JP2005174933A - Mask and mask frame assembling device, and assembling method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a mask and mask frame assembling device, and an assembling method. <P>SOLUTION: In this mask and mask frame assembling device, a mask, and a tensile force generator connected to one end of the mask to generate tensile force are provided. It is also provided with a tensile force control device including a sensing means to detect tensile force between one end of the tensile force generating device and one end of the mask, a tensile force controller to generate a control signal based on a signal from the sensing means, and a control valve to control the tensile force generator based on the control signal. The mask and mask frame assembling method is also provided. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a mask and mask frame assembling apparatus and assembling method, and more particularly, a mask and mask frame assembling apparatus further including a tensile force control device, a substrate automatic alignment device, or an automatic measuring device, and a mask and a mask using the same. The present invention relates to a mask frame assembling method.

  In general, a mask and a mask frame assembling apparatus are used as a mask for forming an organic film or an electrode layer having a predetermined pattern in a process of manufacturing an organic light emitting display, or an electron gun in a flat color cathode ray tube. A color selection function for accurately landing an electron beam emitted from the fluorescent film disposed on the inner surface of the panel, that is, a red, green, and blue phosphor having a predetermined pattern. An example of a mask and mask frame assembly for depositing a second electrode which is an organic light emitting layer or a cathode electrode among such mask and mask frame assemblies is disclosed in Patent Document 1. The vapor deposition mask disclosed herein is formed by forming striped slots or square or circular dot-like meshes separated from each other at a predetermined interval on the thin plate body, and a tensile force is applied to the frame. It is fixed in the state. In the mask disclosed in Patent Document 2, a slit portion and a bridge portion form a mesh shape on a metal thin plate. The mask disclosed in Patent Document 3 has an electrode mask portion and a pair of terminal mask portions. The electrode mask portion has a width corresponding to the gap between the cathode electrodes, that is, the second electrodes, and includes a connecting portion that connects both ends of the stripe-shaped marking portion and the plurality of marking portions installed in parallel to each other. .

  The conventional mask disclosed as described above, for example, has a striped long hole formed in a metal thin plate, so that even if it is supported by a frame that supports the edge of the metal thin plate, it can drip due to the weight of the mask during the deposition process. Therefore, there is a problem that the strip does not adhere to the substrate.

  Therefore, the mask and the mask frame are assembled in a state where a constant tensile force is applied to the mask in the direction indicated by the arrow as shown in FIG. FIG. 2A shows the normal process of assembling the mask and mask frame. After the mask frame 10 (see FIG. 1) is placed on the upper part of an apparatus, for example, a vapor deposition apparatus (not shown) (S21), the mask 20 (see FIG. 1) is placed on the upper end of the mask frame 10 (S22). A tensile force is then primarily applied to the mask 20 through a tensile force generator 110 as shown in FIG. 2B. One end of the mask 20 is connected to one end of the tensile force generator 110 through the clamp 140, and the lower end of the tensile force generator 110 is disposed on the support member 120. The support member 120 may be a fixing means or a movable means. A substrate 30 (see FIG. 2C) is placed on the upper end of the mask 20 to which a tensile force is primarily applied, and the substrate 30 and the mask 20 are aligned (S24). In the conventional alignment method, an image taken by a CCD camera (not shown) is observed with the naked eye, and the substrate 30 and the mask 20 are aligned by moving the substrate 30 by hand. Next, a tensile force may be secondarily applied to the mask 20 to compensate for the tensile force lost in the alignment process of the substrate 30 and the mask 20 (S25). If a part of the pixels in the active region of the substrate 30 is enlarged, the pattern 31 of the substrate 30 is positioned in the mesh area of the mask 20 (slit shape and dot shape are shown in the drawing) as shown in FIG. To do. A T / P (Total Pitch) (T / P1, T / P2 in the case of dots) at a fixed interval generated between the center line of the pattern 31 of the substrate 30 and the center line of the mesh of the mask 20 is measured (S26). . In a conventional measuring method, an image from a CCD camera (not shown) is measured and recorded through the naked eye. Next, the edge region of the mask 20 is fixed to the mask frame 10 by welding, for example, seam welding (S27). After fixing, the assembled assembly of the mask 20 and the mask frame 10 is allowed to stand for a predetermined time (S28), and then T / P between the substrate 30 and the mask 20 is measured again (S29).

