JP2005183819A - Lens barrel, exposure device and method of manufacturing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a lens barrel which keeps an internal space clean and which can regulate the position of each lens barrel unit with high accuracy, and to provide an exposure device which can manufacture efficiently a device of a high integration degree and a method of manufacturing the device. <P>SOLUTION: The lens barrel includes an annularly formed housing groove 65 opened at the upper side of a gravity direction and recessed on the first collar 60a of a first lens barrel unit 59b1, and an O ring 66 housed in the housing groove 65. The lens barrel also includes an annular groove 67 connected to an exhaust unit and recessed at an inside from the adhesion position of the O ring 66 on the second collar 60b of a second lens barrel unit 59b2 connected to the first collar 60a of the first lens barrel unit 59b1. The invasion of outside air into the lens barrel unit 59 through a space between the first and second collars 60a and 60b is suppressed by the O ring 66. A vaporization product generated in an extremely small amount from the O ring 66 is exhausted together with the gas in the space between the first and second collars 60a and 60b out of the lens barrel unit 59 through the annular groove 67. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a lens barrel that houses at least one optical element such as a lens or a mirror. The present invention also relates to an exposure apparatus used in a photolithography process of a manufacturing process of various devices such as a semiconductor element, a liquid crystal display element, an imaging element, and a thin film magnetic head. Furthermore, the present invention relates to a device manufacturing method for manufacturing the various devices.

  Conventionally, this type of exposure apparatus is provided with an illumination optical system that illuminates a mask, such as a reticle or a photomask, on which a predetermined pattern is formed, with predetermined exposure light, as described in Patent Document 1, for example. . In addition, a projection optical system that exposes the image of the pattern onto a substrate (wafer, glass plate, or the like) coated with a photosensitive material such as a photoresist by illumination of the illumination optical system is provided. These illumination optical system and projection optical system are composed of a plurality of optical elements such as lens elements and mirrors, and are accommodated in a lens barrel.

In such an exposure apparatus, the wavelength of exposure light has been shortened in order to meet the recent demand for finer circuit patterns. Recently, an exposure apparatus using KrF excimer laser light in the far ultraviolet region (λ = 248 nm), ArF excimer laser light in the vacuum ultraviolet region (λ = 193 nm), F ₂ laser light (λ = 157 nm), etc. as exposure light. Has been developed.

  By the way, when such vacuum ultraviolet light is used as exposure light, the following problems have become apparent. That is, oxygen, water vapor, hydrocarbon gas existing in a space (such as the internal space of the lens barrel) through which the exposure light passes, or a cloudy substance on the surface of an optical element such as a lens element reacts with the exposure light. The problem is that an organic gas becomes a light-absorbing material that absorbs the exposure light.

  In addition, when there is a driving mechanism for driving an optical element, a stage, etc. in the exposure apparatus, it is volatilized from the coating material of the wire for supplying power to the driving mechanism and transmitting signals in a trace amount. An organic substance or the like can also be the light-absorbing substance. Furthermore, so-called degassing such as a volatile matter adhering to the inner wall of the optical element and the lens barrel that accommodates the optical element can also serve as the light-absorbing substance.

As the exposure light, in particular, when light having a short wavelength equal to or less than F ₂ laser light is employed, the exposure light emitted from the light source is greatly absorbed by the light-absorbing substance with respect to the exposure light of the ArF excimer laser light, The energy may be significantly reduced before reaching the substrate. As described above, when the energy of the exposure light itself decreases or the transmittance of the exposure light decreases due to the fogging of the optical element, the exposure efficiency of the exposure apparatus decreases and the product yield decreases.

Therefore, in recent years, an exposure apparatus has been developed that purges the interior space of the lens barrel through which the exposure light passes using an inert gas, for example, a purge gas such as nitrogen, helium, or argon. That is, a purge gas is supplied to the internal space, and a gas containing the light-absorbing substance is discharged out of the space.
Japanese Patent Laid-Open No. 11-233412 (Claims 1 to 4 and FIG. 2)

However, the conventional configuration is equipped with a purge mechanism for purging the interior space with the purge gas. However, as the exposure light, vacuum ultraviolet light, particularly when employing the light of F ₂ laser following a short wavelength, may be assumed that outside air impact of entering the internal space can not be ignored as was small.

  In particular, in a so-called divided lens barrel, one or a plurality of optical elements are collected and housed in independent lens barrel units, and one lens barrel is formed by stacking these lens barrel units. Outside air easily enters the internal space of the lens barrel from the gap formed between the units.

  In order to suppress the intrusion of outside air through the gaps between the lens barrel units, a configuration in which a packing made of, for example, a fluororesin is interposed between the end surfaces of the lens barrel units is conceivable. However, even if it is a fluororesin, the volatilized substances cannot be completely reduced to zero.

  Further, when assembling the lens barrel, it is necessary to adjust the optical axis between the optical elements accommodated in the lens barrel units. The optical axis of the optical element is mainly adjusted by adjusting the relative position of each lens barrel unit itself. Here, at the time of the adjustment, if the packing is interposed between the lens barrel units and crushed into a predetermined shape, it is necessary to move each lens barrel unit while distorting the packing. In such a case, the relative position between the lens barrel units after adjustment may change due to the elastic force of the packing.

  Furthermore, the possibility that the packing adheres to the joint surface of each lens barrel unit cannot be denied, and if such packing sticks, the position adjustment of each lens barrel unit itself may be difficult. On the other hand, in order to suppress the sticking of the packing, it is conceivable to reduce the amount of deformation of the packing by deepening the packing receiving groove. However, if the deformation amount of the packing is reduced, the tight adhesion of the packing to each lens barrel unit will be reduced, and the airtightness of the lens barrel will be reduced.

  The present invention has been made paying attention to such problems existing in the prior art. The purpose of this is to maintain a clean internal space and to accurately adjust the position of each lens barrel unit, and to provide an exposure apparatus and a device that can efficiently manufacture a highly integrated device. It is to provide a manufacturing method.

  In order to achieve the above object, the invention according to claim 1 is a lens barrel configured by laminating a plurality of lens barrel units each housing at least one optical element, wherein the lens barrel unit includes A first lens barrel unit having a joint portion; and a second lens barrel unit having a second joint portion that engages with the first joint portion of the first lens barrel unit. At least one of the lens barrel unit and the second lens barrel unit includes a first seal member that suppresses gas flow through the space between the first joint and the second joint. A gas flow suppression mechanism and a second gas flow suppression mechanism different from the first gas flow suppression mechanism are provided.

  In the first aspect of the present invention, the first gas flow suppression mechanism suppresses the intrusion of the outside air including the contaminants of the optical element and the light absorbing material of the exposure light into the inside of the lens barrel. Furthermore, even if a very small amount of pollutant or light-absorbing material passes through the first gas flow suppression mechanism or is generated by the first gas flow suppression mechanism, the pollutant or light-absorbing material is not transferred to the second gas flow suppression mechanism. The intrusion into the inner side of the lens barrel is suppressed by the suppression mechanism. Thereby, the amount of contaminants entering the lens barrel can be reduced, and the inside of the lens barrel can be kept clean. For this reason, the optical element can be hardly contaminated and the energy of the exposure light can be kept high.

  According to a second aspect of the present invention, in the operation of the first aspect of the present invention, the second gas flow suppression mechanism is configured such that the space between the first joint portion and the second joint portion is the same. It is a gas discharge mechanism that discharges gas to the outside.

  In the second aspect of the invention, in addition to the action of the first aspect of the invention, intrusion of outside air into the lens barrel is suppressed by the seal member. On the other hand, the volatile matter that is slightly volatilized from the seal member is discharged to the outside by the gas discharge mechanism. For this reason, the amount of contaminants that contaminate the optical element can be reduced, and the inside of the lens barrel can be kept clean.

  The invention according to claim 3 is the invention according to claim 2, wherein the gas discharge mechanism is disposed inside the seal member in a space between the first joint and the second joint. It is characterized in that it is provided.

  In the invention according to the third aspect, in addition to the action of the invention according to the second aspect, the volatile matter from the seal member toward the inner side of the lens barrel can be efficiently discharged to the outside. The inside can be kept cleaner.

  The invention according to claim 4 is the invention according to claim 2 or 3, wherein one of the seal member and the gas discharge mechanism is provided in the first lens barrel unit, and the seal The other of the member and the gas discharge mechanism is provided in the second lens barrel unit.

  In the invention according to the fourth aspect, in addition to the action of the invention according to the second or third aspect, it is not necessary to provide the seal member and the gas exhaust mechanism at the same joint portion. Processing can be performed easily.

  According to a fifth aspect of the present invention, in the first aspect of the invention, the second gas flow suppression mechanism is a second seal made of a material different from that of the seal member provided in the first gas flow suppression mechanism. It is characterized by including a member.

  The invention according to claim 6 is the invention according to claim 5, wherein the seal member is made of an elastic member, and the second seal member is made of a metal material that is deformed when the lens barrel units are stacked. It is characterized by this.

