JP2005142314A - ワイヤループ形状、そのワイヤループ形状を備えた半導体装置、ワイヤボンディング方法 - Google Patents
ワイヤループ形状、そのワイヤループ形状を備えた半導体装置、ワイヤボンディング方法 Download PDFInfo
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Abstract
【課題】第2ボンディング点でワイヤ接合強度を高め、かつワイヤリング時間が少なくて済む、ワイヤループ形状、その形状を備えた半導体装置及びワイヤボンディング方法の提供にある。
【解決手段】第1ボンディング点と第2ボンディング点との間をワイヤで接続するワイヤループ形状において、前記第2ボンディング点でワイヤボンディングした後、ワイヤを切断することなく再度ワイヤループを形成してその位置にワイヤの一部を含めて潰した状態のボンディングをした。
【選択図】 図1
Description
次に図6(b)に示すように、キャピラリ4はB点まで上昇してワイヤ3を繰
り出す。次に図6(c)に示すように、キャピラリ4を第2ボンディング点Zと
反対方向にC点まで水平移動させる。
そこで、セキュリティボンディング方法が提案されている。この方法は、特許文献3に記載されているように、第2ボンディング点にワイヤをボンディングした後、一旦ワイヤを切断してワイヤの先端にボールを形成した後、再度第2ボンディング点に上からボールボンディングする方法である。ボールボンディングした後は、そのままワイヤを切断するか、あるいはさらにボールボンディングした位置に重ならない点にエンドボンディングするようにしている。
上記の工程において、設定されたn点、とは予めキャピラリの移動通過点として座標軸(X,Y,Z)に設定したn(nは1,2,3・・・の何れかを示す。)個の点をいう(以下、同じ)。
第1ボンディング点Aと第2ボンディング点Zとに接続したワイヤループ形状は、ネック高さ部H(2a−3a)、台形部長さ部分L(3a−3b)及び傾斜部S(3b−1a)とからなっており、台形部長さ部分Lの両端には癖3a、3bが付けられている。
すなわち、第2ボンディング点において、ワイヤボンディングが行われた後、ワイヤを切断することなく再度ワイヤループを形成してその位置にワイヤの一部を含めて潰した状態のボンディングが行われる。これにより、半導体装置10は、第2ボンディング点での接合面積が拡大されたワイヤループ形状を備えるものとなる。
次に図2(b)に示すように、キャピラリ4はB点まで上昇してワイヤ3を繰り出す。次に図2(c)に示すように、キャピラリ4を第2ボンディング点Zと反対方向にC点まで水平移動させる。
続いて、図2(d)に示すように、キャピラリ4はD点まで上昇してワイヤ3を繰り出す。続いて、図2(e)に示すように、キャピラリ4は再び第2ボンディング点Zと反対方向にE点まで水平移動、即ちリバース動作を行う。これにより、ワイヤ3は、C点からE点まで傾斜した形状となり、ワイヤ3の部分に癖3bが付く。
上記の各工程を行うに当たり、予めキャピラリ4の移動通過点を座標軸(X,Y,Z)上に複数個所(n点)設定しておいて行う。
1a リード
2 チップ
2a パッド
3 ワイヤ
4 キャピラリ
30 ボール
H(2a-3a) ネック高さ部
L(3a-3b) フラット部
S(3b-1a) 傾斜部
A 第1ボンディング点
Z 第2ボンディング点
G 滑走路ループ形状
Claims (8)
- 第1ボンディング点と第2ボンディング点との間をワイヤで接続するワイヤループ形状において、前記第2ボンディング点でワイヤボンディングした後、ワイヤを切断することなく再度ワイヤループを形成してその位置にワイヤの一部を含めて潰した状態のボンディングをしたことを特徴とするワイヤループ形状。
- 第1ボンディング点にワイヤを接続する第1の工程と、次にキャピラリを設定されたn点を通過する上昇下降移動・水平移動及びこれらを合成した移動等のループコントロールを行う第2の工程と、続いて第2ボンディング点へボンディングを行う第3の工程と、次にキャピラリを設定されたn点を通過する上昇下降移動・水平移動及びこれらを合成した移動等のループコントロールを行いながらワイヤを繰り出す第4の工程と、続いて第2ボンディング点付近にボンディングする第5の工程とにより形成したことを特徴とする請求項1記載のワイヤループ形状。
- 前記第4の工程と第5の工程を交互にn回(nは1,2,3・・・)繰り返して形成することを特徴とする請求項2記載のワイヤループ形状。
- 第1ボンディング点と第2ボンディング点との間をワイヤボンディングする方法において、第1ボンディング点にワイヤを接続する第1の工程と、次にキャピラリを設定されたn点を通過する上昇下降移動・水平移動及びこれらを合成した移動等のループコントロールを行う第2の工程と、続いて第2ボンディング点にボンディングを行う第3の工程と、次にキャピラリを設定されたn点を通過する上昇下降移動・水平移動及びこれらを合成した移動等のループコントロールを行いながらワイヤを繰り出す第4の工程と、続いて第2ボンディング点付近にボンディングする第5の工程とを備えたことを特徴とするワイヤボンディング方法。
