JP2005131213A - Method for externimation of various bacteria using ozone for organism-growing apparatus - Google Patents

Method for externimation of various bacteria using ozone for organism-growing apparatus Download PDF

Info

Publication number
JP2005131213A
JP2005131213A JP2003372362A JP2003372362A JP2005131213A JP 2005131213 A JP2005131213 A JP 2005131213A JP 2003372362 A JP2003372362 A JP 2003372362A JP 2003372362 A JP2003372362 A JP 2003372362A JP 2005131213 A JP2005131213 A JP 2005131213A
Authority
JP
Japan
Prior art keywords
organism
ozone
gas
chamber
growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003372362A
Other languages
Japanese (ja)
Inventor
Minoru Sueda
穣 末田
Tetsuo Ichikizaki
哲雄 市来崎
Toshiyuki Ota
利行 大田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ryomei Engineering Co Ltd
Original Assignee
Ryomei Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ryomei Engineering Co Ltd filed Critical Ryomei Engineering Co Ltd
Priority to JP2003372362A priority Critical patent/JP2005131213A/en
Publication of JP2005131213A publication Critical patent/JP2005131213A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Mushroom Cultivation (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a sterilization method using ozone for an organism growing apparatus, eliminating bacteria which affect growth of useful organism stored in the growing apparatus easily and completely. <P>SOLUTION: Ozonic gas is brought into the organism growing apparatus 10 first prior to the transfer of useful organism into the apparatus 10, in order not only to maintain the appropriate temperature and gas composition including steam for their growth in the apparatus 10 where the useful organism is cultured, but also to eliminate bacteria which affect the growth, and bacteria will be eliminated when each part of the apparatus 10 is exposed to the ozonic gas. Then, a gas for adjusting the gas composition is brought into the apparatus 10, with which the gas composition in the apparatus 10 will include no ozone more and will become appropriate for the growth of the organism through at least three stages of process, ozone injection for eliminating bacteria included in the apparatus, degradation and removal of the ozone and dust removal by a HEPA filter F. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、細胞培養、菌の発酵、きのこの栽培等、各種生物体育成室に収容された有用生物体の育成に当って、それの障害となる雑菌をオゾンによって駆除する、オゾンによる生物体育成室の雑菌駆除方法に関する。   The present invention eliminates various germs that become obstacles to the growth of useful organisms housed in various organism growth rooms, such as cell culture, fermentation of fungi, and cultivation of mushrooms. The present invention relates to a method for eliminating germs in adult rooms.

従来、細胞、菌、きのこ等の生物体育成室(例えば培養器)に収容された各種有用生物体の育成(培養、発酵、栽培)に当って、その育成の障害となる雑菌の駆除のために、熱湯(煮沸)、高温蒸気による加熱(高圧、乾熱滅菌等)、電磁波(紫外線等)の照射、液状殺菌剤(アルコール、ホルマリン、塩素化合物等)の塗布、又はそれへの浸漬、ガス状殺菌剤(オゾン等)への曝露等が行なわれている。   Conventionally, for the elimination of various germs that hinder the growth of various useful organisms (culture, fermentation, cultivation) housed in organism growth rooms (eg, incubators) such as cells, fungi, and mushrooms In addition, hot water (boiling), heating with high temperature steam (high pressure, dry heat sterilization, etc.), irradiation with electromagnetic waves (ultraviolet rays, etc.), application of liquid disinfectants (alcohol, formalin, chlorine compounds, etc.), or immersion in it, gas Exposure to fungicides (such as ozone) has been carried out.

いずれも一長一短があり、生物体育成室の取外し可能な部材や部品に対してはそれぞれ有効であるが、本体及び取外し不能又は困難な部材に対しては、一般に加熱や液状殺菌剤への浸漬は馴染まず、電磁波の照射はその陰になる部分に対しては効果がなく、駆除が不完全であり、液状殺菌剤の塗布は一般に手作業に依存しており、極めて煩瑣であると言う問題点がある。それに対してガス状殺菌剤(オゾン等)への曝露は、ガス状殺菌剤が狭い隙間にも侵入するため、設備さえ整備されていれば、自動的に行なわれ、その漏洩さえ完全に防止されれば、作業環境への影響はなく、最も有効な手段と考えられる。   Both have advantages and disadvantages, and are effective for removable members and parts of the organism growing room, but for the main body and non-removable or difficult members, heating and immersion in a liquid disinfectant are generally not possible. First of all, electromagnetic radiation has no effect on the shadowed parts, the disinfection is incomplete, and the application of liquid disinfectant generally depends on manual work and is extremely troublesome There is. On the other hand, exposure to gaseous sterilizers (such as ozone) can be carried out automatically if the equipment is in place because the gaseous sterilizer penetrates into narrow gaps, and even leakage is completely prevented. If there is no influence on the work environment, it is considered to be the most effective means.

