JP2005106166A - Active vibration cancellation device and exposing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an active vibration cancellation device or the like capable of suppressing gas discharge to a vacuum domain and suppressing deterioration of wide range vibration cancellation performance. <P>SOLUTION: This invented active vibration cancellation device 111 bears load of a mirror cylinder base 113 of a mirror cylinder support part by pressure of pressurized gas in a bellows 20, cancellation of vibration of low frequency component is performed by drive of each VCM 40, 50, 60 in the bellows 20. Each VCM 40, 50, 60 is arranged in the bellows 20 reserving pressurized gas therein, gas generated with accompanying drive of each VCM 40, 50, 60 is blocked by the bellows 20 and does not leak into inside of an external chamber (in vacuum domain). Consequently, even if the active vibration cancellation device 111 is installed as a single body without providing a vacuum bulkhead separately, gas discharge into vacuum domain can be suppressed. Since the vacuum bulkhead is not necessary, a device construction become compact and desired device specifications can be materialized more easily. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to an active vibration isolator capable of realizing vibration isolation in a vacuum region, and a sensitive substrate using an energy ray such as EUV light (Extreme Ultra Violet light: extreme ultraviolet light) as a pattern formed on an original plate. The present invention relates to an exposure apparatus that transfers to the surface.

  In recent years, with the miniaturization of semiconductor integrated circuits, a projection lithography technique using EUV light having a wavelength of about 13 nm has been developed in order to improve the resolution of an optical system limited by the diffraction limit of light. This projection exposure apparatus using EUV light includes a lens barrel that houses a projection optical system that projects a pattern on an original onto a sensitive substrate, an original stage that moves and positions the original, and a sensitive substrate stage that moves and positions the sensitive substrate. Etc.

  The projection optical system column of the EUV exposure apparatus is generally arranged in a vacuum chamber in order to prevent the EUV light from being absorbed by air. Alternatively, in addition to the EUV exposure apparatus, the projection optical system column of an electron beam exposure apparatus (EP exposure apparatus) that uses an electron beam is also generally arranged in a vacuum chamber or the like. The vacuum chamber that forms such a vacuum region is connected to a vacuum pump for evacuation, piping for accommodating an electric cable, an exhaust pipe, and the like.

  The lens barrel and the vacuum chamber are supported on a building floor via a structure called a support or a body. In this case, relatively low-frequency floor vibration, high-frequency stage residual vibration, and the like are transmitted to the projection optical system barrel in the vacuum chamber through the body, and the exposure performance may deteriorate due to the influence of this vibration. Therefore, a vibration isolator that blocks vibration is provided in the support portion of the projection optical system barrel. As such a vibration isolator, an active vibration isolator having an air mount and an actuator (drive system) arranged in parallel is known. This type of active vibration isolator performs wide-area filter vibration isolation using an air mount and low-frequency dynamic vibration isolation using an actuator.

  The actuator of the vibration isolator has components (coils and the like) that emit a relatively large amount of gas. For this reason, it is not preferable to install the active vibration isolator in a vacuum because it adversely affects the optical performance of the projection optical system. Therefore, in order to prevent the gas from being released into the vacuum, a vacuum partition that separates the installation space of the vibration isolator in the vacuum chamber is required. However, when such a vacuum partition is provided, the configuration of the apparatus becomes complicated, and a relatively wide space including the vibration isolator must be secured in the vacuum region in the vacuum chamber, so that a desired apparatus specification is realized. It becomes difficult.

  Furthermore, the air mount of the active vibration isolator, the hose connected to the air mount, etc. are often made of hard rubber made of a relatively thick material or a metal bellows tube in order to prevent gas leakage. However, if the air mount or the hose connected thereto is made of a hard material, the rigidity of the air mount in each axial direction is increased, and thus the wide-area filter vibration isolation function is limited.

The present invention has been made in view of such problems, and it is an object of the present invention to provide an active vibration isolation device that can suppress gas discharge into a vacuum region and suppress a decrease in wide-area vibration isolation performance. And
Furthermore, it aims at providing the exposure apparatus which has such an active vibration isolator.

The active vibration isolator of the present invention comprises a bellows in which a pressurized gas that supports a supported object is stored, and an actuator that is disposed in the bellows and controls the position of the supported object. It is characterized by.
The “position” of the supported object includes the “posture” of the supported object.

