JP2005096322A - Functional layer transfer film, antifouling layer, and functional layer transfer body - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a functional layer transfer film which can easily and efficiently give a functional layer to a substrate poor in flexibility, eliminate the following antifouling treatment by forming an antifouling layer in advance on the functional layer, and transfer the functional layer and the antifouling layer simultaneously, the antifouling layer, and a functional layer transfer body. <P>SOLUTION: In the film, a peeling layer 13, if necessary, the antifouling layer 15, the functional layer 17, and an adhesive layer 19, if necessary, are formed on one side of the substrate 11. The functional layer 17 comprises at least one layer having functions of reflection preventing properties, glare shielding properties, conductivity, gas-barrier properties, optical diffraction properties, and/or hard coat properties. The antifouling layer 15 is formed by a CVD method, and the mass proportion of fluorine in the antifouling layer 15 is distributed to be larger on the substrate 11 side than on the functional layer 17 side. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a functional layer transfer film, and more particularly to a functional layer transfer film for transferring an antifouling layer and a functional layer at once, and an antifouling layer and a functional layer transfer body. is there.

  In the present specification, “ratio”, “part”, “%” and the like indicating the composition are based on mass unless otherwise specified, and the “/” mark indicates that they are integrally laminated.

  Also, “CVD” is an abbreviation, functional expression, common name, or industry for “chemical vapor deposition, chemical vapor deposition”, “TAC” for “triacetyl cellulose”, and “PET” for “polyethylene terephthalate”. It is a term.

(Technical background) Displays on TVs, PCs, mobile phones, etc., curved mirrors, rearview mirrors, goggles, window glass, and other commercial displays, light on the surface to read displayed characters, figures and other information Anti-reflective and anti-glare properties to prevent reflections, anti-stain properties to prevent dirt and dust attached by wind and rain, oil or fingerprints, barrier properties to prevent adhesion of dirt and electromagnetic waves and to prevent rust, etc. Functionality such as light diffractive properties such as holograms that enhance design and security properties and / or hard coat properties that prevent scratches due to external forces are required. It is required to provide a functional layer for providing these functions on the display surface.
However, most of the above displays are base materials with poor flexibility, such as metal plates, glass plates, ceramics, and plastic plates with poor flexibility, and it is not possible to form a functional layer on the outermost surface of the base material. Since a sheet-by-sheet forming operation is required, the productivity is extremely low and the cost is high. Moreover, it is possible to produce continuously by a roll-to-roll method, and it is impossible to provide an advanced functional layer using a highly functional vacuum technique. For this reason, the functional layer having the above advanced functionality is easily provided on the surface of the substrate having low flexibility (the material to be transferred of the present invention) by the transfer method, and the necessary protection is provided on the outermost surface. There is a demand for a functional layer transfer film that can transfer and form a dirty layer in a batch.

(Prior art) Conventionally, for example, the reflection prevention to a plastic optical component is performed in order from the component side to the air side in a first layer of a mixture of silicon monoxide and zirconium oxide, a second layer of zirconium oxide, An antireflection layer in which a vapor deposition film having a three-layer structure including a third layer is formed is known (see, for example, Patent Document 1). However, the antireflection is formed by a roll-to-roll method such as a vacuum method such as a vapor deposition method or a sputtering method, or a wet method in which a composition liquid is applied and dried. The transferred object of the invention has the disadvantage that it cannot be performed.
Also, once in a roll-to-roll system, a film substrate having flexible releasability, a fluorine-based hard coat layer (low refractive index layer) / a hard coat layer containing a metal oxide (high refractive index layer) / After providing an adhesive layer, a method of transferring to a substrate having poor flexibility is known (for example, see Patent Document 2). However, the outermost surface is a fluorine-based hard coat layer (low refractive index layer), which has some antifouling properties but is insufficient. When changing, there is a problem that a fluorine-based hard coat layer (low refractive index layer) cannot be used.
And there exists what becomes a transfer antireflection film which gave only the function of an antifouling layer (for example, refer to patent documents 3). This uses a water-repellent material for the outermost surface of the antireflection film, but it is not sufficient as a function of the antifouling layer because it does not have oil repellency.
Furthermore, a method is known in which an antifouling agent coating solution is applied and fixed on the surface of the functional layer imparted by transfer, an excess antifouling agent that has not been fixed is removed, and an antifouling layer is formed. (For example, refer to Patent Document 4). However, there are drawbacks in that the number of processes is high and the cost is high.
As a method for manufacturing the antifouling layer, there is a method using a plasma CVD method (see, for example, Patent Document 5). In this method, a raw material containing a perfluoroalkyl group is used, and an antifouling layer is provided on a plastic film by a plasma CVD method. However, this alone is no different from an antifouling layer obtained by coating a material containing a perfluoroalkyl group by another coating method such as a printing method. The present invention has been found to have antifouling properties even after transfer, and is used as a transfer antifouling layer.
Japanese Patent Publication No. 06-87081 Japanese Patent Laid-Open No. 11-288225 JP 2003-103680 A Japanese Patent Laid-Open No. 2002-292776 Japanese Patent Laid-Open No. 10-1553

  Accordingly, the present invention has been made to solve such problems. Its purpose is roll-to-roll, forming a functional layer such as an antireflection layer and an antifouling layer on a flexible film and transferring it to an inflexible substrate via an adhesive. A functional layer and an antifouling layer that can easily and efficiently impart a functional layer to a substrate having poor properties, and can be provided with an antifouling layer in advance so that the subsequent antifouling treatment can be omitted. It is to provide a functional layer transfer film capable of simultaneously transferring the film, and an antifouling layer and a functional layer transfer body.

In order to solve the above-described problems, the functional layer transfer film according to the invention of claim 1 is configured such that an antifouling layer and a functional layer are sequentially provided on one surface of a substrate.
In the functional layer transfer film according to the invention of claim 2, the antifouling layer is formed by a CVD method, and a mass ratio of fluorine in the antifouling layer is distributed more on the substrate side than on the functional layer side. This is what I did.
The functional layer transfer film according to the invention of claim 3 is such that a release layer is provided between the substrate and the antifouling layer.
In the functional layer transfer film according to the invention of claim 4, the antifouling layer is formed by a CVD method, and a mass ratio of fluorine in the antifouling layer is distributed more on the release layer side than on the functional layer side. This is what I did.
The functional layer transfer film according to the invention of claim 5 is such that an adhesive layer is provided on the functional layer surface.
In the functional layer transfer film according to the invention of claim 6, the functional layer has functions of antireflection, antiglare, conductivity, gas barrier property, light diffraction property, flame retardancy, and / or hard coat property. It is made to consist of at least 1 layer which has.
An antifouling layer and a functional layer transfer body according to the invention of claim 7 use the functional layer transfer film according to any one of claims 1 to 6 to at least the functional layer and the antifouling material to the transfer object. The layer is transferred, and the antifouling layer is provided so as to be exposed on the surface of the transfer object.