その一つの従来例に、固体(例えば蒸煮脱脂大豆等)培養 原料の培養装置の内部又は空調経路がオゾン を含有する空気又は水によって予め洗浄され、その加熱処理された固体原料の急冷にオゾン を含有する空気が使用され、また、その培養に当って、固体培養 装置の空調経路に取り込まれた空気にオゾン を含むガスが供給されることが、それぞれ提案されている(例えば特許文献1参照。)。 In one conventional example, the inside of the culture apparatus for solid (eg, steamed defatted soybean) or the air conditioning path is pre-washed with air or water containing ozone, and ozone is used to quench the heat-treated solid raw material. It has been proposed that air containing ozone is used, and that gas containing ozone is supplied to the air taken into the air-conditioning path of the solid culture device in the culture (see, for example, Patent Document 1). ).

しかしながら、例えば蒸煮脱脂大豆のように固体の表面に付着した雑菌がオゾンを含む空気に曝露され、駆除されるだけで、その固体内部で増殖する菌に対しては、オゾン濃度が低く、曝露時間が短ければ、その生育に格別影響はないかも知れないが、オゾンに対して敏感で曝露によってその生育が損われるおそれのある生物体の育成(例えば細胞の培養の場合)に対してはこのままでは適用不可能又は困難である。なお、その細胞の培養に当って、一般に取外し可能な部材、部品に対しては高圧滅菌、本体及び取外し不可能又は困難な部材に対しては液状殺菌薬の複数回の塗布、それによる洗浄、導入ガスに対しては紫外線照射が行なわれている。   However, for example, germs that adhere to the surface of a solid, such as steamed defatted soybeans, are exposed to ozone-containing air and are only removed. If it is short, it may not have a significant effect on its growth, but this is not the case for the growth of organisms that are sensitive to ozone and whose growth can be impaired by exposure (eg in the case of cell culture). Inapplicable or difficult. In culturing the cells, generally, detachable members, autoclaving for parts, and the main body and non-removable or difficult members are applied multiple times with liquid disinfectant, washing by it, The introduced gas is irradiated with ultraviolet rays.

特開平05−131184号公報(特許請求の範囲及び図1)Japanese Patent Laid-Open No. 05-131184 (Claims and FIG. 1)

以上のことから、本発明は、上記した従来技術の欠点を除くために、生物体育成室に収容された有用生物体の育成に当ってそれの障害となる雑菌をオゾンによって容易、且つ完全に駆除する、オゾンによる生物体育成室の雑菌駆除方法を提供することにある。   From the above, in order to eliminate the disadvantages of the prior art described above, the present invention easily and completely eliminates germs that become obstacles to the growth of useful organisms contained in the organism growth room. An object of the present invention is to provide a method for eliminating germs in an organism growing room by ozone.

上記の目的を達するために、請求項1の発明のオゾンによる生物体育成室の雑菌駆除方法は、有用生物体が収容された生物体育成室10内の温度・水蒸気を含むガス組成が前記有用生物体の育成に適するよう維持されるだけではなく、その育成を損う雑菌が駆除されるよう、前記生物体育成室内10への前記有用生物体の搬入に先立って、先ずその生物体育成室10内にオゾン含有ガスが導入され、その室10内の各部が前記オゾン含有ガスに曝露されることによって雑菌が駆除され、次いで前記室10内のガス組成が、オゾンを含まず、且つ前記有用生物体の育成に適したものになるよう、少なくとも、それに含まれる雑菌の駆除のためのオゾンの注入、そのオゾンの分解除去、及びHEPAフィルタFによる除塵の3つの処理を経たガス組成調整用のガスが導入されるよう構成されている。 In order to achieve the above object, according to the method for eliminating germs in an organism growth chamber with ozone according to the invention of claim 1, the gas composition including temperature and water vapor in the organism growth chamber 10 in which the useful organism is accommodated is used. Prior to the introduction of the useful organism into the organism growth chamber 10, the organism growth chamber is first maintained so that not only is it maintained suitable for the growth of the organism but also the germs that impair its growth are eliminated. The ozone-containing gas is introduced into the chamber 10, and various parts in the chamber 10 are exposed to the ozone-containing gas to eliminate germs. Then, the gas composition in the chamber 10 does not contain ozone and is useful Gas that has undergone at least three treatments: injection of ozone to eliminate germs contained in it, decomposition and removal of ozone, and dust removal by HEPA filter F so as to be suitable for the growth of organisms Forming adjustment of the gas is configured to be introduced.

請求項2の発明は、請求項1の発明の構成に加えて、前記生物体育成室10内に収容された前記有用生物体の育成期間中も、その室10内に、少なくとも、それに含まれる雑菌の駆除のためのオゾンの注入、そのオゾンの分解除去、及びHEPAフィルタFによる除塵の3つの処理を経たガス組成調整用のガスが継続して導入されるよう構成されている。 In addition to the configuration of the invention of claim 1, the invention of claim 2 is included in at least the chamber 10 during the growth period of the useful organism housed in the organism growth chamber 10. A gas for adjusting the gas composition that has undergone the three processes of ozone injection for eliminating germs, decomposition and removal of ozone, and dust removal by the HEPA filter F is continuously introduced.