  According to this active vibration isolator, the load of the supported object is supported by the pressure of the pressurized gas in the bellows, and the vibration isolation of the high frequency component (fine adjustment of the position and orientation of the supported object) is performed by the actuator. . The actuator is arranged in a bellows where pressurized gas is stored, and the gas generated when the actuator is driven is blocked by the bellows, so that a vacuum partition is not provided in the vacuum region. Gas release can be suppressed. Therefore, even if the device is installed in the vacuum region, the vacuum environment is not deteriorated due to gas discharge accompanying the driving of the actuator. Further, when the vacuum partition is not required, the apparatus configuration becomes compact and it becomes easy to realize a desired apparatus specification.

In the active vibration isolator of the present invention, it is preferable to further include a rigidity cancellation mechanism that cancels the rigidity of the bellows.
Note that “the rigidity of the bellows” is meant to include the rigidity of the hose and cable attached thereto.
The bellows has a repulsive type (for example, if it is stretched, a force is generated in the direction of contraction, and if it is contracted, a force is generated in a direction of expansion). Therefore, the rigidity cancellation mechanism is changed to a suction type opposite to the repulsion type, and the bellows repulsion force and the suction force of the rigidity cancellation mechanism are balanced to cancel the bellows rigidity (spring constant). . Therefore, even if the base (building floor or the like) side to which the vibration isolator is attached is shaken and displaced, the displacement can be prevented from being transmitted to the supported object side, and the support performance can be improved. In particular, vacuum bellows, hoses, etc. are often formed of a thick, hard material to prevent gas leaks, and the rigidity becomes high and the vibration isolation performance tends to decrease. Accordingly, it is possible to prevent the vibration isolation performance from being lowered.

In the active vibration isolator of the present invention, the rigidity cancellation mechanism can cancel the rigidity of the bellows by the attractive force between the magnetic poles.
As the rigidity canceling mechanism, a boil coil motor (VCM) based on the Lorentz electromagnetic force principle can be used. With this VCM, the aforementioned suction force (a force opposite to the repulsive force of the bellows) can be realized.

In the active vibration isolator of the present invention, the rigidity canceling mechanism includes a cored voice coil motor, and cancels the rigidity of the bellows by the attractive force between the core and the magnet of the cored voice coil motor. Can do.
In this case, in the direction perpendicular to the driving direction of the iron core type voice coil motor, an attractive force (negative rigidity) is generated in a direction opposed to the permanent magnet, and the rigidity of the bellows and the pressurized gas therein (positive rigidity). Can be countered.

In the active vibration isolator of the present invention, the pressure of the pressurized gas in the bellows can be controlled by a pneumatic servo by pressure feedback.
In this case, the pressure of the pressurized gas in the bellows can be appropriately controlled.

  The exposure apparatus of the present invention includes a lens barrel containing a projection optical system that projects a pattern on an original onto a sensitive substrate, an original stage that moves and positions the original, and a sensitive substrate stage that moves and positions the sensitive substrate A body that supports the lens barrel, the original plate stage, and the sensitive substrate stage on a building floor, a chamber that forms a vacuum region between the body and the lens barrel, and the body in the vacuum region in the chamber A vibration isolator provided between the lens barrel and the lens barrel, wherein the vibration isolator comprises the active vibration isolator according to any one of claims 1 to 5.

  According to this exposure apparatus, it is possible to improve the exposure performance by providing the active vibration isolation device that can suppress the gas release into the vacuum region and suppress the deterioration of the wide-area vibration isolation performance.

  ADVANTAGE OF THE INVENTION According to this invention, the active vibration isolator etc. which can suppress the gas discharge | release in a vacuum area | region and can suppress the fall of wide region vibration isolation performance can be provided.

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
First, an example of the mechanical structure of an exposure apparatus according to an embodiment of the present invention will be described in the case of an EUVL projection exposure apparatus with reference to FIG. Although not shown in FIG. 3, the EUV exposure apparatus includes an illumination optical system including an EUV source that emits EUV light.

