JP2005224741A - Method for heating and drying coating film, and heating and drying apparatus for coating film - Google Patents

Method for heating and drying coating film, and heating and drying apparatus for coating film Download PDF

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JP2005224741A
JP2005224741A JP2004037699A JP2004037699A JP2005224741A JP 2005224741 A JP2005224741 A JP 2005224741A JP 2004037699 A JP2004037699 A JP 2004037699A JP 2004037699 A JP2004037699 A JP 2004037699A JP 2005224741 A JP2005224741 A JP 2005224741A
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coating film
substrate
coated
solvent
coating
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Nobuyuki Nakahara
伸之 中原
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Canon Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem that the peripheral edge part of a coating film is swelled in heating and drying the coating film. <P>SOLUTION: A method for drying the coating film is provided by which the swelling of the peripheral edge part of the coating film in heating and drying is prevented to obtain the coating film having uniform thickness by giving potential to the coating film surface and supplying a solvent during the drying. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明はガラス基板や半導体ウェーハ等の板状被処理物の表面に塗布されたレジスト液、スラリー等の各種液状塗布液を加熱乾燥させる塗布膜の乾燥方法および装置に関するものである。   The present invention relates to a coating film drying method and apparatus for heating and drying various liquid coating solutions such as a resist solution and a slurry coated on the surface of a plate-like workpiece such as a glass substrate or a semiconductor wafer.

例えば特開平3−56163号公報(特許文献1)に開示されている回転塗布方式、例えば米国特許第4、696、885号公報(特許文献2)などに開示されているスリットノズル方式によりガラス基板や半導体ウェーハなどの板状被塗布基板表面に塗布されたレジスト液、SOG液のような液体材料の塗布膜を乾燥させる方法として、加熱炉内に基板を設置して塗布膜を過熱乾燥させる炉内乾燥方式、ホットプレート上に基板を設置しプレートを介して塗布膜を乾燥させるホットプレート方式などがある。   For example, a glass substrate by a spin coating method disclosed in JP-A-3-56163 (Patent Document 1), for example, a slit nozzle method disclosed in US Pat. No. 4,696,885 (Patent Document 2) or the like. As a method for drying a coating film of a liquid material such as a resist solution or an SOG solution applied to the surface of a plate-like substrate such as a semiconductor wafer or a semiconductor wafer, a furnace in which the substrate is installed in a heating furnace and the coating film is overheated and dried There are an internal drying method, a hot plate method in which a substrate is placed on a hot plate and a coating film is dried through the plate.

炉内加熱方式やホットプレート方式などの塗布膜を加熱乾燥させる方法では、蒸発した溶媒成分が周囲に拡散しやすい場合、塗布膜の周辺縁部が最も蒸発が速いため、塗布膜の周辺縁部では乾燥によって塗布膜が盛り上がるといった問題がある。この問題に対して特開2003−19558号公報(特許文献3)に開示されているように塗布膜溶媒の蒸発を抑制するといった方法がある。また別の方法として特開2000−107671号公報(特許文献4)に開示されているような塗布膜が完全に乾燥し固化する前に、塗布膜表面に気流を吹き付けて均一な膜厚を得る方法がある。
特開平3−56163 米国特許4、696、885 特開2003−19558 特開2000−107671
In the method of heating and drying the coating film such as in-furnace heating method or hot plate method, when the evaporated solvent component is likely to diffuse around, the peripheral edge of the coating film is the fastest evaporation, so the peripheral edge of the coating film Then, there is a problem that the coating film is raised by drying. To solve this problem, there is a method of suppressing evaporation of the coating film solvent as disclosed in Japanese Patent Application Laid-Open No. 2003-19558 (Patent Document 3). As another method, before the coating film as disclosed in JP-A-2000-107671 (Patent Document 4) is completely dried and solidified, an air current is blown onto the surface of the coating film to obtain a uniform film thickness. There is a way.
JP-A-3-56163 US Pat. No. 4,696,885 JP2003-19558 JP 2000-107671

しかし特開2003−19558に記載の方法では、塗布膜から蒸発する溶媒量分布を極端に不均一にすることはできないため、塗布膜の周辺縁部の盛り上がりを抑制する効果は小さい。また特開2000−107671に記載の方法では、塗布膜の周辺縁部の盛り上がりを完全に抑制する効果は小さいとともに塗布膜面に気流よる膜厚むらが生じやすいといった問題がある。   However, in the method described in Japanese Patent Application Laid-Open No. 2003-19558, since the distribution of the amount of solvent evaporated from the coating film cannot be made extremely non-uniform, the effect of suppressing the rise of the peripheral edge of the coating film is small. Further, the method described in JP-A-2000-107671 has a problem that the effect of completely suppressing the rising of the peripheral edge portion of the coating film is small and the film thickness unevenness due to the airflow tends to occur on the coating film surface.