請求項3の発明は、請求項1又は2の発明の構成に加えて、前記生物体育成室10内に収容された前記有用生物体の育成期間中、少なくとも新しい生物体の搬入時、及び、好ましくはその育成状態のチェック時、生物体の一部の搬出時、のそれぞれ雑菌汚染が懸念される度毎に、及び、好ましくは所定の周期で、オゾンを含有するガスが前記室10内へ一時的に導入されるよう構成されている。 In addition to the structure of the invention of claim 1 or 2, the invention of claim 3 is at least a time of carrying in a new organism during the growth period of the useful organism housed in the organism growth chamber 10, and Preferably, the ozone-containing gas is introduced into the chamber 10 each time there is a concern about contamination with germs during the check of the growth state and when a part of the organism is carried out, and preferably at a predetermined cycle. It is configured to be introduced temporarily.

請求項4の発明は、請求項1乃至3のいずれか発明の構成に加えて、前記室10内ガスは引き出され、ガス組成調整部分20を経てガス組成調整用ガスの少なくとも一部となって循環されるよう構成されている。   According to a fourth aspect of the present invention, in addition to the configuration of any one of the first to third aspects, the gas in the chamber 10 is drawn out and becomes at least part of the gas composition adjusting gas through the gas composition adjusting portion 20. It is configured to be circulated.

請求項1の発明によれば、生物体育成室10内の各部が、小さい隙間も含めて、オゾン含有ガスに曝露され、雑菌が駆除されたうえ、少なくとも、それに含まれる雑菌の駆除のためのオゾンの注入、そのオゾンの分解除去、及びHEPAフィルタFによる除塵の3つの処理を経たガス組成調整用のガスの導入によって、前記室10内のガス組成が、オゾンを含まず、且つ前記有用生物体の育成に適したものになり、しかも、その後もガス組成調整用のガスに何らかの原因でそれぞれ侵入した、比較的大きい胞子状の菌はHEPAフィルタFによって捕捉され、比較的小さい菌はオゾン含有ガスによって駆除されるため、オゾンに対して敏感でその生育が損われるおそれのある生物体(例えば細胞の培養)の育成に支障ない環境が確保される。 According to the invention of claim 1, each part in the organism growth chamber 10 is exposed to the ozone-containing gas, including a small gap, and the germs are exterminated, and at least for eliminating the germs contained therein. The gas composition in the chamber 10 does not contain ozone by introducing gas for adjusting the gas composition that has undergone the three processes of ozone injection, ozone decomposition and removal, and dust removal by the HEPA filter F. Relatively large spore-shaped bacteria that have entered the gas for gas composition adjustment for some reason are captured by the HEPA filter F, and relatively small bacteria contain ozone. Since it is extinguished by gas, an environment is secured that does not hinder the growth of organisms (eg, cell culture) that are sensitive to ozone and may lose their growth.

請求項2の発明によれば、請求項1の発明の効果に加えて、前記生物体育成室10内に収容された前記有用生物体の育成期間中も同様に、その室10内に、少なくとも、それに含まれる雑菌の駆除のためのオゾンの注入、そのオゾンの分解除去、及び比較的大きい菌のHEPAフィルタFによる除塵の3つの処理を経たガス組成調整用のガスが継続して導入され、それに伴って室10内のガスが室外に引き出されるため、何等かの原因で室10内のガスが雑菌で汚染されることがあっても、その雑菌は室10内から継続して排除される。従って、オゾンに対して敏感でその生育が損われるおそれのある生物体(例えば細胞の培養)の育成に支障ない環境が継続して確保される。   According to the invention of claim 2, in addition to the effect of the invention of claim 1, during the growth period of the useful organism housed in the organism growth chamber 10, similarly, The gas for adjusting the gas composition after three treatments of ozone injection for eliminating germs contained therein, decomposition and removal of the ozone, and dust removal by the HEPA filter F of relatively large bacteria was continuously introduced. As a result, the gas in the chamber 10 is drawn out of the room, so that even if the gas in the chamber 10 is contaminated with germs for any reason, the germs are continuously removed from the chamber 10. . Therefore, an environment that is sensitive to ozone and that does not hinder the growth of organisms (for example, cell culture) that are likely to lose their growth is continuously secured.

請求項3の発明によれば、請求項1又は2の発明の効果に加えて、前記生物体育成室10内に収容された前記有用生物体の育成期間中、少なくとも新しい生物体の搬入時、及び、好ましくはその育成状態のチェック時、生物体の一部の搬出時、のそれぞれ雑菌汚染が懸念される度毎に、及び、好ましくは所定の周期で、オゾンを含有するガスが前記室10内へ一時的に導入されるため、勿論、生物体への曝露時間やオゾン濃度が、その生物体に応じてそれぞれ十分に短く、且つ低く設定されることが必要ではあるが、生物体の育成環境がさらに積極的に雑菌汚染の危険から守られる。 According to the invention of claim 3, in addition to the effect of the invention of claim 1 or 2, at least when a new organism is carried in during the growth period of the useful organism housed in the organism growth chamber 10, Preferably, each time the growing state is checked and when a part of the organism is carried out, the gas containing the ozone is contained in the chamber 10 every time there is a concern about contamination with germs, and preferably at a predetermined cycle. It is necessary to set the exposure time to the organism and the ozone concentration to be sufficiently short and low according to the organism. The environment is more actively protected from the risk of contamination.