FIG. 3 is a cross-sectional view showing an example of the mechanical structure of an EUV exposure apparatus according to an embodiment of the present invention.
The exposure apparatus 100 shown in FIG. 3 includes a body 101 that is a structure extending in the horizontal direction in the middle stage of the apparatus. The body 101 is disposed on a building floor (bottom panel) 105 via support columns 103 at both ends thereof. Between the lower surface of the body 101 and the upper surface of the column 103, an anti-vibration table (air mount or the like) 107 is interposed. The body 101 is a hollow member, and a cavity 101a is formed at the center.

  A disc-shaped lens barrel base 113 is disposed on the periphery of the cavity 101a of the body 101 via an active vibration isolator 111 described later. The active vibration isolation devices 111 are arranged at three locations in the circumferential direction of the lens barrel base 113. A support leg 115 is disposed between the side of the lens barrel base 113 and the building floor 105. An anti-vibration table (air mount or the like) 119 is interposed between the side of the lens barrel base 113 and the upper end of the support leg 115.

  In the cavity 101a of the body 101, the lower part of the projection optical system barrel 120 is disposed. The lens barrel 120 includes a flange portion 120a that projects from the side surface of the central portion. The entire lens barrel 120 is supported by the body 101 and the column 103 in a state where the flange portion 120 a is placed on the lens barrel base 113. A mount 121 is interposed between the flange portion 120 a of the lens barrel 120 and the lens barrel base 113.

  A turbo molecular pump TMP / dry pump DP (vibration type vacuum pump) connected in series is connected to the lens barrel 120. The turbo molecular pump TMP rotates a thin metal wing (rotor) at a high speed so as to have a molecular motion speed, and exhausts by increasing the number of molecules that pass from the exhaust side rather than the number of molecules that pass from the intake side. Is a mechanical pump. The dry pump DP is a pump for obtaining a low vacuum without steam without using water or oil. The inside of the lens barrel 120 is reduced to a predetermined pressure by the turbo molecular pump TMP / dry pump DP.

A box-shaped support base 130 is fixed to the upper surface of the body 101. The support stand 130 stands on top of the lens barrel base 113 and the lens barrel 120. The inside of the support base 130 is decompressed to about 10 ⁻² to 10 ⁻¹ Pa. A lower end of reticle chamber 135 (inner chamber) is fixed to the upper surface of support base 130 with a bolt. In the reticle chamber 135, a reticle stage device 137 that moves and positions the reticle R by electrostatic attraction is disposed. The reticle stage device 137 is disposed on the upper surface of the support base 130 via a mount 139. Inside the reticle chamber 135, the upper end of the support base 130 is connected to the upper end of the lens barrel 120 via the bellows 162. A blind device 138 is provided on the lower surface of the reticle stage device 137. This blind device 138 is for limiting the exposure area of the reticle R.

A cryopump CP (non-vibration type vacuum pump) and a turbo molecular pump TMP / dry pump DP (vibration type vacuum pump) are connected in parallel to the reticle chamber 135. The cryopump CP is a condensing vacuum pump for condensing and trapping gas molecules on a cryogenic surface. The cryopump CP condenses and captures gas molecules inside the reticle chamber 135. This cryopump is preferably a pulse tube type. On the other hand, the turbo molecular pump TMP / dry pump DP is the same as described above, and the pressure inside the reticle chamber 135 is reduced to about 10 ⁻⁴ Pa. In the reticle chamber 135, a heat panel HP is raised at a position facing the cryopump CP. In the heat panel HP, the surface on the reticle stage device 137 side is a mirror metal surface. The heat panel HP can shield the cold radiation from the cryopump CP to the reticle stage device 137.

  Inside the reticle chamber 135, a hole 130 a is formed in the upper surface of the support base 130. The upper end of the lens barrel 120 is arranged inside the chamber hole 130a. The upper end of the lens barrel 120 is located immediately below the blind device 138 in the reticle chamber 135. The outside of the support table 130 and the reticle chamber 135 is further covered with an upper vacuum chamber (outer chamber) 140. The upper vacuum chamber 140 has a box shape and is fixed to the upper surface of the body 101. The upper vacuum chamber 140 is connected to a turbo molecular pump TMP / dry pump DP. The turbo molecular pump TMP / dry pump DP is the same as described above, and the inside of the upper vacuum chamber 140 is depressurized to a predetermined pressure.