  In the inventions according to the fifth and sixth aspects, even if a very small amount of volatile matter is generated from the sealing member that suppresses the entry of contaminants and light-absorbing substances from the outside of the lens barrel, By using a metal material for the seal member, it is possible to suppress the entry of the volatile matter into the lens barrel.

  According to a seventh aspect of the present invention, in the lens barrel configured by laminating a plurality of lens barrel units that accommodate at least one optical element, the lens barrel unit includes a first joint portion. And a second lens barrel unit having a second joint portion that engages with the first joint portion of the first lens barrel unit, the first lens barrel unit and the first lens barrel unit. A seal member that suppresses gas flow through the space between the first joint portion and the second joint portion, and abuts or bites into at least one of the two lens barrel units. A third gas flow suppression mechanism including a convex portion is provided.

  According to the seventh aspect of the present invention, after adjusting the position of each lens barrel unit in the direction intersecting the optical axis of the optical element accommodated in the lens barrel unit, the convex portion is brought into contact with the seal member. Or you can bite. Thereby, after positioning each barrel unit accurately, the airtightness in the barrel can be maintained high, and the internal space of the barrel can be kept clean.

  The invention according to claim 8 is the invention according to claim 7, wherein the seal member is formed in a ring shape and divided at least at one place. It is.

  In the eighth aspect of the invention, in addition to the operation of the seventh aspect of the invention, the position of each barrel unit is adjusted, and then the seal member is easily attached to the barrel unit. Can do.

  The invention according to claim 9 is the invention according to claim 7 or 8, wherein the seal member is a first cross-section in a cross section of the optical element including the optical axis. And a plurality of seal surfaces parallel to the joint surface between the second joint portion and the second joint portion.

In the ninth aspect of the invention, in addition to the action of the invention of the seventh or eighth aspect, the airtightness in the lens barrel can be further enhanced.
The invention according to claim 10 is the invention according to any one of claims 7 to 9, wherein the seal is provided on one of the first joint and the second joint. A housing groove for housing the member; a pressing portion that presses the seal member on the other of the first joint portion and the second joint portion; and a displacement mechanism that displaces the pressing portion toward the seal member; Is provided.

  In the invention according to claim 10, in addition to the action of the invention according to any one of claims 7 to 9, the position of each lens barrel unit is adjusted, and then the holding portion is displaced. By displacing to the seal member side by the mechanism and pressing the seal member by the pressing portion, the airtightness in the lens barrel can be imparted. Therefore, the position adjustment of each lens barrel unit can be performed with high accuracy, and the internal space of the lens barrel can be kept clean.

  The invention according to claim 11 is the invention according to claim 10, wherein the first joint and the second joint are fastened to at least one of the pressing part and the displacement mechanism. Thus, an inclined surface for displacing the pressing portion toward the seal member is formed.

  Here, when the lens barrel units stacked are bonded and fixed, it is necessary to tighten them in the arrangement direction of the lens barrel units. In a lens barrel that houses an optical system in which optical elements are arranged so as to intersect with the direction of gravity, the stacked lens barrel units are tightened up and down. In the invention according to the eleventh aspect, in addition to the action of the invention according to the tenth aspect, the force to be tightened up and down by the action of the inclined surface can be converted into the force to the inner side of each barrel unit. . For this reason, by tightening each lens barrel unit, the seal member and the convex portion arranged on the inner side of the tightening portion of each lens barrel unit can be easily brought into contact or bite.

  According to a twelfth aspect of the present invention, in the lens barrel configured by laminating a plurality of lens barrel units that accommodate at least one optical element, the lens barrel unit includes a first joint portion. And a second lens barrel unit having a second joint portion that engages with the first joint portion of the first lens barrel unit, and the first joint portion includes: A connecting portion connected to the first barrel unit; and a separating portion that is outside the connecting portion and separated from the connecting portion with respect to the optical axis of the optical element, and the second joint portion and the connecting portion. It has a sealing member arrange | positioned between the side surface of a part, and the side surface of the said isolation | separation part, It is characterized by the above-mentioned.

  In the invention according to claim 12, the position of each lens barrel unit is adjusted by tightening the separating portion with respect to the connecting portion and bringing the seal member into close contact with the side surface of the second connecting portion and the connecting portion. Later, the airtightness of the lens barrel can be easily increased.

  According to a thirteenth aspect of the present invention, in the lens barrel configured by laminating a plurality of lens barrel units that accommodate at least one optical element, the lens barrel unit includes a first joint portion. And a second lens barrel unit having a second joint portion that engages with the first joint portion of the first lens barrel unit, the first lens barrel unit and the first lens barrel unit. At least one of the two lens barrel units has a gas flow suppression mechanism including a seal member that suppresses the flow of gas through the space between the first joint and the second joint, The seal member is made of metal gallium.

  Metallic gallium has a melting point of 30 ° C. For this reason, in the invention according to the thirteenth aspect, after adjusting the position of each lens barrel unit, the metal gallium is poured into the housing groove of the seal member in a slightly heated and melted state, and is allowed to cool. The airtightness of the tube can be increased. Moreover, since metal gallium has almost no volatile matter, the inside of the lens barrel can be kept extremely clean.

  According to a fourteenth aspect of the present invention, in the invention according to any one of the first to thirteenth aspects of the present invention, the at least one optical element is a substrate for an image of a pattern formed on a mask. It is a part of the projection optical system to be transferred on.

  In the invention described in claim 14, in addition to the action of the invention described in any one of claims 1 to 13, the optical performance of the projection optical system is improved, and the image of the pattern is displayed on the substrate. Can be transferred with high accuracy.

  According to a fifteenth aspect of the present invention, in an exposure apparatus that exposes an image of a pattern formed on a mask on a substrate under exposure light, at least one element disposed in an optical path of the exposure light. The optical element is housed in the lens barrel according to any one of claims 1 to 14.

In the invention according to the fifteenth aspect, a highly integrated device can be efficiently manufactured.
According to a sixteenth aspect of the present invention, in the device manufacturing method including the lithography step, the exposure is performed using the exposure apparatus according to the fifteenth aspect in the lithography step.

In the invention of the sixteenth aspect, a highly integrated device can be efficiently manufactured.
Next, technical ideas further included in the inventions described in the above claims will be described below together with their actions.

  (1) The first or second joint portion is provided with an accommodation groove for accommodating the seal member so as to open upward in the gravitational direction. The lens barrel according to one item.

  If comprised in this way, in addition to the effect | action of the invention as described in any one of the said Claims 2-4, a sealing member can be easily hold | maintained with respect to a lens-barrel unit, and a lens-barrel The assembly work of the unit can be easily performed.

  (2) The second gas flow suppression mechanism includes a seal mechanism that fits in an uneven relationship between the first lens barrel unit and the second lens barrel unit. The lens barrel described.

  If comprised in this way, the channel | path narrowly bent will be formed in the fitting part of the uneven | corrugated relationship between the 1st and 2nd lens-barrel units laminated | stacked. In this narrowly bent path, the conductance of the gas flow is significantly reduced (the resistance of the gas flow is significantly increased). For this reason, even if a very small amount of volatile matter is generated from the sealing member that suppresses intrusion of contaminants from outside the lens barrel, the volatile matter suppresses intrusion into the lens barrel through the bent passage. can do.

  (3) The mirror according to claim 10 or 11, wherein the pressing portion includes a thin plate portion formed of a material integral with the first lens barrel unit or the second lens barrel unit. Tube.

  If comprised in this way, in addition to the effect | action of the invention of the said Claim 10 or Claim 11, since the holding | suppressing part is formed with the material integral with the 1st or 2nd lens-barrel unit, it is a lens-barrel. There is no formation of a gap that directly communicates the inside and outside of the. For this reason, the inside of a lens-barrel can be made into a more airtight state.

  As described above in detail, according to the present invention, the internal space can be accurately separated from the outside air, and the position of each lens barrel unit can be adjusted accurately, and a highly integrated device. It is possible to provide an exposure apparatus and a device manufacturing method that can efficiently manufacture the device.

(First embodiment)
A first embodiment in which the present invention is embodied in a semiconductor device manufacturing exposure apparatus and the same exposure apparatus will be described below with reference to FIGS.

As shown in FIG. 1, the exposure apparatus includes an exposure light source 21, an exposure apparatus body 22, and a beam matching unit (hereinafter referred to as “BMU”) 23. The exposure light source 21 is a laser light source that emits, for example, F ₂ laser light (λ = 157 nm) as the exposure light EL. The BMU 23 includes a plurality of optical elements, and the plurality of optical elements are accommodated in the BMU chamber 29. The BMU 23 optically connects the exposure light source 21 and the exposure apparatus main body 22, and the exposure light EL emitted from the exposure light source 21 through the BMU 23 is guided into the exposure apparatus main body 22.