本発明は前記課題を解決するために、スリット状の開口部を持つ塗布ヘッドと被塗布基板とを、塗布ヘッド開口部の長手方向に直行するように相対移動させつつ、塗布ヘッド開口部から液体を吐出することにより被印刷基板に塗布した溶媒と溶質からなる塗布膜を加熱乾燥し固化させる加熱乾燥方法において、該被塗布基板に塗布された該塗布膜の周辺縁部に該溶媒を供給する溶媒供給部と電界印加端子とを設け、該溶媒供給部から該被塗布基板に溶媒を供給すると同時に、該電界印加端子により塗布された該塗布膜の周辺縁部表面に電位を与える加熱乾燥方法を提供している。   In order to solve the above-mentioned problems, the present invention provides a liquid from a coating head opening while moving a coating head having a slit-shaped opening and a substrate to be coated so as to be orthogonal to the longitudinal direction of the coating head opening. In a heating and drying method in which a coating film made of a solvent and a solute applied to a substrate to be printed is heated and dried to solidify by supplying the solvent, the solvent is supplied to the peripheral edge of the coating film applied to the substrate to be coated Heat drying method of providing a solvent supply unit and an electric field application terminal, supplying a solvent from the solvent supply unit to the substrate to be coated, and simultaneously applying a potential to the peripheral edge surface of the coating film applied by the electric field application terminal Is provided.

また本発明は、前記溶媒供給部が前記塗布膜の表面に対して、垂直および水平に移動する加熱乾燥方法を提供している。   The present invention also provides a heating and drying method in which the solvent supply unit moves vertically and horizontally with respect to the surface of the coating film.

また本発明は、前記被塗布基板に塗布された前記塗布膜の前記周辺縁部の乾燥状態に応じて供給する前記溶媒量を変更する加熱乾燥方法を提供している。   The present invention also provides a heat drying method for changing the amount of the solvent supplied according to the dry state of the peripheral edge portion of the coating film applied to the substrate to be coated.

また本発明は、前記被塗布基板に塗布された前記塗布膜の前記周辺縁部の乾燥状態に応じて前記溶媒を供給する時間を変更加熱乾燥方法を提供している。   The present invention also provides a heat drying method in which the time for supplying the solvent is changed according to the dry state of the peripheral edge portion of the coating film applied to the substrate to be coated.

また本発明は、前記被塗布基板に塗布された前記塗布膜の前記周辺縁部の乾燥状態に応じて、該電界印加端子に加える電位を変更する加熱乾燥方法を提供している。   The present invention also provides a heating and drying method in which a potential applied to the electric field application terminal is changed according to a dry state of the peripheral edge portion of the coating film applied to the substrate to be coated.

また本発明は、スリット状の開口部を持つ塗布ヘッドと被塗布基板とを、塗布ヘッド開口部の長手方向に直行するように相対移動させつつ、塗布ヘッド開口部から液体を吐出することにより被印刷基板に塗布した溶媒と溶質からなる塗布膜を加熱乾燥し固化させる加熱乾燥装置において、該被塗布基板に塗布された該塗布膜の周辺縁部に該溶媒を供給する溶媒供給部を設け、該溶媒供給部該被塗布基板に塗布された該塗布膜の周辺縁部表面に電位を与えるための電界印加端子を備えている加熱乾燥装置を提供している。   The present invention also provides a coating head by discharging liquid from the coating head opening while relatively moving the coating head having the slit-shaped opening and the substrate to be coated so as to be orthogonal to the longitudinal direction of the coating head opening. In a heating and drying apparatus that heats and solidifies a coating film made of a solvent and a solute applied to a printed substrate, a solvent supply unit that supplies the solvent to a peripheral edge of the coating film applied to the substrate to be coated is provided. There is provided a heating and drying apparatus provided with an electric field application terminal for applying a potential to the peripheral edge surface of the coating film coated on the substrate to be coated.

また本発明は、前記溶媒供給部が前記塗布膜の表面に対して、垂直および水平に移動する加熱乾燥装置を提供している。   The present invention also provides a heating and drying apparatus in which the solvent supply unit moves vertically and horizontally with respect to the surface of the coating film.