  When the process of assembling the mask and the mask frame is performed by the conventional technique, there are various problems.

  First, when a tensile force is applied to the mask, the tensile force transmitted from the tensile force generator to the mask is the relationship between the force and the deformation, that is, the tensile force applied from the tensile force generator and the amount of deformation of the mask. In the case of a conventional tension generator, for example, an actuator composed of a cylinder and a piston, only an approximation of the applied tensile force is estimated. Therefore, accurate force control is not performed. Therefore, according to the conventional technique made by the open loop method, when a mask, particularly a fine metal mask (FMM) is used, a tensile force less than a target set value is applied to reduce the droop due to the weight of the mask. There is a possibility that it cannot be prevented or a tensile force exceeding the target set value is applied to cause mask damage due to an excessive tensile force.

  In addition, since the process of aligning the mask and the substrate is performed manually, there is a problem in that the precision and work reliability of the alignment process are greatly reduced.

  When measuring and recording the T / P between the center line of the mask mesh and the center line of the pattern on the substrate for the pixels in the active area on the substrate, according to the conventional technique, the operator directly measures with the naked eye As a result, the accuracy of measurement and accuracy is greatly reduced. Bring.

JP 2000-060589 A Japanese Patent Laid-Open No. 11-071583 JP 2000-12238 A

  An object of the present invention is to provide a mask and mask frame assembling apparatus having an improved structure to overcome the above-mentioned problems.

  Another object of the present invention is to provide a mask and a mask frame assembling method for providing the improved structure.

  According to one aspect of the present invention for achieving the above object, in the mask and mask frame assembling apparatus comprising a mask, a tensile force generator connected to one end of the mask and generating a tensile force, the tensile force generation Sensing means for sensing a tensile force between one end of the vessel and one end of the mask; a tension force controller for generating a control signal based on a signal from the sensing means; and There is provided a mask and mask frame assembling apparatus comprising a tensile force control device including a control valve for controlling a tensile force generator.

  According to another aspect of the present invention, there is provided a mask and mask frame assembling apparatus, wherein the sensing means of the tension control device is a load cell.

  According to still another aspect of the present invention, based on a first optical means for photographing one end of the substrate, an alignment controller that receives a signal from the first optical means, and a movement signal from the alignment controller. An apparatus for assembling a mask and a mask frame, further comprising an automatic substrate alignment device including a substrate moving means for moving the substrate.

  According to still another aspect of the present invention, in the mask and mask frame assembling apparatus, optical means for photographing pixels on one surface of the substrate disposed on the mask, and optics for moving the optical means A moving means; a measurement controller for detecting a T / P between the substrate and the mask based on a signal input from the optical means; and a storage means for storing a signal output from the measurement controller. A mask and a mask frame assembling apparatus are further provided.

  According to still another aspect of the present invention, the second optical means for photographing the pixels on the one surface of the substrate, the optical movement means for moving the second optical means, and the second optical means An automatic measurement apparatus further comprising: a measurement controller that detects T / P between the substrate and the mask based on an input signal; and a storage unit that stores the signal output from the measurement controller. A mask and a mask frame assembling apparatus are provided.

