JP2005116483A5 - - Google Patents

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JP2005116483A5
JP2005116483A5 JP2003352803A JP2003352803A JP2005116483A5 JP 2005116483 A5 JP2005116483 A5 JP 2005116483A5 JP 2003352803 A JP2003352803 A JP 2003352803A JP 2003352803 A JP2003352803 A JP 2003352803A JP 2005116483 A5 JP2005116483 A5 JP 2005116483A5
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film
inorganic insulating
light
insulating film
emitting device
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JP2003352803A
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絶縁表面を有する基板上に陽極と、有機化合物を含む層と、陰極とを有する発光素子を備えた発光装置であって、
前記発光素子は、無機絶縁膜と、ビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む膜とが交互に積層された多層膜で覆われていることを特徴とする発光装置。
A light emitting device including a light emitting element having an anode, a layer containing an organic compound, and a cathode on a substrate having an insulating surface,
The light-emitting element is covered with a multilayer film in which inorganic insulating films and films containing vinyl polymer, acetylene polymer, or diene polymer are alternately laminated.
請求項において、前記無機絶縁膜は、窒化珪素膜、窒化酸化珪素膜、または酸化珪素膜であることを特徴とする発光装置。 2. The light emitting device according to claim 1 , wherein the inorganic insulating film is a silicon nitride film, a silicon nitride oxide film, or a silicon oxide film . 請求項1において、前記無機絶縁膜は、炭素を主成分とする膜であることを特徴とする発光装置。2. The light emitting device according to claim 1, wherein the inorganic insulating film is a film containing carbon as a main component. 請求項1において、前記無機絶縁膜は、窒化珪素または窒化酸化珪素からなる第1の無機絶縁膜及び第2の無機絶縁膜と、前記第1の無機絶縁膜及び前記第2の無機絶縁膜の間に形成された炭素を主成分とする膜とを有する3層構造であることを特徴とする発光装置。2. The inorganic insulating film according to claim 1, wherein the inorganic insulating film includes a first inorganic insulating film and a second inorganic insulating film made of silicon nitride or silicon nitride oxide, and the first inorganic insulating film and the second inorganic insulating film. A light-emitting device having a three-layer structure including a carbon-based film formed therebetween. 請求項3または4において、前記炭素を主成分とする膜は、DLC膜、CNx膜、またはアモルファスカーボン膜であることを特徴とする発光装置。5. The light emitting device according to claim 3, wherein the film containing carbon as a main component is a DLC film, a CNx film, or an amorphous carbon film. 請求項3乃至5のいずれか一において、前記炭素を主成分とする膜は、Arを含むことを特徴とする発光装置。6. The light-emitting device according to claim 3, wherein the film containing carbon as a main component contains Ar. 請求項4において、前記第1の無機絶縁膜、前記第2の無機絶縁膜、及び前記炭素を主成分とする膜は、それぞれArを含むことを特徴とする発光装置。5. The light-emitting device according to claim 4, wherein each of the first inorganic insulating film, the second inorganic insulating film, and the film containing carbon as a main component contains Ar. 絶縁表面を有する基板上に陽極と、有機化合物を含む層と、陰極とを有する発光素子を備えた発光装置であって、
前記発光素子は、第1の無機絶縁膜、前記第1の無機絶縁膜上に形成されたビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む膜、及び当該膜上に形成された第2の無機絶縁膜で覆われていることを特徴とする発光装置。
A light emitting device including a light emitting element having an anode, a layer containing an organic compound, and a cathode on a substrate having an insulating surface,
The light emitting element includes a first inorganic insulating film, a film containing a vinyl polymer, an acetylene polymer, or a diene polymer formed on the first inorganic insulating film, and a second inorganic insulating film formed on the film. A light-emitting device which is covered with a film .
請求項1乃至のいずれか一において、前記ビニルポリマーは、エチレン、プロピレン、スチレン、置換スチレン、ビニルエーテル、ビニルチオエーテル、ビニルエステル、ハロゲン化ビニル、ハロゲン化ビニリデン、ビニルカルバゾール、アクリル酸誘導体、メタクリル酸誘導体、イソブチレン、アクリロニトリル、またはビニルシクロプロパンであることを特徴とする発光装置。 The vinyl polymer according to any one of claims 1 to 8 , wherein the vinyl polymer is ethylene, propylene, styrene, substituted styrene, vinyl ether, vinyl thioether, vinyl ester, halogenated vinyl, vinylidene halide, vinyl carbazole, acrylic acid derivative, methacrylic acid. A light-emitting device, which is a derivative, isobutylene, acrylonitrile, or vinylcyclopropane. 請求項1乃至9のいずれか一に記載の発光装置を用いた電子機器。An electronic apparatus using the light emitting device according to claim 1. 請求項10に記載の電子機器は、ビデオカメラ、デジタルカメラ、ナビゲーションシステム、パーソナルコンピュータ、携帯情報端末、モバイルコンピュータ、携帯電話、携帯型ゲーム機、音響再生装置、または画像再生装置であることを特徴とする電子機器 The electronic device according to claim 10, a video camera, a digital camera, a navigation system, a personal computer, portable information terminals, mobile computers, cellular phones, portable game machines, it is a sound reproducing apparatus or image reproducing apparatus, Features electronic equipment . 絶縁表面を有する基板上に陽極と、有機化合物を含む層と、陰極とを有する発光素子を備えた発光装置の作製方法であって、
発光素子を覆う第1の無機絶縁膜をスパッタ法またはPCVD法により形成
前記第1の無機絶縁膜上にビニルポリマー、アセチレンポリマー、またはジエンポリマーを含むをプラズマ重合法により形成
前記ビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む上に第2の無機絶縁膜をスパッタ法またはPCVD法により形成することを特徴とする発光装置の作製方法。
