JP2005123551A - Cylindrical semiconductor epitaxial growth system - Google Patents

Cylindrical semiconductor epitaxial growth system Download PDF

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JP2005123551A
JP2005123551A JP2003388562A JP2003388562A JP2005123551A JP 2005123551 A JP2005123551 A JP 2005123551A JP 2003388562 A JP2003388562 A JP 2003388562A JP 2003388562 A JP2003388562 A JP 2003388562A JP 2005123551 A JP2005123551 A JP 2005123551A
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wafer
pocket
epitaxial growth
susceptor
cylinder type
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Akira Okabe
晃 岡部
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CXE JAPAN KK
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Abstract

<P>PROBLEM TO BE SOLVED: To automate wafer conveyance in a cylindrical semiconductor epitaxial growth system in consideration of more automation in a semiconductor manufacturing factory. <P>SOLUTION: An automatic detecting device for the setting state of a wafer and a monitor chip automatic conveying device for epitaxial processing result inspection are mounted together on an automatic conveying device (automatic loader) for wafers which stably operates without maintenance. Consequently, the processing speed and yield are improved. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は,ウエハーの表面にシリコン単結晶を気相エピタキシャル成長させるシリンダー型エピタキシャル成長装置において,サセプターへのウエハーの着脱等をオートローダーにより自動化したものに関する。  The present invention relates to a cylinder type epitaxial growth apparatus for vapor phase epitaxial growth of a silicon single crystal on the surface of a wafer, in which attachment / detachment of a wafer to / from a susceptor is automated by an autoloader.

従来のシリンダー型エピタキシャル半導体成長装置の概要を図6,図7に示す。01はウエハー03を取付けるポケット02を備えたサセプター,04は支柱で上端に蓋05が固定されている。06は蓋05から突出するアームで,駆動ネジ07と螺合し,ガイド棒08と滑合している。09はベルジャー,010は加熱ランプ,011は架台である。  An outline of a conventional cylinder type epitaxial semiconductor growth apparatus is shown in FIGS. 01 is a susceptor having a pocket 02 for attaching a wafer 03, 04 is a support, and a lid 05 is fixed to the upper end. Reference numeral 06 denotes an arm protruding from the lid 05, which is screwed with the drive screw 07 and slides with the guide rod 08. 09 is a bell jar, 010 is a heating lamp, and 011 is a stand.

作業者は手作業により,サセプター01の外側表面にあるポケット02にウエハー03を設置した後,図示しないモーターで駆動ネジ07を回転させて,図7のように,ベルジャー09内にサセプター01を降下させ,蓋05でベルジャー09を密封する。その後,加熱ランプ010によりベルジャー09内を加熱し,図示しないモーターでサセプター01を回転させつつ,エピタキシャル成長プロセスガスをベルジャー09内に導入し,ウエハー03上にシリコン単結晶のエピタキシャル層を成長させる。  The operator manually installs the wafer 03 in the pocket 02 on the outer surface of the susceptor 01, and then rotates the drive screw 07 with a motor (not shown) to lower the susceptor 01 into the bell jar 09 as shown in FIG. The bell jar 09 is sealed with the lid 05. Thereafter, the inside of the bell jar 09 is heated by the heating lamp 010, and the epitaxial growth process gas is introduced into the bell jar 09 while rotating the susceptor 01 by a motor (not shown) to grow an epitaxial layer of silicon single crystal on the wafer 03.