  A box-shaped support base 150 is fixed to the lower surface of the body 101. A wafer chamber 155 (inner chamber) is further arranged inside the support table 150. The lower end of the wafer chamber 155 is fixed to the inner bottom surface of the support base 150 with bolts. Inside the wafer chamber 155, a wafer stage device 157 for placing and moving and positioning the wafer W is disposed. The wafer stage device 157 is disposed on the upper surface of the support base 150 via the mount 159.

In the wafer chamber 155, a cryopump CP and a turbo molecular pump TMP / dry pump DP are connected in parallel. The cryopump CP is the same as described above, and the gas molecules inside the wafer chamber 155 are condensed and captured on the cryogenic surface. The turbo molecular pump TMP / dry pump DP is the same as described above, and the inside of the wafer chamber 155 is depressurized to about 10 ⁻⁴ Pa. In the wafer chamber 155, a heat panel HP is raised at a position facing the cryopump CP. This heat panel HP is also the same as described above, and cool heat radiation from the cryopump CP is shielded.

  Inside the support base 150, the upper end of the wafer chamber 155 is connected to the lower end of the lens barrel 120 via the bellows 161. The lower end of the lens barrel 120 is located immediately above the wafer W placed on the wafer stage device 157 in the wafer chamber 155. The outside of the support table 150 and the wafer chamber 155 is further covered with a lower vacuum chamber 160 (outer chamber). The lower vacuum chamber 160 has a box shape and is fixed to the lower surface of the body 101. The lower vacuum chamber 160 is also depressurized to a predetermined pressure, similar to the upper vacuum chamber 140 described above.

  Stage metrology rings 171 and 172 are arranged in the vicinity of the upper end of the lens barrel 120 in the support stand 130 and in the vicinity of the lower end of the lens barrel 120 in the hole 101a of the body 101, respectively. These rings 171 and 172 are supported by legs 171a and 172a extending from the lens barrel base 113, respectively. Rings 171 and 172 are frame members to which measuring instruments for measuring relative positions of lens barrel 120, reticle stage device 137, and wafer stage device 157 are attached.

  The projection optical system barrel 120 in this embodiment is a six-projection system including six mirrors M1 to M6. In practice, each of the mirrors M1 to M6 includes a mirror holder and a mirror body, but is not shown. Each mirror M1-M6 is numbered in order from the upstream side. EUV light (shown by a one-dot chain line in FIG. 3) emitted from an illumination optical system (not shown) is reflected by the reticle R and then sequentially reflected by the first to sixth mirrors M1 to M6 in the lens barrel 120. To the wafer W. In the lens barrel 120, an ion pump IP is disposed between the fifth mirror M5 and the sixth mirror M6. The ion pump IP has a cylindrical magnet having an absorber on the inner surface, ionizes the gas and implants it in the absorber inside the magnet, and sorbs and exhausts the ionized gas. An ionizer is attached to the lower end of the ion pump IP.

  When the resist on the wafer W is irradiated with EUV light, contamination occurs due to a chemical reaction. When this contamination is emitted into the projection optical system barrel 120 and attached to the mirror, the reflectivity of the mirror is lowered. In the present embodiment, contamination is ionized by an ionizer, and the ionized contamination is sorbed by the ion pump IP, thereby reducing the adhesion of contamination to the mirror. When the contamination is already charged, it is possible to use the above-described cryopump instead of the ion pump IP to sorb the contamination with a magnetic field.

Furthermore, the exposure apparatus 100 has a plurality of pipes 191 to 196 extending from the inside of the apparatus to the outside. If these pipes 191 to 196 are flexible pipes, the force and vibration applied from the pipes to the chambers 135 and 155 can be reduced.
The pipe 191 extends to the outside of the apparatus from the left of the upper part of the lens barrel 120 in the drawing. This pipe 191 is a vacuum exhaust pipe for exhausting the inside of the lens barrel 120.
The pipe 192 extends from the blind device 138 to the outside of the device. The pipe 192 is a pipe that accommodates an electric cable or the like of the blind device 138.
The pipe 193 (195) extends out of the chamber from the reticle stage device 137 (wafer stage device 157). The pipe 193 (195) is a pipe that accommodates an electric cable or the like of the stage apparatus.
The pipe 194 (196) extends out of the chamber from the cryopump CP of the reticle chamber 135 (wafer chamber 155). This pipe 194 (196) is a vacuum exhaust pipe for exhausting the inside of the chamber.