  The exposure apparatus main body 22 transfers an image of a pattern formed on a reticle R as a mask onto a wafer W as a substrate by irradiation with exposure light EL. Hereinafter, a schematic configuration of the exposure apparatus main body 22 will be described.

  In the chamber 24 of the exposure apparatus main body 22, an illumination system barrel 25 as a barrel and a projection system barrel 27 as a barrel are sequentially arranged in the optical axis direction of the exposure light EL introduced via the BMU 23. ing. The chamber 24 includes an air conditioner (not shown), and the interior of the chamber 24 is maintained at a predetermined temperature and humidity under the control of the main control system 30 that controls the operation of the entire exposure apparatus main body. It is like that.

  An illumination optical system 33 for illuminating the reticle R is accommodated in the illumination system column 25. The illumination optical system 33 includes optical elements such as a plurality of mirrors 34, a fly-eye lens (which may be a rod integrator) 35 that forms an optical integrator, and a condenser lens 36. The fly-eye lens 35 forms a large number of secondary light sources that illuminate the reticle R with a uniform illuminance distribution on the rear surface thereof when the exposure light EL from the exposure light source 21 is incident. Behind the fly-eye lens 35, a reticle blind 37 for shaping the shape of the exposure light EL is disposed.

  Disc-shaped parallel flat glass 38 is disposed in the BMU side opening 25a and the mask side opening 25b at both ends of the illumination system barrel 25. The parallel flat glass 38 is made of a material (synthetic quartz, fluorite, etc.) that transmits the exposure light EL. A parallel flat glass 38 is also arranged at the open end of the BMU chamber 29. A bellows 29 a is mounted between the BMU chamber 29 and the BMU side end of the illumination system barrel 25, and the space through which the exposure light EL passes is partitioned from the space of the chamber 24.

  Further, the illumination system lens barrel 25 is partitioned into illumination hermetic chambers 39 that form a plurality of (five in this example) internal spaces via parallel flat glass 38. Each illumination hermetic chamber 39 accommodates optical elements such as a mirror 34, a fly-eye lens 35, and a condenser lens 36, and a reticle blind 37 alone or in combination.

  Further, in the projection system column 27, a projection optical system 42 for projecting an image of the pattern on the reticle R illuminated by the illumination optical system 33 onto the wafer W is accommodated. The projection optical system 42 includes a plurality (two in this example) of cover glasses 43 and a plurality (three in this example) of lens elements 44 as optical elements. A projection hermetic chamber 45 serving as an internal space is defined in the projection system barrel 27 by the inner wall of the projection system barrel 27 and the cover glass 43.

  Further, a reticle stage RST is disposed between the projection optical system 42 and the illumination optical system 33. By this reticle stage RST, the reticle R on which a predetermined pattern is formed is held so as to be movable in a plane orthogonal to the optical axis of the exposure light EL. A wafer stage WST is disposed on the image plane side of the projection optical system 42. By this wafer stage WST, the wafer W coated with a photoresist having photosensitivity to the exposure light EL can be moved in a plane perpendicular to the optical axis of the exposure light EL, and finely moved along the optical axis. It is designed to be held as possible.

  A movable mirror that reflects a laser beam from an interferometer (not shown) is fixed to the end of the reticle stage RST. The position of the reticle stage RST in the scanning direction is constantly detected by the interferometer, and is driven in the predetermined scanning direction under the control of the main control system 30.

  Further, a movable mirror that reflects a laser beam from an interferometer (not shown) is fixed to the end of wafer stage WST, and the position in the plane where wafer stage WST is movable is always detected by the interferometer. The Wafer stage WST is configured to be movable not only in the scanning direction but also in a direction perpendicular to the scanning direction under the control of main control system 30. As a result, a step-and-scan operation in which scanning exposure is repeated for each shot area on the wafer W is possible.

  Here, when the circuit pattern on the reticle R is scanned and exposed to the shot area on the wafer W by the step-and-scan method, the illumination area on the reticle R is shaped into a rectangle (slit) by the reticle blind 37. Is done. This illumination area has a longitudinal direction perpendicular to the scanning direction on the reticle R side. Then, by scanning the reticle R at a predetermined speed Vr during exposure, the circuit pattern on the reticle R is sequentially illuminated from one end side to the other end side in a slit-like illumination region. As a result, the circuit pattern on the reticle R in the illumination area is projected onto the wafer W via the projection optical system 42 to form a projection area.

  Here, since the wafer W is in an inverted imaging relationship with the reticle R, the wafer W is scanned in a direction opposite to the scanning direction of the reticle R at a predetermined speed Vw in synchronization with the scanning of the reticle R. As a result, the entire shot area of the wafer W can be exposed. The scanning speed ratio Vw / Vr is in accordance with the reduction magnification of the projection optical system 42, and the circuit pattern on the reticle R is accurately reduced and transferred onto each shot area on the wafer W.

  A purge gas supply system 50 is connected to the openings 49 formed in the walls of the BMU chamber 29, the illumination hermetic chambers 39, and the projection hermetic chamber 45. An inert gas as a purge gas is supplied to the BMU chamber 29 and the chambers 39 and 45 from the tank 51 in the utility plant of the microdevice factory via the purge gas supply system 50 and the openings 49. It has become. Here, the inert gas is a single gas selected from nitrogen, helium, neon, argon, krypton, xenon, radon, or the like, or a mixed gas thereof.

Here, in this purge gas, it accumulates on the surfaces of optical elements such as the mirror 34, fly-eye lens 35, condenser lens 36, parallel flat glass 38, cover glass 43 and lens element 44 under irradiation of the exposure light EL. Contaminants that cause a clouding phenomenon, or light-absorbing substances such as oxygen that strongly absorbs F ₂ laser light may be included as impurities.

  For this reason, in the air supply pipe 52 of the purge gas supply system 50, the filter 53 and the purge gas for removing impurities including the pollutants and light absorbing substances contained in the purge gas are adjusted to a predetermined temperature, and the purge gas contains A temperature-controlled dryer 54 that removes moisture is interposed. The BMU chamber 29 and the chambers 39 and 45 are connected to an exhaust duct 56 of a semiconductor element manufacturing factory via a purge gas discharge pipe 55.

  The contaminants present in the BMU chamber 29 and the chambers 39 and 45 are, for example, organic silicon compounds, ammonium salts, sulfates, volatilized substances from the resist on the wafer W, and components used for driving parts. The volatile matter from the slidability improving agent, the volatile matter from the coating layer of the wiring for supplying power or signals to the electric components in the chamber 24, and the like. Therefore, the purge gas discharged to the outside of the factory may contain these contaminants.

Next, the configuration of the projection system barrel 27 that houses the projection optical system 42 will be described.
As shown in FIG. 2, the projection system barrel 27 includes a plurality of barrel units 59 that hold the lens elements 44.

  Of the lens barrel unit 59, the air supply pipe 52 of the purge gas supply system 50 is connected to the lens barrel units 59 a located at both ends of the projection system lens barrel 27. On the other hand, in the lens barrel unit 59, the lens barrel unit 59 b positioned substantially in the center of the projection system lens barrel 27 has a support flange FLG for supporting the projection system lens barrel 27 on the gantry 22 a of the exposure apparatus main body 22. Is provided. A purge gas discharge pipe 55 is connected to the lens barrel unit 59b.

  Here, the lens element 44 is held by a holding member (not shown) in the lens barrel unit 59b provided with the support flange FLG and the lens barrel unit 59 disposed below the lens barrel unit 59b. . Further, at least one lens element 44 (only one is shown in FIG. 2) can be moved by a holding member (not shown) in each of the lens barrel units 59 arranged above the support flange FLG, that is, on the reticle R side. Is held in. The lens element 44 is driven under the control of the main control system 30 by a piezo element 62 attached to the peripheral wall of the lens barrel unit 59.

  In addition, since the lens element 44 is held by the holding member at, for example, three locations on the outer periphery thereof, a gap is generated between the lens element 44 and the holding member with respect to the inner wall of the lens barrel unit 59.

  For this reason, the purge gas supplied to the projection system barrel 27 to the barrel units 59a at both ends thereof passes through the gap between the inner wall of each barrel unit 59 and the lens element 44, and is almost in the middle of the barrel unit. 59b is reached. Along with the flow of the purge gas, the gas in the projection hermetic chamber 45 of the projection system column 27 is replaced with the purge gas. As a result, the gas containing the light-absorbing substance and the pollutant existing in the projection hermetic chamber 45 passes through the purge gas discharge pipe 55 and the exhaust duct 56 connected to the lens barrel unit 59b in the substantially central portion. It is supposed to be discharged.

  As shown in FIG. 3, a first flange portion 60a as a first joint portion is formed on a first end surface 59c as a joint surface in the first lens barrel unit 59b1. Further, in the second lens barrel unit 59b2 joined to the first lens barrel unit 59b1, the second end surface 59d as the joining surface facing the first end surface 59c of the first lens barrel unit 59b1 has a second end surface 59d. A second flange 60b is formed as a second joint. Here, each of the first and second lens barrel units 59b1 and 59b2 has a first flange portion 60a on the first end surface 59c, and the second end surface 59d opposite to the first end surface 59c. Has a second collar 60b.