シリンダー型エピタキシャル半導体成長装置において,サセプターへのウエハーの着脱は,前述のように人手によって行なわれていた。その為,▲1▼作業速度が遅い。▲2▼ウエハーに汚染物質が混入する。▲3▼ウエハーが損傷する。▲4▼作業者が高温にさらされる危険がある。▲5▼コストが高くなる。等の問題があった。
これらに対処する為,従来も,ウエハーをサセプターに自動着脱するオートローダーは存在したが,▲1▼オートローダーにDCサーボモータを使用していたため,整流ブラシの磨耗粉が発生し,半導体製造に不可欠なクリーン環境を維持出来ない。更に整流ブラシの短期交換が必要で生産性を低下させる。▲2▼オートローダーの電源オフ時に,姿勢保持機能がなく,関節が落下して周辺機器や搬送中のウエハーが破壊される。また,復旧時も位置検出が出来ず復旧が遅い。▲3▼アーム先端のグリッパーを,DCモータで駆動しているため,保守・交換周期が短く生産性を低下させている。また作動スピードの調整が出来ず,ウエハーを強くつかみ過ぎ破損させることがある。▲4▼エピタキシャル成長の結果を検査するために,処理済みのウエハーをまるごと費やすので,製品歩留まりが低くなる。▲5▼ウエハーカセットやサセプターポケットのウエハーの設置状況を自動認識するシステムが無く,コンピューターへのウエハーの枚数入力も手動で行なわなければならない。等,種々の問題があった。
In the cylinder type epitaxial semiconductor growth apparatus, the wafer is attached to and detached from the susceptor manually as described above. Therefore, (1) work speed is slow. (2) Contaminants are mixed into the wafer. (3) The wafer is damaged. (4) There is a risk that the worker will be exposed to high temperatures. (5) Cost increases. There was a problem such as.
In order to deal with these problems, there has been an autoloader that automatically attaches and detaches a wafer to and from a susceptor. An indispensable clean environment cannot be maintained. In addition, short-term replacement of the rectifying brush is necessary, reducing productivity. (2) When the autoloader is turned off, there is no posture maintenance function, the joints fall and the peripheral equipment and the wafer being transferred are destroyed. Also, the position cannot be detected at the time of recovery and recovery is slow. (3) Since the gripper at the end of the arm is driven by a DC motor, the maintenance and replacement cycle is short and productivity is reduced. Also, the operating speed cannot be adjusted, and the wafer may be gripped too much and be damaged. (4) Since the whole processed wafer is spent to inspect the result of epitaxial growth, the product yield is lowered. (5) There is no system that automatically recognizes the installation status of wafer cassettes and wafers in the susceptor pocket, and the number of wafers must be manually entered into the computer. There were various problems.

本発明の請求項1に係る発明は,サセプターの外側表面のウエハーポケットにウエハーを装着してベルジャー内へ挿入し,同ベルジャー内を加熱するとともに処理ガスを導入して,前記ウエハー表面にシリコン単結晶を気相エピタキシャル成長させるシリンダー型エピタキシャル成長装置において,前記ポケットへの前記ウエハーの着脱を,電源遮断時の姿勢保持機能を有するACモーター駆動オートローダーに搭載された,空気作動式グリッパーで行なうものである。  According to the first aspect of the present invention, a wafer is mounted in a wafer pocket on the outer surface of the susceptor and inserted into the bell jar, the inside of the bell jar is heated and a processing gas is introduced, and a silicon single unit is introduced into the wafer surface. In a cylinder type epitaxial growth apparatus for vapor phase epitaxial growth of crystals, the wafer is attached to and detached from the pocket by an air-operated gripper mounted on an AC motor-driven autoloader having a posture maintaining function when the power is shut off. .

本発明の請求項2に係る発明は,請求項1において,前記サセプターの外側表面に,気相エピタキシャル成長処理結果を検査する為のモニターチップ用のポケットを設け,同ポケットへの前記モニターチップの着脱を,前記オートローダーに搭載された,真空吸引式アームで行なうものである。  According to a second aspect of the present invention, in the first aspect, a pocket for a monitor chip for inspecting a vapor phase epitaxial growth processing result is provided on the outer surface of the susceptor, and the monitor chip is attached to and detached from the pocket. Is performed with a vacuum suction arm mounted on the autoloader.

本発明の請求3項に係る発明は,請求項1,2において,ウエハーカセット,前記ウエハーポケット,前記モニターチップ用のポケットの少なくとも何れかの,前記ウエハーのセット状況を検知するレーザー装置を備えたものである。According to a third aspect of the present invention, there is provided the laser device according to the first or second aspect, wherein the laser device detects a setting state of the wafer in at least one of a wafer cassette, the wafer pocket, and the monitor chip pocket. Is.

本発明の請求項1に係る発明では,手作業に比べ,▲1▼作業速度が早い。▲2▼ウエハーに汚染物質が混入しない。▲3▼ウエハーが損傷しない。▲4▼作業者が高温にさらされる危険がない。▲5▼コストが安くなる。等の効果がある。また,従来のオートローダーに比べても,▲1▼半導体製造に不可欠なクリーンな環境を維持出来る。▲2▼電源オフ時にも関節が落下せず,周辺機器や搬送中のウエハーを破壊することが無い。また,復旧時も位置検出が容易で復旧が早い。▲3▼グリッパーの作動スピードの調整が容易で,ウエハーを柔かくつかみ破損しない。▲5▼保守・交換周期が長く生産性が向上する。等の効果がある。  In the invention according to claim 1 of the present invention, (1) the work speed is faster than the manual work. (2) Contaminants do not enter the wafer. (3) The wafer is not damaged. (4) There is no danger that the worker will be exposed to high temperatures. (5) Cost is reduced. There are effects such as. Compared with conventional autoloaders, (1) a clean environment essential for semiconductor manufacturing can be maintained. (2) The joints do not drop even when the power is turned off, and peripheral devices and wafers being transferred are not destroyed. In addition, position detection is easy and recovery is quick. (3) The gripper operating speed can be easily adjusted, and the wafer can be grasped softly and not damaged. (5) Longer maintenance and replacement cycles improve productivity. There are effects such as.

