JP2005116483A5 - - Google Patents
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- JP2005116483A5 JP2005116483A5 JP2003352803A JP2003352803A JP2005116483A5 JP 2005116483 A5 JP2005116483 A5 JP 2005116483A5 JP 2003352803 A JP2003352803 A JP 2003352803A JP 2003352803 A JP2003352803 A JP 2003352803A JP 2005116483 A5 JP2005116483 A5 JP 2005116483A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- inorganic insulating
- light
- insulating film
- emitting device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229920000642 polymer Polymers 0.000 claims 14
- 238000000034 method Methods 0.000 claims 13
- 229920002554 vinyl polymer Polymers 0.000 claims 11
- 229910052581 Si3N4 Inorganic materials 0.000 claims 8
- 238000004519 manufacturing process Methods 0.000 claims 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 8
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims 7
- 150000001993 dienes Chemical class 0.000 claims 7
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 5
- 229910052799 carbon Inorganic materials 0.000 claims 5
- -1 ethylene, propylene, styrene Chemical group 0.000 claims 5
- 239000010410 layer Substances 0.000 claims 5
- 150000002894 organic compounds Chemical class 0.000 claims 4
- 238000004544 sputter deposition Methods 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 3
- 229910003481 amorphous carbon Inorganic materials 0.000 claims 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 claims 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims 2
- YIWFBNMYFYINAD-UHFFFAOYSA-N ethenylcyclopropane Chemical compound C=CC1CC1 YIWFBNMYFYINAD-UHFFFAOYSA-N 0.000 claims 2
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical class C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 claims 2
- 239000002356 single layer Substances 0.000 claims 2
- 125000003011 styrenyl group Chemical class [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims 2
- 229920001567 vinyl ester resin Chemical class 0.000 claims 2
- 125000000391 vinyl group Chemical class [H]C([*])=C([H])[H] 0.000 claims 2
- UIYCHXAGWOYNNA-UHFFFAOYSA-N vinyl sulfide Chemical class C=CSC=C UIYCHXAGWOYNNA-UHFFFAOYSA-N 0.000 claims 2
- 230000001413 cellular effect Effects 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 238000005240 physical vapour deposition Methods 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 238000009751 slip forming Methods 0.000 claims 1
Claims (17)
前記発光素子は、無機絶縁膜と、ビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む膜とが交互に積層された多層膜で覆われていることを特徴とする発光装置。 A light emitting device including a light emitting element having an anode, a layer containing an organic compound, and a cathode on a substrate having an insulating surface,
The light-emitting element is covered with a multilayer film in which inorganic insulating films and films containing vinyl polymer, acetylene polymer, or diene polymer are alternately laminated.
前記発光素子は、第1の無機絶縁膜、前記第1の無機絶縁膜上に形成されたビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む膜、及び当該膜上に形成された第2の無機絶縁膜で覆われていることを特徴とする発光装置。 A light emitting device including a light emitting element having an anode, a layer containing an organic compound, and a cathode on a substrate having an insulating surface,
The light emitting element includes a first inorganic insulating film, a film containing a vinyl polymer, an acetylene polymer, or a diene polymer formed on the first inorganic insulating film, and a second inorganic insulating film formed on the film. A light-emitting device which is covered with a film .
発光素子を覆う第1の無機絶縁膜をスパッタ法またはPCVD法により形成し、
前記第1の無機絶縁膜上にビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む膜をプラズマ重合法により形成し、
前記ビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む膜上に第2の無機絶縁膜をスパッタ法またはPCVD法により形成することを特徴とする発光装置の作製方法。 A method for manufacturing a light-emitting device including a light-emitting element having an anode, a layer containing an organic compound, and a cathode over a substrate having an insulating surface,
Forming a first inorganic insulating film covering the light emitting element by sputtering or PCVD;
The vinyl polymer, a film containing an acetylene polymer or diene polymer, formed by plasma polymerization on the first inorganic insulating film,
The method for manufacturing a light emitting device, wherein a second inorganic insulating film is formed by sputtering or PCVD method on the membrane containing the vinyl polymer, acetylene polymer or diene polymer.