  In a lens barrel in which the lens element 44 is arranged so as to intersect with the gravity direction, that is, a so-called horizontal type barrel unit 59, the first collar portion 60a is disposed on the upper side in the gravity direction, and the second collar portion 60b. Is arranged on the lower side in the direction of gravity.

  As shown in FIGS. 3 and 4, the first flange 60 a is recessed with an annular accommodation groove 65 that opens upward in the direction of gravity. The accommodation groove 65 accommodates an O-ring 66 as a first gas flow suppression mechanism, a seal member, and an elastic member. The O-ring 66 is made of an elastic material with little volatilized material, for example, fluorine rubber.

  As shown in FIGS. 3 and 5, the second collar part 60 b is opposed to the housing groove 65 of the first collar part 60 a in a state where the first and second lens barrel units 59 b 1 and 59 b 2 are joined. Accordingly, an annular groove 67 is formed at a position on the inner side of the lens barrel unit 59 and opens downward in the direction of gravity and forms a part of the gas discharge mechanism. A plurality (three in FIG. 5) of exhaust holes 68 are formed at equal intervals on the bottom surface of the annular groove 67. An exhaust device 70 (see FIG. 2) that forms part of a gas exhaust mechanism for decompressing the inside of the annular groove 67 is connected to the exhaust hole 68 via an exhaust pipe 69.

  As shown in FIG. 2, the exhaust device 70 includes a vacuum pump 71 and a switching valve 72. In the vacuum pump 71, when the lens barrel units 59 are stacked with their relative positions in the plane orthogonal to the optical axis of the lens elements 44 adjusted, the vacuum pumps 71 are provided in the annular groove 67 as necessary. The gas is exhausted and the pressure is reduced.

  For example, when the exposure light EL is allowed to pass through the projection system barrel 27, the switching valve 72 causes the annular groove 67 and the vacuum pump 71 to communicate with each other and the annular groove 67 is decompressed. In this case, as shown in FIG. 3, due to the presence of the O-ring 66, the projection hermetic chamber 45 of the projection system barrel 27 is isolated from the outside air. And the gas containing the gaseous organic substance which exists between the 1st collar part 60a and the 2nd collar part 60b of each lens-barrel unit 59 and is volatilized slightly from the O-ring 66 is in the annular groove 67. And is evacuated by the vacuum pump 71.

  In the projection system column 27, in this isolated state, the inside of the projection hermetic chamber 45 is in consideration of the amount of gas exhausted by the exhaust device 70 through the annular groove 67 between the lens barrel units 59. The purge gas is supplied from the purge gas supply system 50 so as to be equal to or positive with the atmospheric pressure.

  As shown in FIG. 2, when the relative position of each barrel unit 59 of the projection system barrel 27 is adjusted, the switching valve 72 blocks between the annular groove 67 and the vacuum pump 71. The decompression in the annular groove 67 is released. The switching valve 72 allows the inside of the annular groove 67 to communicate with the air supply pipe 52 of the purge gas supply system 50 so that the purge gas is supplied into the annular groove 67. In this case, when the purge gas is supplied at a predetermined pressure between the first flange portion 60a and the second flange portion 60b of each lens barrel unit 59 and the bolt 61 is loosened, the collapse amount of the O-ring 66 is slightly reduced. The Thereby, the frictional force between each lens barrel unit 59 and the O-ring 66 is reduced, and each lens barrel unit 59 can be moved in a plane intersecting the optical axis of the lens element 44.

Therefore, according to the first embodiment, the following effects can be obtained.
(A) In the projection system lens barrel 27, a plurality of first lens barrel units 59b1 that are stacked are provided with first and second flange portions 60a and 60b that are joined to the second lens barrel unit 59b2 that is stacked. Is provided. And between the 1st and 2nd collar parts 60a and 60b, the O-ring 66 which suppresses the distribution | circulation of the gas inside and outside the lens barrel unit 59 via between the 1st and 2nd collar parts 60a and 60b. It is intervened. Further, an annular groove 67 connected to the exhaust device 70 for discharging the gas in the space between the first and second collar parts 60a, 60b to the outside of the lens barrel unit 59 is formed in the second collar part 60b. .

  For this reason, intrusion of outside air into the projection system barrel 27 is suppressed by the O-ring 66. On the other hand, the volatilized matter that is slightly volatilized from the O-ring 66 and becomes a pollutant that contaminates the lens element 44 is discharged to the outside of the projection system barrel 27 by the exhaust device 70 through the annular groove 67. Thereby, the amount of contaminants entering the projection system column 27 can be reduced, and the projection system column 27 can be kept clean. Accordingly, the optical performance of the projection optical system 42 is improved, and the pattern image on the reticle R can be transferred onto the wafer W with high accuracy.

  (A) In the projection system lens barrel 27, the gas in the space between the first and second flange portions 60a and 60b joined to each other on the inner side of the O-ring 66 in the first and second flange portions 60a and 60b. An annular groove 67 is provided for discharging the gas. For this reason, the volatile matter that is generated from the O-ring 66 in a very small amount and goes toward the inside of the projection system barrel 27 can be efficiently discharged to the outside of the projection system barrel 27. Therefore, the interior of the projection system barrel 27 can be kept clean.

  (C) In the projection system barrel 27, the O-ring 66 is held in the housing groove 65 of the first flange 60a, and the annular groove 67 connected to the exhaust device 70 is provided in the second flange 60b. For this reason, it is not necessary to provide the accommodation groove 65 for accommodating the O-ring 66, the annular groove 67, and the exhaust hole 68 opened in the annular groove 67 in the same first or second flange portion 60a, 60b. The unit 59 can be easily processed.

  (D) In the projection system barrel 27, the first groove 60a is provided with a receiving groove 65 for receiving the O-ring 66 so as to open upward in the gravity direction. For this reason, the O-ring 66 can be easily held with respect to the lens barrel unit 59, and the assembling work of the lens barrel unit 59 can be easily performed.

(Second Embodiment)
In the second embodiment, as shown in FIG. 6, an annular groove 67 is formed in the first flange portion 60a. That is, the accommodation groove 65 for accommodating the O-ring 66 and the annular groove 67 are formed in the same first flange portion 60a.

Therefore, according to the second embodiment, in addition to the effects equivalent to the effects described in (a), (b) and (d) in the first embodiment, the following effects can be obtained.
(E) In the lens barrel unit 59, the housing groove 65 and the annular groove 67 are formed in the first flange 60a. For this reason, the structure of the 2nd collar part 60b in the lens-barrel unit 59 can be simplified.

(Third embodiment)
In the third embodiment, as shown in FIG. 7, an annular groove 67 is formed in the first flange 60a, and an accommodation groove 65 for accommodating the O-ring 66 is formed in the second flange 60b. That is, in the lens barrel unit 59 of the third embodiment, the housing groove 65 and the annular groove 67 are oppositely arranged as compared with the lens barrel unit 59 of the first embodiment.

According to the third embodiment, the same effects as the effects described in (a) to (c) in the first embodiment can be obtained.
(Fourth embodiment)
In the fourth embodiment, as shown in FIG. 8, an accommodation groove 65 for accommodating the O-ring 66 is formed in the second flange portion 60b. That is, the accommodation groove 65 for accommodating the O-ring 66 and the annular groove 67 are formed in the same second flange portion 60b.

Therefore, according to the fourth embodiment, it is possible to obtain an effect equivalent to the effects described in (a) and (b) in the first embodiment and (e) in the second embodiment.
(Fifth embodiment)
In the lens barrel unit 59 of the fifth embodiment, as shown in FIG. 9, the second seal member is provided inside and outside the accommodation groove 65 that accommodates the O-ring 66 constituting the first seal member in the first flange portion 60 a. As a result, a plating layer 81 made of gold or silver is formed. When the second collar portion 60b of the second lens barrel unit 59b2 is stacked on the first collar portion 60a, the plated layer 81 is slightly deformed by the weight of the second lens barrel unit 59b2, and the first collar portion 59b2 It plays the role which improves the adhesiveness of the collar part 60a and the 2nd collar part 60b.

Therefore, according to the present embodiment, the following effects can be obtained.
(F) In the lens barrel unit 59, an O-ring 66 and a plating layer 81 are provided as a mechanism for suppressing the flow of gas inside and outside the lens barrel unit 59. For this reason, the O-ring 66 can suppress the entry of outside air into the lens barrel unit 59. Then, it is possible to suppress volatilization generated from the O-ring 66 from entering the inside of the lens barrel through the space between the first and second flange portions 60a and 60b by the plating layer 81. it can.