また本発明は、前記電界印加端子が前記塗布膜の上面に対向するように設置されている加熱乾燥装置を提供している。   The present invention also provides a heating and drying apparatus in which the electric field application terminal is installed so as to face the upper surface of the coating film.

また本発明は、前記塗布膜の上面に対向する位置に設置されている前記電界印加端子が前記塗布膜の上面に対して、垂直および水平に移動する加熱乾燥装置を提供している。   The present invention also provides a heating and drying apparatus in which the electric field application terminal installed at a position facing the upper surface of the coating film moves vertically and horizontally with respect to the upper surface of the coating film.

また本発明は、前記電界印加端子が前記塗布膜の側面に対向するように設置されている加熱乾燥装置を提供している。   The present invention also provides a heating and drying apparatus in which the electric field application terminal is installed so as to face the side surface of the coating film.

また本発明は、前記塗布膜の側面に対向する位置に設置されている前記電界印加端子が前記塗布膜の側面に対して、垂直および水平に移動する加熱乾燥装置を提供している。   The present invention also provides a heating and drying apparatus in which the electric field application terminal installed at a position facing the side surface of the coating film moves vertically and horizontally with respect to the side surface of the coating film.

本発明の加熱乾燥方法において、被塗布基板に塗布された塗布膜周辺縁部表面に溶媒を供給するとともに、塗布膜周辺縁部表面に塗布膜周辺縁部上面に対向する方向に電位差がつくように電界与えることで供給した溶媒を保持することにより、塗布膜周辺縁部の盛り上がりを抑制する効果がある。   In the heating and drying method of the present invention, a solvent is supplied to the surface of the peripheral edge of the coating film applied to the substrate to be coated, and a potential difference is created on the surface of the peripheral edge of the coating film in a direction opposite to the upper surface of the peripheral edge of the coating film. By holding the solvent supplied by applying an electric field to the film, there is an effect of suppressing the swell of the peripheral edge of the coating film.

また、被塗布基板に塗布された塗布膜周辺縁部表面に溶媒を乾燥状態に応じて供給するとともに、塗布膜周辺縁部表面に塗布膜周辺縁部上面に対向する方向に与える電位差を乾燥状態に応じて調整することにより、塗布膜周辺縁部の盛り上がりを抑制する効果がある。   In addition, the solvent is supplied to the surface of the peripheral edge of the coating film applied to the substrate to be coated according to the dry state, and the potential difference applied to the surface of the peripheral edge of the coating film in the direction facing the upper surface of the peripheral edge of the coating film is in the dry state. By adjusting according to the above, there is an effect of suppressing the swell of the peripheral edge of the coating film.

また、被塗布基板に塗布された塗布膜周辺縁部表面に溶媒を乾燥状態に応じて供給するとともに、塗布膜周辺縁部表面に塗布膜周辺縁部上面に対向する方向に与える電位差を乾燥状態に応じて調整し、かつ塗布膜周辺縁部表面に塗布膜周辺縁部側面に対向する方向に与える電位差を乾燥状態に応じて調整することにより、塗布膜周辺縁部の盛り上がりを抑制する効果がある。   In addition, the solvent is supplied to the surface of the peripheral edge of the coating film applied to the substrate to be coated according to the dry state, and the potential difference applied to the surface of the peripheral edge of the coating film in the direction facing the upper surface of the peripheral edge of the coating film is in the dry state. And adjusting the potential difference applied to the surface of the peripheral edge of the coating film in the direction facing the side surface of the peripheral edge of the coating film according to the dry state, thereby suppressing the rise of the peripheral edge of the coating film. is there.

本発明は上記の問題点である加熱乾燥の際に塗布膜の周辺縁部において盛り上がるという問題を解決するため、乾燥中に塗布膜面に電位を与えるとともに溶媒を供給することにより、本発明は上記の問題点である加熱乾燥時の塗布膜の周辺縁部における盛り上がりを抑制し、厚みが均一な塗布膜を得ることが可能な塗布膜の乾燥方法を提供することを目的とする。   The present invention solves the problem of rising at the peripheral edge of the coating film at the time of heating and drying, which is the above-mentioned problem, and by applying a potential to the coating film surface and supplying a solvent during drying, the present invention An object of the present invention is to provide a method for drying a coating film that can prevent the above-mentioned problem from rising at the peripheral edge of the coating film during heat drying and obtain a coating film having a uniform thickness.