本発明の請求項2に係る発明では,処理結果の検査はウエハーを分割したモニターチップで行い,製品ウエハーを使用しないので,製品の歩留まりが向上する。  In the invention according to claim 2 of the present invention, the processing result is inspected by the monitor chip obtained by dividing the wafer, and the product wafer is not used, so that the product yield is improved.

本発明の請求項3に係る発明では,ウエハーカセット,ウエハーポケット,モニターチップ用のポケット等のウエハーの設置状況をレーザー装置で認識し,ウエハーの着脱を正確に行ない,コンピューターへのウエハーの枚数入力も自動化することが出来る。  In the invention according to claim 3 of the present invention, the installation status of wafers such as a wafer cassette, a wafer pocket and a pocket for a monitor chip is recognized by a laser device, the wafer is accurately attached and detached, and the number of wafers is input to the computer. Can also be automated.

図1は本実施例に係るシリンダー型半導体エピタキシャル成長装置の正面図,図2は図1のII−II矢視図,図3は図2のA部の詳細図,図4は図3のIV−IV矢視図,図5は図3のV−V矢視図である。
これらの図において,1はACモーター駆動のオートローダーで,アーム2a,2bの中に駆動用のACサーボモータを内蔵しており,アーム2bのロッド2cの先端に,空気作動式のグリッパー3を備えている。次いで,グリッパー3部の詳細を図3〜図5を用いて説明する。4はベーンモーター式のエアーアクチュエーター,4pはエアーアクチュエーターの回転軸,5a〜5dはウエハー03を外周から保持するグリッパーピン,6はウエハータン,7はモニターチップ用のバキュームタン,8はサセプターのウエハーポケット観察用のレーザー装置,9はウエハーカセット観察用のレーザー装置である。図1の10はウエハーカセット,11はウエハー台である。その他は従来のものと同じで同一符号は同一部材を示す。
1 is a front view of a cylinder type semiconductor epitaxial growth apparatus according to this embodiment, FIG. 2 is a view taken along the line II-II in FIG. 1, FIG. 3 is a detailed view of a portion A in FIG. IV view, FIG. 5 is a VV arrow view of FIG.
In these figures, reference numeral 1 denotes an AC motor-driven autoloader, which has a built-in AC servomotor in the arms 2a and 2b, and an air-operated gripper 3 at the tip of the rod 2c of the arm 2b. I have. Next, details of the gripper 3 will be described with reference to FIGS. 4 is a vane motor type air actuator, 4p is a rotation shaft of the air actuator, 5a to 5d are gripper pins for holding the wafer 03 from the outer periphery, 6 is a wafer tongue, 7 is a vacuum tongue for a monitor chip, and 8 is a wafer of a susceptor. A laser device for pocket observation 9 is a laser device for wafer cassette observation. In FIG. 1, 10 is a wafer cassette and 11 is a wafer table. Others are the same as the conventional ones, and the same symbols indicate the same members.

