JP2005154187A5 - - Google Patents
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- JP2005154187A5 JP2005154187A5 JP2003393758A JP2003393758A JP2005154187A5 JP 2005154187 A5 JP2005154187 A5 JP 2005154187A5 JP 2003393758 A JP2003393758 A JP 2003393758A JP 2003393758 A JP2003393758 A JP 2003393758A JP 2005154187 A5 JP2005154187 A5 JP 2005154187A5
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- optical element
- base material
- molding die
- noble metal
- element molding
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Description
しかしながら、上記従来の光学素子成形用型の製造方法では、アークプラズマを発生させて成形面への付着（成膜）を行う際、プラズマ供給時間が長くなる（プラズマ発生繰り返し数が多くなる）ほど、アーク放電の際に発生するドロップレット（液滴）が、成形面上に形成された成膜面に付着してしまい、平滑な成膜面が得られない場合があった。
本発明は上記事情に鑑みて成されたものであり、イオン注入によって、イオン注入後に成膜される膜と成形面との密着強度を向上させるとともに、それとは異なる方法で平滑な成膜面で高密着強度を有する光学素子成形用型を提供することを目的とする。
However, in the above-described conventional method for producing an optical element molding die, when plasma is generated and deposited on the molding surface (film formation), the plasma supply time becomes longer (the number of repetitions of plasma generation increases). , droplets generated during the arc discharge (drop) is Mai and adhered to the deposition surface formed on the forming surface, there may not smooth the deposition surface can be obtained.
The present invention has been made in view of the above circumstances, and improves the adhesion strength between a film formed after ion implantation and a molding surface by ion implantation, and provides a smooth film formation surface by a different method. An object of the present invention is to provide an optical element molding die having high adhesion strength.
本発明は、上記課題を解決するため、以下の手段を採用する。
本発明に係る光学素子成形用型の製造方法は、光学素子のプレス成形に用いる光学素子成形用型の製造方法において、真空容器内に設置された、前記光学素子成形用型の母材の周囲に、少なくとも一種の貴金属イオンを含むアークプラズマを発生させ、前記母材にパルス電圧を印加することにより前記母材周囲の前記アークプラズマから前記貴金属イオンのみを引き出し、この貴金属イオンを前記母材の少なくとも成形面に注入する第１の工程と、該第１の工程後の前記成形面に、少なくとも一種の貴金属からなる膜をスパッタリング法で成膜させる第２の工程とを備えていることを特徴とする。
The present invention employs the following means in order to solve the above problems.
An optical element molding die manufacturing method according to the present invention is an optical element molding die manufacturing method used for press molding of an optical element. The optical element molding die is placed in a vacuum vessel and is surrounded by a base material of the optical element molding die. In addition, an arc plasma containing at least one kind of noble metal ions is generated, and by applying a pulse voltage to the base material, only the noble metal ions are extracted from the arc plasma around the base material, and the noble metal ions are extracted from the base material. A first step of injecting into at least a molding surface; and a second step of depositing a film made of at least one noble metal by sputtering on the molding surface after the first step. And
この光学素子成形用型の製造方法は、第１の工程にて母材の少なくとも成形面に貴金属イオンの注入を行うので、注入された面に母材と貴金属との両方の成分が混合された層を形成させることができ、貴金属膜の母材への密着性と膜の耐久性とを向上させることができる。
また、第２の工程では、第１の工程後の成形面にスパッタリング法で貴金属を含む膜を成膜するので、第１の工程においてアークプラズマが発生する際に生じるドロップレットの付着を抑え、凹凸が抑えられた成膜面を作製することができる。
In this method for manufacturing an optical element molding die, noble metal ions are implanted into at least the molding surface of the base material in the first step, so that both components of the base material and the noble metal are mixed into the implanted surface. A layer can be formed, and the adhesion of the noble metal film to the base material and the durability of the film can be improved.
Further, in the second step, a film containing a noble metal is formed on the molding surface after the first step by a sputtering method, so that adhesion of droplets generated when arc plasma is generated in the first step is suppressed, A film formation surface with reduced unevenness can be produced.
また、本発明の光学素子成形用型の製造方法は、前記光学素子成形用型の製造方法であって、前記貴金属が、Ｐｔ、Ａｕ、Ｉｒ、Ｒｅ、Ａｇ、Ｏｓ、Ｔａのうち少なくとも一つを備えていることを特徴とする。
また、本発明の光学素子成形用型の製造方法は、前記光学素子成形用型の製造方法であって、前記母材が、超硬合金、炭化ケイ素、又は炭素の何れか一つであることを特徴とする。
The method for manufacturing an optical element molding die according to the present invention is a method for manufacturing the optical element molding die, wherein the noble metal is at least one of Pt, Au, Ir, Re, Ag, Os, and Ta. It is characterized by having.
The method for producing an optical element molding die of the present invention is the method for producing the optical element molding die, wherein the base material is any one of cemented carbide, silicon carbide, or carbon. It is characterized by.