図1は実施例1における加熱乾燥方式による乾燥方法の概略図である。ホットプレート1上に図示しない真空吸着により被塗布基板2が設置されている。被塗布基板2表面には図4で示す塗布膜形成方法により塗布膜3が形成されている。塗布膜3の塗布膜周辺縁部4の上面に対向する位置に任意に移動可能な電界印加端子5が設置されている。直流電圧器6が被塗布基板2と電界印加端子5に接続されている。塗布膜3の塗布膜周辺縁部4の表面に対向する位置に塗布膜3の溶媒8を図示しない溶媒供給ポンプより任意の量、時間で供給できるノズル7が設置されている。   FIG. 1 is a schematic view of a drying method using a heat drying method in Example 1. FIG. A substrate 2 to be coated is placed on the hot plate 1 by vacuum suction (not shown). A coating film 3 is formed on the surface of the substrate to be coated 2 by the coating film forming method shown in FIG. An electric field application terminal 5 that can be arbitrarily moved is provided at a position facing the upper surface of the coating film peripheral edge 4 of the coating film 3. A DC voltage device 6 is connected to the substrate to be coated 2 and the electric field application terminal 5. A nozzle 7 that can supply the solvent 8 of the coating film 3 in an arbitrary amount and time from a solvent supply pump (not shown) is installed at a position facing the surface of the coating film peripheral edge 4 of the coating film 3.

図2は実施例1の実施形態を示すスリットノズル方式による塗布膜形成方法の概略図である。図2(a)に示すように被塗布基板101の塗布開始位置に塗布ヘッド102が被塗布基板101と一定間隔を保った状態で停止している。塗布ヘッド102が停止した状態でスリット部103から塗布液104を吐出し塗布液溜り105を形成する。次に図2(b)に示すように被塗布基板101と塗布ヘッド102を一定間隔に保った状態で塗布ヘッド102が被塗布基板101に対し相対的に移動106するように、被塗布基板101もしくは塗布ヘッド102を移動することにより被塗布基板101に塗布膜107を形成する。   FIG. 2 is a schematic view of a coating film forming method by a slit nozzle method showing an embodiment of the first embodiment. As shown in FIG. 2A, the coating head 102 is stopped at a coating start position of the substrate to be coated 101 with a certain distance from the substrate to be coated 101. In a state in which the coating head 102 is stopped, the coating liquid 104 is discharged from the slit portion 103 to form a coating liquid pool 105. Next, as shown in FIG. 2B, the coated substrate 101 is moved 106 so that the coating head 102 moves relative to the coated substrate 101 while keeping the coated substrate 101 and the coating head 102 at a constant interval. Alternatively, the coating film 107 is formed on the substrate 101 by moving the coating head 102.

(実験例1)
被塗布基板には縦10cm×横10cm×厚0.5cmの青板ガラスを用いた。塗布液粘度は4Pa・secとした。塗布液固形分濃度は60.6wt%とした。塗布ヘッドと被塗布基板の距離は150μmとした。塗布動作時の塗布ヘッドと被塗布基板の相対速度は5mm/secとした。幅2mmの電界印加端子を塗布膜の周辺に沿って、塗布膜上面より2mmの間隔で設置した。直流電圧器により電界印加端子と被塗布基板間に5kVの電圧を設定した。ノズルから0.05ml/secで溶媒を供給する。ホットプレートの面内の温度分布は設定温度90±1℃に設定した。
(Experimental example 1)
As the substrate to be coated, blue plate glass of 10 cm long × 10 cm wide × 0.5 cm thick was used. The coating solution viscosity was 4 Pa · sec. The coating solution solid content concentration was 60.6 wt%. The distance between the coating head and the substrate to be coated was 150 μm. The relative speed between the coating head and the substrate to be coated during the coating operation was 5 mm / sec. Electric field application terminals having a width of 2 mm were placed along the periphery of the coating film at intervals of 2 mm from the upper surface of the coating film. A voltage of 5 kV was set between the electric field application terminal and the substrate to be coated by a DC voltage device. The solvent is supplied from the nozzle at 0.05 ml / sec. The temperature distribution in the surface of the hot plate was set to a set temperature of 90 ± 1 ° C.

以上の条件のもと、7分間加熱乾燥を行った結果、乾燥膜の被塗布基板中央部の膜厚は88.1μm、乾燥膜の縁部のもっとも厚い膜厚は95.3μmとなった。   As a result of heat drying for 7 minutes under the above conditions, the thickness of the dry film at the center of the substrate to be coated was 88.1 μm, and the thickest film at the edge of the dry film was 95.3 μm.