請求項4の発明によれば、請求項1乃至3の発明の効果に加えて、前記室10内ガスは引き出され、ガス組成調整部分20を経てガス組成調整用ガスの少なくとも一部となって循環されるため、新たなガスの導入その他、ガス組成調整のための負担がそれだけ軽減される。   According to the invention of claim 4, in addition to the effects of the inventions of claims 1 to 3, the gas in the chamber 10 is drawn out and becomes at least a part of the gas for adjusting the gas composition through the gas composition adjusting portion 20. Since it is circulated, the burden of introducing a new gas and adjusting the gas composition is alleviated accordingly.

本発明を実施するため最良の形態に関わる、オゾンによる生物体育成室の雑菌駆除方法についてコウジカビ培養を例に図1により説明すると、10はそのコウジカビである生物体が収容され、培養される生物体育成室(培養器)であって、図示されない断熱材が施されたステンレス製の扉(図示省略)と壁で囲まれており、そのうえ、HEPAフィルタFと2つのダンパDとを持つ隔壁によって、側面にガス導入口12aを持つフィルタリング室12と,側面にガス排出口11aを持つ培養室11と,が上下に隔てられている。なお、その他、室10の内部にはシャーレ等に入った生物体が載置される培養ラック11b、壁には温度計T、圧力計P、CO2計C1、オゾン計C2等のセンサや室10内の温度を設定値に保持するための加熱手段(図示省略)もそれぞれ設けられている。   Referring to FIG. 1 as an example of Aspergillus culturing, a method for eliminating germs in an organism growing room by ozone, which relates to the best mode for carrying out the present invention, 10 is an organism in which an organism that is Aspergillus is contained and cultured. It is a body growing room (incubator), surrounded by a stainless steel door (not shown) and a wall provided with a heat insulating material (not shown), and by a partition wall having a HEPA filter F and two dampers D The filtering chamber 12 having the gas introduction port 12a on the side surface and the culture chamber 11 having the gas discharge port 11a on the side surface are separated vertically. In addition, inside the chamber 10, a culture rack 11b on which organisms that have entered a petri dish or the like are placed, and on the wall, sensors such as a thermometer T, a pressure gauge P, a CO2 meter C1, an ozone meter C2, and the chamber 10 Heating means (not shown) for keeping the temperature at a set value is also provided.

20はガス組成調整部分であって、主要機器としては、循環ファン21、オゾナイザ22、ガス加湿器23、オゾン分解器24の他、前記ガス加湿器23に内蔵されたガス加熱器25、ガス冷却器26も備えている。27はCO2ボンベ、28は酸素ボンベであり、また、30は操作盤を含む、装置全体を制御する制御部分である。   Reference numeral 20 denotes a gas composition adjusting portion, and main equipment includes a circulation fan 21, an ozonizer 22, a gas humidifier 23, an ozone decomposer 24, a gas heater 25 built in the gas humidifier 23, and a gas cooling unit. A container 26 is also provided. 27 is a CO2 cylinder, 28 is an oxygen cylinder, and 30 is a control part for controlling the entire apparatus including an operation panel.

配管について説明すると、その一つとして、室10内からガス排出口11aを排出されたガスが、循環ファン21によって吸引され、酸素ボンベ28から供給され、オゾナイザ22によってその一部がオゾンに転換されたオゾン含有酸素及びCO2ボンベ27から供給されるCO2を同伴し、ガス加湿器25に送られ、水と接触し、オゾン及びCO2の一部がその水に溶解すると共に、大部分の大部分のガスが加湿され、さらに、ガス冷却器26を経て直接フィルタリング室12のガス導入口12aに導かれるよう、ラインL1が設けられている。 The piping will be described as one example. The gas discharged from the gas discharge port 11a from the inside of the chamber 10 is sucked by the circulation fan 21, supplied from the oxygen cylinder 28, and part thereof is converted to ozone by the ozonizer 22. The ozone-containing oxygen and the CO2 supplied from the CO2 cylinder 27 are entrained, sent to the gas humidifier 25, contacted with water, and a part of ozone and CO2 is dissolved in the water, and most of the most A line L1 is provided so that the gas is humidified and further led directly to the gas inlet 12a of the filtering chamber 12 via the gas cooler 26.

その他、ガス加熱器25の出口とガス導入口12aとの間には、オゾン分解器24が挿入されたバイパスラインL2が設けられ、また循環ファン21の吐出口とガス導入口12aとの間には、バイパスラインL3が設けられている。なお、Vは流量調節弁、RVは減圧弁である。   In addition, a bypass line L2 into which an ozonolysis device 24 is inserted is provided between the outlet of the gas heater 25 and the gas inlet 12a, and between the outlet of the circulation fan 21 and the gas inlet 12a. Is provided with a bypass line L3. V is a flow control valve, and RV is a pressure reducing valve.