  (G) In the lens barrel unit 59, a very small amount of volatilized matter generated from the O-ring 66 is generated in the first collar portion 60a through the space between the first and second collar portions 60a and 60b. A gold or silver plating layer 81 is formed to suppress intrusion into the film. For this reason, the plating layer 81 not only hardly generates volatilized substances, but also can suppress the intrusion of volatilized substances generated from the O-ring 66 into the projection system barrel 27 with a very small amount. Therefore, the inside of the projection system barrel 27 can be kept clean.

(Sixth embodiment)
In the lens barrel unit 59 of the sixth embodiment, as shown in FIG. 10, in the first flange portion 60 a and the second flange portion 60 b, inside the storage groove 65 that stores the O-ring 66 that forms the first seal member. A labyrinth seal 84 is formed as a second gas flow suppression mechanism. The labyrinth seal 84 includes two narrow grooves 85 formed in the first flange 60a and two protrusions 86 formed in the second flange 60b. These narrow grooves 85 and the protrusions 86 are formed in an annular shape in the first flange portion 60a and the second flange portion 60b. When the first lens barrel unit 59b1 and the second lens barrel unit 59b2 are stacked, the protrusion 86 enters the narrow groove 85 to form a nested structure.

  The labyrinth seal 84 is not shut off in a state where both sides of the labyrinth seal 84 are completely sealed. However, in the narrow and bent passage formed in the labyrinth seal 84, the conductance of the gas flow is significantly reduced. In other words, the resistance of the gas flow is remarkably increased in this passage. For this reason, the amount of gas including volatilized substances from the O-ring 66 and reaching the inside of the lens barrel unit 59 can be reduced to a level that can be almost ignored.

  Here, the gap between the protrusion 86 and the inner wall surface of the narrow groove 85 in the labyrinth seal 84 is the maximum adjustment width at the time of adjusting the position of each lens barrel unit 59 in the direction intersecting the optical axis of the lens element 44. It is desirable to make it larger. By doing so, it is possible to adjust the position of each barrel unit 59 while suppressing the entry of light-absorbing substances and contaminants from the outside of the barrel unit 59 by the O-ring 66.

Therefore, according to the present embodiment, the following effects can be obtained.
(H) In this projection system lens barrel 27, a labyrinth seal that fits between the first collar portion 60a of the first lens barrel unit 59b1 and the second collar portion 60b of the second lens barrel unit 59b2 with an uneven relationship. 84 is formed. For this reason, by providing the O-ring 66 outside the labyrinth seal 84, it is possible to suppress the entry of light-absorbing substances and contaminants from the outside of the lens barrel unit 59, and a very small amount of volatilization from the O-ring 66. An object can be prevented from entering the inside of the lens barrel unit 59.

(Seventh embodiment)
In the lens barrel unit 59 of the seventh embodiment, as shown in FIG. 11, a part of the third gas flow suppression mechanism is formed on the first collar portion 60a of the first lens barrel unit 59b1, and as a sealing member. A gasket 91 having a donut shape is embedded. On the other hand, the second collar portion 60b of the second lens barrel unit 59b2 joined to the first collar portion 60a constitutes a part of the third gas flow suppression mechanism that contacts the gasket 91 and serves as a convex portion. An arcuate convex portion 92 is formed.

  The gasket 91 is formed of, for example, a soft metal such as copper (oxygen-free copper), gold, aluminum, indium, and gallium, a soft alloy such as solder, and a resin material that generates little volatilized material such as a fluororesin. Yes. Further, the arc-shaped convex portion 92 has an annular shape on the second flange portion 60b, and is formed so that its cross section has an arc shape.

Therefore, according to the present embodiment, the following effects can be obtained.
(K) In this lens barrel unit 59, a gasket 91 made of a soft metal is embedded in the first flange portion 60a of the first lens barrel unit 59b1, and the gasket 91 is provided with the second lens barrel unit 59b2. The arc-shaped convex part 92 of the 2 collar part 60b contact | abuts. The arcuate protrusion 92 abuts on the gasket 91 and slightly presses the gasket 91, so that the inside of the lens barrel unit 59 can be kept airtight.

  (G) In this lens barrel unit 59, an arcuate convex portion 92 that abuts on the gasket 91 of the first flange 60a is formed in an arcuate cross section. For this reason, the arc-shaped convex portion 92 hardly damages the surface of the gasket 91, and the arc-shaped convex portion 92 is suppressed from being caught on the surface of the gasket 91 when adjusting the position of each lens barrel unit 59. Thereby, the position of each lens barrel unit 59 can be adjusted in a direction intersecting the optical axis of the lens element 44 in a state where the interior of the lens barrel unit 59 is kept airtight.

(Eighth embodiment)
In the lens barrel unit 59 of the eighth embodiment, as shown in FIG. 12, the accommodation groove 95 is recessed in the first flange portion 60a of the first lens barrel unit 59b1. On the other hand, the convex part 96 is formed in the 2nd collar part 60b of the 2nd lens-barrel unit 59b2. A sealing material 98 as a seal member is interposed so as to be accommodated in the accommodation groove 95 and to surround the convex portion 96.

  As this sealing material 98, metal gallium, lacquer, etc. are suitable, for example. These sealing materials 98 can be injected between the housing groove 95 and the convex portion 96 after adjusting the position of each lens barrel unit 59 in the direction intersecting the optical axis of the lens element 44.

Therefore, according to the present embodiment, the following effects can be obtained.
(Sa) Metallic gallium has a melting point of 30 ° C., which is close to room temperature, slightly warmed to a molten state, injected between the accommodation groove 95 and the convex portion 96, and left to cool at room temperature in the clean room. Solidified. For this reason, the airtightness of the lens barrel unit 59 can be easily increased. Moreover, since the metal gallium has almost no volatilized substances, the inside of the projection system column 27 can be kept extremely clean.

  (Shi) Moreover, lacquer has urushiol as a main component, and the molecular state changes without excess or deficiency (without generating extra molecular chains) at the stage of solidification. For this reason, in the solidified state, the amount of released gas can be suppressed to a very small amount that does not affect the lens element 44 even if it enters the lens barrel unit 59.

(Ninth embodiment)
In the lens barrel unit 59 of the ninth embodiment, as shown in FIG. 13, the first collar part 60a of the first lens barrel unit 59b1 is divided into a substantially annular outer collar part 101 and inner collar part 102. Has been. The outer flange 101 is divided into two parts in the circumferential direction of the first lens barrel unit 59b1.

  On the inner peripheral side of the outer flange portion 101, a receiving portion 104 that forms part of the third gas flow suppression mechanism and receives the gasket 103 as a seal member is formed in a step shape. Further, a flange 105 protruding in the outer peripheral direction is formed on the first end surface 59c side of the inner flange 102. And the accommodation space 106 of the gasket 103 enclosed by the receiving part 104, the collar part 105, and the 2nd collar part 60b is formed between the 1st collar part 60a and the 2nd collar part 60b.

  The gasket 103 has a planar annular shape and is divided into two in the circumferential direction. The split surface of one gasket 103 is formed in a slope shape so as to be slidable in contact with the split surface of the other gasket 103. In addition, two seal surfaces 107a and 107b that are parallel to each other in a stepped state are formed on the surface of the gasket 103 on the second flange portion 60b side, and these seal surfaces 107a and 107b are the first seal portion 107a of the first flange portion 60a. The end face 59c and the second end face 59d are arranged in parallel. The gasket 103 is disposed such that the seal surface 107 a faces the second flange 60 b and the seal surface 107 b faces the flange 105 of the inner flange 102. The gasket 103 is made of, for example, a soft metal such as copper (oxygen-free copper), gold, aluminum, indium, or gallium, a soft alloy such as solder, or a resin material that generates little volatilized material such as a fluororesin. Has been.

  The portion of the second flange 60b facing the seal surface 107a and the portion of the flange 105 facing the seal surface 107b constitute a part of the third gas flow suppression mechanism and have a triangular cross section as a convex portion. The claw portion 108 is formed in an annular shape.

  And in the state which accommodated the gasket 103 in the accommodation space 106 between the 2nd collar part 60b, the inner side collar part 102, and the outer side collar part 101, the outer side collar part 101 is bolt 61 with respect to the said 2nd collar part 60b. When tightened and fixed, the gasket 103 is displaced toward the second flange portion 60b and the flange portion 105 via the receiving portion 104. Due to this displacement, the claw portion 108 of the second flange portion 60 b bites into the seal surface 107 a of the gasket 103, and the claw portion 108 of the flange portion 105 bites into the seal surface 107 b of the gasket 103, respectively. Sex is to be secured.

  In the ninth embodiment using the gasket 103, first, after adjusting the position of each lens barrel unit 59 in the direction intersecting the optical axis of the lens element 44 accommodated in the lens barrel unit 59, It is necessary to fix the outer flange 101 to the second flange 60b.