(実験例2)
被塗布基板には縦10cm×横10cm×厚0.5cmの青板ガラスを用いた。塗布液粘度は4Pa・secとした。塗布液固形分濃度は60.6wt%とした。塗布ヘッドと被塗布基板の距離は150μmとした。塗布動作時の塗布ヘッドと被塗布基板の相対速度は5mm/secとした。幅2mmの電界印加端子を塗布膜の周辺に沿って、塗布膜上面より2mmの間隔で設置した。直流電圧器により電界印加端子と被塗布基板間に5kVの電圧を設定した。ノズルから0.05ml/secで溶媒を供給する。ホットプレートの面内の温度分布は設定温度90±1℃に設定した。
(Experimental example 2)
As the substrate to be coated, blue plate glass of 10 cm long × 10 cm wide × 0.5 cm thick was used. The coating solution viscosity was 4 Pa · sec. The coating solution solid content concentration was 60.6 wt%. The distance between the coating head and the substrate to be coated was 150 μm. The relative speed between the coating head and the substrate to be coated during the coating operation was 5 mm / sec. Electric field application terminals having a width of 2 mm were placed along the periphery of the coating film at intervals of 2 mm from the upper surface of the coating film. A voltage of 5 kV was set between the electric field application terminal and the substrate to be coated by a DC voltage device. The solvent is supplied from the nozzle at 0.05 ml / sec. The temperature distribution in the surface of the hot plate was set to a set temperature of 90 ± 1 ° C.

以上の条件のもと、7分間加熱乾燥を行った。乾燥開始から4分間はノズルから0.05ml/secで溶媒を供給した。開始4分から6分まではノズルから0.04ml/secで溶媒を供給すると共に電界印加端子を塗布膜上面に対して垂直方向に0.5mm/minで移動させ塗布膜に近づけていった。その後終了まで電界印加端子の動きを停止したままノズルから0.02ml/secで溶媒を供給しつづけた。その結果、乾燥膜の被塗布基板中央部の膜厚は89.3μm、乾燥膜の縁部のもっとも厚い膜厚は93.5μmとなった。   Under the above conditions, heat drying was performed for 7 minutes. The solvent was supplied from the nozzle at 0.05 ml / sec for 4 minutes from the start of drying. From the start 4 minutes to 6 minutes, the solvent was supplied from the nozzle at 0.04 ml / sec, and the electric field application terminal was moved in the direction perpendicular to the upper surface of the coating film at 0.5 mm / min to approach the coating film. Thereafter, the solvent was continuously supplied from the nozzle at 0.02 ml / sec while the movement of the electric field application terminal was stopped until the end. As a result, the film thickness at the center of the substrate to be coated of the dry film was 89.3 μm, and the thickest film at the edge of the dry film was 93.5 μm.

図3は実施例2における加熱乾燥方式による乾燥方法の概略図である。ホットプレート9上に図示しない真空吸着により被塗布基板10が設置されている。被塗布基板10表面には図4で示す塗布膜形成方法により塗布膜11が形成されている。塗布膜11の塗布膜周辺縁部12の上面に対向する位置に任意に移動可能な電界印加端子13が設置されている。直流電圧器14が被塗布基板10と電界印加端子13に接続されている。塗布膜11の塗布膜周辺縁部12の側面に対向する位置に任意に移動可能な電界印加端子17が設置されている。直流電圧器14が被塗布基板10と電界印加端子17に接続されている。被塗布基板10はアース19が設置されている。塗布膜11の塗布膜周辺縁部12の表面に対向する位置に塗布膜11の溶媒16を図示しない溶媒供給ポンプより任意の時間、量で供給できるノズル15が設置されている。   FIG. 3 is a schematic view of a drying method by a heat drying method in Example 2. A substrate 10 to be coated is placed on the hot plate 9 by vacuum suction (not shown). A coating film 11 is formed on the surface of the substrate 10 to be coated by the coating film forming method shown in FIG. An electric field application terminal 13 that can be arbitrarily moved is provided at a position facing the upper surface of the coating film peripheral edge 12 of the coating film 11. A DC voltage device 14 is connected to the substrate to be coated 10 and the electric field application terminal 13. An electric field application terminal 17 that can be arbitrarily moved is provided at a position facing the side surface of the coating film peripheral edge portion 12 of the coating film 11. A DC voltage device 14 is connected to the substrate to be coated 10 and the electric field application terminal 17. The substrate to be coated 10 is provided with a ground 19. A nozzle 15 capable of supplying the solvent 16 of the coating film 11 in an arbitrary time and amount from a solvent supply pump (not shown) is installed at a position facing the surface of the coating film peripheral edge 12 of the coating film 11.