以上のように構成され、次に示す操作によって、有用生物体が収容された生物体育成室 10内の温度・水蒸気を含むガス組成が前記有用生物体の育成に適するよう維持されるだけではなく、その育成を損う雑菌が駆除される。すなわち、先ず、ガス組成調整手段20によって、その生物体育成室10内にオゾン含有ガスが導入され、その室10内の各部が前記オゾン含有ガスに曝露されると共に、ガス加湿器25内の水に溶解したオゾンに接触することによって雑菌が駆除される。なお、ガス加熱器25、ガス冷却器26は、生物体育成室10に送られるガスの湿度、温度を生物体の育成に適した値に調節する。 The above-described operation is not only maintained so that the gas composition including the temperature and water vapor in the organism growth chamber 10 in which the useful organisms are accommodated is suitable for the growth of the useful organisms. The germs that impair its growth are eliminated. That is, first, an ozone-containing gas is introduced into the organism growth chamber 10 by the gas composition adjusting means 20, each part in the chamber 10 is exposed to the ozone-containing gas, and water in the gas humidifier 25 is Various bacteria are exterminated by contact with ozone dissolved in water. Note that the gas heater 25 and the gas cooler 26 adjust the humidity and temperature of the gas sent to the organism growth chamber 10 to values suitable for the growth of the organism.

それについて詳細に説明すると、図示されない扉が閉じられ、ラインL1の弁Vが開かれ、ラインL2,L3の弁Vが閉じられた状態で、密閉された生物体育成室10内の空気は、循環ファン21によってガス排出口11aから引き出されたガスは、前記循環ファン21の吐出側で、酸素ボンベ28から供給される酸素の一部が、オゾナイザ22によってオゾンに転換されたオゾン含有酸素及びCO2ボンベ27から供給されるCO2を同伴し、ガス加湿器25に送られ、水と接触し、オゾン及びCO2の一部がその水に溶解すると共に大部分の残りのガスは雑菌駆除に適した温度、湿度に調節される。   In detail, when the door (not shown) is closed, the valve V of the line L1 is opened, and the valves V of the lines L2 and L3 are closed, the air in the sealed organism growth chamber 10 is The gas withdrawn from the gas discharge port 11a by the circulation fan 21 is composed of ozone-containing oxygen and CO2 in which a part of oxygen supplied from the oxygen cylinder 28 is converted into ozone by the ozonizer 22 on the discharge side of the circulation fan 21. Along with CO2 supplied from the cylinder 27, it is sent to the gas humidifier 25 and comes into contact with water. Ozone and a part of CO2 are dissolved in the water, and most of the remaining gas is a temperature suitable for controlling germs. Adjusted to humidity.

そのガスは、さらにガス組成調整用のガスとなって(雑菌の駆除だけであればオゾン添加、加湿だけでよく、CO2添加は省略も可)、直接ガス導入口12aを経てフィルタリング室12に導かれる。2つのダンパDは閉じられていて、そのフィルタリング室12へ導かれたガスは、HEPAフィルタFで除塵されたうえ、培養室11に導かれる。そのガスは、ガス排出口11aから循環ファン21によって引き出されることによって、上述の操作を受けながら、その大部分は繰り返し循環される。なお、室10内の温度、オゾン濃度、CO2濃度は、それぞれセンサT,C1,C2からの信号に基き、制御部分30によってそれぞれの設定値に制御される。 The gas further becomes a gas for adjusting the gas composition (if only germs are eliminated, ozone addition and humidification are sufficient, and CO2 addition may be omitted), and the gas is introduced directly to the filtering chamber 12 via the gas inlet 12a. It is burned. The two dampers D are closed, and the gas guided to the filtering chamber 12 is removed by the HEPA filter F and then guided to the culture chamber 11. The gas is drawn out by the circulation fan 21 from the gas discharge port 11a, and most of the gas is repeatedly circulated while receiving the above-described operation. The temperature in the chamber 10, the ozone concentration, and the CO2 concentration are controlled to the respective set values by the control unit 30 based on signals from the sensors T, C1, and C2, respectively.

それによって、ガスが循環する間に、それに同伴された比較的大きい胞子状の菌はHEPAフィルタFに捕捉され、生物体育成室10内の各部は、小さい隙間も含めて、オゾン含有ガスに曝露されると共に、ガスがガス加湿器25内の水に溶解したオゾンに接触することによって、全ての雑菌が駆除される。なお、水に溶解したオゾンはオゾン含有ガスに比してその殺菌力は著しく高い。また、上述(0023)に記載の操作中にガス組成等の条件が設定値に達していれば、ラインL1,L2の弁Vが閉じられ、ラインL3の弁Vが開かれた状態で単に室10のガスがラインL3を経由して循環されるだけでも雑菌の駆除が行なわれる。 Thereby, while the gas circulates, relatively large spore-like bacteria entrained therein are captured by the HEPA filter F, and each part in the organism growth chamber 10 is exposed to the ozone-containing gas including a small gap. At the same time, when the gas comes into contact with ozone dissolved in the water in the gas humidifier 25, all germs are eliminated. Note that ozone dissolved in water has a significantly higher sterilizing power than ozone-containing gas. If the conditions such as the gas composition have reached the set values during the operation described in the above (0023), the valve V in the lines L1 and L2 is closed and the valve V in the line L3 is opened. Even if 10 gases are circulated through the line L3, germs are eliminated.