Next, the above-described active vibration isolation device 111 will be described in detail with reference to FIGS. 1 and 2. In the following description, the X, Y, and Z directions indicate the arrow directions shown in FIGS. 1 and 2.
FIG. 1A is a cross-sectional view showing a configuration of an active vibration isolator according to an embodiment of the present invention, and FIG. 1B is an enlarged view of a Y drive iron core voice coil motor.
2A is a cross-sectional view taken along line II-II in FIG. 1A, and FIG. 2B is an enlarged view of an X-driven iron core type voice coil motor.
As described above, the active vibration isolator 111 shown in these drawings is arranged at three positions in the circumferential direction of the lens barrel 120 between the periphery of the cavity 101a of the body 101 and the lens barrel base 113.

  As shown in FIGS. 1 and 2, the active vibration isolation device 111 includes a support member 1 that is fixed to the upper surface of the body 101. The support member 1 has a flange portion 1a projecting inward. When the support member 1 is fixed, an inner recess 5 is formed between the upper surface of the body 101 and the lower surface of the flange portion 1a. A base 10 is disposed inside the support member 1. A flange portion 10 a that protrudes outward is formed at the lower end of the base 10. The flange 10 a of the base 10 is disposed in the inner recess 5 of the support member 1, and the upper end of the base 10 protrudes above the support member 1. An O-ring (not shown) is interposed between the flange portion 1a of the support member 1 and the flange portion 10a of the base 10, and both the flange portions 1a and 10a are coupled by bolts (not shown). . An O-ring (not shown) is also interposed between the support member 1 and the upper surface of the body 101.

  A bellows 20 is attached to the upper surface of the support member 1 around the upper end of the base 10. The bellows 20 is formed of a relatively thick hard rubber or the like for vacuum, and includes a bellows portion 21 attached to the upper surface of the support member 1 and a barrel portion 22 on the upper side of the bellows portion 21. The bellows 20 has a resilience characteristic (spring constant: positive rigidity) in which a force is generated in the direction of contraction when extended, and a force is generated in a direction of expansion when contracted. A top plate 25 is attached to the upper end of the barrel portion 22 of the bellows 20. A lens barrel base 113 is attached to the top surface of the top plate 25 (see FIG. 3).

  The bellows 20 is filled with pressurized gas. The pressure of the pressurized gas in the bellows 20 is controlled by a pneumatic servo by pressure feedback via the hose 31 based on a detection result of a pressure sensor 85 described later. The hose 31 extends through the base 10 to the inside of the body 101. A servo valve 33 is incorporated in the hose 31. The servo valve 33 is connected to an exhaust pipe 35 extending to the outside of the apparatus and a connection pipe 37 connected to a pressure source. The load of the barrel base 113 and the barrel 120 is supported by the pressure of the pressurized gas inside the bellows 20.

  In the bellows 20, a pair of Y drive iron core type voice coil motors (abbreviated as Y-VCM: see FIG. 1B) 40 and a pair of X drive iron core types are provided between the base 10 and the top plate 25. A voice coil motor (abbreviated X-VCM: see FIG. 2B) 50 and a Z drive voice coil motor (abbreviated Z-VCM: FIG. 1A) between these Y-VCM 40 and X-VCM 50 2A) is provided. By driving these VCMs 40, 50, 60, high-frequency component vibration isolation (fine adjustment of the positions of the lens barrel base 113 and the lens barrel 120) is performed.

  The Y-VCM 40 is arranged along the Y direction (direction orthogonal to the X direction). As shown in FIG. 1, the Y-VCM 40 includes an iron core 41 that rises from the upper surface of the base 10. Coils 43 are fixed on both sides of the iron core 41. A yoke 45 having a U-shaped cross section is disposed outside the iron core 41 to which the coil 43 is fixed. On both inner side surfaces of the yoke 45, a permanent magnet 47 in which an S pole portion 47a and an N pole portion 47b are stacked is provided. There is a gap between the permanent magnet 47 of the yoke 45 and the coil 43 of the iron core 41, and an attractive force (negative rigidity) in the X direction is generated between them. The upper end of the yoke 45 is attached to a block 44 fixed to the lower surface of the top plate 25.