Therefore, according to the present embodiment, the following effects can be obtained.
(Su) In the lens barrel unit 59, in a state where the outer collar portion 101 is fastened and fixed to the second collar portion 60b, the claw portions 108 of the second collar portion 60b and the inner collar portion 102 are connected to the seal surfaces 107a, It bites into 107b. For this reason, after each lens barrel unit 59 is accurately positioned, the airtightness in the projection system barrel 27 can be maintained high, and the internal space of the projection system barrel 27 can be kept clean. .

  (C) In the lens barrel unit 59, the outer flange portion 101 and the gasket 103 are divided into two in the circumferential direction of the lens barrel unit 59. Therefore, the gasket 103 can be easily attached to the lens barrel unit 59 after adjusting the position of each lens barrel unit 59.

  (So) In this barrel unit 59, the gasket 103 has a plurality of seal surfaces 107a and 107b parallel to the second end surface 59d of the second flange 60b. For this reason, the airtightness in the projection system barrel 27 can be further enhanced.

(10th Embodiment)
In the lens barrel unit 59 of the tenth embodiment, as shown in FIG. 14, in the ninth embodiment, the upper first collar portion 60a and the second collar portion 60b in the projection system lens barrel 27 are closer to the lens barrel unit. 59 is formed so as to increase the amount of protrusion from the outer peripheral surface. Further, the gasket 103 has an annular shape without being divided in the circumferential direction of the lens barrel unit 59. And the protrusion amount of each 1st and 2nd collar part 60a, 60b is set so that the gasket 103 arrange | positioned between the 1st and 2nd collar part 60a, 60b immediately above may not interfere.

Therefore, according to the present embodiment, the following effects can be obtained.
(T) In the projection system barrel 27, the first and second flange portions 60a and 60b on the lower side are formed so that the protruding amount from the outer peripheral surface of the barrel unit 59 becomes smaller. For this reason, the diameter of the gasket 103 is so small that it is arrange | positioned between the 1st and 2nd collar part 60a, 60b of the lower side, and is arrange | positioned between the 1st and 2nd collar part 60a, 60b of an upper side. By making it as large as possible, the gasket 103 that is not divided in the circumferential direction can be used. Therefore, the sealing performance in the gasket 103 is improved, and the airtightness in the projection system barrel 27 can be improved.

(Eleventh embodiment)
In the lens barrel unit 59 of the eleventh embodiment, as shown in FIG. 15, in the ninth embodiment, a part of the third gas flow suppressing mechanism is formed and two rectangular sections are used as seal members. A gasket 111 is used. Further, the outer flange portion 101 has a stepped portion 112 formed on the receiving portion 104 facing the gasket 111. A claw portion 108 that bites into the gasket 111 is also formed in each step of the step portion 112.

Even if comprised in this way, not only the effect similar to 9th Embodiment is exhibited, but the following effects are exhibited.
(H) In this barrel unit 59, two gaskets 111 having a rectangular cross section are used. For this reason. The configuration of the gasket 111 can be simplified, and the manufacturing cost of the lens barrel unit 59 can be reduced.

(Twelfth embodiment)
In the lens barrel unit 59 of the twelfth embodiment, as shown in FIG. 16, the housing groove 121 is recessed in the first collar portion 60a of the first lens barrel unit 59b1. The accommodation groove 121 accommodates a gasket 122 that forms a part of the third gas flow suppression mechanism and has a rectangular cross section as a seal member. A claw portion 108 having a triangular cross section is formed on the bottom surface of the housing groove 121.

  Further, the second collar portion 60b of the second lens barrel unit 59b2 is provided with a pressing ring 123 as a displacement mechanism and a washer 124 as a pressing portion on the outer peripheral side thereof. The washer 124 is disposed on the gasket 122 side, and a claw portion 108 is formed at a portion facing the gasket 122.

  A threaded portion 125 is formed on the inner peripheral surface of the presser ring 123 and the outer peripheral surface of the second flange portion 60b facing the inner peripheral surface. The holding ring 123 is screwed to the second flange 60b so as to be relatively movable in the optical axis direction of the lens element 44 accommodated in the lens barrel unit 59. Then, when the presser ring 123 is screwed to the first flange portion 60a side, the washer 124 is also displaced to the first flange portion 60a side. As a result, the washer 124 pushes down the gasket 122, and the washer 124 and the claw portion 108 of the housing groove 121 bite into the gasket 122.

  In the lens barrel unit 59, the gasket 122 is first accommodated between the first flange 60a and the washer 124, and the holding ring 123 is screwed away in a direction away from the first flange 60a. In this state, the position of each lens barrel unit 59 is adjusted in the direction intersecting with the optical axis of the lens element 44 accommodated therein. Then, the holding ring 123 is screwed to the first flange 60a side, the gasket 122 is pressed by the washer 124, and the washer 124 and the claw portion 108 of the receiving groove 121 are bitten into the gasket 122, so that the inside of the projection system barrel 27 Ensure airtightness.

According to this embodiment, the following effects are produced.
(T) In the lens barrel unit 59, the housing groove 121 is provided in the first flange 60a, the washer 124 that presses the gasket 122 in the second flange 60b, and the washer 124 is displaced to the gasket 122 side. A holding ring 123 is provided. For this reason, after adjusting the position of each lens barrel unit 59, the washer 124 is displaced to the gasket 122 side by the holding ring 123 and the gasket 122 is pressed by the washer 124. Sex can be imparted. Accordingly, the position adjustment of each lens barrel unit 59 can be performed with accuracy while the presser ring 123 is loosened, and the internal space of the projection system lens barrel 27 can be kept clean.

(13th Embodiment)
In the lens barrel unit 59 of the thirteenth embodiment, as shown in FIG. 17, in the twelfth embodiment, a thin plate portion 133 that presses the gasket 122 is formed integrally with the second lens barrel unit 59b2, The mechanism for displacing the thin plate portion 133 toward the gasket 122 is different.

  In this embodiment, the holding ring 131 as a displacement member of the second collar part 60b is moved by a bolt 61 that tightens between the first collar part 60a. An inclined surface 132 is formed on the surface of the pressing ring 131 on the thin plate portion 133 side.

  In the lens barrel unit 59, first, the gasket 122 is accommodated between the first flange portion 60a and the thin plate portion 133, and the holding ring 131 is temporarily fixed to the first flange portion 60a with the bolt 61 loosened. Keep it. In this state, the position of each lens barrel unit 59 is adjusted in the direction intersecting with the optical axis of the lens element 44 accommodated therein. Then, the holding ring 131 is fastened and fixed to the first flange portion 60a by the bolt 61. Thereby, the gasket 122 is pressed by the thin plate portion 133, and the claw portion 108 of the thin plate portion 133 and the accommodation groove 121 is bitten into the gasket 122, thereby ensuring the airtightness in the projection system lens barrel 27.

According to this embodiment, in addition to the effects described in the thirteenth embodiment, the following effects are achieved.
(T) In the lens barrel unit 59, the holding ring 131 is formed with an inclined surface 132 for displacing the thin plate portion 133 toward the gasket 122 side. Here, when the stacked barrel units 59 are bonded and fixed, it is necessary to tighten them in the arrangement direction of the barrel units 59. In the projection system barrel 27 that accommodates the projection optical system 42 in which the lens elements 44 are arranged so as to intersect the direction of gravity, that is, the so-called horizontal projection system barrel 27, the stacked barrel units 59 are arranged vertically. Tighten to. In the lens barrel unit 59, the force that is tightened up and down by the action of the inclined surface 132 can be converted into a force inward of the lens barrel unit 59. For this reason, by tightening each lens barrel unit 59, the gasket 122 and the claw portion 108 disposed inside the tightening portion (bolt 61) of each lens barrel unit 59 can be easily bitten.

  (G) In this barrel unit 59, the gasket 122 is pressed by a thin plate portion 133 formed of a material integral with the barrel unit 59. For this reason, a gap that directly communicates the inside and outside of the lens barrel unit 59 is not formed in the second collar portion 60b. Therefore, the interior of the projection system lens barrel 27 can be brought into a more airtight state.

(14th Embodiment)
In the lens barrel unit 59 of the fourteenth embodiment, as shown in FIG. 18, the first collar portion 60a includes an inner collar portion 142 as a connecting portion coupled to the first lens barrel unit 59b1, and the lens element 44. It is divided into an outer flange 141 serving as a separating portion disposed outside the optical axis. A slope 143 is formed on the inner peripheral surface of the outer flange 141. An accommodation space 144 having a triangular cross section is formed between the outer collar 141, the inner collar 142, and the second collar 60b, and the O-ring 66 is disposed in the accommodation space 144.

  In the lens barrel unit 59, first, the O-ring 66 is accommodated in the accommodation space 144, and the outer flange 141 is temporarily fixed to the second flange 60b with the bolt 61 loosened. In this state, the position of each lens barrel unit 59 is adjusted in the direction intersecting with the optical axis of the lens element 44 accommodated therein. Then, the outer flange 141 is fastened and fixed to the second flange 60b by the bolt 61.