  According to another aspect of the present invention, in the mask and mask frame assembling method including the step of applying a tensile force by a tensile force generator having one end connected to the mask, the step of applying the tensile force includes the step of applying the tensile force. Sensing means for sensing a tensile force from a force generator, a tensile force controller for generating a control signal based on a signal from the sensing means, and controlling the tensile force generator from the control signal Providing a tensile force control device including a control valve, wherein the sensing means senses a tensile force applied from the tensile force generator, and the tensile force controller detects the control signal from the sensed signal. And a method of assembling the mask and the mask frame, comprising: controlling the tension generator with the control signal according to the control signal.

  According to still another aspect of the present invention, the method further includes aligning a substrate on the mask, and the aligning the substrate includes first optical means disposed on the substrate, and the first optical means. An alignment controller that receives a signal from the alignment controller, a substrate automatic alignment apparatus that includes a substrate moving unit that receives the movement signal from the alignment controller and moves the substrate; and the first optical means includes the substrate. A step of photographing one end of the substrate, a step in which the alignment controller measures an error (shift) between the substrate and the mask based on a signal from the first optical means, and the measured error is determined as a predetermined allowable error. Determining whether to apply a movement signal to the substrate moving means as compared to the above, and applying a movement signal to the substrate moving means when the measured error is greater than the allowable error. Characteristic Providing a mask and mask frame assembly methods.

  According to still another aspect of the present invention, the method further includes measuring a T / P between the substrate and the mask, and measuring the T / P between the substrate and the mask is performed on an upper portion of the substrate. A second optical means arranged to image a predetermined pixel on one surface of the substrate; an optical moving means for moving the second optical means on the top of the substrate; and an input from the second optical means A measurement controller that detects a T / P between the substrate and the mask based on the measured signal, and a storage unit for storing the signal output from the measurement controller, The optical movement means moving the second optical means to the position of the predetermined pixel; the second optical means imaging the predetermined pixel; and the measurement controller for the pixel Center line of pattern on board Recognizing the mask center line and measuring an interval between the center lines; and storing a measurement value for the interval in a storage unit. A mask and a mask frame assembling method are provided. To do.

  According to another aspect of the present invention, there is provided a mask and mask frame assembling method, wherein the step of measuring the T / P between the substrate and the mask is repeated for all predetermined pixels. provide.

  According to still another aspect of the present invention, in the mask and mask frame assembling method, the method further includes the step of measuring the T / P between the substrate and the mask, and the step of measuring the T / P between the substrate and the mask comprises: A second optical means disposed on the substrate for photographing a predetermined pixel on one surface of the substrate; an optical movement means for moving the second optical means on the substrate; A measurement controller for detecting T / P between the substrate and the mask based on a signal input from the second optical means; and a storage means for storing the signal output from the measurement controller. A step of providing an automatic measuring device; a step of moving the second optical means to the position of the predetermined pixel; a step of photographing the predetermined pixel by the second optical means; and the measurement control. The vessel is Recognizing the center line of the pattern on the substrate and the mask center line to measure the interval between the center lines, and storing the measured value for the interval in a storage means, A mask and a mask frame assembling method are provided.

  The present invention has the following effects.

  An apparatus and method for assembling a mask and a mask frame according to an embodiment of the present invention apply a tensile force smaller than the target value to the mask by maintaining the tensile force applied to the mask through the tensile force control device at a constant target value. Thus, it is possible to solve the problem that the mask hangs due to its own weight or the mask is damaged and broken by applying a tensile force larger than the target value to the mask.

  Meanwhile, a mask and mask frame assembling apparatus and an assembling method according to another embodiment of the present invention automate alignment between a substrate and a mask, which is performed by a conventional manual operation, through an automatic alignment apparatus. It is possible to prevent a decrease in alignment accuracy due to work scattering.

  On the other hand, the mask and mask frame assembling apparatus and the assembling method according to still another embodiment of the present invention perform T / P measurement which has been conventionally performed manually and visually through a T / P automatic measuring apparatus between a substrate and a mask. Automating prevents loss of measurement accuracy due to work dispersal between workers and increases productivity by reducing time spent working with traditional methods through smooth movement to a predetermined location be able to.