  The X-VCM 50 is arranged along the X direction (direction orthogonal to the Y direction). As shown in FIG. 2, the X-VCM 50 basically has the same configuration as the Y-VCM 40 described above. That is, the X-VCM 50 includes an iron core 51 to which the coil 50 is fixed. A yoke 55 having a U-shaped cross section is disposed outside the iron core 51, and a permanent magnet 57 in which an S pole portion 57 a and an N pole portion 57 b are stacked is provided on both inner side surfaces of the yoke 55. There is a gap between the permanent magnet 57 of the yoke 55 and the coil 53 of the iron core 51, and an attractive force (negative rigidity) in the Y direction is generated between them. The upper end of the yoke 55 is attached to a block 54 fixed to the lower surface of the top plate 25.

  The Z-VCM 60 includes a coil 63 supported by a central block 61 on the base 10. As shown in FIG. 2, the coil 63 has a loop shape. As shown in FIG. 1, a yoke 69 having a U-shaped cross section is disposed outside the coil 63. On both inner side surfaces of the yoke 69, a permanent magnet 65 in which an S pole portion 65a and an N pole portion 65b are laminated is provided. The upper end of the yoke 69 is attached to a block 67 fixed to the lower surface of the top plate 25. There is a gap between the permanent magnet 65 of the yoke 69 and the coil 63. However, the coil 63 does not include an iron core, and no attractive force (negative stiffness) in the X direction and the Y direction is generated between them. The permanent magnet 65 and the coil 63 serve as a drive unit in the Z direction.

  The Z-VCM 60 includes a Z rigidity generating unit 70 that generates a suction force (negative rigidity) in the Z direction. As shown in FIG. 1, the Z rigidity generating portion 70 includes iron cores 71 fixed to both side portions on the upper end of the yoke 69. Each iron core 71 has a strip shape extending along the Y direction. A yoke 73 having a U-shaped cross section is disposed outside each iron core 71. Both yokes 73 are arranged such that the opening portions face each other. A permanent magnet 75 in which an S pole portion 75 a and an N pole portion 75 b are stacked is provided on the upper and lower inner surfaces of each yoke 73. The lower ends of the yokes 73 are respectively attached to blocks 62 fixed to the upper surface of the base 10. There is a gap between the iron core 71 and the permanent magnet 75 of the yoke 73, and an attractive force (negative rigidity) in the Z direction is generated between them.

  As shown in FIG. 1, an X direction / Z direction displacement sensor 81 is provided in the bellows 20. The sensor 81 has a variable portion 81a attached to the lower end of the yoke 45 of the Y-VCM 40 and a fixed portion 81b attached to the side of the base 10. On the other hand, as shown in FIG. 2, a Y-direction displacement sensor 83 is provided in the bellows 20. The sensor 83 includes a varying portion 83a attached to the lower end of the yoke 55 of the X-VCM 50 and a fixing portion 83b attached to the side of the base 10. These sensors 81 and 83 detect displacements in the X, Y, and Z directions of the top plate 25 with respect to the base 10. Based on the detection results of the sensors 81 and 83, the drive amounts of the VCMs 40, 50, and 60 in the X, Y, and Z directions are controlled.

  As shown in FIGS. 1 and 2, a pressure sensor 85 is provided on the side surface of the base 10 in the bellows 20. The pressure sensor 85 detects the pressure in the bellows 20. Based on the detection result of the pressure sensor 85, the servo valve 33 incorporated in the hose 31 is opened and closed, and the pressure of the pressurized gas is controlled by a pneumatic servo by pressure feedback.

  The active vibration isolation device 111 supports the load of the lens barrel base 113 and the lens barrel 120 (see FIG. 3) with the pressure of the pressurized gas in the bellows 20, and bellows vibration isolation (position fine adjustment) of low frequency components. This is done by driving each VCM 40, 50, 60 in 20. Each VCM 40, 50, 60 is arranged in a bellows 20 in which pressurized gas is stored, and the gas generated by driving each VCM 40, 50, 60 is blocked by the bellows 20 and the outer chamber 140 (see FIG. 3). It does not leak inside. Therefore, the gas release into the outer chamber 140 can be suppressed even if the active vibration isolator 111 is installed alone without providing a separate vacuum partition. Further, when the vacuum partition is not required, the apparatus configuration becomes compact and it becomes easy to realize a desired apparatus specification.