  Here, as described above, in the so-called horizontal type projection system barrel 27, the stacked barrel units 59 are fastened in the vertical direction. In the lens barrel unit 59, when the outer collar 141 is fastened and fixed to the second collar 60b, the upper and lower tightening force is converted into a force inward of the lens barrel unit 59 by the action of the inclined surface 143. Can do. For this reason, by tightening each lens barrel unit 59, the O-ring 66 accommodated in the accommodation space 144 is pushed up obliquely inward (in the drawing, obliquely upward) by the slope 143. As a result, the O-ring 66 is pressed against the outer peripheral surface of the inner collar 142 and the second collar 60b, and the space between the first collar 60a and the second collar 60b is closed, and the inside of the projection system barrel 27 is closed. Airtightness can be ensured.

According to this embodiment, the following effects are produced.
(N) In this lens barrel unit 59, an accommodation space 144 of an O-ring 66 having a triangular cross section is provided between the outer flange 141 and the inner flange 142 of the first flange 60a. The O-ring 66 is brought into close contact with the second flange 60b and the inner flange 142 by tightening the outer flange 141 with respect to the second flange 60b.

  Therefore, by tightening the outer flange 141 against the second flange 60b, one O-ring 66 is brought into close contact with the inner flange 142 and the second flange 60b. Therefore, after adjusting the position of each lens barrel unit 59, the air tightness of the projection system lens barrel 27 can be easily increased with one O-ring 66.

(Fifteenth embodiment)
In the lens barrel unit 59 of the fifteenth embodiment, as shown in FIG. 19, in the fourteenth embodiment, a part of the third gas flow suppression mechanism is configured in the accommodation space 144 instead of the O-ring 66. In addition, a gasket 151 having a triangular cross section as a sealing member is accommodated. In addition, a claw portion 152 that forms part of the third gas flow suppression mechanism and has a triangular cross section as a convex portion is formed on the outer peripheral surface of the inner flange portion 142 and the portion corresponding to the gasket 151 in the second flange portion 60b. Is formed.

  In this lens barrel unit 59, the gasket 151 is first accommodated in the accommodating space 144, and the outer flange 141 is temporarily fixed to the second flange 60b with the bolt 61 loosened. In this state, the position of each lens barrel unit 59 is adjusted, and the outer flange 141 is fastened and fixed to the second flange 60b by the bolt 61. By this tightening, the gasket 151 housed in the housing space 144 is pushed up obliquely inside (obliquely upward in the figure) by the slope 143. Thereby, the claw portions 152 of the inner flange portion 142 and the second flange portion 60b bite into the gasket 151, the space between the first flange portion 60a and the second flange portion 60b is closed, and the inside of the projection system lens barrel 27 is closed. Airtightness can be ensured.

According to this embodiment, the same effect as that of the fourteenth embodiment can be obtained.
(Modification)
The embodiment of the present invention may be modified as follows.

  For example, an adjustment washer made of a material having the same property as the material forming the projection system barrel 27 and having an annular shape is used as the first and second collar portions 60a of the first and second barrel units 59b1 and 59b2. , 60b. Then, by selectively fitting the adjustment washers, the first and second lens barrel units 59b1 and 59b2 are relatively relative to each other in the optical axis direction of each lens element 44 (that is, the optical axis direction of the exposure light EL). Various positions may be adjusted. In this case, it is necessary to interpose the gas flow suppression mechanism of the present invention between the first and second flange portions 60a and 60b and the adjustment washer.

  In the first to sixth embodiments, the O-ring 66 is used as the seal member, but grease or magnetic fluid can be used instead of the O-ring 66. Here, since grease and magnetic fluid generate a large amount of volatilized substances, the volatilized substances such as the annular groove 67 connected to the exhaust device 70, the plating layer 81, the labyrinth seal 84, and the like do not enter the lens barrel unit 59. The combined use of the second gas flow suppression mechanism is essential. Further, as the grease, a low-gas releasing fluorine-based grease, for example, a fluorine-based grease used in a vacuum apparatus such as “Varierta” manufactured by NOK Kluver is particularly suitable.

  In the first to sixth and thirteenth embodiments, an O-ring whose surface is covered with a metal material may be used as the O-ring 66. In such a case, the volatilization of the volatile matter from the surface of the O-ring is suppressed, which is preferable for keeping the projection system barrel 27 clean.

In the seventh embodiment, a plurality of arcuate convex portions 92 may be provided.
In the eighth embodiment, a plurality of convex portions 96 may be provided.
In the ninth to thirteenth and fifteenth embodiments, a plurality of claw portions 108 may be provided for each sealing surface of the gaskets 103, 111, 122, 151.

In the twelfth embodiment, the claw portion 108 in the accommodation groove 95 may be omitted.
In the twelfth embodiment, the washer 124 may be omitted. However, in this case, it is necessary to provide the claw portion 108 at a portion corresponding to the gasket 122 of the holding ring 123.

  In each embodiment, the projection optical system 42 is not limited to a refraction type, and may be a catadioptric type or a reflection type. The exposure apparatus may be an exposure apparatus including at least one optical element. For example, a contact exposure apparatus that exposes a mask pattern by bringing the mask and the substrate into close contact without using the projection optical system 42, and a mask. The present invention can be similarly applied to a proximity exposure apparatus that exposes a mask pattern by bringing a substrate and a substrate close to each other.

The exposure apparatus of the present invention is not limited to a reduction exposure type exposure apparatus, and may be, for example, a 1 × exposure type or an expansion exposure type exposure apparatus.
Also, from a reticle to a glass substrate for manufacturing a reticle or mask used in not only microdevices such as semiconductor elements but also light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, and electron beam exposure apparatuses. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern to a silicon wafer or the like. Here, in an exposure apparatus using DUV (deep ultraviolet) or VUV (vacuum ultraviolet) light, a transmission type reticle is generally used. As a reticle substrate, quartz glass, quartz glass doped with fluorine, fluorite, fluoride, and the like are used. Magnesium or quartz is used. Further, in proximity type X-ray exposure apparatuses and electron beam exposure apparatuses, a transmission type mask (stencil mask, member mask) is used, and a silicon wafer or the like is used as a mask substrate.

  -Also, not only exposure devices used for manufacturing semiconductor elements, but also manufacturing exposure devices, thin film magnetic heads, etc. used to manufacture displays including liquid crystal display elements (LCD), etc., and transfer device patterns onto glass plates. The present invention can also be applied to an exposure apparatus for transferring a device pattern to a ceramic wafer or the like, and an exposure apparatus used for manufacturing an image pickup device such as a CCD.

  The present invention can also be applied to a step-and-repeat batch exposure type exposure apparatus that transfers a mask pattern to a substrate while the mask and the substrate are stationary, and sequentially moves the substrate stepwise. it can.

As the light source of the exposure apparatus, for example, g-line (λ = 436 nm), i-line (λ = 365 nm), Kr ₂ laser (λ = 146 nm), Ar ₂ laser (λ = 126 nm), or the like may be used. . In addition, a single wavelength laser beam in the infrared region or visible region oscillated from a DFB semiconductor laser or fiber laser is amplified by, for example, a fiber amplifier doped with erbium (or both erbium and ytterbium), and a nonlinear optical crystal is obtained. It is also possible to use harmonics that have been converted into ultraviolet light.

Note that the exposure apparatus of each of the above embodiments is generally manufactured as follows, for example.
That is, first, the plurality of lens elements 44, the cover glass 43, and the like constituting the projection optical system 42 are accommodated in the projection system barrel 27 of each of the above embodiments. The illumination optical system 33 including optical elements such as the mirror 34 and the lenses 35 and 36 is housed in the illumination system barrel 25. Then, the illumination optical system 33 and the projection optical system 42 are incorporated in the exposure apparatus main body 22 to perform optical adjustment. Next, a wafer stage WST (including a reticle stage RST in the case of a scan type exposure apparatus) composed of a large number of mechanical parts is attached to the exposure apparatus main body 22 to connect wiring. Then, after connecting the pipe of the purge gas supply system 50 for supplying the purge gas into the optical path of the exposure light EL, further comprehensive adjustment (electrical adjustment, operation check, etc.) is performed.

  Here, the components constituting the illumination system column 25 and the projection system column 27 are assembled after removing impurities such as processing oil and metal substances by ultrasonic cleaning or the like. The exposure apparatus is preferably manufactured in a clean room in which the temperature, humidity, and pressure are controlled and the cleanness is adjusted.

Next, an embodiment of a device manufacturing method using the above-described exposure apparatus in a lithography process will be described.
FIG. 20 is a flowchart illustrating a manufacturing example of a device (a semiconductor element such as an IC or LSI, a liquid crystal display element, an imaging element (CCD or the like), a thin film magnetic head, a micromachine, or the like).