(Points of the Invention) The inventors of the present invention have been diligently advancing research and continuously and efficiently a highly functional layer and an antifouling layer using a vacuum technique in a roll-to-roll manner on a flexible substrate. After production, the present invention was accomplished by transferring and transferring to the surface of the transfer object.
For this reason, since the two layers are transferred at a time by transferring the two layers at the same time, the subsequent antifouling process is not required, the number of steps is low, the cost is low, and the flexibility is poor. Even in the body, a functional layer transfer film capable of transferring and forming an advanced functional layer and an antifouling layer on the surface thereof can be obtained.
According to the first and second aspects of the present invention, even if the substrate has poor flexibility, the subsequent antifouling treatment can be omitted, and the functional layer and the antifouling layer can be transferred simultaneously. Provided is a functional layer transfer film capable of easily and efficiently transferring and forming a functional layer and an antifouling layer.
According to the third to fourth aspects of the present invention, a base material with poor flexibility can be obtained by omitting the later antifouling treatment and transferring the functional layer and the antifouling layer at the same time even with a base material with poor flexibility. Provided is a functional layer transfer film that not only can transfer and form the functional layer and antifouling layer easily and efficiently, but can also be transferred without a release layer.
According to the present invention of claim 5, there is provided a functional layer transfer film capable of easily and efficiently transferring a functional layer and an antifouling layer simultaneously without applying an adhesive to a substrate having poor flexibility.
According to the sixth aspect of the present invention, the antireflection and antiglare properties for preventing light reflection on the surface, the antifouling property for preventing dirt and the like attached by wind and rain, oil or fingerprints, Conductivity that shields electromagnetic waves, barrier properties that prevent rust, etc., light diffraction properties such as holograms that enhance design and security, flame retardance that suppresses combustion, and / or hard coat properties that prevent scratches caused by external forces, etc. A functional layer transfer film capable of transferring the functional layer is provided.
According to the present invention of claim 7, the functional layer and the antifouling layer are transferred at the same time, and the antifouling layer and the functional layer transfer having a high degree of functionality and antifouling property even on a substrate having poor flexibility. The body is provided.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is a cross-sectional view of a functional transfer film showing one embodiment of the present invention.
FIG. 2 is an explanatory view of a main part for explaining the plasma CVD apparatus.
FIG. 3 is a graph of the reflectance of the functional layer transfer body showing one embodiment of the present invention.

  (Basic Material) The functional layer transfer film 10 of the present invention has, as shown in FIG. 1, a release layer 13, an antifouling layer 15, a functional layer 17 and, if necessary, one surface of a substrate 11. An adhesive layer 19 is provided. Further, it is possible even without the release layer 13. The functional layer 17 is a layer having functions of antireflection, antiglare, gas barrier, light diffractive, flame retardant, or hard coat. The antifouling layer 15 is formed by a CVD method, and the mass ratio of fluorine in the antifouling layer is more distributed (also referred to as uneven distribution) from the functional layer side to the base material side or the release layer side.

  In the antifouling layer and functional layer transfer body of the present invention, at least the functional layer 17 and the antifouling layer 15 are transferred to the transfer object using the functional layer transfer film 10 of the present invention, and the antifouling layer 15 is transferred. Is the outermost surface. On the outermost surface of the antifouling layer 15, a larger proportion of fluorine is distributed than on the functional layer side.

  (Substrate) The substrate 11 will be described. The base material 11 is not particularly limited as long as it is used in a roll-to-roll system, but a flexible base material is preferable. Examples of the material of the substrate 11 having flexibility include, for example, a triacetyl cellulose film, a diacetyl cellulose film, an acetate butyrate cellulose film, a polyether sulfone film, a polystyrene resin film, a polyacrylic resin film, and a polyurethane type. Resin film, polyester film, polycarbonate resin film, polysulfone film, cyclic olefin resin film, polyether film, trimethylpentene film, polyether ketone film, polyether sulfone film, acrylonitrile film, acrylonitrile-styrene copolymer resin (AS resin) film, acrylonitrile-butadiene-styrene copolymer resin (ABS resin) film, polyamide resin film Fluorine-based resin film, acetal resin film, a cellulose-based resin film or the like can be used.

  Among these, a uniaxial or biaxially stretched polyester film is more preferable because of its excellent heat resistance. The thickness of the flexible substrate is usually preferably about 6 μm to 188 μm. In addition, the base material 11 may be colored as long as it has flexibility, and a pattern, a character, etc. may be provided by printing etc.

  (Peeling Layer) The peeling layer 13 will be described. The release layer 13 is provided for the purpose of causing peeling at the interface between the antifouling layer 15 and the release layer 13. Further, although a part of the release layer 13 may be transferred to the transfer target, it does not substantially affect the function and is within the scope of the present invention. As a material for the release layer 13, a release resin, a resin containing a release agent, a curable resin that is cross-linked by ionizing radiation, and the like can be used. Examples include acrylic resins, vinyl acetate resins, melamine resins, polyester resins, urethane resins, fluorine resins, silicones, epoxy resins, and fiber resins. The resin containing the release agent is, for example, an acrylic resin, a vinyl resin, a polyester resin, a fiber resin, or the like obtained by adding or copolymerizing a release agent such as fluorine resin, silicone, or various waxes. It is. The curable resin that is cross-linked by ionizing radiation is, for example, a resin containing a monomer / oligomer having a functional group that is polymerized (cured) by ionizing radiation such as ultraviolet (UV) or electron beam (EB).

  (Formation of Release Layer) The release layer 13 is formed by dispersing or dissolving the resin in a solvent to obtain a low route, reverse roll coat, gravure coat, reverse gravure coat, bar coat, rod coat, kiss coat, knife coat, die coat. It is formed by applying and drying by a known coating method such as comma coating, flow coating, spray coating, etc., and removing the solvent. If necessary, it is crosslinked by heat drying at a temperature of 30 ° C. to 120 ° C., aging, or irradiation with ionizing radiation.

  The thickness of the release layer 13 is usually about 0.01 μm to 5.0 μm, preferably about 0.5 μm to 3.0 μm. The thinner the thickness is, the better. However, when the thickness is 0.1 μm or more, better film formation is obtained and the peeling force is stabilized.