- 前記第4の工程と第5の工程を交互にn回(nは1,2,3・・・)繰り返すことを特徴とする請求項4記載のボンディング方法。
- 第1ボンディング点と第2ボンディング点との間をワイヤで接続したワイヤループ形状を有する半導体装置において、前記第2ボンディング点でワイヤボンディングした後、ワイヤを切断することなく再度ワイヤループを形成してその位置にワイヤの一部を含めて潰した状態のボンディングを行ったワイヤループ形状を備えたことを特徴とする半導体装置。
- 前記ワイヤループの形状は、第1ボンディング点にワイヤを接続する第1の工程と、次にキャピラリを設定されたn点を通過する上昇下降移動・水平移動及びこれらを合成した移動等のループコントロールを行う第2の工程と、続いて第2ボンディング点にボンディングを行う第3の工程と、次にキャピラリを設定されたn点を通過する上昇下降移動・水平移動及びこれらを合成した移動等のループコントロールを行いながらワイヤを繰り出す第4の工程と、ワイヤを第2ボンディング点付近に接続する第5の工程とにより形成されたことを特徴とする請求項6記載の半導体装置。
- 前記第4の工程と第5の工程を交互にn回(nは1,2,3・・・)繰り返して形成したことを特徴とする請求項7記載の半導体装置。
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007194470A (ja) * | 2006-01-20 | 2007-08-02 | Kaijo Corp | ボンディングワイヤのループ形状及びそのループ形状を備えた半導体装置並びにボンディング方法 |
US7425727B2 (en) | 2004-09-16 | 2008-09-16 | Sharp Kabushiki Kaisha | Optical semiconductor device, method for fabricating the same, lead frame and electronic equipment |
JP2011176280A (ja) * | 2010-01-27 | 2011-09-08 | Shinkawa Ltd | 半導体装置の製造方法並びにワイヤボンディング装置 |
US10181452B2 (en) | 2017-01-27 | 2019-01-15 | Nichia Corporation | Method for manufacturing light-emitting device |
US20220199571A1 (en) * | 2020-12-23 | 2022-06-23 | Skyworks Solutions, Inc. | Apparatus and methods for tool mark free stitch bonding |
-
2003
- 2003-11-06 JP JP2003376440A patent/JP3830485B2/ja not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7425727B2 (en) | 2004-09-16 | 2008-09-16 | Sharp Kabushiki Kaisha | Optical semiconductor device, method for fabricating the same, lead frame and electronic equipment |
JP2007194470A (ja) * | 2006-01-20 | 2007-08-02 | Kaijo Corp | ボンディングワイヤのループ形状及びそのループ形状を備えた半導体装置並びにボンディング方法 |
JP2011176280A (ja) * | 2010-01-27 | 2011-09-08 | Shinkawa Ltd | 半導体装置の製造方法並びにワイヤボンディング装置 |
US8123108B2 (en) | 2010-01-27 | 2012-02-28 | Shinkawa Ltd. | Method of manufacturing semiconductor device and wire bonding apparatus |
US8196803B2 (en) | 2010-01-27 | 2012-06-12 | Shinkawa Ltd. | Method of manufacturing semiconductor device and wire bonding apparatus |
US10181452B2 (en) | 2017-01-27 | 2019-01-15 | Nichia Corporation | Method for manufacturing light-emitting device |
US20220199571A1 (en) * | 2020-12-23 | 2022-06-23 | Skyworks Solutions, Inc. | Apparatus and methods for tool mark free stitch bonding |
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