A method for manufacturing a light-emitting device including a light-emitting element having an anode, a layer containing an organic compound, and a cathode over a substrate having an insulating surface,
Forming a first inorganic insulating film covering the light emitting element by sputtering or PCVD;
The vinyl polymer, a film containing an acetylene polymer or diene polymer, formed by plasma polymerization on the first inorganic insulating film,
The method for manufacturing a light emitting device, wherein a second inorganic insulating film is formed by sputtering or PCVD method on the membrane containing the vinyl polymer, acetylene polymer or diene polymer.
絶縁表面を有する基板上に陽極と、有機化合物を含む層と、陰極とを有する発光素子を備えた発光装置の作製方法であって、A method for manufacturing a light-emitting device including a light-emitting element having an anode, a layer containing an organic compound, and a cathode over a substrate having an insulating surface,
発光素子を覆う第1の無機絶縁膜をスパッタ法またはPCVD法により形成し、Forming a first inorganic insulating film covering the light emitting element by sputtering or PCVD;
前記第1の無機絶縁膜上にビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む膜を物理蒸着法により形成し、A film containing a vinyl polymer, an acetylene polymer, or a diene polymer is formed on the first inorganic insulating film by a physical vapor deposition method,
前記ビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む膜上に第2の無機絶縁膜をスパッタ法またはPCVD法により形成することを特徴とする発光装置の作製方法。A method for manufacturing a light-emitting device, wherein a second inorganic insulating film is formed by a sputtering method or a PCVD method over a film containing the vinyl polymer, acetylene polymer, or diene polymer.
請求項12または13において、前記第1の無機絶縁膜、前記ビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む膜、及び前記第2の無機絶縁膜を大気に触れることなく連続的に形成することを特徴とする発光装置の作製方法。 14. The method according to claim 12 , wherein the first inorganic insulating film, the film containing the vinyl polymer, the acetylene polymer, or the diene polymer, and the second inorganic insulating film are continuously formed without being exposed to the atmosphere. A method for manufacturing a light-emitting device. 請求項12乃至14のいずれか一において、前記第1の無機絶縁膜は、窒化珪素膜、窒化酸化珪素膜、酸化珪素膜、DLC膜、CNx膜、もしくはアモルファスカーボン膜の単層またはこれらの積層であることを特徴とする発光装置の作製方法。 In any one of claims 12 to 14, wherein the first inorganic insulating film, a silicon nitride film, a silicon nitride oxide film, a silicon oxide film, DLC film, CNx films, Moshiku monolayer of the amorphous carbon film, or A method for manufacturing a light-emitting device, which is a stacked structure of these. 請求項12乃至15のいずれか一において、前記第2の無機絶縁膜は、窒化珪素膜、窒化酸化珪素膜、酸化珪素膜、DLC膜、CNx膜、もしくはアモルファスカーボン膜の単層、またはこれらの積層であることを特徴とする発光装置の作製方法。16. The method according to claim 12, wherein the second inorganic insulating film is a silicon nitride film, a silicon nitride oxide film, a silicon oxide film, a DLC film, a CNx film, an amorphous carbon film, or a single layer thereof. A method for manufacturing a light-emitting device, which is a stacked structure. 請求項12乃至16のいずれか一において、前記ビニルポリマーは、エチレン、プロピレン、スチレン、置換スチレン、ビニルエーテル、ビニルチオエーテル、ビニルエステル、ハロゲン化ビニル、ハロゲン化ビニリデン、ビニルカルバゾール、アクリル酸誘導体、メタクリル酸誘導体、イソブチレン、アクリロニトリル、またはビニルシクロプロパンであることを特徴とする発光装置の作製方法。 In any one of claims 12 to 16, wherein the vinyl polymer are ethylene, propylene, styrene, substituted styrene, vinyl ether, vinyl thioether, vinyl esters, vinyl halides, vinylidene halides, vinyl carbazole, acrylic acid derivatives, methacrylic acid A method for manufacturing a light-emitting device, which is a derivative, isobutylene, acrylonitrile, or vinylcyclopropane.
JP2003352803A 2003-10-10 2003-10-10 Semiconductor device and manufacturing method of the same Withdrawn JP2005116483A (en)

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JP4776556B2 (en) * 2007-01-26 2011-09-21 株式会社アルバック ORGANIC EL ELEMENT AND METHOD FOR PRODUCING ORGANIC EL ELEMENT
JP2008226472A (en) * 2007-03-08 2008-09-25 Tokyo Electron Ltd Electronic device, its manufacturing method, structural body of sealing film, manufacturing device for manufacturing electronic device, and plasma processing device
KR101311670B1 (en) * 2007-07-09 2013-09-25 엘지디스플레이 주식회사 Organic Electroluminescent Device and method for fabricating thereof
JP2009037812A (en) 2007-07-31 2009-02-19 Sumitomo Chemical Co Ltd Organic el device and its manufacturing method
JP5119865B2 (en) * 2007-11-02 2013-01-16 セイコーエプソン株式会社 Organic electroluminescence equipment, electronic equipment
JP5012848B2 (en) * 2009-05-13 2012-08-29 セイコーエプソン株式会社 Organic electroluminescence device and electronic device
CN115377229A (en) * 2022-09-16 2022-11-22 武汉敏芯半导体股份有限公司 Silicon dioxide passivation film and manufacturing method thereof

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