  (Antifouling layer) The antifouling layer 15 provided on the peeling layer 13 will be described. This also applies to the case where it is provided directly on the substrate instead of on the release layer 13. In the functional layer transfer film of the present invention, the antifouling layer is the outermost surface of the transferred object after transfer. The antifouling layer is provided in order to prevent hand fingerprints and oil from adhering to the outermost surface of the object to be transferred. Conventionally, there is no antifouling layer on an object to be transferred after transfer, and therefore, it has been necessary to perform an antifouling treatment on the object to be transferred after transfer. Antifouling agent is usually used for antifouling treatment, but uniform application of antifouling agent requires very high technology, so apply antifouling agent to the surface of the object to which the functional film is transferred. Is not only difficult, but also requires an antifouling application process and an excess antifouling agent removal process, which are burdensome.

  In the present invention, a functional layer 17 such as a transfer antireflection film having a configuration in which the antifouling layer 15 is incorporated in advance is provided, and the functional layer 17 such as an antireflection film having the antifouling layer as the outermost surface. Can be directly transferred and attached to an object. The antifouling agent for the antifouling layer 15 used in the present invention is generally a water-repellent or oil-repellent coat, and siloxane-based, fluorinated alkylsilyl compounds, etc. can be applied, but silicon having at least a perfluoroalkyl group can be used. Antifouling agents containing compounds are preferred.

  (Method for forming antifouling layer) The method for forming the antifouling layer 15 is preferably a CVD (chemical vapor deposition) method, more preferably a plasma CVD (plasma assisted chemical vapor deposition) method. In addition, a coating method for performing plasma treatment can also be used. Examples of starting materials when using the plasma CVD method include trifluoropropyltrimethoxysilane, heptadecatrifluorodecyltrimethoxysilane, and tridecafluorooctyltrimethoxysilane, but are not limited thereto. Other materials may be used as long as a film containing a fluoroalkyl group can be formed.

  If the perfluoroalkyl antifouling agent is applied as in direct printing in the present invention, the antifouling surface appears on the functional layer 17 side instead of the release layer 13 side of the functional transfer film. There is a nature. That is, when transfer is performed in this state, the outermost surface of the transfer material has no antifouling property. When a surface having antifouling performance is provided on the base material 11 side or release layer 13 side (when providing a release layer) of the functional transfer film using plasma CVD, the antifouling layer 15 is transferred to an object to be transferred. The outermost surface of the object to be transferred becomes a surface having the antifouling performance of the antifouling layer 15, and the function can be expressed. The surface having the antifouling performance is a surface in which a large proportion of fluorine is distributed in the antifouling layer 15.

  (Plasma CVD method) Next, the plasma CVD method will be described by taking a method for forming the antifouling layer 15 as an example, but other layers can be formed in accordance with this method. For this purpose, the antifouling layer 15 is formed on the surface of the release layer 13 of the substrate 11 / release layer 13 or directly on the substrate 11, but here, in the sense that the explanation is universal, 11 / Peeling layer 13 and substrate 11 itself are expressed as a substrate. FIG. 2 is an explanatory diagram of a main part for explaining the plasma CVD apparatus. As shown in FIG. 2, the plasma CVD apparatus has a film running system and electrodes 26 and 27 in a vacuum vessel 21. A base material 11, which is a long and belt-like film (referred to as winding), is fed out from a paper feeding unit 23 of a film running system and travels while restricting the travel position by a plurality of guide rolls, and a film forming drum 27 (electrode) The film is formed on the upper surface, travels again, and is wound up by the winding unit 24. The film formation is performed with the assistance of plasma generated between the electrode 26 and the film formation drum 27 (also serving as an electrode) by supplying carriers and / or reaction gases from the gas inlet 25. The The entire reaction vessel 21 is evacuated by a vacuum pump (not shown).

  The reaction vessel 21 is supplied with a compound gas having at least a predetermined flow rate perfluoroalkyl group or nitrogen gas from the raw material gas inlet 25, and the inside of the reaction vessel 21 is always filled with these gases at a constant pressure. Yes. First, the base material 11 unwound from the paper supply unit 23 is wound around a film forming drum 27 (also an electrode) that is a reaction chamber drum of plasma CVD in the vacuum vessel 21 and is synchronized with the rotation of the film forming drum 27. However, it is sent in the direction of the winding unit 24. Next, an RF voltage is applied between the electrode 6 and the film-forming drum 7 by a power source. At this time, the frequency of the power source is not limited to a radio wave, and an appropriate frequency from a direct current to a microwave can be used.

  Then, by applying an RF voltage between the electrode 26 and the film forming drum 27, plasma is generated around these electrodes. In the plasma, ionization of a compound gas having at least a perfluoroalkyl group occurs, a compound containing a perfluoroalkyl group is generated and deposited on the substrate 11 wound around the film forming drum 27, and the antifouling layer 15. Is formed. Thereafter, the base material 11 on which the antifouling layer 15 is formed is wound up by the winding unit 24. In the plasma CVD method, the film pressure, transparency, color, etc. of the layer to be formed are adjusted over a wide range by controlling the film formation temperature, material gas flow rate and pressure, discharge conditions, and substrate film running speed. can do.

  Thus, by forming the antifouling layer 15 by the CVD method, the mass ratio of fluorine in the antifouling layer 15 is distributed more on the substrate 11 side or on the release layer 13 side (when a release layer is provided). be able to. Although the principle is not clear, the fluorine atom in the plasma state or the substance containing fluorine collides first with the substrate 11 side or the release layer 13 side (when the release layer is provided), and then the deposited atoms or Presumed to be fixed by molecules and grow. Here, the distribution of fluorine may not be uniform, and the mass ratio of fluorine in the antifouling layer 15 as a whole is the substrate 11 side or the release layer 13 side (when a release layer is provided). If it is distributed in a large amount, the above-mentioned functions can be fully expressed.

  (Functional Layer) The functional layer 17 provided on the antifouling layer 15 will be described. The functional layer 17 is a layer having a function selected according to the purpose. For example, the functional layer 17 is attached by antireflection or antiglare to prevent light reflection on the surface, wind and rain, oil or fingerprint. Antifouling to prevent dirt, etc., conductivity to prevent adhesion of dirt and electromagnetic waves, barrier properties to prevent rust, etc., light diffraction properties such as holograms that enhance design and security, and suppression of combustion These include hard coat properties that increase flame retardancy and / or increase the scratch resistance of the surface and prevent scratches caused by external forces.

  The functional layer 17 may be composed of one layer or two or more layers. Moreover, what is necessary is just to select the order suitably, when providing the some functional layer 17. FIG. The material of the functional layer 17 may be appropriately selected from materials corresponding to the functionality, and is not particularly specified. However, since the functional layer 17 is provided on the antifouling layer 15, the antifouling agent has good compatibility with the antifouling agent. A film containing silicon, such as a silicon oxide or an organic silicon compound, which has good film formability on the layer 15 and good adhesion to the antifouling layer 15 is preferable.