ウエハーカセット観察用のレーザー装置9は,ウエハーカセット10内のウエハー03の枚数とセット状況を検知し,コンピューターへ枚数を自動入力する。次いで,ウエハータン6で,ウエハーカセット10内のウエハー03を取り出し,一旦ウエハー台11の上に置く。次いで,オートローダー1のACサーボモータを駆動してグリッパー3をウエハー台11上のウエハー03へ近づけ,図示しない空気源から供給する圧縮空気でベーンモーター式のエアーアクチュエーター4を駆動して回転軸4pを矢印イ方向に回転させる。そうすると,グリッパーピン5a〜5dが内側へ引寄せられウエハー03を外周から保持する。次いで,グリッパー3をサセプター01へ近づけ,ウエハーポケット観察用のレーザー装置8でウエハーポケット02を観察して2重装着等のミスを防ぎながら,ウエハー03をポケット02へ取付ける。次いで,バキュー厶タン7でモニターチップを吸着し,ウエハーポケット観察用のレーザー装置8で観察しつつサセプターのモニターチップ専用のポケットへ取付ける。このようにして,所定数のウエハー03及びモニターチップを装着した後,サセプター01をベルジャー09内へ降下させ,従来のものと同様にして気相エピタキシャル成長処理を行なう。
処理が終ったら,装着のときと同様にして,オートローダー1のグリッパー3で,ウエハー03を保持してサセプターのウエハーポケット02から取外し,ウエハー台11の上に置き,ウエハータン6で所定のウエハーカセットへ搬送する。また,モニターチップもバキュームタン7で吸着して取外し,エピタキシャル成長層の測定・検査に供する。
The wafer cassette observation laser device 9 detects the number of wafers 03 in the wafer cassette 10 and the setting status, and automatically inputs the number to the computer. Next, the wafer 03 in the wafer cassette 10 is taken out by the wafer tongue 6 and once placed on the wafer table 11. Next, the AC servo motor of the autoloader 1 is driven to bring the gripper 3 close to the wafer 03 on the wafer table 11, and the vane motor type air actuator 4 is driven by compressed air supplied from an air source (not shown) to rotate the rotating shaft 4p. Rotate in the direction of arrow a. Then, the gripper pins 5a to 5d are drawn inward to hold the wafer 03 from the outer periphery. Next, the gripper 3 is brought close to the susceptor 01, the wafer pocket 02 is observed with the laser device 8 for wafer pocket observation, and the wafer 03 is attached to the pocket 02 while preventing a mistake such as double mounting. Next, the monitor chip is adsorbed by the vacuum tank 7 and is attached to the pocket dedicated to the monitor chip of the susceptor while being observed by the laser device 8 for observing the wafer pocket. In this way, after mounting a predetermined number of wafers 03 and monitor chips, the susceptor 01 is lowered into the bell jar 09, and a vapor phase epitaxial growth process is performed in the same manner as in the prior art.
When the processing is completed, the wafer 03 is held by the gripper 3 of the autoloader 1 and removed from the wafer pocket 02 of the susceptor, placed on the wafer table 11, and a predetermined wafer is placed by the wafer tongue 6 in the same manner as the mounting. Transport to cassette. In addition, the monitor chip is also adsorbed and removed by the vacuum tank 7 and used for the measurement and inspection of the epitaxial growth layer.

本実施例の効果は発明の効果の欄に記載したことと同様であり,重複する説明は省略するが,ウエハー着脱装置の他,ウエハーのセット状況を検知するレーザー装置やエピタキシャル成長層を測定・検査するモニターチップの着脱装置を搭載したオートローダーにより,生産能率と製品歩留りが大幅に向上する。近年半導体製造工場におけるオートメーション化が進むなか,ウエハー搬送の自動化は非常に重要であり,これに対し,安定稼動・メンテナンスフリーの本オートローダーの寄与するところ大である。  The effect of the present embodiment is the same as that described in the column of the effect of the invention, and a duplicate description is omitted, but in addition to the wafer attaching / detaching device, a laser device for detecting the wafer setting status and an epitaxial growth layer are measured and inspected. The autoloader equipped with a monitor chip attaching / detaching device greatly improves production efficiency and product yield. In recent years, automation of wafer transport is very important as semiconductor manufacturing plants are becoming more automated, and this autoloader, which is stable and maintenance-free, contributes greatly.

実施例に係るシリンダー型半導体エピタキシャル成長装置の正面図Front view of a cylinder type semiconductor epitaxial growth apparatus according to an embodiment 図1のII−II矢視図II-II arrow view of FIG. 図2のA部詳細図Detailed view of part A in FIG. 図3のIV−IV矢視図IV-IV arrow view of FIG. 図3のV−V矢視図VV arrow view of FIG. 従来のシリンダー型エピタキシャル半導体成長装置の正面図(サセプターが上がった状態)Front view of conventional cylinder type epitaxial semiconductor growth equipment (with susceptor raised) 従来のシリンダー型エピタキシャル半導体成長装置の正面図(サセプターが下がった状態)Front view of conventional cylinder type epitaxial semiconductor growth equipment (with susceptor lowered)