  Hereinafter, a mask frame combination according to a preferred embodiment of the present invention and a method of aligning a substrate using the same will be described with reference to the accompanying drawings.

  FIG. 3 is a block diagram showing a schematic view of a mask and mask frame assembling apparatus according to the present invention. According to an embodiment of the present invention, the mask and mask frame assembling apparatus includes a tensile force control device 200, and further includes at least one of an automatic alignment device 300 and an automatic measurement device 400 in addition to the tensile force control device 200. The mask and mask frame assembling apparatus may further include only the automatic measuring apparatus 400. The pulling force control device 200, the automatic alignment device 300, and the automatic measurement device 400 may be controlled through individual controllers as will be described later, and the individual controllers may be integrated into the control device 100.

  FIG. 4A shows a schematic partial cross-sectional view of a tensile force control device provided according to an embodiment of the present invention. The mask 20 is disposed on one surface of the mask frame 10. One end of the mask 20 is connected to the tensile force generator 210 through a clamp 240. Sensing means is disposed between the clamp 240 and the tensile force generator 210 to sense the tensile force actually applied to the mask 20. It is preferable to use a load cell 230 that accurately represents the relationship between the tensile force and the deformation amount as the sensing means. FIG. 4B shows a detailed configuration diagram of the tensile force control device 200, and FIG. 4C shows a control block diagram of the tensile force control device 200. In FIG. 4B, the tensile force signal sensed by the load cell 230 is transmitted to the tensile force controller 260 and the control signal u is derived from the difference between the predetermined target tensile force Fin and the actually applied tensile force Fout. And a control valve, such as a servo valve 240 capable of blocking and conducting the flow of working fluid such as compressed air, and a master valve (solenoid valve) 250 for selecting the flow of working fluid into and out of the tensile force generator. The control valve controls the tensile force generator 210 and adjusts the tensile force applied to the mask 20 according to the control signal u.

  Meanwhile, according to another embodiment of the present invention, an automatic alignment apparatus for automatically aligning the substrate 30 and the mask 20 as shown in FIG. 5A may be provided. As shown in FIG. 5B, the automatic alignment apparatus 300 includes a first optical unit 320 that images one end of the substrate 30, an alignment controller 340 that generates a movement signal based on a video signal from the first optical unit 320, and Substrate moving means 330 for moving the substrate 30 based on a movement signal from the alignment controller 340 is provided. Specifically, the optical means 320 is disposed on the substrate 30 placed on the mask 20, and an alignment mark 310 for alignment is provided at one end of the substrate 30 formed of a transparent material, that is, an inactive region. Is placed. An alignment through hole 21 is formed on the mask 20 at a position corresponding to the alignment mark 310, and another alignment mark 11 is disposed on the mask frame 10. FIG. 6A shows an automatic substrate alignment process. The optical means 320 disposed on the substrate 30, for example, a CCD camera images the area at a position corresponding to the alignment mark 310 of the inactive area of the substrate 30 (S 310), and the alignment controller 340 is input. The image is formed on the substrate, the mask and the mask frame, more specifically, the alignment mark 310 disposed in the non-active area of the substrate, and the alignment mark 11 and the mask disposed in the corresponding position of the mask frame. The through hole 21 is recognized (S320), and the interval between these alignment marks, that is, the position error (deviation) is measured (S330). The measured position error is then compared with a predetermined tolerance (S340), and if the position error is less than the tolerance, the automatic alignment step is terminated. If the position error is larger than the allowable error, the automatic alignment step does not end, and the alignment controller 340 generates a movement signal from the position error and then outputs the movement signal to the substrate moving unit 330. 30 is moved to a desired position (S350). Next, the processes after step S310 are repeated.