  Examples of means for producing such silicon-containing layers include plasma chemical vapor deposition (CVD, chemical vapor deposition), thermal CVD, vacuum deposition, sputtering, sol-gel wet coating, ion plating, and the like. The thin film formation method is mentioned. Among these, the plasma CVD method is preferable because it is easy to control the film quality and film thickness and is suitable for mass production. In order to form a film containing silicon, as a starting material of the plasma CVD method, specifically, silane, disilane, tetramethylsilane (TMS), hexamethyldisiloxane (HMDSO), tetramethyldisiloxane (TMDSO), Methyltrimethoxysilane (MTMOS), tetraethylorthosilicate (TEOS), hexamethyldisilane (HMDS), tetramethylcyclotetrasiloxane (TOMCATS), methylsilane, dimethylsilane, trimethylsilane, diethylsilane, propylsilane, phenylsilane, tetramethoxy Silane, octamethylcyclotetrasiloxane (OMCTS), tetraethoxysilane hexamethyldisilazane (HMDSN), hexamethyldisiloxane (HMDSO), allyldimethyl (diisopropyl) Pyramino) silane, allylaminotrimethylsilane, ammonium silicofluoride, anilinotrimethylsilane, 1,3-bis (chloromethyl) tetramethyldisilazane, bis (dimethylamino) dimethylsilane, bis (diethylamino) diethylsilane, bis ( Dimethylamino) dimethylsilane, bis (dimethylaminodimethylsilyl) ethane, bis (dimethylamino) diphenylsilane, bis (dimethylamino) methylsilane, bis (dimethylamino) vinylethylsilane, bis (dimethylamino) vinylmethylsilane, bis ( Ethylamino) dimethylsilane, bis (ethylmethylketoxime) methylisopropoxysilane, bis (methyldiethoxysilylpropyl) amine, N, O-bis (trimethylsilyl) acetamide, N-6,9 Bis (trimethylsilyl) adenine, N, N′-bis (trimethylsilyl) -1,4-butanediamine, bis (trimethylsilyl) carbodiimide, bis (trimethylsilyl) cytosine, N, O-bis (trimethylsilyl) hydroxylamine, 3-cyanopropyl (Diisopropyl) dimethylaminosilane, di-n-butyltetramethyldisilazane, (diethylamino) trimethylsilane, (diisopropylamino) trimethylsilane, (N, N′-dimethyl) trimethylsilane, 1,3-divinyltetramethyldisilazane, Heptamethyldisilazane, 1,1,3,3,5,5-hexamethylcyclotrisilazane, 1,2,3,4,5,6-hexamethylcyclotrisilazane, hexamethyldisilazane, nonamethyltrisilazane , Octame Tilcyclotetrasilazane, n-octyldiisopropyl (dimethylamino) silane, phenethyldimethyl (dimethylamino) silane, phenylbis (dimethylamino) silane, phenylmethylbis (dimethylamino) silane, 1,3,5,7-tetraethyl- 2,4,6,8-tetramethylcyclotetrasilazane, tetrakis (diethylamino) silane, tetrakis (dimethylamino) silane, 1,1,3,3-tetramethyldisilazane, 2,2,5,5-tetramethyl -2,5-dila-1-azacyclopentane, 1,1,3,3-tetraphenyldimethyldisilazane, 1,3,5,7-tetravinyl-1,3,5,7-tetramethylcyclotetra Silazane, 1,2,3-triethyl-2,4,6-trimethylcyclotrisilazane, tri- - hexyl silyl amine, N- (trimethylsilyl) acetamide, trimethylsilyl azide, N- (trimethylsilyl) imidazole, triphenyl aminosilane, can be used Si-based compounds such as 1-trimethylsilyl-1,2,4-triazole. Note that the material and thickness of the functional layer 17 are not particularly limited, and may be appropriately selected.

(Antireflection layer) An antireflection layer means a structure in which one or more transparent dielectric layers are laminated, and the refractive index of the outermost layer of the dielectric layers is lower than that of the layer immediately below it. The optical thickness (refractive index × geometric thickness) of the dielectric layer is set to ¼ of the wavelength of light to be prevented from being reflected. With such a configuration, the reflected light from the interface of each layer is attenuated by interference. The typical layer structure of the antireflection layer is as follows: (1) layer immediately below (antifouling layer or other functional layer) / low refractive index layer, (2) layer directly below / high refractive index layer / low refractive index Layer, (3) layer immediately below / low refractive index layer / high refractive index layer / low refractive index layer, (4) layer directly below / high refractive index layer / medium refractive index layer / low refractive index layer, and the like. As the material of each layer constituting the antireflection layer, for the low refractive index layer, inorganic materials such as magnesium fluoride (MgF ₂ ) and cryolite, or a low refractive index resin composition as described later can be used. Examples of the high refractive index layer include inorganic substances such as titanium dioxide and zinc sulfide. The antireflection layer is produced by a known dry coating method such as vapor deposition or sputtering, or a wet coating method such as roll coating or lip die coating.

    (Material and forming method of antireflection layer) Here, an antireflection layer consisting of three layers (medium refractive index layer / high refractive index layer / low refractive index layer) (referred to as a three-layer antireflection layer) is taken as an example. A method and a material for forming the three-layer antireflection layer on the structure in which the material 11 / the release layer 13 / the antifouling layer 15 are sequentially laminated will be described. In this example, the antireflection layer is a structure laminated in the order of “medium refractive index layer / high refractive index layer / low refractive index layer”. The functional layer transfer film 10 of the present invention is laminated in the order of “low refractive index layer / high refractive index layer / medium refractive index layer” so that the structure is formed in the transferred object after transfer. The low refractive index layer is a light transmissive film having a refractive index of 1.3 or more and 1.5 or less (wavelength λ = 550 nm), and has a film thickness of 30 to 300 nm, preferably 30 to 250 nm, and more preferably 30. ~ 200 nm. The high refractive index layer is a light transmissive film having a refractive index of 1.8 or more and 2.4 or less (wavelength λ = 550 nm), and has a film thickness of 30 to 300 nm, preferably 30 to 250 nm. Preferably it is 30-200 nm. The medium refractive index layer is a light transmissive layer having a refractive index of 1.5 or more and 1.8 or less (wavelength λ = 550 nm), and has a film thickness of 30 to 300 nm, preferably 30 to 250 nm, and more preferably 30. ~ 200 nm.