生物体育成室10内の雑菌の完了後は、ラインL2の弁Vが開かれ、ラインL1,L3の弁Vが閉じられることによって、ガス組成調整用のガスはオゾン分解器24を通過するようになり、それに含まれるオゾンが分解除去され、オゾンを含まないガスとなって培養室11に導入される。その後暫らくは、同様のガス組成、温度の調整操作が行なわれ、ガスが繰り返し循環されると、室10内のオゾン含有ガスは、それを含まない、生物体の育成に適した組成のガスに完全に置換される。それによって作業者への影響も解消されるため、室10内への生物体の搬入が可能となる。なお、この間のガス組成調整ガスのオゾン分解除去前のオゾン濃度は、(0022)〜(0024)に記載の生物体育成室10内の雑菌の駆除中のそれに比べて低くてもよい。 After completion of the germs in the organism growing room 10, the valve V of the line L2 is opened and the valves V of the lines L1 and L3 are closed so that the gas for adjusting the gas composition passes through the ozonolysis device 24. Then, the ozone contained therein is decomposed and removed, and introduced into the culture chamber 11 as a gas containing no ozone. For the time being, the same gas composition and temperature adjustment operations are performed, and when the gas is repeatedly circulated, the ozone-containing gas in the chamber 10 does not contain the gas having a composition suitable for growing organisms. Is completely replaced. Since the influence on the worker is thereby eliminated, it becomes possible to carry in the organism into the chamber 10. In addition, the ozone concentration before the ozonolysis removal of the gas composition adjustment gas during this period may be lower than that during the extermination of germs in the organism growing chamber 10 described in (0022) to (0024).

しかも、その間は勿論、有用生物体の育成期間中も上記操作が維持されることによって、何等かの原因で雑菌の侵入があっても、比較的大きい胞子状の菌はHEPAフィルタFによって捕捉され、且つ比較的小さい菌はオゾン含有ガス及びガス加湿器25内の水に溶解したオゾンによって駆除されるため、オゾンに対して敏感でその生育が損われるおそれのある生物体(例えば細胞の培養)の育成に支障ない環境が引続き確保される。 Moreover, of course, the above-mentioned operation is maintained during the growth period of useful organisms, so that relatively large spore-like bacteria are captured by the HEPA filter F even if there is an invasion of germs for any reason. In addition, since relatively small bacteria are exterminated by ozone-containing gas and ozone dissolved in the water in the gas humidifier 25, organisms that are sensitive to ozone and whose growth may be impaired (for example, cell culture) An environment that does not hinder the development of the plant will continue to be secured.

最後に、前記生物体育成室10内に収容された前記有用生物体の育成期間中、少なくとも新しい生物体の搬入時、及び、好ましくはその育成状態のチェック時、生物体の一部の搬出時、のそれぞれ雑菌汚染が懸念される度毎に、及び、好ましくは所定の周期で、ラインL2,L3の弁Vが閉じられ、ラインL1の弁Vが開かれ、オゾンを含有するガスが前記室10内へ一時的に導入される。なお、そのオゾン含有ガスの湿度、CO2濃度はそれ以前のまま維持される。それによって、勿論、生物体への曝露時間やオゾン濃度が、その生物体に応じてそれぞれ十分に短く、且つ低く設定されることが必要ではあるが、生物体のオゾン含有ガスへの曝露がそれに基いて一時的であるため、その育成を損うことなく、生物体の育成環境がさらに積極的に常に雑菌汚染の危険から守られる。 Finally, during the growth period of the useful organism housed in the organism growth chamber 10, at least when a new organism is carried in, and preferably when the growth state is checked, when a part of the organism is carried out The valve V of the lines L2 and L3 is closed, the valve V of the line L1 is opened, and gas containing ozone is supplied to the chamber every time there is a concern about contamination with various germs, and preferably at a predetermined cycle. 10 is temporarily introduced. Note that the humidity and CO2 concentration of the ozone-containing gas are maintained as before. Thus, of course, the exposure time and ozone concentration of the organism need to be set sufficiently short and low depending on the organism, but the exposure of the organism to the ozone-containing gas Because it is temporary, the environment for growing organisms is always more positively protected from the danger of contamination by bacteria without compromising its growth.

しかも、前記室10内ガスは引き出され、ガス組成調整部分20を経てガス組成調整用ガスの少なくとも一部、好ましくは大部分となって循環されるため、新たなガスの導入その他、ガス組成調整のための負担がそれだけ軽減される。   Moreover, since the gas in the chamber 10 is drawn and circulated through the gas composition adjusting portion 20 as at least a part, preferably a large part of the gas composition adjusting gas, the introduction of new gas and other gas composition adjustments are performed. The burden for is reduced accordingly.

以下の実施例によって本発明をさらに遺伝子操作のためのコウジカビの培養に当っての雑菌駆除について具体的に説明するが、この発明の範囲はこれに限定されるものではない。すなわち、 先ず検体であるコウジカビは収容されず、生物体育成室10内に37℃、オゾン濃度20ppmのCO2を含むガスが30分導入、循環された(L1ライン)、その後オゾン分解器24を経たオゾンを含まないガスが30分導入、循環され(L2ライン)ることによって生物体育成室10内のガスがオゾンを含まず、コウジカビに適したガスに置換された。 The present invention will be described in more detail with reference to the following examples, which illustrate the control of various germs in the cultivation of Aspergillus oryzae for genetic manipulation. However, the scope of the present invention is not limited thereto. That is, first, the mildew that is the specimen is not accommodated, and a gas containing CO 2 with an ozone concentration of 20 ppm is introduced and circulated in the organism growth chamber 10 for 30 minutes (L1 line), and then passes through the ozonolysis device 24. A gas not containing ozone was introduced and circulated for 30 minutes (L2 line), whereby the gas in the organism growth chamber 10 did not contain ozone and was replaced with a gas suitable for Aspergillus.