(実験例3)
被塗布基板には縦10cm×横10cm×厚0.5cmの青板ガラスを用いた。塗布液粘度は4Pa・secとした。塗布液固形分濃度は60.6wt%とした。塗布ヘッドと被塗布基板の距離は150μmとした。塗布動作時の塗布ヘッドと被塗布基板の相対速度は5mm/secとした。幅1mmの電界印加端子を塗布膜の周辺に沿って、初期位置として塗布膜上面より2mmの間隔で設置した。直流電圧器により電界印加端子と被塗布基板間に5kVの電圧を設定した。幅1mmの電極を塗布膜の周辺に沿って、初期位置として塗布側面より2mmの間隔で設置した。ホットプレートの面内の温度分布は設定温度90±1℃に設定した。
(Experimental example 3)
As the substrate to be coated, blue plate glass of 10 cm long × 10 cm wide × 0.5 cm thick was used. The coating solution viscosity was 4 Pa · sec. The coating solution solid content concentration was 60.6 wt%. The distance between the coating head and the substrate to be coated was 150 μm. The relative speed between the coating head and the substrate to be coated during the coating operation was 5 mm / sec. An electric field application terminal having a width of 1 mm was placed along the periphery of the coating film at an interval of 2 mm from the upper surface of the coating film as an initial position. A voltage of 5 kV was set between the electric field application terminal and the substrate to be coated by a DC voltage device. An electrode having a width of 1 mm was placed along the periphery of the coating film at an interval of 2 mm from the coating side surface as an initial position. The temperature distribution in the surface of the hot plate was set to a set temperature of 90 ± 1 ° C.

以上の条件のもと、7分間加熱乾燥を行った。乾燥開始から4分間はノズルから0.05ml/secで溶媒を供給した。開始4分から6分まではノズルから0.03ml/secで溶媒を供給すると共に塗布膜上面および側面と対向する電界印加端子を0.5mm/minで塗布膜に近づけていった。その後終了まで電界印加端子の動きを停止したままノズルから0.01ml/secで溶媒を供給しつづけた。その結果、乾燥膜の被塗布基板中央部の膜厚は90.2μm、乾燥膜の縁部のもっとも厚い膜厚は91.3μmとなった。   Under the above conditions, heat drying was performed for 7 minutes. The solvent was supplied from the nozzle at 0.05 ml / sec for 4 minutes from the start of drying. From the start 4 minutes to 6 minutes, the solvent was supplied from the nozzle at 0.03 ml / sec, and the electric field application terminal facing the upper and side surfaces of the coating film was brought closer to the coating film at 0.5 mm / min. Thereafter, the solvent was continuously supplied from the nozzle at 0.01 ml / sec while the movement of the electric field application terminal was stopped until the end. As a result, the film thickness at the center of the substrate to be coated of the dry film was 90.2 μm, and the thickest film at the edge of the dry film was 91.3 μm.

(比較実験例1)
図4は比較実験例における加熱乾燥方式による乾燥方法の概略図である。図4(a)に示すようにチャンバ29に排気装置27、給気装置28が設置されている。チャンバ29内にホットプレート20上に図示しない真空吸着により被塗布基板21が設置されている。被塗布基板21表面には図4で示す塗布膜形成方法により塗布膜22が形成されている。貫通孔24、25、26が設けられた部材23が被塗布基板21に対して所定の位置に設置してある。図4(b)に部材23の平面図を示す。
(Comparative Experimental Example 1)
FIG. 4 is a schematic view of a drying method using a heat drying method in a comparative experimental example. As shown in FIG. 4A, an exhaust device 27 and an air supply device 28 are installed in the chamber 29. A substrate 21 to be coated is placed on the hot plate 20 by vacuum suction (not shown) in the chamber 29. A coating film 22 is formed on the surface of the substrate to be coated 21 by the coating film forming method shown in FIG. A member 23 provided with through holes 24, 25, 26 is installed at a predetermined position with respect to the substrate 21 to be coated. FIG. 4B shows a plan view of the member 23.