  As shown in FIG. 20, first, in step S201 (design step), function / performance design (for example, circuit design of a semiconductor device) of a device (micro device) is performed, and pattern design for realizing the function is performed. Do. Subsequently, in step S202 (mask manufacturing step), a mask (such as a reticle R) on which the designed circuit pattern is formed is manufactured. On the other hand, in step S203 (substrate manufacturing step), a substrate (or a wafer W when a silicon material is used) is manufactured using a material such as silicon or a glass plate.

  Next, in step S204 (substrate processing step), using the mask and substrate prepared in steps S201 to S203, an actual circuit or the like is formed on the substrate by lithography or the like, as will be described later. Next, in step S205 (device assembly step), device assembly is performed using the substrate processed in step S204. This step S205 includes processes such as a dicing process, a bonding process, and a packaging process (chip encapsulation or the like) as necessary.

  Finally, in step S206 (inspection step), inspections such as an operation confirmation test and a durability test of the device manufactured in step S205 are performed. After these steps, the device is completed and shipped.

  FIG. 21 is a diagram showing an example of a detailed flow of step S204 of FIG. 20 in the case of a semiconductor device. In FIG. 21, in step S211 (oxidation step), the surface of the wafer W is oxidized. In step S212 (CVD step), an insulating film is formed on the wafer W surface. In step S213 (electrode formation step), an electrode is formed on the wafer W by vapor deposition. In step S214 (ion implantation step), ions are implanted into the wafer W. Each of the above steps S211 to S214 constitutes a pretreatment process at each stage of the wafer processing, and is selected and executed according to a necessary process at each stage.

  At each stage of the wafer process, when the above pre-process is completed, the post-process is executed as follows. In this post-processing process, first, a photosensitive agent is applied to the wafer W in step S215 (resist formation step). Subsequently, in step S216 (exposure step), the circuit pattern of the mask (reticle R) is transferred onto the wafer W by the lithography system (exposure apparatus) described above. Next, in step S217 (development step), the exposed wafer W is developed, and in step S218 (etching step), the exposed member other than the portion where the resist remains is removed by etching. In step S219 (resist removal step), the resist that has become unnecessary after the etching is removed.

Multiple circuit patterns are formed on the wafer W by repeatedly performing these pre-processing and post-processing steps.
If the device manufacturing method of this embodiment described above is used, in the exposure step (step S216), the resolution can be improved by the exposure light EL in the vacuum ultraviolet region, and the exposure amount can be controlled with high accuracy. Therefore, the exposure accuracy can be improved, and a highly integrated device having a minimum line width of about 0.1 μm can be manufactured with a high yield.

1 is a schematic block diagram that shows an exposure apparatus of a first embodiment. FIG. 2 is a side view of the projection system barrel in FIG. 1. FIG. 2 is a partial cross-sectional view showing a main part of the projection system barrel in FIG. 1. FIG. 4 is a plan view showing a first lens barrel unit in FIG. 3. The bottom view which shows the 2nd lens-barrel unit of FIG. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 2nd Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 3rd Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 4th Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 5th Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 6th Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 7th Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 8th Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 9th Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 10th Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 11th Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 12th Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 13th Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 14th Embodiment. The fragmentary sectional view which shows the principal part of the projection type | system | group barrel of the exposure apparatus of 15th Embodiment. The flowchart which shows the manufacturing method of a device. The flowchart which shows the manufacturing method of a semiconductor element.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 22 ... Exposure apparatus main body, 25 ... Illumination system lens barrel as a lens barrel, 27 ... Projection system lens barrel as a lens barrel, 42 ... Projection optical system, 44 ... Lens element as an optical element, 59, 59a, 59b ... Mirror Tube unit, 59b1 ... first lens barrel unit, 59b2 ... second lens barrel unit, 59c ... first end surface as joining surface, 59d ... second end surface as joining surface, 60a ... as first joining portion 1st collar part, 60b ... 2nd collar part as 2nd junction part, 65,95,121 ... accommodating groove, 66 ... O-ring as 1st gas distribution control mechanism and seal member and elastic member, 67 ... gas An annular groove constituting a part of the discharge mechanism, 70 ... an exhaust device constituting a part of the gas discharge mechanism, 81 ... a plating layer as a second seal member, 84 ... a labyrinth seal as a second gas flow suppression mechanism, 91 , 103, 11 , 122, 151... Constituting a part of the third gas flow suppression mechanism and a gasket as a sealing member, 92... Constituting a part of the third gas flow suppression mechanism and an arc-shaped convex part as a convex part, 96. Convex part, 98 ... Sealing material as seal member, 107a, 107b ... Seal surface, 108, 152 ... Part of third gas flow suppression mechanism and claw part as convex part, 123, 131 ... Displacement mechanism , A washer as a pressing part, 132, 143 are inclined surfaces, 133 is a thin plate part as a pressing part, 141 is an outer collar as a separating part, 142 is an inner collar as a connecting part, and EL is an exposure. Light, R ... reticle as mask, W ... wafer as substrate.

Claims (16)

In a lens barrel configured by laminating a plurality of lens barrel units containing at least one optical element,
The lens barrel unit includes a first lens barrel unit having a first joint portion and a second lens barrel having a second joint portion that engages with the first joint portion of the first lens barrel unit. Gas flow through at least one of the first lens barrel unit and the second lens barrel unit via a space between the first joint portion and the second joint portion. A lens barrel comprising: a first gas flow suppression mechanism including a seal member that suppresses the gas; and a second gas flow suppression mechanism different from the first gas flow suppression mechanism. 2. The gas discharge mechanism according to claim 1, wherein the second gas flow suppression mechanism is a gas discharge mechanism that discharges gas in a space between the first joint and the second joint to the outside. A lens barrel. The lens barrel according to claim 2, wherein the gas discharge mechanism is provided inside the seal member in a space between the first joint and the second joint. One of the seal member and the gas discharge mechanism is provided in the first lens barrel unit, and the other of the seal member and the gas discharge mechanism is provided in the second lens barrel unit. The lens barrel according to claim 2 or claim 3. 2. The lens barrel according to claim 1, wherein the second gas flow suppression mechanism includes a second seal member made of a material different from the seal member included in the first gas flow suppression mechanism. The lens barrel according to claim 5, wherein the seal member is made of an elastic member, and the second seal member is made of a metal material that is deformed when the lens barrel units are stacked. In a lens barrel configured by laminating a plurality of lens barrel units containing at least one optical element,
The lens barrel unit includes a first lens barrel unit having a first joint portion and a second lens barrel having a second joint portion that engages with the first joint portion of the first lens barrel unit. Gas flow through at least one of the first lens barrel unit and the second lens barrel unit via a space between the first joint portion and the second joint portion. A lens barrel provided with a third gas flow suppression mechanism including a seal member that suppresses the gas and a convex portion that abuts or bites into the seal member. The lens barrel according to claim 7, wherein the seal member is formed in a ring shape and is divided at least at one place. The seal member has a plurality of seal surfaces parallel to a joint surface between the first joint portion and the second joint portion in a cross section taken along a plane including the optical axis of the optical element. The lens barrel according to claim 7 or claim 8. An accommodation groove for accommodating the seal member is provided in one of the first joint and the second joint, and the seal member is disposed in the other of the first joint and the second joint. The lens barrel according to any one of claims 7 to 9, further comprising a pressing portion to be pressed and a displacement mechanism for displacing the pressing portion toward the seal member. An inclined surface is formed on at least one of the pressing portion and the displacement mechanism to displace the pressing portion toward the seal member by tightening the first joint portion and the second joint portion. The lens barrel according to claim 10. In a lens barrel configured by laminating a plurality of lens barrel units containing at least one optical element,
The lens barrel unit includes a first lens barrel unit having a first joint portion, and a second mirror having a second joint portion that engages with the first joint portion of the first lens barrel unit. And a separation unit separated from the connection part, outside the connection part with respect to the optical axis of the optical element, the connection part connected to the first lens barrel unit. And a sealing member disposed between a side surface of the second joint portion, a side surface of the coupling portion, and a side surface of the separation portion. In a lens barrel configured by laminating a plurality of lens barrel units containing at least one optical element,
The lens barrel unit includes a first lens barrel unit having a first joint portion and a second lens barrel having a second joint portion that engages with the first joint portion of the first lens barrel unit. Gas flow through at least one of the first lens barrel unit and the second lens barrel unit via a space between the first joint portion and the second joint portion. A lens barrel having a gas flow suppressing mechanism including a sealing member for suppressing the gas, wherein the sealing member is made of metal gallium. 14. The at least one optical element is a part of a projection optical system that transfers an image of a pattern formed on a mask onto a substrate. The lens barrel described. In an exposure apparatus that exposes an image of a pattern formed on a mask on a substrate under exposure light,
15. An exposure apparatus comprising: at least one optical element disposed in an optical path of the exposure light housed in a lens barrel according to any one of claims 1 to 14. In a device manufacturing method including a lithography process,
16. A device manufacturing method, wherein exposure is performed using the exposure apparatus according to claim 15 in the lithography process.

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