  When the thickness of the film constituting the antireflection layer is 30 nm or less, it is difficult to function as an optical functional layer, and the thickness of the film constituting the antireflection layer exceeds 300 nm. In such a case, the light transmittance is not preferable. Here, the low refractive index layer, the middle refractive index layer, and the high refractive index layer are names for distinguishing the respective thin layers when the multilayer antireflection layer is relatively compared by the respective refractive indexes. A layer having a relatively high refractive index is a high refractive index layer, a layer having a relatively low refractive index is a low refractive index layer, and a layer having a refractive index intermediate between the high refractive index layer and the low refractive index layer is a medium refractive index. It is a layer. Generally, a refractive index of 1.80 or more is a high refractive index layer, 1.5 to 1.80 (wavelength λ = 550 nm) is a medium refractive index layer, and less than 1.5 (wavelength λ = 550 nm) is low. In many cases, the refractive index layer is used. Here, the refractive index at the wavelength of 550 nm is indicated because the wavelength has the highest human sensitivity.

  Next, the low refractive index layer will be described in more detail. The low refractive index layer is a layer provided on the high refractive index layer, and preferably has a refractive index of 1.3 or more and 1.5 or less (wavelength λ = 550 nm) and a film thickness of 30 to 300 nm. However, the refractive index and film thickness are not defined in the present invention. The low refractive index layer is preferably a film containing a silicon oxide compound or an organosilicon compound having good adhesion to the high refractive index layer, but is not specified in the present invention, and any material can be used as long as it can be provided on the high refractive index layer. It may be used. For example, a layer containing magnesium fluoride or silicon oxyfluoride may be used. When the thin film forming the medium refractive index layer, the high refractive index layer, and the low refractive index layer is formed only with the silicon oxide compound or the organosilicon compound, the yield can be improved and not only is preferable in terms of cost. Since the adhesion of each thin layer can be improved, it is preferable. In addition, the method for forming or laminating the low refractive index layer is not particularly specified, but is a plasma chemical vapor deposition (CVD) method, a thermal CVD method, a vacuum deposition method, a sputtering method, a wet coating method such as a sol-gel method, or ion plating. It can be formed or laminated by a thin film forming method such as a method.

  The high refractive index layer will be described in more detail. The high refractive index layer is a layer provided on the middle refractive index layer, and preferably has a refractive index of 1.8 to 2.4 (wavelength λ = 550 nm) and a film thickness of 30 to 300 nm. However, the refractive index and film thickness are not defined in the present invention. By using the high refractive index layer on the middle refractive index layer, in the multilayer antireflection layer, in combination with the low refractive index layer provided on the upper side of the high refractive index layer (the direction opposite to the substrate side), respectively. The reflection of light can be efficiently prevented by the difference in refractive index.

  Here, the refractive index of the high-refractive index layer is preferably determined relatively in relation to the other layers that are stacked, and exhibits an antireflection effect due to the balance of the entire antireflection multilayer. In general, the refractive index of the high refractive index layer is more preferably from 1.8 to 2.4 (λ = 550 nm). The high refractive index layer is preferably a film containing a silicon oxide compound or an organic silicon compound having good adhesion to the medium refractive index layer, but the material is not defined in the present invention, and any film can be provided on the medium refractive index layer. A material may be used. For example, a silicon oxide compound layer, an organic silicon compound layer, a titanium oxide layer, an ITO (indium-tin oxide) layer, an IZO layer, an IXO layer, an Nb2O5 layer, a Ta2O5, a ZnS layer, or the like can be used. Further, the method for forming or laminating the high refractive index layer (7) is not particularly specified, but wet coating methods such as plasma chemical vapor deposition (CVD) method, thermal CVD method, vacuum deposition method, sputtering method, sol-gel method, It can be formed or laminated by a thin film forming method such as an ion plating method.

Next, the middle refractive index layer will be described in more detail. The medium refractive index layer is a layer provided on the surface of the antifouling layer 15, and preferably has a refractive index of 1.5 or more and 1.8 or less (wavelength λ = 550 nm) and a film thickness of 30 to 300 nm. However, the refractive index and film thickness are not defined in the present invention. The medium refractive index layer is preferably a layer containing a silicon oxide compound or an organosilicon compound having good adhesion to the antifouling layer. A layer containing a silicon oxide compound or an organic silicon compound is formed by a plasma chemical vapor deposition (CVD) method, a thermal CVD method, a vacuum deposition method, a sputtering method, a wet coating method such as a sol-gel method, or a thin film formation method such as an ion plating method. Or it can laminate. Among these, the plasma CVD method is preferable, and is excellent in that the film quality and film thickness can be easily controlled, and a layer containing a silicon oxide compound or an organic silicon compound can be easily formed on the surface of the antifouling layer 15. . In the formation of a film containing silicon, the above-mentioned substances can be used as a starting material for the plasma CVD method. In addition, when forming a layer containing a silicon oxide compound or an organosilicon compound according to the present invention, in order to easily control the refractive index, hydrogen gas, nitrogen gas, oxygen gas, N ₂ O gas, NO ₂ gas, N ₂ O ₄ gas, NO gas, or the like may be added. Further, an inert gas (eg, argon gas, helium gas) may be added to stabilize the plasma discharge or control the film density.

  (Anti-glare layer) The anti-glare layer prevents glare and flickering of the display image by diffusing (scattering) light with fine irregularities on the surface of the layer or fine refractive index fine particles dispersed inside the layer. . The antiglare optical property has a haze value of 3% or more, preferably 3 to 40%, more preferably 5 to 30%. When the haze value is less than 3%, the antiglare property is insufficient, and when the haze value exceeds 40%, the light transmittance is deteriorated. 60 degree gloss is 100 or less, More preferably, it is 90 or less, More preferably, it is 50-85. When the 60 ° gloss exceeds 100, the antiglare property becomes insufficient due to the surface gloss due to reflection. The transmission sharpness is 100 or more, more preferably 150 or more, and further preferably 200 to 300. If the transmission definition is less than 100, the visibility is insufficient. The total light transmittance is 70% or more, more preferably 75% or more, and further preferably 80 to 95%. If the total light transmittance is less than 70%, the transparency is insufficient. Is generally good for anti-glare properties, visibility, light transmittance, transparency and the like.

  (Formation of an antiglare layer) The antiglare layer may be a known layer, preferably a layer containing an inorganic filler such as silica, or a layer having a fine uneven surface for irregularly reflecting external light. Examples of the layer containing the inorganic filler include acrylic resins such as polyacrylate copolymers composed of ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, t-butyl acrylate, diene resins, polyester resins, and silicon resins. In the curable resin, a silica particle having an average particle diameter of usually 30 μm or less, preferably about 2 to 15 μm, is dispersed in an amount of about 0.1 to 10 parts by mass with respect to 100 parts by mass of the resin. The film is applied and dried by reverse roll coating, die coating or the like so that the thickness after drying is about 5 to 30 μm, and is cured by irradiation with heat, ultraviolet rays or electron beams as necessary.