次いで検体が培養ラック11bに載置され、2週間その培養が行なわれた。培養の間2日に1度の割合いで培養状況の観察が行なわれた。その際生物体育成室10の扉の開閉よる雑菌の侵入が懸念されたため、扉の開閉のタイミングに合わせて、濃度2.5ppmを含むガスが生物体育成室10内に導入され、30分間循環されることによって、雑菌駆除処理が行なわれた。その結果、2週間の間に培地には雑菌が繁殖することなく培養が行なわれた。 Next, the specimen was placed on the culture rack 11b and cultured for 2 weeks. The culture state was observed once every two days during the culture. At that time, since there was concern about the invasion of germs by opening and closing the door of the organism growth chamber 10, a gas containing a concentration of 2.5 ppm was introduced into the organism growth chamber 10 and circulated for 30 minutes in accordance with the opening and closing timing of the door. As a result, various germs were removed. As a result, the culture was carried out in the medium without propagation of various bacteria in the two weeks.

オゾン濃度2.5ppmの雰囲気にコウジカビ、枯草菌、パン酵母、大腸菌が暴露されたときの、生存率の時間推移を図2に示す。このデータはこれらの細菌、真菌が種類によりオゾンへの耐性に差があり、この特性を利用することで狙った菌を選択的に殺菌することができることを示している。本実施例においてもコウジカビの培養の障害になる雑菌の除去に選択殺菌の考えを適用し効果が確認された。 FIG. 2 shows the time course of the survival rate when Aspergillus niger, Bacillus subtilis, baker's yeast, and Escherichia coli are exposed to an atmosphere with an ozone concentration of 2.5 ppm. This data shows that these bacteria and fungi differ in their resistance to ozone depending on the type, and by utilizing this characteristic, the targeted bacteria can be selectively sterilized. Also in this example, the idea of selective sterilization was applied to the removal of various germs that hindered the cultivation of Aspergillus, and the effect was confirmed.

本発明を実施するための最良の形態例に適用される装置の機器構成図である。It is an apparatus block diagram of the apparatus applied to the best example for implementing this invention. 実施例1を説明するためのコウジカビとそれ以外の駆除すべき菌に対するオゾンへの暴露時間と生存率の関係を示すグラフである。It is a graph which shows the relationship between the exposure time to ozone with respect to Aspergillus oryzae and other bacteria to be controlled for explaining Example 1 and the survival rate.

符号の説明Explanation of symbols

10 生物体育成室
11 培養室
11a ガス排出口
11b 培養ラック
12 フィルタリング室
12a ガス導入口
20 ガス組成調整部分
21 循環ファン
22 オゾナイザ
23 ガス加湿器
24 オゾン分解器
25 ガス加熱器
26 ガス冷却器
27 CO2ボンベ
28 酸素ボンベ
30 制御部分
C1 CO2計
C2 オゾン計
D ダンパ
L1,L2,L3 配管ライン
F HEPAフィルタ
P 圧力計
T 温度計
V 流量調節弁
VR 減圧弁
DESCRIPTION OF SYMBOLS 10 Organism growth room 11 Culture room 11a Gas discharge port 11b Culture rack 12 Filtering room 12a Gas introduction port 20 Gas composition adjustment part 21 Circulating fan 22 Ozonizer 23 Gas humidifier 24 Ozone decomposer 25 Gas heater 26 Gas cooler 27 CO2 Cylinder 28 Oxygen cylinder 30 Control part
C1 CO2 meter C2 Ozone meter D Damper L1, L2, L3 Piping line F HEPA filter P Pressure gauge T Thermometer
V Flow control valve VR Pressure reducing valve

Claims (4)