符号の説明Explanation of symbols

01・・・サセプター
02・・・ウエハーポケット
03・・・ウエハー
04・・・支柱
05・・・蓋
06・・・アーム
07・・・駆動ネジ
08・・・ガイド棒
09・・・ベルジャー
010・・・加熱ランプ
1・・・ACモーター駆動オートローダー
2a・・・アーム
2b・・・アーム
2c・・・ロッド
3・・・グリッパー
4・・・エアーアクチュエーター
4p・・・エアーアクチュエーターの回転軸
5a・・・グリッパーピン
5b・・・グリッパーピン
5c・・・グリッパーピン
5d・・・グリッパーピン
6・・・ウエハータン
7・・・モニターチップ用のバキュームタン
8・・・サセプターポケット観察用のレーザー装置
9・・・ウエハーカセット観察用のレーザー装置
01 ... susceptor 02 ... wafer pocket 03 ... wafer 04 ... post 05 ... lid 06 ... arm 07 ... drive screw 08 ... guide rod 09 ... bell jar 010 ··· Heating lamp 1 ··· AC motor drive autoloader 2a · · · Arm 2b · · · Arm 2c · · · Rod 3 · · · Gripper 4 · · · Air actuator 4p · · · Air actuator rotation shaft 5a · · · .. Gripper pin 5b ... Gripper pin 5c ... Gripper pin 5d ... Gripper pin 6 ... Wafer tongue 7 ... Vacuum tongue 8 for monitor chip ... Laser device 9 for susceptor pocket observation ... Laser equipment for wafer cassette observation

Claims (3)

サセプターの外側表面のウエハーポケットにウエハーを装着してベルジャー内へ挿入し,同ベルジャー内を加熱するとともに処理ガスを導入して,前記ウエハー表面にシリコン単結晶を気相エピタキシャル成長させるシリンダー型エピタキシャル成長装置において,前記ポケットへの前記ウエハーの着脱を,電源遮断時の姿勢保持機能を有するACモーター駆動オートローダーに搭載された,空気作動式グリッパーで行なうことを特徴とするシリンダー型半導体エピタキシャル成長装置In a cylinder type epitaxial growth apparatus that inserts a wafer into a wafer pocket on the outer surface of the susceptor and inserts it into a bell jar, heats the inside of the bell jar and introduces a processing gas, and vapor-phase epitaxially grows a silicon single crystal on the wafer surface The cylinder type semiconductor epitaxial growth apparatus, wherein the wafer is attached to and detached from the pocket by an air-operated gripper mounted on an AC motor-driven autoloader having a posture maintaining function when the power is shut off. 前記サセプターの外側表面に,気相エピタキシャル成長処理結果を検査する為のモニターチップ用のポケットを設け,同ポケットへの前記モニターチップの着脱を,前記オートローダーに搭載された,真空吸引式アームで行なうことを特徴とする請求項1記載のシリンダー型半導体エピタキシャル成長装置A pocket for a monitor chip for inspecting the result of vapor phase epitaxial growth processing is provided on the outer surface of the susceptor, and the monitor chip is attached to and detached from the pocket by a vacuum suction arm mounted on the autoloader. 2. A cylinder type semiconductor epitaxial growth apparatus according to claim 1, wherein ウエハーカセット,前記ウエハーポケット,前記モニターチップ用のポケットの少なくとも何れかの,前記ウエハーのセット状況を検知するレーザー装置を備えたことを特徴とする請求項1,2記載のシリンダー型半導体エピタキシャル成長装置3. A cylinder type semiconductor epitaxial growth apparatus according to claim 1, further comprising a laser device for detecting a setting state of the wafer in at least one of a wafer cassette, the wafer pocket, and a pocket for the monitor chip.
JP2003388562A 2003-10-15 2003-10-15 Cylindrical semiconductor epitaxial growth system Pending JP2005123551A (en)

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Publication number Priority date Publication date Assignee Title
KR100927730B1 (en) * 2008-01-16 2009-11-18 세메스 주식회사 Buffer system of sheet type substrate processing apparatus and substrate transfer method using same
KR101306228B1 (en) * 2010-05-18 2013-09-06 주식회사 선반도체 A wafer handler used to Epi-layer
KR101306229B1 (en) 2012-08-10 2013-09-06 주식회사 선반도체 A wafer handler used to Epi-layer
KR101306227B1 (en) 2012-08-10 2013-09-17 주식회사 선반도체 A wafer handler used to Epi-layer

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100927730B1 (en) * 2008-01-16 2009-11-18 세메스 주식회사 Buffer system of sheet type substrate processing apparatus and substrate transfer method using same
KR101306228B1 (en) * 2010-05-18 2013-09-06 주식회사 선반도체 A wafer handler used to Epi-layer
KR101306229B1 (en) 2012-08-10 2013-09-06 주식회사 선반도체 A wafer handler used to Epi-layer
KR101306227B1 (en) 2012-08-10 2013-09-17 주식회사 선반도체 A wafer handler used to Epi-layer

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