被塗布基板には縦10cm×横10cm×厚0.5cmの青板ガラスを用いた。塗布液粘度は4Pa・secとした。塗布液固形分濃度は60.6wt%とした。塗布ヘッドと被塗布基板の距離は150μmとした。塗布動作時の塗布ヘッドと被塗布基板の相対速度は5mm/secとした。縦15cm×横15cm×厚0.5cm部材に設けた穴は直径24、16、8mmとした。0.5mm/minで給排気を行い、チャンバ内は1気圧となるようにした。ホットプレートの面内の温度分布は設定温度90±1℃に設定した。   As the substrate to be coated, blue plate glass of 10 cm long × 10 cm wide × 0.5 cm thick was used. The coating solution viscosity was 4 Pa · sec. The coating solution solid content concentration was 60.6 wt%. The distance between the coating head and the substrate to be coated was 150 μm. The relative speed between the coating head and the substrate to be coated during the coating operation was 5 mm / sec. The holes provided in the 15 cm long × 15 cm wide × 0.5 cm thick member had diameters of 24, 16, and 8 mm. Supply / exhaust was performed at 0.5 mm / min so that the pressure in the chamber was 1 atm. The temperature distribution in the surface of the hot plate was set to a set temperature of 90 ± 1 ° C.

以上の条件のもと、7分間加熱乾燥を行った。その結果、乾燥膜の被塗布基板中央部の膜厚は87.3μm、乾燥膜の縁部のもっとも厚い膜厚は99.3μmとなった。   Under the above conditions, heat drying was performed for 7 minutes. As a result, the film thickness at the center of the substrate to be coated of the dry film was 87.3 μm, and the thickest film at the edge of the dry film was 99.3 μm.

実施例1における加熱乾燥方法を示す概略断面図。1 is a schematic cross-sectional view showing a heat drying method in Example 1. FIG. 実施例1における塗布膜形成方法を示す概略断面図。FIG. 2 is a schematic cross-sectional view illustrating a method for forming a coating film in Example 1. 実施例2における加熱乾燥方法を示す概略断面図。FIG. 3 is a schematic cross-sectional view showing a heat drying method in Example 2. 比較実験例1における加熱乾燥方法を示す概略断面図。FIG. 3 is a schematic cross-sectional view showing a heat drying method in Comparative Experimental Example 1.

符号の説明Explanation of symbols

1、9、20 ホットプレート
2、10、21、101 被塗布基板
3、11、22、107 塗布膜
4、12 塗布膜周辺縁部
5、13、17 電界印加端子
6、14、18 直流電圧器
7、15 ノズル
8、16 溶媒
19 アース
23 部材
24、25、26 貫通孔
27 排気装置
28 給気装置
29 チャンバ
102 塗布ヘッド
103 スリット
104 塗布液
105 塗布液溜り
106 移動方向
1, 9, 20 Hot plate 2, 10, 21, 101 Substrate to be coated 3, 11, 22, 107 Coating film 4, 12 Coating film peripheral edge 5, 13, 17 Electric field application terminal 6, 14, 18 DC voltage device 7, 15 Nozzle 8, 16 Solvent 19 Ground 23 Member 24, 25, 26 Through hole 27 Exhaust device 28 Air supply device 29 Chamber 102 Coating head 103 Slit 104 Coating solution 105 Coating solution reservoir 106 Moving direction

Claims (11)