有用生物体が収容された生物体育成室(10)内の温度・水蒸気を含むガス組成が前記有用生物体の育成に適するよう維持されるだけではなく、その育成を損なう雑菌が駆除されるよう、前記生物体育成室内(10)への前記有用生物体の搬入に先立って、先ずその生物体育成室(10)内にオゾン含有ガスが導入され、その室(10)内の各部が前記オゾン含有ガスに曝露されることによって雑菌が駆除され、次いで前記室(10)内のガス組成が、オゾンを含まず、且つ前記有用生物体の育成に適したものになるよう少なくとも、それに含まれる雑菌の駆除のためのオゾンの注入、そのオゾンの分解除去、及びHEPAフィルタ(F)による除塵の3つの処理を経たガス組成調整用のガスが導入されることを特徴とするオゾンによる生物体育成室の雑菌駆除方法。 Not only is the gas composition containing the temperature and water vapor in the organism growth chamber (10) in which the useful organisms are accommodated maintained so as to be suitable for the growth of the useful organisms, but the germs that impair the growth are controlled. Prior to the introduction of the useful organism into the organism growth chamber (10), first, an ozone-containing gas is introduced into the organism growth chamber (10), and each part in the chamber (10) contains the ozone. The bacteria contained in the chamber (10) are contained at least so that the gas composition in the chamber (10) does not contain ozone and is suitable for the growth of the useful organism. Biomass by ozone, characterized by introducing gas for gas composition adjustment after three treatments of ozone injection, ozone decomposition and removal, and dust removal by HEPA filter (F) Bacteria method of combating growing chamber. 前記生物体育成室(10)内に収容された前記有用生物体の育成期間中も、その室(10)内に、少なくとも、それに含まれる雑菌の駆除のためのオゾンの注入、そのオゾンの分解除去、及びHEPAフィルタ(F)による除塵の3つの処理を経たガス組成調整用のガスが継続して導入されることを特徴とする請求項1に記載のオゾンによる生物体育成室の雑菌駆除方法。 During the growth period of the useful organism housed in the organism growth chamber (10), at least ozone injection for eliminating germs contained in the chamber (10) and decomposition of the ozone The method for eliminating germs in an organism-growing room with ozone according to claim 1, wherein the gas for gas composition adjustment that has undergone the three processes of removal and dust removal by the HEPA filter (F) is continuously introduced. . 前記生物体育成室(10)内に収容された前記有用生物体の育成期間中、少なくとも新しい生物体の搬入時、及び、好ましくはその育成状態のチェック時、生物体の一部の搬出時、のそれぞれ雑菌汚染が懸念される度毎に、及び、好ましくは所定の周期で、オゾンを含有するガスが前記室(10)内へ一時的に導入されることを特徴とする、請求項1又は2に記載のオゾンによる生物体育成室の雑菌駆除方法。 During the breeding period of the useful organism housed in the organism breeding room (10), at least when a new organism is carried in, and preferably at the time of checking the breeding state, when a part of the organism is carried out, The ozone-containing gas is temporarily introduced into the chamber (10) every time there is a concern about contamination of each of the microorganisms, and preferably at a predetermined cycle. 2. A method for eliminating germs in an organism-growing room with ozone according to 2. 前記室(10)内ガスが引き出され、ガス組成調整部分(20)を経てガス組成調整用のガスの少なくとも一部となって循環されることを特徴とする、請求項1乃至3のいずれかに記載のオゾンによる生物体育成室の雑菌駆除方法。
The gas in the chamber (10) is drawn out and circulated as at least part of a gas for gas composition adjustment through a gas composition adjustment portion (20). A method for eliminating germs in an organism-growing room with ozone as described in 1.
JP2003372362A 2003-10-31 2003-10-31 Method for externimation of various bacteria using ozone for organism-growing apparatus Pending JP2005131213A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003372362A JP2005131213A (en) 2003-10-31 2003-10-31 Method for externimation of various bacteria using ozone for organism-growing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003372362A JP2005131213A (en) 2003-10-31 2003-10-31 Method for externimation of various bacteria using ozone for organism-growing apparatus

Publications (1)

Publication Number Publication Date
JP2005131213A true JP2005131213A (en) 2005-05-26

Family

ID=34648768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003372362A Pending JP2005131213A (en) 2003-10-31 2003-10-31 Method for externimation of various bacteria using ozone for organism-growing apparatus

Country Status (1)

Country Link
JP (1) JP2005131213A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107258314A (en) * 2016-04-08 2017-10-20 单文修 A kind of edible fungi material continuous production device and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107258314A (en) * 2016-04-08 2017-10-20 单文修 A kind of edible fungi material continuous production device and method

Similar Documents

Publication Publication Date Title
EP1992684B1 (en) Incubator for isolator
US20090081075A1 (en) Method of sterilization and sterilization apparatus
JP2722228B2 (en) Method for removing contamination of living cells or the surface in the vicinity thereof using gas-phase hydrogen peroxide
KR101357336B1 (en) Culture apparatus
US8753877B2 (en) Incubator
JP6336112B2 (en) A greatly enhanced decontamination method with hydrogen peroxide vaporized at low concentrations
EP2127686A2 (en) Area decontamination via low-level concentration of germicidal agent
KR20150058053A (en) Incubator and method for decontaminating incubator
JP6471853B2 (en) incubator
JP2005131213A (en) Method for externimation of various bacteria using ozone for organism-growing apparatus
CN107473327A (en) The method that Escherichia coli are removed using low temperature plasma
CN213431947U (en) Mask rapid disinfection multiplexing device
CN109357332A (en) Cleaning operation area control of microorganisms system and its application method
JPH1080264A (en) Sterilization with ozone and device for sterilization with ozone
KR101490039B1 (en) Method for producing fermentation food
JP4789390B2 (en) Method and apparatus for sterilizing production facilities
WO2010077862A2 (en) Apparatus and methods for controlling chlorine dioxide concentration
JP2002355278A (en) Closed space atmosphere keeper
WO2021142563A1 (en) Sterilization device for medical instrument
JP4527573B2 (en) Activated gas generator and fungi or yeast production device
JP2005229843A (en) Gas partial pressure adjusting apparatus, culture apparatus and method
JP2021188752A (en) Fungus proliferation suppression method
JPH11178566A (en) Culture apparatus
CN111110895A (en) Medical instrument&#39;s disinfecting equipment
Tamaoki et al. Use of Narrow Bandwidth Ultraviolet Light and Copper-Enriched Stainless Steel Construction To Achieve Active Background Contamination Control™ In A Cell Culture CO2 Incubator