発光素子を覆う第1の無機絶縁膜をスパッタ法またはPCVD法により形成し、Forming a first inorganic insulating film covering the light emitting element by sputtering or PCVD;
前記第1の無機絶縁膜上にビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む膜を物理蒸着法により形成し、A film containing a vinyl polymer, an acetylene polymer, or a diene polymer is formed on the first inorganic insulating film by a physical vapor deposition method,
前記ビニルポリマー、アセチレンポリマー、またはジエンポリマーを含む膜上に第2の無機絶縁膜をスパッタ法またはPCVD法により形成することを特徴とする発光装置の作製方法。A method for manufacturing a light-emitting device, wherein a second inorganic insulating film is formed by a sputtering method or a PCVD method over a film containing the vinyl polymer, acetylene polymer, or diene polymer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003352803A JP2005116483A (en) | 2003-10-10 | 2003-10-10 | Semiconductor device and manufacturing method of the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003352803A JP2005116483A (en) | 2003-10-10 | 2003-10-10 | Semiconductor device and manufacturing method of the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005116483A JP2005116483A (en) | 2005-04-28 |
JP2005116483A5 true JP2005116483A5 (en) | 2006-10-19 |
Family
ID=34543613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003352803A Withdrawn JP2005116483A (en) | 2003-10-10 | 2003-10-10 | Semiconductor device and manufacturing method of the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2005116483A (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4337852B2 (en) | 2006-08-30 | 2009-09-30 | セイコーエプソン株式会社 | ORGANIC ELECTROLUMINESCENT DEVICE, ITS MANUFACTURING METHOD, AND ELECTRONIC DEVICE |
JP4776556B2 (en) * | 2007-01-26 | 2011-09-21 | 株式会社アルバック | ORGANIC EL ELEMENT AND METHOD FOR PRODUCING ORGANIC EL ELEMENT |
JP2008226472A (en) * | 2007-03-08 | 2008-09-25 | Tokyo Electron Ltd | Electronic device, its manufacturing method, structural body of sealing film, manufacturing device for manufacturing electronic device, and plasma processing device |
KR101311670B1 (en) * | 2007-07-09 | 2013-09-25 | 엘지디스플레이 주식회사 | Organic Electroluminescent Device and method for fabricating thereof |
JP2009037812A (en) | 2007-07-31 | 2009-02-19 | Sumitomo Chemical Co Ltd | Organic el device and its manufacturing method |
JP5119865B2 (en) * | 2007-11-02 | 2013-01-16 | セイコーエプソン株式会社 | Organic electroluminescence equipment, electronic equipment |
JP5012848B2 (en) * | 2009-05-13 | 2012-08-29 | セイコーエプソン株式会社 | Organic electroluminescence device and electronic device |
CN115377229A (en) * | 2022-09-16 | 2022-11-22 | 武汉敏芯半导体股份有限公司 | Silicon dioxide passivation film and manufacturing method thereof |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3175712B2 (en) * | 1998-10-23 | 2001-06-11 | 日本電気株式会社 | DLC protective film, organic EL device using the protective film, and method of manufacturing the same |
US6268695B1 (en) * | 1998-12-16 | 2001-07-31 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
JP2001307873A (en) * | 2000-04-21 | 2001-11-02 | Toppan Printing Co Ltd | Organic electroluminescence display element and its manufacturing method |
JP3783099B2 (en) * | 2000-05-16 | 2006-06-07 | 株式会社豊田中央研究所 | Organic electroluminescence device |
JP4660065B2 (en) * | 2000-08-04 | 2011-03-30 | 積水化学工業株式会社 | Conductive fine particles and substrate structure |
JP4255643B2 (en) * | 2001-02-21 | 2009-04-15 | 株式会社半導体エネルギー研究所 | Light emitting device and manufacturing method thereof |
JP3694249B2 (en) * | 2001-04-25 | 2005-09-14 | 積水化学工業株式会社 | Fine particle plating method, conductive fine particles, and connection structure |
US7109653B2 (en) * | 2002-01-15 | 2006-09-19 | Seiko Epson Corporation | Sealing structure with barrier membrane for electronic element, display device, electronic apparatus, and fabrication method for electronic element |
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2003
- 2003-10-10 JP JP2003352803A patent/JP2005116483A/en not_active Withdrawn
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