なお、本発明の技術範囲は上記実施の形態に限定されるものではなく、本発明の趣旨を逸脱しない範囲において種々の変更を加えることが可能である。
例えば、上記実施形態ではターゲット７及び成膜用ターゲット１３としてＰｔを使用したが、Ｐｔに限らずＡｕ、Ｉｒ、Ｒｅ、Ａｇ、Ｏｓ、Ｔａ等の貴金属及びこれらの合金であっても構わない。
また、母材２が超硬合金としているが、超硬合金に限らず、炭化ケイ素、又は炭素であっても構わない。
The technical scope of the present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present invention.
For example, although Pt is used as the target 7 and the film formation target 13 in the above embodiment, it is not limited to Pt, and may be a noble metal such as Au, Ir, Re, Ag, Os, Ta, or an alloy thereof.
Moreover, although the base material 2 is a cemented carbide, it is not limited to a cemented carbide but may be silicon carbide or carbon.
Claims (6)
真空容器内に設置された、前記光学素子成形用型の母材の周囲に、少なくとも一種の貴金属イオンを含むアークプラズマを発生させ、前記母材にパルス電圧を印加することにより前記母材周囲の前記アークプラズマから前記貴金属イオンのみを引き出し、この貴金属イオンを前記母材の少なくとも成形面に注入する第１の工程と、
該第１の工程後の前記成形面に、少なくとも一種の貴金属からなる膜をスパッタリング法で成膜させる第２の工程とを備えていることを特徴とする光学素子成形用型の製造方法。 In the method of manufacturing an optical element molding die used for press molding of an optical element,
An arc plasma containing at least one kind of noble metal ions is generated around a base material of the optical element molding die installed in a vacuum vessel, and a pulse voltage is applied to the base material to thereby surround the base material. Extracting only the noble metal ions from the arc plasma, and injecting the noble metal ions into at least the molding surface of the base material;
A method for producing an optical element molding die, comprising: a second step of forming a film made of at least one kind of noble metal by a sputtering method on the molding surface after the first step.
前記母材の成形面に、少なくとも一種の貴金属イオンを含むプラズマを発生させ、前記母材にパルス電圧を印加することにより前記母材周囲の前記プラズマからイオンのみを引き出し可能なイオン注入手段と、
少なくとも一種の貴金属からなる膜を成膜可能な前記イオン注入手段とは異なる手段と、
前記母材と前記イオン注入手段と、或いは、前記母材と前記異なる手段との何れか一方の間を選択的に遮蔽するシャッターとを備えていることを特徴とする光学素子成形用型の製造装置。 A vacuum container in which a base material for an optical element molding die is disposed;
An ion implantation means capable of generating a plasma containing at least one kind of noble metal ions on the molding surface of the base material and extracting only ions from the plasma around the base material by applying a pulse voltage to the base material;
Means different from the ion implantation means capable of forming a film made of at least one kind of noble metal;
An optical element molding die, comprising: a shutter that selectively shields between the base material and the ion implantation means, or between the base material and the different means. apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003393758A JP4347671B2 (en) | 2003-11-25 | 2003-11-25 | Optical element molding mold manufacturing method and optical element molding mold manufacturing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003393758A JP4347671B2 (en) | 2003-11-25 | 2003-11-25 | Optical element molding mold manufacturing method and optical element molding mold manufacturing apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005154187A JP2005154187A (en) | 2005-06-16 |
| JP2005154187A5 true JP2005154187A5 (en) | 2006-01-19 |
| JP4347671B2 JP4347671B2 (en) | 2009-10-21 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003393758A Expired - Lifetime JP4347671B2 (en) | 2003-11-25 | 2003-11-25 | Optical element molding mold manufacturing method and optical element molding mold manufacturing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4347671B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5122757B2 (en) * | 2006-04-06 | 2013-01-16 | 株式会社アルバック | Coating device, coating method |
| JP4761576B2 (en) * | 2007-07-31 | 2011-08-31 | Ｊｘ日鉱日石金属株式会社 | Au-containing surface-treated Ti material |
| US8021768B2 (en) * | 2009-04-07 | 2011-09-20 | National Material, L.P. | Plain copper foodware and metal articles with durable and tarnish free multiplayer ceramic coating and method of making |
| KR101121367B1 (en) | 2009-07-16 | 2012-03-09 | 이용현 | Apparatus and method for coating of platinum catalysts for fuel cell |
| JP5907774B2 (en) * | 2012-03-27 | 2016-04-26 | オリンパス株式会社 | Method for manufacturing optical element molding die and method for manufacturing optical element |
| CN113526961A (en) * | 2021-08-19 | 2021-10-22 | 南通三责精密陶瓷有限公司 | Manufacturing method of silicon carbide mold for glass molding and silicon carbide mold |
-
2003
- 2003-11-25 JP JP2003393758A patent/JP4347671B2/en not_active Expired - Lifetime
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