  In this active vibration isolator 111, an X-direction suction force (negative stiffness) is generated by the Y-VCM 40 that controls the Y-direction position, and the Y-direction suction force is generated by the X-VCM 50 that controls the X-direction position. Further, a Z-direction suction force can be generated by the Z-rigidity generating portion 70 of the Z-VCM 60 that performs position control in the Z-direction. Since the repulsion characteristics (spring constant: positive stiffness) of the bellows 20 in the X, Y, and Z directions can be canceled by the suction force of each of the VCMs 40, 50, and 60, the wide area of the vibration isolation device A decrease in vibration isolation performance can be suppressed. Therefore, even if the body 103 to which the active vibration isolator 111 is attached is shaken and displaced, the displacement can be prevented from being transmitted to the lens barrel 120 side, and the support performance can be improved. The exposure apparatus 100 (see FIG. 3) provided with such an active vibration isolator 111 can improve the exposure performance because the adverse effects of vibration are reduced.

FIG. 1A is a cross-sectional view showing a configuration of an active vibration isolator according to one embodiment of the present invention, and FIG. 1B is an enlarged view of a Y drive iron core voice coil motor. 2A is a cross-sectional view taken along line II-II in FIG. 1A, and FIG. 2B is an enlarged view of an X-driven iron core type voice coil motor. It is sectional drawing which shows the mechanical structural example of the EUV exposure apparatus which concerns on one Example of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Support member 10 Base 20 Bellows 21 Bellows part 22 Barrel part 25 Top plate 31 Hose 33 Servo valve 40 Y-VCM
41 Iron core 43 Coil 45 Yoke 47 Permanent magnet 50 X-VCM
51 Iron core 53 Coil 55 Yoke 57 Permanent magnet 60 Z-VCM
63 Coil 65 Permanent magnet 69 Yoke 70 Z rigidity generating portion 71 Iron core 73 Yoke 75 Permanent magnet 81 X direction / Z direction displacement sensor 83 Y direction displacement sensor 85 Pressure sensor 100 Exposure device 101 Body 103 Post 105 Building floor (bottom)
107, 119 Anti-vibration table 111 Active vibration isolator 113 Lens base 120 Projection optical system lens barrel 135 Reticle chamber 137 Reticle stage device 140 Upper vacuum chamber 155 Wafer chamber 157 Wafer stage device 160 Lower vacuum chamber M1-M6 Mirror HP Heat panel IP ion pump CP cryopump TMP turbomolecular pump DP dry pump

Claims (6)

A bellows in which pressurized gas for supporting the object to be supported is stored;
An actuator disposed in the bellows for controlling the position of the supported object;
An active vibration isolation device comprising:   The active vibration isolator according to claim 1, further comprising a rigidity cancellation mechanism that cancels the rigidity of the bellows.   The vacuum apparatus according to claim 2, wherein the rigidity canceling mechanism cancels the rigidity of the bellows by an attractive force between magnetic poles.   The rigidity canceling mechanism has a cored voice coil motor, and the rigidity of the bellows is canceled by an attractive force between the core of the cored voice coil motor and a magnet. 3. The vacuum apparatus according to 3.   The vacuum apparatus according to any one of claims 1 to 4, wherein the pressure of the pressurized gas in the bellows is controlled by a pneumatic servo by pressure feedback. A lens barrel containing a projection optical system that projects the pattern on the original plate onto the sensitive substrate;
An original stage for moving and positioning the original; and
A sensitive substrate stage for moving and positioning the sensitive substrate;
A body that supports the lens barrel, the original stage and the sensitive substrate stage on a building floor;
A chamber for forming a vacuum region between the body and the lens barrel;
A vibration isolator provided between the body and the lens barrel in a vacuum region in the chamber;
Comprising
6. An exposure apparatus, wherein the vibration isolator comprises the active vibration isolator according to any one of claims 1 to 5.

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