  On the other hand, according to still another embodiment of the present invention, as further shown in FIG. 5B, an automatic measuring device 400 for automatically measuring the T / P between the substrate 30 and the mask 20 may be provided. . The automatic measuring apparatus 400 includes an optical moving unit 420 including a second optical unit 410 for photographing a predetermined pixel on one surface of the substrate 30, a supporting unit 421 that supports the second optical unit 410, and a driving unit 422. And the center line of the mesh of the mask 20 and the center line of the pattern on the substrate 30 are recognized based on the image photographed by the second optical unit 410 and the T / P between them is measured, and the optical moving unit 420 A measurement controller 430 for transmitting a movement signal, and storage means 440 for storing the T / P signal measured from the measurement controller 430 are included. As shown in FIG. 6B, when T / P measurement is started, the second optical means 410, for example, a CCD camera is moved to a predetermined position (S410). The image photographed by the second optical means 410 is sent to the measurement controller 430, and the measurement controller 430 uses the image signal to generate the mask 20 and the substrate 30, that is, the mesh of the mask 20 with respect to the predetermined position and the pattern 31 on the substrate 30. (See FIG. 2D), the center line between the mesh of the mask 20 and the pattern 31 on the substrate 30 is recognized (S420), and the T / P between them is measured (S430). The measured T / P is sent to and stored in the storage means 440 (S440). The T / P automatic measurement step may be repeated for all predetermined pixels. However, this may be performed independently, and the tensile force control device or the automatic alignment may be performed. May be installed and implemented with the controller or independently.

  The controller, the tensile force controller 260, the alignment controller 340, and the measurement controller 430 described above may be individually configured or integrated into the controller 100 (see FIG. 3) in an integrated manner. The first optical means 320 and the second optical means 410 may be configured separately, and the same optical means may perform individual roles.

  Although the present invention has been described with reference to one embodiment shown in the drawings, this is by way of example only, and various modifications and equivalent other embodiments can be made by those skilled in the art. I understand that. Therefore, the protection scope of the present invention must be determined by the technical idea of the claims.

  The present invention can be used as a vapor deposition apparatus during a manufacturing process of a flat panel display device such as an organic light emitting display device, and can also be used as a thin film vapor deposition apparatus in various electronic device manufacturing processes.

It is the isolation | separation perspective view of the conventional mask and mask frame where tensile force is applied. 3 is an assembly flowchart of a mask and a mask frame according to a conventional technique. FIG. 6 is a schematic partial cross-sectional view of a conventional tensile force control device. It is a schematic diagram of the substrate alignment method by a prior art. It is the schematic showing T / P between the centerline of a substrate pattern and the centerline of a mask mesh (slit shape or dot shape) in the active region of a substrate. 1 is a conceptual diagram of a configuration of an assembly control device for a mask frame combination according to an embodiment of the present invention. 1 is a schematic partial cross-sectional view of a tensile force control device according to an embodiment of the present invention. It is a detailed block diagram of the tension | pulling force control apparatus by one Example of this invention. It is a control block diagram of the tensile force control apparatus by one Example of this invention. 1 is a schematic diagram illustrating an automatic alignment apparatus and an automatic measurement apparatus according to an embodiment of the present invention. 5 is a flowchart of a method for automatically aligning substrates according to an embodiment of the present invention. 4 is a flowchart of a method for automatically measuring and storing T / P between a substrate and a mask according to an embodiment of the present invention.

Explanation of symbols

210 Tensile force generator 230 Sensing means 240 Clamp 250 Master valve (solenoid valve)
260 Tensile force controller

Claims (10)