  (Conductive layer) As the conductive layer, a known metal transparent thin film, a transparent metal oxide, or a coating layer containing a conductive filler can be applied. Specifically, for example, a metal such as gold, silver, copper, nickel or chromium formed by a method such as a known vacuum deposition method, sputtering method or plating method, tin oxide retaining transparency, ITO or ATO, etc. It is a transparent synthetic resin layer containing a transparent metal oxide or a filler (particle) such as ITO or ATO by a coating method.

  (Gas barrier layer) The gas barrier layer is a transparent metal oxide compound such as aluminum oxide, tin oxide or silicon oxide formed by a method such as a known vacuum deposition method, sputtering method or CVD method, polyvinylidene chloride by a coating method, A transparent synthetic resin layer such as polyvinyl alcohol.

  (Light Diffraction Layer) As the light diffraction layer, a hologram or a diffraction grating in which interference fringes due to interference between the object light and the reference light are recorded in a concavo-convex pattern can be applied. Holograms include laser reproduction holograms such as Fresnel holograms, white light reproduction holograms such as rainbow holograms, color holograms utilizing these principles, computer generated holograms (CGH), and holographic diffraction gratings. Moreover, although there is no light diffractive property, fine uneven | corrugated shapes, such as a line, a hairline, a mat | matte, may be sufficient.

  Examples of the diffraction grating include a holographic diffraction grating using a hologram recording means. In addition, an arbitrary diffraction light can be obtained based on a calculation by mechanically creating a diffraction grating using an electron beam drawing apparatus or the like. A diffraction grating can also be mentioned. Further, a mechanical cutting method may be used. These holograms and / or diffraction gratings may be recorded in a single or multiple manner or in combination.

  (Formation of optical diffraction layer) As a method of forming the optical diffraction layer, first, a laser beam interference method using a glass plate coated with a photosensitive material, an electron beam drawing method on a glass plate coated with an electron beam resist material, a machine An original plate is prepared by a known method such as a cutting method. From the original plate, a metal stamper plate by plating or a resin stamper plate for forming fine unevenness, which is an uneven pattern in a mirror image relationship (also referred to as a female type or a negative type) with the uneven pattern of the original plate, is prepared. The stamper plate is used to emboss and cure a known thermosetting type or ionizing radiation curable resin layer such as ultraviolet ray provided on the surface of the antifouling layer 15 of the substrate 11 / release layer 13 / antifouling layer 15 / If it is made, an uneven | corrugated pattern will be shaped and the optical diffraction effect will express. If a transparent reflective layer is provided as necessary, a further diffraction effect can be obtained.

  (Flame Retardant Layer) The flame retardant layer can suppress burning of the object when the object after transfer is exposed to a high temperature or is struck by fire. A transparent metal oxide compound such as silicon oxide formed by a known vacuum deposition method, sputtering method, CVD method or the like.

  (Hard Coat Layer) The hard coat layer is a layer having a hardness of H or higher in the pencil hardness test of JIS-K5400, such as polyester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, etc. ) Apply a polyfunctional (meth) acrylate monomer such as acrylate prepolymer, trimethylolpropane tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, or a mixture of two or more thereof. Curing with heat or ionizing radiation.

  (Adhesive layer) The adhesive layer 19 will be described. The adhesive layer 19 is used for adhering the antifouling layer 15 / functional layer 17 formed in the functional layer transfer film 10 of the present invention to the transfer material side, and has an adhesive force at room temperature. And those that develop adhesiveness or adhesive force by treatment such as heating, and are collectively referred to as an adhesive layer in the present specification.

  Moreover, the structure which does not have the contact bonding layer 19, and consists of the base material 11 / peeling layer 13 / antifouling layer 15 / functional layer 17 is also included in one of the functional layer transfer films 10 of the present invention. In this case, the antifouling layer 15 / functional layer 17 can be attached to the transferred material side by providing the adhesive layer 19 on the transferred material side.

  The material of the adhesive layer 19 may be adhesive and / or tacky, and includes what are called adhesives, adhesives, and hot melts, and is not particularly defined. For example, acrylic, epoxy, vinyl acetate, vinyl chloride, isocyanate, silicone, styrene-butadiene, vinyl chloride-vinyl acetate, ethylene-vinyl acetate, polyester, rubber chloride, chlorinated polypropylene, A resin such as a urethane-based resin is used alone, or an emulsion-based resin, an organic solvent-based resin, a water-soluble resin, or the like mainly composed of a mixture of these resins.

  (Formation of adhesive layer) As a method of forming the adhesive layer 19, the application liquid obtained by diluting the above resin with water or an organic solvent is usually a printing method such as gravure printing, offset printing, or screen printing, or It is applied onto the functional layer 17 by a coating method such as roll coating, bar coating, comma coating, spray coating, or extrusion coating, and then dried or cooled, and if necessary, a thermosetting resin or UV curable resin. The curable coating film such as resin, electron beam curable resin, and radiation curable resin may be formed by curing treatment.

  In the antifouling layer and functional layer transfer body of the present invention, at least the functional layer 17 and the antifouling layer 15 are transferred to the transfer object using the functional layer transfer film 10 of the present invention, and the antifouling layer 15 is transferred. Is the outermost surface. The structure of the functional layer transfer film 10 is as follows: substrate 11 / release layer 13 / antifouling layer 15 / functional layer 17 / adhesive layer 19 and substrate 11 / antifouling layer 15 / functional layer 17 / adhesive layer 19 The transfer layer is peeled off from the release layer 13 by transfer, and the adhesive layer 19 / functional layer 17 / antifouling layer 15 is transferred onto the transferred substrate, and the antifouling layer 15 is exposed to the outermost surface. As described above, a part of the release layer 13 / may be transferred within a range that does not affect the function.

  (Transfer to be transferred) The material of the transfer target is a metal plate, a glass plate, ceramics, a plastic plate with poor flexibility, or the like. Of course, a flexible material such as a plastic film may be used, and it is more effective if it can be transferred by a roll-to-roll method. In this way, a member having the antifouling layer 15 exposed to the outermost surface is used for a display such as a television, a personal computer, a mobile phone, a curved mirror, a rearview mirror, goggles, a window glass, and other commercial displays. Excellent antifouling property to prevent dirt and the like attached by oil or fingerprint.

  Furthermore, if the functional layer is antireflective and / or antiglare, light reflection on the display surface can be prevented, and displayed characters, figures, and other information can be easily read. In addition, if it is conductive, it can be a barrier layer that is difficult to adhere to dust and dirt, is easy to read information, shields external electromagnetic waves, reduces malfunctions of the electronic display device, and barriers water and oxygen. If it is a light diffractive layer such as a diffraction grating or hologram, the design and security can be improved, and if it is a hard coat layer, scratches due to external force can be prevented. .

