipe 12 to the next process (not shown).

この例の場合も、ガスハイドレート生成熱を循環ガス（原料ガス）の顕熱を利用して除去する。   Also in this example, the gas hydrate generation heat is removed using sensible heat of the circulating gas (raw material gas).

本発明に係るガスハイドレート製造装置の第１実施形態の概略構成図である。It is a schematic block diagram of 1st Embodiment of the gas hydrate manufacturing apparatus which concerns on this invention. 本発明に係るガスハイドレート製造装置の第２実施形態の概略構成図である。It is a schematic block diagram of 2nd Embodiment of the gas hydrate manufacturing apparatus which concerns on this invention. 本発明に係るガスハイドレート製造装置の第３実施形態の概略構成図である。It is a schematic block diagram of 3rd Embodiment of the gas hydrate manufacturing apparatus which concerns on this invention. 従来のガススハイドレート製造工程図である。It is a conventional gas hydrate production process diagram. 従来のガススハイドレート製造工程図である。It is a conventional gas hydrate production process diagram.

符号の説明Explanation of symbols

Ａ 湿潤状態のガスハイドレート粉体
Ａ’乾燥したガスハイドレート粉体
ｇ 原料ガス
１ 反応容器
５ 仕切板
６ ガス充填室
７ 流動層室
１５ ガス噴出孔
A Wet gas hydrate powder A 'Dry gas hydrate powder g Raw material gas 1 Reaction vessel 5 Partition plate 6 Gas filling chamber 7 Fluidized bed chamber 15 Gas ejection hole

Claims (5)

湿潤状態のガスハイドレート粉体に含まれている水分と原料ガスとを反応させてほぼ乾燥したガスハイドレート粉体を製造する際に、反応容器内に導入した湿潤状態のガスハイドレート粉体に対し、反応容器の下部から原料ガスを噴出して前記ガスハイドレート粉体を上下に流動化させ、前記ガスハイドレート粉体に含まれている水分と原料ガスとの接触効率を高めることを特徴とするガスハイドレート製造方法。 The wet gas hydrate powder introduced into the reaction vessel when producing almost dry gas hydrate powder by reacting the moisture contained in the wet gas hydrate powder with the raw material gas In contrast, the raw material gas is jetted from the lower part of the reaction vessel to fluidize the gas hydrate powder up and down, thereby increasing the contact efficiency between the moisture contained in the gas hydrate powder and the raw material gas. A gas hydrate production method characterized by the above. 湿潤状態のガスハイドレート粉体に含まれている水分と原料ガスとを反応させてほぼ乾燥したガスハイドレート粉体を製造するガスハイドレート製造装置において、反応容器内に無数のガス噴出孔を有する仕切板を設け、該仕切板の下方をガス充填室とすると共にその上方を流動層室とし、該流動層室内に導入した湿潤状態のガスハイドレート粉体に対し、前記仕切板に設けた無数のガス噴出孔から原料ガスを噴出して前記ガスハイドレート粉体を上下に流動化させ、前記ガスハイドレート粉体に含まれている水分と原料ガスとの接触効率を高めることを特徴とするガスハイドレート製造装置。 In a gas hydrate production apparatus for producing almost dry gas hydrate powder by reacting moisture contained in a wet gas hydrate powder with a raw material gas, an infinite number of gas ejection holes are provided in the reaction vessel. The partition plate has a gas filling chamber below the partition plate and a fluidized bed chamber above the partition plate, and is provided on the partition plate for the wet gas hydrate powder introduced into the fluidized bed chamber. The gas hydrate powder is fluidized up and down by ejecting raw material gas from countless gas ejection holes, and the contact efficiency between the moisture contained in the gas hydrate powder and the raw material gas is increased. Gas hydrate manufacturing equipment. 反応容器内に上下両端の空いた腰板を設けると共に、該腰板によって前記反応容器内に塊成化区画と濃度増加区画とを形成し、かつ、前記塊成化区画に供給する流動化ガス供給量を調整してガスハイドレート粉体を造粒化させることを特徴とする請求項２記載のガスハイドレート製造装置。 A lumbar plate provided at both upper and lower ends is provided in the reaction vessel, and the agglomeration compartment and the concentration increasing compartment are formed in the reaction vessel by the lumbar plate, and the fluidized gas supply amount supplied to the agglomeration compartment is provided. The gas hydrate production apparatus according to claim 2, wherein the gas hydrate powder is granulated by adjusting 反応容器から飛散したガスハイドレート粒子を、捕集装置によって原料ガスから分離した後、前記反応容器に戻すことを特徴とする請求項３記載のガスハイドレート製造装置。 The gas hydrate production apparatus according to claim 3, wherein the gas hydrate particles scattered from the reaction vessel are separated from the raw material gas by a collecting device and then returned to the reaction vessel. 反応容器に冷却ジャケット又は冷却管を設けたことを特徴とする請求項３記載のガスハイドレート製造装置。
4. A gas hydrate production apparatus according to claim 3, wherein the reaction vessel is provided with a cooling jacket or a cooling pipe.
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JP2006096865A (en) * 2004-09-29 2006-04-13 Mitsui Eng & Shipbuild Co Ltd Apparatus for producing hydrate slurry and plant for producing hydrate
JP2006095438A (en) * 2004-09-29 2006-04-13 Mitsui Eng & Shipbuild Co Ltd Fluidized bed type reaction column for gas hydrate slurry
JP2007217600A (en) * 2006-02-17 2007-08-30 Mitsui Eng & Shipbuild Co Ltd Apparatus and method for producing gas hydrate
JP2007238697A (en) * 2006-03-07 2007-09-20 Mitsui Eng & Shipbuild Co Ltd Methods of production and regasification and apparatus for production and regasification of gas hydrate
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