In a mask and mask frame assembling apparatus comprising a mask and a tensile force generator connected to one end of the mask to generate a tensile force,
Sensing means for sensing a tensile force between one end of the tensile force generator and one end of the mask, a tensile force controller for generating a control signal based on a signal from the sensing means, and the control An apparatus for assembling a mask and a mask frame, comprising: a tensile force control device including a control valve for controlling the tensile force generator according to a signal.   2. The mask and mask frame assembling apparatus according to claim 1, wherein the sensing means of the tensile force control device is a load cell.   Substrate including first optical means for photographing one end of the substrate, an alignment controller to which a signal from the first optical means is input, and a substrate moving means for moving the substrate based on a movement signal from the alignment controller The mask and mask frame assembling apparatus according to claim 1, further comprising an automatic alignment device. In the mask and mask frame assembling apparatus,
Optical means for photographing pixels on one surface of the substrate arranged on the mask, optical movement means for moving the optical means, the substrate and the substrate based on a signal input from the optical means Mask and mask frame assembly, further comprising: an automatic measurement device including a measurement controller for detecting T / P between masks, and a storage means for storing a signal output from the measurement controller. apparatus.   A second optical means for photographing a pixel on one surface of the substrate; an optical movement means for moving the second optical means; and the substrate and the signal based on a signal input from the second optical means. The automatic measurement apparatus further comprising: a measurement controller for detecting T / P between masks; and storage means for storing a signal output from the measurement controller. The mask and mask frame assembling apparatus described in 1. In a mask and mask frame assembly method comprising applying a tensile force by a tensile force generator having one end connected to the mask.
Applying the tensile force comprises:
Sensing means for sensing a pulling force from the pulling force generator, a pulling force controller for generating a control signal based on a signal from the sensing means, and controlling the pulling force generator by the control signal Providing a tensile force control device including a control valve for
Sensing the tensile force applied by the sensing means from the tensile force generator;
The tensile force controller generating the control signal from the sensed signal;
A method of assembling a mask and a mask frame, the method comprising: the control valve controlling the tension generator from the control signal. Aligning the substrate on the mask further comprising aligning the substrate;
First optical means disposed on the substrate, an alignment controller that receives a signal from the first optical means, and a substrate moving means that moves the substrate upon receiving a movement signal from the alignment controller Comprising a substrate automatic alignment device comprising:
The first optical means photographing one end of the substrate;
The alignment controller measuring an error between the substrate and the mask based on a signal from the first optical means;
Comparing the measured error with a predetermined tolerance to determine whether a movement signal is applied to the substrate moving means;
7. The mask and mask frame assembling method according to claim 6, further comprising the step of applying a movement signal to the substrate moving means when the measured error is larger than the allowable error. Further comprising measuring T / P between the substrate and the mask;
Measuring T / P between the substrate and the mask comprises:
A second optical unit disposed on the substrate for photographing a predetermined pixel on one surface of the substrate; an optical moving unit for moving the second optical unit on the substrate; A measurement controller for detecting T / P between the substrate and the mask based on a signal input from two optical means, and a storage means for storing the signal output from the measurement controller. Providing a measuring device;
The optical moving means moving the second optical means to the predetermined pixel position;
The second optical means photographing the predetermined pixel;
The measurement controller recognizing a center line of the pattern on the substrate and the mask center line with respect to the pixel, and measuring an interval between the center lines;
The method for assembling a mask and a mask frame according to claim 6, further comprising: storing a measurement value for the interval in a storage unit.   9. The method of claim 8, wherein the step of measuring the T / P between the substrate and the mask is repeated for all predetermined pixels. In the mask and mask frame assembling method,
Measuring T / P between the substrate and the mask,
Measuring T / P between the substrate and the mask comprises:
A second optical unit disposed on the substrate for photographing a predetermined pixel on one surface of the substrate; an optical moving unit for moving the second optical unit on the substrate; A measurement controller for detecting T / P between the substrate and the mask based on a signal input from two optical means, and a storage means for storing the signal output from the measurement controller. Providing a measuring device;
The optical moving means moving the second optical means to the predetermined pixel position;
The second optical means photographing the predetermined pixel;
The measurement controller recognizing a center line of the pattern on the substrate and the mask center line with respect to the pixel, and measuring an interval between the center lines;
Storing the measurement value for the interval in a storage means, and a mask and mask frame assembling method.

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