  With the functional layer transfer film 10 of the present invention, for example, an antireflection layer can be directly provided on an acrylic plate, and the display front plate is further subjected to saponification treatment at the time of producing a polarizing plate. A layer can be applied.

  (Transfer method) The transfer method for transferring the functional layer transfer film 10 of the present invention to a transfer target is not particularly limited, and for example, pressurization or heat pressurization with a flat platen, The functional layer transfer film 10 may be peeled off after being pressed against the transfer target with a heated or non-heated roll. In addition, if a concavo-convex pattern is provided on a flat plate or roll to be pressed, only the pattern portion can be transferred and transferred.

  (Modification) The present invention includes the following modifications. (1) The adhesive layer 19 may be configured to contain a near-infrared absorber such as a pigment (pigment or dye) that absorbs near-infrared rays having a wavelength of about 800 to 1100 nm. In this way, when the adhesive layer (with near-infrared absorbing agent) / antireflection layer / antifouling layer is transferred to the front plate for PDP display (transfer object) made of glass or acrylic resin, the layer structure is increased. In addition, near infrared rays generated from the PDP can be shielded, and malfunction of the TV remote controller can be prevented.

  (2) The functional layer 17 may be configured to have a function of facilitating application of the adhesive layer. For example, a transparent metal oxide compound such as silicon oxide is used as a base layer so that a desired adhesive can be used. Materials that are compatible with both the base material and the adhesive layer are appropriately selected. It is formed by a normal printing method, a plasma chemical vapor deposition (CVD) method, a thermal CVD method, a vacuum deposition method, a sputtering method, a wet coating method such as a sol-gel method, or a thin film formation method such as an ion plating method. To obtain antifouling properties, it is possible to transfer only the antifouling layer onto the object.

  EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention further in detail, it is not limited to this.

Using a 75 μm-thick PET film as a base material, a release layer was formed on the base material by Showa Ink Industries' release varnish (46-7-0) by the Bravia printing method. On the release layer, an antifouling layer was provided by the above plasma CVD method using trifluoropropyltrimethoxysilane (KBM-7103) manufactured by Shin-Etsu Chemical Co., Ltd. as a starting material. The conditions of the plasma CVD method are as follows. An RF power source of 13.56 MHz is used as a high-frequency power source, a traveling speed during continuous film formation is 10 m / min, an applied power is 1 kW, a trifluoropropyltrimethoxysilane gas flow rate is 100 sccm, a nitrogen gas The flow rate was 100 sccm and the film formation pressure was 10 Pa.
On the antifouling layer, an antireflection layer having the following four-layer structure was provided by plasma CVD. The conditions of the plasma CVD method are as follows. An RF power source of 13.56 MHz is used as a high frequency power source, a traveling speed during continuous film formation is 10 m / min, an applied power is 1 kW, an oxygen gas flow rate is 100 sccm, a titanium tetra Film formation was performed under the conditions of an isopropoxide gas flow rate of 150 sccm and a film formation pressure of 10 Pa. The second layer was formed under the conditions of an applied power of 1 kW, an oxygen gas flow rate of 100 sccm, a tetramethoxysilane gas flow rate of 100 sccm, and a deposition pressure of 10 Pa. The third layer was formed under the same conditions as the first layer. The fourth layer was formed under the same conditions as the second layer. The gas flow unit sccm is a standard cubic cm per minute. Moreover, the titanium tetraisopropoxide gas raw material used is GELEST. INC's titanium tetraisopropoxide (AKT872), the tetramethoxysilane gas raw material is Tetramethoxysilane from Junsei Chemical Co., Ltd. Finally, a heat seal adhesive (TS-PC varnish A) was applied as an adhesive layer composition of Dainippon Ink & Chemicals, Inc. on the antireflection layer by a gravure printing method to provide an adhesive layer. Example 1 The functional layer transfer film 10 was obtained.

  A PET film having a thickness of 75 μm was used as a base material, a release layer was not formed on the base material, and an antifouling layer was provided on the base material by the plasma CVD method as in Example 1. A functional layer transfer of Example 2 is provided on the antifouling layer by plasma CVD in the same manner as in Example 1 having a four-layer structure, and an adhesive layer is provided on the antireflection layer as in Example 1. Film 10 was obtained.

  A 75 μm-thick PET film was used as a substrate, and a release layer was formed on the substrate by Showa Ink Industries' release varnish (46-7-0) by gravure printing. On the release layer, metaxylene hexafluoride (KP-801M) manufactured by Shin-Etsu Chemical Co., Ltd. was applied by a printing method instead of the plasma CVD method to provide an antifouling layer. The functional layer transfer of Example 3 is provided on the antifouling layer by plasma CVD in the same manner as in Example 1 having a four-layer structure, and an adhesive layer is provided on the antireflection layer in the same manner as in Example 1. Film 10 was obtained.

  Using a PET film with a thickness of 75 μm as a base material, without forming a release layer on the base material, metaxylene hexafluoride (KP-801M) from Shin-Etsu Chemical Co., Ltd. was applied by a printing method to prevent antifouling. A layer was provided. The functional layer transfer of Example 3 is provided on the antifouling layer by plasma CVD in the same manner as in Example 1 having a four-layer structure, and an adhesive layer is provided on the antireflection layer in the same manner as in Example 1. Film 10 was obtained.

  The functional layer transfer film 10 of Example 1 has a configuration of base material (PET film) / peeling layer / antifouling layer / antireflection layer / adhesion layer. Pressure was applied with a hot plate at 0 ° C., and the substrate was peeled off to obtain an antifouling layer and a functional layer transfer body of Example 5.

Using the functional layer transfer film 10 of Example 1 as a material to be transferred, to a glass plate (poor flexibility) used for a liquid crystal display of a mobile phone, with a hot plate (100 ° C.) of the image display portion The substrate was peeled off and the antifouling layer and functional layer transfer body of Example 6 were obtained.

  The functional layer transfer film 10 of Example 2 has a configuration of base material (PET film) / antifouling layer / antireflection layer / adhesive layer, and heats at 100 ° C. on the TAC film as a transfer target. The plate was pressed and the substrate was peeled off to obtain an antifouling layer and a functional layer transfer body of Example 7.

  Using the functional layer transfer film 10 of Example 2 as a material to be transferred, to a glass plate (poor flexibility) used for a liquid crystal display of a mobile phone, with a hot plate (100 ° C.) of the image display portion The substrate was peeled off and the antifouling layer and the functional layer transfer body of Example 8 were obtained.