スリット状の開口部を持つ塗布ヘッドと被塗布基板とを、塗布ヘッド開口部の長手方向に直行するように相対移動させつつ、塗布ヘッド開口部から液体を吐出することにより被印刷基板に塗布した溶媒と溶質からなる塗布膜を加熱乾燥し固化させる加熱乾燥方法において、該被塗布基板に塗布された該塗布膜の周辺縁部に該溶媒を供給する溶媒供給部と電界印加端子とを設け、該溶媒供給部から該被塗布基板に溶媒を供給すると同時に、該電界印加端子により塗布された該塗布膜の周辺縁部表面に電位を与えることを特徴する加熱乾燥方法。   The coating head having a slit-shaped opening and the substrate to be coated were applied to the substrate to be printed by ejecting liquid from the coating head opening while relatively moving the coating head and the coating head in the longitudinal direction of the coating head opening. In a heating and drying method in which a coating film made of a solvent and a solute is dried by heating and solidified, a solvent supply unit for supplying the solvent and an electric field application terminal are provided at a peripheral edge of the coating film applied to the substrate to be coated, A heating and drying method, wherein a solvent is supplied from the solvent supply unit to the substrate to be coated, and at the same time, a potential is applied to a peripheral edge surface of the coating film applied by the electric field application terminal. 前記溶媒供給部が前記塗布膜の表面に対して、垂直および水平に移動することを特徴とする請求項1に記載の加熱方法。   The heating method according to claim 1, wherein the solvent supply unit moves vertically and horizontally with respect to the surface of the coating film. 前記被塗布基板に塗布された前記塗布膜の前記周辺縁部の乾燥状態に応じて供給する前記溶媒量を変更することを特徴とする請求項1に記載の加熱乾燥方法。   2. The heat drying method according to claim 1, wherein the amount of the solvent to be supplied is changed according to a dry state of the peripheral edge of the coating film applied to the substrate to be coated. 前記被塗布基板に塗布された前記塗布膜の前記周辺縁部の乾燥状態に応じて前記溶媒を供給する時間を変更することを特徴とする請求項1に記載の加熱乾燥方法。   The heat drying method according to claim 1, wherein a time for supplying the solvent is changed according to a dry state of the peripheral edge portion of the coating film applied to the substrate to be coated. 前記被塗布基板に塗布された前記塗布膜の前記周辺縁部の乾燥状態に応じて、該電界印加端子に加える電位を変更することを特徴する請求1に記載の加熱乾燥方法。   2. The heat drying method according to claim 1, wherein a potential applied to the electric field application terminal is changed in accordance with a dry state of the peripheral edge portion of the coating film applied to the substrate to be coated. スリット状の開口部を持つ塗布ヘッドと被塗布基板とを、塗布ヘッド開口部の長手方向に直行するように相対移動させつつ、塗布ヘッド開口部から液体を吐出することにより被印刷基板に塗布した溶媒と溶質からなる塗布膜を加熱乾燥し固化させる加熱乾燥装置において、該被塗布基板に塗布された該塗布膜の周辺縁部に該溶媒を供給する溶媒供給部を設け、該溶媒供給部該被塗布基板に塗布された該塗布膜の周辺縁部表面に電位を与えるための電界印加端子を備えていることを特徴する加熱乾燥装置。   The coating head having a slit-shaped opening and the substrate to be coated were applied to the substrate to be printed by ejecting liquid from the coating head opening while relatively moving the coating head and the coating head in the longitudinal direction of the coating head opening. In a heating and drying apparatus for heating and drying and solidifying a coating film composed of a solvent and a solute, a solvent supply unit for supplying the solvent is provided at a peripheral edge of the coating film applied to the substrate to be coated, and the solvent supply unit A heating and drying apparatus comprising an electric field applying terminal for applying a potential to a peripheral edge surface of the coating film coated on a substrate to be coated. 前記溶媒供給部が前記塗布膜の表面に対して、垂直および水平に移動することを特徴とする請求項6に記載の加熱装置。   The heating apparatus according to claim 6, wherein the solvent supply unit moves vertically and horizontally with respect to the surface of the coating film. 前記電界印加端子が前記塗布膜の上面に対向するように設置されていることを特徴とする請求項6に記載の加熱乾燥装置。   The heat drying apparatus according to claim 6, wherein the electric field applying terminal is disposed so as to face the upper surface of the coating film. 前記塗布膜の上面に対向する位置に設置されている前記電界印加端子が前記塗布膜の上面に対して、垂直および水平に移動することを特徴とする請求項6に記載の加熱乾燥装置。   The heat drying apparatus according to claim 6, wherein the electric field application terminal installed at a position facing the upper surface of the coating film moves vertically and horizontally with respect to the upper surface of the coating film. 前記電界印加端子が前記塗布膜の側面に対向するように設置されていることを特徴とする請求項6に記載の加熱乾燥装置。   The heat drying apparatus according to claim 6, wherein the electric field application terminal is disposed so as to face a side surface of the coating film. 前記塗布膜の側面に対向する位置に設置されている前記電界印加端子が前記塗布膜の側面に対して、垂直および水平に移動することを特徴とする請求項10に記載の加熱乾燥装置。   The heat drying apparatus according to claim 10, wherein the electric field application terminal installed at a position facing the side surface of the coating film moves vertically and horizontally with respect to the side surface of the coating film.
JP2004037699A 2004-02-16 2004-02-16 Method for heating and drying coating film, and heating and drying apparatus for coating film Withdrawn JP2005224741A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013061854A1 (en) * 2011-10-24 2013-05-02 東京エレクトロン株式会社 Apparatus for burning film and method for burning film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013061854A1 (en) * 2011-10-24 2013-05-02 東京エレクトロン株式会社 Apparatus for burning film and method for burning film

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