  The functional layer transfer film 10 of Example 3 has a configuration of base material (PET film) / peeling layer / antifouling layer / antireflection layer / adhesive layer. As in Example 1, TAC is used as a transfer target. The film was pressed onto a film with a hot plate at 100 ° C., and the base material was peeled off to obtain an antifouling layer and a functional layer transfer body of Example 9.

  The functional layer transfer film 10 of Example 4 has a configuration of base material (PET film) / antifouling layer / antireflection layer / adhesive layer, and onto the TAC film as a transfer target as in Example 1. Then, pressurization was performed with a hot plate at 100 ° C., and the substrate was peeled off to obtain an antifouling layer and a functional layer transfer body of Example 10.

(Evaluation) Evaluation was made by using a contact angle for antifouling and a spectral reflectance for antireflection.
The contact angle was measured according to JIS-R3257. Spectral reflection measurement was performed according to JIS-K5600, and a spectrophotometer (UV-3100PC) manufactured by Shimadzu Corporation was used as the measuring instrument.
For composition analysis, a photoelectron spectrometer (ESCALAB220i-XL) manufactured by VG Scientific was used. Furthermore, as the oil-based magic ink, the red and black penter pens of Pentel were used.

  (Results of Evaluation) From the functional layer transfer film 10 of Example 1, the antireflection layer and the antifouling layer are easily transferred to an object to be transferred (TAC), and the antifouling layer and the functional layer of Examples 5 and 6 A transcript was obtained. Transferred antifouling layer and functional layer The antireflection film and antifouling layer of the transfer body are formed by exposing the antifouling layer to the outermost surface of the object to be transferred (TAC) without impairing the antireflection performance. We were able to. Further, as a result of laminating the obtained antireflection film on the surface of the liquid crystal display device, the reflection of external light was small and the antireflection property was excellent.

  The transferred antireflection films of Examples 5 and 6 had excellent antireflection characteristics with the reflectance shown in FIG. Moreover, when the contact angle of the transfer surface of a TAC film was measured, it was 134 degrees and sufficient antifouling property was recognized. Furthermore, when writing with oil-based magic ink and leaving it for 1 hour and then wiping with a cloth, the oil-based magic ink was not wiped off with only one wiping. When the composition of the transfer surface of the TAC film was analyzed, C: F: Si: O = 21.9: 58.1: 3.2: 16.8, and fluorine was unevenly distributed on the surface.

  Furthermore, the transferred antireflection film of Example 6 was transferred only to the liquid crystal display portion, and the glass plate was normal without cracks or chips. Also in Examples 7 and 8, antifouling layers and functional layer transfer bodies were obtained in the same manner as in Examples 5 and 6. Transferred antifouling layer and functional layer The antireflection film and antifouling layer of the transfer body are formed by exposing the antifouling layer to the outermost surface of the object to be transferred (TAC) without impairing the antireflection performance. We were able to. Further, as a result of laminating the obtained antireflection film on the surface of the liquid crystal display device, the reflection of external light was small and the antireflection property was excellent.

  The transferred antireflection films of Examples 6 and 7 had excellent antireflection characteristics with the reflectance shown in FIG. Moreover, when the contact angle of the transfer surface of a TAC film was measured, it was 128 degrees and sufficient antifouling property was recognized. Furthermore, when writing with oil-based magic ink and leaving it for 1 hour and then wiping with a cloth, the oil-based magic ink was not wiped off with only one wiping. When the composition of the transfer surface of the TAC film was analyzed, C: F: Si: O = 17.5: 51.3: 5.2: 26, and fluorine was unevenly distributed on the surface.

  Further, the transferred antireflection film of Example 8 was transferred only to the liquid crystal display portion, and the glass plate was normal without any cracks or chips.

  The antireflection film obtained by transferring the antifouling layer and the functional layer transfer body of Example 9 to a TAC film (transferred material) had the same reflectance as that of Example 1 and had excellent antireflection characteristics. However, when the contact angle of the transfer surface of the TAC film was measured, it was 75 degrees and the antifouling property was not sufficient, but there was no practical problem. Furthermore, when writing on the transfer surface of the TAC film with oil-based magic ink and leaving it for 1 hour and then wiping with a cloth, it could not be completely wiped off even after wiping 5 or more times. When the composition of the transfer surface of the TAC film was analyzed, C: F: Si: O = 44.6: 0.2: 2.7: 32.7, and fluorine was not unevenly distributed on the surface.

  When the antifouling layer and the functional layer transfer body of Example 10 were transferred to a TAC film (material to be transferred), it was difficult to peel off at the interface between the PET film serving as the base material and the antifouling layer, but this was a practical problem. There was no.

  The functional layer transfer film is not limited to various display devices such as liquid crystal display devices, organic EL display devices, and inorganic EL display devices, polarizing plates, and touch panel surfaces that are usually used. Since it can be used in an environment, it can be used for various articles. It can also be used for automobile parts such as curved mirrors and rearview mirrors, sports equipment such as goggles, building parts such as window glass, cards such as bank cards and credit cards, billboards, and commercial displays.

It is sectional drawing of the functional transfer film which shows one Example of this invention. It is explanatory drawing the principal part explaining a plasma CVD apparatus. It is a graph of the reflectance of the functional layer transfer body which shows one Example of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10: Functional layer transfer film 11: Base material 13: Release layer 15: Antifouling layer 17: Functional layer 19: Adhesive layer 21: Vacuum container 23: Paper feeding part 24: Winding part 25: Gas inlet 26: Electrode 27: Film formation drum

Claims (7)

A functional layer transfer film, wherein an antifouling layer and a functional layer are sequentially provided on one surface of a substrate. 2. The function according to claim 1, wherein the antifouling layer is formed by a CVD method, and a mass ratio of fluorine in the antifouling layer is distributed more on the substrate side than on the functional layer side. Layer transfer film. The functional layer transfer film according to claim 1, wherein a release layer is provided between the substrate and the antifouling layer. The function according to claim 3, wherein the antifouling layer is formed by a CVD method, and a mass ratio of fluorine in the antifouling layer is distributed more on the release layer side than on the functional layer side. Layer transfer film. The functional layer transfer film according to claim 1, wherein an adhesive layer is provided on the functional layer surface. The functional layer is composed of at least one layer having functions of antireflection, antiglare, electrical conductivity, gas barrier properties, light diffraction properties, flame retardancy, and / or hard coat properties. The functional layer transfer film according to any one of 1 to 5. Using the functional layer transfer film according to any one of claims 1 to 6, at least the functional layer and the antifouling layer are transferred to the transfer target, and the antifouling layer is exposed on the surface of the transfer target. An antifouling layer and a functional layer transfer body, wherein the antifouling layer and the functional layer transfer body are provided.

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